CN111033890B - 封装上天线布置 - Google Patents

封装上天线布置 Download PDF

Info

Publication number
CN111033890B
CN111033890B CN201880054203.5A CN201880054203A CN111033890B CN 111033890 B CN111033890 B CN 111033890B CN 201880054203 A CN201880054203 A CN 201880054203A CN 111033890 B CN111033890 B CN 111033890B
Authority
CN
China
Prior art keywords
package
antenna
trace
insert
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201880054203.5A
Other languages
English (en)
Other versions
CN111033890A (zh
Inventor
J·B·拉西特
R·V·夏诺伊
D·W·小基德韦尔
M·A·塔索德基
M·F·维纶茨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qualcomm Inc
Original Assignee
Qualcomm Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qualcomm Inc filed Critical Qualcomm Inc
Publication of CN111033890A publication Critical patent/CN111033890A/zh
Application granted granted Critical
Publication of CN111033890B publication Critical patent/CN111033890B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4853Connection or disconnection of other leads to or from a metallisation, e.g. pins, wires, bumps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4857Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/565Moulds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/568Temporary substrate used as encapsulation process aid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3114Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49827Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49833Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers the chip support structure consisting of a plurality of insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5383Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5386Geometry or layout of the interconnection structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5389Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/19Manufacturing methods of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/20Structure, shape, material or disposition of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/10Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L25/105Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being of a type provided for in group H01L27/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/16Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/50Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00Details of, or arrangements associated with, antennas
    • H01Q1/12Supports; Mounting means
    • H01Q1/22Supports; Mounting means by structural association with other equipment or articles
    • H01Q1/2283Supports; Mounting means by structural association with other equipment or articles mounted in or on the surface of a semiconductor substrate as a chip-type antenna or integrated with other components into an IC package
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q9/00Electrically-short antennas having dimensions not more than twice the operating wavelength and consisting of conductive active radiating elements
    • H01Q9/04Resonant antennas
    • H01Q9/0407Substantially flat resonant element parallel to ground plane, e.g. patch antenna
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68345Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self supporting substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68359Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during manufacture of interconnect decals or build up layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6605High-frequency electrical connections
    • H01L2223/6616Vertical connections, e.g. vias
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6661High-frequency adaptations for passive devices
    • H01L2223/6677High-frequency adaptations for passive devices for antenna, e.g. antenna included within housing of semiconductor device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04105Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/12105Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/20Structure, shape, material or disposition of high density interconnect preforms
    • H01L2224/21Structure, shape, material or disposition of high density interconnect preforms of an individual HDI interconnect
    • H01L2224/214Connecting portions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/10All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/1011All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
    • H01L2225/1017All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support
    • H01L2225/1035All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support the device being entirely enclosed by the support, e.g. high-density interconnect [HDI]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/10All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/1011All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
    • H01L2225/1047Details of electrical connections between containers
    • H01L2225/1058Bump or bump-like electrical connections, e.g. balls, pillars, posts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10253Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18162Exposing the passive side of the semiconductor or solid-state body of a chip with build-up interconnect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q21/00Antenna arrays or systems
    • H01Q21/28Combinations of substantially independent non-interacting antenna units or systems

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Geometry (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Details Of Aerials (AREA)

Abstract

公开了一种封装和相关方法。该封装可包括天线、由低损耗材料制成的插入件、以及模制件,其中该模制件直接接触并包围该插入件的至少一部分,其中该天线由至少部分地安置在该插入件的表面上的导电材料形成。

