CN114921752A - 一种复合板材提高亮度的加工工艺 - Google Patents
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- 239000002131 composite material Substances 0.000 title claims abstract description 41
- 238000005516 engineering process Methods 0.000 title claims abstract description 17
- 238000012545 processing Methods 0.000 title claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 229910010413 TiO 2 Inorganic materials 0.000 claims abstract description 20
- 238000000576 coating method Methods 0.000 claims abstract description 20
- 239000011248 coating agent Substances 0.000 claims abstract description 18
- 230000008020 evaporation Effects 0.000 claims abstract description 17
- 238000001704 evaporation Methods 0.000 claims abstract description 17
- 230000003287 optical effect Effects 0.000 claims abstract description 17
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 12
- 238000000016 photochemical curing Methods 0.000 claims abstract description 10
- 238000007747 plating Methods 0.000 claims abstract description 10
- 238000005520 cutting process Methods 0.000 claims abstract description 8
- 230000037452 priming Effects 0.000 claims abstract description 6
- 238000004544 sputter deposition Methods 0.000 claims abstract description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000001723 curing Methods 0.000 claims abstract description 5
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 5
- 239000010703 silicon Substances 0.000 claims abstract description 5
- 238000005498 polishing Methods 0.000 claims abstract description 4
- 238000005507 spraying Methods 0.000 claims abstract description 4
- 238000004381 surface treatment Methods 0.000 claims abstract description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 15
- 239000012528 membrane Substances 0.000 claims description 10
- 229910052786 argon Inorganic materials 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 238000003756 stirring Methods 0.000 claims description 9
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 7
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 6
- 229910021617 Indium monochloride Inorganic materials 0.000 claims description 6
