CN108350175A - 生产硅氮烷-硅氧烷共聚物的方法和这种共聚物的用途 - Google Patents
生产硅氮烷-硅氧烷共聚物的方法和这种共聚物的用途 Download PDFInfo
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- CN108350175A CN108350175A CN201680063163.1A CN201680063163A CN108350175A CN 108350175 A CN108350175 A CN 108350175A CN 201680063163 A CN201680063163 A CN 201680063163A CN 108350175 A CN108350175 A CN 108350175A
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- 238000000034 method Methods 0.000 title claims abstract description 26
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- 125000000217 alkyl group Chemical group 0.000 claims description 40
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- 239000000203 mixture Substances 0.000 claims description 28
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 13
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- QKDYDXJISKWZQE-UHFFFAOYSA-N selenopheno[3,2-b]selenophene Chemical compound [se]1C=CC2=C1C=C[se]2 QKDYDXJISKWZQE-UHFFFAOYSA-N 0.000 description 1
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- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- URMVZUQDPPDABD-UHFFFAOYSA-N thieno[2,3-f][1]benzothiole Chemical compound C1=C2SC=CC2=CC2=C1C=CS2 URMVZUQDPPDABD-UHFFFAOYSA-N 0.000 description 1
- ONCNIMLKGZSAJT-UHFFFAOYSA-N thieno[3,2-b]furan Chemical compound S1C=CC2=C1C=CO2 ONCNIMLKGZSAJT-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/62—Nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
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- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
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- C08L83/04—Polysiloxanes
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
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Abstract
Description
Claims (13)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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EP15192355.4 | 2015-10-30 | ||
EP15192355 | 2015-10-30 | ||
EP16000814 | 2016-04-11 | ||
EP16000814.0 | 2016-04-11 | ||
PCT/EP2016/001635 WO2017071788A1 (en) | 2015-10-30 | 2016-10-04 | Method for producing silazane-siloxane copolymers and the use of such copolymers |
Publications (1)
Publication Number | Publication Date |
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CN108350175A true CN108350175A (zh) | 2018-07-31 |
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CN201680063163.1A Pending CN108350175A (zh) | 2015-10-30 | 2016-10-04 | 生产硅氮烷-硅氧烷共聚物的方法和这种共聚物的用途 |
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US (1) | US10421841B2 (zh) |
EP (1) | EP3368591B1 (zh) |
JP (1) | JP2018534400A (zh) |
KR (1) | KR20180079378A (zh) |
CN (1) | CN108350175A (zh) |
MY (1) | MY190747A (zh) |
SG (1) | SG11201803485UA (zh) |
TW (1) | TWI729018B (zh) |
WO (1) | WO2017071788A1 (zh) |
Families Citing this family (8)
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WO2017140407A1 (en) * | 2016-02-15 | 2017-08-24 | AZ Electronic Materials (Luxembourg) S.à.r.l. | Silazane-siloxane random copolymers, their production and use |
CN111194485A (zh) | 2017-10-13 | 2020-05-22 | 默克专利股份有限公司 | 光电装置的制造方法 |
WO2020056542A1 (en) * | 2018-09-17 | 2020-03-26 | Henkel Ag & Co. Kgaa | Two-part coating composition |
JP7103245B2 (ja) * | 2019-01-29 | 2022-07-20 | 信越化学工業株式会社 | ポリシロキサザン化合物およびその製造方法並びにこれを含む組成物および硬化物 |
JP7371592B2 (ja) * | 2019-09-27 | 2023-10-31 | 信越化学工業株式会社 | アルコキシシリル基を有するポリシロキサザン化合物およびその製造方法、並びにこれを含む組成物および硬化物 |
