CN111213271B - 固态薄膜混合电化学电池 - Google Patents
固态薄膜混合电化学电池 Download PDFInfo
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- CN111213271B CN111213271B CN201880065741.4A CN201880065741A CN111213271B CN 111213271 B CN111213271 B CN 111213271B CN 201880065741 A CN201880065741 A CN 201880065741A CN 111213271 B CN111213271 B CN 111213271B
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/22—Electrodes
- H01G11/30—Electrodes characterised by their material
- H01G11/50—Electrodes characterised by their material specially adapted for lithium-ion capacitors, e.g. for lithium-doping or for intercalation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/02—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof using combined reduction-oxidation reactions, e.g. redox arrangement or solion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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JP2010170715A (ja) * | 2009-01-20 | 2010-08-05 | Toyota Motor Corp | 正極活物質材料 |
CN103155066A (zh) * | 2010-10-04 | 2013-06-12 | 电子部品研究院 | 用于锂离子电容器的阴极活性材料和用于生产该阴极活性材料的方法 |
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US7993782B2 (en) * | 2005-07-01 | 2011-08-09 | National Institute For Materials Science | All-solid lithium battery |
EP1961060B1 (en) | 2005-11-17 | 2017-12-20 | Sapurast Research LLC | Hybrid thin-film battery |
JP5540643B2 (ja) * | 2009-02-03 | 2014-07-02 | ソニー株式会社 | 薄膜固体リチウムイオン二次電池及びその製造方法 |
WO2011014970A2 (en) | 2009-08-07 | 2011-02-10 | Oc Oerlikon Balzers Ag | All solid-state electrochemical double layer supercapacitor |
JP2013512547A (ja) | 2009-11-30 | 2013-04-11 | オーツェー エリコン バルザーズ アーゲー | リチウムイオン電池およびリチウムイオン電池の製造方法 |
WO2011128978A1 (ja) | 2010-04-13 | 2011-10-20 | トヨタ自動車株式会社 | 固体電解質材料、リチウム電池および固体電解質材料の製造方法 |
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JP2010170715A (ja) * | 2009-01-20 | 2010-08-05 | Toyota Motor Corp | 正極活物質材料 |
CN103155066A (zh) * | 2010-10-04 | 2013-06-12 | 电子部品研究院 | 用于锂离子电容器的阴极活性材料和用于生产该阴极活性材料的方法 |
CN103814472A (zh) * | 2011-09-30 | 2014-05-21 | 丰田自动车株式会社 | 全固体电池及其制造方法 |
CN105556627A (zh) * | 2013-09-30 | 2016-05-04 | 京瓷株式会社 | 全固态电容器 |
CN106784798A (zh) * | 2017-02-15 | 2017-05-31 | 中国科学院过程工程研究所 | 正极活性材料、制备方法及包含其的高性能正极浆料和全固态锂离子电池 |
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EP3669416A4 (en) | 2021-05-19 |
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CA3079064A1 (en) | 2019-02-21 |
CA3079064C (en) | 2023-10-17 |
KR20200049785A (ko) | 2020-05-08 |
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WO2019035745A1 (en) | 2019-02-21 |
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