CN101644900B - Exposure apparatus, method for manufacturing device - Google Patents

Exposure apparatus, method for manufacturing device Download PDF

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Publication number
CN101644900B
CN101644900B CN2008101733964A CN200810173396A CN101644900B CN 101644900 B CN101644900 B CN 101644900B CN 2008101733964 A CN2008101733964 A CN 2008101733964A CN 200810173396 A CN200810173396 A CN 200810173396A CN 101644900 B CN101644900 B CN 101644900B
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liquid
substrate
mentioned
exposure device
exposure
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CN101644900A (en
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马込伸贵
小林直行
榊原康之
高岩宏明
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Nikon Corp
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Nikon Corp
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Abstract

The invention provides an exposure apparatus, a method for manufacturing devices and a method for controlling the exposure apparatus. An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

Description

Exposure device
The application is that application number is 200480021856.1, the applying date is on July 26th, 2004, denomination of invention is divided an application for the application for a patent for invention of " exposure device, device making method, and the control method of exposure device ".
Technical field
The present invention relates to a kind ofly by projection optics, be and liquid exposure device that substrate is exposed, the device making method that uses this exposure device, and the control method of exposure device.
Background technology
Semiconductor devices or liquid crystal display device will be by being formed at graph transfer printing on mask to the so-called photoetching method manufacture on the photonasty substrate.The exposure device that this photo-mask process is used has the mask platform of supporting mask and the Substrate table of supporting substrates, Yi Bian mobile mask platform and Substrate table successively, Yi Bian be to substrate by the graph transfer printing of mask by projection optics.In recent years, in order to tackle the further highly integrated of component graphics, wish to obtain the higher exploring degree of projection optics system.When the numerical aperture that the exposure wavelength used is shorter, projection optics is was larger, the exploring degree of projection optics system was higher.For this reason, the exposure wavelength that exposure device is used shortens year by year, and the numerical aperture of projection optics system also increases.The exposure wavelength of main flow is the 248nm of KrF excimer laser now, but more the 193nm of short wavelength's ArF excimer laser is also just obtaining practical.In addition, when exposing, same with the exploring degree, depth of focus (DOF) also becomes important.Exploring degree R and depth of focus δ mean with following formula respectively.
R＝k 1·λ/NA …(1)
δ＝±k 2·λ/NA 2 …(2)
Wherein, λ is exposure wavelength, and NA is the numerical aperture of projection optics system, k 1, k 2For the process coefficient.As can be known from (1) formula, (2) formula, when in order to carry high-resolution R, reducing exposure wavelength lambda, while increasing numerical aperture NA, depth of focus δ narrows down.
When depth of focus δ becomes narrow, be difficult to make substrate surface consistent with the image planes of projection optics system, the danger of the surplus deficiency while having exposure actions.Therefore, as the method that reduces in fact exposure wavelength and expansion depth of focus, for example propose to have to be disclosed in the immersion method that the world discloses No. 99/49504 communique.The liquid such as this immersion method water or organic solvent are full of between the following and substrate surface of projection optics system, formation immersion zone, the wavelength that utilizes the exposure light in liquid is that (n is the refractive index of liquid to airborne 1/n, be generally 1.2～1.6 left and right) this point, carry high-resolution, simultaneously, depth of focus is expanded as to about n doubly.
, in liquid immersion exposure apparatus, as leak of liquid or the immersion of exposure use, exist by this liquid and cause the fault of bulking block, the possibility of the problem such as leak electricity or get rusty.In addition, can not carry out well exposure-processed.
Summary of the invention
The present invention makes in view of such situation, and its purpose is to provide a kind of exposure device, device making method, and the control method of exposure device that also can carry out well exposure-processed in the occasion of using immersion method.In addition, can provide the use that can reduce to expose liquid leakage or immerse the impact produced, the exposure device that carries out well exposure-processed, device making method, and the control method of exposure device.
In order to address the above problem, the following formation that employing of the present invention is corresponding with Fig. 1～Figure 22 shown in form of implementation.But the symbol with parantheses that each several part adopts, only for this part of illustration, does not limit each several part.
The exposure device of the 1st form of the present invention (EX) shines substrate (P) by liquid (1) by exposure light (EL), and substrate (P) is exposed; Wherein: have projection optics system (PL) and liquid supply mechanism (10);
This projection optics system (PL) looks like figure to project on substrate (P);
This liquid supply mechanism (10) supplies to liquid (1) between projection optics system (PL) and substrate (P);
The supply of liquid supply mechanism (10) stop liquid (1) when abnormal or fault being detected.
According to the present invention, when detecting when abnormal, stop the liquid supply being undertaken by liquid supply mechanism, so, can prevent the leakage of liquid or the expansion of immersion or its loss.Therefore, can prevent the peripheral device member that liquid causes fault, get rusty or the generation of the problem of the change of substrate environment of living in, or reduce the impact of such problem.
The exposure device of the 2nd form of the present invention (EX) shines substrate (P) by liquid (1) by exposure light (EL), and substrate (P) is exposed; Wherein have:
By liquid (1) by figure look like to project on substrate (P) projection optics system (PL) and
Electrical equipment (47,48);
In order to prevent the electric leakage caused of adhering to of liquid (1), when detecting when abnormal, stop powering to electrical equipment (47,48).
According to the present invention, detect when abnormal, stop, to the electrical equipment power supply, preventing the electric leakage that adhering to of liquid causes, so, can prevent from leaking electricity on the generation of the problems such as fault of the impact of peripheral device and electrical equipment self, or reduce the loss caused thus.
The exposure device of the 3rd form of the present invention (EX) shines substrate (P) by liquid (1) by exposure light (EL), and substrate (P) is exposed; Wherein have:
By liquid (1) by figure look like to project on substrate (P) projection optics system (PL) and
Be passed to the air entry (42A, 66) that attracts system (25);
In order to prevent the inflow of liquid (1), when detecting when abnormal, stop air-breathing from air entry (42A, 66).
Exposure device is such as having for relative the spigot surface air entry of the air bearing of supporting station device (gas bearing) and the various air entries such as air entry that absorption keeps the holding device of mask and substrate non-contactly, but, when liquid flow into these air entries, cause with the vacuum pump equal vacuum of these air entry circulations to be the fault of (attracting system).According to the present invention, when detecting when abnormal, stop from air entry air-breathing, so, can prevent that liquid from flowing into the problem of vacuum system by air entry.In the 1st～3rd form of the present invention, " detect abnormal " and mean that detecting the base plate exposure by liquid is that immersion exposure produces dysgenic situation, not only inclusion test to relevant to the circulation of liquid extremely, and abnormal etc. to the action about keeping the platform that substrate moves of inclusion test, in addition, also inclusion test to the relevant apparatus that is connected with exposure device extremely.For example, also inclusion test is to the occasion of the abnormal signal (alarm) in the liquid manufacturing installation as relevant apparatus, and this liquid manufacturing installation manufacture supplies to the liquid of exposure device.
The exposure device of the 4th form of the present invention (EX) shines substrate (P) by liquid (1) by exposure light (EL), and substrate (P) is exposed; Wherein: have
By liquid (1), figure is looked like to project to the projection optics system (PL) on substrate (P),
Be passed to the air entry (21,61,66) that attracts system (25,70,74),
Separation, from attracting mouthful liquid (1) of (21,61,66) suction and the separation vessel (22,71,75) of gas, reaches
Make the exsiccator (23,72,76) of the gas drying of being separated by separation vessel (22,71,75).
For example when the liquid from liquids recovery mechanism attracted mouthful (reclaiming mouth) to use vacuum system to attract liquid, as the liquid component reclaimed, flowing into vacuum was (attracting system), causes the fault of this vacuum system etc.According to the present invention, to from attracting mouthful liquids and gases that suck to carry out gas-liquid separation, then with exsiccator, the gas separated by separation vessel is carried out to drying, thereby can prevent that liquid component (comprising wet gas) from flowing into the problem of vacuum system with separation vessel.Therefore, can prevent the generation of the problems such as fault of vacuum system (attracting system), simultaneously, maintain well the liquids recovery action of being undertaken by liquids recovery mechanism between can be for a long time, the recovery action that can prevent liquids recovery mechanism can not be carried out and the leakage of the liquid that causes.
The exposure device of the 5th form of the present invention (EX) shines substrate (P) by liquid (1) by exposure light (EL), and substrate (P) is exposed; Wherein: have Substrate table (PST), projection optics system (PL), reach control device (CONT);
This Substrate table (PST) can keep substrate (P) mobile, has the 1st zone (LA1) thereon;
This projection optics system (PL) looks like to project to substrate (P) by figure, has the 2nd zone (LA2), the 2nd zone (LA2) comprises image planes side fore-end (2a), relative with the 1st zone (LA1), and at least a portion in the 1st zone (LA1) between keep liquid (1);
This control device (CONT) is corresponding to the position relationship of the 1st zone (LA1) with the 2nd zone (LA2), the movement of restricting substrate platform (PST).
According to the present invention, in the occasion that liquid is held in to the formation between the 1st zone and the 2nd zone, for example do not become between the 1st zone and the 2nd zone and keep the movement of the position relationship ground restricting substrate platform of liquid, thereby can prevent the problems such as leakage of liquid.
The exposure device of the 6th form of the present invention (EX) shines substrate (P) by liquid (1) by exposure light (EL), and substrate (P) is exposed; Wherein: have projection optics system (PL), Substrate table (PST), substructure member (41), the 1st detecting device (80C), the 2nd detecting device (80D), reach control device (CONT);
This projection optics system (PL) looks like figure to project on substrate (P) by liquid (1);
This Substrate table (PST) can keep substrate (P) mobile;
This substructure member (41) is supporting substrates platform (PST) movably;
The 1st detecting device (80C) is located at Substrate table (PST), tracer liquid (1);
The 2nd detecting device (80D) is located at substructure member (41), tracer liquid (1);
This control device (CONT), corresponding to the testing result of the 1st detecting device (80C) and the 2nd detecting device (80D), is controlled the action of exposure device.
According to the present invention, corresponding to the testing result of the 1st detecting device that mutually is arranged at diverse location and the 2nd detecting device, control the action of exposure device, so, can take and the corresponding adequate measures of the range of scatter of the liquid leaked or countermeasure.Therefore, the required time that resumes operation after leak of liquid occurs can be shortened, the decline of the operation ratio of exposure device can be prevented.For example, when the 1st detecting device of being located at Substrate table detects existing of liquid, the range of scatter of the liquid that control device judgement is leaked be narrower scope, such as the supply that stops the liquid being undertaken by liquid supply mechanism etc., carries out and disposal that this scope is accordingly suitable.Like this, the required time that resumes operation can be suppressed to Min..On the other hand, when the 2nd detecting device of being located at substructure member detected existing of liquid, the range of scatter of the liquid that judgement is leaked was wider zone, and control device stops the power supply such as the electrical equipments such as drive unit that Substrate table is driven.Like this, even the liquid leaked is diffused into wider scope, also can prevent the infringements such as the electric leakage of electrical equipment and fault.
The exposure device of the 7th form of the present invention (EX) shines substrate (P) by liquid (1) by exposure light (EL), and substrate (P) is exposed; Wherein: have projection optics system (PL), liquid supply mechanism (10), Substrate table (PST), reach control device (CONT);
This projection optics system (PL) looks like to project to figure on substrate;
This liquid supply mechanism (10) supplies to liquid (1) between projection optics system (PL) and substrate (P);
This Substrate table (PST) can keep substrate (P) mobile;
This control device (CONT) is during liquid supply mechanism (10) feed fluid (1), the moving range of Substrate table (PST) is limited to the 1st scope (SR1), during the supply of liquid supply mechanism (10) stop liquid (1), the moving range of Substrate table (PST) is restricted to 2nd scope (SR2) wider than the 1st scope (SR1).
According to the present invention, during liquid supply mechanism feed fluid, the moving range of Substrate table for example is limited to and liquid can be held in to the 1st scope on Substrate table, thereby can prevent the problems such as leakage of liquid.On the other hand, during the supply of liquid supply mechanism stop liquid, be made as the 2nd scope than the 1st wide ranges by the moving range by Substrate table, thereby can successfully carry out Substrate table is moved to the relevant predetermined action of Substrate table such as substrate exchange position.
The exposure device of the 8th form of the present invention shines substrate by liquid by exposure light, and substrate is exposed; Wherein: have projection optics system (PL), liquid supply mechanism (10), Substrate table (PST), reach control device (CONT);
This projection optics system (PL) looks like to project to figure on substrate;
This liquid supply mechanism (10) is by the image planes side of liquid supply to projection optics system;
This Substrate table (PST) can be in the image planes side shifting of projection optics system;
The moving range of this control device (CONT) control desk;
The moving range of the platform when this control device will maintain liquid between projection optics system and platform is restricted to the narrow scope of moving range of the platform when not maintaining liquid between projection optics system and platform.
According to the 8th form of the present invention, for example, in the exposure process of the substrate on platform, between projection optics system and platform, keep well liquid sustainably, between projection optics system and platform, not keeping the occasion of liquid, can successfully carry out other actions such as substrate exchange.
The 9th form of the present invention, provide a kind of device making method, and this device making method is characterised in that, uses the exposure device (EX) of above-mentioned form.According to the present invention, when detecting when abnormal, the driving of the device that stops being scheduled to, so, can prevent the generation of the problems such as fault of locking apparatus, can under good device context, carry out the device manufacture.
The present invention's the 10th form, provide a kind of control method of exposure device, and this exposure device shines exposure light on substrate substrate is exposed by liquid; This exposure device by comprise projection optics system (PL), liquid supply mechanism (10), electrical equipment (47,48), and the inscape of equipment (42, PH) form, and be connected with outside relevant apparatus; This projection optics system (PL) looks like to project to figure on substrate; This liquid supply mechanism (10) supplies to liquid (1) the image planes side of projection optics system; This equipment (47,48) is usingd electric energy as driving force; This equipment (42, PH) has the function that attracts gas; Wherein: comprise such step, that is,
By the image planes side of liquid supply to projection optics system;
Reception is notified abnormal signal from least one of above-mentioned inscape and outside relevant apparatus;
According to above-mentioned signal, confined liquid feed mechanism (10), take electric energy as the equipment (47,48) of driving force and have at least a action of the equipment (42, PH) of the function that attracts gas.
Control method according to exposure device of the present invention, in exposure device inside or the relevant apparatus of exposure device outside produce abnormal, in the occasion of notifying this such abnormal signal extremely exerted an influence for the exposure to substrate etc., confined liquid feed mechanism (10), take electric energy as the equipment (47,48) of driving force and have at least a action of the equipment (42, PH) of the function that attracts gas, thereby can prevent leak of liquid, the attraction of the liquid that produced by its electric leakage caused, suction device etc.
The accompanying drawing explanation
Fig. 1 is the signal pie graph that the 1st form of implementation of exposure device of the present invention is shown.
Fig. 2 is the skeleton view that Substrate table is shown.
Fig. 3 be illustrate near the fore-end of projection optics system, liquid supply mechanism, and the signal pie graph of liquids recovery mechanism.
Fig. 4 is the planimetric map that the position relationship of the view field of projection optics system and liquid supply mechanism and liquids recovery mechanism is shown.
Fig. 5 is for being located at the schematic cross-section of the retracting device of Substrate table for explanation.
Fig. 6 is the schematic diagram of the detecting device with optical fiber of the 2nd form of implementation be used to exposure device of the present invention is described.
Fig. 7 is the schematic diagram of the detecting device with optical fiber of the 2nd form of implementation be used to exposure device of the present invention is described.
Fig. 8 is the outboard profile that the configuration example of the detecting device with optical fiber is shown.
Fig. 9 is the planimetric map of Fig. 8.
Figure 10 is the routine outboard profile of another configuration that the detecting device with optical fiber is shown.
Figure 11 is the planimetric map that another embodiment of the detecting device with optical fiber is shown.
Figure 12 is the routine skeleton view of another configuration that the detecting device with optical fiber is shown.
Figure 13 is the schematic diagram that another embodiment of the detecting device with optical fiber is shown.
Figure 14 is the schematic diagram of the detecting device with prism of the 3rd form of implementation be used to exposure device of the present invention is described.
Figure 15 is the schematic diagram of the detecting device with prism of the 3rd form of implementation be used to exposure device of the present invention is described.
Figure 16 is the planimetric map that the configuration example of the detecting device with prism is shown.
Figure 17 is the figure that another example of the detecting device with prism is shown.
Figure 18 is the routine signal pie graph of another configuration that the detecting device with prism is shown.