Description

封装上天线布置
引言
本公开的各方面一般涉及无线通信设备,并且尤其涉及封装上天线(antenna-on-package,AOP)布置等。
无线通信系统被广泛部署以提供诸如语音、数据、多媒体等各种类型的通信内容。典型的无线通信系统是能够通过共享可用系统资源(例如,带宽、发射功率等)来支持与多个用户的通信的多址系统。此类多址系统的示例包括码分多址(CDMA)系统、时分多址(TDMA)系统、频分多址(FDMA)系统、正交频分多址(OFDMA)系统、以及其他系统。这些系统往往遵照诸如由第三代伙伴项目(3GPP)提供的长期演进(LTE)、由第三代伙伴项目2(3GPP2)提供的超移动宽带(UMB)和演进数据优化(EV-DO)、由电气电子工程师协会(IEEE)提供的802.11等规范来部署。
无线通信设备包括天线和一个或多个集成电路。这些组件可以按数种不同方式(例如,封装内天线(antenna-in-package,AIP)、封装上天线(antenna-on-package,AOP)、片上天线(antenna-on-chip,AOC)等)来布置。
在常规的AOP布置中,电信号行进通过一条或多条迹线和/或一个或多个贯通孔(例如,穿模通孔(through-mold via,TMV)、穿板通孔(through-substrate via,TSV)、穿封装通孔(through-package via,TPV)、穿插入件通孔(through-insert via,TIV)等)。这些迹线和通孔可以由导电材料制成,并且还可以与介电材料接触和/或被介电材料至少部分地包围。常规的介电材料(诸如硅或模制化合物)导致介电损耗,这意味着它们遭受电流漏泄、杂散电容等。相应地,有损材料可能会妨碍常规AOP布置的性能,尤其是在高频应用中。相应地,需要新材料和/或新材料布置。
概述
以下概述是仅为了帮助描述本公开的各个方面而提供的综览,并且仅被提供用于解说这些方面而非对其进行限制。
在一个示例中,公开了一种集成封装。例如,该封装可包括天线、由低损耗材料制成的插入件、以及模制件,其中该模制件直接接触并包围该插入件的至少一部分,其中该天线由至少部分安置在该插入件的表面上的导电材料形成。
在另一示例中,公开了一种方法。例如,该方法可包括:提供由低损耗材料制成的插入件;提供模制件,以使得该模制件直接接触并包围该插入件的至少一部分;以及在该插入件的至少一表面上安置导电材料,其中该导电材料形成天线。
在又一示例中,公开了另一种封装。例如,该封装可包括:用于发射和接收电磁辐射的装置、用于减小介电损耗的装置和用于将导电材料绝缘的装置,其中该用于将导电材料绝缘的装置直接接触并包围该用于减小介电损耗的装置的至少一部分,其中用于发射和接收电磁辐射的装置被至少部分地安置在该用于减小介电损耗的装置的表面上。
附图简述
呈现附图以帮助描述本公开的各个方面,并且提供这些附图仅仅是为了解说这些方面而非对其进行限制。
图1一般地解说了常规的AOP布置。
图2一般地解说了根据本公开的各方面的AOP布置。
图3一般地解说了根据本公开的各方面的另一AOP布置。
图4一般地解说了根据本公开的各方面的又一AOP布置。
图5一般地解说了根据本公开的各方面的又一AOP布置。
图6一般地解说了根据本公开的各方面的又一AOP布置。
图7一般地解说了根据本公开的各方面的包括透镜的又一AOP布置。
图8A一般地解说了处于第一制造阶段的扇出面板封装。
图8B一般地解说了处于第二制造阶段的扇出面板封装。
图8C一般地解说了处于第三制造阶段的扇出面板封装。
图8D一般地解说了处于第四制造阶段的扇出面板封装。
图8E一般地解说了处于第五制造阶段的扇出面板封装。
图8F一般地解说了处于第六制造阶段的扇出面板封装。
图8G一般地解说了处于第七制造阶段的扇出面板封装。
图9一般地解说了处于后续制造阶段的图8G的扇出面板封装。
图10A一般地解说了处于替换的后续制造阶段的图8G的扇出面板封装。
图10B一般地解说了处于后续制造阶段的图10A的扇出面板封装。
图11A一般地解说了处于第一制造阶段的天线封装。
图11B一般地解说了处于第二制造阶段的天线封装。
图11C一般地解说了处于第三制造阶段的天线封装。
图11D一般地解说了处于第四制造阶段的天线封装。
图12A一般地解说了处于第一制造阶段的天线封装。
图12B一般地解说了处于第二制造阶段的天线封装。
图12C一般地解说了处于第三制造阶段的天线封装。
图12D一般地解说了处于第四制造阶段的天线封装。
图12E一般地解说了处于第五制造阶段的天线封装。
图12F一般地解说了处于第六制造阶段的天线封装。
图12G一般地解说了处于第七制造阶段的天线封装。
图12H一般地解说了处于第八制造阶段的天线封装。
图12I一般地解说了处于第九制造阶段的天线封装。
图12J一般地解说了处于第十制造阶段的天线封装。
图13一般地解说了根据本公开的各方面的用于制造AOP封装的方法。
图14一般地解说了根据本公开的各方面的又一AOP布置。
详细描述
根据本公开的各方面,使用新材料和/或新材料布置来减少介电损耗并改善AOP布置的操作。具体而言,低损耗材料(LLM)(诸如玻璃和/或合成石英)被纳入到AOP布置中。LLM可能比有损材料(如硅或模制化合物)更昂贵。结果,换出有损材料并替换为LLM可能会改善AOP布置,但也可能会增加制造成本。
根据本公开的各方面,LLM被策略性地置于AOP封装内的位置,尤其是成本效益最大的位置。结果,可以按具有成本效益的方式改善AOP布置的性能,尤其是在高频应用中。
图1一般地解说了常规AOP布置100。常规AOP布置100可以安装在具有一个或多个电路板触点112的电路板110上。常规AOP布置100进一步包括其中具有第一迹线132的第一绝缘层130。电路板触点112可以连接到电路板110和/或第一迹线132两者和/或与它们物理接触。第一迹线132可以至少部分地嵌入在第一绝缘层130中,并且可以水平地和/或垂直地延伸穿过第一绝缘层130。
常规AOP布置100进一步包括具有集成电路152的模制层150。集成电路152可以经由第一迹线132和电路板触点112耦合到电路板110。集成电路152可被进一步连接到贯通孔174(例如,穿模通孔)。贯通孔174可以垂直延伸穿过模制层150,并且可以被配置成将第一迹线132耦合到第二绝缘层170。贯通孔174的垂直延伸可以行进穿过模制层150并终止于嵌入在第二绝缘层170中的第二迹线172。第二迹线172可以至少部分地嵌入在第二绝缘层170中,并且可以水平地和/或垂直地延伸贯穿第二绝缘层170。
第二绝缘层170可以经由一个或多个天线封装触点192被耦合到天线封装190。第一迹线132、第二迹线172和贯通孔174可被布置成使得天线封装190能与集成电路152通信,并且使得常规AOP布置100能与电路板110通信。
在常规AOP布置100中,电信号行进穿过贯通孔174(其可以由导电材料制成),并穿过天线封装190中的天线。贯通孔174和/或天线可以与例如硅或模制化合物接触并被其至少部分地包围。硅和模制化合物可能会展现出介电损耗,这意味着它们遭受电流漏泄和/或杂散电容。相应地,有损材料可能会妨碍常规AOP布置100的性能,尤其是在高频应用中。
图2–7一般地解说了不同的AOP布置,所有这些布置都纳入了LLM(例如,玻璃、合成石英、有机层压板、陶瓷和/或任何其他低损耗材料)。在一些实现中,LLM是经历低于特定阈值的欧姆损耗的材料。欧姆损耗可归因于损耗角正切(loss tangent)。相应地,在10GHz下损耗角正切小于例如0.004的材料可以被认为是LLM。附加地或替换地,在10GHz下介电常数小于例如3.5的材料可以被认为是LLM。介电常数具有负载效应,这会导致材料边界处的反射场景中的失配,但并不会促进天线损耗。LLM可被策略性地置于AOP封装内的位置,尤其是成本效益最高的位置(例如,与通孔、迹线和/或其他元件(例如,天线)毗邻的位置)。LLM插入件的策略性放置可涉及仅底部封装(如图2所示)、底部封装和顶部封装两者(如图3所示)、或仅顶部封装(如图4所示)。
