CN107144235A - A kind of article surface Shape measure method and device - Google Patents
A kind of article surface Shape measure method and device Download PDFInfo
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- CN107144235A CN107144235A CN201710304285.1A CN201710304285A CN107144235A CN 107144235 A CN107144235 A CN 107144235A CN 201710304285 A CN201710304285 A CN 201710304285A CN 107144235 A CN107144235 A CN 107144235A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
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Abstract
The present invention discloses a kind of article surface Shape measure method：1. the port 1 of Low coherence light from three end circulators is injected, and is projected from port 2, is injected after the first collimated from the x galvanometers in x y scanning galvanometers, and y galvanometers are projected；3. the light projected is divided into two parts light after the second lens focus by a light splitting piece, and a part is from glass bottom surface reflection, and as reference light, another part, which is penetrated, to be mapped to by sample surfaces and reflect after glass, is used as sample light；4. light path is returned two parts light altogether, and the y galvanometers of scanning galvanometer are converged to through the second lens, x galvanometers is injected through y galvanometers, then projects；5. light converges the port 2 for entering three end circulators through the first lens, is then projected from port 3；6. the light projected from port 3 enters spectrometer, and spectrometer broadcasts data to computer；7. scanning galvanometer carries out point by point scanning to sample；8. computer calculates the phase difference of adjacent positionWith depth difference Δ z, the quantitative distribution situation of final sample surface topography is obtained.
Description
Technical field：
The present invention relates to a kind of article surface Shape measure method and device.
Background technology：
Micromorphology detection has very important in fields such as industrial products detection, machine-building, electronics industries
Application value, with modern electronics industry, the precise and tiny processing of optics and the development of micro-electromechanical technology, the requirement to microcosmic surface precision
More and more higher, surface topography quality turn into ensure and improve machinery, electronics and Performance of Optical System, quality and life-span it is crucial because
One of element.In nearest decades, domestic and international micromorphology fields of measurement occurs in that many new technology and methods, makes survey
Accuracy of measurement is improved constantly, and oneself enters the even sub- nanoscale of nanometer from micro-meter scale.Current micromorphology measuring method
Two major classes can be divided into:Contact and contactless.Contact pin type contourgraph is to use more extensive contact surface profile at present
Measuring instrument, has the advantages that big measurement range, high resolution, measurement result are reliable and stable, reproducible, its axially measured resolution
Rate is up to 1nm or smaller, but in microcosmic surface contour detecting, and usually requiring that can not contact with sample surfaces, contact detection meeting
Sample surfaces are caused to damage.Nano-precision non-contact measurement method can be divided into non optical method and the major class of optical means two, non-
Measuring method includes PSTM and AFM, and PSTM transverse direction resolution is 0.1nm,
Axial resolution 0.01nm magnitudes, its axially and transversely measurement range it is smaller (about 1 μm), PSTM is by tunnel
Electric current reflects measured surface pattern, therefore, can only measure conductor or semiconductor, and measurement must be carried out in a vacuum.Atom
The axial resolution of force microscope reaches 0.1nm, and lateral resolution is about 10nm, can both detect conductor, can also be detected non-
Conductor, but have the shortcomings that areas imaging is small, influenceed big by probe.Nanoscale optics measuring method is divided into two classes：(1) color is combined
The aberration confocal spectroscopic technology (Chromatic confocal spectrum, CCS) of difference and confocal microscopy, (2) interference is surveyed
Amount method, including：Monochromatic light phase-shifting interferometry (Phase-shifting interferometry, PSI), vertical scanning white light
Interferometric method (Vertical scanning white-light interferometry, SWLI), white-light spectrum interferometric method
(White-light spectral interferometry, WLSI) and heterodyne interferometry (Heterodyne
interferometry,HI)。
Axial resolution, axially measured scope, the stability of a system, lateral resolution and detection speed be urn Topography into
The problem of relatively more crucial as in.CCS axial resolutions reach 2nm, are worse than interference technique, but CCS advantage is high stability.
