JP6975630B2 - Board processing equipment and board processing method - Google Patents

Description

The present invention relates to a substrate processing apparatus and a substrate processing method. The substrates to be processed include, for example, semiconductor wafers, liquid crystal display substrates, plasma display substrates, FED (Field Emission Display) substrates, optical disk substrates, magnetic disk substrates, optomagnetic disk substrates, and photomasks. Substrates, ceramic substrates, solar cell substrates, etc. are included.

In the manufacturing process of a semiconductor device or a liquid crystal display device, a substrate processing device that processes a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display panel with a processing liquid is used. Such a substrate processing apparatus includes a spin chuck that holds and rotates the substrate substantially horizontally, a nozzle for discharging the processing liquid to the substrate held by the spin chuck, and a processing liquid that supplies the processing liquid to the nozzles. It includes a pipe and a treatment liquid valve interposed in the middle of the treatment liquid pipe.

The following Patent Document 1 discloses a substrate processing apparatus for detecting a leak failure of a processing liquid valve. This substrate processing device includes a treatment liquid suction pipe that branches from a branch position set in a vertical portion on the downstream side of the treatment liquid valve in the treatment liquid piping, a suction device connected to the tip of the treatment liquid suction pipe, and a vertical one. Includes a liquid level sensor located slightly upstream of the branch position in the portion. After the operation of discharging the treatment liquid from the nozzle is completed, the suction device sucks the treatment liquid and retracts the tip surface of the treatment liquid to the branch position. The liquid level sensor monitors the liquid level height of the processing liquid in the vertical portion, and when the liquid level reaches a predetermined height, the substrate processing apparatus determines a leak failure of the processing liquid valve.

Japanese Patent No. 5030767

In the method of Patent Document 1, it is necessary to suck the treatment liquid by the suction device and retract the tip surface of the treatment liquid to the branch position every time the operation of discharging the treatment liquid from the nozzle is completed. Since it is necessary to greatly retract the tip surface of the treatment liquid, it takes time to suck the treatment liquid. That is, such suction may deteriorate the throughput. Therefore, it is required to detect the leakage of the treatment liquid from the supply valve (treatment liquid valve) by using another method.

Therefore, one object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of detecting leakage of a processing liquid from a supply valve without deteriorating the throughput.

One embodiment of this invention, a substrate holding unit for holding a substrate, a processing liquid nozzle for ejecting the processing liquid for processing the substrate, a supply pipe for supplying the processing liquid into the processing liquid nozzle A supply valve that is interposed in the supply pipe and opens and closes the supply pipe, and a treatment liquid that is discharged from the treatment liquid nozzle and is not supplied to the substrate held in the board holding unit flows. The flow pipe, a leak detection unit for detecting the leakage of the processing liquid from the supply valve, the flow valve that is interposed in the flow pipe to open and close the flow pipe, and the above-mentioned flow pipe. It has a detector for detecting the treatment liquid that collects in the upstream region on the upstream side of the flow valve, or the treatment liquid that branches from the upstream region and collects in the branch region where the treatment liquid can be stored. A substrate processing apparatus including a leak detection unit that detects a leak from the supply valve based on the treatment liquid accumulated in the upstream region or the branch region in the closed state of the supply valve and the flow valve. I will provide a.

According to this configuration, the distribution valve interposed in the distribution pipe is closed while the supply valve interposed in the supply pipe is closed. By closing the flow valve, the liquid supplied to the flow pipe can be stored in the upstream region or the branch region. When the treatment liquid leaks from the supply valve due to a failure of the supply valve or the like, the treatment liquid leaked from the supply valve is discharged from the treatment liquid nozzle and supplied to the distribution pipe. Since the flow valve is in the closed state, when there is a liquid leak from the supply valve, the processing liquid leaked from the supply valve is collected in the upstream region or the branch region. Therefore, by detecting the treatment liquid accumulated in the upstream side region or the branch region, the leakage liquid from the supply valve can be satisfactorily detected.

Since the leakage of the treatment liquid from the supply valve is detected using the treatment liquid discharged from the treatment liquid nozzle, it is possible to detect the leakage of the treatment liquid from the supply valve without significantly retracting the tip surface of the treatment liquid. .. Therefore, it is possible to detect the leakage of the processing liquid from the supply valve while shortening the throughput.
In one embodiment of this invention, the substrate processing apparatus, the processing liquid nozzle, a processing position located above the substrate held by the substrate holding unit, is held by the substrate holding unit further including a nozzle moving unit for moving between the upper substrate and a retracted position retracted laterally. Then, the flow pipe, including the evacuation flow pipe the retreat said is disposed at a position processing solution treatment liquid discharged from the nozzle flows.

According to this configuration, the leakage from the supply valve is detected by using the evacuation distribution pipe. Since the leakage from the supply valve is detected by using the evacuation distribution pipe in which the treatment liquid supplied to the substrate does not flow during the substrate processing, the leakage from the supply valve can be detected with high accuracy.
In one embodiment of the present invention, the substrate processing apparatus further includes a pot for receiving the processing liquid discharged from the processing liquid nozzle arranged at the retracted position. Then, the retracted circulation pipe is connected to said pot, solution treatment which is received in the pot, including the drain pipe that flows to the drainage.

When the substrate is not treated with the treatment liquid, the treatment liquid nozzle is arranged at the retracted position.
According to this configuration, the processing liquid discharged from the processing liquid nozzle in the state where the processing liquid nozzle is arranged at the retracted position is received by the pot and then supplied to the drainage pipe. This makes it possible to detect the leakage from the supply valve during non-treatment.

In one embodiment of this invention, the leakage detection unit, to run the distribution valve closed valve closing process in a state in which the treatment liquid nozzle is disposed in the retracted position.
According to this configuration, the flow valve is closed with the processing liquid nozzle arranged at the retracted position. As a result, when there is a liquid leak from the supply valve, the processing liquid leaked from the supply valve can be stored in the upstream region or the branch region of the evacuation distribution pipe. Then, by detecting the treatment liquid accumulated in the upstream side region or the branch region, the leakage liquid from the supply valve can be satisfactorily detected in the evacuation flow pipe.

In one embodiment of this invention, the nozzle movement unit executes a moving step of moving the processing liquid nozzle disposed in said retracted position to another position from the retracted position. Then, the leakage detection unit, wherein prior to the moving step, open the circulating valve in the closed state, to run a first valve opening step.
According to this configuration, the flow valve in the closed state is opened in advance of the moving step of moving from the retracted position to another position. As a result, when there is a treatment liquid stored in the upstream side region or the branch region of the evacuation distribution pipe, this treatment liquid can be discharged to the outside of the upstream side region or the branch region. Therefore, it is possible to prevent the treatment liquid from being accumulated in the upstream region or the branch region during the period when the leak detection is not performed. Therefore, the next leak detection can be performed satisfactorily.

In one embodiment of this invention, the leakage detection unit, prior to the retracting discharge step of opening the supply valve in a state in which the treatment liquid nozzle is disposed in the retracted position, the flow in the closed state opening the valve, to run a second valve opening steps.
According to this configuration, the flow valve in the closed state is opened in the closed state prior to the evacuation / discharge process. Therefore, the evacuation / discharge process can be performed while keeping the flow valve in the open state, whereby the evacuation / discharge process can be performed satisfactorily.

In one embodiment of this invention, the leakage detection unit, when detecting liquid leakage from the supply valve, opening the circulating valve in the closed state, to perform a third valve opening process.
According to this configuration, when a leak is detected from the supply valve, the processing liquid stored in the upstream region or the branch region of the distribution pipe is discharged to the outside of the upstream region by opening the closed flow valve. can do.

