CN106707699B - Exposure device, device making method - Google Patents

Abstract

The present invention provides exposure device, device making method.A kind of exposure device is used up substrate irradiation exposure through liquid so that the base plate exposure, has：Projection optical system, will be as penetrating liquid shadow-mark；Movable link supports the substrate and movement；Liquid organization of supply, from the top of the movable link through supply opening to supplying liquid under the projection optical system；And liquids recovery mechanism, the liquid of the supply is recycled with the gases from the top of the movable link through suction port；There is receiving to be recycled from the suction port for the liquids recovery mechanism and the slot of liquid detached with gas and detection be housed in the slot liquid amount detector.

Description

Exposure device, device making method

It is on July 26th, 2004, entitled " exposure that the application, which is application No. is the 201410333238.6, applying date, The divisional application of the application for a patent for invention of device, device making method ".Wherein, application No. is 201410333238.6 applications Be application No. is the 200480021856.1, applying date be on July 26th, 2004, entitled " exposure device, device manufacturing method The divisional application of the application for a patent for invention of the control method of method and exposure device ".

Technical field

The present invention relates to a kind of exposure device being exposed to substrate by projection optics system and liquid, using the exposure The device making method of device and the control method of exposure device.

Background technology

Semiconductor devices or liquid crystal display device are transferred to by the figure that will be formed on mask on photosensitive substrate So-called photolithography method manufacture.The exposure device that the photo-mask process uses has the base of the mask platform and supporting substrates of bearing mask Pallet moves mask platform and Substrate table on one side, the figure of mask is transferred to substrate by projection optics system on one side successively.In recent years Come, in order to cope with the further highly integrated of component graphics, it is desirable to obtain the higher resolution of projection optics system.It uses Exposure wavelength it is shorter, when numerical aperture of projection optics system is bigger, the resolution of projection optics system is higher.For this purpose, exposure dress It sets the exposure wavelength used to shorten year by year, the numerical aperture of projection optics system also increases.The exposure wavelength of present mainstream be KrF by The 248nm of excimers laser, but the 193nm of shorter wavelengths of ArF excimer lasers also just obtains functionization.In addition, When exposure is made, same as resolution, depth of focus (DOF) also becomes important.Resolution R and depth of focus δ are indicated with following formula respectively.

R=k₁·λ/NA …(1)

δ=± k₂·λ/NA² …(2)

Wherein, λ is exposure wavelength, and NA is the numerical aperture of projection optics system, k₁、k₂For process factor.From (1) formula, (2) It is found that when reducing exposure wavelength lambda in order to improve resolution R, increasing numerical aperture NA, depth of focus δ's formula narrows.

When depth of focus δ becomes narrow, it is difficult to keep substrate surface consistent with the image planes of projection optics system, deposit during exposure The insufficient danger of surplus.Therefore, as the substantial method for reducing exposure wavelength and expanding depth of focus, such as propose there is disclosure In the immersion method of No. 99/49504 bulletin of International Publication No..The liquid such as the immersion method water or organic solvent are full of projection optics system Below between substrate surface, form liquid immersion area, the wavelength using the exposure light in liquid is that (n is by 1/n in air The refractive index of liquid, usually 1.2~1.6 or so) this point, resolution is improved, meanwhile, depth of focus is expanded as about n times.

But in liquid immersion exposure apparatus, the liquid leakage such as exposure or immersion then exist and cause to fill by the liquid The possibility for the problems such as setting the failure of component, leaking electricity or get rusty.In addition, processing cannot be exposed well.

Invention content

The present invention is exactly given this situation to make, and its purpose is to provide a kind of occasions using immersion method Also it can be exposed the exposure device of processing, the control method of device making method and exposure device well.In addition, can carry The influence generated, the exposure device, the device that are exposed processing well are immersed in leakage for the liquid that can reduce exposure The control method of part manufacturing method and exposure device.

To solve the above-mentioned problems, the present invention is using following composition corresponding with Fig. 1~Figure 22 shown in form of implementation.But It is that the symbol with parantheses that each section uses only is used to illustrate the part, does not limit each section.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 1st form of the present invention by liquid (1), Substrate (P) is exposed；Wherein：With projection optics system (PL) and liquid feed mechanism (10)；

The projection optics system (PL) projects to figure picture on substrate (P)；

Liquid (1) is supplied between projection optics system (PL) and substrate (P) by the liquid feed mechanism (10)；

The supply of liquid feed mechanism (10) stop liquid (1) when detecting exception or failure.

According to the present invention, when detecting abnormal, stop being supplied by the liquid that liquid feed mechanism carries out, so, it can prevent The only expansion of the leakage or immersion of liquid or its loss.It is therefore possible to prevent the failure of peripheral device component, life caused by liquid The generation of the problem of variation of rust or substrate local environment, or reduce the influence of this problem.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 2nd form of the present invention by liquid (1), Substrate (P) is exposed；Wherein have：

By liquid (1) by figure picture project to projection optics system (PL) on substrate (P) and

Electrical equipment (47,48)；

Electric leakage caused by the attachment of liquid (1) in order to prevent, when detecting abnormal, stops to electrical equipment (47,48) Power supply.

According to the present invention, when detecting abnormal, stop electric leakage caused by preventing the attachment of liquid to power electrical apparatus, So the generation of the problems such as failure of the influence and electrical equipment itself that can prevent from leaking electricity to peripheral device, or reduce and thus make At loss.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 3rd form of the present invention by liquid (1), Substrate (P) is exposed；Wherein have：

By liquid (1) by figure picture project to projection optics system (PL) on substrate (P) and

It is passed to the air entry (42A, 66) for attracting system (25)；

The inflow of liquid (1) in order to prevent stops the air-breathing from air entry (42A, 66) when detecting abnormal.

Exposure device is for example with the air bearing (gas bearing) for non-contactly supporting table apparatus for being oppositely oriented face Air entry and absorption keep the various air entries such as the air entry of holding meanss of mask and substrate, still, when liquid flows into When to these air entries, cause the failure of the vacuum systems such as the vacuum pump to circulate with these air entries (attracting system).According to the present invention, When detecting abnormal, stop from air entry air-breathing, so, the problem of liquid can be prevented to be flowed into vacuum system by air entry. In the 1st~the 3rd form of the present invention, " detecting exception ", which means to detect, exposes the i.e. liquid leaching of the base plate exposure by liquid Light generates dysgenic situation, includes not only the relevant exception of circulation detected with liquid, and include detect about It remains substrate and carries out exception of action of mobile platform etc., in addition, also including the related dress for detecting and being connected to exposure device The exception set.For example, also include the occasion of the abnormal signal (alarm) in the liquid manufacturing device detected as relevant apparatus, The liquid manufacturing device manufactures the liquid for being supplied to exposure device.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 4th form of the present invention by liquid (1), Substrate (P) is exposed；Wherein：Have

Figure picture is projected into the projection optics system (PL) on substrate (P) by liquid (1),

It is passed to the air entry (21,61,66) for attracting system (25,70,74),

The separator (22,71,75) of the liquid (1) and gas that are sucked from suction port (21,61,66) is detached, and

Make the drier (23,72,76) of the gas dry detached by separator (22,71,75).

Such as when attracting liquid using vacuum system from the liquid suction port (recovery port) of liquids recovery mechanism, such as recycling Liquid component is flowed into vacuum system (attracting system), then causes the failure etc. of the vacuum system.According to the present invention, with separator to from suction The liquids and gases for drawing mouth sucking carry out gas-liquid separation, and then the gas detached by separator is dried with drier, The problem of thus preventing liquid component (including wet gas) to be flowed into vacuum system.It is therefore possible to prevent vacuum system (attracting system) Failure the problems such as generation, meanwhile, the liquids recovery action carried out by liquids recovery mechanism is well maintained during can growing, can The leakage of liquid caused by preventing the recycling action of liquids recovery mechanism from cannot carry out.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 5th form of the present invention by liquid (1), Substrate (P) is exposed；Wherein：With Substrate table (PST), projection optics system (PL) and control device (CONT)；

The Substrate table (PST) can remain substrate (P) movement, have the 1st region (LA1) on it；

Figure picture is projected to substrate (P) by the projection optics system (PL), has the 2nd region (LA2), the 2nd region (LA2) Including image planes side fore-end (2a) relatively with the 1st region (LA1) is kept between at least part in the 1st region (LA1) Liquid (1)；

The control device (CONT) corresponds to the position relationship in the 1st region (LA1) and the 2nd region (LA2), restricting substrate platform (PST) movement.

According to the present invention, in the occasion for the composition being held in liquid between the 1st region and the 2nd region, such as do not become The position relationship of liquid is kept between the 1st region and the 2nd region the movement of restricting substrate platform, thus prevents letting out for liquid The problems such as leakage.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 6th form of the present invention by liquid (1), Substrate (P) is exposed；Wherein：With projection optics system (PL), Substrate table (PST), substructure member (41), the 1st detector (80C), the 2nd detector (80D) and control device (CONT)；

The projection optics system (PL) is projected to figure picture on substrate (P) by liquid (1)；

It is mobile that the Substrate table (PST) can remain substrate (P)；

The substructure member (41) movably supporting substrates platform (PST)；

1st detector (80C) is set to Substrate table (PST), detection liquid (1)；

2nd detector (80D) is set to substructure member (41), detection liquid (1)；

The control device (CONT) corresponds to the testing result of the 1st detector (80C) and the 2nd detector (80D), and control exposes The action of electro-optical device.

According to the present invention, corresponding to the testing result control for the 1st detector and the 2nd detector for being mutually set to different location The action of exposure device processed, so, adequate measures corresponding with the range of scatter of the liquid leaked or countermeasure can be taken.Cause This, can shorten the required time that resumes operation after liquid leakage occurs, can prevent the decline of the operation ratio of exposure device.For example, When the 1st detector set on Substrate table detect liquid there are when, control device judges that the range of scatter of liquid of leakage is Relatively narrow range, such as stop the supply etc. of the liquid carried out by liquid feed mechanism, it carries out corresponding with the range appropriate Disposition.In this way, the required time that can will resume operation is suppressed to minimum limit.On the other hand, when the 2nd inspection set on substructure member Survey device detect liquid there are when, judge leakage liquid range of scatter for wider region, control device stopping for example The power supply of the electrical equipments such as the driving device that Substrate table is driven.In this way, even if the liquid of leakage is diffused into wider model It encloses, the damages such as electric leakage and failure prevented also from electrical equipment.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 7th form of the present invention by liquid (1), Substrate (P) is exposed；Wherein：With projection optics system (PL), liquid feed mechanism (10), Substrate table (PST) and control Device (CONT)；

The projection optics system (PL) projects to figure picture on substrate；

Liquid (1) is supplied between projection optics system (PL) and substrate (P) by the liquid feed mechanism (10)；

It is mobile that the Substrate table (PST) can remain substrate (P)；

The control device (CONT) is during liquid feed mechanism (10) supplies liquid (1), by the shifting of Substrate table (PST) Dynamic scope limitation is in the 1st range (SR1), during the supply of liquid feed mechanism (10) stop liquid (1), by Substrate table (PST) moving range is restricted to 2nd range (SR2) wider than the 1st range (SR1).

The moving range of Substrate table is limited to for example during liquid feed mechanism supplies liquid according to the present invention The 1st range that liquid can be held on Substrate table, the problems such as thus preventing the leakage of liquid.On the other hand, it is supplied in liquid To mechanism stop liquid supply during, by the way that the moving range of Substrate table is set as 2nd range wider than the 1st range, from And can the relevant predetermined action of the Substrate tables such as substrate exchange position successfully be moved into being about to Substrate table.

Exposure light is irradiated to substrate by the exposure device of the 8th form of the present invention by liquid, is exposed to substrate； Wherein：With projection optics system (PL), liquid feed mechanism (10), Substrate table (PST) and control device (CONT)；

The projection optics system (PL) projects to figure picture on substrate；

The liquid feed mechanism (10) supplies a liquid to the image planes side of projection optics system；

The Substrate table (PST) can be moved in the image planes side of projection optics system；

The moving range of control device (CONT) console；

The control device by the moving range of platform when maintaining liquid between projection optics system and platform be limited to than The narrow range of the moving range of platform when not maintaining liquid between projection optics system and platform.

In 8th form according to the invention, such as the exposure process of substrate on platform, sustainably in projection optics system It keeps liquid well between platform, in the occasion for keeping liquid not between projection optics system and platform, can successfully carry out base Other actions such as plate exchange.

The 9th form of the present invention, provides a kind of device making method, which is characterized in that, in use State the exposure device (EX) of form.According to the present invention, when detecting abnormal, stop the driving of scheduled device, so, it can prevent The generation of the problems such as failure of locking apparatus can carry out device manufacture under good device context.

10th form of the invention, provides a kind of control method of exposure device, which is used exposure by liquid Illumination is mapped on substrate and is exposed to substrate；The exposure device by comprising projection optics system (PL), liquid feed mechanism (10), The inscape of electrical equipment (47,48) and equipment (42, PH) is constituted, and is connect with external relevant apparatus；The projection optics System (PL) projects to figure picture on substrate；Liquid (1) is supplied to the image planes of projection optics system by the liquid feed mechanism (10) Side；The equipment (47,48) is using electric energy as driving force；The equipment (42, PH) has the function of attracting gas；Wherein：Including this The step of sample, that is,

Supply a liquid to the image planes side of projection optics system；

Receive the signal of at least one notice exception from above-mentioned inscape and external relevant apparatus；

According to above-mentioned signal, limitation liquid feed mechanism (10) as the equipment (47,48) of driving force and has using electric energy Attract at least one action of the equipment (42, PH) of the function of gas.

The control method of exposure device according to the invention, the relevant apparatus inside exposure device or outside exposure device Exception is generated, is notifying the exception to be the occasion of the abnormal signal as being had an impact to the exposure etc. of substrate, is limiting liquid Body feed mechanism (10) as the equipment (47,48) of driving force and has the function of the equipment (42, PH) for attracting gas using electric energy At least one action, thus prevent liquid leakage, the attraction etc. for the liquid that the electric leakage that is induced by it, suction device generate.

Description of the drawings

Fig. 1 is the signal composition figure for the 1st form of implementation for showing exposure device of the present invention.

Fig. 2 is the perspective view for showing Substrate table.

Fig. 3 be show near the fore-end of projection optics system, the signal structure of liquid feed mechanism and liquids recovery mechanism Cheng Tu.

Fig. 4 is the position relationship of the view field and liquid feed mechanism and liquids recovery mechanism that show projection optics system Plan view.

Fig. 5 is the schematic cross-section for illustrating the retracting device set on Substrate table.

Fig. 6 is the schematic diagram of the detector with optical fiber of the 2nd form of implementation for illustrating exposure device of the present invention.

Fig. 7 is the schematic diagram of the detector with optical fiber of the 2nd form of implementation for illustrating exposure device of the present invention.

Fig. 8 is the side view of the configuration example for the detector for showing to have optical fiber.

Fig. 9 is the plan view of Fig. 8.

Figure 10 is the side view of another configuration example for the detector for showing to have optical fiber.

Figure 11 is the plan view of another embodiment for the detector for showing to have optical fiber.

Figure 12 is the perspective view of another configuration example for the detector for showing to have optical fiber.

Figure 13 is the schematic diagram of another embodiment for the detector for showing to have optical fiber.

Figure 14 is the schematic diagram of the detector with prism of the 3rd form of implementation for illustrating exposure device of the present invention.

Figure 15 is the schematic diagram of the detector with prism of the 3rd form of implementation for illustrating exposure device of the present invention.

Figure 16 is the plan view of the configuration example for the detector for showing to have prism.

Figure 17 is the figure of another use example for the detector for showing to have prism.

Figure 18 is the signal composition figure of another configuration example for the detector for showing to have prism.

(a) and (b) of Figure 19 is the figure for another embodiment for showing the detector with optical fiber.

(a) and (b) of Figure 20 is the figure for illustrating another embodiment of the present invention.

