CN107297678A - 平面研磨装置 - Google Patents
平面研磨装置 Download PDFInfo
- Publication number
- CN107297678A CN107297678A CN201710228022.7A CN201710228022A CN107297678A CN 107297678 A CN107297678 A CN 107297678A CN 201710228022 A CN201710228022 A CN 201710228022A CN 107297678 A CN107297678 A CN 107297678A
- Authority
- CN
- China
- Prior art keywords
- fixed plate
- thickness
- workpiece
- measuring device
- thickness measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/28—Work carriers for double side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
- B24B49/04—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
- H10P52/40—Chemomechanical polishing [CMP]
- H10P52/402—Chemomechanical polishing [CMP] of semiconductor materials
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-081116 | 2016-04-14 | ||
| JP2016081116A JP6760638B2 (ja) | 2016-04-14 | 2016-04-14 | 平面研磨装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107297678A true CN107297678A (zh) | 2017-10-27 |
Family
ID=60085360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710228022.7A Pending CN107297678A (zh) | 2016-04-14 | 2017-04-10 | 平面研磨装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6760638B2 (enExample) |
| KR (1) | KR102315142B1 (enExample) |
| CN (1) | CN107297678A (enExample) |
| TW (1) | TWI704613B (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110193775A (zh) * | 2019-03-12 | 2019-09-03 | 上海新昇半导体科技有限公司 | 化学机械抛光方法以及化学抛光系统 |
| CN110394726A (zh) * | 2018-04-17 | 2019-11-01 | 创技股份有限公司 | 研磨装置 |
| CN113021183A (zh) * | 2019-12-25 | 2021-06-25 | 创技股份有限公司 | 工件孔检测装置以及工件孔检测方法 |
| CN115297997A (zh) * | 2020-03-23 | 2022-11-04 | 胜高股份有限公司 | 工件的双面抛光装置 |
| IT202100022463A1 (it) * | 2021-08-27 | 2023-02-27 | Biesse Spa | Metodo per controllare la lavorazione di pannelli di forma sostanzialmente parallelepipeda e macchina per la lavorazione di pannelli di forma sostanzialmente parallelepipeda, in particolare macchina levigatrice per la levigatura/satinatura di pannelli di legno, metallo, o simili |
| CN117300886A (zh) * | 2022-06-27 | 2023-12-29 | 不二越机械工业株式会社 | 双面研磨装置 |
| CN117359435A (zh) * | 2023-12-05 | 2024-01-09 | 福建荣德光电科技有限公司 | 一种光学镜片加工用的数控平面精密铣磨机 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022254856A1 (ja) * | 2021-06-04 | 2022-12-08 | 株式会社Sumco | ワークの両面研磨装置および両面研磨方法 |
| CN113245973B (zh) * | 2021-06-08 | 2022-07-22 | 唐山国芯晶源电子有限公司 | 一种石英晶片抛光游轮修磨厚度检测方法 |
| CN117583975B (zh) * | 2024-01-18 | 2024-03-19 | 山西日盛达太阳能科技股份有限公司 | 一种光伏玻璃抛光装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107160288A (zh) * | 2016-03-08 | 2017-09-15 | 快递股份有限公司 | 平面研磨装置及游星轮 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0740233A (ja) * | 1993-07-27 | 1995-02-10 | Speedfam Co Ltd | ワークの厚さ測定装置 |
| JP2888339B1 (ja) * | 1998-03-27 | 1999-05-10 | 直江津電子工業株式会社 | 被加工物保持プレート |
| JP4324933B2 (ja) | 2000-08-23 | 2009-09-02 | Sumco Techxiv株式会社 | 平面研磨装置 |