US11043676B1 (en) * | 2019-12-05 | 2021-06-22 | Enevate Corporation | Method and system for silosilazanes, silosiloxanes, and siloxanes as additives for silicon dominant anodes |
KR20230044211A (ko) * | 2020-07-28 | 2023-04-03 | 메르크 파텐트 게엠베하 | 폴리실라잔 폴리부타디엔 하이브리드 코팅 조성물 |
WO2022196430A1 (ja) * | 2021-03-17 | 2022-09-22 | 株式会社スリーボンド | 硬化性組成物ならびにこれを用いた硬化被膜、物品および被膜形成方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB997494A (en) * | 1962-04-02 | 1965-07-07 | Gen Electric | Organopolysiloxane compositions |
JPS60145815A (ja) * | 1984-01-10 | 1985-08-01 | Shin Etsu Chem Co Ltd | 離型剤組成物 |
US4678688A (en) * | 1983-12-28 | 1987-07-07 | Shin-Etsu Chemical Co., Ltd. | Method for forming a surface film of cured organosilicon polymer on a substrate surface |
US6534184B2 (en) * | 2001-02-26 | 2003-03-18 | Kion Corporation | Polysilazane/polysiloxane block copolymers |
US20150188006A1 (en) * | 2013-12-30 | 2015-07-02 | Cree, Inc. | Silazane-containing materials for light emitting diodes |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6274924B1 (en) | 1998-11-05 | 2001-08-14 | Lumileds Lighting, U.S. Llc | Surface mountable LED package |
US6204523B1 (en) | 1998-11-06 | 2001-03-20 | Lumileds Lighting, U.S., Llc | High stability optical encapsulation and packaging for light-emitting diodes in the green, blue, and near UV range |
JP2004077874A (ja) * | 2002-08-20 | 2004-03-11 | Clariant (Japan) Kk | 層間絶縁膜用感光性組成物及びパターン化層間絶縁膜の形成方法 |
TWI498356B (zh) * | 2011-11-25 | 2015-09-01 | Lg Chemical Ltd | 有機聚矽氧烷 |
-
2016
- 2016-10-04 CN CN201680063163.1A patent/CN108350175A/zh active Pending
- 2016-10-04 JP JP2018521903A patent/JP2018534400A/ja active Pending
- 2016-10-04 US US15/771,477 patent/US10421841B2/en active Active
- 2016-10-04 KR KR1020187015118A patent/KR20180079378A/ko not_active Application Discontinuation
- 2016-10-04 WO PCT/EP2016/001635 patent/WO2017071788A1/en active Application Filing
- 2016-10-04 SG SG11201803485UA patent/SG11201803485UA/en unknown
- 2016-10-04 EP EP16775471.2A patent/EP3368591B1/en active Active
- 2016-10-04 MY MYPI2018701664A patent/MY190747A/en unknown
- 2016-10-28 TW TW105135005A patent/TWI729018B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB997494A (en) * | 1962-04-02 | 1965-07-07 | Gen Electric | Organopolysiloxane compositions |
US4678688A (en) * | 1983-12-28 | 1987-07-07 | Shin-Etsu Chemical Co., Ltd. | Method for forming a surface film of cured organosilicon polymer on a substrate surface |
JPS60145815A (ja) * | 1984-01-10 | 1985-08-01 | Shin Etsu Chem Co Ltd | 離型剤組成物 |
US6534184B2 (en) * | 2001-02-26 | 2003-03-18 | Kion Corporation | Polysilazane/polysiloxane block copolymers |
US20150188006A1 (en) * | 2013-12-30 | 2015-07-02 | Cree, Inc. | Silazane-containing materials for light emitting diodes |
Non-Patent Citations (1)
Title |
---|
陈朝辉: "《先驱体结构陶瓷》", 30 September 2003, 国防科技大学出版社 * |
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EP3368591B1 (en) | 2019-07-31 |
TWI729018B (zh) | 2021-06-01 |
TW201728687A (zh) | 2017-08-16 |
JP2018534400A (ja) | 2018-11-22 |
EP3368591A1 (en) | 2018-09-05 |
US10421841B2 (en) | 2019-09-24 |
MY190747A (en) | 2022-05-12 |
WO2017071788A1 (en) | 2017-05-04 |
SG11201803485UA (en) | 2018-05-30 |
US20180312641A1 (en) | 2018-11-01 |
KR20180079378A (ko) | 2018-07-10 |
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