CN109976102A - 光照射装置 - Google Patents
光照射装置 Download PDFInfo
- Publication number
- CN109976102A CN109976102A CN201811606724.5A CN201811606724A CN109976102A CN 109976102 A CN109976102 A CN 109976102A CN 201811606724 A CN201811606724 A CN 201811606724A CN 109976102 A CN109976102 A CN 109976102A
- Authority
- CN
- China
- Prior art keywords
- light
- irradiation device
- emitting component
- light source
- corner
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017253774A JP6549690B2 (ja) | 2017-12-28 | 2017-12-28 | 光照射装置 |
JPJP2017-253774 | 2017-12-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN109976102A true CN109976102A (zh) | 2019-07-05 |
Family
ID=67076394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201811606724.5A Withdrawn CN109976102A (zh) | 2017-12-28 | 2018-12-27 | 光照射装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6549690B2 (ko) |
KR (1) | KR20190080758A (ko) |
CN (1) | CN109976102A (ko) |
TW (1) | TW201937302A (ko) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06338453A (ja) * | 1993-05-27 | 1994-12-06 | Nec Corp | 基板周辺部露光装置 |
CN105974741A (zh) * | 2015-03-11 | 2016-09-28 | 豪雅冠得股份有限公司 | 光照射装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS602261A (ja) | 1983-06-08 | 1985-01-08 | 川原 哲夫 | 避難用シユ−トにおける床板の製法 |
US5625738A (en) * | 1994-06-28 | 1997-04-29 | Corning Incorporated | Apparatus for uniformly illuminating a light valve |
JP2011150916A (ja) * | 2010-01-22 | 2011-08-04 | Toshiba Lighting & Technology Corp | 照明器具 |
JP2013215661A (ja) | 2012-04-06 | 2013-10-24 | Ushikata Shokai:Kk | 紫外光照射装置 |
TWI620889B (zh) * | 2013-04-15 | 2018-04-11 | Hoya Candeo Optronics Corp | Light irradiation device |
JP6215607B2 (ja) * | 2013-07-23 | 2017-10-18 | 浜松ホトニクス株式会社 | 光源装置 |
JP2015114633A (ja) * | 2013-12-14 | 2015-06-22 | Hoya Candeo Optronics株式会社 | 光照射装置 |
-
2017
- 2017-12-28 JP JP2017253774A patent/JP6549690B2/ja active Active
-
2018
- 2018-12-13 TW TW107145097A patent/TW201937302A/zh unknown
- 2018-12-20 KR KR1020180165991A patent/KR20190080758A/ko unknown
- 2018-12-27 CN CN201811606724.5A patent/CN109976102A/zh not_active Withdrawn
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06338453A (ja) * | 1993-05-27 | 1994-12-06 | Nec Corp | 基板周辺部露光装置 |
CN105974741A (zh) * | 2015-03-11 | 2016-09-28 | 豪雅冠得股份有限公司 | 光照射装置 |
Also Published As
Publication number | Publication date |
---|---|
TW201937302A (zh) | 2019-09-16 |
JP6549690B2 (ja) | 2019-07-24 |
JP2019121635A (ja) | 2019-07-22 |
KR20190080758A (ko) | 2019-07-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20200901 Address after: No. 10-1, liudingmu, Shinjuku, Tokyo, Japan Applicant after: HOYA Corp. Address before: Saitama Prefecture, Japan Applicant before: HOYA CANDEO OPTRONICS Corp. |
|
TA01 | Transfer of patent application right | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WW01 | Invention patent application withdrawn after publication |
Application publication date: 20190705 |
|
WW01 | Invention patent application withdrawn after publication |