CN107134498B - 使用激光烧蚀的太阳能电池的接触形成 - Google Patents
使用激光烧蚀的太阳能电池的接触形成 Download PDFInfo
- Publication number
- CN107134498B CN107134498B CN201710165852.XA CN201710165852A CN107134498B CN 107134498 B CN107134498 B CN 107134498B CN 201710165852 A CN201710165852 A CN 201710165852A CN 107134498 B CN107134498 B CN 107134498B
- Authority
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- China
- Prior art keywords
- layer
- polysilicon
- dielectric
- amorphous silicon
- solar cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000000608 laser ablation Methods 0.000 title description 9
- 239000000758 substrate Substances 0.000 claims abstract description 41
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 48
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 39
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 26
- 229920005591 polysilicon Polymers 0.000 claims description 26
- 235000012239 silicon dioxide Nutrition 0.000 claims description 24
- 239000000377 silicon dioxide Substances 0.000 claims description 24
- 239000003989 dielectric material Substances 0.000 claims description 23
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 10
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 10
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 10
- 239000000463 material Substances 0.000 abstract description 49
- 238000004519 manufacturing process Methods 0.000 abstract description 23
- 238000000034 method Methods 0.000 abstract description 19
- 230000015572 biosynthetic process Effects 0.000 abstract description 13
- 239000000126 substance Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 105
- 210000004027 cell Anatomy 0.000 description 40
- 239000013078 crystal Substances 0.000 description 13
- 239000004698 Polyethylene Substances 0.000 description 7
- -1 polyethylene Polymers 0.000 description 7
- 229920000573 polyethylene Polymers 0.000 description 7
- 238000005215 recombination Methods 0.000 description 7
- 230000006798 recombination Effects 0.000 description 7
- 238000002679 ablation Methods 0.000 description 6
- 230000006378 damage Effects 0.000 description 6
- 239000003550 marker Substances 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- 239000011358 absorbing material Substances 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000005360 phosphosilicate glass Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003685 thermal hair damage Effects 0.000 description 2
- 229910020776 SixNy Inorganic materials 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000013034 coating degradation Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/93—Interconnections
- H10F77/933—Interconnections for devices having potential barriers
- H10F77/935—Interconnections for devices having potential barriers for photovoltaic devices or modules
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/146—Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
- H10F77/219—Arrangements for electrodes of back-contact photovoltaic cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
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- Photovoltaic Devices (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US26565209P | 2009-12-01 | 2009-12-01 | |
| US61/265,652 | 2009-12-01 | ||
| US12/895,437 | 2010-09-30 | ||
| US12/895,437 US8324015B2 (en) | 2009-12-01 | 2010-09-30 | Solar cell contact formation using laser ablation |
| CN201080054693.2A CN102640300B (zh) | 2009-12-01 | 2010-10-01 | 使用激光烧蚀的太阳能电池的接触形成 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080054693.2A Division CN102640300B (zh) | 2009-12-01 | 2010-10-01 | 使用激光烧蚀的太阳能电池的接触形成 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107134498A CN107134498A (zh) | 2017-09-05 |
| CN107134498B true CN107134498B (zh) | 2019-06-28 |
Family
ID=44067930