图2一般地解说了根据本公开的各方面的AOP布置200。AOP布置200可以安装在具有一个或多个AOP触点202和管芯212的扇出面板封装210上。扇出面板封装210可包括重分布层220和模制层230。重分布层220可包括耦合到该一个或多个AOP触点202的重分布迹线222。重分布迹线222可以垂直地延伸穿过重分布层220和/或在重分布层220内(例如,在重分布层220的各子层之间)水平延伸。重分布迹线222可以进一步耦合到管芯212和贯通孔232,该贯通孔232在天线封装250的方向上延伸穿过模制层230中的LLM插入件234。LLM插入件234可以接触和/或包围贯通孔232或其一部分,并且可以被配置成减小介电损耗。在一些实现中,LLM插入件234基本上包围贯通孔232。
图2中所描绘的LLM插入件234被策略性地放置,以按成本高效方式减小介电损耗。如上所述,用LLM材料构造整个模制层230可能不是具有成本效益的。然而,通过纳入LLM插入件234,由电流流过贯通孔232的移动所导致的介电损耗可被显著减小。模制层230的其他部分(例如,不邻近贯通孔232的那些部分)可以使用不那么昂贵的材料(例如,硅和/或模制化合物)来制造。天线封装250可包括一个或多个天线封装触点252,其将天线封装250耦合到扇出面板封装210和/或贯通孔232的顶侧。天线封装250可包括天线封装底层260、天线封装基板270和天线封装顶层280。天线封装底层260可包括天线底部迹线262,并且天线封装顶层280可包括天线顶部迹线282。天线底部迹线262和天线顶部迹线282可以通过天线封装基板270内的贯通孔272(例如,穿封装通孔)彼此耦合。天线底部迹线262和/或天线顶部迹线282可被配置成联合或单独地发射和/或接收电磁辐射。天线底部迹线262和/或天线顶部迹线282可被形成为贴片天线,例如,安装在接地面上并提供在平坦表面上的低剖面矩形天线。
图3一般地解说了根据本公开的各方面的AOP封装300。AOP封装300可以安装在具有一个或多个AOP触点302和管芯312的扇出面板封装310上。扇出面板封装310可包括模制层320和具有重分布迹线332的重分布层320。模制层320可包括与LLM插入件324接触和/或被LLM插入件324包围的贯通孔322。贯通孔322可以耦合到AOP触点302和重分布迹线332。不同于图2中所描绘的AOP布置200(其中模制层230被安置在扇出面板封装210之上,图3中所描绘的AOP封装300可包括被安置在扇出面板封装310底部上的模制层320。重分布迹线332可以耦合到管芯312和/或一个或多个天线封装触点352。
扇出面板封装310可以经由该一个或多个天线封装触点352来与天线封装350通信。天线封装350可包括天线封装底层360、天线封装基板370和天线封装顶层380。天线封装底层360可包括天线底部迹线362,并且天线封装顶层380可包括天线顶部迹线382。天线封装基板370可包括将天线底部迹线362和天线顶部迹线382彼此耦合的贯通孔372。天线底部迹线362和/或天线顶部迹线382可被配置成联合或单独地发射和/或接收电磁辐射。天线底部迹线362和/或天线顶部迹线382可被形成为贴片天线。
天线封装基板370还可包括一个或多个LLM插入件374。LLM插入件374可以被提供在天线封装基板370内,以使得其与由天线底部迹线362和/或天线顶部迹线382所形成的天线的至少一部分相接触。结果,由电流流过天线底部迹线362和天线顶部迹线382的移动所导致的介电损耗可被减小。
图4一般地解说了根据本公开的各方面的AOP封装400。AOP封装400的顶部封装与AOP封装300的顶部封装相似。具体而言,天线封装450类似于天线封装350,天线封装触点452类似于天线封装触点352,天线封装底层460、天线封装基板470和天线封装顶层480分别类似于天线封装底层360、天线封装基板370和天线封装顶层380,并且天线底部迹线462、天线顶部迹线482、贯通孔472和LLM插入件474分别类似于天线底部迹线362、天线顶部迹线382、贯通孔372和LLM插入件374。
AOP封装400的底部封装(扇出面板封装410)在某些方面可以与图2中所描绘的扇出面板封装210相似。具体而言,AOP触点402类似于AOP触点202,管芯412类似于管芯212,重分布层420和模制层430分别类似于重分布层220和模制层230,并且重分布迹线422和贯通孔432分别类似于重分布迹线222和贯通孔232。然而,与AOP布置200的底部封装不同,AOP封装400进一步包括扇出面板封装顶层440,该扇出面板封装顶层440包括贯通孔432通过其耦合到天线封装触点452的迹线442。此外,模制层430并不包括类似于LLM插入件234的LLM插入件。
图5一般地解说了根据本公开的各方面的另一AOP封装500。AOP封装500可包括扇出面板封装510。扇出面板封装510在某些方面可以与图2中所描绘的扇出面板封装210相似。具体而言,扇出面板封装510可包括:一个或多个AOP触点502,其类似于AOP触点202;管芯512,其类似于管芯212;重分布层520和重分布迹线522,其分别类似于重分布层220和重分布迹线222;模制层530,其类似于模制层230;以及贯通孔532和LLM插入件534,其分别类似于贯通孔232和LLM插入件234。AOP封装500可进一步包括包含迹线542的扇出面板封装顶层540,其在某些方面类似于图4中所描绘的包含迹线442的扇出面板封装顶层440。AOP封装500可进一步包括天线封装550。
图2–4中所描绘的天线封装250、天线封装350和/或天线封装450可以根据印刷电路板(PCB)工艺来制造,如将在下面参考图11A–11D更详细地讨论的。作为对比,图5中所描绘的天线封装550可以根据嵌入式晶片级球栅阵列(eWLB)工艺来制造,如将在下面关于图12A–12J更详细地讨论的。
像天线封装350和天线封装450一样,图5中所描绘的天线封装550可以纳入LLM。具体而言,天线封装550可包括一个或多个天线封装触点552、天线封装底层560、天线封装基板570和天线封装顶层580。天线封装底层560可具有一个或多个子层,并且可包括垂直延伸穿过天线封装底层560和/或在这些子层之一上水平延伸的天线底部迹线562。天线封装基板570可包括贯通孔572和LLM插入件574。贯通孔572可以延伸穿过LLM插入件574,由此减小损耗。天线底部迹线562和/或天线顶部迹线582可被配置成联合或单独地发射和/或接收电磁辐射。天线底部迹线562和/或天线顶部迹线582可被形成为贴片天线。天线底部迹线562和/或天线顶部迹线582的至少一部分可被安置在LLM插入件574上,由此减小损耗。然而,天线封装基板570可在非策略性区域中包括模制化合物或其他有损材料。
图6一般地解说了根据本公开的各方面的又一AOP封装600。AOP封装600的底部封装(扇出面板封装610)在某些方面可以与图2中所描绘的扇出面板封装210相似。具体而言,AOP触点602类似于AOP触点202,管芯612类似于管芯212,重分布层620和具有LLM插入件634的模制层630分别类似于重分布层220和具有LLM插入件234的模制层230,并且重分布迹线622和贯通孔632分别类似于重分布迹线222和贯通孔232。
图6中所描绘的扇出面板封装610的大小可以不同于图2中所描绘的扇出面板封装210的大小。具体而言,扇出面板封装610可具有比扇出面板封装210更小的占用面积。如从图6将理解的,减小天线封装650的占用面积或许是不可能的。然而,因为AOP封装600以封装上天线布置提供,所以扇出面板封装610和天线封装650不需要是相同的大小。结果,AOP封装600可具有全尺寸的天线封装650,但可以根据扇出面板封装610的较小占用面积而耦合到例如印刷电路板。AOP封装600的顶部封装(天线封装650)在某些方面可以与图4中所描绘的天线封装450相似。具体而言,天线封装触点652可类似于天线封装触点452,天线封装底层660、天线封装基板670和天线封装顶层680可分别类似于天线封装底层460、天线封装基板470和天线封装顶层480,天线底部迹线662和天线顶部迹线682可分别类似于天线底部迹线462和天线顶部迹线482,并且贯通孔672和LLM插入件674可类似于贯通孔472和LLM插入件474。
