CN110114419B - 柔性纳米颗粒光学涂料组合物 - Google Patents
柔性纳米颗粒光学涂料组合物 Download PDFInfo
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- CN110114419B CN110114419B CN201780081493.8A CN201780081493A CN110114419B CN 110114419 B CN110114419 B CN 110114419B CN 201780081493 A CN201780081493 A CN 201780081493A CN 110114419 B CN110114419 B CN 110114419B
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/106—Esters of polycondensation macromers
- C08F222/1065—Esters of polycondensation macromers of alcohol terminated (poly)urethanes, e.g. urethane(meth)acrylates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/08—Homopolymers or copolymers of acrylic acid esters
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1818—C13or longer chain (meth)acrylate, e.g. stearyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2237—Oxides; Hydroxides of metals of titanium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2244—Oxides; Hydroxides of metals of zirconium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/011—Nanostructured additives
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Optics & Photonics (AREA)
- Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Electroluminescent Light Sources (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662439981P | 2016-12-29 | 2016-12-29 | |
| US62/439,981 | 2016-12-29 | ||
| PCT/IB2017/058442 WO2018122749A1 (en) | 2016-12-29 | 2017-12-27 | Flexible nanoparticle optical coating compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110114419A CN110114419A (zh) | 2019-08-09 |
| CN110114419B true CN110114419B (zh) | 2021-11-23 |
Family
ID=61163754
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780081493.8A Active CN110114419B (zh) | 2016-12-29 | 2017-12-27 | 柔性纳米颗粒光学涂料组合物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11034843B2 (enExample) |
| JP (1) | JP7076888B2 (enExample) |
| KR (1) | KR102637049B1 (enExample) |
| CN (1) | CN110114419B (enExample) |
| WO (1) | WO2018122749A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3704199B1 (en) * | 2017-11-02 | 2025-12-31 | Zephyros, Inc. | Induction-activated adhesives and sealants |
| TWI691563B (zh) * | 2018-06-28 | 2020-04-21 | 長興材料工業股份有限公司 | 光可固化塗料組合物及其應用 |
| CN114026187B (zh) | 2019-06-27 | 2023-03-10 | 3M创新有限公司 | 具有高折射率的金属-聚合物杂化材料 |
| WO2021053534A1 (en) | 2019-09-18 | 2021-03-25 | 3M Innovative Properties Company | Articles including nanostructured surfaces and enclosed voids, and methods of making same |
| US11999844B2 (en) * | 2020-03-09 | 2024-06-04 | Rohm And Haas Electronic Materials Llc | Optically clear shear thickening fluids and optical display device comprising same |
| US20230286824A1 (en) * | 2020-08-27 | 2023-09-14 | 3M Innovative Properties Company | Surface-Modified Transition Metal Oxide Nanoparticles, Method of Making the Same, and Curable Composition and Article Including the Same |
| CN116507684A (zh) * | 2020-10-12 | 2023-07-28 | 默克专利股份有限公司 | 组合物 |
| CN113422188B (zh) * | 2021-06-24 | 2022-04-15 | 上海交通大学 | 利用3d打印制备单模柔性可拉伸太赫兹波导的方法及波导 |
| TWI815191B (zh) | 2021-09-30 | 2023-09-11 | 新應材股份有限公司 | 樹脂組成物以及硬化膜 |
| CN116355486B (zh) * | 2023-04-11 | 2024-06-04 | 深圳市大昆仑数码科技有限公司 | 一种高分子贴纸防护剂及其制备方法和应用 |
| CN117820885A (zh) * | 2023-08-31 | 2024-04-05 | 江苏双星彩塑新材料股份有限公司 | 一种高折射率光学涂料及其制备方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101095065A (zh) * | 2004-12-30 | 2007-12-26 | 3M创新有限公司 | 具有高折射率的耐久性硬涂层 |
| CN101124273A (zh) * | 2004-12-30 | 2008-02-13 | 3M创新有限公司 | 用于减反射涂层的耐久性高折射率纳米级复合材料 |
| CN104662689A (zh) * | 2012-02-28 | 2015-05-27 | 3M创新有限公司 | 适于光学耦合层的包含表面改性高折射率纳米粒子的组合物 |
| CN104870594A (zh) * | 2012-12-28 | 2015-08-26 | 3M创新有限公司 | 光学清晰的热熔融加工性高折射率粘合剂 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2736721A (en) | 1952-10-08 | 1956-02-28 | Optionally | |