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710165852.XA Active CN107134498B (zh) | 2009-12-01 | 2010-10-01 | 使用激光烧蚀的太阳能电池的接触形成 |
| CN201080054693.2A Active CN102640300B (zh) | 2009-12-01 | 2010-10-01 | 使用激光烧蚀的太阳能电池的接触形成 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080054693.2A Active CN102640300B (zh) | 2009-12-01 | 2010-10-01 | 使用激光烧蚀的太阳能电池的接触形成 |
Country Status (7)
| Country | Link |
|---|---|
| US (6) | US8324015B2 (https=) |
| EP (3) | EP3723141B1 (https=) |
| JP (3) | JP5726892B2 (https=) |
| CN (2) | CN107134498B (https=) |
| MY (1) | MY155779A (https=) |
| PH (1) | PH12012500956A1 (https=) |
| WO (1) | WO2011068590A2 (https=) |
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| US8324015B2 (en) * | 2009-12-01 | 2012-12-04 | Sunpower Corporation | Solar cell contact formation using laser ablation |
| US8677929B2 (en) * | 2010-12-29 | 2014-03-25 | Intevac, Inc. | Method and apparatus for masking solar cell substrates for deposition |
| US8658458B2 (en) * | 2011-06-15 | 2014-02-25 | Varian Semiconductor Equipment Associates, Inc. | Patterned doping for polysilicon emitter solar cells |
| US8692111B2 (en) * | 2011-08-23 | 2014-04-08 | Sunpower Corporation | High throughput laser ablation processes and structures for forming contact holes in solar cells |
| EP2579317A1 (en) * | 2011-10-07 | 2013-04-10 | Total SA | Method of manufacturing a solar cell with local back contacts |
| CN103890978A (zh) * | 2011-10-28 | 2014-06-25 | 应用材料公司 | 用于太阳能电池制造的背接点通孔形成工艺 |
| US20130199606A1 (en) * | 2012-02-06 | 2013-08-08 | Applied Materials, Inc. | Methods of manufacturing back surface field and metallized contacts on a solar cell device |
| DE102012205966A1 (de) * | 2012-04-12 | 2013-10-17 | Robert Bosch Gmbh | Verfahren zur Herstellung eines Dünnschicht-Solarmoduls |
| JP6334675B2 (ja) * | 2013-03-15 | 2018-05-30 | サンパワー コーポレイション | 太陽電池及びその製造方法 |
| EP4092764A1 (en) | 2013-04-03 | 2022-11-23 | Lg Electronics Inc. | Solar cell |
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| KR102045001B1 (ko) * | 2013-06-05 | 2019-12-02 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| KR101622089B1 (ko) * | 2013-07-05 | 2016-05-18 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| KR101620431B1 (ko) * | 2014-01-29 | 2016-05-12 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| KR101569415B1 (ko) * | 2014-06-09 | 2015-11-16 | 엘지전자 주식회사 | 태양 전지의 제조 방법 |
| KR102219804B1 (ko) | 2014-11-04 | 2021-02-24 | 엘지전자 주식회사 | 태양 전지 및 그의 제조 방법 |
| JP6219913B2 (ja) | 2014-11-28 | 2017-10-25 | エルジー エレクトロニクス インコーポレイティド | 太陽電池及びその製造方法 |
| US10535790B2 (en) * | 2015-06-25 | 2020-01-14 | Sunpower Corporation | One-dimensional metallization for solar cells |
| KR102272433B1 (ko) | 2015-06-30 | 2021-07-05 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| KR102600379B1 (ko) * | 2015-12-21 | 2023-11-10 | 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 | 태양 전지와 그 제조 방법 |
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| US12329704B2 (en) | 2021-08-23 | 2025-06-17 | Medline Industries, Lp | Absorbent repositioning pad and method |
| CN117059681B (zh) | 2023-10-09 | 2024-03-29 | 晶科能源(海宁)有限公司 | 太阳能电池及其制造方法、光伏组件 |
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| CN103890978A (zh) | 2011-10-28 | 2014-06-25 | 应用材料公司 | 用于太阳能电池制造的背接点通孔形成工艺 |
| DE102012205966A1 (de) | 2012-04-12 | 2013-10-17 | Robert Bosch Gmbh | Verfahren zur Herstellung eines Dünnschicht-Solarmoduls |
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| US9768343B2 (en) | 2013-04-29 | 2017-09-19 | OB Realty, LLC. | Damage free laser patterning of transparent layers for forming doped regions on a solar cell substrate |
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| CN101447518A (zh) * | 2008-12-31 | 2009-06-03 | 江苏艾德太阳能科技有限公司 | 一种背点接触异质结太阳能电池及其制造方法 |
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