CN111180390B - 板状物加工方法 - Google Patents
板状物加工方法 Download PDFInfo
- Publication number
- CN111180390B CN111180390B CN201911068976.1A CN201911068976A CN111180390B CN 111180390 B CN111180390 B CN 111180390B CN 201911068976 A CN201911068976 A CN 201911068976A CN 111180390 B CN111180390 B CN 111180390B
- Authority
- CN
- China
- Prior art keywords
- sheet
- thermocompression bonding
- hot
- dividing
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 26
- 238000010438 heat treatment Methods 0.000 claims abstract description 40
- 238000002844 melting Methods 0.000 claims abstract description 8
- 230000008018 melting Effects 0.000 claims abstract description 8
- 238000003672 processing method Methods 0.000 claims abstract description 7
- -1 polyethylene Polymers 0.000 claims description 39
- 238000005520 cutting process Methods 0.000 claims description 29
- 239000004698 Polyethylene Substances 0.000 claims description 14
- 229920000573 polyethylene Polymers 0.000 claims description 14
- 229920000098 polyolefin Polymers 0.000 claims description 14
- 229920000728 polyester Polymers 0.000 claims description 12
- 239000004743 Polypropylene Substances 0.000 claims description 10
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 10
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 10
- 229920001155 polypropylene Polymers 0.000 claims description 10
- 239000004793 Polystyrene Substances 0.000 claims description 9
- 239000011112 polyethylene naphthalate Substances 0.000 claims description 9
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 claims description 8
- 229920002223 polystyrene Polymers 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 12
- 230000010354 integration Effects 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000003825 pressing Methods 0.000 abstract description 2
- 230000001681 protective effect Effects 0.000 description 7
- 238000002679 ablation Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 2
- 238000002507 cathodic stripping potentiometry Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000003331 infrared imaging Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/388—Trepanning, i.e. boring by moving the beam spot about an axis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
