CN110011176B - 激光加工装置和激光振荡器 - Google Patents
激光加工装置和激光振荡器 Download PDFInfo
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- CN110011176B CN110011176B CN201811494615.9A CN201811494615A CN110011176B CN 110011176 B CN110011176 B CN 110011176B CN 201811494615 A CN201811494615 A CN 201811494615A CN 110011176 B CN110011176 B CN 110011176B
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
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- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1611—Solid materials characterised by an active (lasing) ion rare earth neodymium
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1671—Solid materials characterised by a crystal matrix vanadate, niobate, tantalate
- H01S3/1673—YVO4 [YVO]
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0401—Arrangements for thermal management of optical elements being part of laser resonator, e.g. windows, mirrors, lenses
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
- H01S3/0815—Configuration of resonator having 3 reflectors, e.g. V-shaped resonators
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
- H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
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- H—ELECTRICITY
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
- H01S3/2391—Parallel arrangements emitting at different wavelengths
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- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Lasers (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
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| JP2017-239907 | 2017-12-14 | ||
| JP2017239907A JP7169062B2 (ja) | 2017-12-14 | 2017-12-14 | レーザ加工装置及びレーザ発振器 |
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| CN110011176B true CN110011176B (zh) | 2024-07-12 |
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| JP7115973B2 (ja) | 2018-12-28 | 2022-08-09 | 株式会社キーエンス | レーザ加工装置 |
| JP7181790B2 (ja) | 2018-12-28 | 2022-12-01 | 株式会社キーエンス | レーザ加工装置 |
| JP7507599B2 (ja) * | 2020-05-12 | 2024-06-28 | 株式会社ディスコ | レーザー加工方法 |
| US20230307882A1 (en) * | 2020-08-21 | 2023-09-28 | Ipg Photonics Corporation | Compact laser head |
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| CN1601332A (zh) * | 2003-09-26 | 2005-03-30 | 三菱电机株式会社 | 波长变换激光装置 |
| CN104937789A (zh) * | 2012-08-21 | 2015-09-23 | 高功率激光光电有限公司 | 具有用于紫外发生的可更换模块的高功率固态激光器 |
| CN105312783A (zh) * | 2014-07-31 | 2016-02-10 | 株式会社其恩斯 | 激光处理装置 |
| WO2017060967A1 (ja) * | 2015-10-06 | 2017-04-13 | 株式会社島津製作所 | 波長変換装置 |
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| JPH06222407A (ja) * | 1993-01-22 | 1994-08-12 | Ishikawajima Harima Heavy Ind Co Ltd | レーザ光の波長変換方法及びレーザ光の波長変換装置 |
| JPH11284269A (ja) * | 1998-03-13 | 1999-10-15 | Sei Josan | 固体レーザー第三高調波紫外光出力共振器構造 |
| JP2000202655A (ja) | 1999-01-08 | 2000-07-25 | Toray Eng Co Ltd | レ―ザ―マ―キング装置 |
| US6366596B1 (en) | 2000-01-21 | 2002-04-02 | Photonics Industries International, Inc. | High power laser |
| JP3978307B2 (ja) | 2000-02-09 | 2007-09-19 | 株式会社日立製作所 | 紫外レーザ光発生装置並びに欠陥検査装置およびその方法 |
| JP2004219878A (ja) * | 2003-01-17 | 2004-08-05 | Orc Mfg Co Ltd | 波長変換レーザー装置 |
| JP2004317566A (ja) | 2003-04-11 | 2004-11-11 | Orc Mfg Co Ltd | レーザ装置及びレーザ波長変換装置 |
| JP2005317743A (ja) * | 2004-04-28 | 2005-11-10 | Miyachi Technos Corp | レーザ装置及びレーザ加工方法 |
| JP2006147987A (ja) | 2004-11-24 | 2006-06-08 | Keyence Corp | レーザー発振器 |
| JP2006324321A (ja) * | 2005-05-17 | 2006-11-30 | Miyachi Technos Corp | 高調波レーザ装置及びレーザ加工装置 |
| JP2007273558A (ja) | 2006-03-30 | 2007-10-18 | Mitsubishi Electric Corp | 波長変換レーザ装置 |
| JP2008242184A (ja) | 2007-03-28 | 2008-10-09 | Mitsubishi Electric Corp | 波長変換装置、紫外線レーザ装置およびレーザ加工装置 |
| JP2009142864A (ja) | 2007-12-14 | 2009-07-02 | Keyence Corp | レーザ加工装置、レーザ加工装置の設定方法及びレーザ加工装置の設定プログラム並びにコンピュータで読取可能な記録媒体 |
| JP2009253068A (ja) * | 2008-04-08 | 2009-10-29 | Miyachi Technos Corp | レーザ発振器及びレーザ加工装置 |
| US7903701B2 (en) | 2009-03-27 | 2011-03-08 | Electro Scientific Industries, Inc. | Intracavity harmonic generation using a recycled intermediate harmonic |
| JP2010243559A (ja) | 2009-04-01 | 2010-10-28 | Nikon Corp | 光源装置 |
| JP2010251448A (ja) | 2009-04-14 | 2010-11-04 | Shimadzu Corp | 第三高調波を出力する固体パルスレーザ装置 |
| JP2014149315A (ja) | 2011-05-31 | 2014-08-21 | Mitsubishi Electric Corp | 高調波レーザ発振器 |
| JP2015122341A (ja) | 2012-04-09 | 2015-07-02 | 三菱電機株式会社 | レーザ装置 |
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2017
- 2017-12-14 JP JP2017239907A patent/JP7169062B2/ja active Active
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- 2018-10-23 US US16/167,556 patent/US11050212B2/en active Active
- 2018-12-04 DE DE102018220888.3A patent/DE102018220888A1/de active Pending
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| CN1601332A (zh) * | 2003-09-26 | 2005-03-30 | 三菱电机株式会社 | 波长变换激光装置 |
| CN104937789A (zh) * | 2012-08-21 | 2015-09-23 | 高功率激光光电有限公司 | 具有用于紫外发生的可更换模块的高功率固态激光器 |
| CN105312783A (zh) * | 2014-07-31 | 2016-02-10 | 株式会社其恩斯 | 激光处理装置 |
| WO2017060967A1 (ja) * | 2015-10-06 | 2017-04-13 | 株式会社島津製作所 | 波長変換装置 |
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| Publication number | Publication date |
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| US20190190227A1 (en) | 2019-06-20 |
| CN110011176A (zh) | 2019-07-12 |
| DE102018220888A1 (de) | 2019-06-19 |
| US11050212B2 (en) | 2021-06-29 |
| JP2019106511A (ja) | 2019-06-27 |
| JP7169062B2 (ja) | 2022-11-10 |
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