(a) of Figure 19 and (b) for the figure of another embodiment of the detecting device with optical fiber is shown.
(a) of Figure 20 and (b) for be used to the figure of another embodiment of the present invention is described.
(a) of Figure 21 and (b) for be used to the figure of another embodiment of the present invention is described.
Figure 22 is the process flow diagram of an example that the manufacturing process of semiconductor devices is shown.
Figure 23 is the block diagram that the annexation of all devices of the relevant apparatus of the exposure device outside of being controlled by control device according to the detection signal from the various detecting devices of exposure device of the present invention and exposure device inside and control device is shown.
Figure 24 is the process flow diagram of Control the content that the control device of exposure device of the present invention is shown.
Embodiment
The form of implementation of exposure device of the present invention is described with reference to the accompanying drawings, but the invention is not restricted to this.
Fig. 1 is the signal pie graph that the 1st form of implementation of exposure device of the present invention is shown.In Fig. 1, exposure device EX has the mask platform MST that mask M is supported, the Substrate table PST that substrate P is supported, with exposure light EL illumination, be supported on the illumination optical system IL of the mask M of mask platform MST, to to the projection optics of the substrate P by Substrate table PST supporting, be PL by the figure example projection exposure of the mask M of exposure light EL illumination, and the control device CONT of the action of unified control exposure device EX integral body.At control device CONT, connect the alarm device K given the alarm when about the exposure-processed abnormal.In addition, to have mask platform MST and projection optics be the principal post 3 that PL supports to exposure device EX.Principal post 3 is set to the bedplate 4 flatly loaded in floor.At principal post 3, form inwards outstanding upside step part 3A and downside step part 3B.Control device is such as shown in figure 23, is connected with the relevant apparatus of the outside of the various inscapes that form exposure device and exposure device, and the Control the content of control device illustrates in the back.
In order to shorten in fact exposure wavelength, carry high-resolution, simultaneously, increasing depth of focus in fact, the exposure device EX of this form of implementation is the liquid immersion exposure apparatus of applicable immersion method, has the liquids recovery mechanism 20 that liquid 1 is supplied to the liquid supply mechanism 10 on substrate P and reclaims the liquid 1 on substrate P.Exposure device EX to major general's mask M, be transferred on substrate P during, by the liquid 1 of supplying with from liquid supply mechanism 10, forms the regional AR2 of immersion in the part comprised on the substrate P of the AR1 of view field that projection optics is PL.Specifically, the projection optics of exposure device EX is to be full of liquid 1 between the surface of the optical element 2 of fore-end (terminal part) of PL and substrate P, by this projection optics, be that liquid 1 and projection optics between PL and substrate P is PL, the figure of mask M is looked like to project on substrate P, thereby this substrate P is exposed.
In this form of implementation, using and use scanning exposure apparatus (so-called step-scan exposure device) to describe as example as the occasion of exposure device EX, this scanning exposure apparatus make mask M and substrate P towards with direction of scanning on mutual different direction (reverse direction) synchronizing movings, simultaneously, will be formed at the graph exposure of mask M to substrate P.In the following description, if be that the consistent direction of the optical axis AX of PL is Z-direction with projection optics, the synchronizing moving direction (direction of scanning) of mask M and substrate P is X-direction in the plane vertical with Z axis, and the direction (non-direction of scanning) vertical with X-direction with Z-direction is Y direction.In addition, establish around X-axis, Y-axis, and revolution (inclination) direction of Z axis be respectively θ X, θ Y, θ Z direction.Here said " substrate " is included on semiconductor wafer and applies the plate that the photoresist as photosensitive material obtains, and " mask " comprises and be formed with the graticule of wanting the component graphics of reduced projection on substrate.
Illumination optical system IL is by pillar 5 supportings on the top of being fixed in principal post 3.Illumination optical system IL throws light on to the mask M that is supported on mask platform MST with exposure light EL, have exposure light source, make from the uniform-illumination of the light beam of exposure light source outgoing optical integrator, to the exposure light EL from optical integrator carry out optically focused collector lens, relay lens system, and the field of illumination of exposure light EL on mask M is set as to the variable field-of-view diaphragm etc. of slit-shaped.Predetermined field of illumination on mask M is by the exposure light EL illumination of IL by uniform Illumination Distribution.As the exposure light EL from illumination optical system IL outgoing, such as using extreme ultraviolet light (DUV light), ArF excimer laser (wavelength 193nm) and the F such as bright line (g line, h line, i line) from the ultraviolet region of mercury vapor lamp outgoing and KrF excimer laser (wavelength 248nm) 2Laser (157nm) equal vacuum ultraviolet light (VUV light) etc.In this form of implementation, use the ArF excimer laser.
In this form of implementation, use pure water as liquid 1.Pure water not only can be seen through by the ArF excimer laser, and can be seen through by extreme ultraviolet lights (DUV light) such as the bright line (g line, h line, i line) of the ultraviolet region such as from the mercury vapor lamp outgoing and KrF excimer lasers (wavelength 248nm).
Mask platform MST is for supporting mask M, and part has the opening portion 34A that the figure that makes mask M looks like to pass through in the central.Upside step part 3A at principal post 3 supports mask base plates 31 by vibrationproof unit 6.At the middle body of mask base plate 31, also form the opening portion 34B that the figure that makes mask M looks like to pass through.A plurality of gas bearing as non-contact bearing (air bearing) 32 are set below mask platform MST.Mask platform MST is supported on top (spigot surface) 31A of mask base plate 31 non-contactly by gas bearing 32, by mask platform driving mechanisms such as linear motors, can make it with to carry out 2 dimensions in projection optics is the Nei JiXY plane, plane that the optical axis AX of PL is vertical mobile and carry out small revolution towards θ Z direction.On mask platform MST, arranging to be the moving lens 35 that PL moves relative to projection optics with mask platform MST together.In addition, in the position relative with moving lens 35, laser interferometer 36 is set.The position of the 2 dimension directions of the mask M on mask platform MST and the angle of revolution (some occasion also comprises the angle of revolution of θ X, θ Y-direction) of θ Z direction are measured in real time by laser interferometer 36, and measurement result outputs to control device CONT.Control device CONT drives the mask platform driving mechanism according to the testing result of laser interferometer 36, thereby controls the position of the mask M that is supported on mask platform MST.
Projection optics is that PL arrives substrate P for the projection multiplying power β by predetermined by the graphic projection of mask M, a plurality of optical elements (lens) by the optical element that comprises the fore-end of being located at the substrate P side (lens) 2 form, and these optical elements are supported by lens barrel PK.In this form of implementation, projection optics is that PL is that projection multiplying power β is for example 1/4 or 1/5 dwindles and be.Projection optics is that PL also can be etc. and to be doubly or to amplify system.Outer peripheral portion at lens barrel PK is provided with flange portion FLG.In addition, the downside step part 3B at principal post 3 supports lens barrel fixed heads 8 by vibrationproof unit 7.By by projection optics, being that the flange portion FLG of PL is engaged in lens barrel fixed head 8, thereby be that PL is supported on lens barrel fixed head 8 by projection optics.
The projection optics of this form of implementation be PL fore-end optical element 2 relatively lens barrel PK mounting or dismounting arrange (exchange).The liquid 1 of immersion zone AR2 is contacted with optical element 2.Optical element 2 use fluorites form.The compatibility of fluorite and water is high, so, can make liquid 1 close contact in whole of the cardinal principle of the liquid contact surface 2a of optical element 2.Namely, in this form of implementation, the liquid (water) 1 that supply is high with the compatibility of the liquid contact surface 2a of optical element 2, so, the liquid contact surface 2a of optical element 2 and the close contact of liquid 1 are high, and available liquid 1 positively is full of the light path between optical element 2 and substrate P.Optical element 2 also can be the quartz high with the compatibility of water.In addition, also can to the liquid contact surface 2a of optical element 2, implement hydrophiling (lyophily) and process, further improve the compatibility with liquid 1.
Surround optical element 2 ground board member 2P is set.The face relative with substrate P of board member 2P (namely) is tabular surface.Following (liquid contact surface) 2a of optical element 2 also becomes tabular surface, the following same level that substantially is in of the following and optical element 2 of board member 2P.Like this, can form well immersion zone AR2 at wide region.In addition, below board member 2P below, with optical element 2, similarly implement surface treatment (lyophily processing).
Substrate table (movable link) PST arranges movably by the adsorbable substrate P that keeping of substrate tray (substrate holding structure) PH, is provided as in its lower section the gas bearing (air bearing) 42 of a plurality of non-contact bearings.On bedplate 4 by vibrationproof unit 9 supporting substrates base plates 41.Air bearing 42 has blow-off outlet 42B and air entry 42A, top (spigot surface) the 41A blow gas (air) of the relative substrate base 41 of this blow-off outlet 42B, gas below this air entry 42A attraction Substrate table PST between (bearing surface) and spigot surface 41A, by the bounce that blows out generation of the gas from blow-off outlet 42B and the attraction equilibrium of forces produced by air entry 42A, below Substrate table PST and between spigot surface 41A, keep certain gap.Namely, Substrate table PST carries out the noncontact supporting by top (spigot surface) 41A of air bearing 42 relative substrate base (substructure member) 41, by Substrate table driving mechanisms such as linear motors, can be with to carry out 2 dimensions in projection optics is the Nei JiXY plane, plane that the optical axis AX of PL is vertical mobile and carry out small revolution towards θ Z direction.In addition, substrate tray PH Z-direction, θ directions X, and the θ Y-direction also arrange movably.The Substrate table driving mechanism is controlled by control device CONT.That is, substrate tray PH controls focal position (Z position) and the pitch angle of substrate P, and the surface that makes substrate P by automatic focusing mode and automatic leveling mode and projection optics are that the image planes of PL are consistent, carry out the location of X-direction and the Y direction of substrate P.
Upper at Substrate table PST (substrate tray PH), setting can be the moving lens 45 that PL moves relative to projection optics with Substrate table PST together.In addition, in the position relative with moving lens 45, laser interferometer 46 is set.Position and the angle of revolution of 2 dimension directions of the substrate P on Substrate table PST are measured in real time by laser interferometer 46, and measurement result is output to control device CONT.Control device CONT, according to the measurement result of laser interferometer 46, drives and comprises the Substrate table driving mechanism of linear motor machine, thereby be supported on the location of the substrate P of Substrate table PST.
In addition, on Substrate table PST (substrate tray PH), accessory plate 43 (with reference to Fig. 2) is set with surrounding substrate P.Accessory plate 43 has the plane of the height identical with the surface cardinal principle of the substrate P that is held in substrate tray PH.The occasion of exposing at the fringe region to substrate P, also can by accessory plate 43 by liquid 1 be held in projection optics be PL below.
In addition, the arranged outside of the accessory plate in substrate tray PH 43 is for the recovery mouth of the retracting device 60 of the liquid 1 that reclaims the outside flow out to substrate P (attract mouthful) 61.Reclaiming mouth 61 is the slot part that surrounds the ring-type of accessory plate 43 formation, the liquid absorption member 62 that section's configuration within it consists of spongy member or porous plastid etc.
Fig. 2 is the perspective illustration that Substrate table PST is shown and drives the Substrate table driving mechanism of this Substrate table PST.In Fig. 2, Substrate table PST can be supported towards X-direction by X guide table 44 with moving freely.Substrate table PST can, by 44 guiding of X guide table, simultaneously, be moved by predetermined stroke towards X-direction by x-ray motor 47.But x-ray motor 47 has the stator 47A extend arranged along X-direction in X guide table 44 and the mover 47B that arranges, is fixed in Substrate table PST corresponding to this stator 47A.But mover 47B relative stator 47A drives, thereby Substrate table PST is moved towards X-direction.Here, Substrate table PST supports non-contactly by the magnetic guiding mechanism, and this magnetic guiding mechanism consists of relative X guide table 44 maintains the gap of scheduled volume towards Z-direction magnet and executive component.Substrate table PST is supported on X guide table 44 by noncontact state is moved towards X-direction by x-ray motor 47.
At the length direction two ends of X guide table 44, be provided with 1 pair of Y linear motor 48, this Y linear motor 48 can make this X guide table 44 towards Y direction, move together with Substrate table PST.But but Y linear motor 48 has respectively the mover 48B at the length direction two ends of being located at X guide table 44 and the stator 48A arranged corresponding to this mover 48B.But 48A drives by mover 48B relative stator, thereby X guide table 44 is moved together with Substrate table PST towards Y direction.In addition, by adjusting respectively the driving of Y linear motor 48, thereby can make X guide table 44 also mobile towards the revolution of θ Z direction.Therefore, can Substrate table PST and X guide table 44 be moved substantially integratedly towards Y direction and θ Z direction by this Y linear motor 48.
X-direction both sides in substrate base 41, be respectively equipped with targeting part 49, and targeting part 49 forms L word shape in front view, and the movement towards Y direction guides to X guide table 44.Targeting part 49 is supported on bedplate 4 (Fig. 1).In this form of implementation, at the flat 49B of targeting part 49, be provided with the stator 48A of Y linear motor 48.What on the other hand, the length direction both ends below X guide table 44 were provided with respectively spill is directed to member 50.Targeting part 49 engages with being directed to member 50, and top (spigot surface) 49A of targeting part 49 relatively arranges with the inner face that is directed to member 50.At the spigot surface 49A of targeting part 49, be provided with the gas bearing (air bearing) 51 as non-contact bearing, the relative spigot surface 49A of X guide table 44 is supported non-contactly.
In addition, between the flat 49B of the stator 48A of Y linear motor 48 and targeting part 49, be provided as the gas bearing (air bearing) 52 of non-contact bearing, stator 48A is supported non-contactly by the flat 49B of air bearing 52 relative targeting parts 49.For this reason, according to the law of conservation of momentum, corresponding to X guide table 44 and Substrate table PST+(Y) movement of direction, stator 48A court-Y-direction (+Y-direction) is mobile for Y-direction.Movement by this stator 48A is cancelled the counter-force of the movement of X guide table 44 and Substrate table PST, simultaneously, can prevent the variation of centre of gravity place.That is, stator 48A has the function as so-called balance mass.
Fig. 3 be illustrate liquid supply mechanism 10, liquids recovery mechanism 20, and projection optics be PL fore-end enlarged drawing nearby.Liquid supply mechanism 10 is between PL and substrate P for liquid 1 being supplied to projection optics, has the liquid supply part 11 that can send liquid 1 and is connected to liquid supply part 11, will supplies to from the liquid 1 that this liquid supply part 11 is sent the supply ozzle 14 on substrate P by supply pipe 15.Supply with the surface configuration of ozzle 14 near substrate P.Liquid supply part 11 has the case of accommodating liquid 1 and force (forcing) pump etc., by supply pipe 15 with supply with ozzle 14 liquid 1 is supplied on substrate P.The liquid supply action of liquid supply part 11 is controlled by control device CONT, and control device CONT can control by the liquid supply amount of liquid supply part 11 for the time per unit on substrate P.
In the way of supply pipe 15, be provided with the flowmeter 12 that the amount (the liquid supply amount of time per unit) that supplies to the liquid 1 on substrate P from liquid supply part 11 is measured.Flowmeter 12 often monitors the amount that supplies to the liquid 1 on substrate P, its measurement result is outputed to control device CONT.In addition, the flowmeter 12 in supply pipe 15 and supplying with between ozzle 14, be provided with the valve 13 that the stream to supply pipe 15 opens and closes.The on-off action of valve 13 is controlled by control device CONT.The valve 13 of this form of implementation, in the occasion such as wait the drive source (power supply) that makes exposure device EX (control device CONT) to stop by power failure, becomes the mechanically normally closed mode of the stream of inaccessible supply pipe 15.
Liquids recovery mechanism 20, for reclaiming the liquid 1 on the substrate P of being supplied with by liquid supply mechanism 10, has the recovery ozzle (attracting mouth) 21 near the surface configuration of substrate P and by recovery tube 24, is connected in the vacuum system (attracting system) 25 that reclaims ozzle 21.Vacuum is 25 to comprise vacuum pump, and its action is controlled by control device CONT.By vacuum, be 25 drivings, the liquid 1 on substrate P reclaims by reclaiming ozzle 21 together with its gas (air) on every side.As vacuum, be 25, also can at exposure device, vacuum pump be set, but use the vacuum system in the workshop of configuration exposure device EX.