In one embodiment of this invention, the detector detects a treatment liquid accumulated in the upstream region. Then , the leak detection unit enables and removes the leak detection by the leak detection unit when the treatment liquid nozzle is arranged at the retracted position and the flow valve is closed. in certain cases, it disables the leakage detection by the leakage detection unit.

According to this configuration, when the treatment liquid nozzle is arranged at the treatment position and the supply valve is in the closed state, that is, while the treatment liquid is being supplied to the substrate, the leakage detection by the leakage detection unit is enabled. This makes it possible to detect the leakage from the supply valve during non-treatment.
In one embodiment of this invention, the leakage detection unit, during execution of the treatment liquid nozzle wherein the supply valve in a state disposed in the retracted position and the circulating valve is open wither retracted discharge step, disable the leakage detection by the leakage detection unit.

According to this configuration, the leakage detection is invalidated during the execution of the evacuation discharge process. During the execution of the evacuation discharge process, the processing liquid flows through the evacuation distribution pipe. Depending on the type of detector, the flow of the processing liquid in the evacuation flow pipe during the execution of the evacuation / discharge process may be erroneously detected as a leak from the supply valve. However, according to this configuration, since the leakage detection is invalidated during the execution of the evacuation discharge process, only the leakage from the supply valve can be reliably detected.

As an embodiment of the present invention, the leakage detection unit detects when the treatment liquid detected amount specified in advance in the detection period specified pre Me is detected, there leakage from the supply valve and, If the detected amount of the treatment liquid is not detected within the detection period after the flow valve is closed, it may be detected that there is no liquid leakage from the supply valve.

In one embodiment of this invention, the detector is a liquid level sensor including the liquid level of the treatment liquid accumulated in the upstream area or branched area to detect whether or not reached a predetermined height.
According to this configuration, the processing liquid accumulated in the upstream region or the branch region can be detected by a liquid level sensor having a relatively simple configuration. Therefore, it is possible to detect the leakage from the supply nozzle at a lower cost as compared with the case where the treatment liquid falling from the treatment liquid nozzle is directly detected.

In one embodiment of this invention, the supply pipe, the first pipe portion where the supply valve is interposed, and a second pipe portion extending upwardly from the downstream end of the first pipe section, the second and the third pipe portion extending horizontally from the downstream end of the pipe portion, the third pipe portion and a fourth pipe portion and the including for connecting the processing liquid nozzle. Then , after the treatment liquid is discharged from the treatment liquid nozzle, the substrate processing apparatus sucks the treatment liquid in the supply pipe, and the tip surface of the treatment liquid is applied to the third pipe portion or the fourth pipe portion. further including a suction device for sucking up to a predetermined retracted position which is set to the pipe portion.

According to this configuration, since the leakage from the supply valve is detected in the flow pipe, it is not necessary to detect the leakage from the supply valve in the second piping portion. Therefore, after the treatment liquid is discharged from the treatment liquid nozzle, the tip surface of the treatment liquid may be retracted to the retracted position set in the third piping portion or the fourth piping portion. Therefore, leakage of the treatment liquid from the supply valve can be detected without significantly retracting the tip surface of the treatment liquid. Therefore, leakage of the treatment liquid from the supply valve can be detected without deteriorating the throughput.

One embodiment of this invention, a supply pipe for supplying the processing liquid in the processing liquid nozzle for ejecting the processing liquid toward the substrate, interposed in the supply pipe, a supply valve for opening and closing the supply pipe A substrate processing apparatus including a flow pipe through which a treatment liquid discharged from the treatment liquid nozzle and not supplied to the substrate flows, and a distribution valve interposed in the distribution pipe to open and close the distribution pipe. In the substrate processing method executed in the above, the flow is performed in a valve closing step of closing the flow valve when the supply valve is in the closed state, and in the closed state of the supply valve and the closed state of the flow valve. The supply valve is based on the treatment liquid that collects in the upstream region on the upstream side of the flow valve in the pipe, or the treatment liquid that branches from the upstream region and collects in the branch region where the treatment liquid can be stored. leakage detecting the leakage of process liquid from the liquid containing a detection step, that provides a substrate processing method.

According to this method, the distribution valve interposed in the distribution pipe is closed while the supply valve interposed in the supply pipe is closed. By closing the flow valve, the liquid supplied to the flow pipe can be stored in the upstream region or the branch region. When the treatment liquid leaks from the supply valve due to a failure of the supply valve or the like, the treatment liquid leaked from the supply valve is discharged from the treatment liquid nozzle and supplied to the distribution pipe. Since the flow valve is in the closed state, when there is a liquid leak from the supply valve, the processing liquid leaked from the supply valve is collected in the upstream region or the branch region. Therefore, by detecting the treatment liquid accumulated in the upstream side region or the branch region, the leakage liquid from the supply valve can be satisfactorily detected.

Since the leakage of the treatment liquid from the supply valve is detected using the treatment liquid discharged from the treatment liquid nozzle, it is possible to detect the leakage of the treatment liquid from the supply valve without significantly retracting the tip surface of the treatment liquid. .. Therefore, it is possible to detect the leakage of the processing liquid from the supply valve while shortening the throughput.
In one embodiment of this invention, the flow pipe, including the saving circulation pipe in which the processing liquid processing solution discharged from a nozzle disposed in the retracted position flows to retreat from above the substrate to the side .. Then, the substrate processing method, the processing liquid nozzle, said prior to the valve closing step further including a retracted position location step of arranging said retracted position.

According to this method, the processing liquid nozzle is arranged in the retracted position prior to the valve closing step. Therefore, the flow valve is closed while the supply valve is closed and the treatment liquid nozzle is arranged at the retracted position. As a result, when there is a liquid leak from the supply valve, the processing liquid leaked from the supply valve can be stored in the upstream region or the branch region of the evacuation distribution pipe. Then, by detecting the treatment liquid accumulated in the upstream side region or the branch region, the leakage liquid from the supply valve can be satisfactorily detected in the evacuation flow pipe.

In one embodiment of this invention, the substrate processing method, a moving step of moving the processing liquid nozzle disposed in said retracted position to another position from the retracted position, prior to said moving step, open the circulating valve in the closed state, the first further including a valve opening process.
According to this method, the flow valve in the closed state is opened in advance of the moving step of moving from the retracted position to another position. As a result, when there is a treatment liquid stored in the upstream side region or the branch region of the evacuation distribution pipe, this treatment liquid can be discharged to the outside of the upstream side region or the branch region. Therefore, it is possible to prevent the treatment liquid from being accumulated in the upstream region or the branch region during the period when the leak detection is not performed. Therefore, the next leak detection can be performed satisfactorily.

In one embodiment of this invention, the substrate processing method, by opening the supply valve in a state in which the treatment liquid nozzle is disposed in the retracted position, the processing from the treatment liquid nozzle for the pre-dispense and retracting discharge step of discharging the liquid, prior to the retracted discharge step, open the circulating valve in the closed state, the second further including a valve opening process.

According to this method, the flow valve in the closed state is opened in the closed state prior to the evacuation / discharge process. Therefore, the evacuation / discharge process can be performed while keeping the flow valve in the open state, whereby the evacuation / discharge process can be performed satisfactorily.
In one embodiment of this invention, the substrate processing method, when the leakage detecting step detects liquid leakage from the supply valve, opening the circulating valve in the closed state, the third valve opening further including the step.

According to this method, when a leak is detected from the supply valve, the treated liquid stored in the upstream region or the branch region of the flow pipe is discharged to the outside of the upstream region by opening the closed flow valve. can do.
In one embodiment of the present invention, when the leak detection step is arranged at a retracted position where the treatment liquid nozzle retracts laterally from above the substrate and the flow valve is closed . enable leakage detection in the leakage detection step, in a predetermined case else, including the detection disable step of disabling the leakage detection in the leakage detecting process.

According to this method, when the treatment liquid nozzle is arranged at the treatment position and the supply valve is in the closed state, that is, when the treatment liquid is not treated, the liquid leakage detection by the liquid leakage detection unit is enabled. This makes it possible to detect the leakage from the supply valve during non-treatment.
In one embodiment of this invention, the detecting invalid step, when the treatment liquid nozzle wherein is arranged at the retracted position and the supply valve and the circulating valve is open, leakage in the leakage detection step disable the liquid detection.

According to this method, the leakage detection is invalidated during the execution of the evacuation discharge process. During the execution of the evacuation discharge process, the processing liquid flows through the evacuation distribution pipe. Depending on the type of detector used in the leak detection process, there is a risk of erroneously detecting the flow of the processing liquid in the retracted flow pipe during the execution of the retracted discharge process as a leak from the supply valve. However, according to this method, since the leakage detection is invalidated during the execution of the evacuation discharge process, only the leakage from the supply valve can be reliably detected.

As an embodiment of the present invention, the leakage detection step detects if the treatment liquid detected amount specified in advance in the detection period specified pre Me is detected, there leakage from the supply valve and, Further, when the detected amount of the processing liquid is not detected within the detection period after the flow valve is closed, the step of detecting that there is no liquid leakage from the supply valve may be included.

FIG. 1 is a schematic view of a substrate processing apparatus according to a first embodiment of the present invention as viewed in a horizontal direction. FIG. 2 is a block diagram for explaining an electrical configuration of a main part of the substrate processing apparatus. FIG. 3 is a time chart showing the open / closed state of the supply valve, the position state of the processing liquid nozzle, the open / closed state of the flow valve, and the valid / invalid state of the detection output of the liquid level sensor. FIG. 4A is a schematic diagram for explaining a standby process (S1 in FIG. 3). FIG. 4B is a schematic diagram for explaining the pre-dispensing process (S2 in FIG. 3). FIG. 4C is a schematic diagram for explaining the chemical suction after the pre-dispensing step. FIG. 4D is a schematic diagram for explaining a nozzle arrangement step (S3 in FIG. 3) and a chemical solution step (S4 in FIG. 3). FIG. 4E is a schematic diagram for explaining the chemical solution suction after the chemical solution step. FIG. 4F is a schematic diagram in the case where the chemical liquid leaks from the treatment liquid nozzle in the standby step (S1 in FIG. 3). FIG. 5 is a flowchart for explaining the flow of leak detection. FIG. 6 is a diagram showing a main part of the substrate processing apparatus according to the second embodiment of the present invention according to the second embodiment of the present invention. FIG. 7 is a time chart showing an open / closed state of a supply valve, a position state of a chemical solution nozzle, an open / closed state of a distribution valve, and an enabled / disabled state of a detection output of a liquid level sensor according to a second embodiment of the present invention. .. FIG. 8 is a schematic diagram in the case where the chemical solution leaks from the chemical solution nozzle in the standby step (S1 in FIG. 7). FIG. 9 is a diagram for explaining a first modification of the second embodiment of the present invention. FIG. 10 is a diagram for explaining a second modification of the second embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a horizontal view of the substrate processing apparatus 1 according to the first embodiment of the present invention. The substrate processing device 1 is a single-wafer processing device that processes disk-shaped substrates W such as semiconductor wafers one by one. The substrate processing apparatus 1 includes a processing unit 2 that processes the substrate W using a processing liquid (chemical solution and a rinsing liquid), a transfer robot (not shown) that carries in and out the substrate W to and from the processing unit 2, and a substrate processing apparatus. 1 includes a device provided in 1 and a control device 3 for controlling the opening and closing of a valve.

The processing unit 2 is a box-shaped processing chamber 4 and a spin chuck (substrate) that rotates the substrate W around a vertical rotation axis A1 passing through the center of the substrate W while holding the substrate W horizontally in the processing chamber 4. The holding unit) 5 and one or a plurality of processing liquid nozzles that discharge the processing liquid toward the substrate W held by the spin chuck 5 are included.
The spin chuck 5 is formed from a disk-shaped spin base 6 held in a horizontal position, a plurality of holding pins 7 holding the substrate W in a horizontal position above the spin base 6, and a central portion of the spin base 6. It includes a spin shaft 8 extending downward and a spin motor 9 that rotates the substrate W and the spin base 6 around the rotation axis A1 by rotating the spin shaft 8. The spin chuck 5 is not limited to a pinch type chuck in which a plurality of pinching pins 7 are brought into contact with the peripheral end surface of the substrate W, but the back surface (lower surface) of the substrate W, which is a non-device forming surface, is attracted to the upper surface of the spin base 6. It may be a vacuum type chuck that holds the substrate W horizontally.

The processing unit 2 has a rinse liquid nozzle 10 that discharges the rinse liquid downward toward the upper surface of the substrate W held by the spin chuck 5, and a rinse liquid that guides the rinse liquid from the rinse liquid supply source to the rinse liquid nozzle 10. It includes a pipe 11 and a rinse liquid valve 12 that opens and closes the inside of the rinse liquid pipe 11. The rinsing liquid is, for example, pure water (Deionized water). The rinsing solution is not limited to pure water, and may be any of carbonated water, electrolytic ionized water, hydrogen water, ozone water, and hydrochloric acid water having a diluted concentration (for example, about 10 to 100 ppm). A water nozzle moving device may be provided that scans the water landing position with respect to the upper surface of the substrate W in the plane of the substrate W by moving the rinse liquid nozzle 10.

The processing unit 2 has a chemical liquid nozzle (treatment liquid nozzle) 13 for discharging the chemical liquid (treatment liquid) toward the upper surface of the substrate W held by the spin chuck 5, and a nozzle arm to which the chemical liquid nozzle 13 is attached to the tip portion. 14 includes a nozzle moving unit 15 that moves the chemical solution nozzle 13 by swinging the nozzle arm 14 around a predetermined swing axis (not shown). The chemical liquid nozzle 13 is attached to a nozzle arm 14 extending in the horizontal direction with the discharge port 13a facing downward, for example. The nozzle moving unit 15 has a processing position P1 (position shown by a solid line in FIG. 1) set above the substrate W and a retracted position P2 (broken line in FIG. 1) for retracting the chemical solution nozzle 13 to the side of the spin chuck 5. Move (horizontally) to and from the position indicated by.

The processing unit 2 further includes a supply pipe 16 that guides the chemical solution from the chemical solution supply source (not shown) to the chemical solution nozzle 13. A supply valve 18 for opening and closing the supply pipe 16 and a flow meter 19 for measuring the flow rate of the chemical liquid flowing through the supply pipe 16 are interposed in the supply pipe 16 in this order from the chemical liquid nozzle 13 side. The supply pipe 16 has a first pipe portion 16a interposed with a supply valve 18, a second pipe portion 16b extending upward from the downstream end of the first pipe portion 16a, and a second pipe portion 16b, in order from the chemical liquid supply source side. 2 includes a third piping portion 16c extending horizontally from the downstream end of the piping portion 16b and a fourth piping portion 16d extending downward from the downstream end of the third piping portion 16c and connected to the chemical solution nozzle 13. .. The supply valve 18 is interposed in the middle of the first piping portion 16a.

The first and third piping portions 16a and 16c extend horizontally, respectively. The third pipe portion 16c is arranged at a position higher in the vertical direction than the first pipe portion 16a. The height H is, for example, several tens of centimeters. The second pipe portion 16b connects the first pipe portion 16a and the third pipe portion 16c. The second piping portion 16b extends in the vertical direction, for example. The fourth piping portion 16d connects the third piping portion 16c and the chemical solution nozzle 13. The fourth pipe portion 16d extends in the vertical direction, for example. The first to fourth pipe portions 16a to 16d are composed of one continuous pipe, and each pipe diameter is common to each other.

Chemical solutions include, for example, sulfuric acid, acetic acid, nitric acid, hydrochloric acid, hydrofluoric acid, aqueous ammonia, hydrogen peroxide, organic acids (eg citric acid, oxalic acid, etc.), organic alkalis (eg, TMAH: tetramethylammonium hydroxide, etc.), A liquid containing at least one of an organic solvent (for example, IPA: isopropyl alcohol, etc.), a surfactant, and a corrosion inhibitor. The processing unit 2 includes a suction device 17. The suction device 17 is a diaphragm type suction device. The diaphragm type suction device includes a cylindrical head interposed in the middle of the supply pipe 16 (first pipe portion 16a) and a diaphragm housed in the head, and the inside of the head is driven by the diaphragm. It is a suction device having a known configuration that changes the volume of the flow path formed in (see JP-A-2016-111306, etc.). The diaphragm type suction device has a weaker suction force (suction speed) than the ejector type suction device. Therefore, the diaphragm type suction device has a smaller amount of chemical solution that can be sucked than the ejector type suction device. In the example of FIG. 1, the suction device 17 is configured as a separate device from the supply valve 18, but the suction device 17 may be provided by using a part of the supply valve 18.

The processing unit 2 includes a standby pot (pot) 20 arranged around the spin chuck 5 in a plan view. The standby pot 20 is a box-shaped pot for receiving the chemical liquid discharged from the chemical liquid nozzle 13 arranged at the evacuation position P2. A drainage pipe 21 is connected to the bottom of the standby pot 20. The chemical solution received in the standby pot 20 is sent to a drainage treatment facility (not shown) outside the machine via the drainage pipe 21. Therefore, the chemical solution discharged to the standby pot 20 is not supplied to the substrate W.

A distribution valve 22 for opening and closing the drainage pipe 21 is interposed in the middle of the drainage pipe 21. When the flow valve 22 is closed, the liquid is supplied to the drainage pipe 21 so that the chemical solution collects in the upstream region (hereinafter, simply referred to as “upstream region”) 22 of the drainage pipe 21 from the flow valve 22. A detector is placed to detect. The detector is a liquid level sensor 24 (see FIG. 4F) that detects whether or not the liquid level of the chemical liquid accumulated in the upstream region 23 has reached a predetermined height.

The processing unit 2 further includes a cylindrical processing cup 30 that surrounds the spin chuck 5. As shown in FIG. 1, the processing cup 30 is arranged outside the substrate W held by the spin chuck 5 (direction away from the rotation axis A1). The processing cup 30 surrounds the spin base 6. When the processing liquid is supplied to the substrate W while the spin chuck 5 is rotating the substrate W, the processing liquid supplied to the substrate W is shaken off around the substrate W. When the processing liquid is supplied to the substrate W, the upper end portion 30a of the processing cup 30 opened upward is arranged above the spin base 6. Therefore, the treatment liquid (chemical liquid, rinsing liquid, etc.) discharged around the substrate W is received by the treatment cup 30. Then, the processing liquid received in the processing cup 30 is sent to a processing facility (not shown).

FIG. 2 is a block diagram for explaining the electrical configuration of the main part of the substrate processing apparatus 1.
The control device 3 is configured by using, for example, a microcomputer. The control device 3 has an arithmetic unit such as a CPU, a fixed memory device, a storage unit such as a hard disk drive, and an input / output unit. The storage unit stores the program executed by the arithmetic unit.

The control device 3 controls the operation of the spin motor 9, the nozzle moving unit 15, the suction device 17, and the like according to a predetermined program. Further, the control device 3 controls the opening / closing operation of the rinse liquid valve 12, the supply valve 18, the flow valve 22, and the like. Further, the detection output from the liquid level sensor 24 is input to the control device 3.
The flow valve 22, the detector (liquid level sensor 24), and the control device 3 constitute a liquid leakage detection unit that detects liquid leakage from the supply valve 18.

A series of processing on the substrate W by the processing unit 2 will be described with reference to FIGS. 1 and 2.
In the processing example of a series of processing executed by the processing unit 2, the unprocessed substrate W is carried into the processing chamber 4 by the transfer robot, and the substrate W spins with its surface (device forming surface) facing upward. It is handed over to the chuck 5, and the substrate W is held by the spin chuck 5.

During non-execution (that is, standby) of the chemical solution treatment using the chemical solution from the chemical solution nozzle 13 (the chemical solution step S3 (FIG. 3) described later), the chemical solution nozzle 13 is at the retracted position P2 (the position shown by the broken line in FIG. 1). ) Is placed. In the state where the chemical solution nozzle 13 is arranged at the retracted position P2, the discharge port 13a of the chemical solution nozzle 13 faces the standby pot 20.
The control device 3 controls the nozzle moving unit 15 to pull out the chemical solution nozzle 13 arranged at the retracted position P2 to the processing position P1 (the position shown by the solid line in FIG. 1), and the upper surface of the rotating substrate W. The chemical solution is discharged to the chemical solution nozzle 13 toward. As a result, the chemical solution is supplied to the entire upper surface of the substrate W. After stopping the discharge of the chemical solution from the chemical solution nozzle 13, the control device 3 controls the nozzle moving unit 15 to return the chemical solution nozzle 13 from the processing position P1 to the evacuation position P2.

After that, the control device 3 discharges the rinse liquid toward the rotating substrate W to the rinse liquid nozzle 10. As a result, the rinsing liquid is supplied to the entire upper surface of the substrate W, and the chemical liquid adhering to the substrate W is washed away (rinsing step). After stopping the discharge of the rinse liquid from the rinse liquid nozzle 10, the control device 3 rotates the substrate W on the spin chuck 5 at a high rotation speed. As a result, the rinse liquid adhering to the substrate W is shaken off around the substrate W by centrifugal force. Therefore, the rinsing liquid is removed from the substrate W, and the substrate W dries (drying step). After that, the processed substrate is carried out from the processing chamber 4 by the transfer robot.

FIG. 3 shows the open / closed state of the supply valve 18, the position state of the chemical solution nozzle 13, the open / closed state of the flow valve 22, and the liquid level from the standby step (S1) through the chemical solution step (S4) to the standby step (S1) again. It is a time chart which shows the valid / invalid state of the detection output of a sensor 24. FIG. 4A is a schematic diagram for explaining the standby step (S1). FIG. 4B is a schematic diagram for explaining a pre-dispensing step (evacuation discharging step. S2). FIG. 4C is a schematic diagram for explaining the chemical solution suction after the chemical solution step (S4). FIG. 4D is a schematic diagram for explaining the nozzle arrangement step (S3) and the chemical solution step (S4). FIG. 4E is a schematic diagram for explaining the chemical solution suction after the chemical solution step (S4). FIG. 4F is a schematic diagram in the case where the chemical solution leaks from the chemical solution nozzle 13 in the standby step (S1 in FIG. 3).

Next, with reference to FIGS. 1 to 4F, each step from the standby step (S1) through the chemical solution step (S4) to the standby step (S1) again will be described. Further, in FIGS. 4A to 4F, the flow meter 19 is not shown.
In this processing example, the control device 3 moves the pre-dispensing step (S2) for discharging unnecessary chemicals (for example, chemicals that have deteriorated over time or chemicals whose temperature has dropped) in the supply pipe 16 and the chemicals nozzle 13 from the retracted position P2. A nozzle arranging step (S3) for moving to the processing position P1, a chemical solution step (S4) for treating the surface of the substrate W with a chemical solution, and a nozzle retracting process for moving the chemical solution nozzle 13 from the processing position P1 to the retracting position P2. The step (S5) is executed. Further, in this processing example, the state in which the chemical solution nozzle 13 is arranged at the retracted position P2 and the pre-dispensing step (S2) is not being executed is referred to as a standby step (S1).

The feature of this processing example is that in the standby step (S1), the distribution valve 22 interposed in the drainage pipe 21 is always closed. With such a configuration, leakage detection from the supply valve 18 is realized in the standby process (S1).
Further, in this treatment example, when a predetermined period has elapsed from the execution of the previous chemical solution treatment, the pre-dispensing step (S2) is performed prior to the start of the chemical solution treatment. Hereinafter, this treatment example will be described by taking as an example the case where the pre-dispensing step (S2) is performed. However, if a predetermined period has not elapsed since the previous execution of the chemical solution treatment, the pre-dispensing step (S2) will be described. Not executed.

As shown in FIG. 4A, before the start of the chemical solution treatment, the chemical solution nozzle 13 is arranged at the retracted position P2 (standby step (S1)). After the end of the previous chemical solution treatment, the chemical solution nozzle 13 is retracted from the processing position P1 to the retracted position P2, and the chemical solution nozzle 13 continues to be arranged at the retracted position P2 as it is. In this state, the control device 3 closes the flow valve 22 and enables the detection of liquid leakage by the detector (liquid level sensor 24). That is, the control device 3 monitors whether or not there is a leak detection from the supply valve 18.

Then, the pre-dispensing step (S2) is executed. Prior to the start of the pre-dispensing step (S2), the distribution valve 22 in the closed state of the control device 3 is opened. It also disables leak detection by the detector. The open state of the flow valve 22 and the invalidation of the leakage detection by the detector are continued until the nozzle evacuation step (S5) is completed. That is, the control device 3 does not monitor whether or not there is a liquid leakage detection from the supply valve 18 in the pre-dispensing step (S2) to the nozzle retracting step (S5).

At the execution timing of the pre-dispensing step (S2), the control device 3 opens the supply valve 18 with the chemical solution nozzle 13 arranged at the retracted position P2. As a result, the chemical solution from the chemical solution supply source is supplied to the chemical solution nozzle 13 through the supply pipe 16, and the chemical solution is discharged from the discharge port 13a of the chemical solution nozzle 13 as shown in FIG. 4B. The chemical solution discharged from the chemical solution nozzle 13 is received by the standby pot 20 and then flows through the drainage pipe 21. Since the flow valve 22 is in the open state, the chemical liquid flowing through the drainage pipe 21 passes through the drainage pipe 21 and is guided to a predetermined processing facility. After the predetermined pre-dispensing period has elapsed, the control device 3 closes the supply valve 18. After closing the supply valve 18, the control device 3 drives the suction device 17 to suck a predetermined amount of the chemical solution inside the supply pipe 16. As shown in FIG. 4C, the suction of the chemical solution causes the tip surface of the chemical solution inside the supply pipe 16 to retract. When the tip surface of the chemical solution retracts to the retracted position P3, the control device 3 stops driving the suction device 17.

In this embodiment, since the leakage from the supply valve 18 is detected in the drainage pipe 21, the leakage from the supply valve is not detected in the second pipe portion 16b. Therefore, after the pre-dispensing step (S2), the tip surface of the chemical solution may be retracted to the retracted position P3 set in the fourth piping portion 16d.
After that, when the timing of discharging the chemical solution to the substrate W approaches, the control device 3 executes the nozzle arrangement step (S3). That is, as shown in FIG. 4D, the control device 3 controls the nozzle moving unit 15 while maintaining the closed state of the supply valve 18 to pull out the chemical solution nozzle 13 from the retracted position P2 to the processing position P1.

Then, the chemical solution step (S4) is executed. Specifically, after the chemical solution nozzle 13 is arranged at the processing position P1, the control device 3 opens the supply valve 18. As a result, the chemical solution from the chemical solution supply source is supplied to the chemical solution nozzle 13 through the supply pipe 16, and the chemical solution is discharged from the discharge port 13a of the chemical solution nozzle 13 as shown in FIG. 4D. The chemical solution discharged from the chemical solution nozzle 13 is supplied to the substrate W. After closing the supply valve 18, the control device 3 drives the suction device 17 to suck a predetermined amount of the chemical solution inside the supply pipe 16. As shown in FIG. 4E, the suction of the chemical solution causes the tip surface of the chemical solution inside the supply pipe 16 to retract. When the tip surface of the chemical solution retracts to the retracted position P3, the control device 3 stops driving the suction device 17.

In this embodiment, since the leakage from the supply valve 18 is detected in the drainage pipe 21, the leakage from the supply valve is not detected in the second pipe portion 16b. Therefore, after the pre-dispensing step (S2), the tip surface of the chemical solution may be retracted to the retracted position P3 set in the fourth piping portion 16d. The retracted position P3 may be set to the third pipe portion 16c instead of the fourth pipe portion 16d.

Next, the control device 3 executes the nozzle evacuation step (S5). That is, the control device 3 controls the nozzle moving unit 15 while maintaining the open state of the supply valve 18 to return the chemical solution nozzle 13 arranged at the processing position P1 to the evacuation position P2.
When the chemical solution nozzle 13 is arranged at the retracted position P2, the control device 3 closes the flow valve 22 in the open state and enables the detector to detect the leak. That is, the control device 3 restarts monitoring whether or not there is a leak detected from the supply valve 18 (restart of the standby step (S1)).

When the chemical solution leaks from the supply valve 18 due to a failure of the supply valve 18, the chemical solution leaked from the supply valve 18 is discharged from the chemical solution nozzle 13 and the drainage pipe 21 is discharged as shown in FIG. 4F. Is supplied to. In this embodiment, as shown in FIG. 4F, the liquid level sensor 24 (see FIG. 4F) is, for example, a transmissive position sensor having a set of light emitting element 24a and light receiving element 24b, and is an upstream region 23. It is detected whether or not the height of the chemical solution stored in the above reaches the optical axis (the optical axis by the light emitting element 24a and the light receiving element 24b) set at the predetermined detection height position. The position sensor may be a reflective type sensor instead of a transmissive type sensor. Further, the position sensor may be a liquid level sensor that directly detects the height of the liquid level of the chemical liquid stored in the upstream region 23. Further, the liquid level sensor 24 is not limited to the position sensor, and the liquid level sensor 24 may be composed of a capacitance type sensor.

Since the flow valve 22 is closed, if there is a liquid leak from the supply valve 18, the chemical liquid leaked from the supply valve 18 is stored in the upstream region 23. Therefore, by detecting that the chemical solution is accumulated in the upstream region 23, the leakage from the supply valve 18 can be satisfactorily detected.
FIG. 5 is a flowchart for explaining the flow of leak detection.

The control device 3 monitors whether or not there is a leak detection from the supply valve 18 in the standby process (S1) (T1). In the standby step (S1), it is determined that the liquid level of the chemical liquid stored in the upstream region 23 has reached the above-mentioned detection height position based on the detection output from the liquid level sensor 24 (YES in T1). ), The control device 3 warns the monitor (not shown) of the substrate processing device 1 that the liquid has leaked from the supply valve 18 (T2). Information to the effect of liquid leakage from the supply valve 18 may be recorded as a log in a storage unit (not shown) of the control device 3. In this case, the warning of leakage from the supply valve 18 may not be displayed on the monitor.

Further, when the control device 3 determines that the liquid level of the chemical solution stored in the upstream region 23 has reached the detection height position (YES in T1), the control device 3 is in the closed state. The distribution valve 22 is opened (T3). As a result, the chemical solution stored in the upstream area 23 can be discharged to the outside of the machine through the portion downstream of the flow valve 22 in the drainage pipe 21.
As described above, according to the first embodiment, the chemical liquid nozzle 13 is arranged in the retracted position P2, and the supply valve 18 interposed in the supply pipe 16 is closed, and the chemical liquid nozzle 13 is interposed in the drainage pipe 21. The mounted distribution valve 22 is closed. As a result, the liquid supplied to the drainage pipe 21 can be stored in the upstream region 23. When the chemical solution leaks from the supply valve 18 due to a failure of the supply valve 18, the chemical solution leaked from the supply valve 18 is discharged from the chemical solution nozzle 13 and supplied to the drainage pipe 21. Since the flow valve 22 is in the closed state, when there is a liquid leak from the supply valve 18, the chemical liquid leaked from the supply valve 18 is stored in the upstream region 23. Therefore, by detecting the liquid level of the chemical liquid stored in the upstream region 23, the leaked liquid from the supply valve 18 can be satisfactorily detected.

Then, since the leakage of the chemical solution from the supply valve 18 is detected by using the chemical solution discharged from the chemical solution nozzle 13, the supply valve does not retract the tip surface of the chemical solution to the second piping portion (vertical portion) 16b. Leakage of the drug solution from 18 can be detected. Therefore, it is possible to detect the leakage of the chemical solution from the supply valve 18 while shortening the processing throughput.

Further, prior to the pre-dispensing step (S2), the closed flow valve 22 is opened. Thereby, the pre-dispensing step (S2) can be performed while keeping the flow valve 22 in the open state, whereby the pre-dispensing step (S2) can be performed satisfactorily.
Further, from a different point of view, the distribution valve 22 in the closed state is opened in the closed state prior to the arrangement step (S3). As a result, when there is a chemical solution stored in the upstream side region 23 of the drainage pipe 21, this chemical solution can be discharged to the outside of the upstream side region 23. Therefore, it is possible to prevent the chemical solution from being accumulated in the upstream region 23 during the period when the leak is not detected. Therefore, the next leak detection can be performed satisfactorily.

Further, when the chemical liquid nozzle 13 is arranged at the processing position P1 and the supply valve 18 is in the open state, that is, the liquid leakage detection is enabled in the chemical liquid step (S4) and the liquid leakage detection is invalidated in the pre-dispensing step (S2). To. When the position sensor is used as the liquid level sensor 24, if the leakage detection is enabled in the pre-dispensing step (S2), the flow of the chemical liquid in the drainage pipe 21 during the pre-dispensing step (S2) can be performed by the supply valve 18. The possibility of false detection of leaks from the water cannot be completely ruled out. However, in this embodiment, since the leakage detection is disabled during the execution of the pre-dispensing step (S2), only the leakage from the supply valve 18 can be reliably detected.

Further, since the leakage detection according to the present embodiment is detected after the treatment liquid leaking from the supply valve 18 is accumulated, it is possible to detect a leakage liquid having a small flow rate. The detection by the flow meter 19 has a problem that the leakage of a minute flow rate cannot be detected, but the leakage of such a minute flow rate can be detected satisfactorily. Further, in the detection by the flow meter 19, there is a concern about the influence of air biting due to foaming when the supply valve 18 is closed, but in the liquid leakage detection according to the present embodiment, there is no such possibility.

FIG. 6 is a diagram showing a main part of the substrate processing apparatus 201 according to the second embodiment of the present invention. FIG. 7 is a time chart showing the open / closed state of the supply valve 18, the position state of the chemical liquid nozzle 13, the open / closed state of the flow valve, and the valid / invalid state of the detection output of the liquid level sensor 224. FIG. 8 is a schematic diagram in the case where the chemical solution leaks from the chemical solution nozzle 13 in the standby step (S1 in FIG. 7).

In the second embodiment, the parts corresponding to the respective parts shown in the first embodiment are designated by the same reference numerals as those in FIGS. 1 to 5, and the description thereof will be omitted.
The difference between the substrate processing apparatus 201 according to the second embodiment and the substrate processing apparatus 1 according to the first embodiment is that the detector (liquid level sensor 224) for detecting leaks is located in the upstream region. The point is not to detect the processing liquid accumulated in the 23, but to detect the processing liquid accumulated in the branch region (branch drainage pipe 221) branching from the upstream region 23. Hereinafter, a specific description will be given.

In the processing unit 202 of the substrate processing apparatus 201, the upstream region 23 of the drainage pipe 21 includes a vertical portion 23a extending along the vertical direction. A branch drainage pipe 221 is branched and connected in the middle of the vertical portion 23a. The branch drainage pipe 221 has a first pipe portion 221a, a second pipe portion 221b extending vertically upward from the downstream end of the first pipe portion 221a, and a second pipe portion 221b in order from the branch connection position 23b. Includes a third pipe portion 221c extending horizontally from the downstream end of the third pipe portion 221c and a fourth pipe portion 221d extending downward from the downstream end of the third pipe portion 221c. The tip of the fourth pipe portion 221d is connected to a predetermined processing facility.

The first and third piping portions 221a and 221c extend horizontally, respectively. The second pipe portion 221b connects the first pipe portion 221a and the third pipe portion 221c. The second pipe portion 221b extends, for example, along the vertical direction. The fourth piping portion 221d connects the third piping portion 221c and the processing equipment. The fourth pipe portion 221d extends in the vertical direction, for example. The first to fourth pipe portions 221a to 221d are composed of one continuous pipe. The inner diameter of the second pipe portion 221b is a small diameter (for example, about 8 mm). Since the second pipe portion 221b extends upward, the chemical liquid flowing into the branch drainage pipe 221 from the branch connection position 23b of the drainage pipe 21 can be stored in the second pipe portion 221b. ing. The liquid level sensor 224 detects the height of the chemical solution stored in the second piping portion 221b. Since the liquid level sensor 224 has the same configuration as the liquid level sensor 224 (see FIG. 4F), the same reference numerals as those in the case of FIG. 4F are added, and the description thereof is omitted. The detection output from the liquid level sensor 224 is input to the control device 3. The flow valve 22, the detector (liquid level sensor 224), and the control device 3 constitute a liquid leakage detection unit that detects liquid leakage from the supply valve 18.

Since the branch drainage pipe 221 branches from the upstream side region 23 (vertical portion 23a) of the drainage pipe 21, when the flow valve 22 is open, the chemical liquid flowing through the upstream side region 23 is the branch drainage pipe. It is not guided to 221 but is guided to a portion downstream of the flow valve 22 in the drainage pipe 21.
On the other hand, when the chemical solution is supplied to the upstream side region 23 in the closed state of the flow valve 22, the chemical solution overflows in the upstream side region 23, the chemical solution flows into the branch drainage pipe 221 and the branch drainage pipe 221 It is stored inside. Then, the height of the chemical solution stored in the second piping portion 221b is detected by the liquid level sensor 224.

In the processing example executed by the processing unit 202, as in the processing example executed by the processing unit 2 according to the first embodiment, the standby step (S1 in FIG. 7) and the pre-dispensing step (evacuation discharge step. FIG. 7). S2), the nozzle placement step (S3 in FIG. 7) and the chemical solution step (S4 in FIG. 7) are executed.
FIG. 7 shows the open / closed state of the supply valve 18, the position state of the chemical solution nozzle 13, and the distribution from the standby step (S1 in FIG. 7) to the standby step (S1 in FIG. 7) through the chemical solution step (S4 in FIG. 7). It is a time chart which shows the open / closed state of a valve 22 and the valid / invalid state of the detection output of a liquid level sensor 224. FIG. 8 is a schematic diagram in the case where the chemical solution leaks from the chemical solution nozzle 13 in the standby step (S1 in FIG. 7).

When the chemical solution leaks from the supply valve 18 due to a failure of the supply valve 18, the chemical solution leaked from the supply valve 18 is discharged from the chemical solution nozzle 13 and the drainage pipe 21 is discharged as shown in FIG. Is supplied to. Since the flow valve 22 is closed in the standby step (S1 in FIG. 7), if there is a liquid leak from the supply valve 18, the chemical liquid leaked from the supply valve 18 is the first of the branch drainage pipe 221. It is stored in the piping portion 221b of 2. Therefore, by detecting that the chemical liquid is accumulated in the second pipe portion 221b of the branch drainage pipe 221, the liquid leakage from the supply valve 18 can be satisfactorily detected.

The flow of leak detection is the same as in the case of the first embodiment (see FIG. 5). That is, the control device 3 monitors whether or not there is a leak detected from the supply valve 18 in the standby process (S1 in FIG. 7) (T1 in FIG. 5). In the standby step (S1 in FIG. 7), the liquid level of the chemical liquid stored in the second pipe portion 221b of the branch drainage pipe 221 is the detection height position based on the detection output from the liquid level sensor 224. (YES at T1 in FIG. 5), the control device 3 warns the monitor (not shown) of the substrate processing device 1 that the liquid has leaked from the supply valve 18 (T2 in FIG. 5). .. Information to the effect of liquid leakage from the supply valve 18 may be recorded as a log in a storage unit (not shown) of the control device 3. In this case, the warning of leakage from the supply valve 18 may not be displayed on the monitor.

Further, when the control device 3 determines that the liquid level of the chemical liquid stored in the second pipe portion 221b of the branch drainage pipe 221 has reached the detection height position, YES in T1 of FIG. 5). , The control device 3 opens the flow valve 22 in the closed state (T3 in FIG. 5). As a result, the chemical solution stored in the branch drainage pipe 221 can be discharged to the outside of the machine through a portion downstream of the flow valve 22 in the drainage pipe 21.

As shown in FIG. 7, in the processing example executed by the processing unit 202, unlike the processing example executed by the processing unit 2, the leak detection by the detector (liquid level sensor 224) is performed over the entire processing period. It is enabled.
As described above, according to the second embodiment, it is possible to obtain the same action and effect as those described in relation to the first embodiment.

In addition, in the second embodiment, when the flow valve 22 is open, the chemical liquid flowing through the upstream region 23 is not guided to the branch drainage pipe 221 and the flow valve 22 is closed. Only, the chemical solution flows into the branch drainage pipe 221. Therefore, in the chemical solution step (S3 in FIG. 7), it is not necessary to disable the leakage detection by the detector (liquid level sensor 224). Therefore, as compared with the first embodiment, complicated control of switching between valid / invalid of leak detection becomes unnecessary.

Although the two embodiments of the present invention have been described above, the present invention can also be implemented in other embodiments.
For example, in the second embodiment, as in the first modification shown in FIG. 9, the downstream end of the branch drainage pipe 221 is not connected to the processing equipment, but from the distribution valve 22 in the branch drainage pipe 221. May be connected to the downstream part. Specifically, the branch drainage pipe 221 includes a fifth pipe portion 221e that connects the downstream end of the fourth pipe portion 221d and the portion downstream of the distribution valve 22 in the branch drainage pipe 221. You may.

Further, in the second embodiment, as in the second modification shown in FIG. 10, the downstream end of the branch drainage pipe 221 is connected to a portion upstream of the branch connection position 23b in the upstream region 23. You may. Specifically, the branch drainage pipe 221 connects the downstream end (upper end) of the second pipe portion 221b and the portion upstream of the branch connection position 23b in the upstream region 23, the sixth pipe portion 221f. And may be provided.

Further, in the second embodiment, as shown by the broken lines in FIGS. 6, 9 and 10, the degassing pipe 231 for degassing may be branched and connected as in the branch drainage pipe 221. In the examples of FIGS. 6, 9 and 10, the degassing pipe 231 is branched and connected to the downstream end (upper end) of the second pipe portion 221b. As a result, the gas accumulated in the branch drainage pipe 221 (particularly, the second pipe portion 221b) can be easily discharged, so that the chemical solution overflowing in the upstream region 23 can be satisfactorily guided to the branch drainage pipe 221.

Further, for example, in the first embodiment, when the chemical solution nozzle 13 is arranged at the retracted position P2, the control device 3 has described that the flow valve 22 in the open state is closed, but the flow valve 22 is closed. , The predetermined delay period D1 (see FIG. 3) may be later than the arrangement of the chemical solution nozzle 13 at the retracted position P2. Further, although it has been described that the closing of the flow valve 22 and the activation of the leakage detection by the detector are performed in synchronization with each other, the activation of the leakage detection by the detector is more predetermined than the closing of the distribution valve 22. Delay period D2 (see FIG. 3) may be delayed.

Further, in the first embodiment, the closing of the flow valve 22 and the effective start of the leakage detection by the detector are the end of the nozzle evacuation step (S5) if the pre-dispensing step (S2) is executed. It may be done prior to.
Further, in the first and second embodiments, it has been described that the leakage from the supply valve 18 is detected in the drainage pipe 21 for pre-dispensing or the branch drainage pipe 221 branching from the drainage pipe 21. However, the pipe (flow pipe) for which the leak is detected is a pipe (flow pipe) connected to a cup not used in the chemical liquid step (S4) among the cups included in the treatment cup 30 that receives the treatment liquid scattered from the periphery of the substrate. For example, it may be a drainage pipe).

Further, in the first and second embodiments, the pipe (distribution pipe) for which the leak is detected may be an exhaust pipe (not shown).
Further, in the first and second embodiments, the diaphragm type suction device has been described as an example of the suction device 17, but a siphon type suction device may be adopted instead of the diaphragm type suction device.

Further, in the first and second embodiments, only when the detected amount of the liquid leaked from the supply valve 18 reaches a predetermined detected amount within the predetermined detection period, the liquid leaked from the supply valve 18 is considered to be present. It may be detected. In this case, if the predetermined detection amount is not reached within the predetermined detection period, it is detected that there is no leakage.
Further, in the first and second embodiments, in the above description, the treatment liquid to be detected for leaks is a chemical liquid, but the treatment liquid to be detected for leaks is a rinse liquid. May be good.

Further, in the first and second embodiments, the case where the substrate processing apparatus 1,201 is an apparatus for processing the disk-shaped substrate W has been described, but the substrate processing apparatus 1,201 is a glass for a liquid crystal display device. It may be a device for processing a polygonal substrate such as a substrate.
In addition, various design changes can be made within the scope of the matters described in the claims.

1: Board processing device 3: Control device 5: Spin chuck (board holding unit)
13: Chemical solution nozzle (treatment solution nozzle)
15: Nozzle moving unit 16: Supply pipe 16a: First pipe part 16b: Second pipe part 16c: Third pipe part 16d: Fourth pipe part 17: Suction device 18: Supply valve 20: Pot 21: Drainage pipe 22: Flow valve 24: Liquid level sensor P1: Processing position P2: Retract position P3: Retreat position 201: Board processing device 221: Branch drainage pipe 224: Liquid level sensor W: Board

Claims (20)

A board holding unit that holds the board and
A treatment liquid nozzle for discharging the treatment liquid for processing the substrate, and a treatment liquid nozzle for discharging the treatment liquid.
A supply pipe that supplies the treatment liquid to the treatment liquid nozzle,
A supply valve that is connected to the supply pipe and opens and closes the supply pipe,
A distribution pipe through which a treatment liquid discharged from the treatment liquid nozzle and not supplied to the substrate held by the substrate holding unit flows.
A leak detection unit for detecting the leakage of the treatment liquid from the supply valve, which is a flow valve that is interposed in the flow pipe to open and close the flow pipe, and a flow valve among the flow pipes. It has a detector for detecting the processing liquid that collects in the upstream side region on the upstream side or the processing liquid that branches from the upstream side region and collects in the branch region where the treatment liquid can be stored. A substrate processing apparatus including a leak detection unit that detects a leak from a supply valve based on a treatment liquid that collects in the upstream region or the branch region when the valve and the flow valve are closed. The processing liquid nozzle is moved between a processing position located above the substrate held by the substrate holding unit and a retracting position of retracting laterally from above the substrate held by the substrate holding unit. Including a nozzle movement unit to make
The substrate processing apparatus according to claim 1, wherein the distribution pipe includes an evacuation distribution pipe through which a processing liquid discharged from the processing liquid nozzle arranged at the evacuation position flows. Further including a pot for receiving the processing liquid discharged from the processing liquid nozzle arranged at the retracted position.
The substrate processing apparatus according to claim 2, wherein the evacuation distribution pipe is connected to the pot, and the treatment liquid received in the pot includes a drainage pipe for draining the liquid. The substrate processing apparatus according to claim 2 or 3, wherein the liquid leakage detecting unit executes a valve closing step of closing the flow valve in a state where the processing liquid nozzle is arranged at the retracted position. The nozzle moving unit executes a moving step of moving the processing liquid nozzle arranged at the retracted position from the retracted position to another position.
The substrate processing apparatus according to any one of claims 2 to 4, wherein the liquid leakage detecting unit performs a first valve opening step of opening the closed flow valve prior to the moving step. .. A second valve opening step in which the liquid leakage detecting unit opens the flow valve in the closed state prior to the retracting / discharging step of opening the supply valve in a state where the processing liquid nozzle is arranged at the retracting position. The substrate processing apparatus according to any one of claims 2 to 5. The leakage detection unit, when detecting liquid leakage from the supply valve, opening the circulating valve in the closed state, to perform a third valve opening step, in any one of claims 1 to 6 The substrate processing apparatus described. The detector detects the treatment liquid that collects in the upstream region,
When the liquid leakage detection unit is in a state where the treatment liquid nozzle is arranged in the retracted position and the flow valve is closed, the liquid leakage detection unit enables liquid leakage detection by the liquid leakage detection unit, and excludes the predetermined liquid detection unit. The substrate processing apparatus according to any one of claims 2 to 6 , wherein the leak detection by the leak detection unit is invalidated in the case of the case. The leakage detection unit, during execution of the treatment liquid nozzle wherein the supply valve in a state disposed in the retracted position and the circulating valve is open wither retracted discharge step, the leakage detection by the leakage detection unit The substrate processing apparatus according to claim 8, which is invalidated. The leak detection unit
When the treatment liquid detected amount specified in advance in the detection period specified Me pre is detected, detects that there is leakage from the supply valve,
One of claims 1 to 9, wherein if the detected amount of the treatment liquid is not detected within the detection period after the flow valve is closed, it is detected that there is no liquid leakage from the supply valve. The substrate processing apparatus according to. The invention according to any one of claims 1 to 10, wherein the detector includes a liquid level sensor that detects whether or not the liquid level of the treatment liquid accumulated in the upstream region or the branch region has reached a predetermined height. The substrate processing apparatus described. The supply pipe is provided from a first pipe portion interposed with the supply valve, a second pipe portion extending upward from the downstream end of the first pipe portion, and a downstream end of the second pipe portion. A third piping portion extending horizontally and a fourth piping portion connecting the third piping portion and the treatment liquid nozzle are included.
After the treatment liquid is discharged from the treatment liquid nozzle, the treatment liquid in the supply pipe is sucked, and the tip surface of the treatment liquid is set to the third pipe portion or the fourth pipe portion. The substrate processing apparatus according to any one of claims 1 to 11, further comprising a suction device for sucking to a retracted position. A supply pipe that supplies the treatment liquid to the treatment liquid nozzle for discharging the treatment liquid toward the substrate, a supply valve that is interposed in the supply pipe and opens and closes the supply pipe, and discharge from the treatment liquid nozzle. A substrate processing method executed in a substrate processing apparatus including a flow pipe through which a treatment liquid that is a treatment liquid and is not supplied to the substrate flows, and a flow valve that is interposed in the flow pipe to open and close the distribution pipe. hand,
In the valve closing step of closing the distribution valve while the supply valve is in the closed state,
In the closed state of the supply valve and the closed state of the flow valve, the treatment liquid that collects in the upstream region on the upstream side of the flow valve in the flow pipe, or branches from the upstream region and collects the treatment liquid. A substrate processing method comprising a liquid leakage detecting step of detecting leakage of the processing liquid from the supply valve based on the treatment liquid accumulated in a branch region that can be stored. The distribution pipe includes an evacuation distribution pipe through which the processing liquid discharged from the processing liquid nozzle is arranged at a retracting position for retracting laterally from above the substrate.
13. The substrate processing method according to claim 13, wherein the substrate processing method further includes a retracting position arranging step of arranging the processing liquid nozzle at the retracting position prior to the valve closing step. A moving step of moving the processing liquid nozzle arranged at the evacuation position from the evacuation position to another position,
The substrate processing method according to claim 14, further comprising a first valve opening step of opening the closed flow valve prior to the moving step. By opening the supply valve in a state in which the treatment liquid nozzle is disposed in the retracted position, the retracted discharge step of discharging the treatment liquid from the treatment liquid nozzle for the pre-dispense,
The substrate processing method according to claim 14 or 15, further comprising a second valve opening step of opening the closed flow valve prior to the evacuation discharge step. The third valve opening step of opening the closed flow valve when the leak detecting step detects a leak from the supply valve is further included in any one of claims 13 to 16. The substrate processing method described. The leak detection step
When the treatment liquid nozzle is arranged at a retracting position for retracting laterally from above the substrate and the flow valve is closed , the liquid leakage detection in the liquid leakage detection step is enabled, and other than that. The substrate processing method according to any one of claims 13 to 17, further comprising a detection invalidation step of invalidating the leakage detection in the leak detection step in a predetermined case. 18. The detection invalid step invalidates the leak detection in the leak detection step when the treatment liquid nozzle is arranged at the retracted position and the supply valve and the flow valve are open. The substrate processing method described in 1. The leak detection step
When the treatment liquid detected amount specified in advance in the detection period specified Me pre is detected, the detected amount within the detection period from the there leakage from the supply valve and detected, and said circulating valve is closed The substrate processing method according to any one of claims 13 to 19, further comprising a step of detecting that there is no leakage from the supply valve when the treatment liquid is not detected.

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