CN111172500B - 一种pet镀膜方法、镀膜pet - Google Patents

一种pet镀膜方法、镀膜pet Download PDF

Info

Publication number
CN111172500B
CN111172500B CN202010045208.0A CN202010045208A CN111172500B CN 111172500 B CN111172500 B CN 111172500B CN 202010045208 A CN202010045208 A CN 202010045208A CN 111172500 B CN111172500 B CN 111172500B
Authority
CN
China
Prior art keywords
pet
film
layer
coating
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202010045208.0A
Other languages
English (en)
Other versions
CN111172500A (zh
Inventor
陆张武
徐勇军
李恭剑
王迎
徐征驰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zhejiang Jingchi Photoelectric Technology Co ltd
Original Assignee
Zhejiang Jingchi Photoelectric Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhejiang Jingchi Photoelectric Technology Co ltd filed Critical Zhejiang Jingchi Photoelectric Technology Co ltd
Priority to CN202010045208.0A priority Critical patent/CN111172500B/zh
Publication of CN111172500A publication Critical patent/CN111172500A/zh
Application granted granted Critical
Publication of CN111172500B publication Critical patent/CN111172500B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

一种PET镀膜方法、镀膜PET，属于镀膜技术领域。方法包括：步骤S01,在PET基板表面溅镀Ti；步骤S02，在溅镀Ti层的PET基板上进行镀膜。本镀膜PET基于上述方法制备。本发明在PET薄片基本表面镀膜，采用特定的膜层设计，使之与PET表面精密粘结，并达到在400nm～700nm光谱波段平均反射率低于0.15％的吸光作用。

Description

一种PET镀膜方法、镀膜PET
技术领域
本发明属于镀膜技术领域，具体涉及一种PET镀膜方法、镀膜PET。
背景技术
类似于低反射率的减反射膜镀膜，一般用在玻璃等基板上，脆性和延展性相对不足，最重要的是无法达到吸光作用。现有镀膜技术在PET表面镀膜，PET折皱严重，膜层不均匀，光谱达不到要求。
发明专利申请CN201510835077.5公开了一种电子设备壳体的镀膜制备工艺，并具体公开了工艺包括以下步骤：离子轰击步骤：将一面经过UV转印处理的透明PET片材置于真空镀室内，对所述PET片材的表面进行离子轰击；镀膜步骤：利用真空镀膜方式在所述PET片材的表面依次镀上SiO2膜、TiO2膜、铟膜和SiO2膜。该工艺中PET折皱严重，膜层不均匀。
发明内容
本发明针对现有技术存在的问题，提出了一种耐折性好，具有反射率低于0.15％吸光作用的PET镀膜方法、镀膜PET。
本发明是通过以下技术方案得以实现的：
本发明一种PET镀膜方法，包括:
步骤S01,在PET基板表面溅镀Ti；
步骤S02，在溅镀Ti层的PET基板上进行镀膜。
将Ti层作为基板和膜层之间的粘结层，避免PET折皱，膜层不均匀。
作为优选，步骤S01具体包括：真空溅射镀膜机对腔体抽真空；在PET基板表面溅镀Ti。
作为优选，步骤S01溅镀Ti层的厚度为20-200nm。
作为优选，所述步骤S02具体包括：在溅镀Ti层的PET基板上依次溅镀Al2O3、Ti、Al2O3、SiO2。
作为优选，镀膜温度不超过200℃。
作为优选，镀膜的膜厚不超过300nm。
作为优选，镀膜后的PET基板具有400-700nm波段的吸光特性。
一种镀膜PET，采用上述PET镀膜方法制备；所述PET包括PET基板、膜层、Ti层；所述Ti层设于PET基板和膜层之间。
作为优选，所述膜层由Al2O3、Ti、Al2O3、SiO2构成。
本发明具有以下有益效果：
本发明一种PET镀膜方法、镀膜PET，在PET薄片基本表面镀膜，采用特定的膜层设计，使之与PET表面精密粘结，并达到在400nm～700nm光谱波段平均反射率低于0.15％的吸光作用。
附图说明
图1为本发明一种PET镀膜方法的流程图；
图2为采用本发明一种PET镀膜方法制备的PET在不同波段下的反射率曲线图。
具体实施方式
以下是本发明的具体实施例并结合附图，对本发明的技术方案作进一步的描述，但本发明并不限于这些实施例。
如图1，本发明一种PET镀膜方法，包括：
步骤S01,在PET基板表面溅镀Ti；
步骤S02，在溅镀Ti层的PET基板上进行镀膜。
步骤S01具体包括：真空溅射镀膜机对腔体抽真空，如抽至4E-4～2.0E-3Pa区间。随后，在PET基板表面溅镀Ti。优选地，溅镀Ti层的厚度为20-200nm。
之后，膜层通过Ti层镀于PET基板上。Ti层作为膜层与基板之间的粘结层。由于Ti的覆盖性好，镀膜的空洞少，致密性好，比对材料，如Cr，Cr的性能不如Ti，为此Ti层能确保膜层均匀度。并且，Ti与基片及镀膜材料的粘结性好，Ti的化学稳定性好，镀膜后的PET不易折皱。另外，Ti的吸光性好，膜层设计中Ti层起到吸光作用，需要好的吸光性，能进一步降低反射率，提高透过率。
所述步骤S02包括：在溅镀Ti层的PET基板上依次溅镀Al2O3、Ti、Al2O3、SiO2。具体地，首先，在膜上溅镀Al2O3,使用Al靶，激发Al原子电离后溅射至膜上，充氧氧化形成Al2O3。其次，在膜上溅镀Ti，使用Ti靶，激发Ti原子电离后溅射至膜上，充氧氧化形成TiO2。或者直接镀TiO2。接着，在膜上溅镀Al2O3,使用Al靶，激发Al原子电离后溅射至膜上，充氧氧化形成Al2O3。最后，在膜上溅镀SiO2,使用Si靶，激发Si原子电离后溅射至膜上，充氧氧化形成SiO2。其中，镀膜温度不超过200℃。通过镀膜材料和膜层设计，使得具有在400nm-700nm波段具有超高的吸光特性，平均反射率低于0.15％以下，色度L小于1.3，A绝对值小于0.2，色度B值介于-0.42至0.3之间(参见图2)。
本发明上述方法制成的镀膜PET，总膜厚控制300nm以内，并达到吸光作用。镀膜PET包括PET基板、Ti层、膜层。Ti层作为粘结层设于PET基板和膜层之间。所述膜层由Al2O3、Ti、Al2O3、SiO2构成。本发明的基板为超薄的PET，有良好的力学性能，冲击强度是其他薄膜的3～5倍，耐折性好，可以用作一定暗背景下保护层。
本领域的技术人员应理解，上述描述及附图中所示的本发明的实施例只作为举例而并不限制本发明。本发明的目的已经完整有效地实现。本发明的功能及结构原理已在实施例中展示和说明，在没有背离所述原理下，本发明的实施方式可以有任何变形或修改。