In the way of recovery tube 24, be provided with and separate from the liquid 1 of recovery ozzle 21 suctions and the gas-liquid separator 22 of gas.As described above, together with liquid on substrate P, reclaim the gas around it from reclaiming ozzle 21 here.Gas-liquid separator 22 separates liquid 1 and the gas reclaimed from reclaiming ozzle 21.As gas-liquid separator 22, such as device of the device that can adopt the gravity separation mode or centrifuging mode etc.; The device of this gravity separation mode falls liquid by Action of Gravity Field by above-mentioned hole section, thus separating liquid and gas; The liquids and gases that the device of this centrifuging mode is used centrifugal force separate to reclaim.Vacuum is the gas that 25 attractions are separated by gas-liquid separator 22.
Vacuum in recovery tube 24 be 25 and gas-liquid separator 22 between, be provided with the exsiccator 23 that makes the gas drying of being separated by gas-liquid separator 22.Even be mixed with liquid component in the gas separated by gas-liquid separator 22, by by exsiccator 23, making the gas drying, make this drying gas to flow into vacuum be 25, thereby can prevent that liquid component from flowing into the generation that the vacuum caused is 25 problems such as fault.As exsiccator 23, can adopt the device of the such mode of refrigeratory or the device of the such mode of well heater for example, the device of the mode that this refrigeratory is such will be by being cooled to the dew point of this liquid from the gas (being mixed with the gas of liquid component) that gas-liquid separator 22 is supplied with or below it, thereby liquid component is removed, the device of the mode that this well heater is such by being heated to this liquid boiling point or more than it, thereby liquid component is removed.
On the other hand, the liquid 1 separated by gas-liquid separator 22 is recovered to liquids recovery part 28 by the 2nd recovery tube 26.Liquids recovery part 28 has case that the liquid 1 reclaimed is accommodated etc.The liquid 1 that is recovered to liquids recovery part 28 is for example discarded, or after cleaning, turns back to liquid supply part 11 etc. and recycle.In addition, in the way of the 2nd recovery tube 26, between gas-liquid separator 22 and liquids recovery part 28, be provided with the flowmeter 27 that the amount (the liquids recovery amount of time per unit) of the liquid 1 that reclaims is measured.Flowmeter 27 often monitors from the amount of the liquid 1 of substrate P recovery, its measurement result is outputed to control device CONT.As described above, liquid 1 on substrate P and the gas around it reclaim from reclaiming ozzle 21 and reclaim, but, at gas-liquid separator 22 separating liquid 1 and gases, only liquid component are delivered to flowmeter 27, like this, flowmeter 27 can correctly be measured from the amount of the liquid 1 of substrate P recovery.
In addition, to detect be 56 in the focusing (focus) of exposure device EX with the position on the surface of detecting the substrate P be supported on Substrate table PST.Focus detection is 56 to have will detect to project the light projector part 56A on substrate P and accept with light beam from oblique upper by liquid 1 and with the catoptrical light accepting part of light beam, divide 56B by the above-mentioned detection of substrate P reflection.Focus detection is that the light result that is subjected to of 56 (light accepting part divides 56B) outputs to control device CONT.The testing result that control device CONT is 56 according to focus detection can detect the positional information of the Z-direction on substrate P surface.In addition, by from light projector part 56A, throwing a plurality of detection light beams, thereby can detect the θ X of substrate P and the inclination information of θ Y-direction.
Be not limited to substrate P, focus detection is 56 also can detect and be configured to the surface position information of object that projection optics is the image planes side of PL.In addition, focus detection is 56 by the surface position information of liquid 1 inspected object (substrate P), but in the outside of immersion zone AR2, also can adopt not by the focus detection system of the surface position information of liquid 1 ground inspected object (substrate P).
As shown in a part of sectional view of Fig. 1, liquid supply mechanism 10 lens barrel fixed head 8 relative to liquids recovery mechanism 20 is supported discretely.Like this, it is PL that the vibration produced by liquid supply mechanism 10 and liquids recovery mechanism 20 can not be delivered to projection optics by lens barrel fixed head 8.
Fig. 4 illustrates the planimetric map of position relationship that liquid supply mechanism 10 and liquids recovery mechanism 20 and projection optics are the AR1 of view field of PL.Projection optics is that the AR1 of view field of PL becomes at the elongated rectangle of Y direction (slit-shaped), along X-direction, clamps the AR1 of its view field ground and supplies with ozzle 14A～14C 3 of+X side configurations, reclaims ozzle 21A, 21B in-2 of X side configurations.Supply with ozzle 14A～14C and be connected to liquid supply part 11 by supply pipe 15, it is 25 that recovery ozzle 21A, 21B are connected to vacuum by recovery tube 24.In addition, make to supply with pin 14A～14C and reclaiming ozzle 21A, 21B and substantially turn round the position of 180 °, configuration is supplied with ozzle 14A '～14C ', is reclaimed ozzle 21A ', 21B '.Supply with ozzle 14A～14C and reclaim ozzle 21A ', 21B ' along the Y direction alternative arrangement, supply with ozzle 14A '～14C ' and reclaim ozzle 21A, 21B along the Y direction alternative arrangement, supply with ozzle 14A '～14C ' by supply pipe 15 ' be connected to liquid supply part 11, reclaiming ozzle 21A ', 21B ' is 25 by recovery tube 24 ' be connected to vacuum.Supply pipe 15 ' way in, same with supply pipe 15, be provided with flowmeter 12 ' and valve 13 '.In addition, recovery tube 24 ' way in, same with recovery tube 24, be provided with gas-liquid separator 22 ' and exsiccator 23 '.
Fig. 5 illustrates the figure of retracting device 60 of liquid 1 that flows out to the outside of substrate P for recovery.In Fig. 5, retracting device 60 has the recovery mouth that surrounds accessory plate 43 ground and form on substrate tray PH (attract mouthful) 61 and is disposed at the liquid absorption member 62 that reclaims mouthfuls 61, consists of porous plastids such as spongy member or porous ceramics.Liquid absorption member 62, for having the annular component of preset width, can remain scheduled volume by liquid 1.In the inside of substrate tray PH, form and reclaim mouthful 61 streams that are communicated with 63, the bottom that is disposed at the liquid absorption member 62 that reclaims mouth 61 is contacted with stream 63.In addition, 43 of the substrate P on substrate tray PH and accessory plates are provided with a plurality of liquids recovery hole 64.These liquids recovery holes 64 also are connected in stream 63.
At the substrate tray (substrate holding structure) that keeps substrate P, above PH, be provided with a plurality of teats 65 for the back side of supporting substrates P.At these teats 65, be respectively equipped with the adsorption hole 66 that keeps substrate P be used to adsorbing.Adsorption hole 66 is connected respectively to the pipeline 67 that is formed at substrate tray PH inside.
Be connected to the end that the stream 63 that reclaims mouth 61 and liquids recovery hole 64 is connected to the pipeline 68 of being located at substrate tray PH outside.On the other hand, to be connected in the vacuum that comprises vacuum pump be 70 in the other end of pipeline 68.In the way of pipeline 68, being provided with gas-liquid separator 71, is between 70, to be provided with exsiccator 72 at gas-liquid separator 71 and vacuum.By vacuum, be 70 driving, liquid 1 reclaims from reclaiming mouthfuls 61 together with gas around it.In addition, though liquid 1 from substrate P and 43 immersions of accessory plate, around to the rear side of substrate P, this liquid also 64 reclaims from the liquids recovery hole together with ambient gas.In vacuum, be 70, flow into by gas-liquid separator 71 separate, by exsiccator 72 dryings gas.On the other hand, the liquid 1 separated by gas-liquid separator 71 flow into the liquids recovery section 73 with the case that can accommodate liquid 1 etc.The liquid 1 that is recovered to liquids recovery section 73 for example goes out of use or cleans, and turns back to liquid supply part 11 etc., is reused.
In addition, the pipeline 67 that is connected in adsorption hole 66 is connected to an end of the pipeline 69 of being located at substrate tray PH outside.On the other hand, it is 74 that the other end of pipeline 69 is connected to vacuum, and this vacuum is 74 to comprise the vacuum pump of being located at substrate tray PH outside.By vacuum, be 74 driving, the substrate P that is supported on teat 65 is adsorbed maintenance by adsorption hole 66.In the way of pipeline 69, be provided with gas-liquid separator 75, in gas-liquid separator 75 and vacuum, be 74 and be provided with exsiccator 76.In addition, at gas-liquid separator 75, connect the liquids recovery section 73 with the case that can accommodate liquid 1 etc.
Below, with reference to Fig. 1, wait explanation to use above-mentioned exposure device EX by the order of the graph exposure of mask M to substrate P.
Mask M is loaded into to mask platform MST, substrate P is loaded into to Substrate table PST, then, control device CONT drives the liquid supply part 11 of liquid supply mechanism 10, the liquid of scheduled volume 1 is supplied on substrate P at time per unit by supply pipe 15 and supply ozzle 14.In addition, control device CONT is along with by liquid supply mechanism 10 feed fluids 1, and the vacuum that drives liquids recovery mechanism 20 is 25, at time per unit, reclaims the liquid 1 of scheduled volume by reclaiming ozzle 21 and recovery tube 24.Like this, at projection optics, be between the optical element 2 of leading section of PL and substrate P, to form the immersion zone AR2 of liquid 1.Here, in order to form immersion zone AR2, control device CONT controls respectively liquid supply mechanism 10 and liquids recovery mechanism 20, makes the liquid supply amount on relative substrate P and is roughly same amount from the liquids recovery amount on substrate P.Then, control device CONT is carried out the illumination of exposure light EL to mask M by illumination optical system IL, by projection optics, is that PL and liquid 1 project to substrate P by the figure picture of mask M.
While carrying out scan exposure, figure picture in the part of the AR1 of view field projection print plate M, relative to projection optics, be that PL court-directions X (or+directions X) moves mask M by speed V, synchronous therewith, by Substrate table PST, make substrate P court+directions X (or-directions X) mobile by speed β V (β is the projection multiplying power).After 1 exposure area (shot area) exposed, by the stepping of substrate P, next exposure area is moved to the scanning starting position, below, by the substep scan mode, successively exposure-processed is carried out in each exposure area.In this form of implementation, the moving direction that makes liquid 1 be parallel to substrate P is fluidly set towards the direction identical with the moving direction of substrate P.Namely, make substrate P towards with the moving substrate P of direction of scanning (directions X) shown in arrow Xa (with reference to Fig. 4), carrying out the occasion of scan exposure, use supply pipe 15, supply ozzle 14A～14C, recovery tube 24, reach and reclaim ozzle 21A, 21B, carry out supply and the recovery of liquid 1 by liquid supply mechanism 10 and liquids recovery mechanism 20.Namely, when substrate P court-directions X moves, (14A～14C) liquid 1 is supplied to projection optics is between PL and substrate P from supplying with ozzle 14, simultaneously, from reclaiming ozzle 21 (21A, 21B), the liquid 1 on substrate P is reclaimed together with gas around it, be full of projection optics and be between the optical element 2 of leading section of PL and substrate P and make liquid 1 court-directions X mobile.On the other hand, continue to use the occasion that direction of scanning (+directions X) shown in arrow Xb (with reference to Fig. 4) is mobile, carry out scan exposure making substrate P, use supply pipe 15 ', supply with ozzle 14A '～14C ', recovery tube 24 ', and reclaim ozzle 21A ', 21B ', by liquid supply mechanism 10 and liquids recovery mechanism 20, carry out supply and the recovery of liquid 1.Namely, when substrate P court+directions X moves, to supply to projection optics be between PL and substrate P from supplying with ozzle 14 ' (14A '～14C ') by liquid 1, simultaneously, liquid 1 on substrate P is reclaimed together with gas around it from reclaiming ozzle 21 ' (21A ', 21B '), be full of projection optics and be between the optical element 2 of leading section of PL and substrate P and make liquid 1 court+directions X mobile.In this occasion, for example, by supplying with the movement along with substrate P court-directions X of liquid 1 that ozzle 14 supplies with, attract between optical element 2 and substrate P, flowing, so, liquid supply mechanism 10 (liquid supply part 11) though the supply energy less, also can be easily by liquid supply between optical element 2 and substrate P.Then, the direction flowed corresponding to direction of scanning switching liquid 1, thereby court+directions X or-occasion that directions X scans substrate P, all liquid 1 can be filled between optical element 2 and substrate P, can expose by high-resolution and wide depth of focus.
In the exposure-processed process, the measurement result of being located at the flowmeter 12 of liquid supply mechanism 10 outputs to control device CONT often with the measurement result of being located at the flowmeter 27 of liquids recovery mechanism 20.Control device CONT relatively the measurement result of the measurement result of flowmeter 12 amount that namely supplies to the liquid on substrate P by liquid supply mechanism 10 and flowmeter 27 namely by the amount of liquids recovery mechanism 20 from the liquid of substrate P recovery, according to its result relatively, control the valve 13 of liquid supply mechanism 10.Specifically, control device CONT obtains poor with from the liquids recovery amount on substrate P (measurement result of flowmeter 27) of the amount of liquid (measurement result of flowmeter 12) that supplies on substrate P, judge whether this difference of obtaining surpasses predefined allowable value (threshold value), operation valve 13.Here, as described above, control device CONT controls respectively liquid supply mechanism 10 and liquids recovery mechanism 20, the amount of liquid that makes to supply on substrate P is substantially identical with the liquids recovery amount from substrate P, so, as the liquid supply action of liquid supply mechanism 10 and the liquids recovery action of liquids recovery mechanism 20, normally carry out respectively, the above-mentioned difference of obtaining is roughly zero.
In the difference of obtaining, be more than or equal to the occasion of allowable value, namely the liquids recovery amount is than the occasion of liquid supply amount much less, and the recovery action abnormal of control device CONT judgement liquids recovery mechanism 20, can not withdrawal liquid 1.Now, control device CONT such as judgement is 25 to break down and wait extremely in the vacuum of liquids recovery mechanism 20, for preventing can not be by normally withdrawal liquid 1 and the leakage of the liquid 1 that causes of liquids recovery mechanism 20, make valve 13 work of liquid supply mechanism 10, disconnect the stream of supply pipe 15, feed fluid 1 on 10 pairs of substrate P of stop liquid feed mechanism.Like this, control device CONT relatively supplies to the amount of liquid and the amount of liquid reclaimed by liquids recovery mechanism 20 on substrate P from liquid supply mechanism 10, abnormal according to the recovery of its comparative result tracer liquid recovering mechanism 20 action, when liquid 1 surplus supply, detect when abnormal, stop to substrate P feed fluid 1.Like this, can prevent that liquid 1 is immersed in undesirable position to leakage or the liquid 1 in the outside of substrate P or Substrate table PST (substrate tray PH), or the expansion of the loss that causes of such leakage or immersion.
In addition, control device CONT is when the recovery action that liquids recovery mechanism 20 detected abnormal, and the electric leakage caused of adhering to for the liquid 1 of Leakage prevention or immersion, stop to the power supply of the electrical equipment that forms exposure device EX.Here, as electrical equipment, can list be used to making linear motor 47,48 that Substrate table PST moves etc.These linear motors 47,48 are in the liquid 1 that leaks into the Substrate table PST outside and easily adhere to the position of immersion, so control device CONT is by stopping to 47,48 power supplies of these linear motors, thereby can prevent the electric leakage that adhering to of liquid 1 causes.In addition, as electrical equipment, except linear motor 47,48, such as can list be located at Substrate table PST upper, be used to the sensor (photomultiplier (Off オ ト マ Le) etc.) of the exposure light EL that receives relative Substrate table PST.Perhaps, as electrical equipment, can list be used to the position of the Z-direction of adjusting substrate tray PH and vergence direction adjust such as various executive components such as piezoelectric elements.In addition, when detecting when abnormal, can stop, to forming all electrical equipments power supplies of exposure device EX, also can stopping to a part of electrical equipment power supply.Here, when control device CONT detects recovery action abnormal of liquids recovery mechanism 20, such as stopping such as at linear motor or near the piezoelectric element used 0～150V or near the power supply of the electrical equipments (high voltage installation) such as photomultiplier (sensor) that use 300～900V, thereby can prevent electric leakage, suppress the impact of electric leakage on peripheral device.