CCS further drawback is that its axial resolution, axially measured scope and lateral resolution are all decided by sample optical focus, is axially divided
Resolution, axially measured scope depend on focus dispersion characteristics, it is therefore desirable to focus dispersion characteristics strict and steady, be not suitable for into
The quick optical scanner of row, is all that two-dimensional scan is carried out with high-precision flat moving stage mobile example at present, mechanical scanning, which can be introduced, shakes
Dynamic interference, influences axially measured precision, while also limit measuring speed.For interference technique, the main of systematic function is influenceed
Factor is stability and axially measured scope, and interference technique has high sensitivity, but interference to external world is similarly sensitive, interference
The axial precision and lateral resolution of method are unrelated, it is possible to achieve quick optical scanner.
The axial resolution of interferometric method is higher than CCS, but interferometric method has phase parcel and easily asked by environmental disturbances
Topic.PSI, WLSI and HI are the height value that sample surfaces are obtained by calculating the phase difference between reference light and sample light, phase
The main value scope of calculating is [- π ,+π], when phase exceedes [- π ,+π], occurs phase parcel, it is necessary to recover by Phase- un- wrapping
True phase, can just obtain correct elevation information.At present, although the method for existing a variety of numerical value Phase- un- wrappings is suggested,
But these methods are the problem of all have certain, complicated and time consumption is calculated, is influenceed by noise and lack sampling, particularly when adjacent 2 points
When phase difference is more than π, it is impossible to recover real phase.The principle of Phase- un- wrapping is the continuity according to phase, by comparing
Phase difference carries out Phase- un- wrapping between adjacent 2 points, it is, in principle, that when adjacent 2 points of phase difference is more than π, just can not
Correct to recover true phase, which define the application of interferometric method.SWLI can measure absolute light path, in the absence of phase bag
Problem is wrapped up in, but for each sensing point, it is necessary to carry out axial scan, the demodulation accuracy and axial scan precision of interference fringe are limited
Axially measured precision is made, while also limit measuring speed using axial scan.
The content of the invention：
The invention aims to overcome the shortcoming of above-mentioned prior art high, dry by environment there is provided a kind of measurement accuracy
Disturb and article surface Shape measure method and device that mechanical disturbance is small.
The goal of the invention of the present invention can be realized by following technical scheme：A kind of article surface Shape measure side
Method, detection process is as follows：
1. Low coherence light is produced by low-coherence light source, Low coherence light injects the port 1 of three end circulators, then from end
Mouth 2 is projected；
2. from port 2 project light x-y scanning galvanometers are injected after the first collimated in x galvanometers, then shaken from x
Mirror is then projected to y galvanometers from y galvanometers；
3. the light from the injection of y galvanometers is through the second lens focus, and the light after focusing is divided into two after a light splitting piece
Light splitter, a part is from glass bottom surface reflection, as reference light, and another part, which is penetrated, to be projected after glass by sample surfaces, so
Back reflection, is used as sample light；
4. from two parts light of 3. middle transmitting, light path is returned altogether, and the y galvanometers of scanning galvanometer are converged to through the second lens, are passed through
Y galvanometers inject x galvanometers, then project；
5. the light that x galvanometers are projected converges the port 2 into three end circulators through the first lens, is then projected from port 3；
6. the reference light and sample light projected from port 3 enters spectrometer, and spectrometer broadcasts data to computer；
7. control scanning galvanometer motion, scanning galvanometer to sample carry out point by point scanning, computer obtain sample surfaces each
The low-coherent light interference spectrum of position；
8. computer calculates the phase difference of adjacent position
9. according to phase differenceThe depth difference Δ z of the sample adjacent two positions is calculated, the phase of sample surface morphology is obtained
Difference diagram；
10. the depth difference Δ z of calculating is integrated, obtains the quantitative distribution situation of final sample surface topography.