- 239000002202 Polyethylene glycol Substances 0.000 claims description 6
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims description 6
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- 229920001223 polyethylene glycol Polymers 0.000 claims description 6
- 229910052738 indium Inorganic materials 0.000 claims description 5
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 150000003839 salts Chemical class 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 2
- 230000001699 photocatalysis Effects 0.000 abstract description 4
- 238000002834 transmittance Methods 0.000 abstract description 4
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 238000009713 electroplating Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 15
- 239000007888 film coating Substances 0.000 description 8
- 238000009501 film coating Methods 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 238000007639 printing Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- 238000005282 brightening Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000007146 photocatalysis Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000003116 impacting effect Effects 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229920001910 maleic anhydride grafted polyolefin Polymers 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000005543 nano-size silicon particle Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 238000013441 quality evaluation Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
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Abstract
本发明公开了一种复合板材提高亮度的加工工艺,包括以下步骤:步骤一:制备基板,用裁切机对复合板材进行裁切,并进行表面处理,得到被镀基底;步骤二:对步骤一中的被镀基底进行镀硅处理,得到打底层;步骤三:通过光学蒸发镀膜机真空溅射反光层溶胶在步骤二中的打底层电镀形成反光层;步骤四:通过光学蒸发镀膜机在步骤三中的反光层上镀SiO2膜和TiO2膜形成颜色膜;步骤五:对经过上述步骤处理的复合板材表面喷涂耐磨光固化油墨层,并经CNC精雕,得到手机背板成品,本发明颜色膜采用SiO2/TiO2复合薄膜,设置在反光层和光固化油墨层之间,有助于提高光催化性能,提高光透过率。
Description
技术领域
本发明涉及复合板加工技术领域,具体涉及一种复合板材提高亮度的加工工艺。
背景技术
随着科技的发展,诸如手机、平板电脑等移动终端,在人们的工作、学习、日常交流等各方面的使用率也越来越高。而手机是目前人们使用较多的3C产品,在市场上占据主流位置。用户除了对手机产品的硬件要求较高之外,越来越注重手机产品的外观。手机产品外观能给用户带来直接的视觉体验,很大程度上决定着用户对产品的质量评价。
传统手机金属后盖虽具有较为理想的大众审美金属质感,但因具有对手机信号的屏蔽作用,后盖去金属化趋势明显加快,玻璃屏复合板凭借着高颜值成为手机终端的新宠。消费者对手机外观和质感的追求不断提高,在复合板材上及玻璃上镀仿金属色及色彩炫酷艳丽的外观,镀膜增亮技术应运而生。
发明内容
本发明的目的在于提供一种复合板材提高亮度的加工工艺,颜色膜通过光学蒸发镀膜机镀SiO2/TiO2复合薄膜,设置在反光层和光固化油墨层之间,有助于提高光催化性能,提高光透过率,光线从透明面层穿入,依次经过光固化油墨层、颜色膜在反光层的作用下将光线反射出去,颜色膜在光线反射下呈现出其颜色效果,SiO2/TiO2复合薄膜具有高光透过率,不会存在失真问题,从而体现出丰富色彩及质感效果,亮度增亮明显。
本发明的目的可以通过以下技术方案实现:
一种复合板材提高亮度的加工工艺,包括以下步骤:
步骤一:制备基板,用裁切机对复合板材进行裁切,并进行表面处理,得到被镀基底;
步骤二:对步骤一中的被镀基底进行镀硅处理,得到打底层;
步骤三:通过光学蒸发镀膜机真空溅射反光层溶胶在步骤二中的打底层电镀形成反光层;
步骤四:通过光学蒸发镀膜机在步骤三中的反光层上镀SiO2膜和TiO2膜形成颜色膜;
步骤五:对经过上述步骤处理的复合板材表面喷涂耐磨光固化油墨层,并经CNC精雕,得到手机背板成品。
作为本发明进一步的方案:采用等离子体对基板表面进行清洗。
作为本发明进一步的方案:打底层的厚度为100-120nm。
作为本发明进一步的方案:反光层为氧化铟锡薄膜,反光层的厚度为30-40nm。
作为本发明进一步的方案:反光溶胶的制备步骤为:
S1:将一定量的铟溶解在浓酸盐中得到InCl3溶液,取出一定量的InCl3溶液,与乙酰丙酮按1:2-1:3的摩尔比混合搅拌得到透明溶液;
S2:再按透明溶液与乙二醇甲醚的质量比为80:5的比例加入乙二醇甲醚,在室温下搅拌,得到In溶胶;
S3:按In:Sn质量比为15:6的比例加入SnCl4·5H2O,搅拌20min得到In-Sn溶胶;
S4:按In-Sn溶胶与聚乙二醇的质量比为80:20的比例加入聚乙二醇,静置40min得到反光层溶胶。
作为本发明进一步的方案:颜色膜采用SiO2/TiO2复合薄膜,颜色膜的厚度为50-70nm。
作为本发明进一步的方案:步骤四中,光学蒸发镀膜机镀SiO2膜采用氩气为保护气体;
光学蒸发镀膜机镀TiO2膜采用氧气为保护气体。
作为本发明进一步的方案:氩气采用高纯氩气,纯度为99.999%。
作为本发明进一步的方案:氧气采用高纯氧气,纯度为99.999%。
作为本发明进一步的方案:步骤五中,光固化油墨层的厚度为20-25μm。
本发明的有益效果:
(1)本发明采用光学蒸发镀膜机镀SiO2/TiO2复合薄膜,设置在反光层和光固化油墨层之间,有助于提高光催化性能,提高光透过率,光线从透明面层穿入,依次经过光固化油墨层、颜色膜在反光层的作用下将光线反射出去,颜色膜在光线反射下呈现出其颜色效果,SiO2/TiO2复合薄膜具有高光透过率,不会存在失真问题,从而体现出丰富色彩及质感效果,增亮效果明显;
(2)本发明在基板镀膜前进行等离子体处理,实现对基板表面的清洁和除静电的作用,激活基板表面性能,提高表面能,提高基板对膜层的吸附力,提高镀膜效果。
附图说明
下面结合附图对本发明作进一步的说明。
图1是本发明流程图的结构示意图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其它实施例,都属于本发明保护的范围。
请参阅图1所示,本发明为一种复合板材提高亮度的加工工艺,包括以下步骤:
步骤一:制备基板,用裁切机对复合板材进行裁切,并进行表面处理,得到被镀基底;
步骤二:对步骤一中的被镀基底进行镀硅处理,得到打底层;
步骤三:通过光学蒸发镀膜机真空溅射反光层溶胶在步骤二中的打底层电镀形成反光层;
步骤四:通过光学蒸发镀膜机镀SiO2膜和TiO2膜在步骤三中的反光层形成颜色膜;
步骤五:对经过上述步骤处理复合板材表面喷涂耐磨光固化油墨层,并经CNC精雕,得到手机背板成品。
步骤一中,对基板进行离子清洗,通过条形阳极离子源,清洗基片表面污染物(氧化物、含碳氢化合物等),从而实现增加膜基结合力,减少基底缺陷,增加基片表面能;
将离子源与基板之间的间距控制在25-30mm,使经离子源处理后的基板表面的达因值不低于45mN/m;
基板的厚度优选为0.5mm;
步骤二中,采用硅靶在复合材料表面镀制一层打底层,打底层的厚度为110nm;
步骤三中,反光层采用氧化铟锡薄膜,反光层的厚度优选35nm,氧化铟锡薄膜中铟氧化物与锡氧化物的质量比为15:6,利用其金属分子连续性差的原理,控制厚度使其具有银白色的外观并且电阻大;
具体的,将一定量的铟溶解在浓酸盐中得到InCl3溶液,取出一定量的InCl3溶液,与乙酰丙酮按1:2—1:3的摩尔比混合搅拌得到透明溶液;再按透明溶液与乙二醇甲醚的质量比为80:5的比例加入乙二醇甲醚,在室温下搅拌,得到In溶胶;按In:Sn质量比为15:6的比例加入SnCl4·5H2O,搅拌20min得到In-Sn溶胶,然后按In-Sn溶胶与聚乙二醇的质量比为80:20的比例加入聚乙二醇,静置40min得到反光层溶胶,并通过光学蒸发镀膜机溅射反光层溶胶到基板上得到反光层;
步骤四中,颜色膜采用SiO2/TiO2复合薄膜,具体的,颜色膜的制备如下:
采用光学蒸发镀膜机溅射镀膜工艺镀SiO2膜,镀膜室的镀膜温度控制在110℃,将衬底承片台正对着靶,在靶和衬底之间充入氩气,由于电场作用气体辉光放电,大量的气体离子将撞击在靶材的表面,使被溅射材料以原子状态脱离靶的表面飞溅出来,淀积到衬底上形成SiO2薄膜;
采用光学蒸发镀膜机溅射镀膜工艺镀TiO2膜,镀膜室的镀膜温度控制在110℃,将衬底承片台正对着靶,在靶和衬底之间充入氧气,由于电场作用气体辉光放电,大量的气体离子将撞击在靶材的表面,使被溅射材料以原子状态脱离靶的表面飞溅出来,淀积到衬底上形成TiO2薄膜;
将SiO2膜和TiO2膜进行叠加,得到SiO2/TiO2复合薄膜;
其中,氩气采用高纯氩气,纯度为99.999%;
氧气采用高纯氧气,纯度为99.999%。
SiO2/TiO2复合薄膜的膜层厚度为60nm;
步骤五中,光固化油墨层的厚度为20-25μm;
其中,光固化油墨层能够用PET透明膜替换。
步骤一中,基板的制备为将20-60重量份的聚碳酸酯、30-50重量份的聚甲基丙烯酸酯、3-10重量份的无色着色剂、1-3重量份的马来酸酐接枝聚烯烃、0.1-0.5重量份的润滑剂、0.1-1重量份的固化剂、0.1-1.5重量份的硅烷偶联剂、抗氧剂0.1-0.6份和1-5重量份的纳米二氧化硅经高速混合至160℃,将混合均匀的物料加入到双螺杆造粒机中,在180℃进行混炼塑化后,复合挤出后放入模具中压铸成型,冷却,得到基板;
本发明的核心点之一:在于颜色膜采用SiO2/TiO2复合薄膜,设置在反光层和光固化油墨层之间,有助于提高光催化性能,提高光透过率,光线从透明面层穿入,依次经过光固化油墨层、颜色膜在反光层的作用下将光线反射出去,颜色膜在光线反射下呈现出其颜色效果,SiO2/TiO2复合薄膜具有高光透过率,不会存在失真问题,从而体现出丰富色彩及质感效果,达到预期的外观视觉效果从而满足人们个性化需求;
本发明的核心点之二:在于基板镀膜前进行等离子体处理,实现对基板表面的清洁和除静电的作用,激活基板表面性能,提高表面能,提高基板对膜层的吸附力,提高镀膜效果;
本发明的核心点之三:在于反光层采用氧化铟锡薄膜,利用其金属分子连续性差和在常温下铟不被空气氧化的原理,即被溅射金属粒子离开温度较高的阴极靶面后不会被氧化,通过狭峰沉积在复合材料表面形成金属铟膜层,在一定的厚度范围内,使其具有银白色的外观并且电阻大,电阻值大于4000Mw。
以上对本发明的一个实施例进行了详细说明,但所述内容仅为本发明的较佳实施例,不能被认为用于限定本发明的实施范围。凡依本发明申请范围所作的均等变化与改进等,均应仍归属于本发明的专利涵盖范围之内。
Claims (10)
1.一种复合板材提高亮度的加工工艺,其特征在于,包括以下步骤:
步骤一:制备基板,用裁切机对复合板材进行裁切,并进行表面处理,得到被镀基底;
步骤二:对步骤一中的被镀基底进行镀硅处理,得到打底层;
步骤三:通过光学蒸发镀膜机真空溅射反光层溶胶在步骤二中的打底层电镀形成反光层;
步骤四:通过光学蒸发镀膜机在步骤三中的反光层上镀SiO2膜和TiO2膜形成颜色膜;
步骤五:对经过上述步骤处理的复合板材表面喷涂耐磨光固化油墨层,并经CNC精雕,得到手机背板成品。
2.根据权利要求1所述的一种复合板材提高亮度的加工工艺,其特征在于,步骤一中,采用等离子体对基板表面进行清洗。
3.根据权利要求1所述的一种复合板材提高亮度的加工工艺,其特征在于,步骤二中,打底层的厚度为100-120nm。
4.根据权利要求1所述的一种复合板材提高亮度的加工工艺,其特征在于,步骤三中,反光层为氧化铟锡薄膜,反光层的厚度为30-40nm。
5.根据权利要求1所述的一种复合板材提高亮度的加工工艺,其特征在于,步骤三中,反光溶胶的制备步骤为:
S1:将一定量的铟溶解在浓酸盐中得到InCl 3溶液,取出一定量的InCl 3溶液,与乙酰丙酮按1:2-1:3的摩尔比混合搅拌得到透明溶液;
S2:再按透明溶液与乙二醇甲醚的质量比为80:5的比例加入乙二醇甲醚,在室温下搅拌,得到In溶胶;
S3:按In:Sn质量比为15:6的比例加入SnCl 4·5H2O,搅拌20min得到In-Sn溶胶;
S4:按In-Sn溶胶与聚乙二醇的质量比为80:20的比例加入聚乙二醇,静置40min得到反光层溶胶。
6.根据权利要求1所述的一种复合板材提高亮度的加工工艺,其特征在于,步骤四中,颜色膜采用SiO2/TiO2复合薄膜,颜色膜的厚度为50-70nm。
7.根据权利要求1所述的一种复合板材提高亮度的加工工艺,其特征在于,步骤四中,光学蒸发镀膜机镀SiO2膜采用氩气为保护气体;
光学蒸发镀膜机镀TiO2膜采用氧气为保护气体。
8.根据权利要求7所述的一种复合板材提高亮度的加工工艺,其特征在于,氩气采用高纯氩气,纯度为99.999%。
9.根据权利要求7所述的一种复合板材提高亮度的加工工艺,其特征在于,氧气采用高纯氧气,纯度为99.999%。
10.根据权利要求1所述的一种复合板材提高亮度的加工工艺,其特征在于,步骤五中,光固化油墨层的厚度为20-25μm。
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