图7一般地解说了根据本公开的各方面的具有透镜790的又一AOP封装700。AOP封装700的底部封装(扇出面板封装710)在某些方面可以与图6中所描绘的扇出面板封装610相似。具体而言,AOP触点702类似于AOP触点602,管芯712类似于管芯612,重分布层720和具有LLM插入件734的模制层630分别类似于重分布层620和具有LLM插入件634的模制层630,并且重分布迹线722和贯通孔732分别类似于重分布迹线622和贯通孔632。
AOP封装700的顶部封装(天线封装750)在某些方面可以与图6中所描绘的天线封装650相似。具体而言,天线封装触点752可类似于天线封装触点652,天线封装底层760、天线封装基板770和天线封装顶层780可分别类似于天线封装底层660、天线封装基板670和天线封装顶层680,天线底部迹线762和天线顶部迹线782可分别类似于天线底部迹线662和天线顶部迹线682,并且贯通孔772和LLM插入件774可类似于贯通孔672和LLM插入件674。透镜790可被配置成聚焦从天线封装650发射和/或由天线封装650接收的电磁辐射。
图8A–8G一般地解说了用于扇出面板封装810的若干阶段制造工艺的至少一部分。扇出面板封装810可以根据图9来进一步制造(从而导致与图2中所描绘的扇出面板封装210相似的扇出面板封装)。替换地,扇出面板封装810可以根据图10A–10B来进一步制造(从而导致与图4中所描绘的扇出面板封装410相似的扇出面板封装)。
图8A一般地解说了处于第一制造阶段的扇出面板封装810。在图8A中,管芯812、贯通孔832和LLM插入件834被安置在载体800上。
图8B一般地解说了处于第二制造阶段的扇出面板封装810。在图8B中,模制层830被安置在管芯812、贯通孔832和LLM插入件834顶部上方。在一些实现中,模制层830可以被向后抛光,以暴露贯通孔832的表面和/或管芯812的触点。在图8B中所描绘的阶段之后,模制层830的制造可以完成。已完成的模制层830可类似于图2中所描绘的模制层230和/或图4中所描绘的模制层430。
图8C一般地解说了处于第三制造阶段的扇出面板封装810。在图8C中,第一重分布层821(例如,包括层压板的介电层)被安置在模制层830上。可以使用光刻来在第一重分布层821中创建通道,然后可以用导电材料来填充这些通道。
图8D一般地解说了处于第四制造阶段的扇出面板封装810。在图8D中,第一重分布迹线822被安置在第一重分布层821上。第一重分布迹线822可以使用例如镀铜来形成。
图8E一般地解说了处于第五制造阶段的扇出面板封装810。在图8E中,第二重分布层823(例如,包括层压板的介电层)被安置在第一重分布层821和第一重分布迹线822上。可以使用光刻来在第二重分布层823中创建通道,然后可以用导电材料来填充这些通道。
图8F一般地解说了处于第六制造阶段的扇出面板封装810。在图8F中,第二重分布迹线824被安置在第二重分布层823上。第二重分布迹线824可以使用例如镀铜来形成。在图8F中所描绘的阶段之后,重分布层820的制造可以完成。已完成的重分布层820可类似于图2中所描绘的重分布层220和/或图4中所描绘的重分布层420。
图8G一般地解说了处于第七制造阶段的扇出面板封装810。在图8G中,扇出面板封装810被从载体800中移除。
图9一般地解说了处于进一步制造阶段的图8G的扇出面板封装810。如从图9将理解的,扇出面板封装810已在垂直方向上翻转,以使得模制层830在顶部,而重分布层820在底部。一个或多个AOP触点902已被安置在第二重分布迹线824上。此外,触点焊盘936被安置在贯通孔832、和/或LLM插入件834的至少一部分上。将理解,通过完成图8A-8G和图9中所描述的每个阶段,可以制造出类似于图2中所描绘的扇出面板封装210的扇出面板封装。
图10A–10B一般地解说了两个可用作图9的最终阶段的替换方案的阶段。具体而言,通过完成图8A-8G和图10A-10B中所描述的每个阶段,可以制造出类似于图4中所描绘的扇出面板封装410的扇出面板封装。
图10A一般地解说了处于后续制造阶段的图8G的AOP封装。在图10A中,扇出面板封装顶层1040被安置在模制层830上。可以使用光刻来在扇出面板封装顶层1040中创建通道,然后可以用导电材料来填充这些通道。
图10B一般地解说了处于后续制造阶段的图10A的AOP封装。在图10B中,在扇出面板封装顶层1040上安置了触点焊盘1041,并且在第二重分布迹线824上安置了AOP触点1002。
图11A一般地解说了处于第一制造阶段的天线封装。在图11A中,提供了天线封装基板1170。天线封装基板1170可包括贯通孔1172和LLM插入件1174。贯通孔1172和LLM插入件1174在垂直方向上穿过天线封装基板1170。贯通孔1172可通过以下方式来形成:在天线封装基板1170中钻孔;以及用导电材料来填充该孔。LLM插入件1174可通过以下方式来形成:提供天线封装基板1170;在天线封装基板1170中创建孔;以及随后将LLM插入件1174插入到或嵌入到该孔中。替换地,可提供并放置LLM插入件1174,并且可在LLM插入件1174周围提供天线封装基板1170。
图11B一般地解说了处于第二制造阶段的天线封装。在图11B中,天线封装底层1160和天线封装顶层1180被分别提供在天线封装基板1170的底部和顶部。天线封装底层1160可包括天线底部迹线1162,并且天线封装顶层1180可包括天线顶部迹线1182。天线底部迹线1162和天线顶部迹线1182可通过以下方式来形成:用铜或其他合适的导电材料来对天线封装基板1170的表面进行镀敷。可以在这些镀铜部分周围提供介电层。
图11C一般地解说了处于第三制造阶段的天线封装。在图11C中,介电层1163包括例如被添加到包括天线底部迹线1162的表面的层压板和/或围绕天线底部迹线1162的介电层。可将介电层1183添加到天线顶部迹线1182和/或围绕天线顶部迹线1182的介电层。此外,可将触点焊盘1164添加到天线封装底层1160。触点焊盘1164可在垂直方向上穿过图11C中所描绘的层压板层,并且可将天线底部迹线1162耦合到天线封装1150的外表面。
图11D一般地解说了处于第四制造阶段的天线封装。在图11D中,在触点焊盘1164上放置了天线封装触点1152。
图11A–11C中所描绘的制造工艺可被用于制造图3中所描绘的天线封装350、图4中所描绘的天线封装450和/或图6中所描绘的天线封装650。图11A–11C中所描绘的制造工艺可被用于通过略去LLM插入件1174来制造图2中所描绘的天线封装250。
图12A一般地解说了处于第一制造阶段的天线封装。在图12A中,提供了第一载体1201,并且在第一载体1201上放置了贯通孔1272(例如,穿插入件通孔)和LLM插入件1274。
图12B一般地解说了处于第二制造阶段的天线封装,其中完成了天线封装基板1270。在图12B中,在第一载体的未覆盖部分上提供了模制件1276。替换地,可在第一载体1201、贯通孔1272和LLM插入件1274上方提供模制件1276,并且随后可对模制件1276向后抛光,直至贯通孔1272和LLM插入件1274被暴露。贯通孔1272、LLM插入件1274和模制件1276可构成已完成的天线封装基板1270。
图12C一般地解说了处于第三制造阶段的天线封装。在图12C中,在天线封装基板1270的表面上(例如,在贯通孔1272、LLM插入件1274和/或模制件1276(或其相应部分)的表面上)安置了第一天线底部迹线1261。第一天线底部迹线1261可以使用例如镀铜来形成。
图12D一般地解说了处于第四制造阶段的天线封装。在图12D中,第一天线封装底部子层1262覆盖第一天线底部迹线1261以及天线封装基板1270的暴露部分。第一天线封装底部子层1262可通过以下方式来提供:用层压板或某种其他介电材料来涂敷第一天线底部迹线1261等。在第一天线封装底部子层1262上安置了第二天线底部迹线1263。第二天线底部迹线1263可以使用例如镀铜来形成。第一天线封装底部子层1262可包括使用例如光刻来形成的贯通孔。相应地,第二天线底部迹线1263可填充该通孔,以使得第二天线底部迹线1263耦合到第一天线底部迹线1261。
图12E一般地解说了处于第五制造阶段的天线封装。在图12E中,第二天线封装底部子层1264覆盖第二天线底部迹线1263以及天线封装基板第一天线封装底部子层1262的暴露部分。第二天线封装底部子层1264可通过以下方式来提供:用层压板或某种其他介电材料来涂敷第二天线底部迹线1263等。