| JP4202841B2 (ja) * | 2003-06-30 | 2008-12-24 | 株式会社Sumco | 表面研磨装置 |
| JP2008227393A (ja) * | 2007-03-15 | 2008-09-25 | Fujikoshi Mach Corp | ウェーハの両面研磨装置 |
| JP2010023167A (ja) * | 2008-07-18 | 2010-02-04 | Epson Toyocom Corp | 砥粒加工装置およびそれを用いた砥粒加工方法 |
| JP4955624B2 (ja) | 2008-07-31 | 2012-06-20 | 信越半導体株式会社 | 両面研磨装置 |
| KR20100079199A (ko) * | 2008-12-30 | 2010-07-08 | 주식회사 동부하이텍 | 화학적 기계 연마 장치 및 방법 |
| US20120276662A1 (en) * | 2011-04-27 | 2012-11-01 | Iravani Hassan G | Eddy current monitoring of metal features |
| JP5917994B2 (ja) * | 2012-04-23 | 2016-05-18 | スピードファム株式会社 | 研磨装置の計測用窓構造 |
| JP6146213B2 (ja) * | 2013-08-30 | 2017-06-14 | 株式会社Sumco | ワークの両面研磨装置及び両面研磨方法 |
-
2016
- 2016-04-14 JP JP2016081116A patent/JP6760638B2/ja active Active
-
2017
- 2017-04-07 KR KR1020170045067A patent/KR102315142B1/ko active Active
- 2017-04-10 CN CN201710228022.7A patent/CN107297678A/zh active Pending
- 2017-04-11 TW TW106112056A patent/TWI704613B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107160288A (zh) * | 2016-03-08 | 2017-09-15 | 快递股份有限公司 | 平面研磨装置及游星轮 |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110394726A (zh) * | 2018-04-17 | 2019-11-01 | 创技股份有限公司 | 研磨装置 |
| CN110193775A (zh) * | 2019-03-12 | 2019-09-03 | 上海新昇半导体科技有限公司 | 化学机械抛光方法以及化学抛光系统 |
| CN113021183A (zh) * | 2019-12-25 | 2021-06-25 | 创技股份有限公司 | 工件孔检测装置以及工件孔检测方法 |
| CN115297997A (zh) * | 2020-03-23 | 2022-11-04 | 胜高股份有限公司 | 工件的双面抛光装置 |
| IT202100022463A1 (it) * | 2021-08-27 | 2023-02-27 | Biesse Spa | Metodo per controllare la lavorazione di pannelli di forma sostanzialmente parallelepipeda e macchina per la lavorazione di pannelli di forma sostanzialmente parallelepipeda, in particolare macchina levigatrice per la levigatura/satinatura di pannelli di legno, metallo, o simili |
| EP4140645A1 (en) | 2021-08-27 | 2023-03-01 | BIESSE S.p.A. | Method for controlling the machining of panels with a substantially parallelepiped-like shape and machine for machining panels with a substantially parallelepiped-like shape, in particular sanding machine for sanding/finishing panels made of wood, metal or the like |
| CN117300886A (zh) * | 2022-06-27 | 2023-12-29 | 不二越机械工业株式会社 | 双面研磨装置 |
| CN117300886B (zh) * | 2022-06-27 | 2024-04-26 | 不二越机械工业株式会社 | 双面研磨装置 |
| CN117359435A (zh) * | 2023-12-05 | 2024-01-09 | 福建荣德光电科技有限公司 | 一种光学镜片加工用的数控平面精密铣磨机 |
| CN117359435B (zh) * | 2023-12-05 | 2024-03-05 | 福建荣德光电科技有限公司 | 一种光学镜片加工用的数控平面精密铣磨机 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102315142B1 (ko) | 2021-10-20 |
| TW201737336A (zh) | 2017-10-16 |
| KR20170117878A (ko) | 2017-10-24 |
| JP6760638B2 (ja) | 2020-09-23 |
| TWI704613B (zh) | 2020-09-11 |
| JP2017189849A (ja) | 2017-10-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20171027 |
|
| WD01 | Invention patent application deemed withdrawn after publication |