CN109937614A - 芯片连线方法及结构 - Google Patents
芯片连线方法及结构 Download PDFInfo
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- CN109937614A CN109937614A CN201780070448.2A CN201780070448A CN109937614A CN 109937614 A CN109937614 A CN 109937614A CN 201780070448 A CN201780070448 A CN 201780070448A CN 109937614 A CN109937614 A CN 109937614A
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- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
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- H01L2224/83009—Pre-treatment of the layer connector or the bonding area
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- H01L2224/83013—Plasma cleaning
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- H01L2224/92—Specific sequence of method steps
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- H01L2224/9212—Sequential connecting processes
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- H01L2224/92144—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a build-up interconnect
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- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1517—Multilayer substrate
- H01L2924/15172—Fan-out arrangement of the internal vias
- H01L2924/15173—Fan-out arrangement of the internal vias in a single layer of the multilayer substrate
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- Production Of Multi-Layered Print Wiring Board (AREA)
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Abstract
一种芯片(201)连线方法及结构,其中芯片(201)连线方法包括:所述基板(100)设有第一连线(111b)和第二连线(111a、111c),在所述基板(100)的厚度方向上,所述第一连线(111b)与所述芯片(201)的距离小于所述第二连线(111a、111c)与所述芯片(201)的距离,将芯片(201)设于所述基板(100)的顶面,所述芯片(201)设有至少两个芯片引脚(211a、211b、211c),所述基板(100)设有第二通孔(121a、121c),所述第二通孔(121a、121c)与所述第二连线(111a、111c)对应,所述第二通孔(121a、121c)内设有第二导电层(401a、401c);其中,至少一个所述芯片引脚(211a、211b、211c)与所述第一连线(111b)电连接,另有至少一个所述芯片引脚(211a、211b、211c)与所述第二通孔(121a、121c)的第一开口(120c)对应、并且所述第二导电层(401a、401c)将所述芯片引脚(211a、211b、211c)与所述第二连线(111a、111c)电连接。连线绕过芯片引脚(211a、211b、211c)的遮挡,可以获得高密度的芯片引脚(211a、211b、211c)、连线,提高芯片(201)连接的节点数量,提高芯片(201)数据传输速度。
Description
PCT国内申请,说明书已公开。
Claims (17)
- PCT国内申请,权利要求书已公开。
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PCT/CN2016/107833 WO2018098649A1 (zh) | 2016-11-30 | 2016-11-30 | 集成电路封装方法以及集成封装电路 |
PCT/CN2017/076430 WO2018098922A1 (zh) | 2016-11-29 | 2017-03-13 | 芯片连线方法及结构 |
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US10896865B2 (en) * | 2018-11-13 | 2021-01-19 | Toyota Motor Engineering & Manufacturing North America, Inc. | Power electronics modules including an integrated cooling channel extending through an electrically-conductive substrate |
US11419213B2 (en) * | 2019-03-26 | 2022-08-16 | Western Digital Technologies, Inc. | Multilayer flex circuit with non-plated outer metal layer |
CN111312687A (zh) * | 2020-02-20 | 2020-06-19 | 京东方科技集团股份有限公司 | 柔性线路板及其制作方法、显示模组 |
TWI751554B (zh) * | 2020-05-12 | 2022-01-01 | 台灣愛司帝科技股份有限公司 | 影像顯示器及其拼接式電路承載與控制模組 |
CN114005848B (zh) * | 2020-07-28 | 2024-09-03 | 合肥鑫晟光电科技有限公司 | 一种驱动背板、其制作方法、背光模组及显示装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0863548A2 (en) * | 1997-03-03 | 1998-09-09 | Nec Corporation | Mounting assembly of integrated circuit device and method for production thereof |
CN1110078C (zh) * | 1996-06-07 | 2003-05-28 | 松下电器产业株式会社 | 半导体元件的安装方法 |
US20030137056A1 (en) * | 2002-01-18 | 2003-07-24 | Fujitsu Limited | Circuit substrate and method for fabricating the same |
CN101199242A (zh) * | 2005-06-16 | 2008-06-11 | 伊姆贝拉电子有限公司 | 电路板结构的制造方法和电路板结构 |
TW201134338A (en) * | 2010-03-16 | 2011-10-01 | Unitech Printed Circuit Board Corp | Manufacturing method of multilayer circuit board with embedded electronic component |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5171712A (en) * | 1991-12-20 | 1992-12-15 | Vlsi Technology, Inc. | Method of constructing termination electrodes on yielded semiconductor die by visibly aligning the die pads through a transparent substrate |
KR950012658B1 (ko) * | 1992-07-24 | 1995-10-19 | 삼성전자주식회사 | 반도체 칩 실장방법 및 기판 구조체 |
US5353498A (en) * | 1993-02-08 | 1994-10-11 | General Electric Company | Method for fabricating an integrated circuit module |
JPH08167630A (ja) * | 1994-12-15 | 1996-06-25 | Hitachi Ltd | チップ接続構造 |
US6475877B1 (en) * | 1999-12-22 | 2002-11-05 | General Electric Company | Method for aligning die to interconnect metal on flex substrate |
US7190080B1 (en) * | 2000-10-13 | 2007-03-13 | Bridge Semiconductor Corporation | Semiconductor chip assembly with embedded metal pillar |
CN100361284C (zh) * | 2001-10-19 | 2008-01-09 | 全懋精密科技股份有限公司 | 一种集成电路封装用基板结构及其制造方法 |
JP4654942B2 (ja) * | 2006-02-28 | 2011-03-23 | ミネベア株式会社 | 面状照明装置 |
US7898811B2 (en) * | 2007-04-10 | 2011-03-01 | Raled, Inc. | Thermal management of LEDs on a printed circuit board and associated methods |
US7553752B2 (en) * | 2007-06-20 | 2009-06-30 | Stats Chippac, Ltd. | Method of making a wafer level integration package |
JP5324191B2 (ja) * | 2008-11-07 | 2013-10-23 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
US9818734B2 (en) * | 2012-09-14 | 2017-11-14 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming build-up interconnect structures over a temporary substrate |
US9035194B2 (en) | 2012-10-30 | 2015-05-19 | Intel Corporation | Circuit board with integrated passive devices |
JP5681824B1 (ja) * | 2013-10-01 | 2015-03-11 | 株式会社フジクラ | 配線板組立体及びその製造方法 |
JP2016051847A (ja) * | 2014-09-01 | 2016-04-11 | イビデン株式会社 | プリント配線板、その製造方法及び半導体装置 |
US10615151B2 (en) * | 2016-11-30 | 2020-04-07 | Shenzhen Xiuyuan Electronic Technology Co., Ltd | Integrated circuit multichip stacked packaging structure and method |
-
2016
- 2016-11-30 WO PCT/CN2016/107833 patent/WO2018098649A1/zh active Application Filing
- 2016-11-30 CN CN201680090833.9A patent/CN110024107B/zh active Active
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- 2017-03-13 CN CN201780070448.2A patent/CN109937614B/zh active Active
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1110078C (zh) * | 1996-06-07 | 2003-05-28 | 松下电器产业株式会社 | 半导体元件的安装方法 |
EP0863548A2 (en) * | 1997-03-03 | 1998-09-09 | Nec Corporation | Mounting assembly of integrated circuit device and method for production thereof |
US20030137056A1 (en) * | 2002-01-18 | 2003-07-24 | Fujitsu Limited | Circuit substrate and method for fabricating the same |
CN101199242A (zh) * | 2005-06-16 | 2008-06-11 | 伊姆贝拉电子有限公司 | 电路板结构的制造方法和电路板结构 |
TW201134338A (en) * | 2010-03-16 | 2011-10-01 | Unitech Printed Circuit Board Corp | Manufacturing method of multilayer circuit board with embedded electronic component |
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