JP2017076826A - 太陽電池 - Google Patents
太陽電池 Download PDFInfo
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- 239000000758 substrate Substances 0.000 claims abstract description 55
- 238000004519 manufacturing process Methods 0.000 claims abstract description 49
- 239000003989 dielectric material Substances 0.000 claims abstract description 36
- 239000013078 crystal Substances 0.000 claims abstract description 33
- 238000000608 laser ablation Methods 0.000 claims abstract description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 56
- 235000012239 silicon dioxide Nutrition 0.000 claims description 28
- 239000000377 silicon dioxide Substances 0.000 claims description 28
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 12
- 238000002679 ablation Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 abstract description 45
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 24
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 14
- 238000005215 recombination Methods 0.000 description 7
- 230000006798 recombination Effects 0.000 description 7
- 230000006378 damage Effects 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 230000002745 absorbent Effects 0.000 description 3
- 239000002250 absorbent Substances 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000005388 borosilicate glass Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000005360 phosphosilicate glass Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003685 thermal hair damage Effects 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910020776 SixNy Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000008832 photodamage Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
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- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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- H01L31/02002—Arrangements for conducting electric current to or from the device in operations
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- H01L31/02008—Arrangements for conducting electric current to or from the device in operations for device characterised by at least one potential jump barrier or surface barrier for solar cells or solar cell modules
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- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
- H01L31/0682—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells back-junction, i.e. rearside emitter, solar cells, e.g. interdigitated base-emitter regions back-junction cells
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
Description
[項目1]
裏面コンタクト型太陽電池の製造方法であって、
単結晶基板の上方に多結晶材料層を形成する段階と、
前記多結晶材料層の上方に誘電材料積層体を形成する段階と、
レーザアブレーションによって、前記誘電材料積層体内に複数のコンタクト開口を形成して、コンタクト開口それぞれの内部に前記多結晶材料層の一部を露呈させる段階と、
前記複数のコンタクト開口内に導電性のコンタクトを形成する段階とを備える製造方法。
[項目2]
前記単結晶基板の上方に前記多結晶材料層を形成する段階は、
単結晶シリコン基板の上方に多結晶シリコン層を形成する段階を含む項目1に記載の製造方法。
[項目3]
前記単結晶シリコン基板の上方に前記多結晶シリコン層を形成する段階は、
前記単結晶シリコン基板の上に直接形成された誘電膜の上に直接、前記多結晶シリコン層を形成する段階と、前記多結晶シリコン層の中に、N型ドーピング領域およびP型ドーピング領域両方を形成する段階とを含む項目2に記載の製造方法。
[項目4]
前記単結晶基板の上方に前記多結晶材料層を形成する段階は、
前記単結晶基板内のN型ドーピング領域およびP型ドーピング領域の上方に前記多結晶材料層を形成する段階を含む項目1に記載の製造方法。
[項目5]
前記多結晶材料層の上方に前記誘電材料積層体を形成する段階は、