In addition, control device CONT, when the recovery action that liquids recovery mechanism 20 detected abnormal, for example stops be used to making the driving of the air bearing 42 that Substrate table PST moves non-contactly relative to the spigot surface 41A of substrate base 41.Air bearing 42 have relative substrate base 41 top (spigot surface) 41A blow gas (air) blow-off outlet 42B and attract the air entry 42A of the gas between (bearing surface) and spigot surface 41A below Substrate table PST, the bounce that blows out generation and the attraction equilibrium of forces produced by air entry 42A by the gas from blow-off outlet 42B, below Substrate table PST and between spigot surface 41A, keep certain gap, but control device CONT is when the recovery action that liquids recovery mechanism 20 detected abnormal, for liquid 1 inflow (immersion) of Leakage prevention, arrive air entry 42A of air bearing 42, stop the action of air bearing 42, air-breathing from air entry 42A particularly.Like this, can prevent that liquid 1 from flowing into the vacuum system be connected with this air entry 42A, can prevent the generation of the problems such as fault of the vacuum system that the inflow of liquid 1 causes.
In addition, also can jut 65 or the adsorption hole 66 that keep substrate P be set at other member, this other member absorption is being held in to the occasion of substrate tray PH, control device CONT stops from be used to adsorbing the air-breathing of the adsorption hole (air entry) that keeps this other member.
In addition, control device CONT, when the recovery action that liquids recovery mechanism 20 detected abnormal, drives alarm device K.Alarm device K can be used emergency warning lamp, alarm tone, display etc. to give the alarm, and like this, for example the operator can learn liquid 1 occurs in exposure device EX leakage or immersion.
In addition, when the recovery action that liquids recovery mechanism 20 detected abnormal, control device CONT increases the liquids recovery amount of retracting device 60.Specifically, making the vacuum of retracting device 60 is that 70 driving amount (driving force) rises.The driving of retracting device 60 (vacuum is 70) becomes vibration source, so, in exposure-processed, preferably reduce or prevent the driving force of retracting device 60, but when the possibility of abnormal, the leakage that liquid 1 occurs of the recovery action that detects liquids recovery mechanism 20, control device CONT rises by the driving force that makes retracting device 60, thereby can prevent the leakage of liquid 1 in the outside (reclaim at least mouthful 61 the outside) of Substrate table PST (substrate tray PH), or the expansion of Leakage prevention.
In addition, near the exposure area the central authorities to substrate P expose during, the liquid 1 of supplying with from liquid supply mechanism 10 is reclaimed by liquids recovery mechanism 20.On the other hand, as shown in Figure 5, by the fringe region to substrate P, carry out exposure-processed, thereby when immersion zone AR2 is near the fringe region of substrate P, can be continued at projection optics by accessory plate 43 is between PL and substrate P, to keep liquid 1, but the part of liquid 1 flows out to the outside of accessory plate 43 sometimes, the liquid 1 of outflow is reclaimed by the recovery mouth 61 that has configured liquid absorption member 62.Here, control device CONT starts to drive aforesaid liquid feed mechanism 10 and liquids recovery mechanism 20, simultaneously, starts the action of retracting device 60.Therefore, from the liquid 1 that reclaim mouth 61 recovery, be 70 attraction by vacuum, together with ambient air, reclaim by stream 63 and pipeline 68.In addition, flowing into substrate P reclaims by stream 63 and pipeline 68 by liquids recovery hole 64 with the liquid 1 in the gap of accessory plate 43 together with ambient air.Now, gas-liquid separator 71 separates from reclaiming mouthful 61 liquid 1 and gases that reclaim.The gas separated by gas-liquid separator 71 by exsiccator 72 dryings after, flowing into vacuum is 70.Like this, can prevent that liquid component from flowing into vacuum is 70 problem.The liquids recovery of being separated by gas-liquid separator 71 on the other hand, is to liquids recovery section 73.
Now, reclaimed from the part of the liquid 1 of liquid supply mechanism 10 supplies by retracting device 60, so the amount of liquid reclaimed by liquids recovery mechanism 20 reduces, result, the liquids recovery amount of being measured by the flowmeter 27 of liquids recovery mechanism 20 reduces.In this occasion, even liquid 1 does not leak, control device CONT also may be according to each measurement result of the flowmeter 27 of the flowmeter 12 of comparative liquid feed mechanism 10 and liquids recovery mechanism 20, and false judgment produces abnormal in the recovery action of liquids recovery mechanism 20.Therefore, 73, gas-liquid separator 71 in retracting device 60 and liquids recovery section are provided with the flowmeter that the amount of the liquid reclaimed is measured, control device CONT obtains the yield of whole liquid, the measurement result of the liquids recovery amount of the integral body of relatively obtaining and the flowmeter 12 of liquid supply mechanism 10 according to the measurement result of the flowmeter 27 of the measurement result of the flowmeter of this retracting device 60 and liquids recovery mechanism 20.According to its result relatively, whether control device CONT judgement produces abnormal with the liquids recovery action of liquids recovery mechanism 20, according to the result of its judgement, the liquid supply that can carry out stop liquid feed mechanism 10 moves, stops power supply, stops the measures such as aspiratory action from air entry.
In addition, when the measured value of the flowmeter of being located at retracting device 60 becomes the larger value of relatively predefined allowable value surplus, when a large amount of liquid 1 of control device CONT judgement flows out to the outside of substrate P, in order to prevent that liquid 1 from, to the leakage in the outside of Substrate table PST (substrate tray PH) etc., also can prevent liquid supply mechanism 10.
The liquid 1 that flows out to the outside of substrate P also likely immerses from the gap of substrate P and accessory plate 43, arrives the rear side of substrate P.The liquid 1 that enters into the rear side of substrate P also exists and flow into be used to adsorbing the possibility of the adsorption hole (attracting mouth) 66 that keeps substrate P.In this occasion, by pipeline 67 and pipeline 69, to be connected to vacuum be 74 in order to adsorb the adsorption hole 66 that keeps substrate P and be located at substrate tray PH, in its way, is provided with gas-liquid separator 75 and carries out dry exsiccator 76 with the gas to being separated by gas-liquid separator 75.Therefore, even liquid 1 flow into adsorption hole 66, also the liquid 1 flowed into from adsorption hole 66 can be recovered to liquids recovery section 73, prevent that liquid component from flowing into vacuum is 74 problem.
In the occasion of liquid 1 from adsorption hole 66 immersions, the possibility had problems due to maintenance that has substrate P etc., so, between pipeline 69 or gas-liquid separator 75 and liquids recovery section 73, configure flowmeter, the occasion of liquid from the immersion of adsorption hole 66 detected by this flowmeter, be judged as abnormal situation, implement the stopping of liquid supply as described above action, power stop, from least 1 air-breathing the stopping of air entry.
For the pipeline 69 being connected with adsorption hole 66, be not provided with the occasion of gas-liquid separator 75, when the recovery action that liquids recovery mechanism 20 or retracting device 60 detected abnormal, in order to prevent that liquid 1 from flowing into adsorption hole (air entry), also can stop vacuum and be the driving of 74 (attracting system), stop air-breathing from adsorption hole 66.
As described above, leak or immerse like that when abnormal when liquid 1 being detected, stopping by liquid supply mechanism 10 to feed fluid 1 on substrate P, so, can prevent the expansion of the leakage of liquid 1 or Leakage prevention or immersion etc.In addition, even at liquid 1, leak or immerse the occasion of such abnormal generation, by stopping to the power supply of the electrical equipments such as linear motor 47,48 that form exposure device EX, thereby can prevent the expansion of the loss that the generation of leaking electricity and electric leakage cause.In addition, in order to adsorb air entry 42A or the substrate P that keeps air bearing 42, stop the air-breathing of each air entry be communicated with from the adsorption hole 66 equal vacuums systems with being located at substrate tray PH, thereby can prevent that liquid 1 from flowing into the generation that the vacuum be connected with this air entry is such problem.In addition, when from reclaiming ozzle 21 or reclaiming mouthfuls 61 or adsorption hole 66 etc. while attracting mouthful withdrawal liquid and the gas around it, with gas-liquid separator, the liquids and gases from attracting mouth to suck are carried out to gas-liquid separation, and with exsiccator, the gas by after gas-liquid separator separates is carried out to drying, thereby can prevent that liquid component (wet gas etc.) from flowing into vacuum system, can reduce the impact of liquid on vacuum system.In addition, this form of implementation is from attracting the formation of mouth withdrawal liquid together with its gas on every side, but separates by the liquids and gases to being reclaimed by gas-liquid separator, thereby can correctly measure the amount of liquid of recovery.
In above-mentioned form of implementation, as liquids recovery mechanism 20, reclaim the abnormal of action, to be 25 fault (remarkable action) be illustrated as example the vacuum of take, but, except vacuum is 25 fault, for example also can list the remarkable action of gas-liquid separator 22.That is, even the liquid 1 that can reclaim on substrate P by reclaiming ozzle 21, gas-liquid separator 22 can not separate liquid and the gas reclaimed from reclaiming ozzle 21 fully, produces the amount of liquid situation fewer than predetermined value of being measured by flowmeter 27.In this occasion, flowing into vacuum and be 25 liquid component increases, so, causing vacuum is 25 fault etc., for this reason, and the action of the liquid supply of control device CONT stop liquid feed mechanism 10, simultaneously, the liquids recovery of stop liquid recovering mechanism 20 (vacuum is 25) is moved, thereby can prevent the leakage of liquid 1, and can prevent that vacuum from being 25 fault.
In this form of implementation, control device CONT controls respectively liquid supply mechanism 10 and liquids recovery mechanism 20, makes the amount of liquid supplied on substrate P substantially identical with the liquids recovery amount from substrate P.For this reason, as the liquid supply action of normally carrying out respectively liquid supply mechanism 10 and the liquids recovery action of liquids recovery mechanism 20, the above-mentioned difference of obtaining is roughly zeroly, and above-mentioned allowable value and its correspondingly are redefined for less value.On the other hand, for example at the liquid 1 used, has high-volatile occasion, even the liquids recovery action of the action of the liquid supply of liquid supply mechanism 10 and liquids recovery mechanism 20 is normally carried out respectively, liquid 1 volatilization on substrate P, the measured value that also may make the flowmeter 27 of liquids recovery mechanism 20 obtain is less than the measured value that the flowmeter 12 by liquid supply mechanism 10 obtains.Therefore, control device CONT preferably, corresponding to the liquid 1 (volatility) or the residing environment of substrate P that use, presets above-mentioned allowable value, according to the allowable value of setting and the comparative result of the above-mentioned difference of obtaining, operation valve 13.
In addition, in above-mentioned form of implementation, the liquid supply amount of comparative liquid feed mechanism 10 and the liquids recovery amount of liquids recovery mechanism 20, the circulation status of tracer liquid 1 abnormal, but also can be only according to the quantity delivered of liquid supply mechanism 10 or only according to the yield of liquids recovery mechanism 20, detect respectively extremely.In addition, be not limited to the flow of liquid, in the machinery that liquid supply mechanism 10 or liquids recovery mechanism 20 detected or the occasion of electrical anomaly, control device CONT also can take the liquid supply of stop liquid feed mechanism 10 to move, stop power supply, stop the measures such as aspiratory action from air entry.
In this form of implementation, from reclaiming ozzle 21, together with liquid 1, the gas around it is also reclaimed, so, in order to measure more accurate liquids recovery amount, use gas-liquid separator 22 that the liquid of recovery is also separated with gas, measure with flowmeter 27 amount of liquid separated.For this reason, the gas-liquid separation ability of gas-liquid separator 22 also may make the amount of liquid change of being measured by flowmeter 27.Therefore, control device CONT also can set above-mentioned allowable value corresponding to the gas-liquid separator 22 (gas-liquid separation ability) used.
In this form of implementation, when the liquids recovery action that detects liquids recovery mechanism 20 abnormal, the stopping of the liquid supply of liquid supply mechanism 10 action, to the stopping of electrical equipment power supply, and from the aspiratory action of air entry stop all carrying out, but also can implement at least any.
In this form of implementation, from the recovery ozzle 21 of liquids recovery mechanism 20, together with liquid 1, the gas around it is also reclaimed, so, in order by better precision, to measure with flowmeter 27 amount of liquid reclaimed, use gas-liquid separator 22 to be separated into liquid and gas, but in liquids recovery mechanism 20 from reclaiming the only occasion of the formation of withdrawal liquid 1 of ozzle 21, without gas-liquid separator 22 separating liquids and gas, the amount of the liquid reclaimed by mensuration, can obtain the liquids recovery amount.
; in this form of implementation; also can form such formation; namely; when the recovery action that liquids recovery mechanism 20 detected abnormal; the liquid supply action of stop liquid feed mechanism 10; or stop powering to electrical equipment; or stop the aspiratory action from air entry; but when position relationship that Substrate table (movable link) PST that can keep substrate P to move and projection optics be PL abnormal being detected, implement the liquid supply action stop, power stop, reaching from the stopping of the aspiratory action of air entry at least any.Here, Substrate table PST and projection optics be the out-of-the way position of PL close be can not be below projection optics be PL the state of maintenance liquid 1, comprise position relationship abnormal of at least one party in Z-direction and XY direction.Namely, even the recovery of the supply action of liquid supply mechanism 10 and liquids recovery mechanism 20 action is normal, for example the action as Substrate table PST produces extremely, Substrate table PST is configured to from respect to projection optics, being the position of the desired position of PL along the skew of XY direction, in this occasion, being created in projection optics is the state (state that can not keep liquid 1 below projection optics is PL) that can not form well the immersion zone AR2 of liquid 1 between PL and the substrate P that is held in Substrate table PST.In this occasion, liquid 1 leaks into the outside of substrate P, the outside of substrate tray PH, or moving lens 45 immersions of Substrate table PST (substrate tray PH).Like this, liquids recovery mechanism 20 is due to the liquid 1 that can not reclaim scheduled volume, so the measurement result of the value that the flowmeter 27 of liquids recovery mechanism 20 will be less than predetermined value outputs to control device CONT.Control device CONT can detect position abnormal of such Substrate table PST such as leakage that liquid 1 occurs according to the measurement result of this flowmeter 27.Then, control device CONT is detecting it when abnormal, implement the liquid supply action stop, power stop, reaching stopping etc. from the aspiratory action of air entry.
In addition, immersion zone AR2 is the preset distance (about 0.1mm～1mm) that distance between PL and substrate P is set as the degree that can be formed by the surface tension of liquid 1 immersion zone AR2 by projection optics, but the occasion for example had problems in position control about Z-direction at Substrate table PST, projection optics is that the distance of substrate P on PL and Substrate table PST increases, may produce can not be below projection optics be PL the situation of maintenance liquid 1.In this occasion, liquid 1 leaks into the outside of substrate P or the outside of Substrate table PST (substrate tray PH) etc., liquids recovery mechanism 20 can not reclaim the liquid 1 of scheduled volume, and the measurement result of the value that the flowmeter 27 of liquids recovery mechanism 20 will be less than predetermined value outputs to control device CONT.Control device CONT is according to the measurement result of this flowmeter 27, and the malposition of such Substrate table PST occurs in the leakage that can detect liquid 1.Control device CONT detects this when abnormal, implement the liquid supply action stop, power stop, reaching stopping etc. from the aspiratory action of air entry.
In order to detect position relationship abnormal that the relative projection optics of Substrate table PST is PL, do not use the measurement result of the flowmeter 27 of liquids recovery mechanism 20, for example by laser interferometer 46, detected the position of the XY direction of Substrate table PST, according to its position probing result, can detect the abnormal of position relationship.Control device CONT also can compare Substrate table position probing result and the predefined allowable value that laser interferometer 46 obtains, and when the platform position probing result of laser interferometer 46 surpassed above-mentioned allowable value, that implements that the supply of liquid 1 moves stopped etc.In addition, can by focus detection, be also the position of the Z-direction of 56 detection Substrate table PST, relatively by focusing (focus), being detected is 56 platform position probing result and the predefined allowable values that obtain, when focus detection is 56 testing result while surpassing allowable value, control device CONT implements the stopping etc. of supply action of liquid 1.Like this, control device CONT is according to comprising the testing result that laser interferometer 46 and focus detection are 56 Substrate table position detecting device, detect projection optics and be PL and Substrate table PST position relationship extremely, when detecting when abnormal, implement the stopping of liquid supply action, the stopping of power supply, and the stopping etc. from the aspiratory action of air entry of electrical equipment relatively.
In addition, also can form such formation, that is, when laser interferometer 46 makes a mistake, the action of the liquid supply of control device CONT stop liquid feed mechanism 10.Here, the mistake of laser interferometer 46 comprises due to the fault of laser interferometer 46 self or dispose certain reasons such as foreign matter on the light path of the mensuration light of interferometer and makes the state that can not carry out the position measurement of Substrate table PST.When laser interferometer 46 made a mistake, control device CONT can not hold the position of Substrate table PST, can not control simultaneously the position of Substrate table PST.In this occasion, the position relationship that is PL and Substrate table PST at projection optics produces extremely, the danger that exists liquid 1 to leak and flow out.Therefore, when laser interferometer 46 makes a mistake, by stopping 10 feed fluids by liquid supply mechanism, thereby can prevent the problem that liquid 1 leaks.