图12F一般地解说了处于第六制造阶段的天线封装,其中完成了第一天线封装底层1260。在图12F中,在第二天线封装底部子层1264上安置了触点焊盘1265。触点焊盘1265可以使用例如镀铜来形成。第二天线封装底部子层1264可包括使用例如光刻来形成的贯通孔。相应地,触点焊盘1265可填充该通孔,以使得触点焊盘1265耦合到第二天线底部迹线1263。第一天线底部迹线1261、第一天线封装底部子层1262、第二天线底部迹线1263、第二天线封装底部子层1264和触点焊盘1265可构成已完成的第一天线封装底层1260。已完成的第一天线封装底层1260可从第一载体1201中被移除。尽管图12F中描绘了第一天线封装底层1260的两个子层,但是将理解,第一天线封装底层1260可包括任何数目的子层,例如,一个子层或者三个或更多个子层。
图12G一般地解说了处于第七制造阶段的天线封装。在图12G中,已将载体粘合层1202添加到第一天线封装底层1260。载体粘合层1202可具有平坦形状,以补足第二载体1203的平坦形状。天线封装基板1270、第一天线封装底层1260和载体粘合层1202可被翻转并被放置在第二载体1203上。
图12H一般地解说了处于第八制造阶段的天线封装。在图12H中,已在天线封装基板1270上提供了天线封装顶层1280。天线封装基板1270可包括天线顶部迹线1281和模制件1282。
图12I一般地解说了处于第九制造阶段的天线封装。在图12I中,第二载体1203被移除(例如,被融化或分解),这可将天线封装1250与载体粘合层1202分离。第一天线封装底层1260、天线封装基板1270和天线封装顶层1280可构成已完成的天线封装1250。
图12J一般地解说了处于第十制造阶段的天线封装。在图12J中,在触点焊盘1265上提供了天线封装触点1252。
图12A–12J中所描绘的制造工艺可被用于制造例如图5中所描绘的天线封装550。
图13一般地解说了根据本公开的各方面的用于制造封装的方法1300。在1310,方法1300提供由低损耗材料制成的插入件。在一些实现中,低损耗材料包括以下一者或多者:玻璃、合成石英、有机层压板、以及陶瓷。
在1320,方法1300提供模制件,以使得该模制件直接接触并包围该插入件的至少一部分。在一些实现中,模制件的提供包括:提供模制件,以使得该模制件接触插入件并且包围该插入件的周界。在一些实现中,模制件包括模制化合物。在1330,方法1300可任选地创建穿过该插入件和/或该模制件的贯通孔。
在1340,方法1300在该插入件的至少一表面上安置(例如,沉积)导电材料,其中该导电材料形成天线。在一些实现中,该天线是贴片天线。在一些实现中,导电材料的安置包括至少部分地在该插入件的底表面上安置天线底部迹线和/或至少部分地在该插入件的顶表面上安置天线顶部迹线。在一些实现中,该天线、该插入件和该模制件构成顶部封装。
在1350,方法1300可任选地通过用导电材料填充该贯通孔来将这些天线底部迹线耦合到这些天线顶部迹线。在1360,方法1300可任选地提供底部封装。在一些实现中,提供底部封装包括:在底部封装中提供管芯;以及用贯通孔将顶部封装耦合到该管芯。在一些实现中,提供底部封装进一步包括:提供底部封装,以使得该贯通孔与由低损耗材料制成的第二插入件接触。
在1370,方法1300可任选地通过用触点将该顶部封装耦合到该底部封装来提供封装。
图14一般地解说了根据本公开的各方面的AOP封装1400。AOP封装1400的顶部封装类似于AOP封装300的顶部封装。具体而言,天线封装1450类似于天线封装350,天线封装底层1460、天线封装基板1470和天线封装顶层1480分别类似于天线封装底层360、天线封装基板370和天线封装顶层380,并且天线底部迹线1462、天线顶部迹线1482、贯通孔1472和LLM插入件1474分别类似于天线底部迹线362、天线顶部迹线382、贯通孔372和LLM插入件374。然而,与AOP布置300的顶部封装(其具有触点352)不同,AOP布置1400包括天线封装重分布层触点1452。
AOP封装1400的底部封装(扇出面板封装1410)在某些方面可以与图3中所描绘的扇出面板封装310相似。具体而言,AOP触点1402类似于AOP触点302,管芯1412类似于管芯312,重分布层1420和模制层1430分别类似于重分布层320和模制层330,并且重分布迹线1422和贯通孔1432分别类似于重分布迹线322和贯通孔332。
上面所阐述的元件可被配置成执行特定功能,并且可同样地构成用于执行那些特定功能的装置。例如,天线封装250、天线封装350、天线封装450、天线封装550、天线封装650和/或天线封装750可构成用于发射和接收电磁辐射的装置。替换地,天线底部迹线262、天线顶部迹线282、天线底部迹线362、天线顶部迹线382、天线底部迹线462、天线顶部迹线482、天线底部迹线562、天线顶部迹线582、天线底部迹线662和/或天线顶部迹线682可构成用于发射和接收电磁辐射的装置。
此外,LLM插入件234、LLM插入件374、LLM插入件474、LLM插入件534、LLM插入件574、LLM插入件634和/或LLM插入件674可构成用于减小介电损耗的装置。天线封装基板270、天线封装基板370、天线封装基板470、天线封装基板570和/或天线封装基板670可构成用于将导电材料绝缘的装置。对于给定电流和/或频率,用于将导电材料绝缘的装置可能遭受第一介电损耗量,而对于该给定电流和/或频率,用于减小介电损耗的装置可能遭受比第一介电损耗量小的第二介电损耗量。贯通孔232、贯通孔272、贯通孔322、贯通孔372、贯通孔432、贯通孔472、贯通孔532、贯通孔572、贯通孔632和/或贯通孔672可构成用于穿过的装置,例如,用于减小介电损耗的装置和/或用于将导电材料绝缘的装置。天线封装触点252、天线封装触点352、天线封装触点452、天线封装触点552和/或天线封装触点652可构成用于将顶部封装耦合到底部封装的装置。管芯212、管芯312、管芯412、管芯512和/或管芯612可构成用于处理的装置。
本文中所使用的术语仅出于描述特定实施例的目的,而非旨在限定本文中所公开的任何实施例。如本文中所使用的,单数形式的“一”、“一个”和“该”旨在也包括复数形式,除非上下文另有明确指示并非如此。还将进一步理解,术语“包括”、“具有”、“包含”和/或“含有”在本文中使用时指定所陈述的特征、整数、步骤、操作、要素、和/或组件的存在,但并不排除一个或多个其他特征、整数、步骤、操作、要素、组件和/或其群组的存在或添加。类似地,如本文中使用的短语“基于”不一定排除其他因素的影响,并且应当在所有情形中被解释为“至少部分地基于”,而不是例如“仅基于”。将理解,诸如“顶部”和“底部”、“左侧”和“右侧”、“垂直”和“水平”等的术语相对于彼此被严格使用的相对术语,而不表达或暗示关于重力方向、用于制造本文所述的组件的制造设备、或本文所述的组件被耦合、安装或以其他方式附连至的某个其他设备的任何关系。术语“耦合”可指代物理耦合(即,两个元件之间的直接接触)和/或电耦合(即,经由导电迹线或其他导电元件来耦合)。应当理解,本文中使用诸如“第一”、“第二”等指定对元素的任何引述一般不限定这些元素的数量或次序。确切而言,这些指定可在本文中用作区别两个或更多个元素或者元素实例的便捷方法。由此,对第一元素和第二元素的引述并不暗示只存在两个元素,并且未进一步暗示第一元素必须以某种方式位于第二元素之前。同样,除非另外声明,否则一组元素可包括一个或多个元素。另外,在说明书或权利要求中使用的“A、B、或C中的至少一个”或“A、B、或C中的一个或多个”或“包括A、B、和C的群组中的至少一个”形式的术语表示“A或B或C或这些元素的任何组合”。尽管前面的公开示出了各种解说性方面,但是应当注意,可对所解说的示例作出各种改变和修改而不会脱离如所附权利要求定义的范围。本公开无意被仅限定于具体解说的示例。例如,除非另有说明,否则根据本文中所描述的本公开的各方面的方法权利要求中的功能、步骤和/或动作无需以任何特定次序执行。此外,尽管某些方面可能是以单数来描述或主张权利的,但是复数也是已构想了的,除非显式地声明了限定于单数。

