CN110904407A - 一种非介质黑色增亮膜及镀膜工艺 - Google Patents

一种非介质黑色增亮膜及镀膜工艺 Download PDF

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CN110904407A
CN110904407A CN201911044415.8A CN201911044415A CN110904407A CN 110904407 A CN110904407 A CN 110904407A CN 201911044415 A CN201911044415 A CN 201911044415A CN 110904407 A CN110904407 A CN 110904407A
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dielectric
film
layers
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李智超
毕文江
朱金波
孙波
曹志嫦
赵二帅
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Henan Dubang Photoelectric Co Ltd
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Abstract

本发明公开了提出了一种非介质黑色增亮膜及镀膜工艺，所述增亮膜包括基材背面上依次镀制的交替非介质膜膜层和油墨层，所述非介质膜膜层可以是SI、IN、NB中的任意两种的组合。所述镀膜工艺首先将基材清洗干净，并对基材表面微观油污和灰尘清洁，将基材放入都1.0*10‑4Pa‑‑6.0*10‑4Pa的真空镀膜机内；然后将非介质材料硅靶材、IN靶材、NB靶材依次在工作气体的环境中进行磁控溅射，在衬底上沉积得到硅单质膜层、IN单质膜层、NB单质膜层；最后镀后基材做防污处理后丝印烘干，就得到了非介质黑色增亮膜。本发明不仅具有绚丽的颜色，同时还具有很好的耐环境测试性能，产品的颜色经久耐用，产品工序简单，生产成本低，产品良品率高。

