CN110462518A - 感光性元件及感光性元件卷 - Google Patents
感光性元件及感光性元件卷 Download PDFInfo
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- CN110462518A CN110462518A CN201880021374.8A CN201880021374A CN110462518A CN 110462518 A CN110462518 A CN 110462518A CN 201880021374 A CN201880021374 A CN 201880021374A CN 110462518 A CN110462518 A CN 110462518A
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- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 229920005787 opaque polymer Polymers 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical class [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 208000007578 phototoxic dermatitis Diseases 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- DSNYFFJTZPIKFZ-UHFFFAOYSA-N propoxybenzene Chemical group CCCOC1=CC=CC=C1 DSNYFFJTZPIKFZ-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/18—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by features of a layer of foamed material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Structural Engineering (AREA)
- Human Computer Interaction (AREA)
- Architecture (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2017/013698 WO2018179370A1 (ja) | 2017-03-31 | 2017-03-31 | 感光性エレメント及び感光性エレメントロール |
| JPPCT/JP2017/013698 | 2017-03-31 | ||
| PCT/JP2018/012196 WO2018181209A1 (ja) | 2017-03-31 | 2018-03-26 | 感光性エレメント及び感光性エレメントロール |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110462518A true CN110462518A (zh) | 2019-11-15 |
Family
ID=61756507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880021374.8A Pending CN110462518A (zh) | 2017-03-31 | 2018-03-26 | 感光性元件及感光性元件卷 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6299940B1 (ja) |
| KR (1) | KR20190133009A (ja) |
| CN (1) | CN110462518A (ja) |
| WO (2) | WO2018179370A1 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020012651A1 (ja) * | 2018-07-13 | 2020-01-16 | 日立化成株式会社 | センシングデバイス用感光性フィルムロールの製造方法及びセンシングデバイス用感光性フィルムロール |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11147246A (ja) * | 1997-11-17 | 1999-06-02 | Sekisui Chem Co Ltd | 超高分子量ポリエチレンシートの製造方法 |
| JP2000330291A (ja) * | 1999-03-18 | 2000-11-30 | Hitachi Chem Co Ltd | 感光性エレメント、これを用いたレジストパターンの製造法、プリント配線板の製造法及びリードフレームの製造法 |
| JP2003228168A (ja) * | 1999-03-18 | 2003-08-15 | Hitachi Chem Co Ltd | レジストパターンの製造法、プリント配線板の製造法及びリードフレームの製造法 |
| JP2004125869A (ja) * | 2002-09-30 | 2004-04-22 | Hitachi Chem Co Ltd | 反射下地感光性エレメント |
| JP2004191877A (ja) * | 2002-12-13 | 2004-07-08 | Asahi Kasei Chemicals Corp | フレキソ印刷用感光性構成体 |
| JP2004255811A (ja) * | 2003-02-27 | 2004-09-16 | Asahi Kasei Chemicals Corp | 印刷版用円筒状クッション構成体 |
| JP2006106287A (ja) * | 2004-10-04 | 2006-04-20 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント及び感光性エレメントの製造方法 |
| CN104122755A (zh) * | 2013-04-24 | 2014-10-29 | 日立化成株式会社 | 感光性元件、感光性元件卷、抗蚀图案的制造方法以及电子部件 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62284716A (ja) * | 1986-06-04 | 1987-12-10 | Toray Ind Inc | ポリエステルの成形方法 |
| JP3380616B2 (ja) | 1994-03-16 | 2003-02-24 | 日立化成工業株式会社 | カバーレイ形成用感光性樹脂組成物、感光性フィルム、カバーレイの製造方法及びカバーレイ |
| JPH11133617A (ja) | 1997-10-28 | 1999-05-21 | Hitachi Chem Co Ltd | ケミカルミーリング用感光性樹脂組成物及びこれを用いた感光性フィルム |
| JP4449402B2 (ja) | 2003-08-25 | 2010-04-14 | 日立化成工業株式会社 | 永久レジスト用感光性樹脂組成物、永久レジスト用感光性フィルム、レジストパターンの形成方法及びプリント配線板 |
| JP2006154622A (ja) * | 2004-12-01 | 2006-06-15 | Fuji Photo Film Co Ltd | パターン形成材料及びパターン形成方法 |
| JP5201066B2 (ja) | 2008-06-19 | 2013-06-05 | Ｊｓｒ株式会社 | タッチパネルの保護膜形成用感放射線性樹脂組成物とその形成方法 |
| JP5617329B2 (ja) | 2010-04-28 | 2014-11-05 | 東洋インキＳｃホールディングス株式会社 | 感光性樹脂組成物およびタッチパネル用絶縁膜 |
| PL2867019T3 (pl) * | 2012-06-29 | 2023-04-24 | Saint-Gobain Performance Plastics Pampus Gmbh | Łożysko ślizgowe zawierające system podkładu jako promotor przyczepności |
| JP2015172674A (ja) * | 2014-03-12 | 2015-10-01 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、硬化膜付き透明基板の製造方法及び硬化膜付き透明基板 |
-
2017
- 2017-03-31 WO PCT/JP2017/013698 patent/WO2018179370A1/ja active Application Filing
- 2017-03-31 JP JP2017566044A patent/JP6299940B1/ja active Active
-
2018
- 2018-03-26 CN CN201880021374.8A patent/CN110462518A/zh active Pending
- 2018-03-26 WO PCT/JP2018/012196 patent/WO2018181209A1/ja active Application Filing
- 2018-03-26 KR KR1020197028603A patent/KR20190133009A/ko unknown
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11147246A (ja) * | 1997-11-17 | 1999-06-02 | Sekisui Chem Co Ltd | 超高分子量ポリエチレンシートの製造方法 |
| JP2000330291A (ja) * | 1999-03-18 | 2000-11-30 | Hitachi Chem Co Ltd | 感光性エレメント、これを用いたレジストパターンの製造法、プリント配線板の製造法及びリードフレームの製造法 |
| JP2003228168A (ja) * | 1999-03-18 | 2003-08-15 | Hitachi Chem Co Ltd | レジストパターンの製造法、プリント配線板の製造法及びリードフレームの製造法 |
| JP2004125869A (ja) * | 2002-09-30 | 2004-04-22 | Hitachi Chem Co Ltd | 反射下地感光性エレメント |
| JP2004191877A (ja) * | 2002-12-13 | 2004-07-08 | Asahi Kasei Chemicals Corp | フレキソ印刷用感光性構成体 |
| JP2004255811A (ja) * | 2003-02-27 | 2004-09-16 | Asahi Kasei Chemicals Corp | 印刷版用円筒状クッション構成体 |
| JP2006106287A (ja) * | 2004-10-04 | 2006-04-20 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント及び感光性エレメントの製造方法 |
| CN104122755A (zh) * | 2013-04-24 | 2014-10-29 | 日立化成株式会社 | 感光性元件、感光性元件卷、抗蚀图案的制造方法以及电子部件 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2018179370A1 (ja) | 2019-04-04 |
| WO2018179370A1 (ja) | 2018-10-04 |
| WO2018181209A1 (ja) | 2018-10-04 |
| KR20190133009A (ko) | 2019-11-29 |
| JP6299940B1 (ja) | 2018-03-28 |
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