Claims (30)

1.一种集成封装,所述封装包括:
天线,包括天线底部迹线和天线顶部迹线以及贯通孔;
两个或更多个由低损耗材料制成的插入件,其中所述插入件的至少部分被置为与所述天线底部迹线、所述天线顶部迹线以及所述贯通孔的至少一部分接触,并且其中每个插入件被放置成如下至少一者:与所述天线顶部迹线和所述天线底部迹线两者接触、或者既围绕所述贯通孔的至少一部分又与所述天线顶部迹线和所述天线底部迹线中的至少一者接触;以及
模制件,其中所述模制件直接接触并包围所述两个或更多个插入件中的每一者的至少一部分并填充所述两个或更多个插入件之间的空间;
其中所述天线由至少部分地安置在所述插入件的表面上的导电材料形成。
2.如权利要求1所述的封装,其特征在于,所述天线是贴片天线。
3.如权利要求1所述的封装,其特征在于,所述天线包括至少部分地安置在所述插入件的底表面上的天线底部迹线和/或至少部分地安置在所述插入件的顶表面上的天线顶部迹线。
4.如权利要求3所述的封装,其特征在于,进一步包括:贯通孔,其穿过所述插入件和/或所述模制件并且将所述天线底部迹线耦合到所述天线顶部迹线。
5.如权利要求1所述的封装,其特征在于,所述低损耗材料包括以下一者或多者:
玻璃;
合成石英;
有机层压板;和/或
陶瓷。
6.如权利要求1所述的封装,其特征在于,所述模制件接触所述插入件并且包围所述插入件的周界。
7.如权利要求1所述的封装,其特征在于,所述模制件包括模制化合物。
8.如权利要求1所述的封装,其特征在于:
所述天线、所述插入件和所述模制件构成顶部封装;并且
所述封装进一步包括底部封装;
其中一个或多个触点将所述顶部封装耦合到所述底部封装。
9.如权利要求8所述的封装,其特征在于:
所述底部封装包括管芯;并且
所述顶部封装通过贯通孔耦合到所述管芯。
10.如权利要求9所述的封装,其特征在于:
所述贯通孔与由低损耗材料制成的第二插入件接触。
11.一种制造集成封装的方法,包括:
提供两个或更多个由低损耗材料制成的插入件;
在所述插入件的至少一表面上安置导电材料,其中所述导电材料形成天线,所述天线包括天线底部迹线和天线顶部迹线以及贯通孔,其中所述插入件的至少部分被置为与所述天线底部迹线、所述天线顶部迹线以及所述贯通孔的至少一部分接触,并且其中每个插入件被放置成如下至少一者:与所述天线顶部迹线和所述天线底部迹线两者接触、或者既围绕所述贯通孔的至少一部分又与所述天线顶部迹线和所述天线底部迹线中的至少一者接触,并且
提供模制件,以使得所述模制件直接接触并包围所述两个或更多个插入件中的每一者的至少一部分并填充所述两个或更多个插入件之间的空间。
12.如权利要求11所述的方法,其特征在于,所述天线是贴片天线。
13.如权利要求11所述的方法,其特征在于,所述导电材料的所述安置包括:至少部分地在所述插入件的底表面上安置天线底部迹线和/或至少部分地在所述插入件的顶表面上安置天线顶部迹线。
14.如权利要求13所述的方法,其特征在于,进一步包括:
创建穿过所述插入件和/或所述模制件的贯通孔;
通过用导电材料填充所述贯通孔来将所述天线底部迹线耦合到所述天线顶部迹线。
15.如权利要求11所述的方法,其特征在于,所述低损耗材料包括以下一者或多者:
玻璃;
合成石英;
有机层压板;和/或
陶瓷。
16.如权利要求11所述的方法,其特征在于,所述模制件的所述提供包括:提供所述模制件,以使得所述模制件接触所述插入件并且包围所述插入件的周界。
17.如权利要求11所述方法,其特征在于,所述模制件包括模制化合物。
18.如权利要求11所述的方法,其特征在于:
所述天线、所述插入件和所述模制件构成顶部封装;并且
所述方法进一步包括:
提供底部封装;以及
通过用触点将所述顶部封装耦合到所述底部封装来提供集成封装。
19.如权利要求18所述的方法,其特征在于,提供所述底部封装包括:
在所述底部封装中提供管芯;以及
用贯通孔将所述顶部封装耦合到所述管芯。
20.如权利要求19所述的方法,其特征在于,提供所述底部封装进一步包括:
提供所述底部封装,以使得所述贯通孔与由低损耗材料制成的第二插入件接触。
21.一种集成封装,所述封装包括:
用于发射和接收电磁辐射的装置,包括天线底部迹线和天线顶部迹线以及贯通孔;
两个或更多个用于减小介电损耗的装置,其中所述用于减小介电损耗的装置的至少部分被置为与所述天线底部迹线、所述天线顶部迹线以及所述贯通孔的至少一部分接触,并且其中每个插入件被放置成如下至少一者:与所述天线顶部迹线和所述天线底部迹线两者接触、或者既围绕所述贯通孔的至少一部分又与所述天线顶部迹线和所述天线底部迹线中的至少一者接触;以及
用于将导电材料绝缘的装置,其中所述用于将导电材料绝缘的装置直接接触并包围所述两个或更多个用于减小介电损耗的装置中的每一者的至少一部分并填充所述两个或更多个用于减小介电损耗的装置之间的空间;
其中所述用于发射和接收电磁辐射的装置被至少部分地安置在所述用于减小介电损耗的装置的表面上。
22.如权利要求21所述的封装,其特征在于,所述用于发射和接收电磁辐射的装置是贴片天线。
23.如权利要求21所述的封装,其特征在于,所述用于发射和接收电磁辐射的装置包括至少部分地安置在所述用于减小介电损耗的装置的底表面上的天线底部迹线和/或至少部分地安置在所述用于减小介电损耗的装置的顶表面上的天线顶部迹线。
24.如权利要求23所述的封装,其特征在于,进一步包括:用于穿过的装置,其穿过所述用于减小介电损耗的装置和/或所述用于将导电材料绝缘的装置并且将所述天线底部迹线耦合到所述天线顶部迹线。
25.如权利要求21所述的封装,其特征在于,所述用于减小介电损耗的装置包括以下一者或多者:
玻璃;
合成石英;
有机层压板;和/或
陶瓷。
26.如权利要求21所述的封装,其特征在于,所述用于将导电材料绝缘的装置接触所述用于减小介电损耗的装置并且包围所述用于减小介电损耗的装置的周界。
27.如权利要求21所述的封装,其特征在于,所述用于将导电材料绝缘的装置包括模制化合物。
28.如权利要求21所述的封装,其特征在于:
用于发射和接收电磁辐射的装置、用于减小介电损耗的装置和用于将导电材料绝缘的装置构成顶部封装;并且
所述封装进一步包括底部封装;
用于将所述顶部封装耦合到所述底部封装的装置。
29.如权利要求28所述的封装,其特征在于:
所述底部封装包括用于处理的装置;并且
所述顶部封装通过用于穿过的装置耦合到所述用于处理的装置。
30.如权利要求29所述的封装,其特征在于:
用于穿过的装置与用于减小介电损耗的第二装置接触。
CN201880054203.5A 2017-08-24 2018-08-06 封装上天线布置 Active CN111033890B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/686,131 2017-08-24
US15/686,131 US10685924B2 (en) 2017-08-24 2017-08-24 Antenna-on-package arrangements
PCT/US2018/045401 WO2019040270A1 (en) 2017-08-24 2018-08-06 ANTENNA ARRANGEMENTS ON HOUSING

