CN107043107B - 一种垂直取向石墨烯基材料的制备方法 - Google Patents

一种垂直取向石墨烯基材料的制备方法 Download PDF

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CN107043107B
CN107043107B CN201710208346.4A CN201710208346A CN107043107B CN 107043107 B CN107043107 B CN 107043107B CN 201710208346 A CN201710208346 A CN 201710208346A CN 107043107 B CN107043107 B CN 107043107B
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张艳
王玲
张婧
李坤
陈壮
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Abstract

本发明涉及一种垂直取向石墨烯基材料的制备方法,包括以下步骤:(1)取石墨烯基原料分散于溶剂中,得到石墨烯基分散液;(2)将步骤(1)制得的石墨烯基分散液过滤,得到石墨烯基薄膜;(3)将步骤(2)制得的石墨烯基薄膜极速冷冻,干燥,即得到所述垂直取向的石墨烯基材料。与现有技术相比,本发明可以控制氧化石墨烯、石墨烯以及石墨烯复合物等石墨烯基衍生物表面进行垂直取向,所得的石墨烯基材料的导电性等可以得到显著提高,且工艺与设备简单,易于规模化生产等。

Description

一种垂直取向石墨烯基材料的制备方法
技术领域
本发明涉及一种石墨烯基材料表面结构取向控制的方法,尤其是涉及一种垂直取向石墨烯基材料的制备方法。
背景技术
2004年由英国科学家Geim首次报道石墨烯以来,石墨烯大的比表面积、优异的电学、力学、电化学等性能使其迅速成为国内外研究热点,其在场发射晶体管、化学/生物传感器、能源存储等方面也显示出潜在的应用。但是石墨烯往往会由于受π-π相互作用而团聚、堆积,导致比表面积缩小,电阻增大,性能大幅降低,从而限制其应用。为了避免团聚,提高其性能,科学家们通过改变石墨烯的形貌结构得到实现。通过将石墨烯及其衍生物形成三维石墨烯,降低团聚达到提高比表面积的目的,并在超级电容器等领域展示出优异的性能。此外,通过改变石墨烯的取向,将石墨烯形成垂直取向,也成为避免石墨烯团聚的一种重要手段。目前,制备垂直取向石墨烯主要是采用等离子体气相沉积法,通过改变气体组分和比例、温度等条件获得。该方法对于设备要求高,条件较为苛刻。
发明内容
本发明的目的就是为了克服上述现有技术存在的缺陷而提供一种垂直取向石墨烯基材料的制备方法。
本发明的目的可以通过以下技术方案来实现:
一种垂直取向石墨烯基材料的制备方法,包括以下步骤:
(1)取石墨烯基原料分散于溶剂中,得到石墨烯基分散液;
(2)将步骤(1)制得的石墨烯基分散液过滤,得到石墨烯基薄膜;
(3)将步骤(2)制得的石墨烯基薄膜极速冷冻并进行冷冻干燥,即得到所述垂直取向的石墨烯基材料。
进一步的,步骤(1)中所述的石墨烯基原料为石墨烯、氧化石墨烯、化学还原氧化石墨烯或石墨烯复合物中的一种。上述中,氧化石墨烯和化学还原氧化石墨烯溶液是根据文献(Zhang,J.;Yang,H.;Shen,G.;Cheng,P.;Zhang,J.;Guo,S.,Chem.Commun.2010,46,1112-1114.)制备得到。上述的这些材料具有一定的分散性,能够分散于溶剂中,并且通过抽滤方式成膜性好。
更进一步的,所述的石墨烯复合物为石墨烯/聚乙烯吡咯烷酮复合物和石墨烯/二氧化硅复合物。石墨烯/聚乙烯吡咯烷酮(CRG/PVP)复合物是根据文献(Zhang,J.;Shen,G.;Wang,W.;Zhou,X.;Guo,S.;J.Mater.Chem.2010,20,10824)制备得到。石墨烯/二氧化硅复合物是根据文献(Zhang,Q.;Zhang,Q.;Xiong,Z;Wan,H.;Chen,X.;Li,H.;Zou,H,;Talanta146(2016)272–278)制备得到。
步骤(1)中所述的溶剂为乙醇、水或二甲基甲酰胺(DMF)。
步骤(1)中石墨烯基分散液的浓度为0.5~2g/L。
步骤(3)中极速冷冻的条件为:置于液氮或干冰中。
步骤(3)中的干燥为:置于冷冻干燥机中干燥,时间为6-24h。
