CN111218648A - 一种超高附着力复合板材颜色膜及其镀膜工艺 - Google Patents
一种超高附着力复合板材颜色膜及其镀膜工艺 Download PDFInfo
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Abstract
本发明公开了一种超高附着力复合板材颜色膜及镀膜工艺，所述颜色膜包括背面依次镀制的过渡层及交替分布的介质膜膜层，在PMMA或PC及其表面硬化处理或涂层处理后的基材上加镀一层过渡层，本过渡层是可以是Si、Cr、In当中的一种，由H4、SI3N4、TI3O5或者NB2O5中一种高折射率材料与SiO2或AL2O3中的一种低折射率材料组成的介质膜膜层，所述介质膜膜层位于玻璃与油墨之间，通过介质膜膜层对光的干涉叠加作用提高油墨的绚丽色彩或直接利用膜层对光的干涉叠加作用实现不同亮丽的颜色，颜色持久耐用且不褪色，本发明提供的复合板材颜色膜膜层附着力牢，加工工序简单，加工良率高，成本低效率高。
Description
技术领域
本发明涉及光学镀膜技术领域，尤其涉及一种超高附着力复合板材颜色膜及其镀膜工艺。
背景技术
复合板材颜色膜主要运用于手机后盖板上，随着手机行业的快速发展其市场需求巨大，颜色膜的作用就是增加油墨颜色的绚丽，并使油墨呈现出各种不同的颜色。
目前行业中，通常的做法是使用蒸镀机或溅射机镀SiO2和TiO2作为颜色膜，但由于PMMA或PC及其表面硬化处理或涂层处理后的复合板材，与常规光学材料H4、SI3N4、TI3O5、NB2O5、AL2O3、SiO2形成的膜层之间附着力弱，因此复合板材上镀膜的颜色膜在80度水温浸泡30分钟会脱膜，其附着力不能满足客户要求，紫外线照射及高温高湿等试验后，复合板材表面的颜色膜有明显的水印、变色、脱膜等现象发生。因此如何解决上述问题成为了现有技术领域中的一个攻关课题。
发明内容
为了克服现有技术的上述缺点，本发明提供了一种超高附着力复合板材颜色膜及其镀膜工艺，在使用溅射沉积薄膜前，先镀一层Si、Cr、In中的一种的过渡层，使颜色膜附着力超强，耐环境性能测试能力更好，颜色持久耐用且不褪色，保证膜层质量、生产效率及良品率大大提升。
为达到上述目的，本发明采用的技术方案是：一种超高附着力复合板材颜色膜，包括位于复合板材背面依次镀制的过渡层及交替分布的介质膜膜层，所述过渡层可以是Si、Cr、In当中的任意一种材料构成，所述介质膜膜层是由高折射率层和低折射率层构成的薄膜，且高折射率层与低折射率层交替分布，其中低折射率层在下，高折射率层在上，所述高折射率层是H4、SI3N4、TI3O5、NB2O5中的任意一种构成的材料，所述低折射率层是SiO2或者AL2O3中的一种材料构成，还包括油墨，所述油墨丝印一层或几层在介质膜膜层表面。
进一步的，所述介质膜膜层为2层以上，最多可达20层。
进一步的，所述过渡层材料膜层厚度为0-5nm，其镀膜方式包括热蒸发和溅射镀膜。
进一步的，所述高折射率层材料的膜层厚度为10-1000nm，低折射率层材料的膜层厚度为10-1000nm。
本发明还提供了一种超高附着力复合板材颜色膜的镀膜工艺，包括以下步骤：
步骤1：将PMMA或PC及其表面硬化处理或涂层处理后的复合板材表面保护膜去除后，使用打底胶带包好不锈钢基板作为工件，将复合板材粘在工件上两者结合牢固；
步骤2：用夹具装夹好工件送入真空环境中，镀膜前运用RF源放电对复合板材基片表面微观油污和灰尘进一步行清洁，以提高膜层附着力；
步骤3：将过渡层材料靶材硅靶、铬靶或铟靶的任意一种在工作气体的环境中进行磁控溅射，在复合板材衬底上沉积得到过渡层材料膜层，所述工作气体为氩气；
步骤4：将高折射率层材料靶材和低折射率层材料靶材在工作气体与反应气体的环境中进行磁控溅射，在复合板材衬底上依次沉积得到高折射率层氧化物薄膜和低折射率层氧化物薄膜，所述高折射率层与低折射率层交替分布，所述工作气体为氩气，反应气体为氧气；