Equally, the occasion that Department of Survey's (being 56 in this form of implementation focus detection) in the position of the Z-direction for controlling Substrate table PST makes a mistake, the position relationship that is PL and Substrate table PST at projection optics produces abnormal, there is the danger of the leakage outflow of liquid 1, so, in focus detection, be 56 occasions that make a mistake, the liquid supply action of control device CONT stop liquid feed mechanism 10.
Substrate table PST (substrate tray PH) and projection optics are that the focus detection that extremely is not limited to of position relationship of the Z-direction of PL is 56, also can use the detection system of the non-optical formula of static capacity sensor.
In addition, also can use interferometer management projection optics is the position relationship on the surface of the image planes of PL and Substrate table PST (substrate P).The content of using interferometer to carry out the management of the surperficial position relationship of image planes that projection optics is PL and Substrate table PST (substrate P) for example is disclosed in United States Patent (USP) 6,202,964, the scope that the decree of the country of the international application appointment of Zai Youben or selection is allowed, quote its disclosed content as a part described herein.
In addition, in above-mentioned form of implementation, the abnormal occasion of generation in exposure actions has been described, but the occasion of abnormal is also identical while not carrying out the exposure of substrate P.
In addition, in above-mentioned form of implementation, when in liquid supply, detecting when abnormal, the supply of stop liquid, but when starting the supply of liquid, even the abnormal occasion that projection optics is the position relationship etc. of PL and Substrate table PST detected, but also the supply of stop liquid starts.
Below, the 2nd form of implementation of exposure device EX of the present invention is described.In the following description, the component part identical or equal with above-mentioned form of implementation adopted to identical symbol, simplify or the description thereof will be omitted.In this form of implementation, the detecting device that use the comprises optical fiber leakage of tracer liquid 1 towards the outside of substrate P or Substrate table PST (substrate tray PH) etc. optically, when the leakage that liquid 1 detected or while immersing, implement by the action of liquid supply mechanism 10 feed fluids, to the stopping of the power supply of electrical equipment, and from least 1 the stopping of the aspiratory action of air entry.
The detection principle of detecting device of the leakage of tracer liquid 1 is described below with reference to Fig. 6 and Fig. 7.In this form of implementation, use optical fiber as detecting device.Fig. 6 is the signal pie graph that general optical fiber is shown.In Fig. 6, the clad section 82 that optical fiber 80 ' have transmits the core 81 of light and is located at around core 81, has the refractive index less than core 81.Optical fiber 80 ' in, light is sealing into the core 81 with refractive index higher than clad section 82 and transmits.
Fig. 7 is the signal pie graph that the optical fiber 80 of this form of implementation is shown.In Fig. 7, optical fiber 80 is for having the core 81 that transmits light, the optical fiber (unclad fiber) that is not provided with clad section around it.The core 81 of optical fiber 80 has than the high refractive index n c of refractive index n a of the gas around it (being air in this form of implementation), and has the refractive index lower than the refractive index n w of liquid (being pure water in this form of implementation) 1 (na<nc<nw).For this reason, the occasion be full of by air around optical fiber 80, as long as the incidence angle θ of light 0Meet sin θ 0Na/nc, light is sealing into the core 81 with refractive index n c higher than air and transmits.That is, from the light of penetrating end incident of optical fiber 80, do not produce large damply from its light quantity of outgoing end outgoing., at liquid (pure water) 1, be attached to the occasion on the surface of optical fiber 80, owing to being nc<nw, so at the position of having adhered to water, all incident angles all can not meet total reflection condition sin θ 0Total reflection, do not occur at this liquid 1 and the interface of optical fiber 80, so light leaks into outside from the liquid attachment portion of optical fiber 80 in=nw/nc.Therefore, from the light quantity of the light of the incident end incident of optical fiber 80, reduce from the outgoing of outgoing end the time.Therefore, this optical fiber 80 is set in the precalculated position of exposure device EX, the light quantity of the outgoing end by measuring this optical fiber 80, thus can whether be attached to optical fiber 80 by control device CONT tracer liquid 1, namely whether liquid 1 leaks.The refractive index of air is 1 left and right, and the refractive index of water is 1.4～1.6 left and right, so core 81 such as best material by the refractive index with 1.2 left and right (glass of quartz, specific composition etc.) forms.
In addition, according to the damping capacity of the light of the outgoing end outgoing from optical fiber 80, can obtain the amount of the liquid 1 that is attached to optical fiber 80.That is, light decrement exists with ... the area that liquid 1 is attached to the part of optical fiber, at a small amount of liquid 1, is attached to the occasion on every side of optical fiber 80, and the damping capacity of the light of outgoing end is little, and in the occasion that a large amount of liquid 1 adheres to, damping capacity is large.Therefore, can consider that the area of the part that liquid 1 adheres to exists with ... the leak of liquid amount, so, the light quantity of the outgoing end by measuring optical fiber 80, thus can obtain the leakage rate of liquid 1.In addition, the measured value of the light quantity of optical fiber outgoing end is compared with predefined a plurality of threshold values (reference value), in the occasion that surpasses each threshold value, sent respectively specific signal, thereby detect scalably the leakage rate of liquid 1.
Fig. 8 illustrates the outboard profile that the optical fiber of above-mentioned detecting device 80 is disposed to the state on every side of Substrate table PST (substrate tray PH), and Fig. 9 is planimetric map.Such as shown in Figure 8 and Figure 9, the configuration peripherally of optical fiber 80 coiling Substrate table PST (substrate tray PH).In the incident end of optical fiber 80, connection is the light projector part 83 of optical fiber 80 incident lights relatively, in the outgoing end of optical fiber 80, connect light accepting part and divide 84, this light accepting part divide 84 can be received in optical fiber 80 transmit, from the light of outgoing end outgoing.Control device CONT is according to the light quantity of the light that incides optical fiber 80 from light projector part 83 and the light quantity of being divided 84 light that receive by light accepting part, obtain the light decay rate of the relative incident end, outgoing end of optical fiber 80, according to this result of obtaining, judge whether liquid 1 is attached to optical fiber 80, and namely whether liquid 1 leaks into the outside of Substrate table PST (substrate tray PH).When control device CONT leaks when judgement liquid 1, realize the stopping of the liquid supply undertaken by liquid supply mechanism 10 action, to the stopping of the power supply of electrical equipment, and stopping etc. from the aspiratory action of air entry.
Optical fiber 80 can be configured to Substrate table PST (substrate tray PH) above, particularly reclaim mouthfuls 61 around, also can be for the immersion (immersion liquid) that checks moving lens 45, be configured to around moving lens 45 or its.
Figure 10 be illustrate by optical fiber 80 be configured to the following air bearing 42 of being located at Substrate table PST around and movably the substrate base of supporting substrates platform PST (substructure member) 41 around example.Optical fiber 80 is due to can be at random crooked, so, can be wound up into Substrate table PST (substrate tray PH), air bearing 42, and the ground, optional position that easily leaks of the liquid 1 such as substrate base 41 install, can freely arrange by form configuration arbitrarily.Particularly by optical fiber 80 is installed on air bearing 42 around, thereby can detect well liquid 1, whether adhere to (leakage) near air bearing 42, prevent that in advance liquid 1 from flowing into the problem of the air entry 42A of air bearing 42.
, in above-mentioned optical fiber 80, when the distance from the incident end to exit end, be difficult to sometimes determine that liquid 1 is attached to the position of optical fiber 80, the i.e. leak position of liquid 1.Therefore, as shown in Figure 11, by a plurality of optical fiber 80 is carried out to 2 dimension configurations by rectangular, thereby can determine the leak position of liquid 1.In Figure 11, detecting device 90 has the 1st optical fiber 80A and the 2nd optical fiber 80B; The 1st optical fiber 80A be take the 1st direction (Y direction) and is length direction, along with the 2nd direction (X-direction) of the 1st direction orthogonal, arranging a plurality of; The 2nd optical fiber 80B be take the 2nd direction and is length direction, arranges a plurality of along the 1st direction.These a plurality of the 1st, the 2nd optical fiber 80A, 80B are by rectangular (mesh shape) configuration.Each incident end set of a plurality of the 1st optical fiber 80A, its Set-dissection is connected with the outgoing end of set optical fiber 85A.The incident end of set optical fiber 85A is connected in light projector part 83A.On the other hand, 84A is divided such as being connected in the light accepting part consisted of 1 Vc CD line sensor etc. in the outgoing end of a plurality of the 1st optical fiber 80A.Each incident end set of same a plurality of the 2nd optical fiber 80B, its Set-dissection is connected with the outgoing end of set optical fiber 85B.The incident end of set optical fiber 85B is connected in light projector part 83B.On the other hand, 84B is divided such as being connected to the light accepting part consisted of 1 Vc CD line sensor etc. in each outgoing end of a plurality of the 2nd optical fiber 80B.
From the light of light projector part 83A outgoing, after set optical fiber 85A transmission, be branched off into respectively a plurality of the 1st optical fiber 80A.Respectively from the light of the incident end incident of the 1st optical fiber 80A after the 1st optical fiber 80A transmission, from the outgoing of outgoing end, divide 84A to be subjected to light by light accepting part.Light accepting part divides 84A to detect respectively respectively from the light quantity of the light of the outgoing end outgoing of a plurality of the 1st optical fiber 80A., as shown in Figure 11, be attached to the occasion on specific the 1st optical fiber 80AL in a plurality of the 1st optical fiber 80A at liquid 1 here, the light quantity of the outgoing end of the 1st optical fiber 80AL descends.Light accepting part divides the light result that is subjected to of 84A to output to control device CONT.Equally, from the light of light projector part 83B outgoing, after set optical fiber 85B transmission, be branched off into respectively a plurality of the 2nd optical fiber 80B.Respectively from the light of the incident end incident of the 2nd optical fiber 80B after the 2nd optical fiber 80B transmission, from the outgoing of outgoing end, divide 84B to be subjected to light by light accepting part.Light accepting part divides 84B to detect respectively from the light quantity of the light of each outgoing end outgoing of a plurality of the 2nd optical fiber 80B., as shown in Figure 11, be attached to the occasion on specific the 2nd optical fiber 80BL in a plurality of the 2nd optical fiber 80B at liquid 1 here, the light quantity in the outgoing end of the 2nd optical fiber 80BL descends.Light accepting part divides the light result that is subjected to of 84B to output to control device CONT.Control device CONT respectively is subjected to the light result according to what light accepting part divided 84A, 84B, can determine that the leak position (position that the relative detecting device 90 of liquid 1 of leakage adheres to) of liquid 1 is near the intersection point of the 1st optical fiber 80AL and the 2nd optical fiber 80BL.
Figure 12 illustrates the detecting device 90 had by optical fiber 80A, the 80B of rectangular configuration to be configured to the figure as the example of the linear motor 47 (stator 47A) of the electromagnetic drive source that drives Substrate table PST.By detecting device 90 is configured to linear motor 47, thereby can determine the outside that leaks into Substrate table PST, the position that is attached to the liquid 1 on linear motor 47.By the position of the liquid 1 that determine to leak, thus the liquid 1 that can leak by good efficiency remove operation.
The occasion that is water at liquid 1, removes the liquid (water) of this leakage, remove operation (wiping operation) by using anhydrous alcohol, thereby can remove and anhydrate well, in addition, and because alcohol volatilizees immediately, so, can successfully remove operation.
Schematic diagram is such as shown in figure 13, by making the incident end incident of pulsed light from optical fiber 80, thereby can determine the position of the liquid 1 that is attached to optical fiber 80 surfaces.At liquid 1, be attached to the occasion on the surface of optical fiber 80, from the pulsed light L1 of the incident end incident of the optical fiber 80 attachment position reflection at liquid 1, produce the phenomenon that its reflected light L2 turns back to the incident end side again.Therefore, the optical elements such as polarization beam splitter are set at light incident side, with optical element, reflected light are guided to light-receiving device and detect.From testing result, the moment of inciding optical fiber 80 according to pulsed light L1 is subjected to the mistiming in the moment of light to reach the ray velocity of transmission in optical fiber 80 with reflected light L2 by the incident end, the distance of the attachment position of incident end and liquid 1 can be obtained, thereby the attachment position (leak position of liquid 1) of liquid 1 can be determined.In the ray velocity of the optical fiber 80 transmission formation material production corresponding to optical fiber 80 (core 81), change, so, can obtain according to the formation material of this optical fiber 80.
Below, the 3rd form of implementation of exposure device EX of the present invention is described.In this form of implementation, the detecting device that comprises prism (optical element) when use detects the leakage of liquid 1 optically, while detecting the leakage of liquid 1, the power supply of implementing the stopping of liquid supply action, the electrical equipment of liquid supply mechanism 10 stops, and from least 1 the stopping of the aspiratory action of air entry.
The detection principle of detecting device of the leakage of tracer liquid 1 is described below with reference to Figure 14 and Figure 15.In this form of implementation, use prism.Figure 14 is the figure that the signal formation of the detecting device 100 that uses prism is shown.In Figure 14, detecting device 100 has prism 101, be installed on the 1st 101A of prism 101, the relative light projector part 102 of prism 101 projection lights, and be installed on prism 101 the 2nd 101B, receive and at the catoptrical light accepting part of the 3rd 101C of prism 101, divide 103 from the light of light projector part 102 outgoing.The 1st 101A and the 2nd 101B become right angle substantially.
Prism 101 has than the high refractive index of the gas around it (being air in this form of implementation), and has the refractive index lower than liquid (being pure water in this form of implementation) 1.The occasion be full of by air around prism 101, the light that projects the 3rd 101C from light projector part 102 is selected Refractive Index of Glass Prism by the 3rd 101C with carrying out total reflection.For this reason, from the unattenuated a lot of light quantities of the light of light projector part 102 outgoing ground, divide 103 to be subjected to light by light accepting part.
Figure 15 illustrates the figure of state of the 3rd 101C that liquid 1 is attached to the prism 101 of detecting device 100.In Figure 15, the light that projects the 3rd 101C from light projector part 102 is because liquid 1 exists face to can't help the 3rd 101C to carry out total reflection, and the light component of a part (or all) leaks into outside from the liquid attachment portion of prism 101.For this reason, from the light quantity decay of the light component of the 2nd 101B of the arrival the light of light projector part 102 outgoing, so light accepting part divides 103 according to the light quantity (optical information) that is subjected to light, can detect the 3rd 101C whether liquid 1 is attached to prism 101.Therefore, the detecting device 100 with this prism 101 is set by the precalculated position at exposure device EX, thus can by CONT according to light accepting part divide 103 be subjected to light as a result tracer liquid 1 whether be attached to prism 101, namely whether liquid 1 leaks.
Figure 16 illustrates the planimetric map that the detecting device 100 that will have above-mentioned prism 101 is configured to the example on every side of Substrate table PST.In Figure 16, detecting device 100 Substrate table PST (substrate tray PH) around is installed a plurality of by predetermined space at the 3rd 101C of prism 101 under the state of upside.The light quantity of the light when control device CONT basis incides prism 101 from each detecting device 100 light projector parts 102 and the light quantity of being divided 103 light that receive by light accepting part, obtain the outgoing light quantity relatively in the attenuation rate of the incident light quantity of prism 101, according to its result of obtaining, judge whether liquid 1 is attached to prism 101, and namely whether liquid 1 leaks into the outside of Substrate table PST (substrate tray PH).When control device CONT judgement liquid 1 leaks, implement the stopping of supply action of the liquid of liquid supply mechanism 10, to the stopping of the power supply of electrical equipment, and stopping etc. from the aspiratory action of air entry.
In this form of implementation, control device CONT, according to each testing result of a plurality of detecting devices 100 and the installation site information of this detecting device 100, can easily determine the leak position of liquid 1.In addition, prism 101 is due to less, so, can be easily mounted to the position arbitrarily of exposure device EX, operation is set also good.
Above-mentioned detecting device 100 is also applicable to water-level gauge (liquid level gauge).Figure 17 arranges the schematic diagram of a plurality of ground installation and measuring device 100 for the wall that is illustrated in the case 110 that can accommodate liquid (water) 1 along short transverse (Z-direction).The wall of case 110 is transparent, and detecting device 100 is contacted with the 3rd 101C of the wall ground installation prism 101 of case 110.The light signal that is subjected in a plurality of detecting devices 100, that the detecting device 100 (light accepting part divides 103) of the liquid 1 in case 110 detected illustrates the value that light signal is low that is subjected to than the detecting device 100 (light accepting part divides 103) that liquid 1 do not detected, so, control device CONT is according to the installation site information of each testing result (being subjected to the light result) case 110 relative to the difference of the plurality of detecting device 100 of a plurality of detecting devices 100, can obtain the liquid level (water level) of the liquid 1 in case 110, like this, can obtain the amount of liquid in case 110.
Figure 18 illustrates the signal pie graph of example that the case 110 that will have forms the detecting device 100 of water-level gauge is applicable to the part of liquids recovery mechanism 20.Liquids recovery shown in Figure 180 mechanism 20 have reclaim ozzle 21, to be connected in the vacuum that reclaims ozzle 21 be 25 and be located at gas-liquid separator 22 and the exsiccator 23 in recovery tube 24 ways by recovery tube 24.By the liquid 1 that gas-liquid separator 22 separates, by the 2nd recovery tube 26, accommodate the case 110 with detecting device 100.That is,, in this form of implementation, case 110 is set and replaces the flowmeter 27 with reference to the liquids recovery mechanism 20 of Fig. 3 explanation.The testing result of detecting device 100 outputs to control device CONT, and control device CONT obtains the amount of liquid reclaimed by reclaiming ozzle 21 according to the testing result of detecting device 100.Control device CONT by relatively from reclaiming the amount of liquid that ozzle 21 reclaims and the amount of liquid of supplying with from liquid supply mechanism 10, thereby can detect recovery action abnormal of liquids recovery mechanism 20.In addition, by pipeline 28A, connect liquid recovery section 28 at case 110, in the way of this pipeline 28A, be provided with valve 28B.Control device CONT when case 110 be filled to scheduled volume or its when above (or termly) make valve 28B start, open stream 28A, with the liquid 1 in liquids recovery part 28 collection boxes 110.
In addition, in form of implementation shown in Figure 180, at supply pipe 15 and recovery tube 24 difference installation and measuring devices 100.Here, supply pipe 15 and recovery tube 24 are formed by transparent material respectively, and the detection faces 100c that makes detecting device 100 at its tube outer surface is installation and measuring device 100 in intimate contact.According to the light accepting part of the detecting device 100 that is installed on supply pipe 15 divide 103 be subjected to the light result, control device CONT can detect liquid 1 and whether be passed to supply pipe 15.Namely, the occasion that is not passed to supply pipe 15 with liquid 1 is compared, the light accepting part of occasion of circulation divides 103 the value that is subjected to light signal to diminish, so, but control device CONT divides 103 the light result tracer liquid 1 that is subjected to whether to be passed to supply pipe 15 according to light accepting part, i.e. whether the supply of liquid supply mechanism 10 action is normally carried out.Equally, control device CONT can divide according to the light accepting part of the detecting device 100 that is installed on recovery tube 24 103 be subjected to the light result, liquid 1 detected and whether be passed to recovery tube 24, i.e. whether the recovery of liquids recovery mechanism 20 action is normally carried out.Like this, detecting device 100 also can be used as the liquid whether tracer liquid 1 optically be passed to supply pipe or recovery tube and has or not sensor.
In addition, being installed near the front end that projection optics for example is PL (optical element 2 near) by the detecting device 100 that will have prism 101, is between PL and substrate P thereby also can use these detecting device 100 tracer liquids 1 whether to be filled to projection optics.
In above-mentioned form of implementation, although use optical fiber 80 or prism 101 leakage of tracer liquid 1 or detecting of liquid 1 optically, also can use the static capacity sensor to detect by electric mode with having or not.
In addition, at liquid 1, it is the occasion of water, also can by electric mode, detect the leakage of liquid 1 or having or not of liquid 1 by leakage sensor, this leakage sensor consists of 2 wires that leave certain intervals, by the leakage that has or not tracer liquid 1 of the conducting between this 2 wire.In this form of implementation, liquid 1 makes water, so, can use the leakage sensor of above-mentioned formation.At liquid 1, use the occasion of ultrapure water, ultrapure water is owing to there is no electric conductivity, so, can not having or not by leakage sensor tracer liquid 1.In this occasion, in the coating as 2 wires leaving, contain in advance electrolysed substance, can obtain electric conductivity in the moment that ultrapure water infiltrates, so the leakage sensor of available above-mentioned formation detects the liquid 1 as ultrapure water.
Certainly the characteristic of above-mentioned each form of implementation capable of being combined is used.For example, lay optical fiber 80 at the periphery of linear motor, in Substrate table PST (substrate tray PH) configuration, have the detecting device 100 of prism 101.
In addition, optical fiber or prism also can not be set to above-mentioned all positions, as long as be set to as required near the of the inside of Substrate table PST or the topworkies such as photoelectric detector or piezoelectric element.
In addition, as reference Fig. 8～as shown in Figure 10, can be wound up into Substrate table PST around or the optical fiber of configuration peripherally 80 of substrate base 41, but certainly also can be as shown in the outboard profile of Figure 19 (b), the 1st optical fiber 80C is set around Substrate table PST, the 2nd optical fiber 80D is set around substrate base 41.In addition, also configurable inside to being located at the recovery mouth 61 on Substrate table PST of optical fiber 80 (80E).Same with above-mentioned form of implementation, in Figure 19, Substrate table PST has the accessory plate formed 43 that surrounds the substrate P that is held in substrate tray PH and the recovery mouth 61 of being located at its outside on every side.Accessory plate 43 have be located at the substrate P that remains on substrate tray PH around, with tabular surface (planar section) 43A on the roughly the same plane, surface of this substrate P.Tabular surface 43A surround substrate P around be set as ring-type.In addition, in the outside of accessory plate 43 (tabular surface 43A), be provided with and reclaim mouth 61.Reclaim mouthfuls 61 for surround the slot part of the ring-type that accessory plate 43 forms (substrate P).In this form of implementation, do not configure liquid absorption member (62) in the inboard of reclaiming mouth 61.As shown in the planimetric map of Figure 19 (a), optical fiber 80E is along the all-round configuration that forms the recovery mouth 61 of ring-type.In the inside of reclaiming mouth 61, be provided with the optical fiber 80E had or not of tracer liquid 1, like this, even liquid 1 leaks from substrate P, before liquid 1 diffusion of leaking, can be detected by optical fiber 80E the liquid 1 of leakage.Therefore, when control device CONT detects existing of liquid 1 as optical fiber 80E, take to use the adequate measures such as liquid supply action of valve 13 stop liquid feed mechanisms 10, thereby can prevent the diffusion of liquid 1 or from the leakage of Substrate table PST.When optical fiber 80E being configured to the inside of reclaiming mouth 61, also liquid absorption member (62) can be configured to this recovery mouth 61.
In addition, as shown in Figure 19 (b), at the optical fiber had or not 80 of tracer liquid 1, be located at respectively the occasion in a plurality of precalculated positions of exposure device EX (Substrate table PST), corresponding to the testing result of these a plurality of optical fiber 80, control device CONT controls the action of exposure device EX.For example, control device CONT is corresponding to the position of the optical fiber 80 that liquid 1 is detected in a plurality of optical fiber 80, select liquid supply mechanism 10 liquid supply stop with the stopping of the power supply of electrical equipment at least one party's action.
Specifically, when control device CONT detects existing of liquid 1 at the 1st optical fiber 80C that is located at Substrate table PST, the liquid supply action of stop liquid feed mechanism 10, when the 2nd optical fiber 80D that is located at substrate base 41 detects existing of liquid 1, stop to the power supply of predetermined electrical equipment.Here, the predetermined electrical equipment vibrationproof unit 9 etc. that can list the linear motor 47,48 that drives Substrate table PST or substrate base 41 be carried out to the vibrationproof supporting.
When the 1st optical fiber 80C that is located at Substrate table PST detected the existence of liquid 1, the 2nd optical fiber 80D that is located at substrate base 41 and existing of liquid 1 do not detected, the liquid 1 that control device CONT judgement is leaked did not feed through to linear motor 47,48 or the vibrationproof unit 9 that drives Substrate table PST.That is, the range of scatter of the liquid 1 of control device CONT judgement leakage is narrower scope.In this occasion, what the liquid supply of control device CONT enforcement liquid supply mechanism 10 moved stops, but continues to linear motor 47,48 or 9 power supplies of vibrationproof unit.On the other hand, when the 2nd optical fiber 80D that is located at substrate base 41 detected existing of liquid 1, the liquid 1 that control device CONT judgement is leaked fed through to linear motor 47,48 or vibrationproof unit 9.That is, the range of scatter of the liquid 1 of control device CONT judgement leakage is wider scope.In this occasion, the action of the liquid supply of control device CONT stop liquid feed mechanism 10, simultaneously, stop the power supply of at least one party in linear motor 47,48 and vibrationproof unit 9.When the 2nd optical fiber 80D detected existing of liquid 1, preferably control device CONT stopped to linear motor 47,48 or 9 power supplies of vibrationproof unit, but does not stop to the power supply of exposure device EX integral body.When stopping to exposure device EX bulk supply, resuming operation after this needs the long period with stabilization.
Like this, corresponding to the 1st optical fiber 80C that is located at mutually different positions and the testing result of the 2nd optical fiber 80D, control the action of exposure device EX, so, the corresponding adequate measure of range of scatter or countermeasure with the liquid 1 leaked can be taked.Therefore, can shorten liquid 1 and leak resuming operation the needed time after occurring, can prevent the reduction of the rate of motion of exposure device EX.When the 1st optical fiber 80C that is located at Substrate table PST detects existing of liquid 1, control device CONT stops carrying out liquid supply by liquid supply mechanism 10, continuation is powered to electrical equipment, thereby can will resume operation or the needed time of stabilization is suppressed to Min..On the other hand, when the 2nd optical fiber 80D that is located at substrate base 41 detected existing of liquid 1, control device CONT stopped to the linear motor 47,48 that drives Substrate table PST or the power supply of vibrationproof unit 9.Like this, even leak into the liquid diffusion of wide region, also can prevent from leaking electricity or such infringement such as fault occurs.
In addition, control device CONT also can, corresponding to the amount by the detected liquid 1 of optical fiber 80, control the action of exposure device EX.For example, control device CONT is corresponding to the amount by the detected liquid 1 of optical fiber 80, select liquid supply mechanism 10 the liquid supply action stop and at least one party's who stops of the power supply of electrical equipment action.
Specifically, when at least one party of control device CONT in the 1st optical fiber 80C and the 2nd optical fiber 80D detects the liquid 1 of the amount that is more than or equal to predefined the 1st reference value, the liquid supply action of stop liquid feed mechanism 10, when the liquid 1 of the amount that is more than or equal to the 2nd reference value being detected, stop driving the linear motor 47,48 of Substrate table PST and substrate base 41 carried out to the power supply of the electrical equipments such as vibrationproof unit 9 of vibrationproof supporting.Here, the 2nd reference value is than the large value of the 1st reference value.
Control device CONT is more than or equal to the 1st reference value in the amount of the detected liquid 1 of at least one party of judgement in the 1st optical fiber 80C and the 2nd optical fiber 80D, during less than the 2nd reference value, the amount of the liquid 1 that judgement is leaked is small amount.In this occasion, the action of the liquid supply of control device CONT stop liquid feed mechanism 10, continue the power supply of linear motor 47,48 and vibrationproof unit 9.On the other hand, when the amount of at least one party detected liquid 1 of judgement in the 1st optical fiber 80C and the 2nd optical fiber 80D was more than or equal to the 2nd reference value, the amount of the liquid 1 that control device CONT judgement is leaked was more amount.In this occasion, the liquid supply of control device CONT stop liquid feed mechanism 10 action, simultaneously, stop to the power supply of at least one party in linear motor 47,48 and vibrationproof unit 9.When optical fiber 80C, 80D detected the liquid 1 of the amount that is more than or equal to the 2nd reference value, preferably control device CONT stopped the power supply of linear motor 47,48 or vibrationproof unit 9, but does not stop to the power supply of exposure device EX integral body.This is because when stopping to exposure device EX bulk supply, resuming operation after this needs the long period with stabilization.
Like this, can control the action of exposure device EX corresponding to the amount of the liquid 1 detected by optical fiber 80, in this occasion, can take the corresponding adequate measures of amount with the liquid 1 leaked.Therefore, resuming operation the needed time after the leakage that can shorten liquid 1 occurs, prevent the decline of the operation ratio of exposure device EX.
In above-mentioned form of implementation, surround Substrate table PST and substrate base 41 around configure 1 optical fiber 80, but also can by a plurality of optical fiber surround Substrate table PST and substrate base 41 around.For example, can respectively configure on 4 limits of substrate base 41 1 optical fiber 80, with amount to 4 optical fiber 80 surround substrate base 41 around.Like this, 1 optical fiber therein detects the occasion of liquid 1, and which optical fiber reacts by inquiry, thereby can easily determine the leakage place of liquid 1.
In addition, as described above, when the projection optics position relationship that is PL and Substrate table PST becomes abnormal etc., can not be below projection optics be PL maintenance liquid 1, produce the problem that liquid 1 leaks.Therefore, in order to prevent the leakage of liquid 1, but the also moving range of restricting substrate platform PST.Below with reference to Figure 20, describe.
In Figure 20, Substrate table PST has as flat site the 1st regional LA1, and the 1st regional LA1 comprises substrate P (or the false substrate D P) surface that is held in substrate tray PH and is in the tabular surface 43A of the accessory plate 43 of identical faces with this substrate P surface.In addition, in the position relative with the 1st regional LA1, be provided with the 2nd regional LA2 as flat site, the 2nd regional LA2 comprise projection optics be image planes side front end face (following) 2a of PL and below this 2a be in the following part of the board member 2P of identical faces.Here, liquid 1 remains between the 1st tabular surface and the 2nd tabular surface on Substrate table PST, forms immersion zone AR2, and the 2nd tabular surface comprises the front end face 2a that projection optics is PL, relative with above-mentioned the 1st tabular surface.Therefore, the 1st regional LA1 of aforesaid substrate platform PST with relative with the 1st regional LA1, to comprise projection optics be that the 2nd regional LA2 of the front end face 2a of PL is the zone that can keep liquid.Liquid 1 is held between the part and the 2nd regional LA2 of the 1st regional LA1, forms immersion zone AR2.The 1st regional LA1 and the 2nd regional LA2 not necessarily leave no choice but for tabular surface, if kept liquid 1, on surface, also can have curved surface or concavo-convex.
In this form of implementation, the liquid 1 of immersion zone AR2 also touch be disposed at projection optics be PL fore-end optical element 2 around, the supply ozzle 14 with liquid supply port 14K and the part with recovery ozzle 21 of liquids recovery mouth 21K.That is, can keep the 2nd regional LA2 of liquid 1 to comprise the liquid contact surface ground formation of supplying with ozzle 14 and reclaiming ozzle 21.
In this form of implementation, control device CONT is corresponding to the position relationship of the 1st regional LA1 and the 2nd regional LA2, the movement of restricting substrate platform PST.Specifically, as shown in Figure 20 (a), in occasion liquid 1 is held between the 1st regional LA1 and the 2nd regional LA2, liquid 1 can be remained to the 1st regional LA1 such shown in Figure 20 (b) and the position relationship of the 2nd regional LA2.Yet, make Substrate table PST than the occasion that moves of court+directions X more of position relationship shown in Figure 20 (b), the part of immersion zone AR2 reaches more lateral compared with the 1st regional LA1, and generation can not remain to liquid 1 situation between the 1st regional LA1 and the 2nd regional LA2.Now, control device CONT judgement produces extremely at the position relationship of the 1st regional LA1 and the 2nd regional LA2, the movement of restricting substrate platform PST.Specifically, control device CONT stops the movement of Substrate table PST.Like this, can prevent the problems such as outflow of liquid 1.
Here, whether control device CONT produces at the position relationship of the 1st regional LA1 and the 2nd regional LA2 according to the measurement result judgement of laser interferometer 46 extremely.Control device CONT is detected the position of the XY direction of Substrate table PST by laser interferometer 46, according to this position probing result, obtain the position relationship that positional information relative the 2nd regional LA2, the 1st regional LA1 is the 1st regional LA1 and the 2nd regional LA2.Information about the size of the 1st regional LA1 and the 2nd regional LA2 is pre-stored within control device CONT.In addition, about the information of the size that is formed at the immersion zone AR2 between the 1st regional LA1 and the 2nd regional LA2 also for example by experiment or simulation obtain in advance, be stored in control device CONT.In addition, obtain in advance the exceptional value about the position relationship of the 1st regional LA1 and the 2nd regional LA2 at control device CONT, be stored in control device CONT.Here, above-mentioned exceptional value is to become the value (relative distance) that liquid 1 can not be held in to the position relationship between the 1st regional LA1 and the 2nd regional LA2, when relative the 2nd regional LA2 of the 1st regional LA1 surpasses above-mentioned exceptional value, can not keep liquid 1 between the 1st regional LA1 and the 2nd regional LA2.
Control device CONT, according to the measurement result of laser interferometer 46, while in the position of relative the 2nd regional LA2 of the 1st regional LA1, surpassing above-mentioned exceptional value, limits the movement of (stopping) Substrate table PST.Like this, can prevent the problems such as outflow of liquid 1.
In addition, control device CONT, according to the measurement result of laser interferometer 46, when the position of relative the 2nd regional LA2 of the 1st regional LA1 surpasses above-mentioned exceptional value, also can not stop the movement of Substrate table PST, but changes the moving direction of Substrate table PST.Specifically, in Figure 20, move by Substrate table PST court+directions X, when relative the 1st regional LA1 of the 2nd regional LA2 becomes abnormal position relationship, control device CONT make Substrate table PST for example court-directions X move.Like this, also can prevent the problems such as outflow of liquid 1.
In addition, control device CONT also can form such formation, that is, when the 1st regional LA1 surpasses above-mentioned exceptional value with the position relationship generation of the 2nd regional LA2 position abnormal, relative the 2nd regional LA2 of the 1st regional LA1, the action of confined liquid feed mechanism (10).Specifically, control device CONT, when the generation of the position relationship at the 1st regional LA1 and the 2nd regional LA2 is abnormal, stops the liquid supply action by liquid supply mechanism (10).Like this, can prevent the problems such as outflow of liquid 1.Perhaps, when relative the 1st regional LA1 of the 2nd regional LA2 became out-of-the way position and concerns, control device CONT reduced the liquid supply amount (the liquid supply amount of time per unit) of liquid supply mechanism (10).Perhaps, control device CONT also can form such formation, that is, stop the power supply of linear motor (47,48) or antihunting device (9) when the position relationship of the 1st regional LA1 and the 2nd regional LA2 produces when abnormal, or stop air-breathing from air entry (42A).
On the other hand, for example, after the immersion exposure of substrate P finishes, stop the feed fluid by liquid supply mechanism (10), by liquids recovery mechanism (20), being reclaimed on substrate P after the liquid 1 on (Substrate table PST), do not keep liquid 1 between the 1st regional LA1 and the 2nd regional LA2.In this occasion, control device CONT removes the mobile restriction of Substrate table PST.Namely, control device CONT is during liquid supply mechanism (10) feed fluid 1, the moving range of Substrate table PST is restricted to and liquid 1 can be held in to the 1st scope between the 1st regional LA1 and the 2nd regional LA2, during the supply of liquid supply mechanism (10) stop liquid 1, be restricted to the 2nd scope than above-mentioned the 1st wide ranges.Namely, liquid 1 being held in to projection optics, it is the occasion between PL and Substrate table PST (substrate P), control device CONT is limited to the 1st scope by the moving range of Substrate table PST, liquid 1 not being held in to projection optics, be the occasion between PL and Substrate table PST (substrate P), allow the movement of the Substrate table PST in the 2nd scope than the 1st wide ranges.Like this, for example, in the exposure process of substrate P, can be between PL and Substrate table PST (substrate P), to continue well to keep liquid 1 at projection optics, for example can successfully carry out action after this, namely Substrate table PST moves to the predetermined action such as action of the loading and unloading position of substrate P.
Figure 21 is the figure that other form of implementation of the present invention is shown, and Figure 21 (a) is outboard profile, and Figure 21 (b) is for watching the planimetric map of Substrate table from top.In Figure 21 (a), at projection optics, be PL optical element 2 around, the ozzle member 18 with liquid supply port 14K and liquids recovery mouth 21K is set.In this form of implementation, ozzle member 18 is for surrounding the annular component arranged laterally of optical element 2 in the top of substrate P (Substrate table PST).At ozzle member 18 and 2 of optical elements, be provided with gap, from the vibration of optical element 2 keep apart by predetermined supporting device support column nozzle member 18.
Ozzle member 18 is located at the top of substrate P (Substrate table PST), has the liquid supply port 14K relatively configured with this substrate P surface.In this form of implementation, ozzle member 18 has 2 liquid supply port 14K.Liquid supply port 14K is located at the following 18a of ozzle member 18.
In addition, ozzle member 18 is located at the top of substrate P (Substrate table PST), has the liquids recovery mouth 21K relatively configured with this substrate P surface.In this form of implementation, ozzle member 18 has 2 liquids recovery mouth 21K.Liquids recovery mouth 21K is located at the following 18a of ozzle member 18.
Liquid supply port 14K, 14K are located at and clamp the De Ge position, X-direction both sides that projection optics is the AR1 of view field of PL, and liquids recovery mouth 21K, the relative projection optics of 21K are that the AR1 of view field of PL compares and is located at more lateral with liquid supply port 14K, 14K.The projection optics of this form of implementation be the AR1 of view field of PL be set as take Y direction as vertically, X-direction is the horizontal rectangle at plan view.
Following (towards the face of substrate P side) 18a of ozzle member 18 is roughly tabular surface, and following (liquid contact surface) 2a of optical element 2 is also tabular surface, and the following 18a of ozzle member 18 and the following 2a of optical element 2 are in same level substantially.Like this, can form well immersion zone AR2 at wide region.Can keep the 2nd regional LA2 of liquid 1 to become in the following 18a of the following 2a of optical element 2 and ozzle member 18 compared with the zone of reclaiming mouthful 21K inside.
On Substrate table PST, be provided with recess 55, substrate tray PH is disposed at recess 55.Beyond recess 55 in Substrate table PST top 57 becomes the surperficial such tabular surface (flat) of equal height (same plane) substantially with the substrate P that is held in substrate tray PH.Can keep the 1st regional LA1 of liquid 1 to become the zone that comprises substrate P surface and top 57.
As shown in Figure 21 (b), orthogonal 2 marginal portions configuration moving lens 45 of rectangular Substrate table PST in plan view.In addition, on Substrate table PST, reference feature 300 is configured to the precalculated position in the outside of substrate P.In reference feature 300, concern that by preposition setting is detected reference mark PFM by not shown substrate adjustment and is detected reference mark MFM by the mask adjustment.In the substrate of this form of implementation is harmonized system, for example adopt such FIA (field picture adjustment) mode that is disclosed in Japanese kokai publication hei 4-65603 communique, this FIA mode makes Substrate table PST static, to shine on mark from the illumination light such as white light of Halogen lamp LED, by imaging apparatus image to the mark that obtains in the predetermined shooting visual field, made a video recording, process the position of mark is measured by image.In addition, in the mark of this form of implementation is harmonized system, for example adopt such VRA (the graticule directly perceived is harmonized) mode that is disclosed in Japanese kokai publication hei 7-176468 communique, this VRA mode light shines mark, the marked image data obtained by shootings such as ccd video cameras is carried out to the image processing, the certification mark position.The top 301A of reference feature 300 becomes tabular surface substantially, is located at the top 57 cardinal principle equal heights (same plane) with the substrate P surface that is held in Substrate table PST and Substrate table PST.It is the effect of 56 reference field that the top 301A of reference feature 300 can play as focus detection.
In addition, substrate adjustment system also detects the alignment mark AM be formed on substrate P.As shown in Figure 21 (b), on substrate P, form a plurality of exposure area S1～S24, alignment mark AM arranges a plurality of corresponding to a plurality of exposure area S1～S24 on substrate P.
In addition, on Substrate table PST, the precalculated position configuration substrate P outside for example is disclosed in such uneven illumination sensor 400 of Japanese kokai publication sho 57-117238 communique as the measurement sensor.Uneven illumination sensor 400 has upper plate rectangular in plan view 401.The top 401A of upper plate 401 becomes tabular surface substantially, is located at the top 57 cardinal principle equal heights (same plane) with the substrate P surface kept by Substrate table PST and Substrate table PST.401A is provided with the pin hole part 470 that can see through light on upper plate 401.Beyond pin hole part 470 in top 401A, covered by light-proofness materials such as chromium.
In addition, precalculated position on Substrate table PST, the substrate P outside, the spatial image survey sensor 500 of setting example as being disclosed in TOHKEMY 2002-14005 communique is as the measurement sensor.Spatial image survey sensor 500 has upper plate rectangular in plan view 501.The top 501A of upper plate 501 becomes tabular surface substantially, is located at the top 57 cardinal principle equal heights (the same face) with the substrate P surface that is held in Substrate table PST and Substrate table PST.501A is provided with and can passes through the slit part 570 of light on upper plate 501.Beyond slit part 570 in top 501A, covered by screening property materials such as chromium.
In addition, on Substrate table PST, also be provided with and for example be disclosed in the such exposure sensor (illuminance transducer) 600 of Japanese kokai publication hei 11-16816 communique, the top 601A of the upper plate 601 of this exposure sensor 600 is located at the top 57 cardinal principle equal heights (same plane) with the substrate P surface that is held in Substrate table PST or Substrate table PST.
In addition, in the side of Substrate table PST, aqueduct member 89 is set with surrounding this Substrate table PST.Aqueduct member 89 recyclable (can keep), from substrate P or the liquid 1 that spills of Substrate table PST, is located at the outside of top (tabular surface) 57 of Substrate table PST.In addition, but the optical fiber had or not 80 of tracer liquid 1 is arranged in the internal configurations of this aqueduct member 89.When the optical fiber 80 of aqueduct member 89 detected existing of liquid 1, control device CONT and above-mentioned form of implementation were similarly taked the adequate measures such as liquid supply action of stop liquid feed mechanism (10).
In this form of implementation, when being exposed, substrate P certainly in substrate P, forms immersion zone AR2, when for example reference mark MFM of measuring basis member 300, use sensor 400,500,600 to measure while processing, also on upper plate 301,401,501,601, form respectively immersion zone AR2.Then, carry out processing by the measurement of liquid 1.For example, when for example the reference mark MFM on reference feature 300 measures by 1 pair of liquid, the zone of top 301A in the 1st regional LA1, that comprise reference feature 300 is relative with the 2nd regional LA2, is full of liquid 1 between the part of the 1st regional LA1 and the 2nd regional LA2.When using uneven illumination sensor 400 to carry out processing by the measurement of liquid 1, the zone of the top 401A that comprises upper plate 401 in the 1st regional LA1 is relative with the 2nd regional LA2, is full of liquid 1 between the part of the 1st regional LA1 and the 2nd regional LA2.Equally, when using sensor 500,600 to carry out processing by the measurement of liquid 1, the zone of the top 501A, the 601A that comprise upper plate 501,601 in the 1st regional LA1 is relative with the 2nd regional LA2, is full of liquid 1 between the part of the 1st regional LA1 and the 2nd regional LA2.
During by liquid supply mechanism (10) feed fluid 1, control device CONT is restricted to the 1st scope SR1 shown in Figure 21 (b) by the moving range of Substrate table PST in order at (on the 1st regional LA1) on Substrate table PST, to form immersion zone AR2.In Figure 21 (b), symbol LA2a be illustrated in the 2nd regional LA2 in the scope that can keep liquid 1 be configured in the 1st regional LA1 +position during Y side and-X side.In Figure 21 (b), for the purpose of simplifying the description, illustrate that projection optics is the occasion that the optical axis AX (the 2nd regional LA2) of PL moves relative to Substrate table PST (the 1st regional LA1) here.Equally, symbol LA2b illustrate the 2nd regional LA2 be configured in the 1st regional LA1 +position during Y side and+X side.The 2nd regional LA2c illustrate the 2nd regional LA2 be configured in the 1st regional LA1-position during Y side and+X side.Symbol LA2d illustrate the 2nd regional LA2 be configured in the 1st regional LA1-position during Y side and-X side.
The zone that connects the inboard at each the 2nd regional LA2a～LA2d De Ge center (projection optics is the optical axis AX of PL) here, is the 1st scope SR1.Like this, during liquid supply mechanism (10) feed fluid 1, be restricted to the 1st scope SR1 by the moving range by Substrate table PST, thereby can often liquid 1 be held between the 1st regional LA1 and the 2nd regional LA2, prevent the problems such as spilling of liquid 1.
On the other hand, not during feed fluid 1, control device CONT is restricted to the 2nd scope SR2 wider than the 1st scope SR1 by the moving range of Substrate table PST in liquid supply mechanism (10).Here, the 1st scope SR1 is contained in the 2nd scope SR2.Like this, during the supply of liquid supply mechanism (10) stop liquid 1, by being restricted to the 2nd scope SR2 wider than above-mentioned the 1st scope SR1, thereby can successfully carry out the predetermined actions such as action that Substrate table PST moves to the loading and unloading position of substrate P.
Above, specifically understand each form of implementation of the present invention, but in the present invention, when the control device by being located at exposure device detects when abnormal, control device is controlled suitable mechanism or the device of exposure device, prevents from advance leaking waiting the electric leakage caused, the attraction etc. of leaking.Here, the block diagram of Figure 23 is concentrated the abnormal detection position of detection, control device is shown, reaches and controlled relation partly by what control device was controlled.The control device of exposure device is connected with the various pick-up units of being located at exposure device inside, these pick-up units as described above for example with good grounds supply side flowmeter or reclaim the side flowmeter separately or its difference in flow the abnormal supply side of (liquid communication)/recovery side flowmeter extremely detected, measure the platform position of Substrate table with the monitor station malposition platform interferometer of (causing thus the generation of leaking), detect the focus state of Substrate table, detect the focus detection system that puts into effect malposition (causing thus the generation of leaking), detect the leakage detector 700 of leak (extremely) that be attached to the optical fiber that is located at Substrate table or bedplate or prism, 701, and according to the various detections such as the abnormal water-level gauge of the water level detecting yield of collection box system.Control device can detect system from these and receive abnormal signal.Now, reference signal and the signal received from each detecting device that control device is relatively more predetermined, can judge it is to be normal signal or abnormal signal.
The control device of exposure device also is connected with various relevant apparatus such as liquid (pure water) manufacturing installation of exposure device outside, liquid (pure water) temperature control equipment, developing apparatus, base board delivery device etc., but the abnormal signal of these relevant apparatus of reception notification.In addition, but the control device of exposure device also reception notification be provided with the abnormal signal in the workshop of exposure device.In addition, be provided with abnormal, the earthquake of capacity of abnormal, the pure water that supplies to exposure device that extremely can list the toilet that configured exposure device in workshop etc. of exposure device or electric power etc. or fire etc.The reference signal that control device also can relatively be scheduled to and the signal received from each relevant apparatus, judge as normal signal or abnormal signal.
The control device of exposure device also can be as above-mentioned each form of implementation explanation and controlled device, for example liquid supply mechanism, liquids recovery mechanism, table apparatus, particularly the various ingredients such as sensor, vibrationproof unit, topworks such as platform air bearing, platform linear motor, substrate tray absorption system, photomultiplier (Off オ ト マ Le) connect, but the abnormal signal of each ingredient of reception notification.In addition, in the occasion do not had for detection of the sensor of earthquake,
Control device also can receive abnormal signal from this seismic sensor.In addition, the occasion having be used to the water quality sensor of the quality (ratios of the impurity such as temperature, dissolved oxygen concentration, organism) of measuring liquid 1, also can receive abnormal signal from this water quality.
Below, the control action of control device is described simply with reference to Figure 24.Control device illustrates abnormal signal from the receptions such as relevant apparatus 1～4 of the outside of the detection system of exposure device inside or exposure device.The signal that abnormal signal for example exerts an influence for the circulation of the liquid of (and then recovery) to supplying with for immersion exposure is shown.Now, the signal that control device also can relatively receive and reference signal, the signal that judgement receives is abnormal signal.Then, control device is determined and has been produced abnormal position according to abnormal signal.Now, control device also can be given the alarm by alarm device.Then, the abnormal position of control device and generation correspondingly judges should control which device, control signal is delivered to this device, abnormal situation is taken measures.For example, the occasion of leak of liquid at the leakage detector by being located at Substrate table (optical fiber etc.), detected, control device stops respectively to the liquid supply undertaken by liquid supply mechanism, controls by platform air-breathing, and the power supply of platform linear motor, substrate tray absorption system, sensor, vibrationproof unit, topworks that the platform that system carries out moves, undertaken by platform air bearing and substrate tray absorption system corresponding to detection signal, on the other hand, the liquids recovery of liquids recovery mechanism is proceeded.Stop the action of which device, judged according to place and its degree (size of signal) of leak of liquid by control device.According to the size of detection signal, platform linear motor or sensor electrical equipment are worked on, the only action of stop liquid feed mechanism.
As described above, the liquid 1 of this form of implementation is used pure water.Pure water, in easily a large amount of acquisitions such as semiconductor manufacturing plants, simultaneously, does not have the photoresist on substrate P and optical element (lens) etc. is produced to dysgenic advantage.In addition, pure water is few to the harmful effect of environment, and the amount of impurity is extremely low, so, also have the surface of cleaning base plate P and be located at the effect on surface of optical element that projection optics is the front end face of PL.
In addition, pure water (water) is roughly 1.44 to the refractive index n of the exposure light EL of wavelength 193nm left and right, so, in the occasion of using ArF excimer laser (wavelength 193nm) as the light source of exposure light EL, the short wavelength turns to 1/n on substrate P, namely about 134nm, can obtain high-resolution.In addition, enlarge about n doubly due to depth of focus with in air, comparing, namely approximately 1.44 times, so, as long as the occasion the depth of focus of the occasion same degree of guaranteeing and using in air gets final product, can further increase the numerical aperture that projection optics is PL, the exploring degree is improved.
In this form of implementation, optical element 2 is installed on to the front end that projection optics is PL, but the optical element that is installed on projection optics and is the PL front end also can be used to adjusting the optical sheet of optical characteristics such as the aberration that projection optics is PL (spherical aberration, coma etc.), or is the planopaallel plate of transmissive exposure light EL.In addition, making the optical element contacted with liquid 1 is than the planopaallel plate of lens cheapness, like this, even the transporting of exposure device EX, assemble, have while adjusting etc. that to cause projection optics be the transmissivity of PL, the illumination of the exposure light EL on substrate P, and the material (being organism etc. such as silicon) of the uniformity decreases of Illumination Distribution be attached to its planopaallel plate, only need to before being about to feed fluid 1, change this planopaallel plate, than the optical element contacted with liquid 1, be the occasion of lens, have advantages of that its replacement cost reduces.Namely, the irradiation of exposure light EL is from the surface contamination of the optical element that will contact with liquid 1 adhering to of the impurity disperse particle or liquid 1 that photoresist produces etc., so, need to change termly this optical element, but by making this optical element, be cheap planopaallel plate, thereby compare with lens, the cost of changing parts is low, and can shorten and change the needed time, can suppress the rising of maintenance cost (operating cost) and the decline of processing energy.
The liquid 1 of this form of implementation is water, but also can be the liquid beyond water, and for example the light source at exposure light EL is F 2The occasion of laser, due to this F 2Laser does not see through water, so, in this occasion, as liquid 1, can use transmissive F 2The liquid of the fluorine systems such as fluorine system oil or mistake fluorinated polyester (PFPE) of laser.In addition, as liquid 1, also can use exposure light EL is existed to high as far as possible, the relative projection optics of transmittance, refractive index is the stable liquid (for example cedar oil) of PL and the photoresist that is coated on the substrate P surface.
In above-mentioned each form of implementation, the shape of above-mentioned ozzle without particular limitation of, for example also can by 2 pairs of ozzles, be carried out supply or the recovery of liquid 1 about the long limit of the AR1 of view field.And, in this occasion, from+directions X or-directions X all can carry out supply and the recovery of liquid 1, so, also can supply with ozzle and reclaim ozzle along configuration with being arranged above and below.
Substrate P as above-mentioned each form of implementation; the glass substrate that the not only semiconductor wafer of applicable semiconductor devices manufacture use, and applicable display device is used, the ceramic wafers that thin-film head is used or the mask used at exposure device or the master (synthetic quartz, silicon wafer) of graticule etc.
In addition, in above-mentioned each form of implementation, adopting projection optics is the exposure device be full of by liquid partly between PL and substrate P, but the liquid immersion exposure apparatus that the present invention also moves applicable to the platform of the substrate that makes to keep exposure object in liquid bath, or on platform, form predetermined depth liquid tank, keep therein the liquid immersion exposure apparatus of substrate.In liquid bath, make to keep structure and the exposure actions of the liquid immersion exposure apparatus that the platform of the substrate of exposure object moves for example at length to be recorded in Japanese kokai publication hei 6-124873 communique, in addition, on platform, form the liquid tank of predetermined depth, keep therein structure and the exposure actions of the liquid immersion exposure apparatus of substrate for example at length to be recorded in Japanese kokai publication hei 10-303114 communique or United States Patent (USP) 5,825,043, as long as the application of this world is specified or the decree of the country of selection is allowed, the content of these documents records is cited as a part described herein.
As exposure device EX, except synchronizing moving mask M and substrate P, the figure of mask M is carried out the scanning exposure apparatus (step-scan exposure device) of the substep scan mode of scan exposure, also applicable to making the figure to mask M under the static state of mask M and substrate P expose together, make successively the projection aligner (stepping exposure device) of the Step-and-repeat mode of substrate P minute moved further.In addition, the present invention is also applicable on substrate P, partly overlapping at least the exposure device that 2 figures carry out the substep suture way of transfer printing.
In addition, the present invention is also applicable to the exposure device of two bench-types, and the exposure device of this pair bench-type has 2 platforms, and these 2 platforms can load respectively the processed substrates such as wafer and move independently towards the XY direction.The structure of the exposure device of two bench-types and exposure actions for example are disclosed in No. 10-214783, No. 10-163099, Japanese kokai publication hei and Japanese kokai publication hei (with United States Patent (USP) 6,341,007,6,400,441,6,549,269 and 6,590,634 correspondences), No. 2000-505958, Japanese Unexamined Patent Application Publication is (with United States Patent (USP) 5,969,441 correspondences) or United States Patent (USP) 6,208,407, as long as the application of this world is specified or the decree of the country of selection is allowed, the content of these documents records is cited as a part described herein.
In addition, as be disclosed in Japanese kokai publication hei 11-135400 communique, the present invention is applicable to the exposure device with Substrate table and test desk, and this Substrate table keeps substrate P, and this test desk has various measurement members or sensor.In this occasion, in projection optics system and between above test desk, can keep liquid, at this test desk, can implement the countermeasures such as above-mentioned water leak detectors.
Kind as exposure device EX, be not limited to the exposure device of semiconductor element graph exposure to the semiconductor manufacture use of substrate P, also can be adapted to widely the liquid crystal display cells manufacture with or the exposure device used of display manufacturing, for the manufacture of the exposure device of thin-film head, imaging apparatus (CCD) or graticule or mask etc. etc.
At Substrate table PST or mask platform MST, use the occasion of linear motor, use the air suspension type of air bearing and use any in the magnetic levitation type of Lorentz force or reactance power all can use.In addition, each PST, MST can be the type moved along ways, also can be do not arrange ways without the ways type.At platform, use the example of linear motor, be disclosed in United States Patent (USP) 5,623,853 and 5,528,118, as long as the application of this world is specified or the decree of the country of selection is allowed, the content of these document records is cited as a part described herein.
As the driving mechanism of each PST, MST, also can use planar motor, this planar motor makes the magnet unit of 2 dimension distributed magnets relative with the armature unit of 2 dimension ground configuration coils, drives each PST, MST by electromagnetic force.In this occasion, as long as the either party in magnet unit and armature unit is connected in to platform PST, MST, the opposing party of magnet unit and armature unit is located to the all-moving surface side of platform PST, MST.
It is that PL ground use rack component mechanically escapes into floor (the earth) that the mobile counter-force produced by Substrate table PST also can not be delivered to projection optics.The disposal route of this counter-force for example is disclosed in United States Patent (USP) 5 in detail, 528,118 (Japanese kokai publication hei 8-166475 communiques), as long as the application of this world is specified or the decree of the country of selection is allowed, the content of these documents records is cited as a part described herein.
It is that PL ground is used rack component mechanically to escape into floor (the earth) that the mobile counter-force produced of Substrate table PST also can not be delivered to projection optics.The disposal route of this counter-force for example is disclosed in United States Patent (USP) 5 in detail, 874,820 (Japanese kokai publication hei 8-330224 communiques), as long as the application of this world is specified or the decree of the country of selection is allowed, the content of these documents records is cited as a part described herein.
The exposure device EX of the application's form of implementation manufactures by the various subsystems that keep the mechanical precision of being scheduled to, electric precision, the assembling of optical accuracy ground to comprise each cited inscape of the application's claim.In order to ensure these various precision, in the front and back of this assembling, various optical system are carried out be used to reaching the adjustment of optical accuracy, to various machinery, be to carry out be used to reaching the adjustment of mechanical precision, various electric systems being carried out be used to reaching the adjustment of electric precision.Assembling procedure from various subsystems to exposure device comprises the distribution connection of the mutual mechanical connection of various subsystems, circuit, the pipe arrangement connection of pneumatic circuit etc.At this, from before the assembling procedure of various subsystems at exposure device, certainly also exist each subsystem to divide other assembling procedure.In case various subsystems finish at the assembling procedure of exposure device, comprehensively adjust, and guarantee the various precision as exposure device integral body.The manufacture of exposure device is preferably in the toilet that temperature and cleanliness factor etc. obtain managing and carries out.
The micro element of semiconductor devices etc. as shown in Figure 12, through the step 201 of the functional performance design of carrying out micro element, make step 202 based on the mask of this design step, manufacture step 203 as the substrate of the base material of device, by the exposure device EX of above-mentioned form of implementation, the graph exposure of mask walked to 206 etc. to the exposure-processed step 204 of substrate, device assembling step (comprising cutting action, bonding process, packaging process) 205, detection and manufacture.
The possibility of utilizing on industry
According to the present invention, can detect the abnormal of the interior arrangement of the exposure device that immersion exposure is exerted an influence or outside relevant apparatus, can suppress or the leakage of the liquid of the use that reduces to expose or immerse the impact on peripheral device member or exposure actions, so, can maintain the good state of expensive exposure device, carry out the immersion exposure of good accuracy and process.Like this, can manufacture the device with desired performance.

Claims (24)

1. one kind shines substrate to the exposure device that substrate exposes by liquid by exposure light, it is characterized in that comprising:
Projection optical system, look like figure to project on described substrate by liquid; And
Air entry, be configured in described projection optical system below, by with making gas being connected of attraction system, flowing into,
In order to prevent that described liquid from flowing into described air entry together with described gas, stop the inflow from the described gas of described air entry when detecting when abnormal.
2. exposure device according to claim 1 is characterized in that comprising:
Keep aforesaid substrate and transportable movable link;
Substrate base, described movable link moves above this substrate base; With
Air bearing, have above-mentioned air entry, for the top of described substrate base, above-mentioned movable link moved,
Above-mentioned air entry carries out air-breathing to the gas between above-mentioned movable link and aforesaid substrate base plate top.
3. exposure device according to claim 2 is characterized in that:
The above-mentioned position relationship that extremely comprises above-mentioned movable link and above-mentioned projection optical system abnormal.
4. exposure device according to claim 3 is characterized in that:
Above-mentioned abnormal position relationship is under above-mentioned projection optical system, to keep the state of liquid.
5. exposure device according to claim 2 is characterized in that comprising:
The 1st zone on above-mentioned movable link; With
Comprise the image planes side fore-end of above-mentioned projection optical system, 2nd zone relative with above-mentioned the 1st zone,
Aforesaid liquid is held between at least a portion in above-mentioned the 1st zone and above-mentioned the 2nd zone and forms the immersion zone, the above-mentioned position relationship that extremely comprises above-mentioned the 1st zone and above-mentioned the 2nd zone abnormal.
6. exposure device according to claim 5 is characterized in that:
At least a portion that above-mentioned abnormal position relationship comprises above-mentioned immersion zone reaches the state of more lateral compared with above-mentioned the 1st zone.
7. exposure device according to claim 5 is characterized in that:
When above-mentioned the 1st zone and the position relationship in above-mentioned the 2nd zone abnormal being detected, stop the movement of above-mentioned movable link.
8. exposure device according to claim 1 is characterized in that:
The above-mentioned leakage that extremely comprises liquid.
9. exposure device according to claim 1 is characterized in that comprising:
Detecting device, the leakage of tracer liquid; With
Control device, based on the testing result of above-mentioned detecting device, control the action of device.
10. exposure device according to claim 9 characterized by further comprising:
Electrical equipment; With
The liquid supply mechanism of feed fluid,
Above-mentioned detecting device is located at respectively a plurality of precalculated positions,
Above-mentioned control device is according to the position of the detecting device that detects aforesaid liquid, selects to stop from the liquid supply of aforesaid liquid feed mechanism and stops at least one action the power supply of above-mentioned electrical equipment.
11. exposure device according to claim 9 characterized by further comprising:
Electrical equipment; With
The liquid supply mechanism of feed fluid,
Above-mentioned control device is according to the amount by the detected liquid of above-mentioned detecting device, selects to stop from the liquid supply of aforesaid liquid feed mechanism and stops at least one action the power supply of above-mentioned electrical equipment.
12. exposure device according to claim 9 is characterized in that:
Above-mentioned detector configurations is at the Substrate table that keeps aforesaid substrate.
13. exposure device according to claim 9 is characterized in that:
Above-mentioned detector configurations is to propping up movably the substructure member of honouring the Substrate table that aforesaid substrate keeps.
14. exposure device according to claim 9 is characterized in that:
Above-mentioned detector configurations is at the periphery of the electromagnetic drive source of the Substrate table for mobile maintenance aforesaid substrate.
15. exposure device according to claim 9 is characterized in that:
Above-mentioned detector configurations is in the inside of the liquids recovery mouth of being located at the Substrate table that keeps aforesaid substrate.
16. exposure device according to claim 15 is characterized in that:
Around the substrate that is held in the aforesaid substrate platform, have with the surface of this substrate and roughly be in conplane flat, aforesaid liquid reclaims the outside that mouth is located at above-mentioned flat.
17. exposure device according to claim 15 is characterized in that:
Aforesaid liquid reclaim mouth comprise form surround aforesaid substrate around slot part.
18. exposure device according to claim 9 is characterized in that:
Above-mentioned detecting device is the leakage of tracer liquid optically.
19. exposure device according to claim 9 is characterized in that:
Above-mentioned detecting device comprises optical fiber.
20. exposure device according to claim 1 is characterized in that comprising:
Liquid supply mechanism, arrive liquid supply between above-mentioned projection optical system and aforesaid substrate;
Liquids recovery mechanism, reclaim the liquid of being supplied with by the aforesaid liquid feed mechanism,
It is abnormal that the above-mentioned recovery that extremely comprises the aforesaid liquid recovering mechanism is moved.
21. exposure device according to claim 20 is characterized in that:
By the amount of the liquid relatively supplied with from the aforesaid liquid feed mechanism and the amount of the liquid reclaimed by the aforesaid liquid recovering mechanism, detect the remarkable action of aforesaid liquid recovering mechanism.
22. exposure device according to claim 1 characterized by further comprising:
Liquid supply mechanism, arrive liquid supply between above-mentioned projection optical system and aforesaid substrate,
It is abnormal that the above-mentioned supply that extremely comprises the aforesaid liquid feed mechanism is moved.
23. exposure device according to claim 1 characterized by further comprising:
Liquid supply mechanism, arrive liquid supply between above-mentioned projection optical system and aforesaid substrate;
Liquids recovery mechanism, reclaim the liquid of being supplied with by the aforesaid liquid feed mechanism,
The above-mentioned mechanicalness that extremely comprises the aforesaid liquid recovering mechanism or electrical resistance abnormal.
24. exposure device according to claim 1 characterized by further comprising:
Liquid supply mechanism, arrive liquid supply between above-mentioned projection optical system and aforesaid substrate,
The above-mentioned mechanicalness that extremely comprises the aforesaid liquid feed mechanism or electrical resistance abnormal.
CN2008101733964A 2003-07-28 2004-07-26 Exposure apparatus, method for manufacturing device Expired - Fee Related CN101644900B (en)

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JP6975630B2 (en) * 2017-02-27 2021-12-01 株式会社Ｓｃｒｅｅｎホールディングス Board processing equipment and board processing method

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CN106707699B (en) 2018-11-13
CN101436001A (en) 2009-05-20
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CN101644900A (en) 2010-02-10
CN101436002B (en) 2011-07-27
CN101436002A (en) 2009-05-20
CN101436000B (en) 2011-05-11
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CN100452293C (en) 2009-01-14
CN101644899A (en) 2010-02-10
CN101644899B (en) 2012-02-22

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