前記多結晶材料層の上に直接、二酸化シリコン層を形成する段階と、前記二酸化シリコン層の上に直接、シリコン窒化物層を形成する段階とを含む項目1に記載の製造方法。
[項目6]
前記二酸化シリコン層を形成する段階は、
前記層の厚みを約1から50ナノメートルの範囲に形成する段階を含む項目5に記載の製造方法。
[項目7]
前記多結晶材料層の上方に前記誘電材料積層体を形成する段階は、
シリコン窒化物層のみを形成する段階を含む項目1に記載の製造方法。
[項目8]
前記複数のコンタクト開口を形成する段階は、パターニングされたマスクを利用せずに行われる項目1に記載の製造方法。
[項目9]
前記複数のコンタクト開口を形成する段階は、
波長が約1064ナノメートル以下であるレーザを利用してアブレーションを行う段階を含む項目1に記載の製造方法。
[項目10]
前記多結晶材料層はアモルファスシリコンを含む項目1に記載の製造方法。
[項目11]
単結晶基板の上方に設けられた多結晶材料層と、
前記多結晶材料層の上方に設けられた誘電材料積層体と、
前記誘電材料積層体内に設けられ、前記多結晶材料層の一部に直接連結されている複数の導電性のコンタクトと、
前記多結晶材料層内に設けられ、前記複数の導電性のコンタクトのうちのいずれかと位置合わせされた、リキャストされたポリシグネチャーとを備える裏面コンタクト型太陽電池。
[項目12]
前記多結晶材料層は、多結晶シリコン層であり、前記単結晶基板は、単結晶シリコン基板である項目11に記載の裏面コンタクト型太陽電池。
[項目13]
前記多結晶シリコン層は、誘電膜の上に直接設けられており、前記誘電膜は前記単結晶シリコン基板の上に直接設けられており、前記多結晶シリコン層は、N型ドーピング領域およびP型ドーピング領域を両方含む項目12に記載の裏面コンタクト型太陽電池。
[項目14]
前記単結晶シリコン基板は、N型ドーピング領域およびP型ドーピング領域を含む項目12に記載の裏面コンタクト型太陽電池。
[項目15]
前記誘電材料積層体は、前記多結晶材料層の上に直接設けられた二酸化シリコン層と、前記二酸化シリコン層の上に直接設けられたシリコン窒化物層とを含む項目11に記載の裏面コンタクト型太陽電池。
[項目16]
前記二酸化シリコン層の厚みは約1から50ナノメートルの範囲である項目15に記載の裏面コンタクト型太陽電池。
[項目17]
前記誘電材料積層体はシリコン窒化物層のみを含む項目11に記載の裏面コンタクト型太陽電池。
[項目18]
前記複数の導電性のコンタクトはそれぞれ丸い形状である項目11に記載の裏面コンタクト型太陽電池。
[項目19]
裏面コンタクト型太陽電池の製造方法であって、
単結晶基板の上方に多結晶材料層を形成する段階と、
前記多結晶材料層の上方に誘電材料積層体を形成する段階と、
前記多結晶材料層内に、リキャストされたポリシグネチャーを形成する段階と、
前記誘電材料積層体内に複数の導電性のコンタクトを形成して、前記多結晶材料層の一部に直接連結して、前記複数の導電性のコンタクトのうち1つを、前記リキャストされたポリシグネチャーと位置合わせする段階とを備える製造方法。
[項目20]
前記単結晶基板の上方に前記多結晶材料層を形成する段階は、
単結晶シリコン基板の上方に多結晶シリコン層を形成する段階を含む項目19に記載の製造方法。
[項目21]
前記単結晶シリコン基板の上方に前記多結晶シリコン層を形成する段階は、
前記単結晶シリコン基板の上に直接形成された誘電膜の上に直接、前記多結晶シリコン層を形成する段階と、前記多結晶シリコン層の中に、N型ドーピング領域およびP型ドーピング領域両方を形成する段階とを含む項目20に記載の製造方法。
[項目22]
前記単結晶シリコン基板の上方に前記多結晶シリコン層を形成する段階は、
前記単結晶基板内のN型ドーピング領域およびP型ドーピング領域の上方にアモルファスシリコン層を形成する段階を含む項目20に記載の製造方法。
[項目23]
前記多結晶材料層の上方に前記誘電材料積層体を形成する段階は、
前記多結晶材料層の上に直接、二酸化シリコン層を形成する段階と、前記二酸化シリコン層の上に直接、シリコン窒化物層を形成する段階とを含む項目19に記載の製造方法。
[項目24]
前記二酸化シリコン層を形成する段階は、
前記層の厚みを約1から50ナノメートルの範囲に形成する段階を含む項目23に記載の製造方法。
[項目25]
前記多結晶材料層の上方に前記誘電材料積層体を形成する段階は、
シリコン窒化物層のみを形成する段階を含む項目19に記載の製造方法。
[項目26]
前記複数の導電性のコンタクトはそれぞれ丸い形状である項目19に記載の製造方法。
[項目27]
前記リキャストされたポリシグネチャーを形成する段階は、
波長が約1064ナノメートル以下であるレーザを利用してアブレーションを行う段階を含む項目19に記載の製造方法。
Claims (6)
- 太陽電池の製造方法であって、
単結晶基板の上方にシリコン層を形成する段階と、
前記シリコン層の上方に誘電材料を形成する段階と、
レーザアブレーションによって、前記誘電材料内に複数のコンタクト開口を形成して、前記複数のコンタクト開口それぞれに前記シリコン層の一部を露呈させる段階と、
前記複数のコンタクト開口内に導電性のコンタクトを形成する段階と
を備え、
前記シリコン層の上方に前記誘電材料を形成する段階は、
前記シリコン層の上に直接、二酸化シリコン層を形成する段階と、
前記二酸化シリコン層の上に直接、シリコン窒化物層を形成する段階とを含む
製造方法。 - 前記二酸化シリコン層を形成する段階は、
前記シリコン層の上に直接、厚みが1から50ナノメートルの範囲の前記二酸化シリコン層を形成する段階を含む請求項1に記載の製造方法。 - 前記単結晶基板の上方にシリコン層を前記形成する段階は、前記単結晶基板の上方に多結晶材料を形成する段階を含む請求項1又は2に記載の製造方法。
- 前記導電性のコンタクトを形成する段階は、前記シリコン層のP型ドーピング領域に電気的に接続する第1の導電性のコンタクトと、前記シリコン層のN型ドーピング領域に電気的に接続する第2の導電性のコンタクトとを形成する段階を含む請求項1から3のいずれか1項に記載の製造方法。
- 前記複数のコンタクト開口を形成する段階は、パターニングされたマスクを利用せずに行われる請求項1から4のいずれか1項に記載の製造方法。
- 前記複数のコンタクト開口を形成する段階は、
波長が1064ナノメートル以下であるレーザを利用してアブレーションを行う段階を含む請求項1から5のいずれか1項に記載の製造方法。
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US20190245099A1 (en) | 2019-08-08 |
US8324015B2 (en) | 2012-12-04 |
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US11152518B2 (en) | 2021-10-19 |
US20140134787A9 (en) | 2014-05-15 |
EP2507844B1 (en) | 2020-03-25 |
CN102640300B (zh) | 2017-04-12 |
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