(a) and (b) of Figure 21 is the figure for illustrating another embodiment of the present invention.

Figure 22 is the flow chart of an example for the manufacturing process for showing semiconductor devices.

Figure 23 is to show to be controlled by control device according to the detection signal of the various detectors from exposure device of the present invention Exposure device outside relevant apparatus and exposure device inside all devices and control device connection relation block diagram.

Figure 24 is the flow chart of the control content for the control device for showing exposure device of the present invention.

Specific implementation mode

Illustrate the form of implementation of the exposure device of the present invention, however, the present invention is not limited thereto with reference to the accompanying drawings.

Fig. 1 is the signal composition figure for the 1st form of implementation for showing exposure device of the present invention.In Fig. 1, exposure device EX has There is the mask platform MST supported to mask M, to the Substrate table PST that substrate P is supported, is supported with exposure light EL illumination In the illumination optical system IL of the mask M of mask platform MST, by by the figure example projection exposure of the mask M of exposure light EL illumination to By the projection optics system PL of the Substrate table PST substrate Ps supported, and it is uniformly controlled the control device of the action of exposure device EX entirety CONT.The alarm device K of alarm is sent out when being abnormal about exposure-processed in control device CONT connections.In addition, exposure Device EX has the principal post 3 supported to mask platform MST and projection optics system PL.The setting of principal post 3 is to being flatly placed in ground The base board 4 of plate face.Inwards step part 3A in upside outstanding and downside step part 3B is formed in principal post 3.Control device As shown in figure 23 like that, it connect, controls with the relevant apparatus of the outside of the various inscapes and exposure device that constitute exposure device The control content of device processed is explained below.

In order to substantially shorten exposure wavelength, resolution is improved, meanwhile, substantial increasing depth of focus, the exposure of this form of implementation Electro-optical device EX is the liquid immersion exposure apparatus for being applicable in immersion method, has 10 He of liquid feed mechanism being supplied to liquid 1 in substrate P Recycle the liquids recovery mechanism 20 of the liquid 1 in substrate P.Exposure device EX is in the phase being at least transferred to mask M in substrate P Between, by from the liquid 1 that liquid feed mechanism 10 supplies in the substrate P of the view field AR1 comprising projection optics system PL one Part forms liquid immersion area AR2.Specifically, the light of the fore-end (terminal part) of the projection optics system PL of exposure device EX It learns hydraulically full 1 between element 2 and the surface of substrate P, passes through the liquid 1 and projection optics between the projection optics system PL and substrate P It is PL, the figure picture of mask M is projected in substrate P, to is exposed to the substrate P.

In this form of implementation, to use scanning exposure apparatus (so-called step-scan exposure device) as exposure device Illustrated for the occasion of EX, the scanning exposure apparatus make mask M and substrate P towards with it is mutually different on scanning direction Direction (opposite direction) synchronizing moving, meanwhile, the graph exposure of mask M is will be formed in substrate P.In the following description, if The direction consistent with the optical axis AX of projection optics system PL is Z-direction, and mask M and substrate P is same in the plane vertical with Z axis Moved further direction (scanning direction) is X-direction, and the direction vertical with Z-direction and X-direction (non-scan direction) is Y-axis side To.In addition, it is respectively θ X, θ Y, θ Z-directions to set around revolution (inclination) direction of X-axis, Y-axis and Z axis." substrate " mentioned here Including the plate that coating is obtained as the photoresist of photosensitive material on the semiconductor wafer, " mask " includes to be formed with to reduce throwing Shadow is in the graticule of the component graphics on substrate.

Illumination optical system IL is supported by the pillar 5 for being fixed on the top of principal post 3.EL pairs of exposure lights of illumination optical system IL The mask M for being supported on mask platform MST is illuminated, the illumination for having exposure light source, making the light beam being emitted from exposure light source The optical integrator of homogenization, the collector lens that optically focused is carried out to the exposure light EL from optical integrator, relay lens system, And illumination regions of the exposure light EL on mask M is set as to the variable field-of-view diaphragm etc. of slit-shaped.It is scheduled on mask M Illumination region is pressed the exposure light EL illumination of uniform Illumination Distribution by IL.As the exposure light being emitted from illumination optical system IL EL, such as the bright line (g lines, h lines, i lines) and KrF excimer laser (waves of the ultraviolet region being emitted from mercury vapor lamp can be used Long 248nm) etc. extreme ultraviolet lights (DUV light), ArF excimer lasers (wavelength 193nm) and F₂The vacuum such as laser (157nm) are purple Outer light (VUV light) etc..In this form of implementation, ArF excimer lasers are used.

In this form of implementation, pure water is used as liquid 1.Pure water can not only be penetrated by ArF excimer lasers, and And it can be by the bright line (g lines, h lines, i lines) and KrF excimer laser (wavelength for the ultraviolet region being for example emitted from mercury vapor lamp 248nm) etc. extreme ultraviolet lights (DUV light) penetrate.

For mask platform MST for supporting mask M, part, which has, at its center makes the opening portion that the figure picture of mask M passes through 34A.Mask bottom plate 31 is supported by Anti-vibration unit 6 in the upside step part 3A of principal post 3.In the center portion of mask bottom plate 31 Also being formed makes the opening portion 34B that the figure picture of mask M passes through.It is arranged below mask platform MST multiple as non-contact axis The gas bearing (air bearing) 32 held.Mask platform MST is non-contactly supported on the upper surface of mask bottom plate 31 by gas bearing 32 (guide surface) 31A can make it vertical with the optical axis AX of projection optics system PL by the mask platforms driving mechanism such as linear motor I.e. interior 2 dimension of progress of X/Y plane is mobile in plane and carries out small revolution towards θ Z-directions.Setting can be with mask platform on mask platform MST MST is together relative to the moving lens 35 of projection optics system PL movements.In addition, laser interference is arranged in the position opposite with moving lens 35 Instrument 36.(some occasions also include θ X, the sides Y θ for the position in the 2 dimension directions of the mask M on mask platform MST and the angle of revolution of θ Z-directions To angle of revolution) measured in real time by laser interferometer 36, measurement result is output to control device CONT.Control device CONT drives mask platform driving mechanism according to the testing result of laser interferometer 36, to which control is supported on covering for mask platform MST The position of mould M.

Projection optics system PL is used for the graphic projection of mask M to substrate P by scheduled projection multiplying power β, by comprising set on Multiple optical elements (lens) of the optical element (lens) 2 of the fore-end of substrate P side are constituted, these optical elements are by lens barrel PK is supported.In this form of implementation, projection optics system PL is the diminution system for projecting multiplying power β and being, for example, 1/4 or 1/5.Projection optics It is that PL is alternatively equimultiple system or amplification system.It is equipped with flange portion FLG in the outer peripheral portion of lens barrel PK.In addition, in the downside of principal post 3 Step part 3B supports lens barrel fixed plate 8 by Anti-vibration unit 7.By the way that the flange portion FLG of projection optics system PL is engaged in Lens barrel fixed plate 8, to which projection optics system PL is supported on lens barrel fixed plate 8.

The optical element 2 of the fore-end of the projection optics system PL of this form of implementation can be with respect to lens barrel PK with assembling and disassembling (exchange) Setting.The liquid 1 of liquid immersion area AR2 is contacted with optical element 2.Optical element 2 is formed with fluorite.The compatibility of fluorite and water Height, so, liquid 1 can be made to be in close contact in the substantially entire surface of the liquid contact surface 2a of optical element 2.That is, in this implementation shape In formula, the liquid (water) 1 high for giving the compatibility of liquid contact surface 2a of optical element 2, so, the liquid of optical element 2 Contact surface 2a and the close contact of liquid 1 are high, and liquid 1 can be used certainly to be full of the light path between optical element 2 and substrate P.Light Learn element 2 or the quartz high with the compatibility of water.In addition, can also implement to the liquid contact surface 2a of optical element 2 hydrophilic Change (lyophilised) processing, further increases the compatibility with liquid 1.

Surround 2 ground of optical element setting board member 2P.(i.e. following) face opposite with substrate P of board member 2P is flat Face.(liquid contact surface) 2a also becomes flat surface below optical element 2, below board member 2P with below optical element 2 It is generally in same level.In this way, in wide scope liquid immersion area AR2 can be formed well.In addition, below board member 2P In the following, implementing surface treatment (lyophilised processing) in the same manner as optical element 2.

Substrate table (movable link) PST is carried out by the adsorbable substrate Ps that remain of substrate tray (substrate holding structure) PH Movably it is arranged, is provided as the gas bearing (air bearing) 42 of multiple non-contact bearings in its lower section.Lead on base board 4 Cross 9 supporting substrates bottom plate 41 of Anti-vibration unit.Air bearing 42 has blow-off outlet 42B and air entry 42A, blow-off outlet 42B opposite The upper surface of substrate base 41 (guide surface) 41A blow gas (air), air entry 42A attract (bearing below Substrate table PST Face) gas between guide surface 41A, the bounce generated by the blowout of the gas from blow-off outlet 42B and by air entry 42A The balance of the attraction of generation keeps certain gap below Substrate table PST between guide surface 41A.That is, Substrate table PST Non-contact bearing is carried out by air bearing 42 opposing substrate bottom plate (substructure member) the upper surface of 41 (guide surface) 41A, by linear electricity The Substrate tables driving mechanism such as motivation can be that 2 dimensions are carried out in X/Y plane in the plane vertical with the optical axis AX of projection optics system PL It moves and carries out small revolution towards θ Z-directions.In addition, substrate tray PH Z-direction, θ X-directions and θ Y-directions also movably Setting.Substrate table driving mechanism is controlled by control device CONT.That is, the focal position (Z location) of substrate tray PH control base boards P And inclination angle, keep the surface of substrate P consistent with the image planes of projection optics system PL by automatic focusing mode and automatic leveling mode, into The positioning of the X-direction and Y direction of row substrate P.

On Substrate table PST (substrate tray PH), setting can be together with Substrate table PST relative to projection optics system PL movements Moving lens 45.In addition, laser interferometer 46 is arranged in the position opposite with moving lens 45.2 dimensions of the substrate P on Substrate table PST The position and angle of revolution in direction are measured in real time by laser interferometer 46, and measurement result is output to control device CONT.Control Device CONT processed drives the Substrate table driving mechanism for including linear motor machine according to the measurement result of laser interferometer 46, from And carry out the positioning for being supported on the substrate P of Substrate table PST.

In addition, accessory plate 43 is arranged on Substrate table PST (substrate tray PH) with surrounding substrate P (with reference to Fig. 2).Accessory plate The plane of 43 height being substantially the same with the surface with the substrate P for being held in substrate tray PH.In the fringe region to substrate P Liquid 1 can be also held in below projection optics system PL by the occasion being exposed by accessory plate 43.

In addition, liquid of the outside setting of the accessory plate 43 in substrate tray PH for recycling the outside for flowing out to substrate P The recovery port (suction port) 61 of the retracting device 60 of body 1.Recovery port 61 is to surround the cricoid groove portion of the formation of accessory plate 43, at it The liquid absorbing member 62 that inside configuration is made of spongy component or porous plastid etc..

Fig. 2 is the perspective illustration for the Substrate table driving mechanism for showing Substrate table PST and driving Substrate table PST.In Fig. 2 In, Substrate table PST can be supported in which move freely by X guide tables 44 towards X-direction.Substrate table PST can be guided by X guide tables 44, Meanwhile it being moved towards X-direction by predetermined stroke by x-ray motor 47.X-ray motor 47 has in X guide tables 44 along X-axis The extended stator 47A in direction and corresponding to stator 47A settings, be fixed on Substrate table PST can mover 47B.It can mover 47B relative stators 47A is driven, to make Substrate table PST be moved towards X-direction.Herein, Substrate table PST passes through magnetism Guiding mechanism non-contactly supports, which is maintained the gap of predetermined amount by opposite X guide tables 44 towards Z-direction Magnet and executive component are constituted.Substrate table PST is by the non-contact state for being supported on X guide tables 44 by x-ray motor 47 towards X-axis It moves in direction.

It is equipped with 1 pair of Y linear motor 48 at the length direction both ends of X guide tables 44, which can make the X Guide table 44 moves together with Substrate table PST towards Y direction.Y linear motors 48 are respectively provided with the length set on X guide tables 44 Direction both ends can mover 48B and corresponding to this can mover 48B setting stator 48A.By can mover 48B relative stators 48A It is driven, to make X guide tables 44 be moved towards Y direction together with Substrate table PST.In addition, linearly electric by adjusting separately Y The driving of motivation 48 is moved so as to make X guide tables 44 also be turned round towards θ Z-directions.Therefore, can base be made by the Y linear motors 48 Pallet PST is substantially integrally moved towards Y direction and θ Z-directions with X guide tables 44.

In the X-direction both sides of substrate base 41, it is respectively equipped with targeting part 49, the shape in front view of targeting part 49 As L-shaped, the movement of X guide tables 44 towards Y direction is guided.Targeting part 49 is supported on base board 4 (Fig. 1). In this form of implementation, the stator 48A of Y linear motors 48 is equipped in the flat 49B of targeting part 49.On the other hand, What the length direction both ends below X guide tables 44 were respectively equipped with spill is directed to component 50.Targeting part 49 be directed to Component 50 engages, and the upper surface of targeting part 49 (guide surface) 49A is oppositely disposed with the inner face for being directed to component 50.In guide part Divide 49 guide surface 49A to be equipped with and is oppositely oriented face as gas bearing (air bearing) 51, the X guide tables 44 of non-contact bearing 49A is non-contactly supported.

In addition, being provided as between the stator 48A of Y linear motors 48 and the flat 49B of targeting part 49 non- The gas bearing (air bearing) 52 of contact bearing, stator 48A are oppositely oriented the flat 49B of part 49 by air bearing 52 Non-contactly support.For this purpose, according to the law of conservation of momentum, direction +Y direction (- Y) of X guide tables 44 and Substrate table PST is corresponded to Movement, stator 48A is mobile towards -Y direction (+Y direction).X guide tables 44 and Substrate table PST are made by the movement of stator 48A Mobile counter-force is cancelled, meanwhile, the variation of position of centre of gravity can be prevented.That is, stator 48A has the work(as so-called balance quality Energy.

Fig. 3 is to show putting near liquid feed mechanism 10, liquids recovery mechanism 20 and projection optics system PL fore-ends Big figure.For liquid feed mechanism 10 for liquid 1 to be supplied between projection optics system PL and substrate P, liquid 1 can be sent out by having Liquid supply portion 11 and the liquid that liquid supply portion 11 is connected to by supply pipe 15, will be sent out from the liquid supply portion 11 Body 1 is supplied to the supply ozzle 14 in substrate P.Surface configuration of the supply ozzle 14 close to substrate P.Liquid supply portion 11 has Liquid 1, is supplied in substrate P by case and the force (forcing) pump etc. for accommodating liquid 1 by supply pipe 15 and supply ozzle 14.Liquid supplies The liquid supply action of part 11 is controlled by control device CONT, control device CONT it is controllable by liquid supply portion 11 for Liquid supply amount per unit time in substrate P.

In the way of supply pipe 15, equipped with the amount to being supplied to the liquid 1 in substrate P from liquid supply portion 11 (per single The liquid supply amount of position time) flowmeter 12 that measures.Flowmeter 12 is often to being supplied to the amount of the liquid 1 in substrate P It is monitored, its measurement result is output to control device CONT.In addition, the flowmeter 12 in supply pipe 15 and supply ozzle Between 14, the valve 13 that is opened and closed equipped with the flow path to supply pipe 15.The on-off action of valve 13 is controlled by control device CONT System.The valve 13 of this form of implementation for example makes the driving source (power supply) of exposure device EX (control device CONT) stop by power failure etc. Occasion only becomes the normally closed of the mechanically flow path of occlusion supply pipe 15.

