CN107119244A - 一种高择优取向细晶超高纯铝靶材的制备方法 - Google Patents
一种高择优取向细晶超高纯铝靶材的制备方法 Download PDFInfo
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- CN107119244A CN107119244A CN201710416241.8A CN201710416241A CN107119244A CN 107119244 A CN107119244 A CN 107119244A CN 201710416241 A CN201710416241 A CN 201710416241A CN 107119244 A CN107119244 A CN 107119244A
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- pure aluminum
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- sheet material
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/04—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metal Rolling (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
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CN201710416241.8A CN107119244B (zh) | 2017-06-06 | 2017-06-06 | 一种高择优取向细晶超高纯铝靶材的制备方法 |
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CN201710416241.8A CN107119244B (zh) | 2017-06-06 | 2017-06-06 | 一种高择优取向细晶超高纯铝靶材的制备方法 |
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CN107119244A true CN107119244A (zh) | 2017-09-01 |
CN107119244B CN107119244B (zh) | 2019-04-30 |
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CN201710416241.8A Active CN107119244B (zh) | 2017-06-06 | 2017-06-06 | 一种高择优取向细晶超高纯铝靶材的制备方法 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107523795A (zh) * | 2017-10-24 | 2017-12-29 | 宝鸡市铭坤有色金属有限公司 | 一种钛靶材的制造方法 |
CN109174996A (zh) * | 2018-08-24 | 2019-01-11 | 爱发科电子材料(苏州)有限公司 | Tft液晶面板配线层用高纯铝靶材的板材压延工艺 |
CN110205590A (zh) * | 2019-05-08 | 2019-09-06 | 东莞市欧莱溅射靶材有限公司 | 一种超高纯铝溅射靶材及其轧制方法 |
CN111318570A (zh) * | 2020-03-05 | 2020-06-23 | 爱发科电子材料(苏州)有限公司 | 一种靶材晶粒微细化的制成工艺 |
CN113755801A (zh) * | 2021-09-17 | 2021-12-07 | 福州大学 | 一种具有均匀取向的高纯铝靶材的制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102002653A (zh) * | 2010-11-27 | 2011-04-06 | 东北大学 | 一种超高纯铝细晶、高取向靶材的制备方法 |
CN103834924A (zh) * | 2013-12-25 | 2014-06-04 | 利达光电股份有限公司 | 一种制备超高纯铝及超高纯铝合金溅射靶材的方法 |
CN105525149A (zh) * | 2014-09-29 | 2016-04-27 | 有研亿金新材料有限公司 | 一种铝合金溅射靶材的制备方法 |
-
2017
- 2017-06-06 CN CN201710416241.8A patent/CN107119244B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102002653A (zh) * | 2010-11-27 | 2011-04-06 | 东北大学 | 一种超高纯铝细晶、高取向靶材的制备方法 |
CN103834924A (zh) * | 2013-12-25 | 2014-06-04 | 利达光电股份有限公司 | 一种制备超高纯铝及超高纯铝合金溅射靶材的方法 |
CN105525149A (zh) * | 2014-09-29 | 2016-04-27 | 有研亿金新材料有限公司 | 一种铝合金溅射靶材的制备方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107523795A (zh) * | 2017-10-24 | 2017-12-29 | 宝鸡市铭坤有色金属有限公司 | 一种钛靶材的制造方法 |
CN109174996A (zh) * | 2018-08-24 | 2019-01-11 | 爱发科电子材料(苏州)有限公司 | Tft液晶面板配线层用高纯铝靶材的板材压延工艺 |
CN110205590A (zh) * | 2019-05-08 | 2019-09-06 | 东莞市欧莱溅射靶材有限公司 | 一种超高纯铝溅射靶材及其轧制方法 |
CN111318570A (zh) * | 2020-03-05 | 2020-06-23 | 爱发科电子材料(苏州)有限公司 | 一种靶材晶粒微细化的制成工艺 |
CN113755801A (zh) * | 2021-09-17 | 2021-12-07 | 福州大学 | 一种具有均匀取向的高纯铝靶材的制备方法 |
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Publication number | Publication date |
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Inventor after: Tu Yiyou Inventor after: Li Feng Inventor after: Xu Wenjing Inventor after: He Han Inventor after: Yuan Mengqi Inventor after: Jiang Jianqing Inventor before: Tu Yiyou Inventor before: Li Feng Inventor before: He Han Inventor before: Xu Wenjing Inventor before: Yuan Mengqi Inventor before: Jiang Jianqing |
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