CN107256712B - 磁盘用玻璃基板及其制造方法、磁盘、圆环状的玻璃基板 - Google Patents
磁盘用玻璃基板及其制造方法、磁盘、圆环状的玻璃基板 Download PDFInfo
- Publication number
- CN107256712B CN107256712B CN201710451295.8A CN201710451295A CN107256712B CN 107256712 B CN107256712 B CN 107256712B CN 201710451295 A CN201710451295 A CN 201710451295A CN 107256712 B CN107256712 B CN 107256712B
- Authority
- CN
- China
- Prior art keywords
- glass substrate
- roughness
- magnetic disk
- side wall
- load factor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011521 glass Substances 0.000 title claims abstract description 175
- 239000000758 substrate Substances 0.000 title claims abstract description 171
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 29
- 238000005498 polishing Methods 0.000 claims description 75
- 230000002093 peripheral effect Effects 0.000 claims description 47
- 239000006061 abrasive grain Substances 0.000 claims description 32
- 238000007517 polishing process Methods 0.000 claims description 12
- 230000008859 change Effects 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 35
- 239000002245 particle Substances 0.000 description 35
- 239000008119 colloidal silica Substances 0.000 description 33
- 239000010410 layer Substances 0.000 description 21
- 239000010419 fine particle Substances 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 239000002002 slurry Substances 0.000 description 11
- 238000011282 treatment Methods 0.000 description 11
- 229910003460 diamond Inorganic materials 0.000 description 10
- 239000010432 diamond Substances 0.000 description 10
- 230000003746 surface roughness Effects 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 238000003426 chemical strengthening reaction Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 239000005354 aluminosilicate glass Substances 0.000 description 6
- 229910000420 cerium oxide Inorganic materials 0.000 description 6
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 238000003754 machining Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 229910052593 corundum Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 description 4
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229910018979 CoPt Inorganic materials 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
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- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 235000010333 potassium nitrate Nutrition 0.000 description 2
- 239000004323 potassium nitrate Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910005335 FePt Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000011553 magnetic fluid Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
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- 238000012986 modification Methods 0.000 description 1
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- 238000004806 packaging method and process Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
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- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
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- 239000002344 surface layer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
- G11B5/82—Disk carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP2012-218412 | 2012-09-28 | ||
| JP2012218412 | 2012-09-28 | ||
| CN201380044680.0A CN104584126B8 (zh) | 2012-09-28 | 2013-06-28 | 磁盘用玻璃基板、磁盘以及磁盘用玻璃基板的制造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380044680.0A Division CN104584126B8 (zh) | 2012-09-28 | 2013-06-28 | 磁盘用玻璃基板、磁盘以及磁盘用玻璃基板的制造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107256712A CN107256712A (zh) | 2017-10-17 |
| CN107256712B true CN107256712B (zh) | 2020-04-14 |
Family
ID=50387658
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710451295.8A Active CN107256712B (zh) | 2012-09-28 | 2013-06-28 | 磁盘用玻璃基板及其制造方法、磁盘、圆环状的玻璃基板 |
| CN201380044680.0A Active CN104584126B8 (zh) | 2012-09-28 | 2013-06-28 | 磁盘用玻璃基板、磁盘以及磁盘用玻璃基板的制造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380044680.0A Active CN104584126B8 (zh) | 2012-09-28 | 2013-06-28 | 磁盘用玻璃基板、磁盘以及磁盘用玻璃基板的制造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9697860B2 (enExample) |
| JP (2) | JP5592037B1 (enExample) |
| CN (2) | CN107256712B (enExample) |
| MY (1) | MY169200A (enExample) |
| SG (2) | SG10201706984QA (enExample) |
| WO (1) | WO2014050241A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9697860B2 (en) * | 2012-09-28 | 2017-07-04 | Hoya Corporation | Magnetic-disk glass substrate, magnetic disk and method for manufacturing magnetic-disk glass substrate |