Liquids recovery mechanism 20 is used to recycle the liquid 1 in the substrate P supplied by liquid feed mechanism 10, has close to base The recycling ozzle (suction port) 21 of the surface configuration of plate P and the vacuum system that recycling ozzle 21 is connected to by recovery tube 24 (attract System) 25.It includes vacuum pump that vacuum, which is 25, and action is controlled by control device CONT.It is 25 drivings by vacuum, in substrate P Liquid 1 is recycled by recycling ozzle 21 together with surrounding gas (air).It is 25 as vacuum, it also can not be in exposure device Vacuum pump is set, but uses the vacuum system in the workshop of configuration exposure device EX.

In the way of recovery tube 24, it is equipped with the gas-liquid separator 22 of liquid 1 and gas that separation is sucked from recycling ozzle 21. Herein, as described above, surrounding gas is recycled together with the liquid in substrate P from recycling ozzle 21.Gas-liquid separator The liquid 1 and gas that 22 separation are recycled from recycling ozzle 21.As gas-liquid separator 22, such as Gravity Separation mode can be used Device or the device etc. for centrifuging mode；The device of the Gravity Separation mode makes liquid fall by gravity by above-mentioned hole portion Under, to detach liquids and gases；The device of the centrifugation mode uses the liquids and gases that centrifugal force separate recycles.Vacuum It is the gas that 25 attractions are detached by gas-liquid separator 22.

Vacuum in recovery tube 24 is between 25 and gas-liquid separator 22, equipped with the gas for making to be detached by gas-liquid separator 22 The dry drier 23 of soma.Even if being mixed with liquid component in the gas detached by gas-liquid separator 22, by by drier 23 Make gas dry, it is 25 so that the gas dried is flowed into vacuum, vacuum system caused by thus preventing liquid component to flow into The generation of the problems such as 25 failure.As drier 23, can be used mode as cooler device or for example heater that The device of the mode of sample, the device of mode as the cooler by the gas supplied from gas-liquid separator 22 by (being mixed with liquid The gas of body ingredient) be cooled to the liquid dew point or itself hereinafter, so that liquid component be removed, mode as the heater Device by be heated to the liquid boiling point or its more than, so that liquid component be removed.

On the other hand, the liquid 1 detached by gas-liquid separator 22 is recovered to liquids recovery part by the 2nd recovery tube 26 28.Liquids recovery part 28 has the case etc. accommodated to the liquid 1 of recycling.It is recovered to the liquid 1 of liquids recovery part 28 Such as it is discarded, or recycled back to liquid supply portion 11 etc. after cleaning.In addition, in the way of the 2nd recovery tube 26, Amount (the liquids recovery per unit time to the liquid 1 of recycling is equipped between gas-liquid separator 22 and liquids recovery part 28 Amount) flowmeter 27 that measures.Flowmeter 27 monitors the amount of the liquid 1 recycled from substrate P often, its measurement result is exported To control device CONT.As described above, the liquid 1 in substrate P and the recycling of surrounding gas are recycled from recycling ozzle 21, but Liquid 1 and gas are detached in gas-liquid separator 22, liquid component is only sent to flowmeter 27, in this way, flowmeter 27 can be correctly Measure the amount of the liquid 1 recycled from substrate P.

In addition, exposure device EX has the focusing of the position on the surface for detecting the substrate P for being supported on Substrate table PST (focus) detection system 56.Focus detection be 56 have detecting light beam is projected in substrate P from oblique upper by liquid 1 The light part 56B of light projector part 56A and the reflected light for the above-mentioned detecting light beam for receiving to be reflected by substrate P.Focus detection system The light result of 56 (light part 56B) is output to control device CONT.Control device CONT is according to the inspection that focus detection is 56 Survey the location information that result can detect that the Z-direction on substrate P surface.In addition, by projecting multiple detections from light projector part 56A With light beam, to can detect that substrate P θ X and θ Y-directions inclination information.

It is not limited to substrate P, focus detection is the table of 56 objects that also can detect the image planes side for being configured to projection optics system PL Face location information.In addition, focus detection is 56 surface position informations by 1 detection object of liquid (substrate P), but in the areas Ye Jin The focus detection system of the not surface position information by 1 ground detection object (substrate P) of liquid can also be used in the outside of domain AR2.

As shown in a part of sectional view of Fig. 1, liquid feed mechanism 10 and liquids recovery mechanism 20 are solid with respect to lens barrel Fixed board 8 is discretely supported.In this way, the vibration generated by liquid feed mechanism 10 and liquids recovery mechanism 20 will not pass through lens barrel Fixed plate 8 is transmitted to projection optics system PL.

Fig. 4 is the view field AR1 for showing liquid feed mechanism 10 and liquids recovery mechanism 20 and projection optics system PL The plan view of position relationship.The view field AR1 of projection optics system PL becomes in the elongated rectangle of Y direction (slit-shaped), along X Axis direction configures 3 supply ozzle 14A~14C with clamping its view field AR1 in the sides+X, and 2 recycling ozzles are configured in the sides-X 21A,21B.Supply ozzle 14A~14C is connected to liquid supply portion 11 by supply pipe 15, and recycling ozzle 21A, 21B pass through It is 25 that recovery tube 24, which is connected to vacuum,.In addition, making supply pin 14A~14C and recycling ozzle 21A, 21B substantially turn round 180 ° Position, configuration supply ozzle 14A '~14C ', recycling ozzle 21A ', 21B '.Supply ozzle 14A~14C and recycling ozzle 21A ', 21B ' are alternately arranged along Y direction, and supply ozzle 14A '~14C ' replaces row with recycling ozzle 21A, 21B along Y direction Row, supply ozzle 14A '~14C ' are connected to liquid supply portion 11 by supply pipe 15 ', and recycling ozzle 21A ', 21B ' pass through It is 25 that recovery tube 24 ', which is connected to vacuum,.It is same as supply pipe 15 in the way of supply pipe 15 ', it is equipped with flowmeter 12 ' and valve 13′.In addition, in the way of recovery tube 24 ', it is same as recovery tube 24, it is equipped with gas-liquid separator 22 ' and drier 23 '.

Fig. 5 is the figure for the retracting device 60 for showing the liquid 1 for recycling the outside for flowing out to substrate P.In Figure 5, it returns Receiving apparatus 60 has the recovery port (suction port) 61 for surrounding the formation of 43 ground of accessory plate on substrate tray PH and is configured at recovery port 61, the liquid absorbing member 62 being made of porous plastids such as spongy component or porous ceramics.Liquid absorbing member 62 is tool There is the annular component of preset width, liquid 1 can be remained predetermined amount.It is formed in the inside of substrate tray PH and is connected with recovery port 61 Logical flow path 63, the bottom for being configured at the liquid absorbing member 62 of recovery port 61 are contacted with flow path 63.In addition, in substrate tray PH On substrate P and accessory plate 43 between be equipped with multiple liquids recovery holes 64.These liquids recovery holes 64 are also connected to flow path 63.

It is equipped with the back side for supporting substrates P in the upper surface of substrate tray (substrate holding structure) PH of holding substrate P Multiple protruding portion 65.It is respectively provided with the adsorption hole 66 that absorption keeps substrate P in these protruding portions 65.Adsorption hole 66 connects respectively It is connected to the pipeline 67 being formed in inside substrate tray PH.

The flow path 63 for being connected to recovery port 61 and liquids recovery hole 64 is connected to pipe outside substrate tray PH The one end on road 68.On the other hand, it is 70 that the other end of pipeline 68, which is connected to the vacuum comprising vacuum pump,.On the way of pipeline 68 In be equipped with gas-liquid separator 71, be that drier 72 is equipped between 70 in gas-liquid separator 71 and vacuum.It is 70 drive by vacuum Dynamic, liquid 1 recycles together with surrounding gas from recovery port 61.In addition, even if liquid 1 soaks between substrate P and accessory plate 43 Enter, around the back side of substrate P, which also recycles together with ambient gas from liquids recovery hole 64.It is 70 in vacuum, flows into The gas detached by gas-liquid separator 71, dried by drier 72.On the other hand, the liquid 1 detached by gas-liquid separator 71 It is flowed into the liquid recovery part 73 that can accommodate case of liquid 1 etc..The liquid 1 for being recovered to liquid recovery part 73 is for example discarded Or clean, back to liquid supply portion 11 etc., it is reused.

In addition, the pipeline 67 for being connected to adsorption hole 66 is connected to the one end of the pipeline 69 outside substrate tray PH. On the other hand, it is 74 that the other end of pipeline 69, which is connected to vacuum, which is 74 true outside substrate tray PH comprising being set to Sky pump.It is 74 driving by vacuum, the substrate P for being supported on protruding portion 65 carries out absorption holding by adsorption hole 66.In pipeline 69 Way in be equipped with gas-liquid separator 75, be that drier 76 is equipped between 74 in gas-liquid separator 75 and vacuum.In addition, in gas-liquid separation The connection of device 75 has the liquid recovery part 73 that can accommodate case of liquid 1 etc..

In the following, referring to Fig.1 etc. explanations using above-mentioned exposure device EX by the sequence of the graph exposure of mask M to substrate P.

Mask M is loaded into mask platform MST, substrate P is loaded into Substrate table PST, then, control device CONT drives liquid The liquid supply portion 11 of body feed mechanism 10, by supply pipe 15 and supply ozzle 14 per unit time by the liquid of predetermined amount Body 1 is supplied in substrate P.In addition, control device CONT drives liquids recovery with liquid 1 is supplied by liquid feed mechanism 10 The vacuum of mechanism 20 is 25, by recycling ozzle 21 and recovery tube 24 in the liquid 1 for recycling predetermined amount per unit time.In this way, The liquid immersion area AR2 of liquid 1 is formed between the optical element 2 and substrate P of the front end of projection optics system PL.Herein, it is Formation liquid immersion area AR2, control device CONT control liquid feed mechanism 10 and liquids recovery mechanism 20 respectively, make opposite base Liquid supply amount on plate P with from the liquids recovery amount generally equal amount in substrate P.Then, control device CONT is by illuminating Optical system IL is exposed mask M the illumination with light EL, and the figure picture of mask M is thrown by projection optics system PL and liquid 1 Shadow is to substrate P.

When being scanned exposure, in the figure picture of a part of view field AR1 projection print plates M, opposite projection optics system PL towards -X direction (or +X direction) by speed V movement mask M, it is synchronous with this, make substrate P towards +X direction by Substrate table PST (or -X direction) is mobile by speed β V (β is projection multiplying power).After being exposed to 1 exposure area (shot area), lead to Next exposure area is moved to scanning starting position, hereinafter, by step scan mode successively to each exposure by the stepping for crossing substrate P Light region is exposed processing.In this form of implementation, liquid 1 is made to be parallel to the movement of the moving direction court and substrate P of substrate P The identical direction in direction is fluidly set.That is, make substrate P towards the scanning direction (-X direction) shown in arrow Xa (with reference to Fig. 4) Moving substrate P is scanned the occasion of exposure, uses supply pipe 15, supply ozzle 14A~14C, recovery tube 24 and recycling ozzle 21A, 21B are carried out the supply and recycling of liquid 1 by liquid feed mechanism 10 and liquids recovery mechanism 20.That is, as substrate P court-X When direction is moved, it is supplied between projection optics system PL and substrate P from supply ozzle 14 (14A~14C) by liquid 1, meanwhile, from Recycling ozzle 21 (21A, 21B) recycles the liquid 1 in substrate P together with surrounding gas, full of projection optics system PL Liquid 1 is set to be flowed towards -X direction between the optical element 2 and substrate P of front end.On the other hand, substrate P is made to continue to use arrow Xb Scanning direction (+X direction) shown in (with reference to Fig. 4) is mobile, is scanned the occasion of exposure, uses supply pipe 15 ', supply ozzle 14A '~14C ', recovery tube 24 ' and recycling ozzle 21A ', 21B ', are carried out by liquid feed mechanism 10 and liquids recovery mechanism 20 The supply and recycling of liquid 1.That is, when substrate P is moved towards +X direction, liquid 1 is supplied from supply ozzle 14 ' (14A '~14C ') Be given between projection optics system PL and substrate P, meanwhile, by the liquid 1 in substrate P from recycling ozzle 21 ' (21A ', 21B ') and its The gas of surrounding recycles together, makes liquid 1 towards+X between the optical element 2 and substrate P of the front end full of projection optics system PL It flows in direction.In the occasion, for example, the liquid 1 by supplying the supply of ozzle 14 attracts as substrate P is towards the movement of -X direction Flowed between optical element 2 and substrate P, so, liquid feed mechanism 10 (liquid supply portion 11) though supply energy It is smaller, also can easily it supply a liquid between optical element 2 and substrate P.Then, it corresponds to scanning direction and switches liquid 1 Liquid 1 can be all filled to optical element 2 by the direction of flowing to make the occasion that substrate P scans towards +X direction or -X direction Between substrate P, it can be exposed by high-resolution and wide depth of focus.

In exposure process, it is set to the measurement result of the flowmeter 12 of liquid feed mechanism 10 and is set to liquids recovery The measurement result of the flowmeter 27 of mechanism 20 is output to control device CONT often.Control device CONT compares the survey of flowmeter 12 Amount result is that the amount for the liquid being supplied to by liquid feed mechanism 10 in substrate P is returned by liquid with the measurement result of flowmeter 27 The amount for receiving the liquid that mechanism 20 is recycled from substrate P, according to its result of the comparison, the valve 13 of control liquid feed mechanism 10.Specifically Ground says, control device CONT find out the amount of liquid (measurement result of flowmeter 12) that is supplied in substrate P with from the liquid in substrate P The difference of body yield (measurement result of flowmeter 27) judges whether the difference found out is more than preset feasible value (threshold Value), control valve 13.Herein, as described above, control device CONT controls liquid feed mechanism 10 and liquid recovery machine respectively Structure 20 makes the amount of liquid being supplied in substrate P be substantially the same with the liquids recovery amount from substrate P, so, such as liquid feed mechanism The action of the liquids recovery of 10 liquid supply action and liquids recovery mechanism 20 is normally carried out respectively, then the above-mentioned difference found out is substantially It is zero.

The difference found out be more than or equal to feasible value occasion, i.e., liquids recovery amount than liquid supply amount much less occasion, Control device CONT judges that the recycling action of liquids recovery mechanism 20 is abnormal, and is unable to withdrawal liquid 1.At this point, control device CONT such as judge the vacuum in liquids recovery mechanism 20 be 25 break down it is abnormal, in order to prevent cannot be by liquid recovery machine The leakage of the normally liquid 1 caused by withdrawal liquid 1 of structure 20, makes the valve 13 of liquid feed mechanism 10 work, and disconnects supply pipe 15 flow path, stop liquid feed mechanism 10 is to supplying liquid 1 in substrate P.It is supplied from liquid in this way, control device CONT compares The amount of liquid that mechanism 10 is supplied in substrate P and the amount of liquid recycled by liquids recovery mechanism 20, are detected according to its comparison result Liquids recovery mechanism 20 recycling action exception, when 1 surplus supply of liquid, detect abnormal when, stop to substrate P supply liquid Body 1.In this way, leakage or liquid 1 of the liquid 1 to substrate P or the outside of Substrate table PST (substrate tray PH) can be prevented to be immersed in not The expansion lost caused by desired position or such leakage or immersion.

In addition, control device CONT is let out in order to prevent in the exception for the recycling action for detecting liquids recovery mechanism 20 Electric leakage caused by leakage or the attachment of the liquid 1 immersed, stops the power supply to the electrical equipment for constituting exposure device EX.Herein, As electrical equipment, the linear motor 47,48 etc. for making Substrate table PST move can be enumerated.These linear motors 47, 48 are easy the position that attachment is immersed in the liquid 1 leaked on the outside of Substrate table PST, so, control device CONT is by stopping It only powers to these linear motors 47,48, thus prevents electric leakage caused by the attachment of liquid 1.In addition, as electrically setting It is standby, other than linear motor 47,48, such as it can enumerate on Substrate table PST, for receiving opposing substrate platform PST's The sensor (photomultiplier (Off オ ト マ Le) etc.) of exposure light EL.Alternatively, as electrical equipment, can enumerate for adjusting The various executive components such as piezoelectric element of the Z-direction of integral basis sheet tray PH and the position adjustment of inclined direction.In addition, working as When detecting abnormal, all power electrical apparatus to constituting exposure device EX can be stopped, can also stopping electrically setting to a part Available electricity.Herein, when control device CONT detects the exception of recycling action of liquids recovery mechanism 20, such as stop to example Such as in linear motor or the piezoelectric element used near 0~150V or the photomultiplier used near 300~900V Electrical equipments such as (sensors) (high voltage installation) are powered, and electric leakage is thus prevented, and inhibit influence of the electric leakage to peripheral device.

