CN108957720B - 受激辐射损耗光学显微镜及其照明系统 - Google Patents

受激辐射损耗光学显微镜及其照明系统 Download PDF

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Publication number
CN108957720B
CN108957720B CN201811125387.8A CN201811125387A CN108957720B CN 108957720 B CN108957720 B CN 108957720B CN 201811125387 A CN201811125387 A CN 201811125387A CN 108957720 B CN108957720 B CN 108957720B
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light
light beam
optical
illumination
wave plate
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Chinese (zh)
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CN108957720A (zh
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袁景和
于建强
方晓红
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Qinghe Jingyuan Semiconductor Technology (Group) Co.,Ltd.
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Institute of Chemistry CAS
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Priority to JP2020551913A priority patent/JP7073523B2/ja
Priority to PCT/CN2018/121206 priority patent/WO2020062609A1/zh
Priority to EP18934542.4A priority patent/EP3757650B1/en
Priority to US17/043,615 priority patent/US11726309B2/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052—Optical details of the image generation
    • G02B21/0076—Optical details of the image generation arrangements using fluorescence or luminescence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
CN201811125387.8A 2018-09-26 2018-09-26 受激辐射损耗光学显微镜及其照明系统 Active CN108957720B (zh)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CN201811125387.8A CN108957720B (zh) 2018-09-26 2018-09-26 受激辐射损耗光学显微镜及其照明系统
JP2020551913A JP7073523B2 (ja) 2018-09-26 2018-12-14 Ｓｔｅｄ光学顕微鏡に用いる照明システム及びｓｔｅｄ光学顕微鏡
PCT/CN2018/121206 WO2020062609A1 (zh) 2018-09-26 2018-12-14 用于sted光学显微镜的照明系统及sted光学显微镜
EP18934542.4A EP3757650B1 (en) 2018-09-26 2018-12-14 Illumination system for sted optical microscope and sted optical microscope
US17/043,615 US11726309B2 (en) 2018-09-26 2018-12-14 Illumination system for STED optical microscope and STED optical microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811125387.8A CN108957720B (zh) 2018-09-26 2018-09-26 受激辐射损耗光学显微镜及其照明系统

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CN108957720A CN108957720A (zh) 2018-12-07
CN108957720B true CN108957720B (zh) 2019-12-10

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US (1) US11726309B2 (enExample)
EP (1) EP3757650B1 (enExample)
JP (1) JP7073523B2 (enExample)
CN (1) CN108957720B (enExample)
WO (1) WO2020062609A1 (enExample)

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CN108957720B (zh) 2018-09-26 2019-12-10 中国科学院化学研究所 受激辐射损耗光学显微镜及其照明系统
CN111722388B (zh) * 2019-03-18 2025-05-30 深圳市泽玖科技有限公司 一种三维微型内窥镜
CN110068560B (zh) * 2019-04-17 2021-08-06 深圳大学 一种受激辐射损耗超分辨成像系统及方法
WO2020211018A1 (zh) * 2019-04-17 2020-10-22 深圳大学 一种受激辐射损耗超分辨成像系统及方法
US11271747B2 (en) 2019-09-16 2022-03-08 Lawrence Livermore National Security, Llc Optical authentication of images
CN111855544B (zh) * 2020-07-31 2021-11-26 上海微电子装备（集团）股份有限公司 一种荧光成像装置及其成像方法
CN113484320B (zh) * 2021-07-01 2024-08-02 西北大学 一种远场光学超薄片层成像系统及方法
CN113866973B (zh) * 2021-10-12 2023-10-03 桂林电子科技大学 一种基于多阶光纤模式复用的光纤sted显微镜
CN114324156B (zh) * 2021-11-18 2025-02-25 中国科学院化学研究所 受激辐射损耗显微镜及其显微成像系统
CN114280802A (zh) * 2021-12-28 2022-04-05 中国华录集团有限公司 一种单光源超分辨光存储光学系统
CN114706208B (zh) * 2022-02-18 2023-01-17 中国科学院化学研究所 受激辐射损耗光学显微镜及其显微成像系统
CN115508994A (zh) * 2022-09-14 2022-12-23 郑州思昆生物工程有限公司 一种显微成像系统
CN115728869B (zh) * 2022-11-15 2025-10-24 昂纳科技(深圳)集团股份有限公司 一种可调谐光滤波器
CN117129426B (zh) * 2023-08-08 2024-08-13 华东师范大学 一种超快时间分辨圆偏振发射光谱仪
KR102899140B1 (ko) * 2023-08-28 2025-12-10 고려대학교 산학협력단 편광 위상 현미경 시스템
CN119804345A (zh) * 2024-12-30 2025-04-11 长春理工大学中山研究院 一种对称式单lcvr偏振成像系统及成像方法

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JP5988643B2 (ja) 2012-03-26 2016-09-07 キヤノン株式会社 計測装置、計測方法及び光学部品の製造方法
GB201217171D0 (en) * 2012-08-23 2012-11-07 Isis Innovation Stimulated emission depletion microscopy
CN103257130B (zh) 2013-05-31 2015-04-01 中国科学院苏州生物医学工程技术研究所 受激辐射损耗显微成像系统
ES2897575T3 (es) * 2013-06-03 2022-03-01 Lumicks Dsm Holding B V Método y sistema para formar imágenes de una hebra molecular
JP6613552B2 (ja) 2013-09-09 2019-12-04 株式会社ニコン 超解像観察装置及び超解像観察方法
CN103616330A (zh) 2013-11-18 2014-03-05 中国科学院化学研究所 基于超连续产生的宽带激光光源激发的超分辨sted显微成像系统
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CN106841149B (zh) * 2017-03-17 2021-05-28 王富 受激辐射损耗显微装置
CN107329245B (zh) * 2017-07-06 2023-05-05 中国科学院西安光学精密机械研究所 基于径向偏振调制的干涉式结构光照明显微镜系统与方法
CN108121059B (zh) * 2017-11-18 2022-01-28 苏州国科医工科技发展(集团)有限公司 一种基于结构光照明的sted并行显微成像系统
CN108957720B (zh) * 2018-09-26 2019-12-10 中国科学院化学研究所 受激辐射损耗光学显微镜及其照明系统

Also Published As

Publication number Publication date
CN108957720A (zh) 2018-12-07
EP3757650A4 (en) 2021-12-15
JP7073523B2 (ja) 2022-05-23
US20210018736A1 (en) 2021-01-21
EP3757650A1 (en) 2020-12-30
WO2020062609A1 (zh) 2020-04-02
JP2021516794A (ja) 2021-07-08
EP3757650B1 (en) 2024-01-03
US11726309B2 (en) 2023-08-15

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Denomination of invention: Stimulated Emission Depletion Optical Microscopy and Its Illumination System

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