CN110095936A - 着色感光性树脂组合物、滤色器及图像显示装置 - Google Patents
着色感光性树脂组合物、滤色器及图像显示装置 Download PDFInfo
- Publication number
- CN110095936A CN110095936A CN201910059478.4A CN201910059478A CN110095936A CN 110095936 A CN110095936 A CN 110095936A CN 201910059478 A CN201910059478 A CN 201910059478A CN 110095936 A CN110095936 A CN 110095936A
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- photosensitive composition
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180011918A KR101933940B1 (ko) | 2018-01-31 | 2018-01-31 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 블랙 매트릭스 및/또는 컬럼 스페이서를 포함하는 컬러필터 및 컬러필터를 포함하는 화상표시장치 |
KR10-2018-0011918 | 2018-01-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110095936A true CN110095936A (zh) | 2019-08-06 |
Family
ID=64959675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910059478.4A Pending CN110095936A (zh) | 2018-01-31 | 2019-01-22 | 着色感光性树脂组合物、滤色器及图像显示装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2019133144A (ko) |
KR (1) | KR101933940B1 (ko) |
CN (1) | CN110095936A (ko) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1577089A (zh) * | 2003-07-16 | 2005-02-09 | 住友化学工业株式会社 | 着色感光性树脂组合物 |
CN102471616A (zh) * | 2009-07-07 | 2012-05-23 | 富士胶片株式会社 | 遮光膜用着色组合物,遮光图案,其形成方法,固体摄像装置及其制造方法 |
CN102549497A (zh) * | 2009-09-10 | 2012-07-04 | 东丽株式会社 | 感光性树脂组合物及感光性树脂膜的制造方法 |
CN103782237A (zh) * | 2011-08-30 | 2014-05-07 | 旭硝子株式会社 | 负型感光性树脂组合物、分隔壁、黑色矩阵以及光学元件 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3883310B2 (ja) * | 1998-11-18 | 2007-02-21 | 富士フイルムエレクトロニクスマテリアルズ株式会社 | カラー液晶表示装置用ブラックマトリックス形成材料 |
KR100617272B1 (ko) | 2005-11-25 | 2006-09-01 | 주식회사 에스앤에스텍 | 슬릿스캔 방식에 의한 포토레지스트 코팅 방법, 슬릿스캔방식에 의한 포토레지스트 코팅 방법에 의해 코팅된포토레지스트 막을 갖는 블랭크 마스크 및 이를 이용하여제조된 포토 마스크 |
JP5660774B2 (ja) * | 2009-11-04 | 2015-01-28 | 住友化学株式会社 | 着色感光性樹脂組成物、塗膜、パターン及び表示装置 |
JP2013050549A (ja) * | 2011-08-30 | 2013-03-14 | Asahi Glass Co Ltd | ネガ型感光性樹脂組成物、隔壁、光学素子 |
JP2013222028A (ja) * | 2012-04-16 | 2013-10-28 | Toppan Printing Co Ltd | 感光性黒色樹脂組成物、カラーフィルタ及び液晶表示装置 |
KR20180107146A (ko) * | 2016-02-12 | 2018-10-01 | 미쯔비시 케미컬 주식회사 | 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 |
KR102247840B1 (ko) * | 2016-03-18 | 2021-05-03 | 제이에스알 가부시끼가이샤 | 표시 소자용 기판, 표시 소자용 기판의 제조 방법 및 표시 소자 |
-
2018
- 2018-01-31 KR KR1020180011918A patent/KR101933940B1/ko active IP Right Grant
-
2019
- 2019-01-11 JP JP2019003141A patent/JP2019133144A/ja active Pending
- 2019-01-22 CN CN201910059478.4A patent/CN110095936A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1577089A (zh) * | 2003-07-16 | 2005-02-09 | 住友化学工业株式会社 | 着色感光性树脂组合物 |
CN102471616A (zh) * | 2009-07-07 | 2012-05-23 | 富士胶片株式会社 | 遮光膜用着色组合物,遮光图案,其形成方法,固体摄像装置及其制造方法 |
CN102549497A (zh) * | 2009-09-10 | 2012-07-04 | 东丽株式会社 | 感光性树脂组合物及感光性树脂膜的制造方法 |
CN103782237A (zh) * | 2011-08-30 | 2014-05-07 | 旭硝子株式会社 | 负型感光性树脂组合物、分隔壁、黑色矩阵以及光学元件 |
Also Published As
Publication number | Publication date |
---|---|
JP2019133144A (ja) | 2019-08-08 |
KR101933940B1 (ko) | 2018-12-31 |
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