In addition, control device CONT detect liquids recovery mechanism 20 recycling action exception when, such as stop use In the driving for making air bearing 42 that the guide surface 41A of Substrate table PST opposing substrates bottom plate 41 non-contactly moves.Air bearing 42 blow-off outlet 42B and attraction Substrate table PST with the upper surface of opposing substrate bottom plate 41 (guide surface) 41A blow gas (air) The air entry 42A of gas between (bearing surface) and guide surface 41A below is generated by the blowout of the gas from blow-off outlet 42B Bounce and balance by the air entry 42A attractions generated, keep one between guide surface 41A below Substrate table PST Fixed gap, but control device CONT is leaked in order to prevent in the exception for the recycling action for detecting liquids recovery mechanism 20 Liquid 1 flow into (immersions) arrive air bearing 42 air entry 42A, stopping air bearing 42 action, especially from air entry The air-breathing of 42A.In this way, liquid 1 can be prevented to be flowed into the vacuum system being connect with air entry 42A, it can prevent the inflow of liquid 1 from drawing The generation of the problems such as failure for the vacuum system risen.

The protrusion 65 or adsorption hole 66 of substrate P are kept in addition, can also be arranged in other component, by other component Absorption is held in the occasion of substrate tray PH, and control device CONT stops from for adsorbing the adsorption hole for keeping other component The air-breathing of (air entry).

In addition, control device CONT is in the exception for the recycling action for detecting liquids recovery mechanism 20, driving alarm fills Set K.Emergency warning lamp, alarm tone, display etc. can be used to send out alarm for alarm device K, in this way, such as operator is it can be seen that exposing The leakage or immersion of liquid 1 occur in device EX.

In addition, when detecting the exception that the recycling of liquids recovery mechanism 20 acts, control device CONT increase recycling dresses Set 60 liquids recovery amount.Specifically, the vacuum of retracting device 60 is made to be that 70 drive volume (driving force) rises.Retracting device 60 (vacuum is 70) are driven into vibration source, so, in exposure-processed, preferably reduce or prevent the driving of retracting device 60 Power, but when detecting the possibility of the exception that the recycling of liquids recovery mechanism 20 acts, the leakage that liquid 1 occurs, control dress CONT is set by making the driving force of retracting device 60 rise, thus prevents the outside of Substrate table PST (substrate tray PH) (at least The outside of recovery port 61) liquid 1 leakage, or prevent leakage expansion.

In addition, during the exposure area near the center to substrate P is exposed, supplied from liquid feed mechanism 10 Liquid 1 recycled by liquids recovery mechanism 20.On the other hand, as shown in Figure 5, pass through the fringe region progress to substrate P Exposure-processed, to when liquid immersion area AR2 is near the fringe region of substrate P, be continued in projected light by accessory plate 43 Be holding liquid 1 between PL and substrate P, but a part for liquid 1 flows out to the outside of accessory plate 43, the liquid of outflow sometimes 1 recovery port 61 by being configured with liquid absorbing member 62 recycles.Herein, control device CONT starts to drive aforesaid liquid supply Mechanism 10 and liquids recovery mechanism 20, meanwhile, start the action of retracting device 60.Therefore, the liquid 1 recycled from recovery port 61 is logical The attraction that vacuum is 70 is crossed, is recycled by flow path 63 and pipeline 68 together with the air of surrounding.In addition, be flowed into substrate P with it is auxiliary The liquid 1 in the gap of plate 43 is helped to be recycled by flow path 63 and pipeline 68 together with the air of surrounding by liquids recovery hole 64.This When, gas-liquid separator 71 detaches the liquid 1 and gas recycled from recovery port 61.The gas detached by gas-liquid separator 71 is by drying After device 72 is dried, it is 70 to be flowed into vacuum.In this way, liquid component can be prevented to be flowed into the problem of vacuum is 70.On the other hand, by The liquids recovery that gas-liquid separator 71 detaches is to liquid recovery part 73.

At this point, a part for the liquid 1 supplied from liquid feed mechanism 10 is recycled by retracting device 60, so, by liquid The amount of liquid that recovering mechanism 20 recycles is reduced, as a result, the liquids recovery amount measured by the flowmeter 27 of liquids recovery mechanism 20 subtracts It is few.In the occasion, even if liquid 1 does not leak, control device CONT may also be according to the flowmeter of comparative liquid feed mechanism 10 12 and liquids recovery mechanism 20 flowmeter 27 each measurement result, false judgment liquids recovery mechanism 20 recycling action in It generates abnormal.Therefore, it is equipped with to the liquid of recycling between the gas-liquid separator 71 in retracting device 60 and liquid recovery part 73 Measure the flowmeter that measures, control device CONT is according to the measurement result and liquid recovery machine of the flowmeter of the retracting device 60 The measurement result of the flowmeter 27 of structure 20 finds out the yield of whole liquid, compares the whole liquids recovery amount and liquid found out The measurement result of the flowmeter 12 of body feed mechanism 10.According to its result of the comparison, control device CONT judges and liquids recovery Whether the liquids recovery action of mechanism 20 generates exception, according to its judgement as a result, stop liquid feed mechanism 10 can be carried out Liquid supply action stops power supply, stops from measures such as the aspiratory actions of air entry.

In addition, when the measured value of the flowmeter set on retracting device 60 become preset feasible value relatively it is superfluous compared with When big value, when control device CONT judges that a large amount of liquid 1 flows out to the outside of substrate P, liquid 1 is to Substrate table in order to prevent The leakage etc. in the outside of PST (substrate tray PH), prevented also from liquid feed mechanism 10.

The liquid 1 for flowing out to the outside of substrate P is also possible to immerse from the gap of substrate P and accessory plate 43, reaches substrate P Back side.Entering the liquid 1 of the back side of substrate P, there is also be flowed into keep the adsorption hole of substrate P (to attract for adsorbing Mouthful) 66 possibility.In the occasion, pass through pipeline 67 to adsorb the adsorption hole 66 for keeping substrate P and being set to substrate tray PH It is 74 to be connected to vacuum with pipeline 69, its on the way, equipped with gas-liquid separator 75 and the gas to being detached by gas-liquid separator 75 The drier 76 being dried.Therefore, even if can return the liquid 1 flowed into from adsorption hole 66 if liquid 1 is flowed into adsorption hole 66 Liquid recovery part 73 is received, liquid component is prevented to be flowed into the problem of vacuum is 74.

In the occasion that liquid 1 is immersed from adsorption hole 66, the possibility generated due to there is holding of substrate P etc., institute With, configured between pipeline 69 or gas-liquid separator 75 and liquid recovery part 73 flowmeter, detected by the flowmeter liquid from The occasion of the immersion of adsorption hole 66, is judged as abnormal situation, implements the stopping of liquid supply action as described above, power supply stops Only, from least one in the stopping of the air-breathing of air entry.

For being not provided with the occasion of gas-liquid separator 75 in the pipeline 69 being connect with adsorption hole 66, when detecting liquids recovery When the exception of the recycling action of mechanism 20 or retracting device 60, liquid 1 is flowed into adsorption hole (air entry) in order to prevent, can also stop Only vacuum is the driving of 74 (attracting system), stops the air-breathing from adsorption hole 66.

As described above, when detecting the leakage of liquid 1 or immersing such abnormal, stop supplying machine by liquid Structure 10 supplies liquid 1 in substrate P, so, expansion or the immersion etc. that the leakage of liquid 1 can be prevented or prevent leakage.In addition, i.e. Make the occasion occurred extremely as liquid 1 leaks or immerses, by stopping to the linear motor for constituting exposure device EX 47, the power supply of the electrical equipments such as 48 thus prevents the expansion lost caused by the generation and electric leakage of electric leakage.In addition, in order to inhale The attached air entry 42A or substrate P for keeping air bearing 42 stops connecting from vacuum systems such as adsorption holes 66 set on substrate tray PH The air-breathing of logical each air entry thus prevents liquid 1 to be flowed into the hair of the vacuum system this problem being connect with the air entry It is raw.In addition, when from recycling ozzle 21 or the suction ports withdrawal liquid such as recovery port 61 or adsorption hole 66 and surrounding gas, use Gas-liquid separator carries out gas-liquid separation to the liquids and gases sucked from suction port, is used in combination drier to by gas-liquid separator separates Gas afterwards is dried, and thus prevents liquid component (wet gas etc.) to be flowed into vacuum system, can reduce liquid to vacuum The influence of system.In addition, this form of implementation is from the composition of suction port withdrawal liquid together with surrounding gas, but by by The liquids and gases of gas-liquid separator recycling are detached, so as to correctly measure the amount of liquid of recycling.

In above-mentioned form of implementation, as the exception of liquids recovery mechanism 20 recycling action, (moved with the failure that vacuum is 25 Make abnormal) for be illustrated, but other than vacuum is 25 failure, such as can also enumerate the action of gas-liquid separator 22 It is abnormal.That is, even if can by recycle ozzle 21 recycle substrate P on liquid 1, gas-liquid separator 22 can not be sufficiently separated from Liquid and gas that ozzle 21 recycles are recycled, the amount of liquid measured by flowmeter 27 the situation fewer than predetermined value is generated.At this It closes, is flowed into the liquid component that vacuum is 25 and increases, so, it is 25 failure etc. to lead to vacuum, for this purpose, control device CONT stops The only liquid supply action of liquid feed mechanism 10, meanwhile, the liquids recovery of stop liquid recovering mechanism 20 (vacuum is 25) is dynamic Make, thus prevents the leakage of liquid 1, and it is 25 failure that can prevent vacuum.

In this form of implementation, control device CONT controls liquid feed mechanism 10 and liquids recovery mechanism 20 respectively, makes The amount of liquid that must be supplied in substrate P is substantially the same with from the liquids recovery amount in substrate P.For this purpose, as normally carried out respectively The action of the liquids recovery of the liquid supply action of liquid feed mechanism 10 and liquids recovery mechanism 20, then the above-mentioned difference found out is substantially It is zero, above-mentioned feasible value is redefined for smaller value corresponding to which.On the other hand, such as in the liquid 1 used there is height Volatile occasion, even if the action point of the liquids recovery of the liquid supply action of liquid feed mechanism 10 and liquids recovery mechanism 20 It does not carry out normally, liquid 1 volatilizees in substrate P, it is also possible to so that the measurement that the flowmeter 27 of liquids recovery mechanism 20 obtains Value is smaller than the measured value obtained by the flowmeter 12 of liquid feed mechanism 10.Therefore, control device CONT preferably corresponds to use Liquid 1 (volatility) or substrate P residing for environment, preset above-mentioned feasible value, asked with above-mentioned according to the feasible value of setting The comparison result of the difference gone out, control valve 13.

In addition, in above-mentioned form of implementation, liquid supply amount and the liquids recovery mechanism 20 of comparative liquid feed mechanism 10 Liquids recovery amount, the exception of the circulation status of liquid 1 is detected, but also only on the basis of the supply amount of liquid feed mechanism 10 or only Exception is detected respectively according to the yield of liquids recovery mechanism 20.In addition, being not limited to the flow of liquid, liquid supply is being detected The mechanically or electrically abnormal occasion of mechanism 10 or liquids recovery mechanism 20, control device CONT can also take stop liquid to supply machine The liquid supply action of structure 10 stops power supply, stops from measures such as the aspiratory actions of air entry.

In this form of implementation, surrounding gas is also recycled together with liquid 1 from recycling ozzle 21, so, In order to measure more accurate liquids recovery amount, the liquid of recycling is also detached with gas using gas-liquid separator 22, uses flowmeter 27 measure the amount of liquid of separation.For this purpose, the gas-liquid separation ability of gas-liquid separator 22 is it is also possible that the liquid measured by flowmeter 27 The scale of construction changes.Therefore, it is above-mentioned to also correspond to the gas-liquid separator used 22 (gas-liquid separation ability) setting by control device CONT Feasible value.

In this form of implementation, when detecting the exception of liquids recovery action of liquids recovery mechanism 20, liquid supply Stopping, the stopping to power electrical apparatus and the stopping of the aspiratory action from air entry of the liquid supply action of mechanism 10 are all Carry out, but can also implement at least any one.

In this form of implementation, from the recycling ozzle 21 of liquids recovery mechanism 20 with liquid 1 together by surrounding gas Also it recycles, so, in order to measure the amount of liquid of recycling with flowmeter 27 by better precision, it is separated into using gas-liquid separator 22 Liquid and gas, but do not have to gas-liquid separation from the occasion of the recycling ozzle 21 only composition of withdrawal liquid 1 in liquids recovery mechanism 20 Device 22 detaches liquid and gas, and the amount of the liquid by measuring recycling can find out liquids recovery amount.

But in this form of implementation, such composition can be also formed, that is, when time for detecting liquids recovery mechanism 20 When the exception of receipts action, the liquid supply action of stop liquid feed mechanism 10, or stop to power electrical apparatus, or stop from The aspiratory action of air entry, but work as and detect that can remain substrate P carries out mobile Substrate table (movable link) PST and projected light When be the exception of the position relationship of PL, implement the stopping of stopping, the power supply of liquid supply action and moved from the air-breathing of air entry In the stopping of work at least any one.Herein, the abnormal position relationship of Substrate table PST and projection optics system PL is that cannot throw The state that liquid 1 is kept below shadow optical system PL, including the position relationship of Z-direction and at least one party in the directions XY is different Often.That is, even if the recycling action of the supply action and liquids recovery mechanism 20 of liquid feed mechanism 10 is normal, such as work as Substrate table The action generation exception of PST, Substrate table PST are configured to inclined along the directions XY from the desired position relative to projection optics system PL The position of shifting, in the occasion, generation cannot be formed well in projection optics system PL and between being held in the substrate P of Substrate table PST The state (state that liquid 1 cannot be kept below projection optics system PL) of the liquid immersion area AR2 of liquid 1.In the occasion, liquid The moving lens 45 that body 1 leaks into the outside of substrate P, the outside of substrate tray PH or Substrate table PST (substrate tray PH) soak. In this way, liquid 1 of the liquids recovery mechanism 20 since predetermined amount cannot be recycled, so, the flowmeter 27 of liquids recovery mechanism 20 will The measurement result of the value smaller than predetermined value is output to control device CONT.Control device CONT is according to the measurement knot of the flowmeter 27 The exception of the position of Substrate table PST as detectable leakage that liquid 1 occurs of fruit etc..Then, control device CONT is being detected When to its exception, implement the stopping of stopping, the power supply of liquid supply action and the stopping etc. of the aspiratory action from air entry.

In addition, liquid immersion area AR2 by projection optics system PL between substrate P at a distance from be set as can be by the surface of liquid 1 Power forms the preset distance (0.1mm~1mm or so) of the degree of liquid immersion area AR2, but for example in Substrate table PST about Z axis side To the occasion led to the problem of is controlled in position, projection optics system PL increases at a distance from the substrate P on Substrate table PST, may production Life cannot keep the situation of liquid 1 below projection optics system PL.In the occasion, liquid 1 leaks into outside or the base of substrate P The outside etc. of pallet PST (substrate tray PH), liquids recovery mechanism 20 cannot recycle the liquid 1 of predetermined amount, liquids recovery mechanism The measurement result of the value smaller than predetermined value is output to control device CONT by 20 flowmeter 27.Control device CONT is according to the stream The measurement result of gauge 27 can detect that the malposition of such Substrate table PST occurs for the leakage of liquid 1.Control device When CONT detects the exception, implement the stopping of stopping, the power supply of liquid supply action and stopping from the aspiratory action of air entry Only etc..

