CN109037099B - 晶片容器的气体供应装置 - Google Patents

晶片容器的气体供应装置 Download PDF

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Publication number
CN109037099B
CN109037099B CN201810592471.4A CN201810592471A CN109037099B CN 109037099 B CN109037099 B CN 109037099B CN 201810592471 A CN201810592471 A CN 201810592471A CN 109037099 B CN109037099 B CN 109037099B
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China
Prior art keywords
wafer container
nozzle
piston
gas
gas supply
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CN201810592471.4A
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English (en)
Chinese (zh)
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CN109037099A (zh
Inventor
金弘烈
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Lishi Tema Co ltd
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Lishi Tema Co ltd
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Publication of CN109037099A publication Critical patent/CN109037099A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02082—Cleaning product to be cleaned
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN201810592471.4A 2017-06-09 2018-06-11 晶片容器的气体供应装置 Active CN109037099B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2017-0072609 2017-06-09
KR1020170072609A KR101956797B1 (ko) 2017-06-09 2017-06-09 웨이퍼 용기의 가스공급장치

Publications (2)

Publication Number Publication Date
CN109037099A CN109037099A (zh) 2018-12-18
CN109037099B true CN109037099B (zh) 2022-03-08

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ID=64612455

Family Applications (1)

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CN201810592471.4A Active CN109037099B (zh) 2017-06-09 2018-06-11 晶片容器的气体供应装置

Country Status (4)

Country Link
KR (1) KR101956797B1 (ko)
CN (1) CN109037099B (ko)
SG (1) SG10201804853QA (ko)
TW (1) TWI697027B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102126527B1 (ko) * 2019-11-11 2020-06-26 주식회사 케이씨티 질소 퍼지 기능을 구비한 풉 스테이지 모듈
KR102228698B1 (ko) * 2020-05-26 2021-03-18 주식회사 케이씨 가스 공급 장치
CN114242626B (zh) * 2021-12-21 2022-04-29 智程半导体设备科技(昆山)有限公司 一种干法晶圆片清洗设备
CN117954361A (zh) * 2024-03-26 2024-04-30 沈阳元创半导体有限公司 一种应用于晶圆装载机的吹扫机构

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007005599A (ja) * 2005-06-24 2007-01-11 Kondo Kogyo Kk シャッター付きブレスフィルター装置および該装置に使用するシャッター押上げロッド並びにシャッター押上げロッド付きノズル
JP2014036049A (ja) * 2012-08-07 2014-02-24 Sinfonia Technology Co Ltd パージノズルユニット、パージ装置、ロードポート
CN105149140A (zh) * 2010-03-05 2015-12-16 翔风技术有限公司 喷嘴驱动单元和气体注入装置
JP5958446B2 (ja) * 2013-10-28 2016-08-02 Tdk株式会社 ロードポート装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3939101B2 (ja) * 2000-12-04 2007-07-04 株式会社荏原製作所 基板搬送方法および基板搬送容器
WO2010137556A1 (ja) * 2009-05-27 2010-12-02 ローツェ株式会社 雰囲気置換装置
JP5887719B2 (ja) * 2011-05-31 2016-03-16 シンフォニアテクノロジー株式会社 パージ装置、ロードポート、ボトムパージノズル本体、ボトムパージユニット
JP6131534B2 (ja) * 2012-06-11 2017-05-24 シンフォニアテクノロジー株式会社 パージノズルユニット、ロードポート、載置台、ストッカー
TWI712098B (zh) * 2014-12-01 2020-12-01 美商恩特葛瑞斯股份有限公司 基板容器、用於基板容器之閥總成、沖洗模組及其替換方法
JP6561700B2 (ja) * 2015-09-04 2019-08-21 シンフォニアテクノロジー株式会社 ガス注入装置
TWI567856B (zh) * 2015-09-08 2017-01-21 古震維 具有吹淨功能的晶圓傳送裝置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007005599A (ja) * 2005-06-24 2007-01-11 Kondo Kogyo Kk シャッター付きブレスフィルター装置および該装置に使用するシャッター押上げロッド並びにシャッター押上げロッド付きノズル
CN105149140A (zh) * 2010-03-05 2015-12-16 翔风技术有限公司 喷嘴驱动单元和气体注入装置
JP2014036049A (ja) * 2012-08-07 2014-02-24 Sinfonia Technology Co Ltd パージノズルユニット、パージ装置、ロードポート
JP5958446B2 (ja) * 2013-10-28 2016-08-02 Tdk株式会社 ロードポート装置

Also Published As

Publication number Publication date
KR20180134626A (ko) 2018-12-19
SG10201804853QA (en) 2019-01-30
CN109037099A (zh) 2018-12-18
TWI697027B (zh) 2020-06-21
TW201903838A (zh) 2019-01-16
KR101956797B1 (ko) 2019-03-12

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