Description

一种非介质黑色增亮膜及镀膜工艺
技术领域
本发明涉及光学镀膜技术领域，尤其涉及一种非介质黑色增亮膜及镀膜工艺。
背景技术
目前行业中手机、遥控器、电器、仪表、玩具面板或后盖板等产品中都要进行光学镀膜，现有技术通常的做法是使用蒸镀机镀SiO2和TiO2作共四层膜，膜厚可达100多NM做黑色增亮膜。但是由于受基板和工艺影响，不能加热镀制，因此薄膜结构很疏松，丝印、超洗加工过程中容易脱膜，附着力不能满足客户要求，紫外线照射及高温高湿等试验后有水印、变色、脱膜等现象发生。尽管行业中也有使用溅射镀膜机镀SiO2和NB2O5作做黑色增亮膜，此工艺所镀膜层致密，附着力较好，但仍旧与蒸镀工艺一样，存在不同角度观看颜色变化很大，厚层较厚、效率低、良率不高等缺点。因此解决上述问题成为了现有技术的一个攻关课题。
发明内容
为了克服现有技术的上述缺点，本发明提供了一种非介质黑色增亮膜及镀膜工艺，可以使用溅射沉积工艺和蒸镀沉积工艺，膜层结构更致密，耐环境性能测试力强，与基材附着力好，在不同角度观察颜色变化少，膜系结构简单，膜厚薄，生产效率高，良率高。
为达到上述目的，本发明采用的技术方案是：一种非介质黑色增亮膜，包括基材背面上依次镀制的交替非介质膜膜层，所述非介质膜膜层可以是SI、IN、NB中的任意两种的组合，还包括油墨层，所述油墨层丝印一层或几层在膜层表面。
进一步的，所述油墨层为黑色，不同层的油墨层可以选择亮黑或亚黑不同黑色的油墨，其厚度一般为微米级。
进一步的，所述非介质材料膜层的厚度都在0-30nm。
进一步的，所述介质膜膜层为SI、IN、NB三种材料的组合。
进一步的，所述非介质材料膜层可以用蒸镀和溅射两种方案成膜。
本发明还提供了一种非介质黑色增亮膜的镀膜工艺，包括以下步骤：
步骤1：用超声波清洗机或平板清洗机将基材清洗干净；
步骤2：将已清洗干净、无污染并检验合格的基材，用夹具装夹好后放入真空镀膜机内，镀膜前运用RF源放电对基材表面微观油污和灰尘进一步进行清洁，以提高膜层附着力，真空镀膜机内的真空度通过磁控溅射机抽真空到1.0*10-4Pa--6.0*10-4Pa；
步骤3：将非介质材料硅靶材、IN靶材、NB靶材依次在工作气体的环境中进行磁控溅射，在衬底上沉积得到硅单质膜层、IN单质膜层、NB单质膜层，所述工作气体为氩气；所述氩气流量为150-450SCCM，磁控溅射的气压为1.0-6.0*10-3Pa，磁控溅射的功率为6-12kw；
步骤4：镀后基材做防污处理后丝印烘干，就得到了非介质黑色增亮膜。
进一步的，所述步骤2中，真空镀膜机内的真空度通过磁控溅射机抽真空到4.0*10-4Pa。
进一步的，所述步骤3中，非介质靶材的纯度为99.999%的高纯靶材，靶材到基材的距离可以为2-5cm。
与现有技术相比，本发明的有益效果：本发明提供一种非介质黑色增亮膜及镀膜工艺，在玻璃、PMMA、PC或复合板材基材上依次镀1-3层由SI单质、IN单质或者NB单质中两种或三种非介质材料组成的膜层，所述膜层位于基材（包括：玻璃、PMMA、PC或复合板材）与油墨之间，通过膜层对光波的反射和吸收作用提高油墨的亮度，颜色持久耐用且不褪色。特别是颜色抗光线入射角的效果好，膜层薄，效率高，成本低、质量高等优点。本覆膜提供的盖板可应用于手机前后盖板等产品中，本专利的工艺和产品均稳定可靠，满足各种用户需求。
综上，本发明的薄膜不仅具有绚丽的颜色，同时还具有很好的耐环境测试性能，产品的颜色经久耐用，能够满足任何严苛的使用环境，特别是产品颜色在任何角度下观察颜色变化不大，产品工序简单，生产成本低，产品良品率高。
具体实施方式
下面将结合本发明实施例中的技术方案进行详细的描述：
一种非介质黑色增亮膜，包括基材背面上依次镀制的交替非介质膜膜层，所述非介质膜膜层可以是SI、IN、NB中的任意两种的组合，所述非介质材料膜层的厚度都在0-30nm，还包括油墨层，所述油墨层丝印一层或几层在膜层表面，所述油墨层为黑色，不同层的油墨层可以选择亮黑或亚黑不同黑色的油墨，其厚度一般为微米级。
所述非介质材料膜层可以用蒸镀和溅射两种方案成膜。
本发明还提供了一种非介质黑色增亮膜的镀膜工艺，包括以下步骤：
步骤1：用超声波清洗机或平板清洗机将基材清洗干净；
步骤2：将已清洗干净、无污染并检验合格的基材，用夹具装夹好后放入真空镀膜机内，镀膜前运用RF源放电对基材表面微观油污和灰尘进一步进行清洁，以提高膜层附着力，真空镀膜机内的真空度通过磁控溅射机抽真空到1.0*10-4Pa--6.0*10-4Pa；
步骤3：将非介质材料硅靶材、IN靶材、NB靶材依次在工作气体的环境中进行磁控溅射，在衬底上沉积得到硅单质膜层、IN单质膜层、NB单质膜层，所述工作气体为氩气；所述氩气流量为150-450SCCM，磁控溅射的气压为1.0-6.0*10-3Pa，磁控溅射的功率为6-12kw；
步骤4：镀后基材做防污处理后丝印烘干，就得到了非介质黑色增亮膜。
所述步骤3中，非介质靶材的纯度为99.999%的高纯靶材，靶材到基材的距离可以为2-5cm。
实施例1．本发明提供了一种非介质黑色增亮膜及镀膜工艺，一种具体实施的膜系结构是G/SI/IN/NB/AIR，其中第一层SI的厚度为0-20nm，第二层IN的厚度为0-30nm，第三层NB的厚度为0-20nm，其膜系总厚度20-50nm。
本发明还提供了非介质黑色增亮膜的镀膜工艺，包括以下步骤：
将磁控溅射的常规衬底、基片可以为玻璃、或PMMA等其它材料用超声波清洗机或平板清洗机清洗干净，用夹具装夹好送入真空环境中；
镀前运用RF源放电对基材表面微观油污和灰尘进一步进行清洁，以提高膜层附着力；
确定真空室的真空度抽到4.0*10-4Pa以上，硅靶材在工作气体环境中进行磁控溅射，在衬底上得到高纯硅单质膜层；IN靶材在工作气体环境中进行磁控溅射，在衬底上得到高纯IN单质膜层；NB靶材在工作气体环境中进行磁控溅射，在衬底上得到高纯NB单质膜层，镀后基材做防污处理后丝印烘干，就得到了非介质黑色增亮膜。
本发明非介质靶材的纯度在99.999%的高纯靶材，靶材到基板的距离可以为2-5cm。
本专利非介质黑色增亮膜产品应用于电子产品显示面板时，所述增亮膜位于其边框区，而应用电子产品背面时，所述增亮膜位于其背面的整面；镀膜后的颜色膜经过一系列严苛的性能测试得出：本发明的薄膜不仅具有绚丽的颜色，同时还具有很好的耐环境测试性能，产品的颜色经久耐用，能够满足任何严苛的使用环境，特别是产品颜色在任何角度下观察颜色变化不大，产品工序简单，生产成本低，产品良品率高。
以上所述仅是本申请的具体实施方式，应当指出，在于本技术领域的普通技术人员来说，在不脱离本申请原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本申请的保护范围。