In order to detect the exception of position relationships of the Substrate table PST with respect to projection optics system PL, liquids recovery mechanism is not used The measurement result of 20 flowmeter 27, such as detect by laser interferometer 46 position in the directions XY of Substrate table PST, according to it Position detection is as a result, can detect that the exception of position relationship.Control device CONT also may compare the base that laser interferometer 46 obtains Pallet position detection result and preset feasible value, when the platform position detection result of laser interferometer 46 is allowed more than above-mentioned When value, implement the stopping etc. of the supply action of liquid 1.In addition, also can be the Z axis side of 56 detection Substrate table PST by focus detection To position, compare the platform position detection result obtained by focusing (focus) detection system 56 and preset feasible value, when poly- When the testing result of burnt detection system 56 is more than feasible value, control device CONT implements the stopping etc. of the supply action of liquid 1.This Sample, control device CONT is according to the detection knot of the Substrate table position detecting device for comprising laser interferometer 46 and focus detection being 56 It is dynamic to implement liquid supply when detecting abnormal for fruit, the exception of the position relationship of detection projection optics system PL and Substrate table PST The stopping of work, the stopping of the power supply of opposite electrical equipment and the stopping etc. of the aspiratory action from air entry.

In addition, can also form such composition, that is, when mistake occurs for laser interferometer 46, control device CONT stops The liquid supply action of liquid feed mechanism 10.Herein, the mistake of laser interferometer 46 include due to laser interferometer 46 from The failure of body to carry out Substrate table PST's in the light path of the measurement light of interferometer configured with certain reasons such as foreign matters The state that position measures.When mistake occurs for laser interferometer 46, control device CONT cannot hold the position of Substrate table PST, Cannot simultaneously control base board platform PST position.In the occasion, generated in the position relationship of projection optics system PL and Substrate table PST Abnormal, there are the danger of liquid 1 leakage and outflow.Therefore, it when mistake occurs for laser interferometer 46, is supplied by liquid by stopping The problem of supplying liquid to mechanism 10, liquid 1 thus prevented to leak.

Equally, (inspection is focused in this form of implementation in the measurement system of the position of the Z-direction for control base board platform PST Survey is that the occasion of mistake 56) occurs, and generates exception in the position relationship of projection optics system PL and Substrate table PST, there are liquid 1 The danger of outflow is leaked, so, it is the occasion of 56 generation mistakes in focus detection, control device CONT stop liquids supply machine The liquid supply action of structure 10.

Substrate table PST (substrate tray PH) and the exception of the position relationship of the Z-direction of projection optics system PL are not limited to gather Burnt detection system 56, it is possible to use the detection system of the non-opticals such as static capacity sensor.

In addition, it is possible to use interferometer manages the position of the image planes of projection optics system PL and the surface of Substrate table PST (substrate P) Set relationship.The management of the image planes of projection optics system PL and the position relationship on Substrate table PST (substrate P) surface is carried out using interferometer Content e.g., as disclosed in United States Patent (USP) 6,202,964, allowed in the decree for the country for being specified by this international application or being selected Range, reference disclosure of which as a part described herein.

In addition, in above-mentioned form of implementation, illustrate to generate abnormal occasion in exposure actions, but without substrate P Exposure when the occasion that is abnormal it is also identical.

In addition, in above-mentioned form of implementation, when detecting abnormal in being supplied in liquid, the supply of stop liquid, but work as When starting the supply of liquid, even if in the abnormal occasion for detecting position relationship of projection optics system PL and Substrate table PST etc., Also can the supply of stop liquid start.

In the following, illustrating the 2nd form of implementation of the exposure device EX of the present invention.In the following description, pair with above-mentioned implementation The identical or same composition part of form uses identical symbol, simplifies or the description thereof will be omitted.In this form of implementation, packet is used Detector containing optical fiber is detected optically by leakage of the liquid 1 towards the outside of substrate P or Substrate table PST (substrate tray PH) etc., when When detecting the leakage or immersion of liquid 1, implement to supply the action of liquid, to the power supply of electrical equipment from liquid feed mechanism 10 Stopping and from least one in the stopping of the aspiratory action of air entry.

Illustrate the testing principle of the detector for the leakage for detecting liquid 1 referring to Fig. 6 and Fig. 7.In this form of implementation, Optical fiber is used as detector.Fig. 6 is the signal composition figure for showing general optical fiber.In figure 6, optical fiber 80 ', which has, transmits light Core 81 and the clad section 82 around core 81, with the refractive index smaller than core 81.In optical fiber 80 ', light quilt The core 81 with the refractive index higher than clad section 82 is sealing into be transmitted.

Fig. 7 is the signal composition figure for the optical fiber 80 for showing this form of implementation.In the figure 7, optical fiber 80 is with transmission light Core 81, the optical fiber (unclad fiber) that clad section is not provided with around it.The core 81 of optical fiber 80 has than surrounding The refractive index nc of the refractive index na high of gas (being air in this form of implementation), and have than liquid (in this form of implementation In be pure water) the 1 low refractive index (na < nc < nw) of refractive index nw.For this purpose, the field being full of by air around optical fiber 80 It closes, as long as the incidence angle θ of light₀Meet sin θ₀> na/nc, then light be sealing into the core 81 with the refractive index nc higher than air It is transmitted.That is, not generated from the light for penetrating end incidence of optical fiber 80 big damply its light quantity is emitted from outgoing end.It can It is that the occasion on the surface of optical fiber 80 is attached in liquid (pure water) 1, due to for nc < nw, so, at the position for being attached to water, All incidence angles cannot all meet total reflection condition sin θ₀=nw/nc does not occur entirely at the interface of the liquid 1 and optical fiber 80 Reflection, so, light leaks into outside from the liquid attachment portion of optical fiber 80.Therefore, from the light of the incident-end incidence of optical fiber 80 Light quantity from outgoing end be emitted when reduce.Therefore, the optical fiber 80 is set in the precalculated position of exposure device EX, passes through measurement The light quantity of the outgoing end of the optical fiber 80, so as to whether be attached to optical fiber 80, i.e. liquid by control device CONT detection liquid 1 Whether 1 leak.The refractive index of air is 1 or so, and the refractive index of water is 1.4~1.6 or so, so, core 81 for example preferably by Material (quartzy, specific composition glass etc.) with 1.2 or so refractive index is constituted.

In addition, according to the attenuation for the light being emitted from the outgoing end of optical fiber 80, the liquid 1 for being attached to optical fiber 80 can be found out Amount.That is, light decrement depends on the area that liquid 1 is attached to the part of optical fiber, optical fiber 80 is attached in a small amount of liquid 1 The occasion of surrounding, the attenuation for being emitted the light of end is small, and in the occasion that a large amount of liquid 1 adheres to, attenuation is big.Therefore, it can examine The area for considering the part that liquid 1 adheres to depends on liquid leakage amount, so, the light quantity of the outgoing end by measuring optical fiber 80, So as to find out the leakage rate of liquid 1.In addition, by the measured value of the light quantity of fiber exit end and preset multiple threshold values (a reference value) is compared, and in the occasion more than each threshold value, sends out specific signal respectively, to scalably detect liquid 1 Leakage rate.

Fig. 8 is the state for showing to be configured at the optical fiber 80 of above-mentioned detector around Substrate table PST (substrate tray PH) Side view, Fig. 9 is plan view.As shown in Figure 8 and Figure 9 like that, optical fiber 80 is wound around Substrate table PST (substrate tray PH) Ground configures.In the incident-end of optical fiber 80, connection can 80 incident light of opposed optical fibers light projector part 83, in the exit end of optical fiber 80 Portion connects light part 84, which can receive the light for transmitting in optical fiber 80, being emitted from outgoing end.Control device CONT is found out according to the light quantity of the light quantity and the light received by light part 84 of the light for being incident on optical fiber 80 from light projector part 83 Optical fiber 80 outgoing end with respect to incident-end light decay rate, according to this find out as a result, judging whether liquid 1 is attached to light Fibre 80, i.e. whether liquid 1 leaks into the outside of Substrate table PST (substrate tray PH).Control device CONT, which works as, judges that liquid 1 leaks When, realize the stopping of the liquid supply action carried out by liquid feed mechanism 10, to the stopping of the power supply of electrical equipment and from suction The stopping etc. of the aspiratory action of gas port.

Optical fiber 80 can be configured to around the upper surface of Substrate table PST (substrate tray PH), especially recovery port 61, also may be used In order to check the immersion (immersion liquid) of moving lens 45, be configured to moving lens 45 or its around.

Figure 10 is around the air bearing 42 for showing optical fiber 80 being configured to below Substrate table PST and removable Ground supports the example around the substrate base (substructure member) 41 of Substrate table PST.Optical fiber 80 is due to can arbitrarily be bent, institute Can be wound up into the liquid 1 such as Substrate table PST (substrate tray PH), air bearing 42 and substrate base 41 and be easy the arbitrary of leakage It installs to position, is configured by arbitrary form with can freely arranging.It is installed on air bearing 42 especially by by optical fiber 80 Around, so as to detect whether liquid 1 adheres near (leakage) to air bearing 42 well, prevent liquid 1 from flowing into advance To air bearing 42 air entry 42A the problem of.

But in above-mentioned optical fiber 80, when the distance from incidence end to exit end, it is difficult to determine that liquid 1 is attached sometimes It in the position of optical fiber 80, the i.e. leak position of liquid 1.Therefore, as shown in Figure 11, by the way that multiple optical fiber 80 are pressed matrix Shape carries out 2 dimension configurations, to can determine the leak position of liquid 1.In fig. 11, detector 90 has the 1st optical fiber 80A and the 2nd Optical fiber 80B；1st optical fiber 80A with the 1st direction (Y direction) for length direction, along the 2nd direction (X-axis directly handed over the 1st direction Direction) setting it is multiple；2nd optical fiber 80B is arranged multiple using the 2nd direction as length direction along the 1st direction.These multiple 1, 2nd optical fiber 80A, 80B is configured by rectangular (reticulate).Each incident-end set of multiple 1st optical fiber 80A, Set-dissection It is connect with the outgoing end of set optical fiber 85A.The incident-end of set optical fiber 85A is connected to light projector part 83A.On the other hand, The outgoing end of multiple 1st optical fiber 80A is such as being connected to the light part 84A constituted by 1 Victoria C CD line sensors.As much Each incident-end set of a 2nd optical fiber 80B, Set-dissection are connect with the outgoing end of set optical fiber 85B.Gather optical fiber The incident-end of 85B is connected to light projector part 83B.On the other hand, each outgoing end of multiple 2nd optical fiber 80B is for example connected to The light part 84B being made of 1 Victoria C CD line sensors etc..

The light being emitted from light projector part 83A is branched off into multiple 1st optical fiber 80A respectively after the 85A transmission of set optical fiber. It is emitted respectively from the light of the incident-end incidence of the 1st optical fiber 80A from outgoing end, by acceptance part after the 1st optical fiber 80A transmission Divide 84A light.Light part 84A detects the light quantity for the light being emitted respectively from the outgoing end of multiple 1st optical fiber 80A respectively.? Here, as shown in Figure 11, it is attached to the occasion on the specific 1st optical fiber 80AL in multiple 1st optical fiber 80A in liquid 1, The light quantity of the outgoing end of 1st optical fiber 80AL declines.The light result of light part 84A is output to control device CONT.Together Sample, the light being emitted from light projector part 83B are branched off into multiple 2nd optical fiber 80B respectively after set optical fiber 85B transmission.Respectively from The light of the incident-end incidence of 2 optical fiber 80B is emitted after the 2nd optical fiber 80B transmission from outgoing end, by light part 84B by Light.Light part 84B detects the light quantity for the light being emitted from each outgoing end of multiple 2nd optical fiber 80B respectively.Herein, as schemed Shown in 11 like that, it is attached to the occasion on the specific 2nd optical fiber 80BL in multiple 2nd optical fiber 80B in liquid 1, in the 2nd light The light quantity of the outgoing end of fine 80BL declines.The light result of light part 84B is output to control device CONT.Control device CONT is according to each light result of light part 84A, 84B, it may be determined that (liquid 1 of leakage is opposite to be detected for the leak position of liquid 1 Device 90 adhere to position) be the 1st optical fiber 80AL and the 2nd optical fiber 80BL near intersections.

Figure 12 is to show that the detector 90 with optical fiber 80A, 80B by rectangular configuration is configured to as drive substrate platform The figure of the example of the linear motor 47 (stator 47A) of the electromagnetic drive source of PST.By the way that detector 90 is configured to linear electrical Machine 47, to can determine leak into the outside of Substrate table PST, the liquid being attached on linear motor 47 1 position.By true Surely the position of the liquid 1 leaked, so as to the removing operation of the liquid 1 leaked by good efficiency.

Liquid 1 be water, remove the leakage liquid (water) occasion, removing operation is carried out by using absolute alcohol (wiping operation), so as to remove water well, in addition, since alcohol volatilizees immediately, so, it can successfully carry out removing work Industry.

Schematic diagram as shown in figure 13 is such, attached to can determine by keeping pulsed light incident from the incident-end of optical fiber 80 It in the position of the liquid 1 on 80 surface of optical fiber.The occasion on the surface of optical fiber 80 is attached in liquid 1, from the incidence end of optical fiber 80 The pulsed light L1 of portion's incidence is reflected in the attachment position of liquid 1, is generated its reflected light L2 and is again returned to showing for incident-end side As.Therefore, the optical elements such as polarization beam splitter are set in light incident side, with optical element by reflected light guide to light-receiving device into Row detection.From testing result, at the time of being incident on optical fiber 80 according to pulsed light L1 with reflected light L2 by incident-end light when The time difference at quarter and the ray velocity transmitted in optical fiber 80 can find out incident-end at a distance from the attachment position of liquid 1, to It can determine the attachment position (leak position of liquid 1) of liquid 1.80 (core of optical fiber is corresponded in the ray velocity that optical fiber 80 transmits 81) forming material generates variation, so, it can be found out according to the forming material of the optical fiber 80.

In the following, illustrating the 3rd form of implementation of the exposure device EX of the present invention.In this form of implementation, when use includes rib When the detector of mirror (optical element) is detected optically by out the leakage of liquid 1, detects the leakage of liquid 1, implement liquid supply The stopping of the liquid supply action of mechanism 10, the power supply of electrical equipment stop and from the stopping of the aspiratory action of air entry At least one.

Illustrate the testing principle of the detector for the leakage for detecting liquid 1 referring to Figure 14 and Figure 15.In this form of implementation It is middle to use prism.Figure 14 is the figure for showing the signal using the detector 100 of prism and constituting.In fig. 14, detector 100 has Prism 101 is installed on the 1st face 101A of prism 101, the light projector part 102 of 101 projection light of opposing prism, and is installed on prism 101 the 2nd face 101B, receive the light that is emitted from light projector part 102 the reflected light of the 3rd face 101C of prism 101 acceptance part Divide 103.1st face 101A and the 2nd face 101B substantially becomes right angle.

Prism 101 has a refractive index higher than surrounding gas (in this form of implementation be air), and with than Liquid (being pure water in this form of implementation) 1 low refractive index.The occasion being full of by air around prism 101, from light projector The light that part 102 projects the 3rd face 101C is carried out selecting Refractive Index of Glass Prism with being totally reflected by the 3rd face 101C.For this purpose, from light-projecting portion With dividing the unattenuated many light quantities of light of 102 outgoing by 103 light of light part.