| US5214119A (en) | 1986-06-20 | 1993-05-25 | Minnesota Mining And Manufacturing Company | Block copolymer, method of making the same, dimaine precursors of the same, method of making such diamines and end products comprising the block copolymer |
| JP2001305305A (ja) * | 2000-04-26 | 2001-10-31 | Omron Corp | 耐光性マイクロレンズアレイ |
| JP4627355B2 (ja) * | 2000-06-23 | 2011-02-09 | 大日本印刷株式会社 | 高屈折率コーティング組成物、高屈折率塗膜、画像表示装置、及び、反射防止フィルム |
| JP4187454B2 (ja) * | 2002-03-29 | 2008-11-26 | 大日本印刷株式会社 | 反射防止フィルム |
| JP2004307579A (ja) * | 2003-04-03 | 2004-11-04 | Mitsubishi Chemicals Corp | 活性エネルギー線硬化性コーティング剤組成物及び該組成物から得られる硬化皮膜を有する成形品 |
| US7371464B2 (en) | 2005-12-23 | 2008-05-13 | 3M Innovative Properties Company | Adhesive compositions |
| KR101257136B1 (ko) | 2006-01-12 | 2013-04-23 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 집광 필름 |
| US7615283B2 (en) * | 2006-06-13 | 2009-11-10 | 3M Innovative Properties Company | Fluoro(meth)acrylate polymer composition suitable for low index layer of antireflective film |
| EP2118149B1 (en) | 2007-02-27 | 2012-05-23 | 3M Innovative Properties Company | Brightness enhancing film comprising nanocomposite structure having improved crack resistance |
| EP2231804B1 (en) | 2007-12-27 | 2016-09-07 | 3M Innovative Properties Company | Urea-based pressure sensitive adhesives |
| US8080608B2 (en) * | 2008-06-03 | 2011-12-20 | 3M Innovative Properties Company | Optical films comprising phenyl ethylene (meth)acrylate monomers |
| US8343622B2 (en) * | 2008-07-01 | 2013-01-01 | 3M Innovative Properties Company | Flexible high refractive index hardcoat |
| US20100110551A1 (en) | 2008-10-31 | 2010-05-06 | 3M Innovative Properties Company | Light extraction film with high index backfill layer and passivation layer |
| WO2010074862A1 (en) * | 2008-12-15 | 2010-07-01 | 3M Innovative Properties Company | High refractive index inorganic oxide nanoparticles comprising surface treatment, polymerizable resin, and articles |
| JP2010198735A (ja) * | 2009-02-20 | 2010-09-09 | Fujifilm Corp | 光学部材及び該光学部材を備えた有機エレクトロルミネッセンス表示装置 |
| US7981995B2 (en) | 2009-09-21 | 2011-07-19 | 3M Innovative Properties Company | Silicone polyoxamide and silicone polyoxamide-hydrazide copolymers |
| JP2012082386A (ja) * | 2010-09-14 | 2012-04-26 | Dic Corp | 光学材料用高屈折組成物およびその硬化物 |
| JP2012140534A (ja) * | 2010-12-28 | 2012-07-26 | Jgc Catalysts & Chemicals Ltd | 透明被膜形成用塗布液および透明被膜付基材 |
| CN106397658B (zh) * | 2011-05-13 | 2019-12-10 | 3M创新有限公司 | 适用于微结构化光学膜的(甲基)丙烯酸苄酯单体 |
| US8659221B2 (en) | 2011-08-26 | 2014-02-25 | 3M Innovative Properties Company | OLED light extraction film with multi-periodic zones of nanostructures |
| JP5952040B2 (ja) * | 2012-03-15 | 2016-07-13 | 東京応化工業株式会社 | 光インプリント用の膜形成組成物及び光学部材の製造方法 |
| JP2014120323A (ja) * | 2012-12-17 | 2014-06-30 | Dainippon Printing Co Ltd | トップエミッション型有機エレクトロルミネッセンス装置の製造方法 |
-
2017
- 2017-12-27 JP JP2019535818A patent/JP7076888B2/ja active Active
- 2017-12-27 CN CN201780081493.8A patent/CN110114419B/zh active Active
- 2017-12-27 US US16/473,910 patent/US11034843B2/en active Active
- 2017-12-27 WO PCT/IB2017/058442 patent/WO2018122749A1/en not_active Ceased
- 2017-12-27 KR KR1020197021736A patent/KR102637049B1/ko active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101095065A (zh) * | 2004-12-30 | 2007-12-26 | 3M创新有限公司 | 具有高折射率的耐久性硬涂层 |
| CN101124273A (zh) * | 2004-12-30 | 2008-02-13 | 3M创新有限公司 | 用于减反射涂层的耐久性高折射率纳米级复合材料 |
| CN104662689A (zh) * | 2012-02-28 | 2015-05-27 | 3M创新有限公司 | 适于光学耦合层的包含表面改性高折射率纳米粒子的组合物 |
| CN104870594A (zh) * | 2012-12-28 | 2015-08-26 | 3M创新有限公司 | 光学清晰的热熔融加工性高折射率粘合剂 |
Also Published As
| Publication number | Publication date |
|---|---|
| US11034843B2 (en) | 2021-06-15 |
| JP2020514464A (ja) | 2020-05-21 |
| KR102637049B1 (ko) | 2024-02-14 |
| CN110114419A (zh) | 2019-08-09 |
| WO2018122749A1 (en) | 2018-07-05 |
| US20190338142A1 (en) | 2019-11-07 |
| JP7076888B2 (ja) | 2022-05-30 |
| KR20190098759A (ko) | 2019-08-22 |
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