本发明制备垂直取向石墨烯基材料的原理为:首先将石墨烯基原料分散于溶剂中,然后采用抽滤方式等成膜,最后将成膜后的产品置于液氮或干冰中极冷,对薄膜中的少量溶剂快速冷冻,再通过后续的冷冻干燥,使得薄膜中冷冻的溶剂升华,进而使石墨烯基薄膜上形成垂直取向。
与现有技术相比,本发明可以在石墨烯及其衍生物薄膜表面形成垂直取向结构,制备工艺和实验设备简单,便于大规模量产,产品的电学性能可得到增强。
附图说明
图1为本发明实施例1制得的垂直取向的石墨烯基材料。
具体实施方式
下面结合附图和具体实施例对本发明进行详细说明。
实施例1
将60mg氧化石墨烯(GO)溶于30mL去离子水中形成浓度为2mg/mL的GO溶液。将制备得到的2mg/ml氧化石墨烯溶液取1ml样品,使用砂芯抽滤装置进行氧化石墨烯薄膜的制备,制备得到面积为1*1cm2,质量为2mg的氧化石墨烯薄膜。将薄膜放入液氮中快速冷冻,取出后冷冻干燥机中干燥12h,得到垂直取向的氧化石墨烯材料。
对氧化石墨烯材料进行形貌表征,其结果如图1所示。四探针法测电阻如表1所示。
实施例2
将60mg石墨烯溶于30mL去离子水中形成浓度为2mg/mL的GO溶液。将制备得到的2mg/ml石墨烯溶液取1ml样品,使用砂芯抽滤装置进行石墨烯薄膜的制备,制备得到面积为1*1cm2,质量为2mg的石墨烯薄膜。将薄膜放入干冰中快速冷冻,取出后冷冻干燥机中干燥12h,得到垂直取向的石墨烯材料。
实施例3
采用化学还原氧化石墨烯(CRGO)分散于超纯水中制备得到浓度为2mg/mL的CRGO均匀溶液。将制备得到的2mg/ml CRGO溶液取1ml样品,使用砂芯抽滤装置进行CRGO薄膜的制备,制备得到面积为1*1cm2,质量为2mg的CRGO薄膜。将薄膜放入液氮中极速冷冻,取出后冷冻干燥机中干燥12h,得到垂直取向的化学还原氧化石墨烯材料。四探针法测电阻如表1所示。
实施例4
采用CRGO分散于DMF中制备得到浓度为0.5mg/mL的CRGO分散液。将制备得到的0.5mg/ml CRGO溶液取8ml样品,使用砂芯抽滤装置进行CRGO薄膜的制备,制备得到面积为1*1cm2,质量为2mg的CRGO薄膜。将薄膜放入干冰中极速冷冻,并将样品冷冻干燥12h,得到垂直取向的化学还原氧化石墨烯材料。
实施例5
将30mg石墨烯/二氧化硅分散于30mL乙醇中形成浓度为1mg/mL的溶液。将制备得到的1mg/ml石墨烯/二氧化硅溶液取2ml样品,使用砂芯抽滤装置进行氧化石墨烯薄膜的制备,制备得到面积为1*1cm2,质量为2mg的氧化石墨烯薄膜。将薄膜放入液氮中冷冻,取出后冷冻干燥机中干燥12h,得到垂直取向的氧化石墨烯材料。
实施例6
采用石墨烯/聚乙烯吡咯烷酮(CRG/PVP)分散于去离子水中制备得到浓度为1mg/mL的分散液。将制备得到的溶液取2ml样品,使用砂芯抽滤装置进行石墨烯复合物薄膜的制备,制备得到面积为1*1cm2,质量为2mg的石墨烯复合物薄膜。将薄膜放入干冰中极速冷冻,取出后冷冻干燥机中干燥12h,得到垂直取向的石墨烯复合物材料。
表1 GO薄膜和CRGO薄膜分别经过垂直取向处理前后的平均电阻率
薄膜种类 处理前/平均电阻率(kΩ·cm) 处理后/平均电阻率(kΩ·cm)
GO 52.17 10.50
CRGO 6.66×10<sup>-5</sup> 3.36×10<sup>-5</sup>
由上表可知,GO薄膜和CRGO薄膜经过处理后,电阻率明显下降,导电性能提高。
上述的对实施例的描述是为便于该技术领域的普通技术人员能理解和使用发明。熟悉本领域技术的人员显然可以容易地对这些实施例做出各种修改,并把在此说明的一般原理应用到其他实施例中而不必经过创造性的劳动。因此,本发明不限于上述实施例,本领域技术人员根据本发明的揭示,不脱离本发明范畴所做出的改进和修改都应该在本发明的保护范围之内。

Claims (3)

1.一种垂直取向石墨烯基材料的制备方法,其特征在于,包括以下步骤:
(1)取石墨烯基原料分散于溶剂中,得到石墨烯基分散液;
(2)将步骤(1)制得的石墨烯基分散液过滤,得到石墨烯基薄膜;
(3)将步骤(2)制得的石墨烯基薄膜极速冷冻,干燥,即得到所述垂直取向的石墨烯基材料;
步骤(1)中所述的溶剂为乙醇、水或二甲基甲酰胺;
步骤(3)中极速冷冻的条件为:置于液氮或干冰中。
2.根据权利要求1所述的一种垂直取向石墨烯基材料的制备方法,其特征在于,步骤(1)中所述的石墨烯基原料为石墨烯、氧化石墨烯或石墨烯复合物中的一种。
3.根据权利要求2所述的一种垂直取向石墨烯基材料的制备方法,其特征在于,所述的石墨烯复合物为石墨烯/聚乙烯吡咯烷酮复合物或者石墨烯/二氧化硅复合物。
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