- B26D1/01—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor involving a cutting member which does not travel with the work
- B26D1/12—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor involving a cutting member which does not travel with the work having a cutting member moving about an axis
- B26D1/14—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor involving a cutting member which does not travel with the work having a cutting member moving about an axis with a circular cutting member, e.g. disc cutter
- B26D1/143—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor involving a cutting member which does not travel with the work having a cutting member moving about an axis with a circular cutting member, e.g. disc cutter rotating about a stationary axis
- B26D1/15—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor involving a cutting member which does not travel with the work having a cutting member moving about an axis with a circular cutting member, e.g. disc cutter rotating about a stationary axis with vertical cutting member
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68354—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to support diced chips prior to mounting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Forests & Forestry (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Dicing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Laser Beam Processing (AREA)
Abstract
提供板状物加工方法,即使在一边对晶片或CSP基板等板状物的正面进行保护一边进行分割的情况下,也不会使生产效率劣化。该板状物加工方法至少包含如下的工序:支承部件配设工序,在被加工物(10)的背面(10b)上配设支承部件;片配设工序,在该支承部件配设工序之前或之后,在被加工物的正面(10a)上敷设热压接片(20)并进行加热而进行热压接;分割工序,将分割单元定位于要分割的区域而将被加工物与热压接片一起分割成各个芯片;一体化工序,对与各个芯片对应地被分割的热压接片(20)进行加热,使该热压接片熔融,将在分割工序中被分割的热压接片(20)连结而进行一体化;以及剥离工序,将一体化的热压接片(20)从被加工物(10)剥离。
Description
技术领域
本发明涉及板状物加工方法,将板状的被加工物分割成各个芯片。
背景技术
由分割预定线划分而在正面上形成有IC、LSI等多个器件的板状的晶片、或者由分割预定线划分而在正面上形成有CSP(Chip Size Package:芯片尺寸封装)的CSP基板通过具有切削刀具的切割装置、激光加工装置等分割成各个芯片,并被用于移动电话、个人计算机等电子设备。
当通过切割装置沿着晶片或CSP基板的分割预定线进行切削时,切削屑附着在晶片或CSP基板的正面上而污染器件或CSP。同样地,当通过激光加工装置对晶片或CSP基板的分割预定线照射激光光线而实施烧蚀加工时,碎屑飞散而污染器件或CSP。为了保护器件的正面免受这些污染,提出了在晶片或CSP基板的正面上粘贴保护带来保护器件的正面免受切削屑、碎屑的污染(例如参照专利文献1)。
专利文献1:日本特开2007-134390号公报
