JP7073523B2 - Ｓｔｅｄ光学顕微鏡に用いる照明システム及びｓｔｅｄ光学顕微鏡 - Google Patents

Ｓｔｅｄ光学顕微鏡に用いる照明システム及びｓｔｅｄ光学顕微鏡 Download PDF

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JP7073523B2
JP7073523B2 JP2020551913A JP2020551913A JP7073523B2 JP 7073523 B2 JP7073523 B2 JP 7073523B2 JP 2020551913 A JP2020551913 A JP 2020551913A JP 2020551913 A JP2020551913 A JP 2020551913A JP 7073523 B2 JP7073523 B2 JP 7073523B2
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light beam
light
optical
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optical path
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JP2021516794A (ja
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景和 袁
建▲強▼ 于
▲暁▼▲紅▼ 方
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0052—Optical details of the image generation
    • G02B21/0076—Optical details of the image generation arrangements using fluorescence or luminescence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP2020551913A 2018-09-26 2018-12-14 Ｓｔｅｄ光学顕微鏡に用いる照明システム及びｓｔｅｄ光学顕微鏡 Active JP7073523B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201811125387.8A CN108957720B (zh) 2018-09-26 2018-09-26 受激辐射损耗光学显微镜及其照明系统
CN201811125387.8 2018-09-26
PCT/CN2018/121206 WO2020062609A1 (zh) 2018-09-26 2018-12-14 用于sted光学显微镜的照明系统及sted光学显微镜

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JP2021516794A JP2021516794A (ja) 2021-07-08
JP2021516794A5 JP2021516794A5 (enExample) 2022-01-06
JP7073523B2 true JP7073523B2 (ja) 2022-05-23

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US (1) US11726309B2 (enExample)
EP (1) EP3757650B1 (enExample)
JP (1) JP7073523B2 (enExample)
CN (1) CN108957720B (enExample)
WO (1) WO2020062609A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108957720B (zh) 2018-09-26 2019-12-10 中国科学院化学研究所 受激辐射损耗光学显微镜及其照明系统
CN210166558U (zh) * 2019-03-18 2020-03-20 苏州溢博伦光电仪器有限公司 一种高荧光收集率显微镜
CN110068560B (zh) * 2019-04-17 2021-08-06 深圳大学 一种受激辐射损耗超分辨成像系统及方法
WO2020211018A1 (zh) * 2019-04-17 2020-10-22 深圳大学 一种受激辐射损耗超分辨成像系统及方法
US11271747B2 (en) * 2019-09-16 2022-03-08 Lawrence Livermore National Security, Llc Optical authentication of images
CN111855544B (zh) * 2020-07-31 2021-11-26 上海微电子装备（集团）股份有限公司 一种荧光成像装置及其成像方法
CN113484320B (zh) * 2021-07-01 2024-08-02 西北大学 一种远场光学超薄片层成像系统及方法
CN113866973B (zh) * 2021-10-12 2023-10-03 桂林电子科技大学 一种基于多阶光纤模式复用的光纤sted显微镜
CN114324156B (zh) * 2021-11-18 2025-02-25 中国科学院化学研究所 受激辐射损耗显微镜及其显微成像系统
CN114280802A (zh) * 2021-12-28 2022-04-05 中国华录集团有限公司 一种单光源超分辨光存储光学系统
CN114706208B (zh) * 2022-02-18 2023-01-17 中国科学院化学研究所 受激辐射损耗光学显微镜及其显微成像系统
CN115508994A (zh) * 2022-09-14 2022-12-23 郑州思昆生物工程有限公司 一种显微成像系统
CN115728869B (zh) * 2022-11-15 2025-10-24 昂纳科技(深圳)集团股份有限公司 一种可调谐光滤波器
CN117129426B (zh) * 2023-08-08 2024-08-13 华东师范大学 一种超快时间分辨圆偏振发射光谱仪
KR102899140B1 (ko) * 2023-08-28 2025-12-10 고려대학교 산학협력단 편광 위상 현미경 시스템
CN119804345A (zh) * 2024-12-30 2025-04-11 长春理工大学中山研究院 一种对称式单lcvr偏振成像系统及成像方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003167198A (ja) 2002-08-28 2003-06-13 Japan Science & Technology Corp 顕微鏡
JP2003262798A (ja) 2002-03-12 2003-09-19 Olympus Optical Co Ltd 顕微鏡
CN102540439A (zh) 2011-12-30 2012-07-04 哈尔滨工业大学 基于反射式液晶空间光调制器的共焦轴向扫描装置及共焦轴向扫描方法
JP2013061255A (ja) 2011-09-14 2013-04-04 Canon Inc 計測装置
JP2013200257A (ja) 2012-03-26 2013-10-03 Canon Inc 計測装置、計測方法及び光学部品の製造方法
JP2015072462A (ja) 2013-09-09 2015-04-16 株式会社ニコン 超解像観察装置及び超解像観察方法
US20150226950A1 (en) 2012-08-23 2015-08-13 Isis Innovation Limited Stimulated emission depletion microscopy

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007025688A1 (de) 2007-06-01 2008-12-11 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Wellenlängen- oder polarisationssensitiver optischer Aufbau und dessen Verwendung
DE102010060121C5 (de) * 2010-10-22 2023-09-28 Leica Microsystems Cms Gmbh SPIM-Mikroskop mit sequenziellem Lightsheet
US9721326B2 (en) * 2011-11-08 2017-08-01 UNIVERSITé LAVAL Method and system for improving resolution in laser imaging microscopy
CN103257130B (zh) 2013-05-31 2015-04-01 中国科学院苏州生物医学工程技术研究所 受激辐射损耗显微成像系统
EP3957983B1 (en) * 2013-06-03 2023-12-13 LUMICKS DSM Holding B.V. Method and system for imaging a molecular strand
CN103616330A (zh) * 2013-11-18 2014-03-05 中国科学院化学研究所 基于超连续产生的宽带激光光源激发的超分辨sted显微成像系统
US10247672B2 (en) * 2014-09-29 2019-04-02 Howard Hughes Medical Institute Non-linear structured illumination microscopy
WO2017174100A1 (de) 2016-04-08 2017-10-12 Universität Heidelberg Parallelisierung des sted-mikroskopieverfahrens
DE102016211374A1 (de) * 2016-06-24 2017-12-28 Carl Zeiss Microscopy Gmbh Mikroskopieverfahren unter Nutzung zeitlicher Fokusmodulation und Mikroskop
US9880377B1 (en) * 2016-09-09 2018-01-30 Photonicsys Ltd. Multiple wavelengths real time phase shift interference microscopy
CN106841149B (zh) * 2017-03-17 2021-05-28 王富 受激辐射损耗显微装置
CN107329245B (zh) * 2017-07-06 2023-05-05 中国科学院西安光学精密机械研究所 基于径向偏振调制的干涉式结构光照明显微镜系统与方法
CN108121059B (zh) * 2017-11-18 2022-01-28 苏州国科医工科技发展(集团)有限公司 一种基于结构光照明的sted并行显微成像系统
CN108957720B (zh) 2018-09-26 2019-12-10 中国科学院化学研究所 受激辐射损耗光学显微镜及其照明系统

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003262798A (ja) 2002-03-12 2003-09-19 Olympus Optical Co Ltd 顕微鏡
JP2003167198A (ja) 2002-08-28 2003-06-13 Japan Science & Technology Corp 顕微鏡
JP2013061255A (ja) 2011-09-14 2013-04-04 Canon Inc 計測装置
CN102540439A (zh) 2011-12-30 2012-07-04 哈尔滨工业大学 基于反射式液晶空间光调制器的共焦轴向扫描装置及共焦轴向扫描方法
JP2013200257A (ja) 2012-03-26 2013-10-03 Canon Inc 計測装置、計測方法及び光学部品の製造方法
US20150226950A1 (en) 2012-08-23 2015-08-13 Isis Innovation Limited Stimulated emission depletion microscopy
JP2015072462A (ja) 2013-09-09 2015-04-16 株式会社ニコン 超解像観察装置及び超解像観察方法

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WO2020062609A1 (zh) 2020-04-02
JP2021516794A (ja) 2021-07-08
CN108957720B (zh) 2019-12-10
EP3757650A1 (en) 2020-12-30
US11726309B2 (en) 2023-08-15
EP3757650B1 (en) 2024-01-03
CN108957720A (zh) 2018-12-07
US20210018736A1 (en) 2021-01-21
EP3757650A4 (en) 2021-12-15

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