Step 8. in belonging to calculating adjacent position phase difference the step of it is as follows：
The coherent swpectrum of adjacent two positions point 1 and 2 is respectively:
The coherent swpectrum of location point 1 is：
The coherent swpectrum of location point 2 is：
Wherein, I1(km)、I2(km) be respectively location point 1,2 coherent swpectrum, S (km) it is light source light spectrum intensity distribution,
A11、A12Respectively the corresponding sample light in position 1 and light amplitude is referred to, A21、A22The respectively corresponding sample light in position 2 and reference
Light amplitude, kmFor wave number, n is air refraction, and the distance of sample surface and the plane of reference is represented with two parts of different resolution, phase
Z in the coherent swpectrum expression formula of adjacent two positions point 1 and 20The absolute distance of sample surface and the plane of reference is represented, its precision is decided by light
The coherence length in source, relative to z0Have parfacies do length resolution distance bekcFor in light source
Cardiac wave number, its precision is decided by the spectral resolution of spectrometer.
It is assumed that location point 2 is Δ z relative to the little height increment of point 10, the reference arm equivalent optical path of location point 1 and 2,
The then difference in height Δ z of location point 1 and 20For,
ForWithDifference
To I1(km) and I2(km) respectively carry out Fourier transform after obtain corresponding sequence of complex numbers F1(2nzm) and F2
(2nzm), zmRepresent the height of discretization.Because it is reflecting surface there was only sample surfaces in sample, then F1(2nzm) and F2(2nzm)
The corresponding position of power spectrum maximum is 2nz0, therefore obtain two plural numbersWithThenFor,
Asterisk represents complex conjugate in above formula, and thus formula calculates phase differenceObtain the phase difference of sample surfaces
Figure, no matter the phase value size of each point, as long as at interval [- π ,+π], phase parcel does not occur, when adjacent 2 points at adjacent 2 points
Phase difference occurs phase parcel on phase difference component, handled by Phase- un- wrapping more than π, eliminates on phase difference component
Phase is wrapped up, then is integrated, and obtains the phase distribution and pattern of sample surfaces.Because unpacking computing is in phase difference component
Upper progress, therefore, the restrictive conditions of adjacent 2 phase difference absolute values is expanded to 2 π by current π.
Step 9. in, according to described phase differenceThe depth difference Δ z of position 1 and position 2 is obtained, especially by following
Mode is obtained：
Include low-coherence light source, three end circulators, the first lens, scanning galvanometer, the second lens and light splitting piece, three end ring
The port 1 of shape device is connected with low-coherence light source, and it is saturating that port 2 is subsequently sequentially connected the first lens-x-y scanning galvanometer-the second
Mirror, port 3 is sequentially connected spectrometer-computer, and the first lens are connected with the x galvanometers of x-y scanning galvanometers, and the second lens are swept with x-y
The y galvanometers for retouching galvanometer are connected, and light splitting piece is arranged on the second lens and is connected with y galvanometers the opposite side of side, and second is saturating on light splitting piece
The reflectance coating that the opposite side plating last layer light transmittance of mirror side is 50%~70%, light splitting piece plates the side of reflectance coating provided with carrying
Supply the sample stage placed by sample.
One speculum is set between the first lens and x-y scanning galvanometers.
After the technical program, compared with prior art, the technical program has advantages below：The present invention can be realized
Surface topography high-precision fast speed non-contact measurement, system architecture is simple, and cost is relatively low, measurement accuracy can reach it is sub- nm grades, by
In the phase for not calculating each position directly, therefore, as long as at interval [- π ,+π] phase does not occur for adjacent 2 points of phase difference
Parcel, 2 π are expanded to by the restrictive condition of the adjacent 2 phase difference absolute values of interferometric method by current π.The plane of reference and sample are placed in
On identical platform, the influence of environmental disturbances and system vibration is eliminated to greatest extent, the stability of a system is improved, is swept using optics
Retouch and realize high speed imaging, reduce the interference that mechanical scanning is introduced.