如上所述,在实施切割装置或激光加工装置的加工时,在晶片或CSP基板的正面上配设保护带,对保护带以及晶片或CSP基板实施分割加工,从而能够保护器件或CSP免受切削屑、碎屑的污染。但是,当在晶片或CSP基板的正面上粘贴有保护带的状态下分割成各个芯片时,粘贴在正面上的保护带也会按照每个芯片被单片化,在实施了分割加工之后,必须从各个芯片的正面一个一个地剥离单片化的保护带,作业极其困难,生产效率显著降低。
发明内容
本发明是鉴于上述事实而完成的,其主要的技术课题在于提供板状物加工方法,即使在一边对晶片或CSP基板等板状物的正面进行保护一边进行分割的情况下,也不会使生产效率劣化。
为了解决上述主要的技术课题,根据本发明,提供板状物加工方法,将板状的被加工物分割成各个芯片,其中,该板状物加工方法至少包含如下的工序:支承部件配设工序,在被加工物的背面上配设支承部件;片配设工序,在该支承部件配设工序之前或之后,在被加工物的正面上敷设热压接片并进行加热从而进行热压接;分割工序,将分割单元定位于要分割的区域而将被加工物与该热压接片一起分割成各个芯片;一体化工序,对与各个芯片对应地被分割的热压接片进行加热,使该热压接片熔融,将在分割工序中被分割的热压接片连结而进行一体化;以及剥离工序,将一体化的热压接片从被加工物剥离。
该分割单元是切削单元或激光光线照射单元中的任意单元,该切削单元以能够旋转的方式具有在外周具有切刃的切削刀具,该激光光线照射单元照射激光光线而对板状物实施烧蚀加工。另外,被加工物可以是由分割预定线划分而在正面上形成有多个器件的晶片。
优选该热压接片从聚烯烃系片或聚酯系片中进行选择。
该聚烯烃系片可以选自聚乙烯片、聚丙烯片、聚苯乙烯片中的任意片。优选在该片配设工序中,在从聚烯烃系片中选择的热压接片为聚乙烯片的情况下,加热温度为120℃~140℃,在从聚烯烃系片中选择的热压接片为聚丙烯片的情况下,加热温度为160℃~180℃,在从聚烯烃系片中选择的热压接片为聚苯乙烯片的情况下,加热温度为220℃~240℃,在该一体化工序中,在该热压接片为聚乙烯片的情况下,加热温度为160℃以上,在该热压接片为聚丙烯片的情况下,加热温度为200℃以上,在该热压接片为聚苯乙烯片的情况下,加热温度为260℃以上。
该聚酯系片可以从聚对苯二甲酸乙二醇酯片或聚萘二甲酸乙二醇酯片中进行选择。优选在该片配设工序中,在从聚酯系片中选择的热压接片为聚对苯二甲酸乙二醇酯片的情况下,加热温度为250℃~270℃,在从聚酯系片中选择的热压接片为聚萘二甲酸乙二醇酯片的情况下,加热温度为160℃~180℃,在该一体化工序中,在该热压接片为聚对苯二甲酸乙二醇酯片的情况下,加热温度为290℃以上,在该热压接片为聚萘二甲酸乙二醇酯片的情况下,加热温度为200℃以上。
本发明的板状物加工方法至少包含如下的工序:支承部件配设工序,在被加工物的背面上配设支承部件;片配设工序,在该支承部件配设工序之前或之后,在被加工物的正面上敷设热压接片并进行加热而进行热压接;分割工序,将分割单元定位于要分割的区域而将被加工物与该热压接片一起分割成各个芯片;一体化工序,对与各个芯片对应地被分割的热压接片进行加热,使该热压接片熔融,将在分割工序中被分割的热压接片连结而进行一体化;以及剥离工序,将一体化的热压接片从被加工物剥离,从而能够防止切削屑或碎屑附着在晶片或CSP基板等板状物的正面上而产生污染,并且能够将按照被分割的每个器件芯片或每个CSP芯片进行了单片化的热压接片连结而统一剥离。由此,无需将单片化的热压接片从各个器件芯片或CSP芯片一个一个地剥离,不会使生产率劣化。
附图说明
图1是晶片和热压接片的立体图。
图2是示出片配设工序的实施方式的立体图。
图3是示出支承部件配设工序的实施方式的立体图。
图4的(a)是示出通过切割装置而实施的分割工序的实施方式的立体图,图4的(b)是示出通过激光加工装置而实施的分割工序的实施方式的立体图。
图5是通过分割工序进行了分割后的晶片的立体图。
图6是示出一体化工序的实施方式的立体图。
图7是示出剥离工序的实施方式的立体图。
标号说明
10:晶片;12:器件;12’:器件芯片;14:分割预定线;20:热压接片;30:热压接装置;32:加热辊;40:切割装置;43:切削刀具;50:激光加工装置;52:激光光线照射单元;52a:聚光器;60:一体化用加热单元;F:框架;T:划片带。
具体实施方式
以下,参照附图对根据本发明构成的板状物加工方法的实施方式进行更加详细的说明。
(片配设工序)
在实施本实施方式时,首先如图1所示,作为板状的被加工物,准备由半导体(例如Si)构成的晶片10以及热压接片20。晶片10是由分割预定线14划分而在正面10a上形成有多个器件12的晶片。
热压接片20从适合热压接的材料中进行选择。适合热压接的材料优选从通过加热至规定的温度范围而发生软化从而发挥粘接性的材料中进行选择。更具体而言,可以从聚烯烃系片或聚酯系片中进行选择。
进一步具体而言,在从聚烯烃系片中选择热压接片20的情况下,优选选自聚乙烯(PE)片、聚丙烯(PP)片、聚苯乙烯(PS)片中的任意片。另外,在从聚酯系片中选择热压接片20的情况下,优选选自聚对苯二甲酸乙二醇酯(PET)片、聚萘二甲酸乙二醇酯(PEN)片中的任意片。另外,在以下说明的实施方式中,选择聚乙烯片作为热压接片20而继续进行说明。