Claims (7)

1.一种PET镀膜方法，其特征在于，包括:
步骤S01,在PET基板表面溅镀Ti；
步骤S02，在溅镀Ti层的PET基板上依次溅镀Al2O3、TiO2、Al2O3、SiO2。
2.根据权利要求1所述的一种PET镀膜方法，其特征在于，步骤S01具体包括：真空溅射镀膜机对腔体抽真空；在PET基板表面溅镀Ti。
3.根据权利要求2所述的一种PET镀膜方法，其特征在于，步骤S01溅镀Ti层的厚度为20-200nm。
4.根据权利要求1所述的一种PET镀膜方法，其特征在于，所述步骤S02中镀膜温度不超过200℃。
5.根据权利要求1所述的一种PET镀膜方法，其特征在于，镀膜的膜厚不超过300nm。
6.根据权利要求1所述的一种PET镀膜方法，其特征在于，镀膜后的PET基板具有400-700nm波段的吸光特性。
7.一种镀膜PET，其特征在于，采用上述权利要求1的PET镀膜方法制备；所述PET包括PET基板、膜层、Ti层；所述Ti层设于PET基板和膜层之间；所述膜层由Al2O3、TiO2、Al2O3、SiO2构成。
CN202010045208.0A 2020-01-16 2020-01-16 一种pet镀膜方法、镀膜pet Active CN111172500B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010045208.0A CN111172500B (zh) 2020-01-16 2020-01-16 一种pet镀膜方法、镀膜pet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010045208.0A CN111172500B (zh) 2020-01-16 2020-01-16 一种pet镀膜方法、镀膜pet

Publications (2)

Publication Number Publication Date
CN111172500A CN111172500A (zh) 2020-05-19
CN111172500B true CN111172500B (zh) 2022-04-01

Family

ID=70652838

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010045208.0A Active CN111172500B (zh) 2020-01-16 2020-01-16 一种pet镀膜方法、镀膜pet

Country Status (1)

Country Link
CN (1) CN111172500B (zh)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110055505A (zh) * 2019-05-31 2019-07-26 成都柔电云科科技有限公司 一种多层钛膜及其制备方法

Also Published As

Publication number Publication date
CN111172500A (zh) 2020-05-19

Similar Documents

Publication Publication Date Title
JP6045043B2 (ja) 焼入れ可能及び焼入れ不可能な透明ナノコンポジット層
JPH0791089B2 (ja) 熱線反射ガラス
JP2011529134A (ja) 基材上に層システムを製造するための方法、並びに層システム
WO2013069402A1 (ja) ガスバリアフィルムおよびガスバリアフィルムの製造方法
CN108156776A (zh) 电子设备的壳体及其制备方法
JP5118999B2 (ja) 焼戻し可能なガラスコーティング
JPH06102558B2 (ja) 色ガラス板
CN205874220U (zh) 蓝色阳光控制镀膜玻璃
CN111172500B (zh) 一种pet镀膜方法、镀膜pet
US20120263885A1 (en) Method for the manufacture of a reflective layer system for back surface mirrors
JP2007310335A (ja) 表面鏡
CN205258316U (zh) 一种海洋蓝双银低辐射镀膜玻璃
CN116732481A (zh) 一种添加硬质Ta-C膜层的NCVM颜色装饰膜及其镀制方法
JPH1096801A (ja) 光吸収性反射防止体およびその製造方法
CN111807716B (zh) 金色三银低辐射镀膜玻璃及其制备方法
CN201817408U (zh) 可异地加工的低辐射玻璃
CN107479116A (zh) 一种双面低反射铬膜系及其制备方法
JP2019066600A (ja) プラスチックレンズ及びその製造方法
CN106477915A (zh) 可钢化低辐射镀膜玻璃及其制造方法
CN109052989B (zh) 茶色基片效果的低辐射镀膜玻璃及其制备方法
CN112853269B (zh) 一种黑色片材及其制备方法和应用
JP4660881B2 (ja) 着色ガラスおよびその製造方法
JPH0460061B2 (zh)
JPH05221689A (ja) 熱線遮蔽ガラス
JP6525497B2 (ja) 多層膜構造体の製造方法、及び多層膜構造体

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant