CN108701578B - 电离装置、方法和用途及分析样品物质的分析仪和方法 - Google Patents

电离装置、方法和用途及分析样品物质的分析仪和方法 Download PDF

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Publication number
CN108701578B
CN108701578B CN201680082108.7A CN201680082108A CN108701578B CN 108701578 B CN108701578 B CN 108701578B CN 201680082108 A CN201680082108 A CN 201680082108A CN 108701578 B CN108701578 B CN 108701578B
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electrode
ionization device
ionization
dielectric element
flow
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Chinese (zh)
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CN108701578A (zh
Inventor
J-C·沃尔夫
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Plas­mi­on GmbH
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Plas­mi­on GmbH
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0027—Methods for using particle spectrometers
    • H01J49/0031—Step by step routines describing the use of the apparatus
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2431—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes using cylindrical electrodes, e.g. rotary drums
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/245—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using internal electrodes

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Fluid Mechanics (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
  • Plasma Technology (AREA)
CN201680082108.7A 2015-12-17 2016-12-14 电离装置、方法和用途及分析样品物质的分析仪和方法 Active CN108701578B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015122155.1A DE102015122155B4 (de) 2015-12-17 2015-12-17 Verwendung einer Ionisierungsvorrichtung
DE102015122155.1 2015-12-17
PCT/IB2016/057626 WO2017103819A1 (de) 2015-12-17 2016-12-14 Verwendung einer ionisierungsvorrichtung, vorrichtung und verfahren zur ionisation eines gasförmigen stoffes sowie vorrichtung und verfahren zur analyse eines gasförmigen ionisierten stoffes

Publications (2)

Publication Number Publication Date
CN108701578A CN108701578A (zh) 2018-10-23
CN108701578B true CN108701578B (zh) 2020-11-03

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US (1) US10777401B2 (enExample)
EP (1) EP3391404B8 (enExample)
JP (2) JP7014436B2 (enExample)
CN (1) CN108701578B (enExample)
CA (1) CA3007449C (enExample)
DE (1) DE102015122155B4 (enExample)
WO (1) WO2017103819A1 (enExample)

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CA2972600A1 (en) * 2017-07-07 2019-01-07 Teknoscan Systems Inc. Polarization dielectric discharge source for ims instrument
KR101931324B1 (ko) * 2017-09-14 2018-12-20 (주)나노텍 셀프 플라즈마 챔버의 오염 억제 장치
TWI838493B (zh) * 2019-03-25 2024-04-11 日商亞多納富有限公司 氣體分析裝置
CN111263503B (zh) * 2019-12-11 2021-04-27 厦门大学 一种等离子体气动探针及其测量系统
US11621155B2 (en) * 2021-07-29 2023-04-04 Bayspec, Inc. Multi-modal ionization for mass spectrometry
CN114286486A (zh) * 2021-12-31 2022-04-05 中国人民解放军战略支援部队航天工程大学 大气压介质阻挡放电等离子体活性产物测量装置和方法
CN114664636B (zh) * 2022-03-04 2023-03-24 苏州大学 基于介质阻挡放电的空气逆流式离子源
CN116864370A (zh) 2022-03-28 2023-10-10 株式会社岛津制作所 离子源及质谱仪

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CN104064429A (zh) * 2014-07-16 2014-09-24 昆山禾信质谱技术有限公司 一种质谱电离源

Also Published As

Publication number Publication date
JP2022020776A (ja) 2022-02-01
WO2017103819A1 (de) 2017-06-22
CA3007449C (en) 2024-01-23
CA3007449A1 (en) 2017-06-22
DE102015122155B4 (de) 2018-03-08
US10777401B2 (en) 2020-09-15
US20180366310A1 (en) 2018-12-20
EP3391404A1 (de) 2018-10-24
EP3391404B1 (de) 2025-08-13
CN108701578A (zh) 2018-10-23
DE102015122155A1 (de) 2017-06-22
JP2019500728A (ja) 2019-01-10
EP3391404C0 (de) 2025-08-13
JP7014436B2 (ja) 2022-02-01
EP3391404B8 (de) 2025-10-08

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