Publications (2)

Publication Number Publication Date
CN111033890A CN111033890A (zh) 2020-04-17
CN111033890B true CN111033890B (zh) 2023-04-28

Family

ID=63364186

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880054203.5A Active CN111033890B (zh) 2017-08-24 2018-08-06 封装上天线布置

Country Status (3)

Country Link
US (1) US10685924B2 (zh)
CN (1) CN111033890B (zh)
WO (1) WO2019040270A1 (zh)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102022353B1 (ko) * 2018-01-18 2019-09-18 삼성전기주식회사 안테나 모듈
WO2019163376A1 (ja) * 2018-02-22 2019-08-29 株式会社村田製作所 アンテナモジュールおよびそれを搭載した通信装置
US11735570B2 (en) * 2018-04-04 2023-08-22 Intel Corporation Fan out packaging pop mechanical attach method
US20190348747A1 (en) 2018-05-14 2019-11-14 Mediatek Inc. Innovative air gap for antenna fan out package
US11043730B2 (en) * 2018-05-14 2021-06-22 Mediatek Inc. Fan-out package structure with integrated antenna
US10810480B2 (en) * 2018-06-25 2020-10-20 Microelectronics Technology, Inc. Electronic tag and electronic system using the same
DE102018118765A1 (de) * 2018-08-02 2020-02-06 Endress+Hauser SE+Co. KG Hochfrequenzbaustein
CN110060983B (zh) * 2019-05-23 2024-06-25 盛合晶微半导体(江阴)有限公司 天线封装结构及封装方法
JP2021035001A (ja) * 2019-08-29 2021-03-01 株式会社デンソー アンテナ一体型モジュール
KR20210072938A (ko) * 2019-12-10 2021-06-18 삼성전기주식회사 안테나 기판 및 이를 포함하는 안테나 모듈
US11626340B2 (en) 2019-12-12 2023-04-11 Qorvo Us, Inc. Integrated circuit (IC) package with embedded heat spreader in a redistribution layer (RDL)
US11594660B2 (en) * 2020-03-04 2023-02-28 Advanced Semiconductor Engineering, Inc. Semiconductor device package
WO2021198856A1 (en) * 2020-03-31 2021-10-07 3M Innovative Properties Company Antenna assemblies
KR20210156072A (ko) * 2020-06-17 2021-12-24 삼성전자주식회사 안테나 패턴을 포함하는 반도체 패키지
DE102020121855A1 (de) * 2020-08-20 2022-02-24 Infineon Technologies Ag Hochfrequenz-Vorrichtungen und zugehörige Herstellungsverfahren
CN112599499B (zh) * 2020-12-15 2022-07-26 华进半导体封装先导技术研发中心有限公司 天线封装结构及封装方法
US11658391B2 (en) * 2020-12-21 2023-05-23 Qualcomm Incorporated Antenna module
KR20230013377A (ko) * 2021-07-19 2023-01-26 삼성전자주식회사 반도체 패키지
US20230140748A1 (en) * 2021-10-29 2023-05-04 STATS ChipPAC Pte. Ltd. Antenna-in-Package Devices and Methods of Making
US20230078536A1 (en) * 2021-09-14 2023-03-16 Apple Inc. Conductive features on system-in-package surfaces