步骤5：镀完后复合板材覆膜进入丝印工序，丝印一道或几道油墨后就得到本专利所述超高附着力复合板材颜色膜，经激光切割成客户要求大小就可以出货。
进一步的，所述步骤3中，优选的氩气流量为250-350SCCM，优选的磁控溅射的气压为1.0-6.0*10-4Pa，优选的磁控溅射的功率为5-15kw，优选的磁控溅射的氧化功率为0kw。
进一步的，所述步骤4中，所述氩气：氧气体积比=（1~3）：（2~4）。
进一步的，所述步骤4中，优选的氩气流量为250-350SCCM，氧气流量150-450SCCM，优选的磁控溅射的气压为1.0-2.0*10-3Pa，优选的磁控溅射的功率为7-15kw，优选的磁控溅射的氧化功率为0-3.5kw。
进一步的，所述过渡层材料靶材、高折射率层材料靶材及低折射率层材料靶材纯度为99.999%，靶材到复合板材基板的距离可以为2-5cm，且反应气体纯度99.99%。
与现有技术相比，本发明的有益效果：本发明提供的产品所镀膜层选用与复合板材、PMMA及PC结合力好的Si、Cr、In非介质膜作为过渡层，膜层的附着力能达到100度水温浸泡60分钟，划切粘拉膜层附着力达到5B，抗紫外线照射及高温高湿等测试性能稳定、重复性好；本发明制作的薄膜不仅具有绚丽的颜色，而且还具有超强的附着力和很好的耐环境测试性能，产品的颜色经久耐用，能够满足任何严苛的使用环境；同时本发明提供的颜色膜制备方法，产品工序简单，生产成本低，良品率高，效率高。
综上，本发明提供一种超高附着力复合板材颜色膜工艺，该工艺就是在PMMA或PC及其表面硬化处理或涂层处理后的基材上加镀一层过渡层,本过渡层是可以是Si、Cr、In当中的一种，由H4、SI3N4、TI3O5或者NB2O5中一种高折射率材料与SiO2或AL2O3中的一种低折射率材料组成的膜层。通过油墨丝印一层或几层在介质膜膜层表面，膜层位于玻璃与油墨之间，通过介质膜膜层对光的干涉叠加作用提高油墨的绚丽色彩或直接利用膜层对光的干涉叠加作用实现不同亮丽的颜色，颜色持久耐用且不褪色。本发明提供的复合板材颜色膜可应用于手机前后盖板上，本专利的工艺和产品均稳定可靠，满足各种用户需求。
附图说明
为了更清楚地说明本申请实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍。
图1所示为本发明颜色膜结构示意图。
具体实施方式
下面将结合本发明实施例中的技术方案进行详细的描述：
参照图1所示，一种超高附着力复合板材颜色膜，包括位于复合板材1背面依次镀制的过渡层2及交替分布的介质膜膜层，所述过渡层2可以是Si、Cr、In当中的任意一种材料构成，所述过渡层2材料膜层厚度为0-5nm，其镀膜方式包括热蒸发和溅射镀膜，所述介质膜膜层是由高折射率层3和低折射率层4构成的薄膜，且高折射率层3与低折射率层4交替分布，其中低折射率层4在下，高折射率层3在上，所述介质膜膜层为2层以上，最多可达20层；所述高折射率层3是H4、SI3N4、TI3O5、NB2O5中的任意一种构成的材料，所述低折射率层4是SiO2或者AL2O3中的一种材料构成，所述高折射率层3材料的膜层厚度为10-1000nm，低折射率层4材料的膜层厚度为10-1000nm，还包括油墨5，所述油墨5丝印一层或几层在介质膜膜层表面，薄膜附着力牢固，丝印后颜色鲜艳。
本发明还提供了一种超高附着力复合板材颜色膜的镀膜工艺，包括以下步骤：
步骤1：将PMMA或PC及其表面硬化处理或涂层处理后的复合板材表面保护膜去除后，使用打底胶带包好不锈钢基板作为工件，工件边沿有事先贴好的强力胶条，复合板材粘在工件上后用压具轻压，使复合板材与底胶结合牢固，在整个操作过程中严格保证装盘区域和镀膜机区域的干湿度和粉尘度，避免产品镀膜出现瑕疵；
步骤2：用夹具装夹好工件送入真空环境中，镀膜前运用RF源放电对复合板材基片表面微观油污和灰尘进一步行清洁，以提高膜层附着力；
步骤3：将过渡层材料靶材硅靶、铬靶或铟靶的任意一种在工作气体的环境中进行磁控溅射，在复合板材衬底上沉积得到过渡层材料膜层，所述工作气体为氩气；
