CN106927468A - 一种制备电子级三氯氢硅的装置 - Google Patents
一种制备电子级三氯氢硅的装置 Download PDFInfo
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- CN106927468A CN106927468A CN201710226793.2A CN201710226793A CN106927468A CN 106927468 A CN106927468 A CN 106927468A CN 201710226793 A CN201710226793 A CN 201710226793A CN 106927468 A CN106927468 A CN 106927468A
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- trichlorosilane
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- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 title claims abstract description 53
- 239000005052 trichlorosilane Substances 0.000 title claims abstract description 53
- 239000012535 impurity Substances 0.000 claims abstract description 50
- 150000003934 aromatic aldehydes Chemical class 0.000 claims abstract description 27
- 239000000470 constituent Substances 0.000 claims abstract description 20
- 238000010521 absorption reaction Methods 0.000 claims abstract description 19
- 239000002994 raw material Substances 0.000 claims abstract description 9
- 238000000746 purification Methods 0.000 claims description 22
- 238000001179 sorption measurement Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 15
- 229910001220 stainless steel Inorganic materials 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002952 polymeric resin Substances 0.000 claims description 7
- 229920003002 synthetic resin Polymers 0.000 claims description 7
- 239000000945 filler Substances 0.000 claims description 6
- 230000003746 surface roughness Effects 0.000 claims description 6
- 229910052796 boron Inorganic materials 0.000 claims description 5
- 125000000524 functional group Chemical group 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 239000002826 coolant Substances 0.000 claims description 3
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 238000005868 electrolysis reaction Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 16
- 238000005265 energy consumption Methods 0.000 abstract description 8
- 238000004904 shortening Methods 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 description 19
- 238000009835 boiling Methods 0.000 description 18
- 239000003153 chemical reaction reagent Substances 0.000 description 15
- 239000005046 Chlorosilane Substances 0.000 description 8
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000003463 adsorbent Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- -1 wherein Substances 0.000 description 3
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 2
- GDFCWFBWQUEQIJ-UHFFFAOYSA-N [B].[P] Chemical compound [B].[P] GDFCWFBWQUEQIJ-UHFFFAOYSA-N 0.000 description 2
- POFAUXBEMGMSAV-UHFFFAOYSA-N [Si].[Cl] Chemical compound [Si].[Cl] POFAUXBEMGMSAV-UHFFFAOYSA-N 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 238000005660 chlorination reaction Methods 0.000 description 2
- 229930016911 cinnamic acid Natural products 0.000 description 2
- 235000013985 cinnamic acid Nutrition 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007792 gaseous phase Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000001496 (E)-2-methyl-3-phenylprop-2-enal Substances 0.000 description 1
- VLUMOWNVWOXZAU-VQHVLOKHSA-N (e)-2-methyl-3-phenylprop-2-enal Chemical compound O=CC(/C)=C/C1=CC=CC=C1 VLUMOWNVWOXZAU-VQHVLOKHSA-N 0.000 description 1
- POQJHLBMLVTHAU-UHFFFAOYSA-N 3,4-Dimethylbenzaldehyde Chemical class CC1=CC=C(C=O)C=C1C POQJHLBMLVTHAU-UHFFFAOYSA-N 0.000 description 1
- BXRFQSNOROATLV-UHFFFAOYSA-N 4-nitrobenzaldehyde Chemical compound [O-][N+](=O)C1=CC=C(C=O)C=C1 BXRFQSNOROATLV-UHFFFAOYSA-N 0.000 description 1
- 241000522254 Cassia Species 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 244000131316 Panax pseudoginseng Species 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical class CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- ZWLUXSQADUDCSB-UHFFFAOYSA-N phthalaldehyde Chemical compound O=CC1=CC=CC=C1C=O ZWLUXSQADUDCSB-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000000066 reactive distillation Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10778—Purification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/18—Stationary reactors having moving elements inside