Claims (8)

1.一种非介质黑色增亮膜，其特征在于，包括基材背面上依次镀制的交替非介质膜膜层，所述非介质膜膜层可以是SI、IN、NB中的任意两种的组合，还包括油墨层，所述油墨层丝印一层或几层在膜层表面。
2.根据权利要求1所述的一种非介质黑色增亮膜，其特征在于，所述油墨层为黑色，不同层的油墨层可以选择亮黑或亚黑不同黑色的油墨，其厚度一般为微米级。
3.根据权利要求1所述的一种非介质黑色增亮膜，其特征在于，所述非介质材料膜层的厚度都在0-30nm。
4.根据权利要求1所述的一种非介质黑色增亮膜，其特征在于，所述介质膜膜层为SI、IN、NB三种材料的组合。
5.根据权利要求1所述的一种非介质黑色增亮膜，其特征在于，所述非介质材料膜层可以用蒸镀和溅射两种方案成膜。
6.根据权利要求1所述的一种非介质黑色增亮膜的镀膜工艺，包括以下步骤：
步骤1：用超声波清洗机或平板清洗机将基材清洗干净；
步骤2：将已清洗干净、无污染并检验合格的基材，用夹具装夹好后放入真空镀膜机内，镀膜前运用RF源放电对基材表面微观油污和灰尘进一步进行清洁，以提高膜层附着力，真空镀膜机内的真空度通过磁控溅射机抽真空到1.0*10-4Pa--6.0*10-4Pa；
步骤3：将非介质材料硅靶材、IN靶材、NB靶材依次在工作气体的环境中进行磁控溅射，在衬底上沉积得到硅单质膜层、IN单质膜层、NB单质膜层，所述工作气体为氩气；所述氩气流量为150-450SCCM，磁控溅射的气压为1.0-6.0*10-3Pa，磁控溅射的功率为6-12kw；
步骤4：镀后基材做防污处理后丝印烘干，就得到了非介质黑色增亮膜。
7.根据权利要求6所述的一种非介质黑色增亮膜的镀膜工艺，其特征在于，所述步骤2中，真空镀膜机内的真空度通过磁控溅射机抽真空到4.0*10-4Pa。
8.根据权利要求6所述的一种非介质黑色增亮膜的镀膜工艺，其特征在于，所述步骤3中，非介质靶材的纯度为99.999%的高纯靶材，靶材到基材的距离可以为2-5cm。
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