Figure 15 is to show that liquid 1 is attached to the figure of the state of the 3rd face 101C of the prism 101 of detector 100.In Figure 15 In, project the light of the 3rd face 101C since there are faces not to be totally reflected by the 3rd face 101C for liquid 1 from light projector part 102, The light ingredient of a part (or whole) leaks into outside from the liquid attachment portion of prism 101.For this purpose, going out from light projector part 102 The light quantity of the light ingredient of the 2nd face 101B of arrival in the light penetrated decays, so, according to the light quantity of light, (light is believed for light part 103 Breath), it can detect that whether liquid 1 is attached to the 3rd face 101C of prism 101.Therefore, by the precalculated position of exposure device EX Detector 100 with the prism 101 is set, is so as to detect liquid 1 according to the light result of light part 103 by CONT No to be attached to prism 101, i.e. whether liquid 1 leaks.

Figure 16 is the flat of the example for showing to be configured to the detector 100 with above-mentioned prism 101 around Substrate table PST Face figure.In figure 16, detector 100 in the state that the 3rd face 101C of prism 101 is towards upside at predetermined intervals in Substrate table It is installed around PST (substrate tray PH) multiple.Control device CONT is incident on according to from 100 light projector part 102 of each detector It is opposite in prism 101 to find out outgoing light quantity for the light quantity of the light quantity of light when prism 101 and the light received by light part 103 The attenuation rate of incident light quantity, according to its find out as a result, judging whether liquid 1 is attached to prism 101, i.e., whether liquid 1 leaks To the outside of Substrate table PST (substrate tray PH).When control device CONT judges that liquid 1 leaks, implement liquid feed mechanism The stopping of the supply action of 10 liquid, to electrical equipment power supply stopping and aspiratory action from air entry stopping etc..

In this form of implementation, control device CONT is according to each testing results of multiple detectors 100 and the detector 100 Installation site information, can easily determine the leak position of liquid 1.In addition, prism 101 is due to smaller, so, it can be easily It is installed to the arbitrary position of exposure device EX, setting operation is also good.

Above-mentioned detector 100 is equally applicable to water-level gauge (liquid level gauge).Figure 17 is the case shown that can accommodate liquid (water) 1 110 wall surface is along multiple the schematic diagrames for installing detector 100 of short transverse (Z-direction) arrangement.The wall surface of case 110 is transparent, Detector 100 installs the 3rd face 101C of prism 101 with being contacted with the wall surface of case 110.It is in multiple detectors 100, detect case The detector 100 of the detector 100 (light part 103) of liquid 1 in 110 shown by optical signal than liquid 1 is not detected The value low by optical signal of (light part 103), so, control device CONT is according to each testing results of multiple detectors 100 (light result) and multiple detector 100 respectively with respect to the installation site information of case 110, the liquid 1 in case 110 can be found out Liquid level (water level), in this way, the amount of liquid in case 110 can be found out.

Figure 18 is to show that the case 110 that will have the detector 100 for constituting water-level gauge is suitable for the one of liquids recovery mechanism 20 The signal of partial example constitutes figure.Liquids recovery mechanism shown in Figure 18 20 has recycling ozzle 21, is connected by recovery tube 24 In the vacuum of recycling ozzle 21 be 25 and set on the gas-liquid separator 22 on the way of recovery tube 24 and drier 23.By gas-liquid separation The liquid 1 that device 22 detaches passes through the 2nd recovery tube 26 receiving to the case 110 with detector 100.That is, in this form of implementation, if Set flowmeter 27 of the replacement of case 110 with reference to Fig. 3 liquids recovery mechanisms 20 illustrated.The testing result of detector 100 is output to control Device CONT processed, control device CONT find out the amount of liquid recycled by recycling ozzle 21 according to the testing result of detector 100. The amount of liquid that control device CONT is recycled from recycling ozzle 21 by comparing and the amount of liquid supplied from liquid feed mechanism 10, from And it can detect that the exception of the recycling action of liquids recovery mechanism 20.In addition, passing through pipeline 28A connection liquids recoveries in case 110 Part 28 is equipped with valve 28B in the way of pipeline 28A.Control device CONT when case 110 be filled to predetermined amount or its more than when (or regularly) make valve 28B starts, open flow path 28A, with the liquid 1 in 28 recycling bins 110 of liquids recovery part.

In addition, in the form of implementation shown in Figure 18, detector 100 is installed respectively in supply pipe 15 and recovery tube 24.At this In, supply pipe 15 and recovery tube 24 are formed by transparent material respectively, keep the detection faces 100c of detector 100 tight in its tube outer surface Contiguity, which is contacted to earth, installs detector 100.According to the light of the light part 103 for the detector 100 for being installed on supply pipe 15 as a result, control Device CONT processed can detect whether liquid 1 is passed to supply pipe 15.That is, not being passed to the occasion phase of supply pipe 15 with liquid 1 Than, the value by optical signal of the light part 103 of the occasion of circulation becomes smaller, so, control device CONT is according to light part 103 Light result can detect whether normally whether liquid 1 be passed to supply pipe 15, the i.e. supply action of liquid feed mechanism 10 It carries out.Equally, control device CONT can according to the light of the light part 103 for the detector 100 for being installed on recovery tube 24 as a result, Detect whether liquid 1 is passed to recovery tube 24, i.e. whether the recycling action of liquids recovery mechanism 20 normally carries out.In this way, Detector 100 also is used as being detected optically by liquid 1 and whether is passed to the liquid of supply pipe or recovery tube whether there is or not sensors.

In addition, by will have the detector 100 of prism 101 to be installed to (light near such as front end of projection optics system PL Learn near element 2), to can also be used whether the detector 100 detection liquid 1 is filled to projection optics system PL and substrate P Between.

In above-mentioned form of implementation, although being detected optically by leakage or the liquid 1 of liquid 1 using optical fiber 80 or prism 101 The presence or absence of ground be detected, but static capacity sensor can also be used etc. and detected in the way of electricity.

In addition, liquid 1 be water occasion, also can by leakage sensor by electricity in the way of detect liquid 1 leakage or The presence or absence of liquid 1, the leakage sensor are made of 2 electric wires for leaving certain intervals, pass through having for the conducting between 2 electric wires Leakage without detection liquid 1.In this form of implementation, liquid 1 uses water, so, the leakage sensor of above-mentioned composition can be used. In liquid 1 using the occasion of ultra-pure water, ultra-pure water due to there is no electric conductivity, so, cannot liquid 1 be detected by leakage sensor Whether there is or not.In the occasion, such as contain electrolysed substance in advance in the coating of 2 electric wires left, then can ultrapure water infiltration when It carves and obtains electric conductivity, so, the leakage sensor of above-mentioned composition can be used to detect the liquid 1 as ultra-pure water.

Certainly the characteristic that above-mentioned each form of implementation can be combined is used.For example, being spread on the periphery of linear motor If optical fiber 80, in detector 100 of Substrate table PST (substrate tray PH) configurations with prism 101.

In addition, optical fiber or prism can also be not provided with above-mentioned all positions, as long as being arranged as required to Substrate table PST Inside or the executing agencies such as photoelectric detector or piezoelectric element near.

In addition, as with reference to Fig. 8~as shown in Figure 10, can be wound up into around Substrate table PST or the week of substrate base 41 Exclosure configures optical fiber 80, but also the 1st light can be arranged around Substrate table PST as shown in the side view of Figure 19 (b) certainly The 2nd optical fiber 80D is arranged in fine 80C around substrate base 41.In addition, optical fiber 80 (80E) can also be configured set on Substrate table The inside of recovery port 61 on PST.Same as above-mentioned form of implementation, in Figure 19, Substrate table PST, which has to surround, is held in substrate The accessory plate 43 formed around the substrate P of pallet PH and the recovery port 61 on the outside of it.Accessory plate 43, which has to be set to, to be kept Flat surface (planar section) 43A of the roughly the same plane in surface around the substrate P of substrate tray PH, with the substrate P.It is flat Smooth face 43A, which is surrounded, is set as ring-type around substrate P.In addition, being equipped with recovery port 61 in the outside of accessory plate 43 (flat surface 43A). Recovery port 61 is the cricoid groove portion formed with surrounding accessory plate 43 (substrate P).In this form of implementation, in recovery port 61 Liquid absorbing member (62) is not configured in side.As shown in the plan view of Figure 19 (a), the edges optical fiber 80E are formed as cricoid recycling The week configuration of mouth 61.In the optical fiber 80E for being internally provided with detection the presence or absence of liquid 1 of recovery port 61, in this way, even if liquid 1 from Substrate P leaks, and before the liquid 1 of leakage is spread, the liquid 1 of leakage can be detected by optical fiber 80E.Therefore, control device CONT when optical fiber 80E detect liquid 1 there are when, take the liquid supply action using 13 stop liquid feed mechanism 10 of valve Etc. adequate measures, thus prevent the diffusion of liquid 1 or the leakage from Substrate table PST.When optical fiber 80E is configured to recovery port When 61 inside, liquid absorbing member (62) can be also configured to the recovery port 61.

In addition, as shown in Figure 19 (b), exposure device EX (bases are respectively arranged in the optical fiber 80 of the presence or absence of detection liquid 1 Pallet PST) multiple precalculated positions occasion, correspond to the testing result of these multiple optical fiber 80, control device CONT control The action of exposure device EX.For example, control device CONT is corresponding to the optical fiber 80 being detected to liquid 1 in multiple optical fiber 80 Position, select at least one party's in the stopping of the stopping of the liquid supply of liquid feed mechanism 10 and the power supply of electrical equipment Action.

Specifically, control device CONT the 1st optical fiber 80C set on Substrate table PST detect liquid 1 there are when, The liquid supply action of stop liquid feed mechanism 10, when the 2nd optical fiber 80D set on substrate base 41 detects depositing for liquid 1 When, stop the power supply to scheduled electrical equipment.Herein, scheduled electrical equipment can enumerate drive substrate platform PST's Linear motor 47,48 or the Anti-vibration unit 9 etc. that vibrationproof bearing is carried out to substrate base 41.

When the 1st optical fiber 80C set on Substrate table PST detects the presence of liquid 1, set on the 2nd optical fiber of substrate base 41 80D be not detected liquid 1 there are when, control device CONT judges that the liquid 1 of leakage does not feed through to the line of drive substrate platform PST Property motor 47,48 or Anti-vibration unit 9.That is, control device CONT judges the range of scatter of the liquid 1 of leakage for relatively narrow model It encloses.In the occasion, control device CONT implements the stopping of the liquid supply action of liquid feed mechanism 10, but continues to linear electricity Motivation 47,48 or Anti-vibration unit 9 are powered.On the other hand, when the 2nd optical fiber 80D set on substrate base 41 detects depositing for liquid 1 When, control device CONT judges that the liquid 1 of leakage feeds through to linear motor 47,48 or Anti-vibration unit 9.That is, control device CONT judges the range of scatter of the liquid 1 of leakage for wider range.In the occasion, control device CONT stop liquids supply machine The liquid supply action of structure 10, meanwhile, stop the power supply of linear motor 47,48 and at least one party in Anti-vibration unit 9.When 2 optical fiber 80D detect liquid 1 there are when, best control device CONT stops to linear motor 47,48 or Anti-vibration unit 9 Power supply, but do not stop the power supply to exposure device EX entirety.When stopping is to when exposure device EX bulk supplies, recovery hereafter is made Industry and stabilisation need the long period.

In this way, corresponding to the testing result for the 1st optical fiber 80C and the 2nd optical fiber 80D for being located at mutually different position, control The action of exposure device EX, so, adequate measure corresponding with the range of scatter of the liquid 1 leaked or countermeasure can be taken.Therefore, Resuming operation the required time after the leakage of liquid 1 occurs can be shortened, the reduction of the rate of motion of exposure device EX can be prevented.When Set on the 1st optical fiber 80C of Substrate table PST detect liquid 1 there are when, control device CONT stops by liquid feed mechanism 10 Liquid supply is carried out, continues, to power electrical apparatus, to be suppressed to most so as to resume operation or stabilize the required time Small limit.On the other hand, when the 2nd optical fiber 80D set on substrate base 41 detect liquid 1 there are when, control device CONT Stop to the linear motor 47,48 of drive substrate platform PST or the power supply of Anti-vibration unit 9.In this way, even if leaking into wide scope Liquid is spread, and is occurred prevented also from being damaged as electric leakage or failure etc..

In addition, control device CONT also corresponds to the amount of the liquid 1 detected by optical fiber 80, control exposure device EX's Action.For example, control device CONT corresponds to the amount of the liquid 1 detected by optical fiber 80, the liquid of liquid feed mechanism 10 is selected The action of at least one party of the stopping of the stopping of body supply action and power supply to electrical equipment.

Specifically, at least one party of the control device CONT in the 1st optical fiber 80C and the 2nd optical fiber 80D detect more than etc. When the liquid 1 of the amount of preset 1st a reference value, the liquid supply action of stop liquid feed mechanism 10, when detecting More than or equal to the amount of the 2nd a reference value liquid 1 when, stop the linear motor 47,48 of drive substrate platform PST and to substrate base 41 Anti-vibration units 9 for carrying out vibrationproof bearing wait the power supply of electrical equipments.Herein, the 2nd a reference value is bigger than the 1st a reference value Value.

Control device CONT is in the liquid 1 for judging to be detected by at least one party in the 1st optical fiber 80C and the 2nd optical fiber 80D Amount more than or equal to the 1st a reference value, less than 2 a reference value when, judge leakage liquid 1 amount for small amount.In the occasion, control The liquid supply action of device CONT stop liquids feed mechanism 10 continues the confession of linear motor 47,48 and Anti-vibration unit 9 Electricity.On the other hand, when the amount for the liquid 1 for judging to be detected by at least one party in the 1st optical fiber 80C and the 2nd optical fiber 80D be more than etc. When 2 a reference value, control device CONT judges the amount of the liquid 1 of leakage for more amount.In the occasion, control device CONT stops The only liquid supply action of liquid feed mechanism 10, meanwhile, stop into linear motor 47,48 and Anti-vibration unit 9 at least The power supply of one side.When optical fiber 80C, 80D detect the liquid 1 more than or equal to the amount of the 2nd a reference value, best control device CONT Stop the power supply of linear motor 47,48 or Anti-vibration unit 9, but does not stop the power supply to exposure device EX entirety.This is because When stopping to when exposure device EX bulk supplies, hereafter resume operation and stabilisation needs the long period.

In this way, the amount of the liquid 1 detected by optical fiber 80 can be corresponded to, the action of control exposure device EX can in the occasion Take adequate measures corresponding with the amount of liquid 1 of leakage.It is therefore possible to shorten resuming operation after the leakage generation of liquid 1 The required time prevents the decline of the operation ratio of exposure device EX.

In above-mentioned form of implementation, 1 optical fiber 80 of configuration around Substrate table PST and substrate base 41 is surrounded, but also may be used It is surrounded around Substrate table PST and substrate base 41 by multiple optical fiber.For example, 1 light can respectively be configured on 4 sides of substrate base 41 Fibre 80, is surrounded with total 4 optical fiber 80 around substrate base 41.In this way, 1 fiber laser arrays wherein go out the field of liquid 1 Which close, by inquiry optical fiber reaction, to can easily determine the leakage place of liquid 1.

In addition, as described above, it, cannot when the position relationship of projection optics system PL and Substrate table PST becomes exception etc. Liquid 1 is kept below projection optics system PL, leads to the problem of the leakage of liquid 1.Therefore, the leakage of liquid 1 in order to prevent, Can restricting substrate platform PST moving range.It is illustrated referring to Figure 20.

In fig. 20, it includes to be held in base that Substrate table PST, which has as the 1st region LA1 of flat site, the 1st region LA1, The substrate P surface (or vacation substrate D P) of sheet tray PH and be in the substrate P surface identical faces accessory plate 43 flat surface 43A.In addition, in the position opposite with the 1st region LA1, it is equipped with the 2nd region LA2, the 2nd region LA2 as flat site Including image planes side front end face (following) 2a of projection optics system PL and being in below the board member 2P of identical faces with 2a below this A part.Herein, liquid 1 is maintained at the 1st flat surface on Substrate table PST and between the 2nd flat surface, forms liquid immersion area AR2, the 2nd flat surface include the front end face 2a of projection optics system PL, opposite with above-mentioned 1st flat surface.Therefore, aforesaid substrate platform The 2nd region LA2 of the 1st region LA1 of PST and front end face 2a opposite with the 1st region LA1, comprising projection optics system PL is It can keep the region of liquid.Liquid 1 is held between a part and the 2nd region LA2 of the 1st region LA1, forms liquid immersion area AR2.1st region LA1 and the 2nd region LA2 have to be not necessarily flat surface, can such as keep liquid 1, then can also have song on surface Face or bumps.

