CN110416061B - 形成低k层的方法和形成半导体装置的方法 - Google Patents

形成低k层的方法和形成半导体装置的方法 Download PDF

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CN110416061B
CN110416061B CN201910292773.4A CN201910292773A CN110416061B CN 110416061 B CN110416061 B CN 110416061B CN 201910292773 A CN201910292773 A CN 201910292773A CN 110416061 B CN110416061 B CN 110416061B
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source
providing
layer
carbon
oxygen
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CN110416061A (zh
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李善英
康珉材
娟 金
金娟
金台原
卓容奭
金善政
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Samsung Electronics Co Ltd
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