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2466687A1 (fr) * 2010-12-20 2012-06-20 STMicroelectronics (Crolles 2) SAS Emetteur-récepteur intégré en ondes millimétriques
CN104078451A (zh) * 2013-03-29 2014-10-01 英特尔公司 用于射频无源件和天线的方法、设备和材料
CN104392937A (zh) * 2013-06-28 2015-03-04 英特尔公司 增加bbul封装中的i/o密度和降低层数的方法
CN104867912A (zh) * 2013-12-18 2015-08-26 英特尔公司 嵌入式毫米波相控阵列模块
CN206364003U (zh) * 2016-01-20 2017-07-28 苹果公司 封装器件、系统级封装器件和电子设备

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002096166A1 (en) * 2001-05-18 2002-11-28 Corporation For National Research Initiatives Radio frequency microelectromechanical systems (mems) devices on low-temperature co-fired ceramic (ltcc) substrates
US7372408B2 (en) 2006-01-13 2008-05-13 International Business Machines Corporation Apparatus and methods for packaging integrated circuit chips with antenna modules providing closed electromagnetic environment for integrated antennas
US9131634B2 (en) * 2011-11-15 2015-09-08 Qualcomm Incorporated Radio frequency package on package circuit
US20140035935A1 (en) 2012-08-03 2014-02-06 Qualcomm Mems Technologies, Inc. Passives via bar
US8952521B2 (en) 2012-10-19 2015-02-10 Infineon Technologies Ag Semiconductor packages with integrated antenna and method of forming thereof
US8917210B2 (en) * 2012-11-27 2014-12-23 International Business Machines Corporation Package structures to improve on-chip antenna performance
US9252491B2 (en) 2012-11-30 2016-02-02 Taiwan Semiconductor Manufacturing Company, Ltd. Embedding low-k materials in antennas
US9685350B2 (en) 2013-03-08 2017-06-20 STATS ChipPAC, Pte. Ltd. Semiconductor device and method of forming embedded conductive layer for power/ground planes in Fo-eWLB
US9356332B2 (en) * 2013-04-29 2016-05-31 Infineon Technologies Ag Integrated-circuit module with waveguide transition element
US9853359B2 (en) * 2013-09-26 2017-12-26 Intel Corporation Antenna integrated in a package substrate
JP6279754B2 (ja) 2013-12-09 2018-02-14 インテル コーポレイション パッケージングされたダイ用のセラミック上アンテナ
CN105765711A (zh) * 2013-12-23 2016-07-13 英特尔公司 封装体叠层架构以及制造方法
US9331029B2 (en) * 2014-03-13 2016-05-03 Freescale Semiconductor Inc. Microelectronic packages having mold-embedded traces and methods for the production thereof
DE112015005575T5 (de) * 2014-12-12 2017-09-28 Sony Corporation Mikrowellenantennenvorrichtung, einheit und herstellungsverfahren
US9806040B2 (en) 2015-07-29 2017-10-31 STATS ChipPAC Pte. Ltd. Antenna in embedded wafer-level ball-grid array package
TWI655719B (zh) 2015-08-12 2019-04-01 矽品精密工業股份有限公司 電子模組
US10074900B2 (en) * 2016-02-08 2018-09-11 The Boeing Company Scalable planar packaging architecture for actively scanned phased array antenna system
US10032722B2 (en) * 2016-05-31 2018-07-24 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor package structure having am antenna pattern and manufacturing method thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2466687A1 (fr) * 2010-12-20 2012-06-20 STMicroelectronics (Crolles 2) SAS Emetteur-récepteur intégré en ondes millimétriques
CN104078451A (zh) * 2013-03-29 2014-10-01 英特尔公司 用于射频无源件和天线的方法、设备和材料
CN104392937A (zh) * 2013-06-28 2015-03-04 英特尔公司 增加bbul封装中的i/o密度和降低层数的方法
CN104867912A (zh) * 2013-12-18 2015-08-26 英特尔公司 嵌入式毫米波相控阵列模块
CN206364003U (zh) * 2016-01-20 2017-07-28 苹果公司 封装器件、系统级封装器件和电子设备

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
无线通信系统的封装技术;Telesphor Kamgaing等;《中国集成电路》;20080205(第02期);第55-63页 *
集成电路封装技术与高分子材料;李善君等;《化工新型材料》;19901231(第10期);第10-13页 *

Also Published As

Publication number Publication date
CN111033890A (zh) 2020-04-17
WO2019040270A1 (en) 2019-02-28
US10685924B2 (en) 2020-06-16
US20190067219A1 (en) 2019-02-28

Similar Documents

Publication Publication Date Title
CN111033890B (zh) 封装上天线布置
CN111867249B (zh) 印刷电路板组件
KR101616625B1 (ko) 반도체 패키지 및 그 제조방법
US7514774B2 (en) Stacked multi-chip package with EMI shielding
US9691710B1 (en) Semiconductor package with antenna
CN102881986B (zh) 半导体封装
US20200118952A1 (en) Semiconductor package structure
US9666930B2 (en) Interface between a semiconductor die and a waveguide, where the interface is covered by a molding compound
CN103247581B (zh) 芯片封装和装置
US7504721B2 (en) Apparatus and methods for packaging dielectric resonator antennas with integrated circuit chips
US8159052B2 (en) Apparatus and method for a chip assembly including a frequency extending device
US8067814B2 (en) Semiconductor device and method of manufacturing the same
US20140124907A1 (en) Semiconductor packages
US20190067220A1 (en) Package structure and method of fabricating package structure
US20060214278A1 (en) Shield and semiconductor die assembly
CN107667427A (zh) 用于将器件嵌入面朝上的工件中的系统、装置和方法
US9875997B2 (en) Low profile reinforced package-on-package semiconductor device
JP2018528620A (ja) 受動デバイスを備える低プロファイルパッケージ
KR20160066311A (ko) 반도체 패키지 및 반도체 패키지의 제조방법
CN102405524A (zh) 集成电路微模块
CN108735716B (zh) 封装结构
CN109686723A (zh) 半导体封装件
US20150303172A1 (en) Reconstitution techniques for semiconductor packages
CN108962878B (zh) 电子封装件及其制法
EP3796562B1 (en) Wireless transmission module and fabrication method therefor

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant