TWI856465B - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

A substrate processing apparatus (100) includes a liquid feed pipe (41), a supply pipe (43), a return pipe (44), a branch part (42), a first valve (47), and a second valve (48). The branch part (42) serves as a branch point among the liquid feed pipe (41), the supply pipe (43), and the return pipe (44). The first valve (47) is provided in the liquid feed pipe (41) and adjusts the flow rate of a processing liquid. The second valve (48) is provided in the return pipe (44). Setting the first valve (47) in an open state and the second valve (48) in a closed state brings a discharge state in which the processing liquid is allowed to flow from the liquid feed pipe (41) to the supply pipe (43) and discharged from a chemical liquid nozzle (21). Setting the second valve (48) from the closed state to the open state brings a processing liquid returning state in which the processing liquid is allowed to flow from the supply pipe (43) to the return pipe (44).

Description

Substrate processing device and substrate processing method

The present invention relates to a substrate processing device and a substrate processing method.

Conventionally, in the manufacturing process of a device including a substrate such as a semiconductor device or a liquid crystal display device, a substrate processing device is used to process the substrate. The substrate is, for example, a semiconductor wafer or a glass substrate for a liquid crystal display device.

Patent document 1 discloses a single-chip substrate processing device for processing substrates one by one. The substrate processing device described in patent document 1 is provided with a rotary chuck and a processing liquid supply device. The rotary chuck rotates the substrate. The processing liquid supply device supplies processing liquid to the substrate held on the rotary chuck. The processing liquid supply device is provided with a nozzle, a supply pipe and a valve. The nozzle spits out processing liquid toward the substrate. The supply pipe supplies processing liquid to the nozzle. The valve is provided on the supply pipe. The processing liquid is supplied to the substrate by being spewed from the nozzle. The valve is provided with a valve body and a valve seat. The valve is closed by the contact between the valve body and the valve seat, and the valve is opened by the separation of the valve body from the valve seat. [Prior art document] [Patent document]

Patent document 1: Japanese Patent Publication No. 2009-222189

(Invent the problem you want to solve)

However, in the substrate processing apparatus described in Patent Document 1, there is a situation in which a processing liquid remains between the valve and the nozzle after the valve is closed. In this case, when the substrate processing apparatus is not processing a substrate, the processing liquid between the valve and the nozzle may drip from the nozzle.

The present invention is made in view of the above-mentioned problem, and its purpose is to provide a substrate processing device and a substrate processing method, which can suppress the dripping of the processing liquid from the nozzle when the substrate processing device is not performing substrate processing. (Technical means for solving the problem)

The first aspect of the present invention is a substrate processing device that processes the substrate by supplying a processing liquid from a nozzle toward the substrate. The substrate processing device comprises: a liquid supply pipe, a supply pipe, a return pipe, a branch portion, a first valve, and a second valve. The liquid supply pipe guides the processing liquid. The supply pipe guides the processing liquid guided by the liquid supply pipe toward the nozzle. The return pipe guides the processing liquid guided by the liquid supply pipe along a path different from that of the supply pipe. The branch portion is a branch point of the liquid supply pipe, the supply pipe, and the return pipe. The first valve is provided on the liquid supply pipe, and can adjust the flow rate of the processing liquid supplied from the liquid supply pipe to the branch portion. The second valve is provided on the return pipe. By setting the first valve to an open state and the second valve to a closed state, a discharging state is achieved, in which the treatment liquid flows from the liquid delivery pipe toward the supply pipe and the treatment liquid is discharged from the nozzle. By setting the second valve from the closed state to the open state, a treatment liquid return state is achieved, in which the treatment liquid flows from the supply pipe toward the return pipe.

In the substrate processing apparatus of the first aspect of the present invention, the first valve may be a valve that does not completely close the processing liquid flow path of the liquid delivery pipe in a closed state.

In the substrate processing device of the first aspect of the present invention, the flow path for the aforementioned processing liquid to pass through may also include: a first flow path, which is on the aforementioned liquid delivery pipe side relative to the aforementioned diverging portion; a second flow path, which is on the aforementioned supply pipe side relative to the aforementioned diverging portion; and a third flow path, which is on the aforementioned return pipe side relative to the aforementioned diverging portion. The first angle may also be greater than the second angle. The aforementioned second angle may also be an angle between a first direction from the aforementioned diverging portion toward the aforementioned first flow path and a second direction from the aforementioned diverging portion toward the aforementioned second flow path. The aforementioned first angle may also be an angle between the aforementioned first direction and a third direction from the aforementioned diverging portion toward the aforementioned third flow path.

In the substrate processing apparatus of the first aspect of the present invention, the first flow path and the third flow path may extend from the branching portion in a substantially horizontal direction, and the second flow path may extend upward from the branching portion.

The substrate processing device of the first aspect of the present invention is also provided with a receiving tank for receiving the aforementioned processing liquid supplied from the aforementioned return pipe. The front end of the aforementioned nozzle can also be arranged at a position higher than the discharge port of the aforementioned return pipe.

In the substrate processing apparatus of the first aspect of the present invention, no valve other than the first valve may be provided on the liquid delivery pipe and the supply pipe.

The substrate processing device of the first aspect of the present invention is also further equipped with a control unit, which controls the aforementioned first valve and the aforementioned second valve. The aforementioned control unit can also switch the opening of the aforementioned first valve to at least the first opening and the second opening. The aforementioned second opening can also be smaller than the aforementioned first opening. The aforementioned control unit can also set the aforementioned ejection state by setting the opening of the aforementioned first valve to the aforementioned first opening and setting the aforementioned second valve to the closed state. In addition, the aforementioned control unit can also set the aforementioned processing liquid return state by setting the opening of the aforementioned first valve to the aforementioned second opening and setting the aforementioned second valve to the open state.

In the substrate processing apparatus of the first aspect of the present invention, the control unit may switch the opening of the first valve to at least the first opening, the second opening, and the third opening. The third opening may be smaller than the second opening. The control unit may set the opening of the first valve from the second opening to the third opening and keep the second valve in the open state to set the valve to a discharge stop state, wherein a smaller amount of the treatment liquid than the discharge state flows from the liquid delivery pipe toward the return pipe.

The substrate processing device of the first aspect of the present invention is further provided with a moving mechanism, which moves the nozzle between a processing position and a retreat position. The processing position may be located above the substrate. The retreat position may be located away from the substrate. The control unit may control the moving mechanism. The control unit may switch the opening of the first valve to the first opening, the second opening, the third opening, and the fourth opening. The fourth opening may be smaller than the first opening and larger than the second opening. The control unit may also, when the nozzle is placed in the retreat position, set the opening of the first valve from the third opening to the fourth opening and the second valve from the open state to the closed state, so as to set the nozzle in a preparatory discharging state, wherein the preparatory discharging state is a state in which the treatment liquid flows from the liquid delivery pipe toward the supply pipe and the treatment liquid is discharged from the nozzle. The control unit may also, when the nozzle is placed in the retreat position, set the opening of the first valve from the fourth opening to the second opening and the second valve from the closed state to the open state, so as to set the nozzle in a preparatory discharging treatment liquid return state, wherein the preparatory discharging treatment liquid return state is a state in which the treatment liquid flows from the supply pipe toward the return pipe. The control unit may also, before the treatment liquid inside the supply pipe is exhausted in the prepared state of discharging the treatment liquid, move the nozzle from the retreat position to the treatment position, set the opening of the first valve from the second opening to the first opening, and set the second valve from the open state to the closed state, so as to set it to the discharging state.

The second aspect of the substrate processing method of the present invention is to process the substrate by supplying a processing liquid from a nozzle to the substrate. The second aspect of the substrate processing method of the present invention includes the following steps: by setting a first valve provided on a liquid supply pipe to an open state and setting a second valve provided on a return pipe connected to the liquid supply pipe to a closed state, the processing liquid is allowed to flow from the liquid supply pipe to a supply pipe connected to the liquid supply pipe and the return pipe and to the nozzle, and the processing liquid is ejected from the nozzle to process the substrate; and by setting the second valve from the closed state to an open state, the processing liquid is allowed to flow from the supply pipe to the return pipe.

In the substrate processing method of the second aspect of the present invention, a step of discharging the processing liquid from the nozzle by setting the opening of the first valve to a first opening and setting the second valve to a closed state can also be performed, and a step of allowing the processing liquid to flow toward the return pipe by setting the opening of the first valve to a second opening smaller than the first opening and setting the second valve to an open state can be performed.

The substrate processing method of the second aspect of the present invention may further include the following steps: by setting the opening of the aforementioned first valve from the aforementioned second opening to a third opening smaller than the aforementioned second opening, and keeping the aforementioned second valve in the aforementioned open state, a step of discharging a smaller amount of the aforementioned processing liquid from the aforementioned nozzle and a step of allowing the aforementioned processing liquid to flow from the aforementioned liquid supply pipe toward the aforementioned return pipe.