步骤4：将高折射率层材料靶材和低折射率层材料靶材在工作气体与反应气体的环境中进行磁控溅射，在复合板材衬底上依次沉积得到高折射率层氧化物薄膜和低折射率层氧化物薄膜，所述高折射率层与低折射率层交替分布，所述工作气体为氩气，反应气体为氧气；
步骤5：镀完后下盘覆膜进入丝印工序，丝印一道或几道油墨（可以是黑色或其它颜色的油墨）后就得到本专利所述超高附着力复合板材颜色膜，经激光切割成客户要求大小就可以出货。
所述步骤3中，优选的氩气流量为250-350SCCM，优选的磁控溅射的气压为1.0-6.0*10-4Pa，优选的磁控溅射的功率为5-15kw，优选的磁控溅射的氧化功率为0kw。
所述步骤4中，所述氩气：氧气体积比=（1~3）：（2~4），所述步骤4中，优选的氩气流量为250-350SCCM，氧气流量150-450SCCM，优选的磁控溅射的气压为1.0-2.0*10-3Pa，优选的磁控溅射的功率为7-15kw，优选的磁控溅射的氧化功率为0-3.5kw。
所述过渡层材料靶材、高折射率层材料靶材及低折射率层材料靶材纯度为99.999%，靶材到复合板材基板的距离可以为2-5cm，且反应气体纯度99.99%。
实施例1．如附图1所列举，超高附着力复合板材颜色膜6层膜结构从下到上依次由过渡层In、低折射率SiO2和高折射率NB2O5交替薄膜排列所得，其中各层的物理厚度分别为过渡层0~5nm、低折射率层10~30nm、高折射率层40~60 nm、低折射率层30~50 nm、高折射率层20~30 nm、低折射率层50~70 nm中的某个最优值。
超高附着力复合板材颜色膜的镀膜工艺，包括以下步骤：
步骤1：将PMMA或PC及其表面硬化处理或涂层处理后的复合板材表面保护膜去除后，使用打底胶带包好不锈钢基板作为工件，工件边沿有事先贴好的强力胶条，复合板材粘在工件上后用压具轻压，使复合板材与底胶结合牢固，在整个操作过程中严格保证装盘区域和镀膜机区域的干湿度和粉尘度，避免产品镀膜出现瑕疵，镀前去除保护膜后表面用离子风机处理；
步骤2：用夹具装夹好工件送入真空环境中，镀膜前运用RF源放电对复合板材基片表面微观油污和灰尘进一步行清洁，以提高膜层附着力，其中RF源清扫操作中使用氩气，流量为150sccm，处理时间约为 60-300秒；
步骤3：将过渡层材料靶材硅靶、铬靶或铟靶的任意一种在工作气体的环境中进行磁控溅射，在复合板材衬底上沉积得到过渡层材料膜层，所述工作气体为氩气，溅射功率为5KW，氩气流量为320 sccm；
步骤4：将高折射率层材料靶材和低折射率层材料靶材在工作气体与反应气体的环境中进行磁控溅射，在复合板材衬底上依次沉积得到高折射率层氧化物薄膜和低折射率层氧化物薄膜，所述高折射率层与低折射率层交替分布，所述工作气体为氩气，反应气体为氧气。低折射率层选定溅射气体为氩气，溅射功率为9KW，反应气体为氧气，氧化功率0.5KW；高折射率选定溅射气体为氩气，溅射功率为9.5KW，反应气体为氧气，氧化功率2.5KW，其中氩气流量为350 sccm，氧气流量为250 sccm。
步骤5：镀完后下盘覆膜进入丝印工序，丝印一道或几道油墨（可以是黑色或其它颜色的油墨）后就得到本专利所述超高附着力复合板材颜色膜，经激光切割成客户要求大小就可以出货。
镀膜后的颜色膜经过一系列严苛的性能测试：a）反射光谱测试，通过日本进口反射率测定仪测试镀膜面反射光谱，各个批次的产品均达到360-740 nm范围内色度坐标，满足客户要求；b）膜层附着力测试，满足5B要求；c）丝印镀膜区后烘干，颜色膜附着力牢固，丝印后颜色鲜艳。
综上，使用该种工艺在复合板材表面及油墨中镀的增亮颜色膜，膜层牢固，可做成不同的蓝、白、红、金、银等颜色，本发明制作的颜色膜膜层附着力牢，加工工序简单，加工良率高，成本低效率高，是一种值得推广的复合板材颜色膜镀制技术。
以上所述仅是本申请的具体实施方式，应当指出，在于本技术领域的普通技术人员来说，在不脱离本申请原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本申请的保护范围。
Claims (9)
1.一种超高附着力复合板材颜色膜，包括位于复合板材背面依次镀制的过渡层及交替分布的介质膜膜层，其特征在于，所述过渡层可以是Si、Cr、In当中的任意一种材料构成，所述介质膜膜层是由高折射率层和低折射率层构成的薄膜，且高折射率层与低折射率层交替分布，其中低折射率层在下，高折射率层在上，所述高折射率层是H4、SI3N4、TI3O5、NB2O5中的任意一种构成的材料，所述低折射率层是SiO2或者AL2O3中的一种材料构成，还包括油墨，所述油墨丝印一层或几层在介质膜膜层表面。
2.根据权利要求1所述的一种超高附着力复合板材颜色膜，其特征在于，所述介质膜膜层为2层以上，最多可达20层。
3.根据权利要求1所述的一种超高附着力复合板材颜色膜，其特征在于，所述过渡层材料膜层厚度为0-5nm，其镀膜方式包括热蒸发和溅射镀膜。
4.根据权利要求1所述的一种超高附着力复合板材颜色膜，其特征在于，所述高折射率层材料的膜层厚度为10-1000nm，低折射率层材料的膜层厚度为10-1000nm。
5.根据权利要求1所述的一种超高附着力复合板材颜色膜的镀膜工艺，包括以下步骤：
步骤1：将PMMA或PC及其表面硬化处理或涂层处理后的复合板材表面保护膜去除后，使用打底胶带包好不锈钢基板作为工件，将复合板材粘在工件上两者结合牢固；
步骤2：用夹具装夹好工件送入真空环境中，镀膜前运用RF源放电对复合板材基片表面微观油污和灰尘进一步行清洁，以提高膜层附着力；
步骤3：将过渡层材料靶材硅靶、铬靶或铟靶的任意一种在工作气体的环境中进行磁控溅射，在复合板材衬底上沉积得到过渡层材料膜层，所述工作气体为氩气；
步骤4：将高折射率层材料靶材和低折射率层材料靶材在工作气体与反应气体的环境中进行磁控溅射，在复合板材衬底上依次沉积得到高折射率层氧化物薄膜和低折射率层氧化物薄膜，所述高折射率层与低折射率层交替分布，所述工作气体为氩气，反应气体为氧气；
步骤5：镀完后复合板材覆膜进入丝印工序，丝印一道或几道油墨后就得到本专利所述超高附着力复合板材颜色膜，经激光切割成客户要求大小就可以出货。
6.根据权利要求5所述的一种超高附着力复合板材颜色膜的镀膜工艺，其特征在于，所述步骤3中，氩气流量为250-350SCCM，磁控溅射的气压为1.0-6.0*10-4Pa，磁控溅射的功率为5-15kw，磁控溅射的氧化功率为0kw。
7.根据权利要求5所述的一种超高附着力复合板材颜色膜的镀膜工艺，其特征在于，所述步骤4中，所述氩气：氧气体积比=（1~3）：（2~4）。
8.根据权利要求5所述的一种超高附着力复合板材颜色膜的镀膜工艺，其特征在于，所述步骤4中，优选的氩气流量为250-350SCCM，氧气流量150-450SCCM，优选的磁控溅射的气压为1.0-2.0*10-3Pa，优选的磁控溅射的功率为7-15kw，优选的磁控溅射的氧化功率为0-3.5kw。
9.根据权利要求5所述的一种超高附着力复合板材颜色膜的镀膜工艺，其特征在于，所述过渡层材料靶材、高折射率层材料靶材及低折射率层材料靶材纯度为99.999%，靶材到复合板材基板的距离可以为2-5cm，且反应气体纯度99.99%。
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| CN114635114A (zh) * | 2022-03-11 | 2022-06-17 | 先导薄膜材料（广东）有限公司 | 一种改善玻璃基金属铟膜结合力的方法 |
| CN114921752A (zh) * | 2022-06-22 | 2022-08-19 | 东莞瑞彩光学薄膜有限公司 | 一种复合板材提高亮度的加工工艺 |
| CN115505879A (zh) * | 2022-09-30 | 2022-12-23 | 广州市博泰光学科技有限公司 | 一种光学镜片镀膜方法 |
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