Brief description of the drawings：
Fig. 1 is the structure chart of article surface Shape measure device of the present invention.
Embodiment：
This technology is described further below in conjunction with the accompanying drawings.
Article surface Shape measure device, including：It is low-coherence light source 1, spectrometer, three end circulators 2, the first lens 3, anti-
Penetrate mirror 5, x-y scanning galvanometers 6, the second lens 7 and sample stage 12.The light that low-coherence light source 1 is sent is by the port of three end circulators 2
1 enters, and the light come out from the port 2 of three end circulators 2 is mapped to speculum 5 after being collimated through lens 3, changes the light behind direction and is mapped to
The x galvanometers of x-y scanning galvanometers 6, the y galvanometers of x-y scanning galvanometers 6 are mapped to from x galvanometers, and the light through y galvanometers is focused on by the second lens 7
To the surface of sample 9, by the quick rotation of scanning galvanometer 6, the scanning to the surface of sample 9 is realized.Sample and conduct reference
The light splitting piece 8 of speculum is placed on identical platform, and sample arm and reference arm are common light path.A post is put on sample stage 12
4, the reflectance coating for plating that last layer light transmittance is 50% -70% on a light splitting piece 8 light splitting piece bottom is put on post 4, by the
The light part that two lens 7 are focused on is split the reflection of the lower surface of piece 8, and another part is focused onto the table of sample 9 through light splitting piece 8
Face, the sample light and the reference light for the lower surface of piece 8 reflection that is split reflected by the surface of sample 9 is converged to by the second lens 7 to be swept
The y galvanometers of galvanometer 6 are retouched, after the light for injecting x galvanometers through y galvanometers changes direction by speculum 5, three end ring are converged to by lens 3
The port 2 of shape device 2, the collimation lens 13 of spectrometer 10 is entered from the port 3 of three end circulators 2, what collimated lens 13 were collimated
Light focuses on high speed linear array after injecting transmission grating 14 (1145lines/mm, Wasatch Photonics) by the 3rd lens 15
The interference spectrum of camera 16 (GL2048L, Sensors Unlimited), reference light and the formation of sample light is real-time by spectrometer 10
Collection, interference spectrum is transmitted to computer 11 and carries out subsequent treatment.
The y rotating shaft positions of scanning galvanometer 6 are the focus of the second lens 7.Pass through the quick rotation of scanning galvanometer 6, realization pair
The scanning on the surface of sample 9.
The present invention is a kind of method for reaching Subnano-class surface profile measurement, is comprised the following steps：
S1, using the frequency domain low-coherent light interference device of common light path, light splitting piece 8 (crosses 50% -70% anti-on the light splitting piece
Penetrate film) it is placed on sample stage 12, the reflected light of the lower surface of light splitting piece 8 and the interference spectrum of sample surfaces reflected light are gathered, x-y is used
Scanning galvanometer 6 carries out point by point scanning to sample, obtains the low-coherent light interference spectrum of each position of sample surfaces.
S2, calculates the phase difference of adjacent position
S3, according to described phase differenceThe depth difference Δ z of the sample adjacent two positions is calculated, surface topography is obtained
Phase difference component；
S4, is integrated to the depth difference Δ z of calculating, obtains the quantitative distribution of sample surface morphology.
The step of phase difference of calculating adjacent position described in step S2, is as follows：
The coherent swpectrum of adjacent two positions point 1 and 2 is respectively:
The coherent swpectrum of location point 1 is：
The coherent swpectrum of location point 2 is：
Wherein, I1(km)、I2(km) be respectively location point 1,2 coherent swpectrum, S (km) it is light source light spectrum intensity distribution,
A11、A12Respectively the corresponding sample light in position 1 and light amplitude is referred to, A21、A22The respectively corresponding sample light in position 2 and reference
Light amplitude, kmFor wave number, n is air refraction, and the distance of sample surface and the plane of reference is represented with two parts of different resolution, phase
Z in the coherent swpectrum expression formula of adjacent two positions point 1 and 20The absolute distance of sample surface and the plane of reference is represented, its precision is decided by light
The coherence length in source, relative to z0Have parfacies do length resolution distance bekcFor in light source
Cardiac wave number, its precision is decided by the spectral resolution of spectrometer.
It is assumed that location point 2 is Δ z relative to the little height increment of point 10, put a little 1 and 2 reference arm equivalent optical path, then
The difference in height Δ z of location point 1 and 20For,
In formula (3),ForWithDifference.To I1(km) and I2(km) respectively carry out Fourier transform after obtain phase
Corresponding sequence of complex numbers F1(2nzm) and F2(2nzm), zmRepresent the height of discretization.Because only having sample surfaces to be anti-in sample
Face is penetrated, then F1(2nzm) and F2(2nzm) the corresponding position of power spectrum maximum be 2nz0, therefore obtain two plural numbersWithThenFor,
Asterisk represents complex conjugate in above formula, and by (4), formula calculates phase differenceObtain the phase difference of sample surfaces
Figure, no matter the phase value size of each point, as long as at interval [- π ,+π], phase parcel does not occur, when adjacent 2 points at adjacent 2 points
Phase difference occurs phase parcel on phase difference component, handled by Phase- un- wrapping more than π, eliminates on phase difference component
Phase is wrapped up, then is integrated, and obtains the phase distribution and pattern of sample surfaces.Because unpacking computing is in phase difference component
Upper progress, therefore, the restrictive conditions of adjacent 2 phase difference absolute values is expanded to 2 π by current π.
In step S3, according to described phase differenceThe position 1 and depth difference Δ z of position 2 is obtained especially by following
Mode is obtained：
Described depth difference Δ z is integrated, detected sample surface morphology is obtained and is quantitatively distributed：Z=∫ Δs z.
The above described is only a preferred embodiment of the present invention, not making any formal limitation to the present invention.Appoint
What those skilled in the art, without departing from the scope of the technical proposal of the invention, all using the side of the disclosure above
Method and technology contents make many possible variations and modification to technical solution of the present invention, or are revised as the equivalent reality of equivalent variations
Apply example.Therefore every content without departing from technical solution of the present invention, the equivalent change that shape, construction and principle according to the present invention are made
Change, all should be covered by protection scope of the present invention.
Claims (5)
1. a kind of article surface Shape measure method, detection process is as follows：
1. Low coherence light is produced by low-coherence light source, Low coherence light injects the port 1 of three end circulators, then from port 2
Project；
2. from port 2 project light x-y scanning galvanometers are injected after the first collimated in x galvanometers, then penetrated from x galvanometers
To y galvanometers, then projected from y galvanometers；
3. the light from the injection of y galvanometers is through the second lens focus, and the light after focusing is divided into two parts light after a light splitting piece
Line, a part is from glass bottom surface reflection, as reference light, and another part, which is penetrated, to be projected after glass by sample surfaces, then instead
Penetrate, be used as sample light；
4. from two parts light of 3. middle transmitting, light path is returned altogether, and the y galvanometers of scanning galvanometer are converged to through the second lens, are shaken through y
Mirror enters x galvanometers, then projects；
5. the light that x galvanometers are projected converges the port 2 into three end circulators through the first lens, is then projected from port 3；
6. the reference light and sample light projected from port 3 enters spectrometer, and spectrometer broadcasts data to computer；
7. the motion of scanning galvanometer is controlled, scanning galvanometer carries out point by point scanning to sample, and computer obtains each position of sample surfaces
Low-coherent light interference spectrum；
8. computer calculates the phase difference of adjacent position
9. according to phase differenceThe depth difference Δ z of the sample adjacent two positions is calculated, the phase difference of sample surface morphology is obtained
Figure；
10. the depth difference Δ z of calculating is integrated, obtains the quantitative distribution situation of final sample surface topography.
