CN111455345A - 一种聚酰亚胺/类金刚石复合柔性膜及其制备方法与应用 - Google Patents
一种聚酰亚胺/类金刚石复合柔性膜及其制备方法与应用 Download PDFInfo
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- CN111455345A CN111455345A CN202010402064.XA CN202010402064A CN111455345A CN 111455345 A CN111455345 A CN 111455345A CN 202010402064 A CN202010402064 A CN 202010402064A CN 111455345 A CN111455345 A CN 111455345A
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- film
- polyimide
- diamond
- composite flexible
- carbon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202010402064.XA CN111455345A (zh) | 2020-05-13 | 2020-05-13 | 一种聚酰亚胺/类金刚石复合柔性膜及其制备方法与应用 |
Applications Claiming Priority (1)
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CN202010402064.XA CN111455345A (zh) | 2020-05-13 | 2020-05-13 | 一种聚酰亚胺/类金刚石复合柔性膜及其制备方法与应用 |
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CN111455345A true CN111455345A (zh) | 2020-07-28 |
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CN202010402064.XA Pending CN111455345A (zh) | 2020-05-13 | 2020-05-13 | 一种聚酰亚胺/类金刚石复合柔性膜及其制备方法与应用 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022267738A1 (zh) * | 2021-06-22 | 2022-12-29 | 江苏菲沃泰纳米科技股份有限公司 | 应用于柔性基材的硬化膜及其制备方法和产品 |
TWI854228B (zh) | 2021-06-22 | 2024-09-01 | 大陸商江蘇菲沃泰納米科技股份有限公司 | 應用於柔性基材的硬化膜及其製備方法和產品 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000047402A1 (en) * | 1998-12-02 | 2000-08-17 | Advanced Refractory Technologies, Inc. | Fluorine-doped diamond-like coatings |
CN1804665A (zh) * | 2006-01-24 | 2006-07-19 | 东北大学 | 一种在树脂镜片上沉积碳膜的方法 |
US20080014406A1 (en) * | 2006-07-11 | 2008-01-17 | International Business Machines Corporation | Injection molded soldering head for high temperature application and method of making same |
CN101886252A (zh) * | 2010-08-06 | 2010-11-17 | 北京大学 | 一种在pc树脂镜片上沉积dlc薄膜的制备方法 |
CN103938211A (zh) * | 2014-05-08 | 2014-07-23 | 西南交通大学 | 一种低应力、耐腐蚀的多层类金刚石(dlc)薄膜的沉积方法 |
CN106449711A (zh) * | 2016-10-24 | 2017-02-22 | 武汉华星光电技术有限公司 | 柔性amoled显示器的制作方法 |
CN209199986U (zh) * | 2019-02-19 | 2019-08-02 | 京东方科技集团股份有限公司 | 一种用于柔性基板的盖板、柔性显示装置 |
TW201940022A (zh) * | 2019-07-11 | 2019-10-01 | 大陸商深圳市柔宇科技有限公司 | 柔性蓋板、柔性顯示器及顯示面板 |
CN111128017A (zh) * | 2019-12-03 | 2020-05-08 | 武汉华星光电半导体显示技术有限公司 | 柔性盖板、柔性盖板的制作方法及显示装置 |
-
2020
- 2020-05-13 CN CN202010402064.XA patent/CN111455345A/zh active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000047402A1 (en) * | 1998-12-02 | 2000-08-17 | Advanced Refractory Technologies, Inc. | Fluorine-doped diamond-like coatings |
CN1804665A (zh) * | 2006-01-24 | 2006-07-19 | 东北大学 | 一种在树脂镜片上沉积碳膜的方法 |
US20080014406A1 (en) * | 2006-07-11 | 2008-01-17 | International Business Machines Corporation | Injection molded soldering head for high temperature application and method of making same |
CN101886252A (zh) * | 2010-08-06 | 2010-11-17 | 北京大学 | 一种在pc树脂镜片上沉积dlc薄膜的制备方法 |
CN103938211A (zh) * | 2014-05-08 | 2014-07-23 | 西南交通大学 | 一种低应力、耐腐蚀的多层类金刚石(dlc)薄膜的沉积方法 |
CN106449711A (zh) * | 2016-10-24 | 2017-02-22 | 武汉华星光电技术有限公司 | 柔性amoled显示器的制作方法 |
CN209199986U (zh) * | 2019-02-19 | 2019-08-02 | 京东方科技集团股份有限公司 | 一种用于柔性基板的盖板、柔性显示装置 |
TW201940022A (zh) * | 2019-07-11 | 2019-10-01 | 大陸商深圳市柔宇科技有限公司 | 柔性蓋板、柔性顯示器及顯示面板 |
CN111128017A (zh) * | 2019-12-03 | 2020-05-08 | 武汉华星光电半导体显示技术有限公司 | 柔性盖板、柔性盖板的制作方法及显示装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022267738A1 (zh) * | 2021-06-22 | 2022-12-29 | 江苏菲沃泰纳米科技股份有限公司 | 应用于柔性基材的硬化膜及其制备方法和产品 |
TWI854228B (zh) | 2021-06-22 | 2024-09-01 | 大陸商江蘇菲沃泰納米科技股份有限公司 | 應用於柔性基材的硬化膜及其製備方法和產品 |
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Application publication date: 20200728 |