In this form of implementation, the liquid 1 of liquid immersion area AR2 also touches the fore-end for being configured at projection optics system PL Optical element 2 around, the supply ozzle 14 with liquid supply port 14K and the recovery tube with liquids recovery mouth 21K A part for mouth 21.That is, the 2nd region LA2 of liquid 1 can be kept to include supply ozzle 14 and recycle the liquid contact surface of ozzle 21 Ground is constituted.

In this form of implementation, control device CONT corresponds to the position relationship of the 1st region LA1 and the 2nd region LA2, limit The movement of Substrate table PST processed.Specifically, as shown in Figure 20 (a), liquid 1 is being held in the 1st region LA1 and the 2nd area Liquid 1 can be remained to the position of such 1st region LA1 and the 2nd region LA2 shown in Figure 20 (b) by the occasion between the LA2 of domain Relationship.However, making the occasion that position relationship is moved more towards +X direction shown in Substrate table PST ratio Figure 20 (b), liquid immersion area AR2 A part reach more lateral compared with the 1st region LA1, liquid 1 cannot be remained to the 1st region LA1 and the 2nd region by generation Situation between LA2.At this point, control device CONT judge the 1st region LA1 and the 2nd region LA2 position relationship generate it is different Often, the movement of restricting substrate platform PST.Specifically, control device CONT stops the movement of Substrate table PST.In this way, liquid can be prevented The problems such as outflow of body 1.

Herein, control device CONT judges according to the measurement result of laser interferometer 46 in the 1st region LA1 and the 2nd area Whether the position relationship of domain LA2 generates exception.Control device CONT is detected the directions XY of Substrate table PST by laser interferometer 46 Position, according to the position detection as a result, finding out opposite 2nd region LA2, the 1st region LA1 location information i.e. the 1st region The position relationship of LA1 and the 2nd region LA2.The information of size about the 1st region LA1 and the 2nd region LA2 is pre-stored within control Device CONT processed.In addition, the information of the size about the liquid immersion area AR2 being formed between the 1st region LA1 and the 2nd region LA2 Such as found out in advance by testing or simulating, it is stored in control device CONT.In addition, control device CONT find out in advance about The exceptional value of the position relationship of 1st region LA1 and the 2nd region LA2 is stored in control device CONT.Herein, above-mentioned exceptional value For the value (relative distance) as the position relationship that cannot be held in liquid 1 between the 1st region LA1 and the 2nd region LA2, when the 1st When region LA1 is more than above-mentioned exceptional value with respect to the 2nd region LA2, liquid cannot be kept between the 1st region LA1 and the 2nd region LA2 1。

Control device CONT is according to the measurement result of laser interferometer 46, in positions of the 1st region LA1 with respect to the 2nd region LA2 When setting more than above-mentioned exceptional value, the movement of limitation (stopping) Substrate table PST.In this way, the problems such as outflow of liquid 1 can be prevented.

In addition, measurement results of the control device CONT according to laser interferometer 46, when the 1st region LA1 is with respect to the 2nd region When the position of LA2 is more than above-mentioned exceptional value, it can not also stop the movement of Substrate table PST, but change the mobile side of Substrate table PST To.Specifically, in fig. 20, being moved towards +X direction by Substrate table PST, when the 2nd region LA2 becomes with respect to the 1st region LA1 When the position relationship of exception, control device CONT makes Substrate table PST for example be moved towards -X direction.In this way, prevented also from liquid 1 The problems such as outflow.

In addition, control device CONT can also form such composition, that is, in the position of the 1st region LA1 and the 2nd region LA2 When relationship generates abnormal, positions of the 1st region LA1 with respect to the 2nd region LA2 more than above-mentioned exceptional value, liquid feed mechanism is limited (10) action.Specifically, control device CONT generates exception when the position relationship in the 1st region LA1 and the 2nd region LA2 When, stop the liquid supply action by liquid feed mechanism (10).In this way, the problems such as outflow of liquid 1 can be prevented.Alternatively, working as When 2nd region LA2 becomes abnormal position relationship with respect to the 1st region LA1, control device CONT reduces liquid feed mechanism (10) Liquid supply amount (liquid supply amount per unit time).Alternatively, control device CONT can also form such composition, that is, when Stop linear motor (47,48) or antihunting device (9) when the position relationship of 1st region LA1 and the 2nd region LA2 generates abnormal Power supply, or stop from the air-breathing of air entry (42A).

On the other hand, such as after the immersion exposure of substrate P, stop supplying liquid by liquid feed mechanism (10), After liquid 1 on by liquids recovery mechanism (20) recycling substrate P on (Substrate table PST), in the 1st region LA1 and the 2nd region Liquid 1 is not kept between LA2.In the occasion, control device CONT releases the mobile limitation of Substrate table PST.That is, control device The moving range of Substrate table PST is limited to that liquid 1 can be kept by CONT during liquid feed mechanism (10) supply liquid 1 The 1st range between the 1st region LA1 and the 2nd region LA2, in the phase of the supply of liquid feed mechanism (10) stop liquid 1 Between, it is limited to 2nd range wider than above-mentioned 1st range.That is, liquid 1 is held in projection optics system PL and Substrate table PST The moving range of Substrate table PST is limited to the 1st range by the occasion between (substrate P), control device CONT, not by liquid 1 The occasion being held between projection optics system PL and Substrate table PST (substrate P), the base being allowed in the 2nd range wider than the 1st range The movement of pallet PST.In this way, for example in the exposure process of substrate P, it can be in projection optics system PL and Substrate table PST (substrate P) Between persistently keep liquid 1 well, such as can successfully carry out action hereafter, i.e. Substrate table PST is moved to the dress of substrate P Carry the predetermined actions such as the action of unloading position.

Figure 21 is the figure for showing the other form of implementation of the present invention, and Figure 21 (a) is side view, and Figure 21 (b) is seen from above The plan view of Substrate table.In Figure 21 (a), around the optical element 2 of projection optics system PL, setting has liquid supply port The ozzle component 18 of 14K and liquids recovery mouth 21K.In this form of implementation, ozzle component 18 is at substrate P (Substrate table PST) Top surround the annular component being laterally arranged of optical element 2.Gap is equipped between ozzle component 18 and optical element 2, From the vibration isolation of optical element 2 come by scheduled supporting device support tube nozzle member 18.

Ozzle component 18 is set to the top of substrate P (Substrate table PST), has and the relatively configured liquid in substrate P surface Body supply mouth 14K.In this form of implementation, ozzle component 18 has 2 liquid supply port 14K.Liquid supply port 14K is set to pipe 18a below nozzle member 18.

In addition, ozzle component 18 is set to the top of substrate P (Substrate table PST), has and be arranged as opposed to the substrate P surface Liquids recovery mouth 21K.In this form of implementation, ozzle component 18 has 2 liquids recovery mouth 21K.Liquids recovery mouth 21K is set The 18a below ozzle component 18.

Liquid supply port 14K, 14K are set to everybody of the X-direction both sides for the view field AR1 for clamping projection optics system PL It sets, view field AR1s of liquids recovery mouth 21K, the 21K with respect to projection optics system PL is set to compared with liquid supply port 14K, 14K More lateral.It is longitudinal that the view field AR1 of the projection optics system PL of this form of implementation, which is set as with Y direction, X-direction is horizontal To the rectangle in plan view.

Below ozzle component 18 (towards the face of substrate P side) the generally planar faces 18a, (liquid connects below optical element 2 Contacting surface) 2a is also flat surface, 18a and 2a below optical element 2 is generally in same level below ozzle component 18.This Sample can form liquid immersion area AR2 well in wide scope.The 2nd region LA2 of liquid 1 can be kept to become below optical element 2 Region below 2a and ozzle component 18 in 18a compared with the insides recovery port 21K.

Recess portion 55 is equipped on Substrate table PST, substrate tray PH is configured at recess portion 55.Recess portion 55 in Substrate table PST with The upper surface of outer 57 become flat as being substantially the same height (same plane) with the surface for the substrate P for being held in substrate tray PH Smooth face (flat).The 1st region LA1 of liquid 1 can be kept to become 57 region comprising substrate P surface and above.

As shown in Figure 21 (b), orthogonal 2 edge parts of rectangular Substrate table PST in plan view Moving lens 45 are set in distribution.In addition, on Substrate table PST, reference feature 300 is configured to the precalculated position in the outside of substrate P.? Reference feature 300, by the setting of scheduled position relationship by substrate not shown in the figure harmonize the reference mark PFM that detects of system and The reference mark MFM that system detects is harmonized by mask.In the substrate of this form of implementation harmonizes system, for example, by using being disclosed in Japan FIA (field picture adjustment) mode as Unexamined Patent 4-65603 bulletins, the FIA modes keep Substrate table PST static, in the future From the illuminations to label such as the white light of halogen lamp, by photographing element to the label of acquisition in the scheduled camera shooting visual field Image imaged, the position of label is measured by image procossing.In addition, the label in this form of implementation harmonizes system In, it, should for example, by using VRA (the intuitive graticule adjustment) mode being disclosed in as Japanese Unexamined Patent Publication 7-176468 bulletins VRA modes light shine label, and image procossing, detection are carried out to the marked image data obtained by camera shootings such as CCD cameras Mark position.The upper surface of reference feature 300 301A substantially becomes flat surface, set on the substrate P surface that is held in Substrate table PST It is substantially the same height (same plane) with the upper surface of Substrate table PST 57.The upper surface of reference feature 300 301A can be played as focusing The effect of the reference plane of detection system 56.

In addition, substrate harmonizes the alignment mark AM that system also detects to be formed in substrate P.As shown in Figure 21 (b), Multiple exposure area S1~S24 are formed in substrate P, alignment mark AM is set corresponding to multiple exposure area S1~S24 in substrate P It sets multiple.

In addition, on Substrate table PST, precalculated position on the outside of substrate P configures e.g., as disclosed in Japanese Unexamined Patent Application 57- Uneven illumination sensor 400 as No. 117238 bulletins is used as measurement sensor.Uneven illumination sensor 400 has Rectangular upper plate 401 in plan view.The upper surface of upper plate 401 401A substantially becomes flat surface, is protected set on by Substrate table PST The upper surface of the substrate P surface held and Substrate table PST 57 is substantially the same height (same plane).It is set in the upper surface of upper plate 401 401A There is the pin hole part 470 of permeable light.It is covered above by the light-proofness material such as chromium other than the pin hole part 470 in 401A.

In addition, on Substrate table PST, precalculated position on the outside of substrate P, be arranged e.g., as disclosed in Japanese Unexamined Patent Publication 2002- Spatial image measurement sensor 500 as No. 14005 bulletins is used as measurement sensor.Spatial image measurement sensor 500 With rectangular upper plate 501 in plan view.The upper surface of upper plate 501 501A substantially become flat surface, set on be held in The upper surface of the substrate P surface of Substrate table PST and Substrate table PST 57 is substantially the same height (the same face).In the upper surface of upper plate 501 501A, which is equipped with, can pass through the slit section 570 of light.It is covered above by the screening property material such as chromium other than the slit section 570 in 501A.

In addition, on Substrate table PST, it also is provided with irradiating e.g., as disclosed in as Japanese Unexamined Patent Publication 11-16816 bulletins Quantity sensor (illuminance transducer) 600, the upper surface of upper plate 601 of the irradiation quantity sensor 600 601A are set to and are held in substrate The upper surface of the substrate P surface of platform PST or Substrate table PST 57 is substantially the same height (same plane).

In addition, in the side of Substrate table PST, water guide pipe component 89 is set with surrounding Substrate table PST.Water guide pipe component 89 The liquid 1 that recyclable (can keep) leaks out from substrate P or on Substrate table PST is set to the upper surface of Substrate table PST (flat surfaces) 57 Outside.In addition, being configured with the optical fiber 80 of the presence or absence of detectable liquid 1 in the inside of the water guide pipe component 89.When aqueduct structure The optical fiber 80 of part 89 detect liquid 1 there are when, take stop liquid in the same manner as control device CONT and above-mentioned form of implementation The adequate measures such as the liquid supply action of feed mechanism (10).

In this form of implementation, liquid immersion area AR2 is formed in substrate P certainly when being exposed to substrate P, works as measurement base When such as reference mark MFM of quasi- component 300, when measuring processing using sensor 400,500,600, also respectively in upper plate 301, liquid immersion area AR2 is formed on 401,501,601.Then, the measurement processing by liquid 1 is carried out.For example, when passing through liquid It is in the 1st region LA1, comprising reference feature 300 when reference mark MFM in 1 pair of such as reference feature 300 is measured The region of 301A is opposite with the 2nd region LA2 above, hydraulically full between a part and the 2nd region LA2 of the 1st region LA1 1.When carrying out the measurement processing by liquid 1 using uneven illumination sensor 400, in the 1st region LA1 includes upper plate 401 The upper surface of the region of 401A it is opposite with the 2nd region LA2, between a part and the 2nd region LA2 of the 1st region LA1 be full of liquid Body 1.Equally, when carrying out the measurement processing by liquid 1 using sensor 500,600, in the 1st region LA1 includes upper plate 501, the region of the upper surface of 601 501A, 601A is opposite with the 2nd region LA2, in a part and the 2nd region of the 1st region LA1 Hydraulically full 1 between LA2.

In order on Substrate table PST (on the 1st region LA1) formed liquid immersion area AR2 and by liquid feed mechanism (10) During supplying liquid 1, the moving range of Substrate table PST is restricted to the 1st range SR1 shown in Figure 21 (b) by control device CONT.? In Figure 21 (b), symbol LA2a shows that the 2nd region LA2 is configured to the most+Y in the 1st region LA1 in the range that can keep liquid 1 Position when side and the most sides-X.Herein, in Figure 21 (b), to simplify the explanation, illustrate the optical axis AX of projection optics system PL Occasion mobile (the 2nd region LA2) opposing substrate platform PST (the 1st region LA1).Equally, symbol LA2b shows that the 2nd region LA2 matches Position when setting to the sides most+Y and the most sides+X in the 1st region LA1.2nd region LA2c shows that the 2nd region LA2 is configured to the 1st area The position when sides most-Y and the most sides+X in the LA1 of domain.Symbol LA2d show the 2nd region LA2 be configured in the 1st region LA1 most- The position when sides Y and the most sides-X.

Connect the inside at each center (herein, the optical axis AX of projection optics system PL) of each 2nd region LA2a~LA2d Region is the 1st range SR1.In this way, during liquid feed mechanism (10) supply liquid 1, by by the mobile model of Substrate table PST It encloses and is limited to the 1st range SR1, so as to which liquid 1 is held between the 1st region LA1 and the 2nd region LA2 often, prevent liquid The problems such as 1 leakage.

On the other hand, during liquid feed mechanism (10) does not supply liquid 1, control device CONT is by Substrate table PST's Moving range is limited to more broader 2nd range SR2 than the 1st range SR1.Herein, the 1st range SR1 is contained in the 2nd range SR2. In this way, during the supply of liquid feed mechanism (10) stop liquid 1, by being limited to than above-mentioned 1st range SR1 wide 2 range SR2, so as to successfully carry out Substrate table PST be moved to substrate P the action of loading and unloading position etc. it is scheduled dynamic Make.

More than, each form of implementation of the present invention is specifically illustrated, but in the present invention, when by the control set on exposure device When device detects abnormal, control device controls the mechanism appropriate or device of exposure device, prevents in advance caused by leak etc. Electric leakage, leak attraction etc..Herein, the block diagram of Figure 23 is set shown in the abnormal detection position of detection, control device and by controlling The relationship by control section of device control.The control device of exposure device and the various detection devices inside exposure device Connection, these detection devices as described above for example with good grounds supply side flowmeter or recycle effluent gauge independent or its flow Difference detects abnormal supply side/recycling effluent gauge of exception (liquid communication), measures the platform position of Substrate table with monitor station The platform interferometer of malposition (thus leading to leak), detect Substrate table focus state, detection put into effect malposition (by This leads to leak) focus detection system, detect the leak for being attached to the optical fiber or prism that are located at Substrate table or base board The leakage detector 700,701 of (exception), and according to various inspections such as the abnormal water-level gauges of water level detecting yield of recycling bins Survey system.Control device can receive abnormal signal from these detection systems.At this point, the more scheduled reference signal of control device with from each Detector received signal can determine that it is for normal signal or abnormal signal.

The control device of exposure device is also manufactured with the various relevant apparatus such as liquid (pure water) outside exposure device and is filled It sets, the connections such as liquid (pure water) temperature-adjusting device, developing apparatus, base board delivery device, can receive and notify these relevant apparatus Abnormal signal.In addition, the control device of exposure device also can receive the exception in workshop of the notice provided with exposure device Signal.In addition, the exception for being provided with workshop of exposure device etc. can enumerate the exception for the toilet for being configured with exposure device, supply It is given to the exception, earthquake or the fire of capacity etc. of pure water or electric power of exposure device etc..Control device also may compare scheduled base Calibration signal and the signal received from each relevant apparatus, judgement are the signals for normal signal or exception.

The control device of exposure device can also such as above-mentioned each form of implementation explanation with controlled device, such as liquid Feed mechanism, liquids recovery mechanism, table apparatus, especially platform air bearing, platform linear motor, substrate tray absorption system, light The various component part connections such as sensors, Anti-vibration unit, the executing agencies such as electric multiplier tube (Off オ ト マ Le), it is each to can receive notice The abnormal signal of component part.In addition, in the occasion of the sensor not for detecting earthquake,

Control device also can receive abnormal signal from the seismic sensor.In addition, with the quality for measuring liquid 1 The occasion of the water quality sensor of (ratios of the impurity such as temperature, dissolved oxygen concentration, organic matter) also can receive abnormal letter from the water quality Number.

In the following, simpling illustrate the control action of control device with reference to Figure 24.Control device is from the inspection inside exposure device The relevant apparatus 1~4 for surveying the outside of system or exposure device waits receptions to show abnormal signal.Show that abnormal signal is, for example, pair The signal that the circulation of the liquid of (and then recycling) has an impact is supplied for immersion exposure.At this point, control device also may compare The signal and reference signal received judges the signal received as abnormal signal.Then, control device is true according to abnormal signal Surely abnormal position is produced.At this point, control device also can send out alarm by alarm device.Then, control device and generation are different Normal position correspondingly judges which device should be controlled, and control signal is sent to the device, is taken measures to abnormal situation.Example Such as, in the occasion for detecting liquid leakage by the leakage detector (optical fiber etc.) set on Substrate table, control device is corresponding to detection It is the platform movement carried out, by platform air axis that signal, which stops controlling to the liquid supply carried out by liquid feed mechanism, by platform respectively, It holds the air-breathing carried out with substrate tray absorption system and platform linear motor, substrate tray absorption system, sensor, Anti-vibration unit, hold The power supply of row mechanism, on the other hand, can the liquids recovery of Jin Shi liquids recoveries mechanism continue.Stop the dynamic of which device Make, is judged according to the place and its degree (size of signal) of liquid leakage by control device.According to the big of detection signal It is small, so that the electrical equipments such as platform linear motor or sensor is worked on, can only stop liquid feed mechanism action.

As described above, the liquid 1 of this form of implementation uses pure water.Pure water is largely obtained semiconductor manufacturing plant etc. is easy , meanwhile, have the advantages that not in substrate P photoresist and the generation harmful effect such as optical element (lens).In addition, pure water It is few to the harmful effect of environment, and the amount of impurity is extremely low, so, also there is the surface of cleaning base plate P and set on projection The effect on the surface of the optical element of the front end face of optical system PL.

In addition, refractive index n generally 1.44 of the pure water (water) to the exposure light EL of wavelength 193nm or so, so, make Use ArF excimer lasers (wavelength 193nm) as the occasion of the light source of exposure light EL, short wavelength turns in substrate P 1/n, i.e., about 134nm can get high-resolution.In addition, since depth of focus expands about n times compared in air, i.e., about 1.44 times, So as long as the occasion of the depth of focus in the occasion same degree for ensuring and using in air, can further increase projection The numerical aperture of optical system PL, thus also makes resolution improve.

In this form of implementation, optical element 2 is installed on to the front end of projection optics system PL, but is installed on projection optics system The optical element of the front ends PL is alternatively the optical characteristics for adjusting projection optics system PL such as the light of aberration (spherical aberration, coma) Learn plate, or the planopaallel plate for transmissive exposure light EL.In addition, the optical element contacted with liquid 1 is made to be more honest and cleaner than lens The planopaallel plate of valence, in this way, even if having in the transport of exposure device EX, assembling, adjustment etc. leads to projection optics system PL's Substance that the uniformity of transmissivity, the illumination of exposure light EL in substrate P and Illumination Distribution declines (such as silicon systems are organic Object etc.) be attached to its planopaallel plate, it is only necessary to the planopaallel plate is replaced before it will supply liquid 1, compared to liquid The optical element that body 1 contacts is the occasion of lens, has the advantages that the reduction of its replacement cost.That is, the irradiation of exposure light EL from Attachment of disperse particle or the impurity in liquid 1 etc. that photoresist generates by the surface contamination of the optical element contacted with liquid 1, It is therefore desirable to the optical element is regularly replaced, but by making the optical element be cheap planopaallel plate, thus and lens It compares, the cost for replacing component is low, and can shorten and replace the required time, can inhibit the upper of maintenance cost (operating cost) Rise and handle the decline of energy.

The liquid 1 of this form of implementation be water, but be alternatively water other than liquid, such as exposure light EL light source be F₂ The occasion of laser, due to the F₂Laser is not through water, so, transmissive F can be used as liquid 1 in the occasion₂The example of laser Such as fluorine system is oily or crosses the liquid of fluorinated polyester (PFPE) fluorine system.In addition, as liquid 1, it is possible to use deposited to exposure light EL In transmittance, the liquid that refractive index is as high as possible, opposite projection optics system PL and the photoresist coated on substrate P surface are stablized (such as cedar oil).

In above-mentioned each form of implementation, the shape of above-mentioned ozzle is not particularly limited, such as also can be about view field AR1's Long side is carried out the supply or recycling of liquid 1 by 2 pairs of ozzles.Moreover, in the occasion, liquid can be all carried out from +X direction or -X direction 1 supply and recycling, so, supply ozzle and recycling ozzle also can be vertically configured in a row.

As the substrate P of above-mentioned each form of implementation, the not only semiconductor wafer of applicable semiconductor devices manufacture, but also Also the glass substrate of applicable display device, the ceramic wafers of film magnetic head or the mask or mark used in exposure device Master (synthetic quartz, silicon wafer) of line piece etc..

In addition, in above-mentioned each form of implementation, using the exposure being locally full of by liquid between projection optics system PL and substrate P Electro-optical device, but the present invention may also apply to the immersion exposure dresses of the platform for the substrate for making to remain exposure object in liquid bath movement It sets, or forms the liquid tank of predetermined depth on platform, keeps the liquid immersion exposure apparatus of substrate wherein.Make to remain in liquid bath The construction and exposure actions of the liquid immersion exposure apparatus of the platform movement of the substrate of exposure object are for example recorded in Japanese Unexamined Patent Publication in detail Flat 6-124873 bulletins keep the liquid immersion exposure apparatus of substrate wherein in addition, forming the liquid tank of predetermined depth on platform Construction and exposure actions be for example recorded in Japanese Unexamined Patent Publication 10-303114 bulletins or United States Patent (USP) 5 in detail, 825,043, As long as this international application is specified or the decree of the country of selection is allowed, the content that these documents are recorded is cited as recording herein A part.

As exposure device EX, in addition to synchronizing moving mask M and substrate P, point for being scanned exposure to the figure of mask M The scanning exposure apparatus (step-scan exposure device) for walking scan mode outside, is equally applicable to keep mask M and substrate P static In the state of the figure of mask M be exposed together, make the projection exposure of the mobile Step-and-repeat mode of substrate P substep successively Device (stepping exposure device).In addition, the present invention may also apply to partly at least overlap 2 figures in substrate P to be turned The exposure device of the substep suture way of print.

In addition, the present invention may also apply to the exposure device of dual stage type, the exposure device of the dual stage type has 2 platforms, this 2 A platform can load respectively chip etc. by processing substrate towards XY it is directionally independent it is mobile.The construction of the exposure device of dual stage type and exposure Action e.g., as disclosed in Japanese Unexamined Patent Publication 10-163099 and Japanese Unexamined Patent Publication 10-214783 (with United States Patent (USP) 6,341, 007,6,400,441,6,549,269 and 6,590,634 correspond to), Japanese Unexamined Patent Application Publication 2000-505958 (with United States Patent (USP) 5, 969,441 correspond to) or United States Patent (USP) 6,208,407, as long as this international application is specified or the decree of the country of selection is allowed, these The content that document is recorded is cited as a part described herein.

In addition, as being disclosed in Japanese Unexamined Patent Publication 11-135400 bulletins, present invention can be suitably applied to Substrate table and The exposure device of test desk, the Substrate table keep substrate P, the test desk to have various measurement components or sensor etc..At this It closes, liquid can be kept between the upper surface of projection optics system and test desk, can implement above-mentioned water leak detectors etc. in the test desk Countermeasure.

As the type of exposure device EX, it is not limited to use the semiconductor manufacturing of semiconductor element graph exposure to substrate P Exposure device, also can widely be adapted to liquid crystal display element manufacture with or display manufacturing exposure device, for making Make the exposure device etc. of film magnetic head, photographing element (CCD) or graticule or mask etc..

Substrate table PST or mask platform MST use linear motor occasion, using air bearing air levitation and Using any all usable in Lorentz force or the magnetic suspension type of reactance force.In addition, each PST, MST can be along guiding structure Part movement type, or be not provided with ways without ways type.The example of linear motor is used in platform, it is public It opens in United States Patent (USP) 5,623,853 and 5,528,118, as long as this international application is specified or the decree of the country of selection is allowed, this The content that a little documents are recorded is cited as a part described herein.

Driving mechanism as each PST, MST, it is possible to use planar motor, the planar motor make 2 dimensions configure magnetic The magnet unit of iron is opposite with the 2 dimension ground configuration armature units of coil, by electromagnetism power drive each PST, MST.In the occasion, only Either one in magnet unit and armature unit is connected to platform PST, MST, by another party of magnet unit and armature unit Set on the mobile surface side of platform PST, MST.

Rack component machine is used by the mobile generated reaction force of Substrate table PST with being also not delivered to projection optics system PL Escape into tool floor (the earth).The processing method of the counter-force is for example disclosed in detail in 5,528,118 (Japanese Unexamined Patent Publication of United States Patent (USP) Flat 8-166475 bulletins), as long as this international application is specified or the decree of the country of selection is allowed, the content that these documents are recorded It is cited as a part described herein.

The mobile generated reaction force of Substrate table PST uses rack component mechanically with being also not delivered to projection optics system PL Escape into floor (the earth).The processing method of the counter-force is for example disclosed in detail in (the Japanese Unexamined Patent Publication 8- of United States Patent (USP) 5,874,820 No. 330224 bulletins), as long as this international application is specified or the decree of the country of selection is allowed, the content that these documents are recorded is drawn It is used as a part described herein.

The exposure device EX of the form of implementation of the application passes through with keeping scheduled mechanical precision, electric precision, optical accuracy Assembling is manufactured comprising each subsystem of each integral part cited by the application claim.In order to ensure these various essences Various optical systems before and after the assembling, are carried out the adjustment for reaching optical accuracy by degree, are used for various machinery systems The adjustment for reaching mechanical precision carries out various electrical systems the adjustment for reaching electric precision.It is filled from each subsystem to exposure The assembling procedure set includes the mutual mechanical connection of each subsystem, the wiring connection of circuit, the piping of pneumatic circuit connection etc.. This from each subsystem before the assembling procedure of exposure device, there certainly exist each subsystem respectively assembling procedure.One Each subsystem of denier terminates in the assembling procedure of exposure device, then carries out structure adjusting, it is ensured that whole as exposure device is each Kind precision.The manufacture of exposure device is preferably carried out in the toilet that temperature and cleanliness factor etc. are managed.

The micro element of semiconductor devices etc. is as shown in Figure 12, the step of the functional performance design by carrying out micro element 201, make the step 202 of mask walk based on the design, manufacture base material as device substrate step 203, by above-mentioned implementation The exposure-processed step 204 of the graph exposure of mask to substrate, device assembling step (are included cutter by the exposure device EX of form Sequence, bonding process, packaging process) 205, detection step 206 etc. manufactured.

The possibility utilized in industry

According to the present invention, the interior arrangement of the detectable exposure device being had an impact to immersion exposure or the related of outside fill The exception set, can inhibit or reduce exposure liquid leakage or immerse to the shadow of peripheral device component or exposure actions It rings, so, the good state of expensive exposure device can be maintained, the immersion exposure processing of good accuracy is carried out.In this way, can make Make the device with desired performance.

Claims (13)

1. a kind of exposure device is used up substrate irradiation exposure through liquid so that the base plate exposure, which is characterized in that have：

Projection optical system, will be as penetrating liquid projection；

Movable link supports the substrate and movement；

Liquid organization of supply, from the top of the movable link through supply opening to supplying liquid under the projection optical system；And

Liquids recovery mechanism recycles the liquid of the supply from the top of the movable link through suction port with the gases；

There is receiving to be recycled from the suction port for the liquids recovery mechanism and the case of liquid detached with gas and detection are housed in this The detector of the amount of the liquid of case.

2. exposure device as described in claim 1, wherein be connected with the stream for making liquid be flowed from the case in the lower part of the case Road；

When the case contains the liquid of given amount or more, being located at the valve start of the flow path makes the flow path open.

3. a kind of exposure device is used up substrate irradiation exposure through liquid so that the base plate exposure, which is characterized in that have：

Projection optical system, by pattern image through on the liquid projection to the substrate；

Suction port is communicated in attraction system；

Separator detaches the liquid sucked from the suction port with gas；And

Drier makes the gas dry after being detached by the separator.

4. exposure device as claimed in claim 3, wherein the gas after being dried by the drier is made to flow into the attraction system System.

5. exposure device as claimed in claim 3, wherein the suction port is arranged for withdrawal liquid.

6. exposure device as claimed in claim 3, has：

Liquid organization of supply supplies liquid between the projection optical system and the substrate；And

Liquids recovery mechanism, has suction port, recycles the liquid of the supply.

7. exposure device as claimed in claim 6, wherein the liquid organization of supply stops when detecting exception to the throwing Liquid supply under shadow optical system.

8. exposure device as claimed in claim 7, wherein this includes the different of the recycling action of the liquids recovery mechanism extremely Often.

9. exposure device as claimed in claim 6, wherein the liquids recovery mechanism has the liquid that will be recycled from the suction port The separator detached with gas and the recovery tube for being connect the separator with the attraction system；

The drier is located at the recovery tube.

10. exposure device as claimed in claim 6, wherein the liquids recovery mechanism has the liquid that will be recycled from the suction port Separator that body is detached with gas and measure the liquid detached with the separator amount flowmeter.

11. exposure device as claimed in claim 3, has movable link, which has suction port, the movable structure Part supports the substrate and movement.

12. exposure device as claimed in claim 11, wherein the substrate that is supported from the movable link and be formed in the base The liquid that the gap of accessory plate around plate flows into is recovered from the suction port.

13. a kind of device making method, including making base plate exposure using the exposure device described in any one of claim 1 to 12 Action.