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
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CN201710226793.2A CN106927468A (zh) | 2017-04-06 | 2017-04-06 | 一种制备电子级三氯氢硅的装置 |
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CN201710226793.2A CN106927468A (zh) | 2017-04-06 | 2017-04-06 | 一种制备电子级三氯氢硅的装置 |
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CN201710226793.2A Pending CN106927468A (zh) | 2017-04-06 | 2017-04-06 | 一种制备电子级三氯氢硅的装置 |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108408729A (zh) * | 2018-05-02 | 2018-08-17 | 西安蓝深环保科技有限公司 | 一种三氯氢硅中分离重金属的方法 |
CN108467042A (zh) * | 2018-03-20 | 2018-08-31 | 中国恩菲工程技术有限公司 | 电子级多晶硅的制备方法 |
CN108946742A (zh) * | 2018-09-28 | 2018-12-07 | 洛阳中硅高科技有限公司 | 提纯三氯氢硅的装置 |
CN110156026A (zh) * | 2019-04-26 | 2019-08-23 | 新疆大全新能源股份有限公司 | 一种多晶硅原料的提纯工艺 |
CN111453736A (zh) * | 2020-04-27 | 2020-07-28 | 江苏鑫华半导体材料科技有限公司 | 三氯氢硅净化系统和方法 |
CN114735709A (zh) * | 2022-06-15 | 2022-07-12 | 北京化工大学 | 一种精馏、吸附、膜分离联合生产电子级三氯氢硅的装置及方法 |
CN116407861A (zh) * | 2023-03-16 | 2023-07-11 | 清电光伏科技有限公司 | 一种基于固定床的电子级多晶硅精馏除碳装置及方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101786630A (zh) * | 2010-01-29 | 2010-07-28 | 天津大学 | 三氯氢硅三塔差压耦合节能精馏提纯系统及操作方法 |
CN102642839A (zh) * | 2012-05-09 | 2012-08-22 | 特变电工新疆硅业有限公司 | 工业级四氯化硅的处理工艺 |
CN103201218A (zh) * | 2010-10-27 | 2013-07-10 | 信越化学工业株式会社 | 氯硅烷类的纯化方法 |
CN103553058A (zh) * | 2013-11-11 | 2014-02-05 | 新特能源股份有限公司 | 一种高纯精制三氯氢硅的生产工艺 |
CN103950935A (zh) * | 2014-03-31 | 2014-07-30 | 中国恩菲工程技术有限公司 | 无关联塔差压热耦合提纯氯硅烷的系统 |
-
2017
- 2017-04-06 CN CN201710226793.2A patent/CN106927468A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101786630A (zh) * | 2010-01-29 | 2010-07-28 | 天津大学 | 三氯氢硅三塔差压耦合节能精馏提纯系统及操作方法 |
CN103201218A (zh) * | 2010-10-27 | 2013-07-10 | 信越化学工业株式会社 | 氯硅烷类的纯化方法 |
CN102642839A (zh) * | 2012-05-09 | 2012-08-22 | 特变电工新疆硅业有限公司 | 工业级四氯化硅的处理工艺 |
CN103553058A (zh) * | 2013-11-11 | 2014-02-05 | 新特能源股份有限公司 | 一种高纯精制三氯氢硅的生产工艺 |
CN103950935A (zh) * | 2014-03-31 | 2014-07-30 | 中国恩菲工程技术有限公司 | 无关联塔差压热耦合提纯氯硅烷的系统 |
Non-Patent Citations (1)
Title |
---|
张远弟等: "三氯氢硅精馏工艺的模拟研究", 《现代化工》 * |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108467042A (zh) * | 2018-03-20 | 2018-08-31 | 中国恩菲工程技术有限公司 | 电子级多晶硅的制备方法 |
CN108467042B (zh) * | 2018-03-20 | 2019-12-31 | 中国恩菲工程技术有限公司 | 电子级多晶硅的制备方法 |
CN108408729A (zh) * | 2018-05-02 | 2018-08-17 | 西安蓝深环保科技有限公司 | 一种三氯氢硅中分离重金属的方法 |
CN108946742A (zh) * | 2018-09-28 | 2018-12-07 | 洛阳中硅高科技有限公司 | 提纯三氯氢硅的装置 |
CN110156026A (zh) * | 2019-04-26 | 2019-08-23 | 新疆大全新能源股份有限公司 | 一种多晶硅原料的提纯工艺 |
CN110156026B (zh) * | 2019-04-26 | 2020-09-04 | 新疆大全新能源股份有限公司 | 一种多晶硅原料的提纯工艺 |
CN111453736A (zh) * | 2020-04-27 | 2020-07-28 | 江苏鑫华半导体材料科技有限公司 | 三氯氢硅净化系统和方法 |
CN111453736B (zh) * | 2020-04-27 | 2024-08-06 | 江苏鑫华半导体科技股份有限公司 | 三氯氢硅净化系统和方法 |
CN114735709A (zh) * | 2022-06-15 | 2022-07-12 | 北京化工大学 | 一种精馏、吸附、膜分离联合生产电子级三氯氢硅的装置及方法 |
CN116407861A (zh) * | 2023-03-16 | 2023-07-11 | 清电光伏科技有限公司 | 一种基于固定床的电子级多晶硅精馏除碳装置及方法 |
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Inventor after: Liu Jianhua Inventor after: Zhao Xiong Inventor after: Wan Ye Inventor after: Jiang Lixia Inventor after: Guo Shuhu Inventor after: Yang Yongliang Inventor after: Yan Dazhou Inventor after: Du Junping Inventor after: Zhang Shengxue Inventor before: Liu Jianhua Inventor before: Zhao Xiong Inventor before: Wan Ye Inventor before: Jiang Lixia Inventor before: Guo Shuhu Inventor before: Yang Yongliang Inventor before: Yan Dazhou Inventor before: Du Junping Inventor before: Zhang Shengxue |
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Application publication date: 20170707 |
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