| JP5775049B2 (ja) * | 2012-10-25 | 2015-09-09 | AvanStrate株式会社 | ガラス基板の製造方法 |
| SG10201608631VA (en) * | 2013-02-22 | 2016-12-29 | Hoya Corp | Glass substrate for magnetic disk and magnetic disk |
| MY168621A (en) * | 2014-03-31 | 2018-11-14 | Hoya Corp | Magnetic-disk glass substrate |
| MY168096A (en) | 2015-09-30 | 2018-10-11 | Hoya Corp | Magnetic-disk glass substrate, magnetic-disk glass substrate intermediate, and method for manufacturing magnetic-disk glass substrate |
| US20170106498A1 (en) * | 2015-10-20 | 2017-04-20 | Hamilton Sundstrand Corporation | Method of manufacturing an actuator assembly component and method of verifying surface finish |
| JP6020753B1 (ja) * | 2015-12-28 | 2016-11-02 | 旭硝子株式会社 | 磁気記録媒体用ガラス基板、磁気記録媒体 |
| US10442055B2 (en) * | 2016-02-18 | 2019-10-15 | Iowa State University Research Foundation, Inc. | Lubricated mechanical polishing |
| DE102016107535A1 (de) * | 2016-04-22 | 2017-10-26 | Schott Ag | Flachglasprodukt mit erhöhter Kantenfestigkeit und Verfahren zu dessen Herstellung |
| JP6574537B2 (ja) | 2017-03-31 | 2019-09-11 | Hoya株式会社 | 磁気ディスク用非磁性基板及び磁気ディスク |
| SG11202001639WA (en) | 2018-02-01 | 2020-03-30 | Hoya Corp | Glass spacer, hard disk drive device, and method for producing glass spacer |
| US11471993B2 (en) | 2018-03-09 | 2022-10-18 | Hoya Corporation | Spacer, laminate of substrates, method for manufacturing substrate, and method for manufacturing substrate for magnetic disk |
| US11056352B2 (en) | 2018-07-31 | 2021-07-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Magnetic slurry for highly efficient CMP |
| WO2020262702A1 (ja) * | 2019-06-28 | 2020-12-30 | Hoya株式会社 | ガラス板の製造方法および磁気ディスクの製造方法 |
| CN114175156B (zh) * | 2019-07-31 | 2024-04-19 | Hoya株式会社 | 圆环形状的玻璃板的制造方法、磁盘用玻璃基板的制造方法、磁盘的制造方法、圆环形状的玻璃板、磁盘用玻璃基板以及磁盘 |
| CN115307986B (zh) * | 2022-02-22 | 2025-06-06 | 陕西北方动力有限责任公司 | 一种磷化产品含油量的检测方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1694781A (zh) * | 2002-12-26 | 2005-11-09 | Hoya株式会社 | 用于信息记录媒体的玻璃衬底以及它的制造方法 |
| CN1934620A (zh) * | 2004-03-25 | 2007-03-21 | Hoya株式会社 | 磁盘用玻璃基板 |
| CN1993736A (zh) * | 2004-08-11 | 2007-07-04 | 昭和电工株式会社 | 磁记录介质的硅基底及其制造方法以及磁记录介质 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05114127A (ja) * | 1991-10-23 | 1993-05-07 | Hitachi Ltd | 磁気デイスク及びその製造方法並びに磁気デイスク装置 |
| JP3158867B2 (ja) | 1994-06-15 | 2001-04-23 | 富士電機株式会社 | 磁気記録媒体の製造方法 |
| JPH11221742A (ja) | 1997-09-30 | 1999-08-17 | Hoya Corp | 研磨方法及び研磨装置並びに磁気記録媒体用ガラス基板及び磁気記録媒体 |
| MY124121A (en) * | 1997-11-07 | 2006-06-30 | Hoya Corp | Magnetic recording medium and method of manufacturing the magnetic recording medium |
| JP3359304B2 (ja) | 1998-08-19 | 2002-12-24 | ホーヤ株式会社 | 磁気記録媒体用ガラス基板、磁気記録媒体及びそれらの製造方法 |
| SG84541A1 (en) * | 1998-08-19 | 2001-11-20 | Hoya Corp | Glass substrate for magnetic recording medium, magnetic recording medium, and method of manufacturing the same |
| US6509111B1 (en) * | 1999-09-24 | 2003-01-21 | Hitachi, Ltd. | Magnetic recording media and magnetic disk apparatus |
| JP3912575B2 (ja) | 1999-12-21 | 2007-05-09 | Hoya株式会社 | 磁気記録媒体用ガラス基板の製造方法、及び磁気記録媒体の製造方法 |
| US6706427B2 (en) * | 1999-12-21 | 2004-03-16 | Hoya Corporation | Management technique of friction coefficient based on surface roughness, substrate for information recording medium, information recording medium and manufacture method thereof |
| US6852432B2 (en) * | 2000-06-30 | 2005-02-08 | Hitachi, Ltd. | Magnetic recording media and magnetic disk apparatus |
| US6790509B2 (en) * | 2000-10-19 | 2004-09-14 | Hoya Corporation | Substrate for information recording medium, information recording medium, and method for controlling surface of substrate for information recording medium |
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| SG11201501455YA (en) | 2015-05-28 |
| US10580448B2 (en) | 2020-03-03 |
| US20150255103A1 (en) | 2015-09-10 |
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| CN107256712A (zh) | 2017-10-17 |
| SG10201706984QA (en) | 2017-10-30 |
| CN104584126B (zh) | 2017-06-23 |
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| CN104584126A (zh) | 2015-04-29 |
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| JPWO2014050241A1 (ja) | 2016-08-22 |
| JP2014179160A (ja) | 2014-09-25 |
| US20170263278A1 (en) | 2017-09-14 |
| MY169200A (en) | 2019-02-26 |
| CN104584126B8 (zh) | 2017-08-08 |
| US9697860B2 (en) | 2017-07-04 |
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