2. a kind of article surface Shape measure method according to claim 1, it is characterised in that：Step 8. in belonging to meter
The step of calculating the phase difference of adjacent position is as follows：
The coherent swpectrum of adjacent two positions point 1 and 2 is respectively:
The coherent swpectrum of location point 1 is：
The coherent swpectrum of location point 2 is：
Wherein, I1(km)、I2(km) be respectively location point 1,2 coherent swpectrum, S (km) it is light source light spectrum intensity distribution, A11、A12
Respectively the corresponding sample light in position 1 and light amplitude is referred to, A21、A22Respectively the corresponding sample light in position 2 and reference light shake
Width, kmFor wave number, n is air refraction, and the distance of sample surface and the plane of reference is represented with two parts of different resolution, adjacent two
Z in the coherent swpectrum expression formula of location point 1 and 20The absolute distance of sample surface and the plane of reference is represented, its precision is decided by light source
Coherence length, relative to z0Have parfacies do length resolution distance bekcFor the middle cardiac wave of light source
Number, its precision is decided by the spectral resolution of spectrometer.
It is assumed that location point 2 is Δ z relative to the little height increment of point 10, the reference arm equivalent optical path of location point 1 and 2, then position
The difference in height Δ z of point 1 and 20For,
ForWithDifference
To I1(km) and I2(km) respectively carry out Fourier transform after obtain corresponding sequence of complex numbers F1(2nzm) and F2(2nzm),
zmRepresent the height of discretization.Because it is reflecting surface there was only sample surfaces in sample, then F1(2nzm) and F2(2nzm) power spectrum
The corresponding position of maximum is 2nz0, therefore obtain two plural numbersWithThenFor,
Asterisk represents complex conjugate in above formula, and thus formula calculates phase differenceThe phase difference component of sample surfaces is obtained, no
By the phase value size of each point, as long as at interval [- π ,+π], phase parcel does not occur, when adjacent 2 points of phase at adjacent 2 points
Difference occurs phase parcel on phase difference component, handled by Phase- un- wrapping more than π, eliminates the phase on phase difference component
Parcel, then be integrated, obtain the phase distribution and pattern of sample surfaces.Because unpacking computing is enterprising in phase difference component
It is capable, therefore, the restrictive conditions of adjacent 2 phase difference absolute values is expanded to 2 π by current π.
3. a kind of article surface Shape measure method according to claim 2, it is characterised in that：Step 9. in, according to institute
The phase difference statedThe depth difference Δ 2 of position 1 and position 2 is obtained, is obtained especially by the following manner：
。
4. a kind of device of article surface Shape measure, it is characterised in that：Include low-coherence light source, three end circulators, first
Lens, scanning galvanometer, the second lens and light splitting piece, the port 1 of three end circulators are connected with low-coherence light source, and port 2 is follow-up
Be sequentially connected the first lens-lens of x-y scanning galvanometers-second, port 3 is sequentially connected spectrometer-computer, the first lens with
The x galvanometers of x-y scanning galvanometers are connected, and the second lens are connected with the y galvanometers of x-y scanning galvanometers, and light splitting piece is arranged on the second lens
Be connected the opposite side of side with y galvanometers, on light splitting piece the opposite side plating last layer light transmittance of the second lens side be 50%~
70% reflectance coating, the side that light splitting piece plates reflectance coating is provided with the sample stage for being supplied to and being placed by sample.
5. a kind of device of article surface Shape measure according to claim 4, it is characterised in that：In the first lens and x-
One speculum is set between y scanning galvanometers.
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| WO2021168613A1 (en) * | 2020-02-24 | 2021-09-02 | Yangtze Memory Technologies Co., Ltd. | Systems and methods for semiconductor chip surface topography metrology |
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