JP6624599B2 - Substrate processing apparatus and processing liquid discharge method - Google Patents

Description

  The present invention relates to a substrate processing apparatus for processing a substrate using a processing liquid, and a processing liquid discharging method for discharging the processing liquid. Substrates to be processed using the processing liquid include, for example, a semiconductor wafer, a substrate for a liquid crystal display, a substrate for a plasma display, a substrate for an FED (Field Emission Display), a substrate for an optical disk, a substrate for a magnetic disk, and a magneto-optical device. Substrates for disks, substrates for photomasks, ceramic substrates, substrates for solar cells and the like are included.

  Patent Document 1 listed below discloses a single-wafer-type substrate processing apparatus that processes substrates one by one. The substrate processing apparatus includes a spin chuck that horizontally holds and rotates the substrate, a processing liquid nozzle that discharges a processing liquid toward an upper surface of the substrate held by the spin chuck, and a processing liquid that is supplied to the processing liquid nozzle. And a switching valve interposed in the processing liquid piping. When the open / close valve is opened, the processing liquid in the processing liquid pipe is supplied to the processing liquid nozzle, and when the processing liquid nozzle is closed, the supply of the processing liquid to the processing liquid nozzle is stopped.

JP 2007-257565 A

When the on-off valve is opened, the valve element separates from the valve seat. At this time, since the valve body rubs against the valve seat, particles may be generated inside the on-off valve. The particles may be supplied to the processing liquid nozzle together with the processing liquid.
Also, when the on-off valve is closed, particles may be generated inside the on-off valve for the same reason. Particles generated before the open / close valve is completely closed may be supplied to the processing liquid nozzle together with the processing liquid. Further, there is a case where the particles remain in the opening / closing valve and are supplied to the processing liquid nozzle together with the processing liquid when the opening / closing valve is opened again.

The particles supplied to the processing liquid nozzle are discharged from the processing liquid nozzle to the substrate together with the processing liquid. Therefore, particles generated in the open / close valve may adhere to the substrate.
Accordingly, an object of the present invention is to provide a substrate processing apparatus and a processing liquid discharging method that can reliably prevent a processing liquid containing particles generated in an opening / closing valve from being supplied to a substrate.

According to an aspect of the present invention, there is provided a substrate holding unit for holding a substrate, a processing liquid nozzle for discharging a processing liquid for processing the substrate, and a processing liquid nozzle. A processing liquid pipe connected to supply the processing liquid from the processing liquid supply unit to the processing liquid nozzle, an open / close valve for opening and closing the processing liquid pipe, and a downstream or upstream side of the open / close valve. A branch pipe branched and connected to the processing liquid pipe at a branch position, and a processing liquid supplied to the processing liquid pipe from the processing liquid supply unit, a downstream portion of the processing liquid pipe downstream of the branch position. It includes a switching unit for switching between the state and the state leading to the branch pipe leading to, and a control unit for controlling the opening and closing valve and the switching unit, the switching Yoo Tsu TMG, the downstream portion includes a pressure loss modification unit for changing the pressure loss when the circulation liquid, said control unit, said opening and closing valve in the held state to the open state, the processing liquid pipe A non-discharge step of not discharging the processing liquid from the processing liquid nozzle by guiding the processing liquid supplied to the branch pipe from the branch position to the branch pipe, and in a state where the open / close valve is kept open, Discharging the processing liquid from the processing liquid nozzle toward the substrate by guiding the processing liquid supplied to the processing liquid pipe from the branch position to the downstream portion, and executing the processing unit. In the non-discharging step, the pressure loss changing unit is set to a large pressure loss state where the pressure loss is relatively large, and in the processing liquid discharging step, the pressure The loss change unit the pressure loss is relatively small small pressure loss condition, to provide a substrate processing apparatus.

According to this configuration, in the non-ejection step, the control unit controls the switching unit such that the processing liquid supplied to the processing liquid pipe is guided from the branch position to the branch pipe while the open / close valve is kept open. . Thus, treatment liquid nozzle or et treatment liquid is not ejected. This makes it possible to prevent the processing liquid from being discharged from the processing liquid nozzle while maintaining the open state of the open / close valve.

In the processing liquid discharging step of discharging the processing liquid toward the substrate, the control unit controls the switching unit so that the processing liquid supplied to the processing liquid piping is moved from the branch position to a downstream portion of the processing liquid piping branch position. (Hereinafter, referred to as a “downstream portion”; the same applies in this section), the processing liquid is discharged from the processing liquid nozzle.
Therefore, without opening and closing the opening and closing valve can discharge the processing liquid from the processing liquid nozzle. Since the non-ejection step without opening and closing the opening and closing valve can be shifted to the processing liquid discharge step, due to the transition to the treatment liquid ejection step from a non-ejection step, there is no occurrence of a new particle in the opening and closing valve.

Therefore, it is possible to reliably prevent the processing liquid containing particles generated in the opening / closing valve from being supplied to the substrate.
In the non-ejection step, the control unit sets the pressure loss changing unit to a high pressure loss state. Therefore, the pressure loss required for the liquid to flow through the downstream portion increases. As a result, the processing liquid supplied to the processing liquid pipe is urged to enter the branch pipe from the branch position.
On the other hand, in the processing liquid discharging step, the control unit brings the pressure loss changing unit into a small pressure loss state. Therefore, the pressure loss required for the liquid to flow through the downstream portion is reduced. As a result, the processing liquid supplied to the processing liquid pipe is urged to enter the downstream portion from the branch position.
In the invention according to claim 2, the control unit opens the opening / closing valve and guides the processing liquid supplied to the processing liquid pipe from the branch position to the downstream portion prior to the non-ejection step. According to the present invention, a pre-dispensing step of discharging a processing liquid for pre-dispensing from the processing liquid nozzle is further performed, and in the non-discharging step, the control unit causes the pressure loss changing unit to relatively control the pressure loss. 2. The substrate processing apparatus according to claim 1, wherein the substrate is set to a large pressure loss state, and the pressure loss changing unit is set to a small pressure loss state in which the pressure loss is relatively small in the pre-dispensing step and the processing liquid discharging step. It is.

  According to this configuration, the processing liquid is discharged from the processing liquid nozzle by the control unit opening the opening / closing valve and guiding the processing liquid supplied to the processing liquid piping from the branch position to the downstream portion. In the pre-dispensing step, the processing liquid discharged from the processing liquid nozzle is discharged outside the apparatus without being supplied to the substrate. Therefore, in the pre-dispensing step, even if particles are generated in the opening / closing valve by the opening operation of the opening / closing valve, the particles are discharged from the processing liquid nozzle together with the processing liquid, and are discharged outside the apparatus together with the processing liquid.
  Therefore, the processing liquid from the processing liquid nozzle can be made non-discharged without opening and closing the open / close valve. Since the transition from the pre-dispensing step to the non-discharge step can be performed without opening and closing the on-off valve, no new particles are generated in the on-off valve due to the transition from the pre-dispense step to the non-discharge step.
  Therefore, it is possible to more reliably prevent the processing liquid containing particles generated in the opening / closing valve from being supplied to the substrate.

According to a third aspect of the present invention, the pressure loss changing unit includes an opening adjustment valve for adjusting an opening of the downstream portion, and the opening adjustment valve has a low opening. The large pressure loss state is realized by setting an opening degree state, and the small pressure loss state is realized by setting the opening degree adjustment valve to a high opening state with a relatively high opening degree. 3. The substrate processing apparatus according to 1 or 2 .

  The invention according to claim 4 is the substrate processing apparatus according to any one of claims 1 to 3, wherein the downstream portion has a high position portion that is higher in the vertical direction than the branch position. is there.
  According to this configuration, by providing the high position portion in a part of the downstream portion, a pressure loss due to the head pressure of the treatment liquid due to the difference in height of the high position portion further occurs. When the supply pressure of the processing liquid supplied to the downstream portion falls below the pressure loss including the head pressure of the processing liquid due to the height difference of the high position portion, the processing liquid passes over the height difference between the branch position and the high position portion. I can't. On the other hand, if the supply pressure of the processing liquid supplied to the downstream portion exceeds the pressure loss including the head pressure of the processing liquid due to the height difference of the high position portion, the difference in height between the branch position and the high position portion is reduced. Can be overcome, and the processing liquid is discharged from the processing liquid nozzle.
  The invention according to claim 5, wherein the processing liquid supply unit includes a circulation pipe through which the processing liquid circulates, an upstream end of the processing liquid pipe is connected to the circulation pipe, and a downstream end of the branch pipe is The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is connected to a circulation pipe.
  According to this configuration, the processing liquid flowing through the branch pipe can be returned to the circulation pipe.

The invention according to claim 6 for achieving the above object has a substrate holding unit for holding a substrate, a processing liquid nozzle for discharging a processing liquid for processing the substrate, and a processing liquid nozzle. A processing liquid pipe connected to supply the processing liquid from the processing liquid supply unit to the processing liquid nozzle, an open / close valve for opening and closing the processing liquid pipe, and a downstream or upstream side of the open / close valve. A branch pipe branched and connected to the processing liquid pipe at a branch position, and a processing liquid supplied to the processing liquid pipe from the processing liquid supply unit, a downstream portion of the processing liquid pipe downstream of the branch position. It includes a switching unit for switching between the state and the state leading to the branch pipe leading to, and a control unit for controlling the opening and closing valve and the switching unit, the switching Yoo Tsu DOO includes a branch line valve for opening and closing the branch pipe, wherein the control unit, while holding the opening and closing valve in an open state, the processing liquid supplied to the process liquid pipe, the branch position A non-discharging step in which the processing liquid is not discharged from the processing liquid nozzle by guiding the processing liquid to the branch pipe, and the processing liquid supplied to the processing liquid pipe while maintaining the open / close valve in an open state. Performing a processing liquid discharging step of discharging a processing liquid from the processing liquid nozzle toward the substrate by guiding the processing liquid nozzle to the substrate from the branch position, wherein the control unit performs the branch pipe valve in the non-discharging step. the opening, closing the branch line valve in either one treatment fluid ejection out step, to provide a board processing unit.

According to this configuration, in the non-ejection step, the control unit controls the switching unit such that the processing liquid supplied to the processing liquid pipe is guided from the branch position to the branch pipe while the open / close valve is kept open. . Thus, the processing liquid is not discharged from the processing liquid nozzle. This makes it possible to prevent the processing liquid from being discharged from the processing liquid nozzle while maintaining the open state of the open / close valve.
In the processing liquid discharging step of discharging the processing liquid toward the substrate, the control unit controls the switching unit to guide the processing liquid supplied to the processing liquid pipe from the branch position to the downstream portion, thereby processing the processing liquid. The processing liquid is discharged from the nozzle.
Therefore, the processing liquid can be discharged from the processing liquid nozzle without opening and closing the open / close valve. Since the process can be shifted from the non-discharge step to the processing liquid discharge step without opening and closing the open / close valve, there is no generation of new particles in the open / close valve due to the shift from the non-discharge step to the process liquid discharge step.
Therefore, it is possible to reliably prevent the processing liquid containing particles generated in the opening / closing valve from being supplied to the substrate.
In the non-discharge step, the control unit opens the branch pipe valve. Thus, the processing liquid supplied to the processing liquid pipe can enter the branch pipe from the branch position.
On the other hand, in processing solution discharge step, the control unit closes the branch pipe valve. Therefore, it becomes difficult for the processing liquid supplied to the processing liquid pipe to flow from the branch position to the branch pipe, and it is encouraged to enter the downstream portion.

In the invention described in claim 7 , the control unit opens the open / close valve and guides the processing liquid supplied to the processing liquid pipe from the branch position to the downstream portion prior to the non-ejection step. By executing a pre-dispensing step of discharging a processing liquid for pre-dispensing from the processing liquid nozzle, the control unit opens the branch pipe valve in the non-discharge step, and performs the pre-dispensing step and the The substrate processing apparatus according to claim 6, wherein the branch pipe valve is closed in the processing liquid discharging step .
According to this configuration, the processing liquid is discharged from the processing liquid nozzle by the control unit opening the opening / closing valve and guiding the processing liquid supplied to the processing liquid piping from the branch position to the downstream portion. In the pre-dispensing step, the processing liquid discharged from the processing liquid nozzle is discharged outside the apparatus without being supplied to the substrate. Therefore, in the pre-dispensing step, even if particles are generated in the opening / closing valve by the opening operation of the opening / closing valve, the particles are discharged from the processing liquid nozzle together with the processing liquid, and are discharged outside the apparatus together with the processing liquid.
Therefore, the processing liquid from the processing liquid nozzle can be made non-discharged without opening and closing the open / close valve. Since the transition from the pre-dispensing step to the non-discharge step can be performed without opening and closing the on-off valve, no new particles are generated in the on-off valve due to the transition from the pre-dispense step to the non-discharge step.
Therefore, it is possible to more reliably prevent the processing liquid containing particles generated in the opening / closing valve from being supplied to the substrate.

The invention according to claim 8 is the substrate processing apparatus according to claim 6 or 7 , wherein the downstream portion partially has a high position vertically higher than the branch position.
According to this configuration, by providing the high position portion in a part of the downstream portion, a pressure loss due to the head pressure of the treatment liquid due to the difference in height of the high position portion further occurs. When the supply pressure of the processing liquid supplied to the downstream portion falls below the pressure loss including the head pressure of the processing liquid due to the height difference of the high position portion, the processing liquid passes over the height difference between the branch position and the high position portion. I can't. On the other hand, if the supply pressure of the processing liquid supplied to the downstream portion exceeds the pressure loss including the head pressure of the processing liquid due to the height difference of the high position portion, the difference in height between the branch position and the high position portion is reduced. Can be overcome, and the processing liquid is discharged from the processing liquid nozzle.

According to a ninth aspect of the present invention, the processing liquid supply unit includes a circulation pipe through which the processing liquid circulates, an upstream end of the processing liquid pipe is connected to the circulation pipe, and a downstream end of the branch pipe is it is connected to the circulation piping, a substrate processing apparatus according to any one of claims 1-8.
According to this configuration, the processing liquid flowing through the branch pipe can be returned to the circulation pipe.

The invention according to claim 1 0 for achieving the above object, there is provided a treatment liquid ejection method of ejecting the processing liquid toward the treatment liquid nozzle onto the substrate, for supplying a process liquid prior Symbol treatment liquid nozzle in state-like holding the opening and closing valve in the open state for opening and closing the processing liquid piping, the processing liquid supplied to the process liquid pipe set branch located on the downstream side or upstream side of the opening and closing valve By guiding the processing liquid from the processing liquid nozzle to the processing liquid nozzle at the branch position, the processing liquid is not discharged from the processing liquid nozzle, and the open / close valve is kept open. the by the processing liquid processing liquid supplied to the pipe from the branch position to guide the downstream portion, viewed contains a treatment liquid ejection step of ejecting the processing liquid processing liquid toward the substrate from the nozzle, the Non-discharge The step includes a step of setting a pressure loss changing unit that changes a pressure loss when a liquid flows through the downstream portion to a large pressure loss state in which the pressure loss is relatively large, and the non-discharge step includes the step of: the pressure loss changes, steps a including to relatively small low pressure loss state the pressure loss, providing a treatment liquid ejection method.

According to the method of the present invention, the same operation and effect as those described in relation to the first aspect can be obtained.
Further, the invention according to claim 11 is that, prior to the non-ejection step, the opening / closing valve is opened and the processing liquid supplied to the processing liquid pipe is moved from the branch position to the processing liquid pipe from the branch position. A pre-dispensing step of discharging the processing liquid for pre-dispensing from the processing liquid nozzle by guiding the processing liquid to the downstream portion on the downstream side, the pre-dispensing step further includes the pressure loss changing unit, The method according to claim 10, further comprising a step of setting a small pressure loss state in which the pressure loss is relatively small.
According to the method of the present invention, the same operation and effect as the operation and effect described in relation to claim 2 can be obtained.

FIG. 1 is a schematic view of a substrate processing apparatus according to an embodiment of the present invention as viewed in a horizontal direction. FIG. 2A is a schematic cross-sectional view illustrating an internal structure of a chemical valve provided in the substrate processing apparatus. FIG. 2B is a schematic sectional view showing the internal structure of the slow leak valve provided in the substrate processing apparatus. FIG. 3 is a time chart showing states of the discharge valve, the slow leak valve, and the branch pipe valve from the pre-dispensing step to the chemical liquid discharging step. FIG. 4A is a schematic diagram showing the flow of the chemical solution in the pre-dispensing step (T1 in FIG. 3). FIG. 4B is a schematic diagram showing the flow of the chemical solution in the discharge stop step (T2 in FIG. 3). FIG. 4C is a schematic diagram showing the flow of the chemical solution in the nozzle moving step (T3 in FIG. 3). FIG. 4D is a schematic view showing the flow of the chemical solution in the chemical solution discharging step (T4 in FIG. 3). FIG. 5 is a diagram for explaining the pressure acting on the chemical solution in the downstream portion of the chemical solution pipe. FIG. 6 is a diagram showing a first modification of the present invention. FIG. 7 is a diagram showing a second modification of the present invention. FIG. 8 is a diagram showing a third modification of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a schematic view of a substrate processing apparatus 1 according to one embodiment of the present invention as viewed in a horizontal direction.
The substrate processing apparatus 1 is a single wafer processing apparatus that processes a disk-shaped substrate W such as a semiconductor wafer one by one. The substrate processing apparatus 1 includes a processing unit 2 that processes a substrate W using a processing liquid, a transport robot (not shown) that transports the substrate W to the processing unit 2, and a control unit 3 that controls the substrate processing apparatus 1. Including. Further, the processing unit 2 is supplied with a chemical from a chemical supply unit (processing liquid supply unit) 101.

  The processing unit 2 and the chemical solution supply unit 101 may be part of a common device, or may be independent units (units that can be moved independently). That is, the substrate processing apparatus 1 including the processing unit 2 and the chemical supply unit 101 may be provided, or the substrate processing apparatus 1 including the processing unit 2 and the chemical supply unit disposed at a position separated from the substrate processing apparatus 1. 101 may be provided as a separate device. Although only one chemical supply unit 101 is shown in FIG. 1, when a plurality of chemicals are provided, the number of chemical supply units 101 may be provided according to the type.

The processing unit 2 includes a box-shaped processing chamber 4 and a spin chuck (substrate) that rotates the substrate W about a vertical rotation axis A1 passing through the center of the substrate W while holding the substrate W horizontally in the processing chamber 4. (Holding unit) 5 and one or a plurality of processing liquid nozzles for discharging the processing liquid toward the substrate W held by the spin chuck 5.
The spin chuck 5 includes a disc-shaped spin base 6 held in a horizontal position, a plurality of holding pins 7 for holding the substrate W in a horizontal position above the spin base 6, and a central portion of the spin base 6. It includes a spin shaft 8 extending downward, and a spin motor 9 for rotating the substrate W and the spin base 6 around the rotation axis A1 by rotating the spin shaft 8. The spin chuck 5 is not limited to a sandwich type chuck in which a plurality of sandwiching pins 7 are brought into contact with the peripheral end surface of the substrate W, and the back surface (lower surface) of the substrate W which is a non-device forming surface is adsorbed on the upper surface of the spin base 6. May be a vacuum type chuck that holds the substrate W horizontally.

  The processing unit 2 includes a rinsing liquid nozzle 10 that discharges a rinsing liquid downward toward the upper surface of the substrate W held by the spin chuck 5, and a rinsing liquid that guides the rinsing liquid from the rinsing liquid supply source to the rinsing liquid nozzle 10. It includes a pipe 11 and a rinse liquid valve 12 that opens and closes the inside of the rinse liquid pipe 11. The rinsing liquid is, for example, pure water (deionized water). The rinsing liquid is not limited to pure water, and may be any of carbonated water, electrolytic ionic water, hydrogen water, ozone water, and hydrochloric acid water having a dilute concentration (for example, about 10 to 100 ppm).

  The processing unit 2 includes a chemical liquid nozzle (processing liquid nozzle) 13 that discharges a chemical liquid toward the upper surface of the substrate W held by the spin chuck 5, a nozzle arm 14 having the chemical liquid nozzle 13 attached to a tip end, a nozzle An arm swing unit 15 for swinging the arm 14 around a predetermined swing axis (not shown). The chemical liquid nozzle 13 is attached to a nozzle arm 14 extending in the horizontal direction with its discharge port 13a directed downward, for example.

  The processing unit 2 further includes a chemical pipe (a processing liquid pipe) 16 that guides the chemical from the chemical supply unit 101 to the chemical nozzle 13. One end 16a (that is, the upstream end) of the chemical pipe 16 is connected to the circulation pipe 103 of the chemical supply unit 101, and the other end 16b of the chemical pipe 16 is connected to the chemical nozzle 13. The chemical pipe 16 has a slow leak valve (pressure loss changing unit) 17 as an opening adjustment valve for adjusting the opening of the chemical pipe 16, and a discharge valve (open / close valve) as an open / close valve for opening and closing the chemical pipe 16. A flow meter 18 for measuring the flow rate of the chemical solution flowing through the chemical solution pipe 16 is provided in this order from the chemical solution nozzle 13 side.

  Further, a branch pipe 21 is branched and connected to a branch position 20 set in the middle of the chemical liquid pipe 16. In this embodiment, the branch position 20 is set at a predetermined position on the upstream side of the flow meter 19. In the following description, the downstream portion 22 downstream of the branch position 20 in the chemical solution pipe 16 is simply referred to as “downstream portion 22”, and the upstream portion 23 of the chemical solution pipe 16 upstream of the branch position 20 is simply referred to as “the downstream portion 22”. This is referred to as "upstream portion 23".

One end 21 a (that is, the downstream end) of the branch pipe 21 is connected to the circulation pipe 103 of the chemical solution supply unit 101. The branch pipe 21 is provided with a branch pipe valve 24 for opening and closing the branch pipe 21.
The chemical liquid pipe 16 includes a high position portion 25 that is higher in the vertical direction by one step than the other portion in a part of the downstream portion 22. In FIG. 1, the downstream portion 22 includes a low position portion 26 set on the branch position 20 side, a high position portion 25 set on the chemical solution nozzle 13 side, and a low position portion 26 and a high position portion 25. And a top end portion 28 connecting the high position portion 25 and the chemical liquid nozzle.

The high portion 25 extends substantially horizontally. The high position portion 25 is disposed higher than the branch position 20 by the height H. The height H is, for example, several tens of cm.
The low position portion 26 extends substantially horizontally while maintaining the same vertical height as the branch position 20. In this embodiment, the chemical liquid nozzle 13 is interposed in the lower portion 26 of the downstream portion 22.

The upper and lower connection portions 27 may extend vertically as shown in FIG. 1 or may extend along a direction inclined with respect to the vertical direction. In this embodiment, the slow leak valve 17 is interposed in the upper and lower connecting portions 27.
The tip portion 28 may extend vertically as shown in FIG. 1 or may extend along a direction inclined with respect to the vertical direction.

  The processing unit 2 includes a standby pot (container) 29 arranged around the spin chuck 5 in plan view. The standby pot 29 is a box-shaped pot for receiving the chemical discharged from the chemical nozzle 13 disposed at the pre-dispensing position P1, which is the retracted position retracted from above the substrate W. A drain pipe 30 is connected to the bottom of the standby pot 29. The chemical solution received by the standby pot 29 is sent out to a drainage treatment facility (not shown) outside the apparatus via a drainage pipe 30. Therefore, the chemical liquid discharged to the standby pot is not supplied to the substrate.

  The chemical supply unit 101 includes a chemical tank 102 for storing a chemical, and a circulation pipe 103 for guiding the chemical stored in the chemical tank 102 to the processing unit 2. Both ends of the circulation pipe 103 are connected to the chemical tank 102, and the chemical stored in the chemical tank 102 circulates in the circulation pipe 103. The circulation pipe 103 is provided with a pump 104 that draws a chemical solution from the chemical solution tank 102 and sends it to the circulation pipe 103. Although not shown, the circulation pipe 103 is provided with a filter, a heater, and the like. One end 16a (that is, the upstream end) of the chemical liquid pipe 16 is connected to the circulation pipe 103. The circulating pressure of the chemical in the circulation pipe 103 is maintained at a predetermined pressure by a pump 104 and a pressure adjustment unit such as a regulator (not shown) provided in the circulation pipe 103. With this circulation pressure, the chemical is supplied from the circulation pipe 103 at a predetermined supply pressure. Further, one end 21a of the branch pipe 21 is connected to the circulation pipe 103.

  The chemical supplied from the circulation pipe 103 to the chemical pipe 16 is, for example, sulfuric acid, acetic acid, nitric acid, hydrochloric acid, hydrofluoric acid, aqueous ammonia, aqueous hydrogen peroxide, an organic acid (for example, citric acid, oxalic acid, etc.), or an organic alkali (for example, , TMAH: tetramethylammonium hydroxide, etc.), an organic solvent (eg, IPA: isopropyl alcohol, etc.), and at least one of a surfactant and a corrosion inhibitor.

FIG. 2A is a schematic cross-sectional view showing the internal structure of the discharge valve 18 provided in the substrate processing apparatus 1. In FIG. 2A, the first valve element 35 in the open state is indicated by a solid line, and the first valve element 35 in the closed state is indicated by a two-dot chain line. Hereinafter, the internal structure of the discharge valve 18 will be described with reference to FIG. 2A.
The discharge valve 18 is, for example, a diaphragm valve. The discharge valve 18 includes a valve body in which the first flow path 32 is formed. The valve body includes a first inlet 31 into which the liquid flows, a first outlet 33 for discharging the liquid flowing into the first inlet 31, a first inlet 31, and a first outlet 33. And a first valve seat 35 surrounding the first flow path 32, and a first valve body 35 disposed in the first flow path 32. . The first valve body 35 is a diaphragm formed of an elastic material such as resin (for example, PTFE) or rubber. The low position portion 26 (chemical solution pipe 16) includes an upstream pipe 26 a for guiding the chemical solution from the chemical solution supply unit 101 to the first inlet 31, and a downstream for guiding the chemical solution from the first outlet 33 to the chemical solution nozzle 13. And a pipe 26b.

  The discharge valve 18 includes a valve actuator that opens and closes a valve body. The valve actuator includes, for example, a pneumatic actuator, more specifically, a first air cylinder 36. The first air cylinder 36 moves the first valve body 35 to an open position (position indicated by a solid line in FIG. 2A) away from the first valve seat 34 and a closed position pressed against the first valve seat 34. (A position shown by a two-dot chain line in FIG. 2A).

  When the first valve body 35 is in the closed position, the first valve body 35 contacts the first valve seat 34, and the first flow path 32 is closed. This state is the closed state of the discharge valve 18. That is, in the closed state of the discharge valve 18, the first valve body 35 is pressed against the first valve seat 34. On the other hand, when the first valve body 35 is in the open position, the first valve body 35 is largely separated from the first valve seat 34, so that the first flow path 32 is opened. This state is the open state of the discharge valve 18. That is, when the discharge valve 18 is in the open state, the first valve body 35 is separated from the first valve seat 34.

As shown in FIG. 1, the control unit 3 includes a computer. The first air cylinder 36 is connected to the control unit 3. The control unit 3 controls the amount of the rod (not shown) of the first air cylinder 36 to protrude and retract, thereby stopping the first valve body 35 at one of the closed position and the open position.
When the first valve body 35 and the first valve seat 34 rub against each other, particles may be generated inside the discharge valve 18. Therefore, the particles are generated inside the discharge valve 18 when the first valve body 35 in the contact state is separated from the first valve seat 34 or when the first valve body 35 comes into contact with the first valve seat 34. May occur.

FIG. 2B is a schematic sectional view showing the internal structure of the slow leak valve 17 provided in the substrate processing apparatus 1. In FIG. 2B, the second valve body 45 in the open state is shown by a solid line, and the second valve body 45 in a partially open state is shown by a two-dot chain line. Hereinafter, the internal structure of the slow leak valve 17 will be described with reference to FIG. 2B.
The slow leak valve 17 is, for example, a diaphragm valve. The slow leak valve 17 includes a valve body in which the second flow path 42 is formed. The valve body includes a second inflow port 41 into which the liquid flows, a second outflow port 43 for discharging the liquid flowing into the second inflow port 41, a second inflow port 41 and a second outflow port 43. A second valve seat 44 surrounding the second flow path 42, and a second valve body 45 disposed in the second flow path 42. . The second valve body 45 is a diaphragm formed of an elastic material such as resin (for example, PTFE) or rubber. The upper and lower connecting portions 27 (chemical solution pipes 16) are an upstream pipe 27a for guiding the chemical solution from the chemical solution supply unit 101 to the second inflow port 41 and a downstream direction for guiding the chemical solution from the second outflow port 43 to the chemical solution nozzle 13. And a pipe 27b.

  The slow leak valve 17 includes a valve actuator that opens and closes a valve body. The valve actuator includes, for example, a pneumatic actuator, more specifically, a second air cylinder 46. The second air cylinder 46 separates the second valve body 45 from the second valve seat 44 at a minute opening S1 with a first open position (a position indicated by a dashed line in FIG. 2B). Is movable between a second open position (position indicated by a solid line in FIG. 2B) farther from the second valve seat 44 than the open position.

  In a state where the second valve body 45 is in the first open position, the second valve body 45 is separated from the second valve seat 44 by a small interval S1. It is in a partially open state (low opening degree state, large pressure loss state). On the other hand, in a state where the second valve body 45 is in the second open position, the second valve body 45 is largely separated from the second valve seat 44, so that the second flow path 42 is opened. This state is the open state of the slow leak valve 17 (high opening degree state, small pressure loss state).

The second air cylinder 46 is connected to the control unit 3 (see FIG. 1). The control unit 3 controls the protruding / retracting amount of the rod (not shown) of the second air cylinder 46 to make the second valve body 45 stand still at one of the first open position and the second open position. .
The second valve body 45 separates from the second valve seat 44 regardless of whether the slow leak valve 17 is open or partially open. That is, the second valve body 45 and the second valve seat 44 do not rub against each other. Therefore, no particles are generated inside the slow leak valve 17.

  Further, the pressure loss generated in the liquid flowing between the second valve seat 44 and the second valve body 45 in the partially opened state is equal to the pressure loss generated in the liquid flowing between the second valve seat 44 and the second valve body 45 in the opened state. Is significantly larger than the pressure loss generated in the liquid flowing between the valve body 45 and the valve body 45. The flow rate (first flow rate) of the liquid discharged from the second outlet 43 in the partially opened state is equal to the flow rate (second flow rate) of the liquid discharged from the second outlet 43 in the opened state. Flow rate).

  As shown in FIG. 1, the control unit 3 controls operations of the spin motor 9, the arm swing unit 15, and the like according to a predetermined program. Further, the control unit 3 controls the opening / closing operation of the rinse liquid valve 12, the slow leak valve 17, the discharge valve 18, the branch pipe valve 24, and the like. The control unit 3 is provided with a detection value from the flow meter 19.

  As shown in FIG. 1, when the substrate W is processed, the control unit 3 controls the spin chuck 5 to rotate the substrate W. Thereafter, the control unit 3 controls the arm swinging unit 15 to move the chemical solution nozzle 13 from the pre-dispensing position P1 (the position shown by a broken line in FIG. 1) above the substrate W to retract to the side of the spin chuck 5. To the processing position P2 (the position indicated by the solid line in FIG. 1), and the chemical liquid is discharged from the chemical liquid nozzle 13 toward the upper surface of the rotating substrate W. Thus, the chemical is supplied to the entire upper surface of the substrate W (chemical supply step). After stopping the discharge of the chemical solution from the chemical solution nozzle 13, the control unit 3 controls the arm swing unit 15 to return the chemical solution nozzle 13 from the processing position P2 to the pre-dispense position P1. When the chemical liquid nozzle 13 is in the pre-dispensing position P <b> 1, the discharge port 13 a of the chemical liquid nozzle 13 faces the standby pot 29.

  Thereafter, the control unit 3 causes the rinsing liquid nozzle 10 to discharge pure water, which is an example of the rinsing liquid, toward the rotating substrate W. As a result, pure water is supplied to the entire upper surface of the substrate W, and the chemical liquid attached to the substrate W is washed away (rinse liquid supply step). After stopping the discharge of the pure water from the rinsing liquid nozzle 10, the control unit 3 causes the spin chuck 5 to rotate the substrate W at a high rotation speed. Thus, the pure water adhering to the substrate W is shaken off around the substrate W by centrifugal force. Therefore, pure water is removed from the substrate W, and the substrate W is dried (drying step).

In the processing example of the substrate processing apparatus 1, pre-dispensing is performed prior to discharging the chemical solution onto the substrate W.
FIG. 3 is a time chart showing states of the discharge valve 18, the slow leak valve 17, and the branch pipe valve 24 from the pre-dispensing step T1 to the chemical liquid discharging step T4. FIG. 4A is a schematic diagram illustrating the flow of the chemical solution in the pre-dispensing step T1. FIG. 4B is a schematic diagram illustrating the flow of the chemical solution in the discharge stop step T2. FIG. 4C is a schematic diagram illustrating the flow of the chemical solution in the nozzle movement step T3. FIG. 4D is a schematic diagram illustrating the flow of the chemical solution in the chemical solution discharging step T4. FIG. 5 is a diagram for explaining the pressure acting on the chemical solution in the downstream portion 22.

As shown in FIG. 5, the lower end of the upper and lower connecting portion 27, head pressure P _H by existing chemical vertical connection portion 27 acts.
The supply pressure P _D of the chemical in the low position portion 26 of the downstream portion 22 is the maximum head pressure P _MH when the chemical is present up to the upper end of the upper and lower connection portion 27, and the pressure loss when passing through the slow leak valve 17. if it exceeds the total pressure of P _S, chemical from a low position portion 26 is supplied to the chemical liquid nozzle 13 passes over the high position part 25.

On the other hand, the supply pressure P _D of the chemical in the low position part 26 of the downstream part 22 is the maximum water head pressure P _MH when the chemical is present in the entire upper and lower connection part 27 and the pressure loss when passing through the slow leak valve 17. if falls below the total pressure of P _S, chemical from a low position part 26 can not get over the high position part 25.
As described above, the second valve seat 44 the pressure loss P _S generated in the liquid that flows between the second valve element 45, the direction of some open state of the slow leak valve 17, the slow leak valve 17 is significantly larger than the open state. Therefore, the pressure loss P _S of the slow leak valve 17 in the open state, so that the total pressure of the pressure loss P _S and the maximum water head pressure P _MH is greater than the supply pressure P _D of the chemical in the low position part 26 If the discharge valve 18 is kept open, the chemical liquid from the low position portion 26 cannot cross the high position portion 25. In this case, the chemical liquid is discharged from the chemical liquid nozzle 13. Never.

Next, steps T1 to T4 will be described with reference to FIGS. 1, 3, and 4A to 4D. 4A to 4D, illustration of the flow meter 19 is omitted.
In the processing example of the substrate processing apparatus 1, the control unit 3 stops the pre-dispensing step T1 of discharging the chemical from the chemical nozzle 13 at the pre-dispensing position P1 and the discharging of the chemical from the chemical nozzle 13 prior to the discharge of the chemical. The discharging stop step T2 to be performed and the nozzle moving step T3 for moving the chemical liquid nozzle 13 from the predispensing position P1 to the processing position P2 are executed. Thereafter, a chemical liquid discharging step (processing liquid discharging step) T4 of discharging a chemical liquid from the chemical liquid nozzle 13 toward the substrate W is executed.

When it is time to execute the pre-dispense, the control unit 3 starts executing the pre-dispense step T1. Specifically, as shown in FIG. 3, the control unit 3 opens the discharge valve 18 and the slow leak valve 17 with the branch pipe valve 24 kept closed. Therefore, the chemical supplied from the circulation pipe 103 to the upstream portion 23 flows from the branch position 20 to the downstream portion 22. At this time, supply pressure P _D of the chemical at the branching position 20, because above the sum of the pressure loss P _S of the slow leak valve 17 in the maximum water head pressure P _MH and open state, chemical branching position 20, the high position part The liquid is supplied to the chemical liquid nozzle 13 after going over 25. Then, as shown in FIG. 4A, the chemical is discharged from the discharge port 13a of the chemical liquid nozzle 13. The chemical solution discharged from the chemical solution nozzle 13 is received by the standby pot 29 and then guided to the substrate processing equipment through the drainage pipe 30.

When a predetermined pre-dispense period has elapsed since the discharge valve 18 was opened, the control unit 3 starts executing a discharge stop step T2. Specifically, as shown in FIG. 3, the control unit 3 opens the branch pipe valve 24 and partially opens the slow leak valve 17 with the discharge valve 18 kept open. By opening the branch pipe valve 24, the chemical solution flowing through the upstream portion 23 can enter the branch pipe 21. Thus, it lowers supply pressure P _D of the chemical at the branching position 20. In addition, the closing of the slow leak valve 17, the pressure loss P _S of the slow leak valve 17 is increased. When the supply pressure P _D of the chemical at the branch position 20 is below the sum of the pressure loss P _S of the slow leak valve 17 with maximum water head pressure P _MH and partially opened state, the branch position 20 chemical liquid, high position Part 25 cannot be overcome. In this case, the chemical liquid already supplied to the upstream portion 23 flows from the branch position 20 to the branch pipe 21. Further, a chemical solution supplied from the circulation pipe 103 to the upstream portion 23 also flows from the branch position 20 to the branch pipe 21. As a result, as shown in FIG. 4B, the discharge of the chemical from the discharge port 13a of the chemical nozzle 13 is stopped. Accordingly, the discharge of the chemical from the chemical nozzle 13 is stopped while the discharge valve 18 is kept open.

  Thereafter, when the timing of discharging the chemical solution to the substrate W approaches, the control unit 3 executes a nozzle moving step T3. That is, the control unit 3 controls the arm swing unit 15 while maintaining the open state of the discharge valve 18 and the branch pipe valve 24 and the partially open state of the slow leak valve 17 as shown in FIGS. 3 and 4C. Under control, the chemical liquid nozzle 13 is pulled out from the predispensing position P1 to the processing position P2.

After the chemical liquid nozzle 13 is arranged at the processing position P2, the control unit 3 executes a chemical liquid discharge step T4. Specifically, as shown in FIG. 3, the control unit 3 opens the slow leak valve 17 and closes the branch pipe valve 24 with the discharge valve 18 kept open. By branch pipe valve 24 is closed, upstream chemical liquid flowing through the side portion 23 will not be able to enter the branch line 21, along with this, increases the supply pressure P _D of the chemical at the branching position 20. Further, the opening of the slow leak valve 17, the pressure loss P _S of the slow leak valve 17 is reduced. When the supply pressure P _D of the chemical at the branching position 20, exceeds the sum of the pressure loss P _S of the slow leak valve 17 in the maximum water head pressure P _MH and open state, chemical branching position 20, the high position part 25 It is possible to get over. In this case, the chemical supplied from the circulation pipe 103 to the upstream portion 23 flows from the branch position 20 to the downstream portion 22, as shown in FIG. The liquid medicine is discharged from 13a. The chemical discharged from the chemical nozzle 13 is supplied to the substrate W.

  As described above, according to this embodiment, when the control unit 3 opens the discharge valve 18 with the branch pipe valve 24 closed and the slow leak valve 17 opened, the chemical liquid is discharged from the chemical liquid nozzle 13. In the pre-dispensing step T1, the chemical discharged from the chemical nozzle 13 is drained outside the apparatus without being supplied to the substrate W. Therefore, even if particles are generated in the discharge valve 18 by the opening operation of the discharge valve 18 in the pre-dispensing step T1, the particles are discharged from the chemical liquid nozzle 13 together with the chemical liquid, and are discharged outside the machine together with the chemical liquid.

  In the discharge stop step T2 after the pre-dispensing, the control unit 3 opens the branch pipe valve 24 and keeps the slow leak valve 17 partially open while keeping the discharge valve 18 in the open state. As a result, the chemical supplied to the chemical pipe 16 is guided from the branch position 20 to the branch pipe 21, and the discharge of the chemical from the chemical nozzle 13 is stopped. Therefore, the discharge of the chemical solution from the chemical solution nozzle 13 can be stopped while the discharge valve 18 is kept open.

In the chemical liquid discharging step T4 for discharging the chemical liquid toward the substrate W, the control unit 3 closes the branch pipe valve 24 and opens the slow leak valve 17 while keeping the discharge valve 18 in the open state. As a result, the chemical supplied to the chemical pipe 16 is guided from the branch position 20 to the downstream portion 22, and the chemical is discharged from the chemical nozzle 13.
Therefore, in the discharge stop step T2 and the chemical liquid discharge step T4, the discharge of the chemical liquid from the chemical liquid nozzle 13 is stopped and restarted without opening and closing the discharge valve 18. Since there is no opening and closing of the discharge valve 18, no new particles are generated in the discharge valve 18 in the discharge stop step T2 and the chemical liquid discharge step T4.

Thus, it is possible to reliably prevent the chemical solution containing particles generated in the discharge valve 18 from being supplied to the substrate W. Therefore, a chemical solution in which particles are not generated can be supplied to the substrate W, and therefore, contamination of the substrate W can be reduced.
In the discharge stop step T2, the control unit 3 opens the branch pipe valve 24 and partially opens the slow leak valve 17 while keeping the discharge valve 18 open, so that the Stop discharging the chemical solution. That is, while the discharge valve 18 is kept open, the discharge of the chemical from the chemical nozzle 13 can be stopped. Therefore, the chemical liquid nozzle 13 can be moved from the pre-dispense position P1 to the processing position P2 while maintaining the discharge valve 18 in the open state and keeping the discharge of the chemical liquid from the chemical liquid nozzle 13 stopped. Accordingly, even when the chemical liquid nozzle 13 is moved while the discharge valve 18 is kept open, there is no possibility that the peripheral members of the substrate W and the substrate W are contaminated with the chemical liquid.

  Further, a slow leak valve 17 having no possibility of generating particles inside is disposed closer to the chemical liquid nozzle 13 than the discharge valve 18. That is, the slow leak valve 17 is disposed between the discharge valve 18 and the chemical liquid nozzle 13 in the chemical liquid pipe 16. Therefore, even when particles are generated inside the discharge valve 18, direct supply of the particles to the chemical liquid nozzle 13 is hindered. Thus, the supply of particles to the chemical liquid nozzle 13 can be suppressed.

  In addition, since the discharge valve 18 is disposed downstream of the branch position 20 in the chemical liquid pipe 16, it is possible to reliably prevent particles generated inside the discharge valve 18 from flowing into the branch pipe 21. Thereby, the chemical solution flowing through the branch pipe 21 can be kept clean. In addition, a clean chemical solution containing no particles can be returned to the circulation pipe 103 via the branch pipe 21.

  Further, the branch position 20 is set on the upstream side with respect to the flow meter 19. That is, the flow meter 19 is provided in the downstream portion 22. Therefore, it can be detected whether the chemical solution supplied to the upstream portion 23 flows from the branch position 20 to the upstream portion 23 or flows from the branch position 20 to the downstream portion 22. Thus, even when a chemical solution is ejected (dropping) from the chemical solution nozzle 13 in the nozzle moving step T2, it can be detected.

As mentioned above, although one Embodiment of this invention was described, this invention can be implemented in another form.
For example, in the above-described embodiment, the case where the shapes of the valve bodies (diaphragms) 35 and 45 are changed by the air cylinders 36 and 46 with respect to the discharge valve 18 and the slow leak valve 17 has been described. However, in at least one of the discharge valve 18 and the slow leak valve 17, the form of the first valve body 35 may be changed by an actuator other than an air cylinder such as an electric motor.

Further, the discharge valve 18 and the slow leak valve 17 may be other types of valves such as a needle valve.
In the above description, the discharge valve 18 is interposed in the low position portion 26 and the slow leak valve 17 is interposed in the upper and lower connection portions 27. However, both the discharge valve 18 and the slow leak valve 17 are in the low position. The discharge valve 18 and the slow leak valve 17 may both be interposed in the upper and lower connection portions 27.

As shown in FIG. 6, a slow leak valve (pressure loss changing unit, opening adjustment valve) 217 may be arranged on the chemical liquid pipe 16 on the upstream side of a discharge valve (open / close valve) 218.
Further, as shown in FIG. 7, the branch position 220 may be set in the chemical liquid pipe 16 on the downstream side of the slow leak valve 17.

Further, as shown in FIG. 8, one end 221a (that is, the downstream end) of the branch pipe 221 may be connected to an external recovery device without being connected to the circulation pipe 103. Further, one end 221a of the branch pipe 221 may be connected to a drainage device outside the machine, so that a chemical solution flowing through the branch pipe 221 may be drained.
In addition, a suction unit (not shown) is arranged downstream of the branch pipes 21 and 221, and a structure in which a chemical solution in the chemical pipe 16 can be sucked through the branch pipes 21 and 221 by a suction force generated by the suction unit. It may be adopted. That is, the branch pipes 21 and 221 may be configured by suction pipes. In this case, when the suction unit is driven, the suction force of the suction unit is transmitted to the inside of the chemical liquid pipe 16 via the suction pipe, and the chemical liquid in the chemical liquid pipe 16 is sucked by the suction unit via the suction pipe. You. The suction unit may be a suction pump or a combination of an ejector that generates a suction force and a gas valve that switches between supply and stop of gas supply to the ejector.

  Further, a high-temperature chemical solution may be circulating in the circulation pipe 103. The circulation pipe 103 is provided with a heater for temperature adjustment, and the chemical solution stored in the chemical tank 102 circulates in the circulation pipe 103 to adjust the temperature of the chemical solution to a predetermined high temperature. In this case, the above-described pre-dispensing step T1 is a step of discharging a high-temperature chemical, and the chemical is passed through the chemical pipe 16 in a state where the chemical is not discharged from the chemical nozzle 13 for a long time. Thereby, the pipe wall of the nozzle pipe of the chemical liquid nozzle 13 and the pipe wall of the chemical liquid pipe 16 which are in a low temperature state can be warmed, so that in the subsequent chemical liquid discharge step T4, a desired high temperature can be obtained. The chemical solution whose temperature has been adjusted can be discharged from the chemical solution nozzle 13.

In addition, although the description has been given by taking as an example the configuration in which the chemical liquid pipe 16 partially has the high position part 25, the chemical liquid pipe 16 may not have the high position part 25.
When the substrate processing apparatus 1 includes a plurality of processing units 2, the chemical supply unit 101 may supply a chemical to the plurality of processing units 2 in common. In this case, the chemical liquid pipe 16 included in each processing unit 2 is branched and connected to the circulation pipe 103, and the branch pipe 21 included in each processing unit 2 is also branched and connected to the circulation pipe 103.

Further, in the above-described embodiment, the case where the processing liquid piping is the chemical liquid piping 16 has been described, but the processing liquid passing through the processing liquid piping may be a liquid other than the chemical liquid.
Further, in the above-described embodiment, the case where the chemical liquid nozzle 13 discharges the chemical liquid toward the upper surface of the substrate W has been described, but the chemical liquid nozzle 13 may discharge the chemical liquid toward the lower surface of the substrate W.

In the above-described embodiment, the case where the substrate processing apparatus 1 is an apparatus for processing a disk-shaped substrate W has been described, but the substrate processing apparatus 1 is an apparatus for processing a polygonal substrate W. Is also good.
Further, two or more of all the modifications described above may be combined.
In addition, various design changes can be made within the scope of the matters described in the claims.

1: substrate processing apparatus 3: control unit 5: spin chuck (substrate holding unit)
13: Chemical liquid nozzle (treatment liquid nozzle)
16: Chemical liquid piping (treatment liquid piping)
17: Slow leak valve (pressure loss changing unit, opening adjustment valve)
18: Discharge valve (open / close valve)
20: branch position 21: branch pipe 22: downstream side part 24: branch pipe valve 25: high position part 101: chemical liquid supply unit (treatment liquid supply unit)
103: Circulation piping 217: Slow leak valve (pressure loss changing unit, opening adjustment valve)
218: Discharge valve (open / close valve)
220: branch position 221: branch pipe

Claims (11)

A substrate holding unit for holding the substrate,
A processing liquid nozzle for discharging a processing liquid for processing the substrate,
A processing liquid pipe connected to the processing liquid nozzle and supplying a processing liquid from a processing liquid supply unit to the processing liquid nozzle;
An opening and closing valve for opening and closing the processing liquid pipe;
A branch pipe branch-connected to the treatment liquid pipe at a branch position set on the downstream side or the upstream side of the on-off valve,
To switch between a state in which the processing liquid supplied from the processing liquid supply unit to the processing liquid pipe is guided to a downstream portion of the processing liquid pipe downstream of the branch position and a state in which the processing liquid is guided to the branch pipe. Switching unit,
A control unit for controlling the switching valve and the switching unit ,
The switching unit includes a pressure loss changing unit that changes a pressure loss when the liquid flows through the downstream portion,
Wherein the control unit, the on-off valve in the held state to the open state, the processing liquid supplied to the process liquid pipe, by leading to the branch pipe from the branch position, the treatment liquid from the treatment liquid nozzle A non-discharging step of not discharging the liquid, and guiding the processing liquid supplied to the processing liquid pipe from the branch position to the downstream portion in a state where the open / close valve is kept in an open state, thereby forming the processing liquid nozzle. perform the treatment liquid ejection step of ejecting the processing liquid toward the substrate from,
In the non-discharge step, the control unit sets the pressure loss change unit to a large pressure loss state in which the pressure loss is relatively large, and in the processing liquid discharge step, sets the pressure loss change unit to a state in which the pressure loss is relatively large. Substrate processing equipment that makes a small pressure loss state as small as possible .   Prior to the non-ejection step, the control unit opens the opening / closing valve and guides the processing liquid supplied to the processing liquid pipe from the branch position to the downstream portion, thereby pre-dispensing the processing liquid from the processing liquid nozzle. Further performing a pre-dispensing step of discharging a processing liquid for
  In the non-discharge step, the control unit sets the pressure loss change unit to a large pressure loss state where the pressure loss is relatively large, and in the pre-dispensing step and the processing liquid discharge step, the pressure loss change unit includes the pressure loss change unit. The substrate processing apparatus according to claim 1, wherein the pressure loss is set to a small pressure loss state where the pressure loss is relatively small. The pressure loss changing unit includes an opening adjustment valve for adjusting the opening of the downstream portion,
The large pressure loss state is realized by setting the opening degree control valve to a low opening state whose opening degree is relatively low, and the opening degree adjustment valve is set to a high opening state whose opening degree is relatively high. to realize the small pressure loss condition by a substrate processing apparatus according to claim 1 or 2. The substrate processing apparatus according to any one of claims 1 to 3 , wherein the downstream portion includes a high position portion that is higher in the vertical direction than the branch position. The processing liquid supply unit includes a circulation pipe through which the processing liquid circulates,
The substrate processing apparatus according to any one of claims 1 to 4 , wherein an upstream end of the processing liquid pipe is connected to the circulation pipe, and a downstream end of the branch pipe is connected to the circulation pipe. A substrate holding unit for holding the substrate,
A processing liquid nozzle for discharging a processing liquid for processing the substrate,
A processing liquid pipe connected to the processing liquid nozzle and supplying a processing liquid from a processing liquid supply unit to the processing liquid nozzle;
An opening and closing valve for opening and closing the processing liquid pipe;
A branch pipe branch-connected to the treatment liquid pipe at a branch position set on the downstream side or the upstream side of the on-off valve,
To switch between a state in which the processing liquid supplied from the processing liquid supply unit to the processing liquid pipe is guided to a downstream portion of the processing liquid pipe downstream of the branch position and a state in which the processing liquid is guided to the branch pipe. Switching unit,
A control unit for controlling the switching valve and the switching unit,
The switching unit includes a branch pipe valve for opening and closing the branch pipe,
The control unit guides the processing liquid supplied to the processing liquid pipe from the branch position to the branch pipe while holding the open / close valve in an open state, thereby discharging the processing liquid from the processing liquid nozzle. The non-ejection step not to be performed, and in a state in which the open / close valve is kept in an open state, the processing liquid supplied to the processing liquid pipe is guided from the branch position to the downstream portion, so that the processing liquid nozzle is Performing a processing liquid discharging step of discharging the processing liquid toward the substrate,
The control unit, the opening of the branch line valve in the non-ejection step, or One prior Symbol treatment liquid ejection step closing the branch line valve, board processor.   Prior to the non-ejection step, the control unit opens the opening / closing valve and guides the processing liquid supplied to the processing liquid pipe from the branch position to the downstream portion, thereby pre-dispensing the processing liquid from the processing liquid nozzle. Further performing a pre-dispensing step of discharging a processing liquid for
  The substrate processing apparatus according to claim 6, wherein the control unit opens the branch pipe valve in the non-discharge step and closes the branch pipe valve in the pre-dispensing step and the processing liquid discharge step.   8. The substrate processing apparatus according to claim 6, wherein the downstream portion includes a high position portion that is higher in the vertical direction than the branch position. 9.   The processing liquid supply unit includes a circulation pipe through which the processing liquid circulates,
  The substrate processing apparatus according to any one of claims 6 to 8, wherein an upstream end of the processing liquid pipe is connected to the circulation pipe, and a downstream end of the branch pipe is connected to the circulation pipe. A processing liquid discharging method for discharging a processing liquid from a processing liquid nozzle toward a substrate,
In the open condition form which holds the closed valve to an open state for opening and closing the processing liquid piping for supplying the treatment liquid to the treatment liquid nozzle, the processing liquid supplied to the process liquid pipe, downstream of the on-off valve A non-discharge step in which the processing liquid is not discharged from the processing liquid nozzle by guiding the liquid from the processing liquid nozzle to the processing liquid piping at the branch position from the branch position set on the side or the upstream side .
In a state where the open / close valve is kept in the open state, the processing liquid supplied to the processing liquid pipe is guided from the branch position to a downstream portion of the processing liquid pipe downstream of the branch position. , look containing a treatment liquid ejection step of ejecting the processing liquid toward the substrate from the treatment liquid nozzle,
The non-discharge step includes a step of changing the pressure loss changing unit that changes the pressure loss when the liquid flows through the downstream portion into a large pressure loss state in which the pressure loss is relatively large,
The non-ejection step, the pressure loss changes, steps a including to relatively small low pressure loss state the pressure loss, the treatment liquid ejection method.   Prior to the non-ejection step, the processing liquid is opened from the processing liquid nozzle for pre-dispensing by opening the open / close valve and guiding the processing liquid supplied to the processing liquid pipe from the branch position to the downstream portion. Further comprising a pre-dispensing step of discharging
  The method according to claim 10, wherein the pre-dispensing step includes a step of setting the pressure loss changing unit to a small pressure loss state in which the pressure loss is relatively small.

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