The substrate processing method of the second aspect of the present invention may further include the following steps: when the nozzle is arranged in a retreat position away from the top of the substrate, the opening of the first valve is set from the third opening to a fourth opening that is smaller than the first opening and larger than the second opening, and the second valve is set from the open state to the closed state, so that the processing liquid flows from the liquid delivery pipe toward the supply pipe, and the processing liquid is ejected from the nozzle; when the nozzle is arranged in the retreat position, the opening of the first valve is set to the fourth opening that is smaller than the first opening and larger than the second opening, and the second valve is set from the open state to the closed state. The fourth opening is set to the second opening, and the second valve is set from the closed state to the open state, so that the processing liquid flows from the supply pipe toward the return pipe; and before the processing liquid in the supply pipe is exhausted, the nozzle is moved from the retreat position toward the processing position above the substrate, and the opening of the first valve is set from the second opening to the first opening, and the second valve is set from the open state to the closed state, so that the processing liquid is ejected from the nozzle to process the substrate. (Compared with the effect of the prior art)

According to the present invention, a substrate processing apparatus and a substrate processing method can be provided, which can suppress the dripping of processing liquid from the nozzle when the substrate processing apparatus is not processing the substrate.

Hereinafter, the embodiments of the present invention will be described with reference to the drawings. In addition, in the drawings, the same or equivalent parts are given the same element symbols and their repeated descriptions are omitted.

(First embodiment) Referring to FIG. 1 , a substrate processing apparatus 100 according to the first embodiment of the present invention will be described. FIG. 1 is a top view schematically showing the structure of the substrate processing apparatus 100 according to the first embodiment of the present invention.

As shown in FIG. 1 , the substrate processing apparatus 100 is a single-wafer apparatus that processes substrates W one by one.

The substrate W is, for example, a silicon wafer, a resin substrate, or a glass or quartz substrate. In this embodiment, a substantially disk-shaped semiconductor substrate is exemplified as the substrate W. However, the shape of the substrate W is not particularly limited. The substrate W may also be formed into a rectangular shape, for example.

The substrate processing apparatus 100 includes a plurality of loading ports LP, a plurality of processing units 1, a memory unit 2, and a control unit 3.

The loading port LP holds a substrate container C that accommodates a substrate W. The processing unit 1 processes the substrate W transferred from the loading port LP with a processing fluid. The processing fluid is, for example, a processing liquid or a processing gas.

The memory unit 2 includes a main memory device (e.g., semiconductor memory) such as a read-only memory ROM (Read Only Memory) and a random access memory RAM (Random Access Memory), and may further include an auxiliary memory device (e.g., a hard disk drive). The main memory device and/or the auxiliary memory device store various computer programs executed by the control unit 3.

The control unit 3 includes a processor such as a CPU (Central Processing Unit) and an MPU (Micro Processing Unit). The control unit 3 controls various elements of the substrate processing apparatus 100.

The substrate processing apparatus 100 also has a transfer robot. The transfer robot transfers the substrate W between the loading port LP and the processing unit 1. The transfer robot has an indexer robot IR and a center robot CR. The indexer robot IR transfers the substrate W between the loading port LP and the center robot CR. The center robot CR transfers the substrate W between the indexer robot IR and the processing unit 1. The indexer robot IR and the center robot CR each have a hand for supporting the substrate W.

The substrate processing apparatus 100 also includes a plurality of fluid boxes 4 and a chemical solution storage cabinet 5. The plurality of fluid boxes 4 and the processing unit 1 are arranged inside the frame 100a of the substrate processing apparatus 100. The chemical solution storage cabinet 5 is arranged outside the frame 100a of the substrate processing apparatus 100. The chemical solution storage cabinet 5 may also be arranged on the side of the substrate processing apparatus 100. In addition, the chemical solution storage cabinet 5 may also be arranged below (underground) the clean room where the substrate processing apparatus 100 is installed.

The plurality of processing units 1 are configured as a tower TW stacked up and down. A plurality of towers TW are provided. The plurality of towers TW are arranged to surround the central robot CR in a plan view.

In this embodiment, three processing units 1 are stacked in the tower TW. In addition, four towers TW are provided. Furthermore, the number of processing units 1 constituting the tower TW is not particularly limited. In addition, the number of towers TW is also not particularly limited.

The plurality of fluid boxes 4 correspond to the plurality of towers TW, respectively. The chemical solution in the chemical solution storage tank 5 is supplied to the tower TW corresponding to the fluid box 4 via the fluid box 4. As a result, the chemical solution is supplied to all the processing units 1 included in the tower TW.

The processing unit 1 will be described below with reference to Fig. 2. Fig. 2 is a side view schematically showing the structure of the processing unit 1.

As shown in FIG. 2 , the processing unit 1 includes a chamber 6 , a spin chuck 10 , and a cup 14 .

The chamber 6 is provided with a partition wall 8, a gate 9, and a FFU 7 (fan filter unit). The partition wall 8 is hollow. A transfer port is provided in the partition wall 8. The gate 9 is used to open and close the transfer port. The FFU 7 forms a downflow of clean air in the chamber 6. The clean air is the air filtered by the filter.

The central robot CR carries the substrate W into the chamber 6 through the transfer port, and carries the substrate W out of the chamber 6 through the transfer port.

The spin chuck 10 is disposed in the chamber 6. The spin chuck 10 rotates around a rotation axis A1 while holding the substrate W horizontally. The rotation axis A1 is a vertical virtual axis passing through the center of the substrate W.

The rotary chuck 10 includes a plurality of chuck pins 11 , a rotary seat 12 , a rotary motor 13 , a cup body 14 , and a lifting unit 15 .

The rotating base 12 is a disc-shaped member. A plurality of chuck pins 11 hold the substrate W in a horizontal position on the rotating base 12. The rotating motor 13 rotates the plurality of chuck pins 11 to rotate the substrate W around the rotation axis A1.

The rotary chuck 10 of this embodiment is a clamping chuck that makes a plurality of chuck pins 11 contact the outer peripheral surface of the substrate W. However, the present invention is not limited thereto. The rotary chuck 10 may also be a vacuum suction cup. The vacuum suction cup holds the substrate W horizontally by adsorbing the non-component forming surface, i.e., the back surface (lower surface) of the substrate W, onto the upper surface of the rotary seat 12.

The cup body 14 receives the processing liquid discharged from the substrate W. The cup body 14 includes: an inclined portion 14a, a guide portion 14b, and a liquid receiving portion 14c. The inclined portion 14a is a cylindrical component extending obliquely upward toward the rotation axis A1. The inclined portion 14a includes an annular upper end, and the annular upper end has an inner diameter larger than the substrate W and the rotating seat 12. The upper end of the inclined portion 14a is equivalent to the upper end of the cup body 14. In a top view, the upper end of the cup body 14 surrounds the substrate W and the rotating seat 12. The guide portion 14b is a cylindrical component extending downward from the lower end (outer end) of the inclined portion 14a. The liquid receiving portion 14c is located at the lower part of the guide portion 14b and forms an annular groove open upward.

The lifting unit 15 lifts the cup body 14 between the raised position and the lowered position. When the cup body 14 is in the raised position, the upper end of the cup body 14 is located above the rotary chuck 10. When the cup body 14 is in the lowered position, the upper end of the cup body 14 is located below the rotary chuck 10.

When the processing liquid is supplied to the substrate W, the cup body 14 is in the raised position. The processing liquid scattered outward from the substrate W is received by the inclined portion 14a and collected in the liquid receiving portion 14c through the guide portion 14b.

The processing unit 1 further includes a cleaning liquid nozzle 16, a cleaning liquid pipe 17, and a cleaning liquid valve 18. The cleaning liquid nozzle 16 discharges cleaning liquid toward the substrate W held by the spin chuck 10. The cleaning liquid nozzle 16 is connected to the cleaning liquid pipe 17. The cleaning liquid valve 18 is inserted and installed in the cleaning liquid pipe 17.

When the cleaning liquid valve 18 is opened, the cleaning liquid is supplied from the cleaning liquid pipe 17 to the cleaning liquid nozzle 16. Then, the cleaning liquid is ejected from the cleaning liquid nozzle 16. The cleaning liquid is, for example, pure water (deionized water). The cleaning liquid is not limited to pure water, and may also be carbonated water, electrolytic ion water, hydrogen water, ozone water, and/or hydrochloric acid water of a diluted concentration. The diluted concentration is, for example, a concentration of 10 ppm or more and 100 ppm or less.

The processing unit 1 also includes: a chemical liquid nozzle 21, and a nozzle moving unit 22. The chemical liquid nozzle 21 discharges chemical liquid toward the substrate W held on the rotary chuck 10. The nozzle moving unit 22 moves the chemical liquid nozzle 21 between a processing position and a retreat position. The processing position indicates a position where the chemical liquid nozzle 21 discharges chemical liquid toward the substrate W. In addition, the processing position is a position above the substrate W. The retreat position indicates a position where the chemical liquid nozzle 21 leaves the substrate W. In addition, the retreat position is a position away from the top of the substrate W. The nozzle moving unit 22 moves the chemical liquid nozzle 21, for example, by rotating the chemical liquid nozzle 21 around a swing axis A2. The swing axis A2 is a vertical virtual axis located at the periphery of the cup body 14. Furthermore, the liquid medicine nozzle 21 is an example of the "nozzle" of the present invention. In addition, the nozzle moving unit 22 is an example of the "moving mechanism" of the present invention.

The substrate processing apparatus 100 further includes a chemical solution supply device 30. The chemical solution supply device 30 supplies chemical solution to the chemical solution nozzle 21 of the processing unit 1. The chemical solution supplied to the chemical solution nozzle 21 contains, for example, isopropyl alcohol (IPA). The chemical solution is an example of the "processing solution" of the present invention.

An example of processing performed on a substrate W by the substrate processing apparatus 100 will be described with reference to Fig. 3. Fig. 3 is a flowchart showing an example of processing performed on a substrate W by the substrate processing apparatus 100.