若如上述那样准备了晶片10和热压接片20,则如图1所示,在晶片10的正面10a上敷设热压接片20。接着,搬送至图2所示的热压接装置30(整体图省略)。热压接装置30具有:加热辊32,其被保持为能够以旋转轴34为中心进行旋转;以及未图示的保持工作台。在加热辊32的正面上涂布有氟树脂。在加热辊32的内部内置有电加热器和温度传感器(省略图示),通过另外准备的控制装置,能够将加热辊32的表面调整为期望的温度。加热辊32能够一边以旋转轴34为中心进行旋转一边沿着形成为平坦的未图示的保持工作台的保持面在规定的方向(箭头所示)上移动。若将晶片10搬送至热压接装置30,则使晶片10的敷设有热压接片20的面朝向上方而载置于未图示的保持工作台的保持面上。接着,如图2所示,利用加热辊32对敷设在晶片10的正面10a的热压接片20侧进行按压并进行加热,使加热辊32一边以旋转轴34为中心进行旋转一边沿着热压接片20的正面在箭头所示的方向上移动。此时,通过加热辊32按照120℃~140℃的范围对热压接片20进行加热。该温度是构成热压接片20的聚乙烯片的熔点附近的温度,按照热压接片20不会过度熔融的程度的温度且按照热压接片20发生软化而发挥出粘接性的温度进行设定。这样,将热压接片20热压接在晶片10的整个正面10a上,完成片配设工序。
(支承部件配设工序)
若完成了上述片配设工序,则如图3的上部所示,准备由正面具有粘接性的划片带T和对划片带T进行保持的环状的框架F构成的支承部件,将划片带T的中央部粘贴于晶片10的背面10b侧。由此,如图3的下部所示,成为支承部件配设在晶片10上的状态。
另外,在本实施方式中,如上所述在片配设工序之后实施了支承部件配设工序,但本发明不限于此。即,也可以在实施片配设工序之前实施支承部件配设工序。更具体而言,首先实施支承部件配设工序,在进行热压接片20的热压接之前的晶片10的背面10b上粘贴划片带T,通过环状的框架F对晶片10进行支承。然后实施片配设工序,在晶片10的正面10a上敷设热压接片20,使用上述的热压接装置30对热压接片进行加热而将热压接片20热压接在晶片10的正面10a上。由此,能够与上述的实施方式同样地得到将热压接片20热压接在正面10a上且借助划片带T而支承于环状的框架F的晶片10。
(分割工序)
若如上述那样完成了片配设工序和支承部件配设工序,则实施分割工序,将分割单元定位于要分割的区域而将晶片10与热压接片20一起分割成各个芯片。以下,参照图4对分割工序的实施方式进行说明。
将晶片10与热压接片20一起分割成各个芯片的分割工序例如通过图4的(a)所示的切割装置40(仅示出一部分)来实现。如图4的(a)所示,切割装置40具有主轴单元41。主轴单元41具有:切削刀具43,其固定于旋转主轴42的前端部,在外周具有切刃;以及刀具罩44,其对切削刀具43进行保护。切削刀具43构成为能够与旋转主轴42一起旋转。在刀具罩44上,在与切削刀具43相邻的位置配设有切削水提供单元45,朝向切削刀具43对晶片10的切削位置提供切削水。在通过切削刀具43实施切削时,使用未图示的对准单元进行切削刀具43与未图示的保持工作台所保持的晶片10的正面10a侧所形成的分割预定线14的对位(对准)。该对准单元至少具有未图示的红外线照明单元和红外线拍摄单元,构成为能够从热压接片20侧对正面10a的分割预定线14进行拍摄、检测。
若实施了该对准单元的对准,则将与旋转主轴42一起高速旋转的切削刀具43定位于与未图示的保持工作台所保持的晶片10的分割预定线14对应的位置并使该切削刀具43下降而切入,并使晶片10相对于切削刀具43在箭头X所示的X轴方向(加工进给方向)上移动。由此,沿着分割预定线14对晶片10进行切削而形成分割槽100,该分割槽100对晶片10进行分割。该分割槽100是将晶片10完全分割的槽,热压接片20也与晶片10一起被分割。一边通过未图示的移动单元使对晶片10进行保持的保持工作台在X轴方向和与X轴方向垂直的Y轴方向上适当移动,一边对晶片10的所有分割预定线14实施上述的切削刀具43的切削加工。由此,如图5所示,沿着晶片10的所有分割预定线14形成分割槽100,将晶片10与热压接片20一起分割。通过以上,完成分割工序。
在本发明中实施的分割工序不限于通过图4的(a)所示的切割装置40来实施,例如也可以使用图4的(b)所示的激光加工装置50(仅示出一部分)来实施。对通过激光加工装置50实施的分割工序进行说明。
如图4的(b)所示,激光加工装置50具有激光光线照射单元52。激光光线照射单元52具有包含未图示的激光光线振荡器在内的光学系统,具有对从激光光线振荡器振荡出的激光光线进行会聚的聚光器52a。激光光线照射单元52按照照射对于晶片10具有吸收性的波长的激光光线而实施烧蚀加工的方式设定激光加工条件。在通过激光光线照射单元52实施分割工序之前,使用未图示的对准单元进行聚光器52a所照射的激光光线LB的照射位置与未图示的保持工作台所保持的晶片10的正面10a侧所形成的分割预定线14的对位(对准)。该对准单元具有未图示的红外线照明单元和红外线拍摄单元,构成为能够从热压接片20侧对正面10a的分割预定线14进行拍摄、检测。
