CN111094256A - 化合物、潜在性紫外线吸收剂、组合物、固化物及固化物的制造方法 - Google Patents

化合物、潜在性紫外线吸收剂、组合物、固化物及固化物的制造方法 Download PDF

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Publication number
CN111094256A
CN111094256A CN201880046837.6A CN201880046837A CN111094256A CN 111094256 A CN111094256 A CN 111094256A CN 201880046837 A CN201880046837 A CN 201880046837A CN 111094256 A CN111094256 A CN 111094256A
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CN
China
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group
carbon atoms
compound
composition
integer
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Pending
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CN201880046837.6A
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English (en)
Chinese (zh)
Inventor
金原有希子
冈田光裕
中屋敷哲千
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Adeka Corp
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Adeka Corp
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Application filed by Adeka Corp filed Critical Adeka Corp
Publication of CN111094256A publication Critical patent/CN111094256A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN201880046837.6A 2017-10-05 2018-10-02 化合物、潜在性紫外线吸收剂、组合物、固化物及固化物的制造方法 Pending CN111094256A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017195515 2017-10-05
JP2017-195515 2017-10-05
PCT/JP2018/036958 WO2019069960A1 (fr) 2017-10-05 2018-10-02 Composé, absorbeur latent de lumière ultraviolette, composition, produit durci, et procédé de production de produit durci

Publications (1)

Publication Number Publication Date
CN111094256A true CN111094256A (zh) 2020-05-01

Family

ID=65994733

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880046837.6A Pending CN111094256A (zh) 2017-10-05 2018-10-02 化合物、潜在性紫外线吸收剂、组合物、固化物及固化物的制造方法

Country Status (5)

Country Link
JP (1) JP7393205B2 (fr)
KR (1) KR20200064029A (fr)
CN (1) CN111094256A (fr)
TW (2) TW201922717A (fr)
WO (1) WO2019069960A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115835907A (zh) 2020-05-22 2023-03-21 安力高医药股份有限公司 用于靶向pd-l1的方法和组合物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07191462A (ja) * 1993-02-05 1995-07-28 Fuji Photo Film Co Ltd 感光性樹脂組成物及び画像形成方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5837314B2 (ja) * 1975-07-16 1983-08-15 イデミツコウサン カブシキガイシヤ ベンゾトリアゾ−ルカゴウブツノ セイゾウホウホウ
US4321396A (en) * 1980-01-17 1982-03-23 Gaf Corporation Copolymerizable, ultraviolet light absorber allyloxy-2-(2H-benzotriazol-2-yl)-4-alkylbenzenes
EP0180548B1 (fr) * 1984-11-01 1989-06-28 Ciba-Geigy Ag Revêtements stabilisés contre l'action de la lumière
US4728599A (en) * 1985-12-02 1988-03-01 Eastman Kodak Company Sterically hindered phenolic ester photographic coupler dispersion addenda and photographic elements employing same
JPH06191155A (ja) * 1992-12-25 1994-07-12 Fuji Photo Film Co Ltd 記録材料
EP0711804A3 (fr) * 1994-11-14 1999-09-22 Ciba SC Holding AG Stabilisateurs à la lumière latents
JP3512911B2 (ja) * 1995-07-11 2004-03-31 富士写真フイルム株式会社 紫外線吸収剤前駆体化合物、それを含有する感光性樹脂組成物及び画像形成方法
US6274677B1 (en) * 1997-03-31 2001-08-14 Daikin Industries Ltd. Process for the producing perfluorovinyl ethersulfonic acid derivatives and copolymer of the same
IT1301973B1 (it) * 1998-07-31 2000-07-20 Ausimont Spa Idro-fluoroalchilvinileteri e procedimento per il loro ottenimento
JP3590345B2 (ja) * 2000-11-27 2004-11-17 三井化学株式会社 光記録媒体
CN100528847C (zh) * 2002-03-12 2009-08-19 西巴特殊化学品控股有限公司 含有羟基苯基三嗪化合物的紫外吸收剂组合物
JP2004018454A (ja) * 2002-06-14 2004-01-22 Daikin Ind Ltd 含フッ素フルオロスルフォニルアルキルビニルエーテル製造方法
JP2006008953A (ja) * 2004-06-29 2006-01-12 Fuji Photo Film Co Ltd 保護用塗料組成物及び塗装物品
EP1945705B1 (fr) * 2005-11-09 2011-10-19 Basf Se Systemes photolatents
JP2011048382A (ja) 2010-10-01 2011-03-10 Kodak Japan Ltd 感光性組成物、感光性平版印刷版および平版印刷版の作成方法
JP6049521B2 (ja) 2013-03-29 2016-12-21 富士フイルム株式会社 感光性樹脂組成物、硬化膜、画像形成方法、固体撮像素子、カラーフィルタおよび紫外線吸収剤
JP2015108649A (ja) 2013-12-03 2015-06-11 凸版印刷株式会社 青色感光性組成物およびカラーフィルタ基板

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07191462A (ja) * 1993-02-05 1995-07-28 Fuji Photo Film Co Ltd 感光性樹脂組成物及び画像形成方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
肥田敬治等: "紫外線硬化を阻害しない新規な紫外線吸収剤の紫外線硬化塗料への応用" *

Also Published As

Publication number Publication date
TW201922717A (zh) 2019-06-16
TW202325698A (zh) 2023-07-01
KR20200064029A (ko) 2020-06-05
JPWO2019069960A1 (ja) 2020-09-10
WO2019069960A1 (fr) 2019-04-11
JP7393205B2 (ja) 2023-12-06

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