As shown in Fig. 3, in step S1, the control unit 3 performs a transfer process of transferring the substrate W into the chamber 6. The following describes the procedure of the transfer process.

First, in a state where the chemical liquid nozzle 21 is retracted from above the substrate W, the central robot CR supports the substrate W with its hand while entering the chamber 6. Then, the central robot CR places the substrate W supported by its hand on the rotary chuck 10. As a result, the substrate W is transferred to the rotary chuck 10.

When the substrate W is transferred onto the rotary chuck 10, the chuck pin 11 clamps the substrate W. Then, the rotary motor 13 rotates the chuck pin 11. As a result, the substrate W rotates. When the substrate W rotates, the process is transferred to step S2.

In step S2, the control unit 3 performs a chemical liquid supply process for supplying a chemical liquid to the substrate W. The procedure of the chemical liquid supply process will be described below.

First, the nozzle moving unit 22 moves the liquid chemical nozzle 21 to the processing position. Then, the lifting unit 15 raises the cup body 14 to the raised position. Then, the liquid chemical supply device 30 starts supplying liquid chemical to the liquid chemical nozzle 21. As a result, the liquid chemical nozzle 21 discharges liquid chemical toward the substrate W.

The liquid chemical ejected from the liquid chemical nozzle 21 falls on the upper surface of the substrate W, and then flows along the upper surface of the rotating substrate W and toward the outer side of the substrate W. As a result, a liquid chemical film is formed in a manner covering the entire upper surface of the substrate W. Furthermore, when the liquid chemical nozzle 21 ejects the liquid chemical, the nozzle moving unit 22 can make the liquid chemical nozzle 21 stationary or scan above the substrate W.

When a predetermined time has passed since the start of the supply of the liquid medicine to the liquid medicine nozzle 21, the supply of the liquid medicine to the liquid medicine nozzle 21 is stopped. Then, the nozzle moving unit 22 moves the liquid medicine nozzle 21 to the retreat position. When the liquid medicine nozzle 21 reaches the retreat position, the process is transferred to step S3.

In step S3, the control unit 3 performs a cleaning liquid supply process of supplying pure water, which is an example of a cleaning liquid, to the substrate W. The procedure of the cleaning liquid supply process is described below.

First, the cleaning liquid valve 18 is opened, and the cleaning liquid nozzle 16 starts to discharge pure water. The pure water falling on the upper surface of the substrate W flows along the upper surface of the rotating substrate W and toward the outer side of the substrate W. The chemical solution on the substrate W is washed away by the pure water discharged from the cleaning liquid nozzle 16. As a result, a pure water liquid film is formed on the entire upper surface of the substrate W.

When a predetermined time has passed since the cleaning liquid valve 18 was opened, the cleaning liquid valve 18 is closed to stop the discharge of pure water toward the substrate W. When the discharge of pure water toward the substrate W is stopped, the process is transferred to step S4.

In step S4, the control unit 3 performs a drying process to dry the substrate W by rotating the substrate W. The following describes the procedure of the drying process.

First, the rotary motor 13 rotates the substrate W at a higher speed (for example, several thousand rpm) than the substrate W during the chemical solution supply process and the cleaning solution supply process. As a result, the liquid is removed from the substrate W, and the substrate W is dried.

When a predetermined time has passed since the high-speed rotation of the substrate W started, the rotation motor 13 stops the rotation of the substrate W. When the rotation of the substrate W stops, the process is transferred to step S5.

In step S5, the control unit 3 performs a carry-out process for carrying the substrate W out of the chamber 6. The following describes the procedure of the carry-out process.

First, the lifting unit 15 lowers the cup 14 to the lower position. Then, the central robot CR puts its hand into the chamber 6. Then, the plurality of chuck pins 11 release the clamping of the substrate W.

After the plurality of chuck pins 11 release the substrate W, the central robot CR supports the substrate W on the rotary chuck 10 with its hand. Then, the central robot CR withdraws its hand from the chamber 6 while supporting the substrate W with its hand. As a result, the processed substrate W is carried out of the chamber 6.

When the processed substrate W is unloaded from the chamber 6, the unloading process shown in step S5 is terminated.

By repeatedly performing the processes shown in step S1 to step S5, the plurality of substrates W transported to the substrate processing apparatus 100 are processed one by one.

Next, the chemical liquid supply device 30 will be described with reference to Fig. 4. Fig. 4 is a schematic diagram showing the structure of the chemical liquid supply device 30.

A plurality of chemical solution supply devices 30 are provided. The plurality of chemical solution supply devices 30 correspond to the plurality of towers TW (see FIG. 1 ), respectively. The chemical solution supply device 30 supplies chemical solution to all the processing units 1 constituting the corresponding tower TW.

In the present embodiment, one tower TW is composed of three processing units 1. Therefore, one chemical solution supply device 30 supplies chemical solution to the three processing units 1.

As shown in FIG. 4 , the chemical solution supply device 30 includes a supply tank 31 , a circulation pipe 32 , a circulation pump 33 , a circulation filter 34 , and a circulation heater 35 .

The supply tank 31 stores the chemical solution. The circulation pipe 32 is a tubular component. A circulation path for circulation of the chemical solution is formed in the circulation pipe 32. The circulation pipe 32 has an upstream side end 32a and a downstream side end 32b. The circulation pipe 32 is connected to the supply tank 31. Specifically, the upstream side end 32a and the downstream side end 32b of the circulation pipe 32 are connected to the supply tank 31.

The circulation pump 33 transports the liquid medicine in the supply tank 31 to the circulation pipe 32. When the circulation pump 33 is operated, the liquid medicine in the supply tank 31 is transported to the upstream side end 32a of the circulation pipe 32. The liquid medicine transported to the upstream side end 32a is transported in the circulation pipe 32 and discharged from the downstream side end 32b to the supply tank 31. With the continuous operation of the circulation pump 33, the liquid medicine continues to flow in the circulation pipe 32 from the upstream side end 32a to the downstream side end 32b. As a result, the liquid medicine circulates in the circulation pipe 32.

The circulation filter 34 removes foreign matter such as dust from the chemical liquid circulating in the circulation pipe 32. The circulation heater 35 adjusts the temperature of the chemical liquid by heating the chemical liquid. The circulation heater 35 maintains the temperature of the chemical liquid at a fixed temperature (e.g., 60° C.) higher than room temperature. The temperature of the chemical liquid circulating in the circulation pipe 32 is maintained at a fixed temperature by the circulation heater 35.

The circulation pump 33 , the circulation filter 34 , and the circulation heater 35 are installed in the circulation pipe 32 .

The supply tank 31 , the circulation pump 33 , the circulation filter 34 and the circulation heater 35 are arranged in the chemical solution storage tank 5 .

A pressurizing device may be provided instead of the circulation pump 33. The pressurizing device increases the air pressure in the supply tank 31 to deliver the chemical solution in the supply tank 31 to the circulation pipe 32.

The chemical solution supply device 30 further includes a plurality of supply mechanisms 40. In the present embodiment, three supply mechanisms 40 are provided.

Each of the plurality of supply mechanisms 40 is connected to the circulation pipe 32. The chemical solution circulating in the circulation pipe 32 is supplied to each of the plurality of supply mechanisms 40.

The plurality of supply mechanisms 40 correspond to the plurality of processing units 1. The supply mechanism 40 supplies the chemical solution to the corresponding processing unit 1. The chemical solution supplied to the processing unit 1 is ejected from the chemical solution nozzle 21.

The chemical solution supply device 30 further includes a recovery tank 51, a recovery pipe 52, a recovery pump 53, and a recovery filter 54. The recovery tank 51 is an example of a "storage tank" of the present invention.

The recovery tank 51 is connected to each of the plurality of supply mechanisms 40. The recovery tank 51 receives the liquid medicine that has not been ejected from the liquid medicine nozzle 21 but has passed through each of the plurality of supply mechanisms 40. A through hole 51a is formed on the upper surface of the recovery tank 51. Thus, even if the liquid medicine and the gas are recovered from the supply mechanism 40 to the recovery tank 51 in a mixed state, the gas can be discharged to the outside from the through hole 51a. That is, the recovery tank 51 functions as a gas-liquid separation device that separates the gas from the liquid. Thus, it can inhibit the liquid medicine mixed with the gas from being supplied to the supply tank 31 from the recovery tank 51.

The recovery pipe 52 is a tubular member. The recovery pipe 52 guides the chemical solution in the recovery tank 51 to the supply tank 31. The recovery pipe 52 has an upstream end portion 52a and a downstream end portion 52b. The upstream end portion 52a is connected to the recovery tank 51. The downstream end portion 52b is connected to the supply tank 31.

The recovery pump 53 is provided in the recovery pipe 52. The recovery pump 53 presses the chemical solution in the recovery tank 51 toward the supply tank 31 through the recovery pipe 52. The recovery filter 54 is provided in the recovery pipe 52. The recovery filter 54 removes foreign matter from the chemical solution flowing in the recovery pipe 52.

Next, the supply mechanism 40 will be described with reference to Fig. 5. Fig. 5 is a schematic diagram showing the structure of the supply mechanism 40 and its surroundings.

5 , the supply mechanism 40 includes a liquid supply pipe 41, a branch portion 42, a supply pipe 43, and a return pipe 44. The liquid supply pipe 41, the supply pipe 43, and the return pipe 44 are connected to each other via the branch portion 42.

The liquid supply pipe 41 is a tubular member. The liquid supply pipe 41 guides the chemical solution circulating in the circulation pipe 32 to the outside of the circulation pipe 32. The liquid supply pipe 41 has an upstream end portion 41a and a downstream end portion 41b. The upstream end portion 41a is connected to the circulation pipe 32.

The supply pipe 43 is a tubular member. The supply pipe 43 guides the liquid medicine guided by the liquid supply pipe 41 to the liquid medicine nozzle 21. The supply pipe 43 has an upstream side end 43a and a downstream side end 43b. The upstream side end 43a is connected to the downstream side end 41b of the liquid supply pipe 41 through the branching portion 42. The downstream side end 43b is connected to the liquid medicine nozzle 21.

The return pipe 44 is a tubular member. The return pipe 44 guides the treatment liquid guided by the liquid delivery pipe 41 along a path different from that of the supply pipe 43. In the present embodiment, the return pipe 44 guides the liquid to the recovery tank 51. The return pipe 44 has an upstream side end 44a and a downstream side end 44b. The upstream side end 44a is connected to the downstream side end 41b of the liquid delivery pipe 41 and the upstream side end 43a of the supply pipe 43 through the branching portion 42. The downstream side end 44b is connected to the recovery tank 51.

The supply mechanism 40 further includes a flow meter 45 , an insert mounting member 46 , a first valve 47 , and a second valve 48 .

The flow meter 45 detects the flow rate of the chemical solution flowing in the liquid supply pipe 41. The flow meter 45 is provided in the liquid supply pipe 41. The flow rate of the chemical solution indicates in detail the amount of the chemical solution flowing in a predetermined position in the liquid supply pipe 41 per unit time.

The insert mounting member 46 is disposed at the branching portion 42. The insert mounting member 46 is a hollow member. The insert mounting member 46 is, for example, an ejector. The insert mounting member 46 is inserted and mounted between the liquid supply pipe 41, the supply pipe 43, and the return pipe 44. The liquid supply pipe 41, the supply pipe 43, and the return pipe 44 are connected to each other via the insert mounting member 46.

The first valve 47 is provided on the liquid supply pipe 41. In the present embodiment, the first valve 47 can adjust the flow rate of the liquid supplied from the liquid supply pipe 41 to the branching portion 42. In other words, the first valve 47 can adjust the opening degree. The opening degree indicates the degree of opening of the first valve 47. The smaller the opening degree of the first valve 47, the smaller the degree of opening of the first valve 47.

The first valve 47 has a driving source such as a motor, and changes the opening by the power of the driving source. The control unit 3 shown in FIG1 controls the opening of the first valve 47 by operating the driving source. The first valve 47 is, for example, a motor needle valve. Furthermore, the first valve 47 may also be a valve other than the motor needle valve, such as a diaphragm valve.

The second valve 48 is provided in the return pipe 44. In the present embodiment, the second valve 48 opens and closes the return pipe 44. The second valve 48 cannot adjust the opening degree. That is, the second valve 48 switches between the passage and the stop of the passage of the chemical solution in the return pipe 44.

Next, the flow of the chemical solution in the chemical solution supply device 30 will be described with reference to FIG. 4 and FIG. 5 .

As shown in FIG. 4 and FIG. 5 , when the liquid medicine circulating in the circulation pipe 32 flows from the circulation pipe 32 into the liquid delivery pipe 41, it is guided toward the branch portion 42 through the liquid delivery pipe 41. The liquid medicine supplied from the branch portion 42 to the supply pipe 43 is ejected from the liquid medicine nozzle 21. The liquid medicine supplied from the branch portion 42 to the return pipe 44 is discharged from the return pipe 44 toward the recovery tank 51. The liquid medicine discharged to the recovery tank 51 is supplied to the supply tank 31 through the recovery pipe 52. The liquid medicine supplied to the supply tank 31 circulates in the circulation pipe 32.

Next, the insert mounting member 46 will be described with reference to Fig. 6. Fig. 6 is a cut-away end view of the insert mounting member 46.

As shown in FIG6 , the insert mounting member 46 includes a first member 46a, a second member 46b, and a third member 46c. The first member 46a, the second member 46b, and the third member 46c are hollow members and are interconnected. The space where the first member 46a, the second member 46b, and the third member 46c are interconnected constitutes the divergence portion 42.

The first member 46a and the third member 46c protrude from the branch portion 42 in directions opposite to each other. The second member 46b protrudes from the branch portion 42 in directions perpendicular to the first member 46a and the third member 46c. Furthermore, in FIGS. 5 and 6 , the first member 46a and the third member 46c are arranged to extend in the up-down direction (in the direction along the X direction), but the first member 46a and the third member 46c may also be arranged to extend in a direction other than the up-down direction (for example, a substantially horizontal direction).

The first member 46a has a first opening 4A. The first opening 4A connects the inside and the outside of the first member 46a. The downstream end 41b of the liquid supply pipe 41 is connected to the first opening 4A.

The second member 46b has a second opening 4B. The second opening 4B connects the inside and the outside of the second member 46b. The upstream end 43a of the supply pipe 43 is connected to the second opening 4B.

The third member 46c has a third opening 4C. The third opening 4C connects the inside and the outside of the third member 46c. The upstream end 44a of the return pipe 44 is connected to the third opening 4C.

The liquid medicine flowing in the liquid delivery pipe 41 is supplied to the inside of the insertion mounting member 46 through the first opening 4A. The liquid medicine inside the insertion mounting member 46 is supplied to the supply pipe 43 through the second opening 4B. The liquid medicine inside the insertion mounting member 46 is supplied to the return pipe 44 through the third opening 4C.

The flow path of the drug solution includes: a branching portion 42, a first flow path R1, a second flow path R2, and a third flow path R3. The branching portion 42 is a branch point of the liquid delivery piping 41, the supply piping 43, and the return piping 44. The first flow path R1 represents the flow path of the drug solution located on the liquid delivery piping 41 side relative to the branching portion 42. The first flow path R1 is located between the branching portion 42 and the upstream side end 41a (refer to Figure 5) of the liquid delivery piping 41. The second flow path R2 represents the flow path of the drug solution located on the supply piping 43 side relative to the branching portion 42. The second flow path R2 is located between the branching portion 42 and the downstream side end 43b of the supply piping 43. The third flow path R3 represents the flow path of the drug solution located on the return piping 44 side relative to the branching portion 42. The third flow path R3 is located between the branch portion 42 and the downstream end portion 44 b of the return pipe 44 .

The supply mechanism 40 further includes a throttle portion 46d. The throttle portion 46d is disposed in the first flow path R1. The throttle portion 46d functions as an orifice that reduces the flow area of the first flow path R1. The flow area is the cross-sectional area of the drug solution flow path perpendicular to the flow direction of the drug solution.

In this embodiment, the throttle portion 46d is formed in the first member 46a of the insert mounting member 46. The throttle portion 46d is opposite to the branch portion 42. The throttle portion 46d ejects the liquid medicine toward the branch portion 42. In this embodiment, the throttle portion 46d is located near the branch portion 42. Therefore, the liquid medicine flows into the branch portion 42 immediately after being ejected from the throttle portion 46d.

6 shows a first direction Q1, a second direction Q2, and a third direction Q3. The first direction Q1 indicates a direction from the branch portion 42 toward the first flow path R1. The second direction Q2 indicates a direction from the branch portion 42 toward the second flow path R2. The third direction Q3 indicates a direction from the branch portion 42 toward the third flow path R3.

FIG6 further shows a first angle θ1 and a second angle θ2. The first angle θ1 represents an angle between the first direction Q1 and the third direction Q3. Specifically, the first angle θ1 represents the minimum angle among the angles between the first direction Q1 and the third direction Q3. The second angle θ2 represents an angle between the first direction Q1 and the second direction Q2. Specifically, the second angle θ2 represents the minimum angle among the angles between the first direction Q1 and the second direction Q2.

The first angle θ1 is greater than the second angle θ2 (the first angle θ1>the second angle θ2). That is, compared with the second flow path R2, the third flow path R3 is not bent relative to the first flow path R1. Therefore, the liquid medicine flowing from the first flow path R1 to the branching portion 42 is mainly guided toward the third flow path R3. In other words, the throttling portion 46d ejects the liquid medicine toward the third flow path R3.

In this embodiment, the first angle θ1 is approximately 180 degrees, and the second angle θ2 is approximately 90 degrees.

The pressure of the drug solution will be described below with reference to Fig. 7. Fig. 7 is a schematic diagram showing the pressure of the drug solution.

FIG7 shows the first pressure P1, the second pressure P2, and the third pressure P3. The first pressure P1 represents the pressure of the liquid medicine in the upstream region of the throttle portion 46d in the first flow path R1. The second pressure P2 represents the pressure of the liquid medicine in the branching portion 42. The third pressure P3 represents the pressure of the liquid medicine in the second flow path R2.

7 further shows the first moving direction X1 and the first moving speed V1. The first moving direction X1 shows the moving direction of the liquid medicine flowing in the first flow path R1 and upstream of the throttle portion 46d. The first moving speed V1 shows the moving speed of the liquid medicine flowing in the first flow path R1 and upstream of the throttle portion 46d.

FIG7 further shows the second moving direction X2 and the second moving speed V2. The second moving direction X2 shows the moving direction of the drug when the drug flows from the first flow path R1 into the branching portion 42. The second moving direction X2 is the opposite direction of the first direction Q1 shown in FIG6. The second moving speed V2 shows the moving speed of the drug when the drug flows from the first flow path R1 into the branching portion 42.

In the present embodiment, the liquid medicine ejected from the throttle portion 46 d moves at the second moving speed V2 while moving in the second moving direction X2 when flowing from the first flow path R1 into the branching portion 42 .

As shown in FIG7 , the flow area of the throttle portion 46d is smaller than the flow area upstream of the throttle portion 46d. Therefore, according to Bernoulli's theorem, the movement speed of the liquid medicine in the throttle portion 46d is increased compared to the upstream of the throttle portion 46d, and the pressure of the liquid medicine is reduced. As a result, the liquid medicine accelerated and depressurized by the throttle portion 46d is ejected from the throttle portion 46d.

Since the liquid medicine accelerated and depressurized by the throttle portion 46d is ejected from the throttle portion 46d, the second moving speed V2 is greater than the first moving speed V1 (the second moving speed V2>the first moving speed V1). In addition, the second pressure P2 is less than the first pressure P1 (the second pressure P2<the first pressure P1).

The first pressure P1 is changed by changing the opening of the first valve 47 shown in FIG5 . The smaller the opening of the first valve 47 is, the smaller the flow area of the first flow path R1 where the first valve 47 is located is. As a result, the flow rate of the liquid per unit time passing through the first valve 47 is reduced, so the first pressure P1 is reduced. In addition, as the first pressure P1 is reduced, the second pressure P2 is also reduced.

In addition, the second pressure P2 is changed by changing the second valve 48 shown in FIG5 to an open state or a closed state. When the second valve 48 is closed, the flow rate of the liquid medicine passing through the third flow path R3 is zero, so the second pressure P2 increases. On the other hand, when the second valve 48 is opened, the flow rate of the liquid medicine passing through the third flow path R3 increases, so the second pressure P2 decreases.

Furthermore, the adjustment of the opening degree of the first valve 47 and the switching of the open/closed state of the second valve 48 are performed by the control unit 3 shown in FIG. 1 .

FIG. 7 shows a first diameter D1, a second diameter D2, a third diameter D3, a fourth diameter D4, and a fifth diameter D5. The first diameter D1 indicates the diameter of the upstream portion of the throttle portion 46d in the first flow path R1. The second diameter D2 indicates the diameter of the throttle portion 46d. The third diameter D3 indicates the diameter of the downstream portion of the throttle portion 46d in the first flow path R1. The fourth diameter D4 indicates the diameter of the upstream portion of the third flow path R3. The upstream portion of the third flow path R3 indicates the vicinity of the divergence portion 42 in the third flow path R3. The fifth diameter D5 indicates the diameter of the upstream portion of the second flow path R2. The upstream portion of the second flow path R2 indicates the vicinity of the divergence portion 42 in the second flow path R2.

The first diameter D1 is larger than the second diameter D2 (the first diameter D1>the second diameter D2). The third diameter D3 is larger than the second diameter D2 (the third diameter D3>the second diameter D2). The fourth diameter D4 is larger than the third diameter D3 (the fourth diameter D4≧the third diameter D3). The fourth diameter D4 is larger than the fifth diameter D5 (the fourth diameter D4≧the fifth diameter D5). Furthermore, the size relationship between the fourth diameter D4 and the fifth diameter D5 is not particularly limited. The fourth diameter D4 may also be smaller than the fifth diameter D5.

Next, the relationship between the opening degree of the first valve 47, the opening and closing state of the second valve 48, and the discharge amount of the liquid medicine from the liquid medicine nozzle 21 will be described with reference to Figures 7 to 9. Figure 8 is a schematic diagram showing the second valve 48 in a closed state. Figure 9 is a schematic diagram showing the second valve 48 in an open state.

As shown in FIG. 7 and FIG. 8 , the control unit 3 sets the second valve 48 (see FIG. 5 ) to a closed state, thereby causing the liquid medicine supplied from the first flow path R1 to the branching portion 42 to flow toward the second flow path R2. In this embodiment, all the liquid medicine supplied from the first flow path R1 to the branching portion 42 flows toward the second flow path R2. In addition, the control unit 3 adjusts the flow rate of the liquid medicine supplied from the first flow path R1 to the branching portion 42 by adjusting the opening of the first valve 47. In this way, the discharge amount of the liquid medicine discharged from the liquid medicine nozzle 21 is adjusted.

On the other hand, as shown in FIG. 7 and FIG. 9 , the control unit 3 can adjust the pressure difference between the second pressure P2 and the third pressure P3 by adjusting the opening of the first valve 47 while setting the second valve 48 (see FIG. 5 ) to the open state.

For example, by setting the second pressure P2 to be less than the third pressure P3, the pressure difference between the second pressure P2 and the third pressure P3 (second pressure P2 < third pressure P3) is used to generate the suction force F1. The suction force F1 represents the force that attracts the liquid medicine in the second flow path R2 to the branching portion 42. The larger the opening of the first valve 47, the larger the suction force F1.

The suction force F1 generates a suck back phenomenon. The suck back means that all or part of the liquid medicine in the second flow path R2 is sucked into the branching portion 42 by the suction force F1. As a result, the liquid medicine ejection from the liquid medicine nozzle 21 stops.

The liquid medicine flowing from the second flow path R2 to the branching portion 42 by back suction is drawn into the liquid flow X of the liquid medicine ejected from the throttle portion 46 d and supplied to the third flow path R3 (suction effect). Then, the liquid medicine supplied to the third flow path R3 is supplied to the recovery tank 51 .

Furthermore, for example, by maintaining the opening of the first valve 47 at a predetermined value, the stagnation end position Z of the liquid medicine can also be maintained at a fixed position. In this case, the larger the opening of the first valve 47 is, the higher the stagnation end position Z is maintained. The higher the stagnation end position Z is, the closer the stagnation end position Z is to the branching portion 42. The lower the stagnation end position Z is, the closer the stagnation end position Z is to the liquid medicine nozzle 21.

In this embodiment, as shown in FIG. 5 , the front end of the liquid medicine nozzle 21 is arranged at a position higher than the discharge port 44c of the downstream side end portion 44b of the return pipe 44. Thus, by setting the second valve 48 from the closed state to the open state, back suction is generated according to the siphon principle. That is, the liquid medicine in the second flow path R2 is sucked into the branching portion 42, and the liquid medicine ejection from the liquid medicine nozzle 21 stops.

In this embodiment, since the front end of the liquid medicine nozzle 21 is arranged at a position higher than the discharge port 44c of the return pipe 44, by setting the second valve 48 from the closed state to the open state, the liquid medicine in the second flow path R2 is sucked into the branching portion 42 regardless of the opening degree of the first valve 47. In addition, the larger the opening degree of the first valve 47, the faster the liquid medicine in the second flow path R2 is sucked into the branching portion 42.

In this embodiment, the first valve 47 is a valve that does not completely close the treatment liquid flow path (a part of the first flow path R1) of the liquid delivery pipe 41 in the closed state. That is, when the opening of the first valve 47 is the minimum opening, the first valve 47 is not closed but opened. At this time, the first valve 47 is slightly opened. Therefore, during the period when the liquid medicine is not ejected from the liquid medicine nozzle 21, by setting the second valve 48 to the open state, the liquid medicine supplied from the first flow path R1 to the branching portion 42 can flow toward the third flow path R3.

As described above with reference to FIGS. 5 to 9 , by setting the first valve 47 to the open state and the second valve 48 to the closed state, the discharge state is achieved, in which the chemical liquid flows from the liquid delivery pipe 41 to the supply pipe 43 and the chemical liquid is discharged from the chemical liquid nozzle 21. On the other hand, by setting the second valve 48 from the closed state to the open state, the processing liquid return state is achieved, in which the chemical liquid flows from the supply pipe 43 to the return pipe 44. Thus, by setting the second valve 48 from the closed state to the open state, when the substrate processing apparatus 100 is not processing the substrate W, it is possible to suppress the chemical liquid from dripping from the chemical liquid nozzle 21.

Furthermore, as described above, the first valve 47 is a valve that does not completely close the process liquid flow path (a portion of the first flow path R1) of the liquid delivery pipe 41 in the closed state. Thus, unlike the case where the first valve 47 is configured to completely close the flow path of the liquid delivery pipe 41 in the closed state, it is possible to suppress dust generated in the first valve 47 due to the opening and closing action of the first valve 47. Specifically, for example, when the first valve is configured to be in the closed state by bringing the valve body of the first valve into contact with the valve seat, dust is generated by repeatedly bringing the valve body and the valve seat into contact and separation with each other. In this embodiment, since the first valve 47 is not completely closed, it is possible to suppress the generation of dust in the first valve 47 due to the opening and closing operation of the first valve 47. In this way, since the generation of dust in the first valve 47 can be suppressed, the discharge of dust from the chemical solution nozzle 21 can be suppressed. This can suppress the substrate W from being contaminated.

In addition, in this embodiment, no valve is provided on the upstream side of the chemical liquid nozzle 21 to completely close the flow path in a closed state. In this embodiment, at least no valve is provided in the flow path from the chemical liquid nozzle 21 to the circulation filter 34 to completely close the flow path in a closed state. In addition, in this embodiment, no valve other than the first valve 47 is provided in the liquid delivery pipe 41 and the supply pipe 43. Thereby, it is possible to further suppress the discharge of dust from the chemical liquid nozzle 21, and thus it is possible to further suppress the contamination of the substrate W.

Next, referring to FIG. 10 and FIG. 11 , the operation of the substrate processing apparatus 100 in the chemical liquid supply process (step S2) of supplying chemical liquid to the substrate W is described in detail. FIG. 10 is a flow chart showing an example of the operation of the substrate processing apparatus 100 in the chemical liquid supply process (step S2) of supplying chemical liquid to the substrate W. FIG. 11 is a timing chart showing the opening of the first valve 47, the opening of the second valve 48, and the flow rate of chemical liquid flowing through the chemical liquid nozzle 21 in the chemical liquid supply process (step S2) of supplying chemical liquid to the substrate W.

As shown in FIG. 10 and FIG. 11 , in step S21, the substrate processing device 100 enters a discharging stop state. The discharging stop state is a state in which the liquid medicine is not discharged from the liquid medicine nozzle 21. In the discharging stop state, the liquid medicine nozzle 21 is arranged in a retreat position. In addition, in the discharging stop state, the control unit 3 sets the first valve 47 to a closed state (a third opening degree described later) and sets the second valve 48 to an open state. Furthermore, in this embodiment, the first valve 47 is not completely closed.

Next, in step S22, the control unit 3 moves the chemical liquid nozzle 21 from the retreat position to the processing position.

Next, in step S23, the control unit 3 sets the opening of the first valve 47 to the first opening and sets the second valve 48 to the closed state. The first opening is the opening of the first valve 47 when the processing liquid is supplied to the substrate W. The first opening is appropriately set according to the processing conditions of the substrate W, such as the type of the processing liquid and the film to be processed of the substrate W.

By setting the opening of the first valve 47 to the first opening and the second valve 48 to the closed state, the processing liquid is supplied from the liquid nozzle 21 toward the substrate W. In other words, it is in the ejection state. When the predetermined processing time has passed, the process proceeds to step S24.

Next, in step S24, the control unit 3 sets the second valve 48 to an open state and sets the opening of the first valve 47 from the first opening to the second opening. As a result, as described above, a suction force F1 is generated, and back suction occurs. In other words, it becomes a process liquid return state. Hereinafter, back suction is sometimes described as process liquid return.

In the present embodiment, the second opening is smaller than the first opening. Although there is no particular limitation on the second opening, in step S24, since the liquid medicine passing through the first valve 47 is not ejected from the liquid medicine nozzle 21, it is preferable that the second opening is smaller. In addition, the second opening may be set to be, for example, the same as the first opening, but when the second valve 48 is suddenly changed from a closed state to an open state when the second opening is larger, there is a possibility that bubbles are generated in the supply piping 43 due to rapid back suction. From this point of view, it is preferable to set the second opening to be smaller than the first opening. In addition, as described above, the suction force F1 may be adjusted by adjusting the second opening to maintain the retention end position Z of the liquid medicine at a predetermined position of the supply piping 43.

However, as described above, in the present embodiment, since the front end of the liquid medicine nozzle 21 is arranged at a position higher than the discharge port 44c of the downstream side end portion 44b of the return pipe 44, in step S24, the liquid medicine of the liquid medicine nozzle 21 and the supply pipe 43 is recovered to the recovery tank 51 via the branch portion 42 and the return pipe 44. In addition, when the front end of the liquid medicine nozzle 21 is arranged at a position higher than the discharge port 44c of the return pipe 44, even if the first valve 47 is set to a closed state, back suction will occur.

Next, in step S25, the control unit 3 maintains the second valve 48 in the open state, and sets the opening of the first valve 47 from the second opening to the third opening. The third opening is smaller than the second opening. The third opening is an opening that sets the first valve 47 in the closed state. In this embodiment, the third opening is an opening that does not completely close the liquid delivery pipe 41.

In addition, in step S24 or step S25, the control unit 3 moves the liquid medicine nozzle 21 from the discharge position to the retreat position. This makes the discharge stop state. Furthermore, the timing of moving the liquid medicine nozzle 21 from the discharge position to the retreat position is not particularly limited as long as it is after the back suction occurs in step S24.

As described above with reference to FIG. 10 and FIG. 11 , the substrate processing method of the present embodiment includes the following step (step S23): by setting the first valve 47 to an open state and the second valve 48 to a closed state, the chemical solution flows from the liquid delivery pipe 41 to the supply pipe 43 and the chemical solution is ejected from the chemical solution nozzle 21. In addition, the substrate processing method includes the following step (step S24): by setting the second valve 48 from a closed state to an open state, the chemical solution flows from the supply pipe 43 to the return pipe 44. Therefore, by setting the second valve 48 from a closed state to an open state, when the substrate processing apparatus 100 is not processing the substrate W, it is possible to suppress the chemical solution from dripping from the chemical solution nozzle 21.

Furthermore, as described above, the following step (step S24) is performed: by setting the second valve 48 from the closed state to the open state, and setting the opening of the first valve 47 from the first opening to the second opening, the liquid medicine flows toward the return pipe 44. Therefore, it is possible to appropriately perform the back suction. For example, it is possible to suppress the generation of bubbles in the supply pipe 43 due to the rapid back suction.

In addition, as described above, the substrate processing method of the present embodiment includes the following step (step S25): by setting the opening of the first valve 47 from the second opening to the third opening, and keeping the second valve 48 in an open state, a smaller amount of chemical solution than the step of discharging the chemical solution (step S23) is allowed to flow from the liquid delivery pipe 41 to the return pipe 44. In this way, when the chemical solution is not discharged toward the substrate W, it is possible to suppress the chemical solution from flowing from the liquid delivery pipe 41 to the recovery tank 51 through the return pipe 44.

In addition, in this embodiment, except for the step of discharging the liquid medicine (step S23), the second valve 48 is kept in an open state. Therefore, even if the first valve 47 cannot be kept in a closed state due to a malfunction, the liquid medicine passing through the first valve 47 can be recovered to the recovery tank 51 via the second valve 48 and the return pipe 44.

(Second embodiment) Next, referring to FIG. 12 and FIG. 13, the operation of the liquid supply process (step S2) of the substrate processing apparatus 100 of the second embodiment of the present invention is described. In the second embodiment, the following example is described, that is, it is different from the liquid supply process shown in FIG. 10 and FIG. 11, and before the step of discharging the liquid onto the substrate W (step S23), the contamination of the supply pipe 43 and the liquid nozzle 21 is reduced. FIG. 12 is a flowchart showing an example of the operation in the liquid supply process (step S2) of the substrate processing apparatus 100 of the second embodiment. FIG. 13 is a timing diagram showing the opening of the first valve 47, the opening of the second valve 48, the flow rate of the chemical liquid flowing through the chemical liquid nozzle 21, and the position of the chemical liquid nozzle 21 in the chemical liquid supply process (step S2) of the substrate processing device 100 of the second embodiment.

As shown in FIG. 12 and FIG. 13 , similar to the first embodiment, in step S21, the substrate processing device 100 is in the ejection stop state. The ejection stop state is a state in which the chemical liquid is not ejected from the chemical liquid nozzle 21. In the ejection stop state, the chemical liquid nozzle 21 is arranged at the retreat position. In addition, in the ejection stop state, the control unit 3 sets the first valve 47 to the closed state (third opening) and sets the second valve 48 to the open state. Furthermore, in this embodiment, the first valve 47 is not completely closed.

Next, in step S211, the control unit 3 supplies liquid medicine to the supply pipe 43 and the liquid medicine nozzle 21, so that the liquid medicine is discharged from the liquid medicine nozzle 21 (preparatory discharge). In this way, since the inside of the supply pipe 43 and the liquid medicine nozzle 21 can be filled with liquid medicine, the inside of the supply pipe 43 and the liquid medicine nozzle 21 can be purified. Specifically, due to the return of the aforementioned processing liquid, the gas in the chamber 6 flows into the inside of the supply pipe 43 and the liquid medicine nozzle 21. Therefore, there is a possibility that the inside of the supply pipe 43 and the liquid medicine nozzle 21 is contaminated by the inflowing gas. In this embodiment, by flowing the chemical solution toward the supply pipe 43 and the chemical solution nozzle 21, the inside of the supply pipe 43 and the chemical solution nozzle 21 can be purified. Thereby, in the subsequent chemical solution discharge step (step S23), it is possible to suppress the contaminated chemical solution from being discharged toward the substrate W.

In step S211, the control unit 3 sets the opening of the first valve 47 from the third opening to the fourth opening, and sets the second valve 48 from the open state to the closed state. In this way, the chemical liquid is supplied from the chemical liquid nozzle 21 to the substrate W. In other words, it becomes a pre-discharge state. The fourth opening is smaller than the first opening and larger than the second opening. By setting the fourth opening smaller than the first opening, the consumption of the chemical liquid can be suppressed by pre-discharge. In addition, the fourth opening can be, for example, the same as the first opening, or larger than the first opening.

Next, in step S212, the control unit 3 sets the second valve 48 to an open state, and sets the opening of the first valve 47 from the fourth opening to the second opening. Thereby, a suction force F1 is generated, and then back-suction is generated. In other words, it becomes a state of preparing to discharge the treated liquid back. Furthermore, the opening of the first valve 47 in step S212 can also be set to be smaller than the opening of the first valve 47 in step S24. In other words, the opening of the first valve 47 in step S212 can also be set to be a fifth opening that is smaller than the second opening. In this case, the speed at which the liquid in the liquid nozzle 21 and the supply piping 43 return to the branching portion 42 slows down.

Next, in step S22, the control unit 3 moves the chemical liquid nozzle 21 from the retreat position to the processing position. In this embodiment, the control unit 3 moves the chemical liquid nozzle 21 from the retreat position to the processing position before the chemical liquid in the supply pipe 43 is exhausted in the state of preparing to discharge the processing liquid.

Next, in step S23, the control unit 3 sets the opening of the first valve 47 to the first opening, and sets the second valve 48 to the closed state. In this embodiment, the control unit 3 sets the opening of the first valve 47 from the second opening to the first opening, and sets the second valve 48 from the open state to the closed state before the liquid in the supply pipe 43 is exhausted in the state of preparing to discharge the treatment liquid, thereby setting the discharge state.

Furthermore, step S24 and step S25 of this embodiment are the same as step S24 and step S25 of the first embodiment, and thus their description is omitted.

As described above with reference to FIG. 12 and FIG. 13 , the substrate processing method of the present embodiment includes the following steps (steps S22 and S23): before the chemical solution in the supply pipe 43 is exhausted, the chemical solution nozzle 21 is moved from the retreat position to the processing position, and the opening of the first valve 47 is set from the second opening to the first opening, and the second valve 48 is set from the open state to the closed state, thereby discharging the chemical solution from the chemical solution nozzle 21 to process the substrate W. Therefore, after the preliminary discharging, during the period before the chemical solution nozzle 21 is moved to the processing position and the chemical solution is discharged from the chemical solution nozzle 21, it is possible to suppress the gas from flowing into the entire interior of the supply pipe 43 and the chemical solution nozzle 21. This can prevent the inside of the supply pipe 43 and the chemical liquid nozzle 21 from being contaminated by the gas.

The other structures, substrate processing methods and effects of the second embodiment are the same as those of the first embodiment.

(First variant) Next, referring to FIG. 14 , a substrate processing apparatus 100 according to the first variant of the present invention is described. FIG. 14 is a structural diagram showing the periphery of the insertion mounting member 46 of the substrate processing apparatus 100 according to the first variant of the present invention. In the first variant, an example in which the first flow path R1 and the third flow path R3 extend in a substantially horizontal direction from the branching portion 42 is described.

As shown in FIG. 14 , in the first variant, the first member 46a and the third member 46c of the insert mounting member 46 are configured to extend in a substantially horizontal direction. The second member 46b is configured to extend upward. In other words, the first flow path R1 and the third flow path R3 extend in a substantially horizontal direction from the branch portion 42. In addition, the second flow path R2 extends upward from the branch portion 42. Therefore, it can suppress the outflow of the liquid medicine in the insert mounting member 46 toward the supply pipe 43 in the dispensing stop state, thereby further suppressing the liquid medicine from dripping from the liquid medicine nozzle 21. Furthermore, when the first flow path R1 and the third flow path R3 extend in a substantially horizontal direction, the second flow path R2 can also extend downward.

(Second variant) Next, referring to FIG. 15, a substrate processing apparatus 100 according to the second variant of the present invention is described. FIG. 15 is a structural diagram showing the periphery of the supply mechanism 40 of the substrate processing apparatus 100 according to the second variant of the present invention. In the second variant, an example in which the insertion mounting member 46 is not provided at the branching point of the liquid delivery pipe 41, the supply pipe 43, and the return pipe 44, that is, the branching portion 42 is described.

As shown in FIG. 15 , in the second modification, the insertion mounting member 46 is not provided at the branching point of the liquid delivery pipe 41, the supply pipe 43, and the return pipe 44, that is, the branching portion 42. Specifically, the throttle portion 46d for reducing the flow area of the first flow path R1 is not provided around the branching portion 42. Even when the throttle portion 46d is not provided, the liquid medicine can flow from the supply pipe 43 to the return pipe 44 as described above.

Furthermore, in the second modification, the supply mechanism 40 is provided with the insertion mounting member 146. Furthermore, in a configuration in which the insertion mounting member 46 is not provided in the branching portion 42, the insertion mounting member 146 may not be provided.

The insert mounting member 146 includes a first member 46a, a second member 46b, and a third member 46c. Since the insert mounting member 146 is constructed in the same manner as the insert mounting member 46 and has the same function as the insert mounting member 46, a detailed description of the insert mounting member 146 is omitted.

The return pipe 44 is connected to the second member 46b of the insert mounting member 146. Air or nitrogen or the like flows into the first member 46a. The third member 46c is connected to the recovery tank 51 via a pipe. By adjusting the inflow of air or nitrogen into the first member 46a, the internal pressure after passing through the throttling portion 46d (not shown) can be adjusted. In this way, since the liquid medicine in the second member 46b can be sucked toward the third member 46c, the flow rate of the liquid medicine passing through the return pipe 44 can be adjusted. As a result, the speed at which the liquid medicine returns from the liquid medicine nozzle 21 and the supply pipe 43 to the branching portion 42 can be adjusted.

Although the embodiments of the present invention have been described above with reference to the drawings, the present invention is not limited to the embodiments described above and can be implemented in various forms within the scope of the essential contents thereof. In addition, the plurality of constituent elements disclosed in the embodiments described above can also be appropriately changed. For example, a constituent element of all constituent elements shown in a certain embodiment can be added to the constituent elements of another embodiment, or a plurality of constituent elements of all constituent elements shown in a certain embodiment can be deleted from the embodiment.

In addition, in order to facilitate the understanding of the present invention, the drawings are schematically represented with each component as the main body, and the thickness, length, quantity, spacing, etc. of each component in the drawings may sometimes be different from the actual ones depending on the circumstances of making the drawings. In addition, the composition of each component shown in the above-mentioned embodiment is only an example and is not particularly limited. Of course, various changes can be made within the scope of the effect of the present invention.

In the above embodiment, although the first valve 47 is illustrated as a valve that does not completely close the flow path of the liquid delivery pipe 41 in the closed state, the present invention is not limited thereto. The first valve 47 may also be a valve that completely closes the flow path of the liquid delivery pipe 41 in the closed state. However, in this case, it is preferable to use a valve with a relatively small contact area between the valve body and the valve seat, such as a motor needle valve.

In addition, in the above-mentioned embodiment, although the example in which the front end of the liquid medicine nozzle 21 is arranged at a position higher than the discharge port 44c of the downstream side end portion 44b of the return pipe 44 has been described, the present invention is not limited thereto. The front end of the liquid medicine nozzle 21 may also be arranged at the same position as the discharge port 44c of the downstream side end portion 44b of the return pipe 44, or at a position lower than the discharge port 44c. In this case, the back suction caused by the siphon principle will not be generated.

In addition, when the front end of the liquid nozzle 21 is arranged at the same height as the discharge port 44c of the downstream side end portion 44b of the return piping 44, or at a position lower than the discharge port 44c, by adjusting the opening of the first valve 47, the retention end position Z can also be kept at a predetermined position between the front end of the liquid nozzle 21 and the upstream side end portion 43a of the supply piping 43.

In addition, in the above-mentioned embodiment, although the example in which the first valve 47 can adjust the opening degree has been described, the present invention is not limited thereto, and the first valve 47 can also be one in which the opening degree cannot be adjusted. That is, the first valve 47 can also be changed between two states of an open state or a closed state.

In addition, for example, in the second embodiment, in order to suppress the contaminated chemical solution from being discharged toward the substrate W, the example of pre-discharging and purifying the inside of the supply pipe 43 and the chemical solution nozzle 21 has been described, but the present invention is not limited thereto. For example, the branching portion 42 may be arranged near the chemical solution nozzle 21 to shorten the supply pipe 43. In this case, the amount of contamination inside the supply pipe 43 can be suppressed, and thus the contaminated chemical solution can be suppressed from contaminating the substrate W.

In addition, in the above-mentioned embodiment, although the example of using a chemical solution as a processing liquid has been described, the present invention is not limited thereto. It is also possible to use a cleaning liquid as a processing liquid. (Industrial applicability)

The present invention can be applied to the fields of substrate processing devices and substrate processing methods.

1: Processing unit 2: Memory unit 3: Control unit 4: Fluid box 4A: First opening 4B: Second opening 4C: Third opening 5: Chemical storage cabinet 6: Chamber 7: FFU (Fan filter unit) 8: Partition wall 9: Gate 10: Rotary chuck 11: Chuck pin 12: Rotary seat 13: Rotary motor 14: Cup body 14a: Inclined part 14b: Guide part 14c: Liquid receiving part 15: Lifting unit 16: Cleaning liquid nozzle 17: Cleaning liquid piping 18: Cleaning liquid valve 21: Chemical nozzle 22: Nozzle moving unit 30: Chemical liquid supply device 31: Supply tank 32: Circulation piping 32a: Upstream side end 32b: Downstream side end 33: Circulation pump 34: Circulation filter 35: Circulation heater 40: Supply mechanism 41: Liquid delivery piping 41a: Upstream side end 41b: Downstream side end 42: Branching section 43: Supply piping 43a: Upstream side end 43b: Downstream side end 44: Return piping 44a: Upstream side end 44b: Downstream side end 44c: Discharge port 45: Flow meter 46: Insertion mounting member 46a: First member 46b: Second member 46c: Third component 46d: Throttling section 47: First valve 48: Second valve 51: Recovery tank 51a: Through hole 52: Recovery piping 52a: Upstream side end 52b: Downstream side end 53: Recovery pump 54: Recovery filter 100: Substrate processing device 100a: Frame A1: Rotation axis A2: Swing axis C: Substrate container D1: First diameter D2: Second diameter D3 Third diameter D4: Fourth diameter D5: Fifth diameter CR: Central robot IR: Index robot LP: Loading port P1: First pressure P2: Second pressure P3: Third pressure Q1: First direction Q2: Second direction Q3: Third direction R1: First flow path R2: Second flow path R3: Third flow path θ1: First angle θ2: Second angle TW: Tower X1: First moving direction X2: Second moving direction V1: First moving speed V2: Second moving speed W: Substrate Z: Retention end position

FIG. 1 is a top view schematically showing the structure of the substrate processing device of the first embodiment of the present invention. FIG. 2 is a side view schematically showing the structure of the processing unit. FIG. 3 is a flow chart showing an example of processing a substrate by the substrate processing device. FIG. 4 is a schematic diagram showing the structure of the liquid supply device. FIG. 5 is a schematic diagram showing the structure of the supply mechanism periphery. FIG. 6 is a cut-off end view of the insertion mounting member. FIG. 7 is a schematic diagram showing the pressure of the liquid. FIG. 8 is a schematic diagram showing the second valve in a closed state. FIG. 9 is a schematic diagram showing the second valve in an open state. FIG. 10 is a flow chart showing an example of the operation of the substrate processing device in the liquid supply process of supplying liquid to the substrate. FIG. 11 is a timing diagram showing the opening of the first valve, the opening of the second valve, and the flow rate of the liquid flowing through the liquid nozzle in the liquid supply process of supplying liquid to the substrate. FIG. 12 is a flow chart showing an example of the action in the liquid supply process of the substrate processing device of the second embodiment. FIG. 13 is a timing diagram showing the opening of the first valve, the opening of the second valve, the flow rate of the liquid flowing through the liquid nozzle, and the position of the liquid nozzle in the liquid supply process of the substrate processing device of the second embodiment. FIG. 14 is a structural diagram showing the periphery of the insertion mounting component of the substrate processing device of the first variant of the present invention. FIG. 15 is a structural diagram showing the periphery of the supply mechanism of the substrate processing device of the second variant of the present invention.

10: Rotating chuck

21: Liquid spray nozzle

30: Liquid medicine supply device

40: Supply organization

41: Liquid delivery piping

41a: Upstream end

41b: Downstream end

42: Division of Divergence

43: Supply piping

43a: Upstream side end

43b: Downstream end

44: Return piping

44a: Upstream end

44b: Downstream end

44c: Exhaust port

45: Flow meter

46: Insert the mounting components

47: First valve

48: Second valve

51: Recycling tank

52: Recycling piping

Claims (11)

A substrate processing device processes a substrate by supplying a processing liquid from a nozzle toward the substrate; the device comprises: a liquid supply pipe that guides the processing liquid; a supply pipe that guides the processing liquid guided by the liquid supply pipe toward the nozzle; a return pipe that guides the processing liquid guided by the liquid supply pipe along a path different from that of the supply pipe; a branching portion that is a branching point of the liquid supply pipe, the supply pipe, and the return pipe; a first valve that is disposed on the liquid supply pipe and can adjust the flow rate of the processing liquid supplied from the liquid supply pipe to the branching portion; a second valve that is disposed on the return pipe; and a control portion that controls the first valve and the second valve; by setting the first valve to an open state and the second valve to a closed state, The process is in a discharging state, wherein the treatment liquid flows from the liquid delivery pipe toward the supply pipe and the treatment liquid is discharged from the nozzle. The process is in a return state, wherein the treatment liquid flows from the supply pipe toward the return pipe, by setting the second valve from the closed state to the open state. The control unit can switch the opening of the first valve to at least the first opening and the second opening. The second opening is smaller than the first opening. The control unit sets the first valve to the discharging state by setting the opening of the first valve to the first opening and the second valve to the closed state, and sets the process to the return state by setting the opening of the first valve to the second opening and the second valve to the open state. As in the substrate processing device of claim 1, the first valve is a valve that does not completely close the processing liquid flow path of the liquid delivery pipe when in a closed state. The substrate processing device of claim 1 or 2, wherein the flow path for the processing liquid to pass through includes: a first flow path, which is on the liquid delivery pipe side relative to the branching portion; a second flow path, which is on the supply pipe side relative to the branching portion; and a third flow path, which is on the return pipe side relative to the branching portion, and the first angle is greater than the second angle, the second angle is the angle between the first direction from the branching portion toward the first flow path and the second direction from the branching portion toward the second flow path, and the first angle is the angle between the first direction and the third direction from the branching portion toward the third flow path. As in claim 3, the substrate processing device, wherein the first flow path and the third flow path extend from the branch portion in a substantially horizontal direction, and the second flow path extends upward from the branch portion. The substrate processing device of claim 1 or 2 is further provided with: a receiving tank for receiving the aforementioned processing liquid supplied from the aforementioned return pipe; the front end of the aforementioned nozzle is arranged at a position higher than the discharge port of the aforementioned return pipe. A substrate processing device as claimed in claim 1 or 2, wherein no valve other than the first valve is provided in the liquid delivery pipe and the supply pipe. In the substrate processing apparatus of claim 1 or 2, the control unit can switch the opening of the first valve to at least the first opening, the second opening and the third opening, the third opening being smaller than the second opening, and the control unit sets the first valve to the ejection stop state by setting the opening of the first valve from the second opening to the third opening and keeping the second valve in the open state, wherein the ejection stop state is a state in which a smaller amount of the processing liquid than the ejection state flows from the liquid delivery pipe toward the return pipe. The substrate processing device as claimed in claim 7 is further provided with: a moving mechanism that moves the nozzle between a processing position and a retreat position; the processing position is a position above the substrate, the retreat position is a position away from the substrate, the control unit controls the moving mechanism, the control unit can switch the opening of the first valve to the first opening, the second opening, the third opening and the fourth opening, the fourth opening being smaller than the first opening and larger than the second opening, The control unit, when the nozzle is arranged at the retreat position, sets the opening of the first valve from the third opening to the fourth opening and sets the second valve from the open state to the closed state, so as to set the nozzle to a pre-dispensing state, and the pre-dispensing state is to make the processing liquid from the liquid delivery The pipe flows toward the supply pipe to discharge the treatment liquid from the nozzle, and when the nozzle is arranged in the retreat position, the opening of the first valve is set from the fourth opening to the second opening, and the second valve is set from the closed state to the open state, so as to be set to a preparatory return state for discharging the treatment liquid. The preparatory return state for discharging the treatment liquid is to make the treatment liquid return from the front The supply pipe flows toward the return pipe, and before the treatment liquid in the supply pipe is exhausted in the return state of the prepared treatment liquid, the nozzle is moved from the retreat position to the treatment position, and the opening of the first valve is set from the second opening to the first opening, and the second valve is set from the open state to the closed state, so as to be set to the discharge state. A substrate processing method is a method for processing the substrate by supplying a processing liquid from a nozzle toward the substrate; the method comprises the following steps: setting a first valve provided on a liquid supply pipe to an open state, and setting a second valve provided on a return pipe connected to the liquid supply pipe to a closed state, so that the processing liquid flows from the liquid supply pipe toward a supply pipe connected to the liquid supply pipe and the return pipe and to the nozzle, and then discharging the processing liquid from the nozzle to process the substrate. ; and by setting the aforementioned second valve from the aforementioned closed state to the open state, the aforementioned treatment liquid flows from the aforementioned supply pipe toward the aforementioned return pipe; Perform the step of discharging the aforementioned treatment liquid from the aforementioned nozzle by setting the opening of the aforementioned first valve to a first opening and setting the aforementioned second valve to a closed state, and perform the step of flowing the aforementioned treatment liquid toward the aforementioned return pipe by setting the opening of the aforementioned first valve to a second opening smaller than the aforementioned first opening and setting the aforementioned second valve to an open state. The substrate processing method of claim 9 further comprises the following step: by setting the opening of the first valve from the second opening to a third opening smaller than the second opening, and keeping the second valve in the open state, a smaller amount of the processing liquid flows from the liquid delivery pipe to the return pipe than the step of ejecting the processing liquid from the nozzle. The substrate processing method of claim 10 further comprises the following steps: when the nozzle is arranged in a retreat position away from the top of the substrate, the opening of the first valve is set from the third opening to a fourth opening that is smaller than the first opening and larger than the second opening, and the second valve is set from the open state to the closed state, so that the processing liquid flows from the liquid delivery pipe to the supply pipe, and the processing liquid is ejected from the nozzle; when the nozzle is arranged in the retreat position, the opening of the first valve is set from the open state to the closed state. The fourth opening is set to the aforementioned second opening, and the aforementioned second valve is set from the aforementioned closed state to the aforementioned open state, so that the aforementioned processing liquid flows from the aforementioned supply pipe toward the aforementioned return pipe; and before the aforementioned processing liquid in the aforementioned supply pipe is exhausted, the aforementioned nozzle is moved from the aforementioned retreat position toward the processing position above the aforementioned substrate, and the opening of the aforementioned first valve is set from the aforementioned second opening to the aforementioned first opening, and the aforementioned second valve is set from the aforementioned open state to the aforementioned closed state, so that the aforementioned processing liquid is ejected from the aforementioned nozzle to process the aforementioned substrate.