若实施了该对准单元的对准,则将聚光器52a定位于与未图示的保持工作台所保持的晶片10的分割预定线14对应的位置,将聚光点定位于晶片10的规定的位置。接着,使激光光线照射单元52进行动作,并且使晶片10相对于聚光器52a在箭头X所示的X轴方向(加工进给方向)上移动。由此,对晶片10进行烧蚀加工而形成激光加工槽110,该激光加工槽110对晶片10进行分割。该激光加工槽110是将晶片10完全分割的槽,热压接片20也与晶片10一起被分割。一边通过未图示的移动单元使对晶片10进行保持的保持工作台在X轴方向和与X轴方向垂直的Y轴方向上适当移动,一边实施上述的激光光线照射单元52的烧蚀加工。由此,沿着晶片10的所有分割预定线14形成激光加工槽110,将晶片10与热压接片20一起分割。
无论在通过上述的切割装置40、激光加工装置50中的任意装置进行分割的情况下,晶片10的正面10a均被热压接片20保护,因此可防止器件12被切削屑或碎屑污染。
(一体化工序)
若实施了上述的分割工序,则实施一体化工序,对与器件12对应地被一个一个地分割的热压接片20进行加热,使它们熔融而连结并一体化。参照图6对该一体化工序进行更具体的说明。
如图5所示,通过分割工序,热压接片20也与晶片10一起与器件12对应地被一个一个地分割。将该晶片10与由框架F和划片带T构成的支承部件一起定位于图6所示的一体化用加热单元60的下方。一体化用加热单元60在内部内置有电加热器和风扇,构成为将规定的温度的热风W朝向下方喷射。在本实施方式中,热压接片20选择聚乙烯片,要将热压接片20加热至超过聚乙烯片的熔点温度的160℃以上。因此,从一体化用加热单元60喷射的热风W的温度按照使热压接片20本身达到160℃以上(例如200℃)的方式设定。从一体化用加热单元60喷射这样设定的热风W而按照规定的时间进行加热,从而热压接片20达到熔点以上的温度而发生熔融。即,如图6的下部所示,通过先实施的分割工序而形成的分割槽100因热压接片20的熔融而消失,热压接片20连结并一体化,再次成为一张片。另外,通过一体化用加热单元60进行加热的温度并非越高越好,优选加热至不会使热压接片20过度地熔融而从晶片10的外缘流出而流出至划片带T侧的程度的温度。通过以上,完成一体化工序。
(剥离工序)
若如上述那样完成了使分割槽100消失而进行连结的一体化工序,则如图7所示,实施剥离工序,将一体化的热压接片20从晶片10的正面10a剥离。对于将一体化的热压接片20从晶片10剥离的具体的手段没有特别限定,在热压接片20上粘贴剥离用的粘接带,将热压接片20与该粘接带一起从晶片10剥离即可。通过这样实施剥离工序,在划片带T上以已分割成各个器件芯片12’的状态露出晶片10。
若如上述那样实施了剥离工序,则将晶片10搬送至从划片带T拾取器件芯片12’的拾取工序,或将晶片10搬送至与划片带T和框架F一起进行收纳的未图示的盒壳体中而进行收纳。
另外,在上述的实施方式中,使热压接片20为聚乙烯片,但本发明不限于此,可以从聚烯烃系片或聚酯系片中适当选择。
在从聚烯烃系片中选择热压接片20的情况下,具体而言,除了聚乙烯片以外,还可以选自聚丙烯片、聚苯乙烯片中的任意片。
在选择聚丙烯片作为热压接片20的情况下,优选在片配设工序中使加热时的温度为160℃~180℃,在一体化工序中使加热时的温度为200℃以上。另外,在选择聚苯乙烯片作为热压接片20的情况下,优选在片配设工序中使加热时的温度为220℃~240℃,在一体化工序中使加热时的温度为260℃以上。
在使热压接片20为聚酯系片的情况下,具体而言,可以从聚对苯二甲酸乙二醇酯片或聚萘二甲酸乙二醇酯片中进行选择。
在选择聚对苯二甲酸乙二醇酯片作为热压接片20的情况下,优选在片配设工序中使加热时的温度为250℃~270℃,在一体化工序中使加热时的温度为290℃以上。另外,在选择聚萘二甲酸乙二醇酯片作为热压接片20的情况下,优选在片配设工序中使加热时的温度为160℃~180℃,在一体化工序中使加热时的温度为200℃以上。
在上述的实施方式中,使作为加工对象的板状物为圆盘形状的晶片10,该晶片10由分割预定线14划分而在正面10a上形成有多个器件12,但本发明不限于此,作为加工对象的板状物也可以是矩形状的CSP基板,该CSP基板由分割预定线划分而在正面上形成有多个CSP。
Claims (8)
1.一种板状物加工方法,将板状的被加工物分割成各个芯片,其中,
该板状物加工方法至少包含如下的工序:
支承部件配设工序,在被加工物的背面上配设支承部件;
片配设工序,在该支承部件配设工序之前或之后,在被加工物的正面上敷设热压接片并进行加热从而进行热压接;
分割工序,将分割单元定位于要分割的区域而将被加工物与该热压接片一起分割成各个芯片;
一体化工序,对与各个芯片对应地被分割的热压接片进行加热,使该热压接片熔融,将在分割工序中被分割的热压接片连结而进行一体化;以及
剥离工序,将一体化的热压接片从被加工物剥离。
2.根据权利要求1所述的板状物加工方法,其中,
该分割单元是切削单元或激光光线照射单元中的任意单元,该切削单元以能够旋转的方式具有在外周具有切刃的切削刀具,该激光光线照射单元照射激光光线而对被加工物实施烧蚀加工。
3.根据权利要求1或2所述的板状物加工方法,其中,
被加工物是由分割预定线划分而在正面上形成有多个器件的晶片。
4.根据权利要求1至3中的任意一项所述的板状物加工方法,其中,
该热压接片从聚烯烃系片或聚酯系片中进行选择。
5.根据权利要求4所述的板状物加工方法,其中,
该聚烯烃系片选自聚乙烯片、聚丙烯片、聚苯乙烯片中的任意片。
6.根据权利要求5所述的板状物加工方法,其中,
在该片配设工序中,在从聚烯烃系片中选择的热压接片为聚乙烯片的情况下,加热温度为120℃~140℃,在从聚烯烃系片中选择的热压接片为聚丙烯片的情况下,加热温度为160℃~180℃,在从聚烯烃系片中选择的热压接片为聚苯乙烯片的情况下,加热温度为220℃~240℃,
在该一体化工序中,在该热压接片为聚乙烯片的情况下,加热温度为160℃以上,在该热压接片为聚丙烯片的情况下,加热温度为200℃以上,在该热压接片为聚苯乙烯片的情况下,加热温度为260℃以上。
7.根据权利要求4所述的板状物加工方法,其中,
该聚酯系片从聚对苯二甲酸乙二醇酯片或聚萘二甲酸乙二醇酯片中进行选择。
8.根据权利要求7所述的板状物加工方法,其中,
在该片配设工序中,在从聚酯系片中选择的热压接片为聚对苯二甲酸乙二醇酯片的情况下,加热温度为250℃~270℃,在从聚酯系片中选择的热压接片为聚萘二甲酸乙二醇酯片的情况下,加热温度为160℃~180℃,
在该一体化工序中,在该热压接片为聚对苯二甲酸乙二醇酯片的情况下,加热温度为290℃以上,在该热压接片为聚萘二甲酸乙二醇酯片的情况下,加热温度为200℃以上。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018-211534 | 2018-11-09 | ||
JP2018211534A JP7154962B2 (ja) | 2018-11-09 | 2018-11-09 | 板状物加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN111180390A CN111180390A (zh) | 2020-05-19 |
CN111180390B true CN111180390B (zh) | 2023-08-15 |
Family
ID=70648723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201911068976.1A Active CN111180390B (zh) | 2018-11-09 | 2019-11-05 | 板状物加工方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7154962B2 (zh) |
KR (1) | KR20200054099A (zh) |
CN (1) | CN111180390B (zh) |
TW (1) | TWI830807B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021185591A (ja) * | 2020-05-25 | 2021-12-09 | 株式会社ディスコ | ウエーハの加工方法 |
JP2023092654A (ja) | 2021-12-22 | 2023-07-04 | 株式会社ディスコ | 被加工物の加工方法 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002155249A (ja) * | 2000-11-22 | 2002-05-28 | Mitsui Chemicals Inc | ウエハ加工用粘着テープ及びその製造方法並びに使用方法 |
TW200807536A (en) * | 2006-07-28 | 2008-02-01 | Tokyo Ohka Kogyo Co Ltd | Wafer bonding method, thinning method and detaching method |
JP2009193825A (ja) * | 2008-02-14 | 2009-08-27 | Toyota Central R&D Labs Inc | 複合電解質膜及びその製造方法 |
JP2010129623A (ja) * | 2008-11-26 | 2010-06-10 | Disco Abrasive Syst Ltd | ウエーハの加工方法 |
CN102206469A (zh) * | 2010-03-31 | 2011-10-05 | 古河电气工业株式会社 | 晶片加工用胶带 |
JP2014135424A (ja) * | 2013-01-11 | 2014-07-24 | Disco Abrasive Syst Ltd | ウエーハ切断方法 |
CN105529302A (zh) * | 2014-10-21 | 2016-04-27 | 株式会社迪思科 | 晶片的加工方法 |
TW201810507A (zh) * | 2016-06-28 | 2018-03-16 | 琳得科股份有限公司 | 排列治具、排列方法及轉貼方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004091619A (ja) * | 2002-08-30 | 2004-03-25 | Toray Ind Inc | 印刷・成形加工用ポリエステルフィルム |
JP2007134390A (ja) | 2005-11-08 | 2007-05-31 | Disco Abrasive Syst Ltd | ウエーハの加工方法 |
-
2018
- 2018-11-09 JP JP2018211534A patent/JP7154962B2/ja active Active
-
2019
- 2019-11-05 CN CN201911068976.1A patent/CN111180390B/zh active Active
- 2019-11-07 KR KR1020190141804A patent/KR20200054099A/ko active IP Right Grant
- 2019-11-07 TW TW108140392A patent/TWI830807B/zh active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002155249A (ja) * | 2000-11-22 | 2002-05-28 | Mitsui Chemicals Inc | ウエハ加工用粘着テープ及びその製造方法並びに使用方法 |
TW200807536A (en) * | 2006-07-28 | 2008-02-01 | Tokyo Ohka Kogyo Co Ltd | Wafer bonding method, thinning method and detaching method |
JP2009193825A (ja) * | 2008-02-14 | 2009-08-27 | Toyota Central R&D Labs Inc | 複合電解質膜及びその製造方法 |
JP2010129623A (ja) * | 2008-11-26 | 2010-06-10 | Disco Abrasive Syst Ltd | ウエーハの加工方法 |
CN102206469A (zh) * | 2010-03-31 | 2011-10-05 | 古河电气工业株式会社 | 晶片加工用胶带 |
JP2014135424A (ja) * | 2013-01-11 | 2014-07-24 | Disco Abrasive Syst Ltd | ウエーハ切断方法 |
CN105529302A (zh) * | 2014-10-21 | 2016-04-27 | 株式会社迪思科 | 晶片的加工方法 |
TW201810507A (zh) * | 2016-06-28 | 2018-03-16 | 琳得科股份有限公司 | 排列治具、排列方法及轉貼方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2020077812A (ja) | 2020-05-21 |
CN111180390A (zh) | 2020-05-19 |
JP7154962B2 (ja) | 2022-10-18 |
KR20200054099A (ko) | 2020-05-19 |
TWI830807B (zh) | 2024-02-01 |
TW202018798A (zh) | 2020-05-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110391182B (zh) | 晶片的加工方法 | |
CN110391139B (zh) | 晶片的加工方法 | |
CN110783249B (zh) | 晶片的加工方法 | |
JP2005019525A (ja) | 半導体チップの製造方法 | |
JP2007134390A (ja) | ウエーハの加工方法 | |
CN111180390B (zh) | 板状物加工方法 | |
KR20140126247A (ko) | 웨이퍼 가공 방법 | |
JP2017005158A (ja) | ウエーハの裏面研削方法 | |
JP2020092198A (ja) | ウェーハの加工方法 | |
CN110429062B (zh) | 晶片的加工方法 | |
JP2020077700A (ja) | ウェーハの加工方法 | |
JP2020115502A (ja) | ウェーハの加工方法 | |
JP2020092200A (ja) | ウェーハの加工方法 | |
CN111063631A (zh) | 晶片的加工方法 | |
JP2021185591A (ja) | ウエーハの加工方法 | |
CN116017863A (zh) | 加工方法 | |
JP2024019854A (ja) | 被加工物の分割方法 | |
JP2022061870A (ja) | ウエーハの加工方法 | |
JP2020115504A (ja) | ウェーハの加工方法 | |
KR20230082571A (ko) | 피가공물의 가공 방법 및 레이저 가공 장치 | |
JP2022146237A (ja) | 積層ウエーハの加工方法 | |
JP2020064985A (ja) | ウェーハの加工方法 | |
JP2023116861A (ja) | ウエーハの加工方法 | |
JP2023080511A (ja) | ウエーハの処理方法 | |
CN117305763A (zh) | 掩模的形成方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |