CN106707699A - Exposure apparatus and device producing method - Google Patents

Abstract

The invention provides an exposure apparatus and a device producing method. According to a tenth aspect of the present invention, there is provided an exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus being provided with components including a projection optical system which projects an image of a pattern onto the substrate; a movable member which supports the substrate and moves; a liquid supply mechanism which supplies the liquid to the projection optical system through a supply port above the movable member; and a liquid recovery mechanism which recovers supplied liquid and gas together through a suction port above the movable member. The liquid recovery mechanism is provided with a tank which receives liquid recovered from the suction port and separated from gas and a detector which detects the amount of liquid received in the tank.

Description

Exposure device, device making method

The application is that the Application No. 201410333238.6, applying date is on July 26th, 2004, entitled " exposure The divisional application of the application for a patent for invention of device, device making method ".Wherein, the application of Application No. 201410333238.6 It is that the Application No. 200480021856.1, applying date is on July 26th, 2004, entitled " exposure device, device manufacturing method The divisional application of the application for a patent for invention of the control method of method and exposure device ".

Technical field

The present invention relates to a kind of exposure device being exposed to substrate by projection optics system and liquid, use the exposure The device making method of device and the control method of exposure device.

Background technology

Semiconductor devices or liquid crystal display device are transferred on photosensitive substrate by the figure that will be formed on mask So-called photolithography method manufacture.The exposure device that the photo-mask process is used has the mask platform of supporting mask and the base of supporting substrates Pallet, moves mask platform and Substrate table, while the figure of mask is transferred into substrate by projection optics system successively on one side.In recent years Come, in order to tackle the further highly integrated of component graphics, it is desirable to obtain the resolution higher of projection optics system.Use Exposure wavelength it is shorter, when numerical aperture of projection optics system is bigger, the resolution of projection optics system is higher.Therefore, exposure dress Put the exposure wavelength for using to shorten year by year, the numerical aperture of projection optics system also increases.The exposure wavelength of present main flow is received for KrF The 248nm of excimers laser, but the 193nm of shorter wavelengths of ArF excimer lasers is also just obtaining practical.In addition, When exposure is made, same with resolution, depth of focus (DOF) also becomes important.Resolution R and depth of focus δ are represented with following formula respectively.

R=k₁·λ/NA …(1)

δ=± k₂·λ/NA² …(2)

Wherein, λ is exposure wavelength, and NA is the numerical aperture of projection optics system, k₁、k₂It is process factor.From (1) formula, (2) Formula understands that, when exposure wavelength lambda, increase numerical aperture NA is reduced to improve resolution R, depth of focus δ narrows.

When depth of focus δ becomes narrow, it is difficult to make substrate surface consistent with the image planes of projection optics system, when there are exposure actions The not enough danger of surplus.Accordingly, as exposure wavelength and the method for expanding depth of focus is substantially reduced, for example, propose there is disclosure In No. 99/49504 immersion method of publication of International Publication No..The liquid such as the immersion method water or organic solvent is full of projection optics system Below between substrate surface, form liquid immersion area, using the wavelength of the exposure light in liquid, for the 1/n in air, (n is The refractive index of liquid, usually 1.2~1.6 or so) this point, resolution is improved, meanwhile, it is for about n times that depth of focus is expanded.

But, in liquid immersion exposure apparatus, such as liquid leakage of exposure or immersion then exists and causes dress by the liquid The possibility of the problems such as putting the failure of component, leak electricity or get rusty.In addition, treatment can not be exposed well.

The content of the invention

The present invention in view of such situation and make, its object is to provide it is a kind of use immersion method occasion Also the control method of exposure device, device making method and the exposure device for the treatment of can be well exposed.In addition, can carry Energy supply enough reduces the influence that the leakage or immersion of the liquid of exposure are produced, exposure device, device that treatment is exposed well The control method of part manufacture method and exposure device.

In order to solve the above problems, the present invention is using following composition corresponding with Fig. 1~Figure 22 shown in form of implementation.But It is that the symbol with parantheses that each several part is used only is used to illustrate the part, does not limit each several part.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 1st form of the invention by liquid (1), Substrate (P) is exposed；Wherein：With projection optics system (PL) and liquid feed mechanism (10)；

The projection optics system (PL) projects on substrate (P) figure picture；

Be supplied to liquid (1) between projection optics system (PL) and substrate (P) by the liquid feed mechanism (10)；

The supply of liquid feed mechanism (10) stop liquid (1) when exception or failure is detected.

According to the present invention, when detecting abnormal, the liquid for stopping being carried out by liquid feed mechanism is supplied, so, can prevent The only expansion of the leakage or immersion of liquid or its loss.It is therefore possible to prevent failure, the life of the peripheral device component that liquid is caused The generation of the problem of the variation of rust or substrate local environment, or reduce the influence of such problem.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 2nd form of the invention by liquid (1), Substrate (P) is exposed；Wherein have：

By liquid (1) by figure picture project to projection optics system (PL) on substrate (P) and

Electrical equipment (47,48)；

For the electric leakage that the attachment for preventing liquid (1) causes, when detecting abnormal, stop to electrical equipment (47,48) Power supply.

According to the present invention, when detecting abnormal, stop to power electrical apparatus, prevent electric leakage caused by the attachment of liquid, So, thus generation the problems such as can prevent the failure of influence of the electric leakage to peripheral device and electrical equipment itself, or reduction makes Into loss.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 3rd form of the invention by liquid (1), Substrate (P) is exposed；Wherein have：

By liquid (1) by figure picture project to projection optics system (PL) on substrate (P) and

It is passed to the air entry (42A, 66) for attracting system (25)；

In order to prevent the inflow of liquid (1), when detecting abnormal, stop the air-breathing from air entry (42A, 66).

Exposure device for example has for being oppositely oriented the air bearing (gas bearing) that face non-contactly supports table apparatus Air entry and absorption keep the various air entries such as the air entry of holding meanss of mask and substrate, but, when liquid is flowed into During to these air entries, cause the failure of the vacuum systems such as the vavuum pump circulated with these air entries (attracting system).According to the present invention, When detecting abnormal, stop from air entry air-breathing, so, can prevent liquid that the problem of vacuum system is flowed into by air entry. In the 1st~the 3rd form of the invention, " detecting exception " means to detect to the i.e. immersion exposure of the base plate exposure by liquid Light produces dysgenic situation, not only comprising detecting the exception related to the circulation of liquid, and comprising detect on Exception of action for the platform that substrate is moved etc. is remain, in addition, also comprising the related dress detected to exposure device connection The exception put.For example, also comprising the occasion of the abnormal signal (alarm) in the liquid manufacture device detected as relevant apparatus, Liquid manufacture device manufacture is supplied to the liquid of exposure device.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 4th form of the invention by liquid (1), Substrate (P) is exposed；Wherein：Have

Figure picture is projected to the projection optics system (PL) on substrate (P) by liquid (1),

The air entry (21,61,66) for attracting system (25,70,74) is passed to,

The separator (22,71,75) of the liquid (1) and gas from suction port (21,61,66) suction is separated, and

Make the dry drier of gas (23,72,76) for by separator (22,71,75) separate.

For example when the liquid suction port (recovery port) from liquids recovery mechanism attracts liquid using vacuum system, as reclaimed Liquid component is flowed into vacuum system (attracting system), then cause failure of the vacuum system etc..According to the present invention, with separator to from suction The liquids and gases for drawing mouth suction carry out gas-liquid separation, and the gas for by separator separate is dried with drier then, So as to liquid component (comprising wet gas) can be prevented to be flowed into the problem of vacuum system.It is therefore possible to prevent vacuum system (attracting system) Failure the problems such as generation, meanwhile, maintain the liquids recovery carried out by liquids recovery mechanism to act during can growing well, can Prevent liquids recovery mechanism recovery act can not carry out caused by liquid leakage.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 5th form of the invention by liquid (1), Substrate (P) is exposed；Wherein：With Substrate table (PST), projection optics system (PL) and control device (CONT)；

The Substrate table (PST) can remain substrate (P) movement, thereon with the 1st region (LA1)；

Figure picture is projected to substrate (P) by the projection optics system (PL), with the 2nd region (LA2), the 2nd region (LA2) It is relative with the 1st region (LA1) comprising image planes side fore-end (2a), kept between at least a portion in the 1st region (LA1) Liquid (1)；

The control device (CONT) is corresponding to the 1st region (LA1) and the position relationship in the 2nd region (LA2), restricting substrate platform (PST) movement.

According to the present invention, in the occasion of the composition being held in liquid between the 1st region and the 2nd region, for example, do not turn into The movement of the position relationship ground restricting substrate platform of liquid is kept between the 1st region and the 2nd region, so as to letting out for liquid can be prevented The problems such as leakage.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 6th form of the invention by liquid (1), Substrate (P) is exposed；Wherein：With projection optics system (PL), Substrate table (PST), substructure member (41), the 1st detector (80C), the 2nd detector (80D) and control device (CONT)；

The projection optics system (PL) is projected on substrate (P) figure picture by liquid (1)；

It is mobile that the Substrate table (PST) can remain substrate (P)；

The substructure member (41) movably supporting substrates platform (PST)；

1st detector (80C) is located at Substrate table (PST), detection liquid (1)；

2nd detector (80D) is located at substructure member (41), detection liquid (1)；

The control device (CONT) exposes corresponding to the 1st detector (80C) and the testing result of the 2nd detector (80D), control The action of electro-optical device.

According to the present invention, corresponding to the 1st detector and the testing result control of the 2nd detector that are mutually arranged at diverse location The action of exposure device processed, so, adequate measures corresponding with the range of scatter of the liquid of leakage or countermeasure can be taken.Cause This, can shorten the required time that resumes operation after liquid leakage occurs, and can prevent the decline of the operation ratio of exposure device.For example, When the 1st detector located at Substrate table detects the presence of liquid, control device judges that the range of scatter of the liquid of leakage is Narrower scope, for example, stop supply of liquid for being carried out by liquid feed mechanism etc., and it is corresponding with the scope appropriate to carry out Disposal.So, the time needed for resuming operation can be suppressed to Min..On the other hand, when the 2nd inspection located at substructure member When survey device detects the presence of liquid, the range of scatter for judging the liquid of leakage is region wider, and control device stops for example The power supply of the electrical equipments such as the drive device being driven to Substrate table.So, even if the liquid of leakage is diffused into model wider Enclose, the infringement such as electric leakage and failure prevented also from electrical equipment.

Exposure light (EL) is irradiated to substrate (P) by the exposure device (EX) of the 7th form of the invention by liquid (1), Substrate (P) is exposed；Wherein：With projection optics system (PL), liquid feed mechanism (10), Substrate table (PST) and control Device (CONT)；

The projection optics system (PL) projects on substrate figure picture；

Be supplied to liquid (1) between projection optics system (PL) and substrate (P) by the liquid feed mechanism (10)；

It is mobile that the Substrate table (PST) can remain substrate (P)；

The control device (CONT) during liquid feed mechanism (10) supplies liquid (1), by the shifting of Substrate table (PST) Dynamic scope is limited to the 1st scope (SR1), during the supply of liquid feed mechanism (10) stop liquid (1), by Substrate table (PST) moving range is restricted to 2nd scope (SR2) wider than the 1st scope (SR1).

According to the present invention, during liquid feed mechanism supply liquid, the moving range of Substrate table is limited to for example Liquid can be held in the 1st scope on Substrate table, so that the problems such as leakage of liquid can be prevented.On the other hand, supplied in liquid To mechanism's stop liquid supply during, by the way that the moving range of Substrate table to be set to the 2nd scope than the 1st wide ranges, from And successfully can enter to be about to Substrate table and move to the related predetermined action of the Substrate tables such as substrate exchange position.

Exposure light is irradiated to substrate by the exposure device of the 8th form of the invention by liquid, and substrate is exposed； Wherein：With projection optics system (PL), liquid feed mechanism (10), Substrate table (PST) and control device (CONT)；

The projection optics system (PL) projects on substrate figure picture；

The liquid feed mechanism (10) supplies a liquid to the image planes side of projection optics system；

The Substrate table (PST) can be in the image planes side shifting of projection optics system；

The moving range of control device (CONT) console；

The control device by the moving range of platform when maintaining liquid between projection optics system and platform be limited to than The narrow scope of the moving range of platform when not maintaining liquid between projection optics system and platform.

According to the 8th form of the invention, such as in the exposure process of the substrate on platform, sustainably in projection optics system Keep liquid well between platform, the occasion of liquid is being kept not between projection optics system and platform, can successfully carry out base Plate exchange etc. other action.

9th form of the invention, there is provided a kind of device making method, the device making method is characterised by, using upper State the exposure device (EX) of form.According to the present invention, when detecting abnormal, stopping the driving of predetermined device, so, can prevent The generation of the problems such as failure of locking apparatus, can carry out device manufacture under good device context.

A kind of 10th form of the invention, there is provided control method of exposure device, the exposure device will be exposed by liquid to be used Illumination is mapped on substrate and substrate is exposed；The exposure device by comprising projection optics system (PL), liquid feed mechanism (10), The inscape of electrical equipment (47,48) and equipment (42, PH) is constituted, and is connected with outside relevant apparatus；The projection optics System (PL) projects on substrate figure picture；Liquid (1) is supplied to the liquid feed mechanism (10) image planes of projection optics system Side；The equipment (47,48) is using electric energy as driving force；The equipment (42, PH) has the function of attracting gas；Wherein：Comprising this The step of sample, i.e.

Supply a liquid to the image planes side of projection optics system；

Receive from the abnormal signal of at least one notice of above-mentioned inscape and outside relevant apparatus；

According to above-mentioned signal, limit liquid feed mechanism (10), the equipment (47,48) with electric energy as driving force and have Attract at least one action of the equipment (42, PH) of the function of gas.

According to the control method of exposure device of the invention, the relevant apparatus inside exposure device or outside exposure device The occasion of abnormal abnormal signal as notifying the exception to be the generation influence such as exposure on substrate is produced, liquid is limited Body feed mechanism (10), the equipment (47,48) with electric energy as driving force and the equipment (42, PH) with the function of attracting gas At least one action so that liquid leakage can be prevented, the attraction of liquid that the electric leakage that is induced by it, suction device are produced etc..

Brief description of the drawings

Fig. 1 is the signal pie graph of the 1st form of implementation for showing exposure device of the present invention.

Fig. 2 is the perspective view for showing Substrate table.

Fig. 3 be show near the fore-end of projection optics system, the signal structure of liquid feed mechanism and liquids recovery mechanism Cheng Tu.

Fig. 4 is view field and liquid feed mechanism and the position relationship of liquids recovery mechanism for showing projection optics system Plan.

Fig. 5 is the schematic cross-section for illustrating the retracting device located at Substrate table.

Fig. 6 is the schematic diagram for illustrating the detector with optical fiber of the 2nd form of implementation of exposure device of the present invention.

Fig. 7 is the schematic diagram for illustrating the detector with optical fiber of the 2nd form of implementation of exposure device of the present invention.

Fig. 8 is the side view of the configuration example for showing the detector with optical fiber.

Fig. 9 is the plan of Fig. 8.

Figure 10 is the side view of another configuration example for showing the detector with optical fiber.

Figure 11 is the plan of another embodiment for showing the detector with optical fiber.

Figure 12 is the perspective view of another configuration example for showing the detector with optical fiber.

Figure 13 is the schematic diagram of another embodiment for showing the detector with optical fiber.

Figure 14 is the schematic diagram for illustrating the detector with prism of the 3rd form of implementation of exposure device of the present invention.

Figure 15 is the schematic diagram for illustrating the detector with prism of the 3rd form of implementation of exposure device of the present invention.

Figure 16 is the plan of the configuration example for showing the detector with prism.

Figure 17 is the figure of another use example for showing the detector with prism.

Figure 18 is the signal pie graph of another configuration example for showing the detector with prism.

(a) and (b) of Figure 19 is the figure of another embodiment for showing the detector with optical fiber.

(a) and (b) of Figure 20 is the figure for illustrating another embodiment of the present invention.

(a) and (b) of Figure 21 is the figure for illustrating another embodiment of the present invention.

Figure 22 is the flow chart of of the manufacturing process for showing semiconductor devices.

Figure 23 is to show the detection signal according to the various detectors from exposure device of the present invention by control device control Exposure device outside relevant apparatus and all devices inside exposure device and control device annexation block diagram.

Figure 24 is the flow chart of the control content of the control device for showing exposure device of the present invention.

Specific embodiment

The form of implementation of exposure device of the invention is illustrated with reference to the accompanying drawings, but the invention is not restricted to this.

Fig. 1 is the signal pie graph of the 1st form of implementation for showing exposure device of the present invention.In Fig. 1, exposure device EX tools There is the mask platform MST supported to mask M, the Substrate table PST supported to substrate P is supported with exposure light EL illumination In the illumination optical system IL of the mask M of mask platform MST, by by the figure of the mask M of exposure light EL illumination example projection exposure to The projection optics system PL of the substrate P supported by Substrate table PST, and it is uniformly controlled the control device of the overall actions of exposure device EX CONT.The alarm device K of alarm is sent when occurring abnormal on exposure-processed in control device CONT connections.In addition, exposure Device EX has the principal post 3 supported to mask platform MST and projection optics system PL.Principal post 3 is set to being flatly placed in ground The bedplate 4 of plate face.Inwards prominent upside step part 3A and downside step part 3B are formed in principal post 3.Control device As shown in figure 23 like that, the relevant apparatus with the outside of the various inscapes and exposure device that constitute exposure device are connected, and control The control content of device processed is explained below.

In order to substantially shorten exposure wavelength, resolution is improved, meanwhile, substantial increasing depth of focus, the exposure of this form of implementation Electro-optical device EX is the liquid immersion exposure apparatus for being applicable immersion method, with the He of liquid feed mechanism 10 being supplied to liquid 1 in substrate P Reclaim the liquids recovery mechanism 20 of the liquid 1 in substrate P.Exposure device EX is in the phase being at least transferred to mask M in substrate P Between, by the liquid 1 that is supplied from liquid feed mechanism 10 in the substrate P of the view field AR1 comprising projection optics system PL one Part forms liquid immersion area AR2.Specifically, the light of the fore-end (terminal part) of the projection optics system PL of exposure device EX Learn hydraulically full 1 between the surface of element 2 and substrate P, by liquid 1 and projection optics between the projection optics system PL and substrate P It is PL, the figure picture of mask M is projected in substrate P, so as to is exposed to the substrate P.

In this form of implementation, to use scanning exposure apparatus (so-called step-scan exposure device) as exposure device Illustrated as a example by the occasion of EX, the scanning exposure apparatus make mask M and substrate P towards with scanning direction on it is mutually different Direction (rightabout) synchronizing moving, meanwhile, will be formed in the graph exposure of mask M to substrate P.In the following description, if The direction consistent with the optical axis AX of projection optics system PL is Z-direction, and mask M is same with substrate P in the plane vertical with Z axis Moved further direction (scanning direction) is X-direction, and the direction (non-scan direction) vertical with Z-direction and X-direction is Y-axis side To.In addition, set being respectively θ X, θ Y, θ Z-directions around revolution (inclination) direction of X-axis, Y-axis and Z axis." substrate " mentioned here Comprising the plate that the photoresist coated on the semiconductor wafer as photosensitive material is obtained, " mask " includes to be formed with will reduce throwing Shadow is in the graticule of the component graphics on substrate.

Illumination optical system IL is supported by the pillar 5 for being fixed on the top of principal post 3.Illumination optical system IL exposure lights EL pairs The mask M for being supported on mask platform MST is illuminated, and with exposure light source, makes the illumination of light beam from exposure light source outgoing The optical integrator of homogenization, the exposure light EL from optical integrator is carried out the collector lens of optically focused, relay lens system, And the illumination region by exposure light EL on mask M is set as variable field-of-view diaphragm of slit-shaped etc..It is predetermined on mask M Illumination region is pressed the exposure light EL illumination of uniform Illumination Distribution by IL.As the exposure light from illumination optical system IL outgoing EL, for example, can be used the bright line (g lines, h lines, i lines) and KrF excimer laser (ripples from the ultraviolet region of mercury vapor lamp outgoing 248nm long) etc. extreme ultraviolet light (DUV light), ArF excimer lasers (wavelength 193nm) and F₂The vacuum such as laser (157nm) are purple Outer light (VUV light) etc..In this form of implementation, ArF excimer lasers are used.

In this form of implementation, pure water is used as liquid 1.Pure water can not only be passed through by ArF excimer lasers, and And can be by for example from the bright line (g lines, h lines, i lines) and KrF excimer laser (wavelength of the ultraviolet region of mercury vapor lamp outgoing 248nm) etc. extreme ultraviolet light (DUV light) is passed through.

Mask platform MST is used to support mask M, and part has the opening portion for passing through the figure picture of mask M at its center 34A.Mask base plate 31 is supported by Anti-vibration unit 6 in the upside step part 3A of principal post 3.In the middle body of mask base plate 31 Also the opening portion 34B for passing through the figure picture of mask M is formed.Multiple is set below mask platform MST used as noncontact axle The gas bearing (air bearing) 32 held.Mask platform MST is non-contactly supported on above mask base plate 31 by gas bearing 32 (spigot surface) 31A, by the mask platform drive mechanism such as linear motor, can make it vertical with the optical axis AX of projection optics system PL 2 dimension movements are carried out in the interior i.e. X/Y plane of plane and carry out small revolution towards θ Z-directions.Being set on mask platform MST can be with mask platform MST is together relative to the moving lens 35 of projection optics system PL movements.In addition, setting laser interference in the position relative with moving lens 35 Instrument 36.(some occasions also include θ X, θ Y sides for the position in the 2 dimension directions of the mask M on mask platform MST and the angle of revolution of θ Z-directions To angle of revolution) measured in real time by laser interferometer 36, measurement result output is to control device CONT.Control device CONT drives mask platform drive mechanism according to the testing result of laser interferometer 36, so as to control to be supported on covering for mask platform MST The position of mould M.

Projection optics system PL is used for the graphic projection of mask M to substrate P by predetermined projection multiplying power β, by comprising being located at Multiple optical elements (lens) of the optical element (lens) 2 of the fore-end of substrate P side are constituted, and these optical elements are by lens barrel PK is supported.In this form of implementation, projection optics system PL is to project the diminution system that multiplying power β is, for example, 1/4 or 1/5.Projection optics It is PL or equimultiple system or amplification system.Flange portion FLG is provided with the outer peripheral portion of lens barrel PK.In addition, in the downside of principal post 3 Step part 3B supports lens barrel fixed plate 8 by Anti-vibration unit 7.It is engaged in by by the flange portion FLG of projection optics system PL Lens barrel fixed plate 8, so as to projection optics system PL is supported on into lens barrel fixed plate 8.

The optical element 2 of the fore-end of the projection optics system PL of this form of implementation can be with respect to lens barrel PK with assembling and disassembling (exchange) Set.The liquid 1 of liquid immersion area AR2 is contacted with optical element 2.Optical element 2 is formed with fluorite.The compatibility of fluorite and water Height, so, liquid 1 can be made to be in close contact the substantially entire surface of the liquid contact surface 2a in optical element 2.That is, in this implementation shape In formula, the supply liquid (water) 1 high with the compatibility of the liquid contact surface 2a of optical element 2, so, the liquid of optical element 2 Contact surface 2a is high with the close contact of liquid 1, can be with liquid 1 positively full of the light path between optical element 2 and substrate P.Light Learn element 2 or the quartz high with the compatibility of water.In addition, also can implement hydrophilic to the liquid contact surface 2a of optical element 2 Change (lyophilised) treatment, further improve the compatibility with liquid 1.

Surround the ground of optical element 2 and board member 2P is set.Relative with the substrate P face of board member 2P is (i.e. following) for flat Face.Below optical element 2 (liquid contact surface) 2a also turn into tabular surface, below board member 2P with optical element 2 below It is generally in same level.So, liquid immersion area AR2 can well be formed in wide scope.In addition, below board member 2P Below, surface treatment (lyophilised treatment) is implemented in the same manner as optical element 2.

Substrate table (movable link) PST is carried out by the adsorbable substrate Ps that remain of substrate tray (substrate holding structure) PH Movably set, the gas bearing (air bearing) 42 of multiple non-contact bearings is provided as in its lower section.Lead on bedplate 4 Cross the supporting substrates base plate 41 of Anti-vibration unit 9.Air bearing 42 has blow-off outlet 42B and air entry 42A, and 42B is relative for the blow-off outlet (spigot surface) 41A blow gas (air) above substrate base 41, air entry 42A attracts (bearing below Substrate table PST Face) gas and between spigot surface 41A, the bounce produced by the blowout of the gas from blow-off outlet 42B and by air entry 42A The balance of the attraction of generation, certain gap is kept below Substrate table PST between spigot surface 41A.That is, Substrate table PST Noncontact supporting is carried out by (spigot surface) 41A above the opposing substrate base plate (substructure member) 41 of air bearing 42, by linear electricity The Substrate table drive mechanism such as motivation, can be to carry out 2 dimensions in X/Y plane in the plane vertical with the optical axis AX of projection optics system PL Move and carry out small revolution towards θ Z-directions.In addition, substrate tray PH in Z-direction, θ X-directions and θ Y-directions also movably Set.Substrate table drive mechanism is controlled by control device CONT.That is, the focal position (Z location) of substrate tray PH control base boards P And inclination angle, make the surface of substrate P consistent with the image planes of projection optics system PL by automatic focusing mode and automatic leveling mode, enter The X-direction of row substrate P and the positioning of Y direction.

On Substrate table PST (substrate tray PH), setting can be together with Substrate table PST relative to projection optics system PL movements Moving lens 45.In addition, setting laser interferometer 46 in the position relative with moving lens 45.2 dimensions of the substrate P on Substrate table PST The position and angle of revolution in direction are measured in real time by laser interferometer 46, and measurement result is output to control device CONT.Control Device CONT processed drives the Substrate table drive mechanism comprising linear motor machine according to the measurement result of laser interferometer 46, from And the positioning of the substrate P for carrying out being supported on Substrate table PST.

In addition, set accessory plate 43 (reference picture 2) on Substrate table PST (substrate tray PH) with surrounding substrate P.Accessory plate 43 planes with the height being substantially the same with the surface of the substrate P for being held in substrate tray PH.In the fringe region to substrate P , can be also held in liquid 1 below projection optics system PL by accessory plate 43 by the occasion being exposed.

In addition, the outside of the accessory plate 43 in substrate tray PH is provided for reclaiming the liquid in the outside for flowing out to substrate P The recovery port (suction port) 61 of the retracting device 60 of body 1.Recovery port 61 is the groove portion of the ring-type for surrounding the formation of accessory plate 43, at it The liquid absorbing member 62 that inside configuration is made up of spongy component or porous plastid etc..

Fig. 2 is the perspective illustration of the Substrate table drive mechanism for showing Substrate table PST and driving Substrate table PST.In Fig. 2 In, Substrate table PST can be supported with moving freely by X guide tables 44 towards X-direction.Substrate table PST can be guided by X guide tables 44, Meanwhile, moved by predetermined stroke towards X-direction by x-ray motor 47.X-ray motor 47 has in X guide tables 44 along X-axis The extended stator 47A in direction and set corresponding to stator 47A, be fixed on Substrate table PST can mover 47B.Can mover 47B relative stators 47A is driven, so that Substrate table PST is moved towards X-direction.Herein, Substrate table PST passes through magnetic Guiding mechanism is non-contactly supported, and the magnetic guiding mechanism is maintained the gap of scheduled volume by relative X guide tables 44 towards Z-direction Magnet and executive component are constituted.Substrate table PST is supported on the state of X guide tables 44 by x-ray motor 47 towards X-axis by noncontact Move in direction.

1 pair of Y linear motor 48 is provided with the length direction two ends of X guide tables 44, the Y linear motors 48 can make the X Guide table 44 is moved together with Substrate table PST towards Y direction.Y linear motors 48 have the length located at X guide tables 44 respectively Direction two ends can mover 48B and corresponding to this can mover 48B set stator 48A.By can mover 48B relative stators 48A It is driven, so that X guide tables 44 are moved together with Substrate table PST towards Y direction.In addition, linearly electric by adjustment Y respectively The driving of motivation 48, so as to X guide tables 44 can be made also to be turned round towards θ Z-directions move.Therefore, base can be made by the Y linear motors 48 Pallet PST is substantially integratedly moved with X guide tables 44 towards Y direction and θ Z-directions.

In the X-direction both sides of substrate base 41, targeting part 49, the shape in front view of targeting part 49 are respectively equipped with As L-shaped, the movement to X guide tables 44 towards Y direction is guided.Targeting part 49 is supported on bedplate 4 (Fig. 1). In this form of implementation, the stator 48A of Y linear motors 48 is provided with the flat 49B of targeting part 49.On the other hand, What the length direction both ends below X guide tables 44 were respectively equipped with spill is directed to component 50.Targeting part 49 be directed to Component 50 is engaged, and (spigot surface) 49A is oppositely disposed with the inner face for being directed to component 50 above targeting part 49.In guide part Divide 49 spigot surface 49A to be provided with and be oppositely oriented face as gas bearing (air bearing) 51, the X guide tables 44 of non-contact bearing 49A is non-contactly supported.

In addition, being provided as between the stator 48A of Y linear motors 48 and the flat 49B of targeting part 49 non- The gas bearing (air bearing) 52 of contact bearing, stator 48A is oppositely oriented the flat 49B of part 49 by air bearing 52 Non-contactly support.Therefore, according to the law of conservation of momentum, corresponding to X guide tables 44 and +Y direction (- Y) direction of Substrate table PST Movement, stator 48A is mobile towards -Y direction (+Y direction).X guide tables 44 and Substrate table PST are made by the movement of stator 48A Mobile counter-force is cancelled, meanwhile, the change of position of centre of gravity can be prevented.That is, stator 48A has as the work(of so-called balance mass Energy.

Fig. 3 is to show putting near liquid feed mechanism 10, liquids recovery mechanism 20 and projection optics system PL fore-ends Big figure.Liquid feed mechanism 10 is used to be supplied to liquid 1 between projection optics system PL and substrate P, with can send out liquid 1 Liquid supply portion 11 and liquid supply portion 11, the liquid that will be sent out from the liquid supply portion 11 are connected to by supply pipe 15 Body 1 is supplied to the supply ozzle 14 in substrate P.Surface configuration of the supply ozzle 14 close to substrate P.Liquid supply portion 11 has Case and force (forcing) pump of liquid 1 etc. are housed, liquid 1 is supplied in substrate P by supply pipe 15 and supply ozzle 14.Liquid is supplied The liquid supply action of part 11 is controlled by control device CONT, control device CONT it is controllable by liquid supply portion 11 for The liquid quantity delivered of the time per unit in substrate P.

In the way of supply pipe 15, it is provided with to the amount of the liquid 1 being supplied to from liquid supply portion 11 in substrate P (per single The liquid quantity delivered of position time) flowmeter 12 that measures.The amount of the liquid 1 often to being supplied in substrate P of flowmeter 12 Monitored, by its measurement result output to control device CONT.In addition, flowmeter 12 and supply ozzle in supply pipe 15 Between 14, the valve 13 being opened and closed to the stream of supply pipe 15 is provided with.The on-off action of valve 13 is controlled by control device CONT System.The valve 13 of this form of implementation for example stops the driving source (power supply) of exposure device EX (control device CONT) by power failure etc. Occasion only, the normally closed mode as the mechanically stream of inaccessible supply pipe 15.

Liquids recovery mechanism 20 is used to reclaim the liquid 1 in the substrate P supplied by liquid feed mechanism 10, with close to base The recovery ozzle (suction port) 21 of the surface configuration of plate P and by recovery tube 24 be connected to reclaim ozzle 21 vacuum system (attract System) 25.Vacuum is 25 to include vavuum pump, and its action is controlled by control device CONT.It is 25 drivings by vacuum, in substrate P Liquid 1 is reclaimed together with the gas (air) around it by reclaiming ozzle 21.It is 25 as vacuum, also can not be in exposure device Vavuum pump is set, but uses the vacuum system in the workshop of configuration exposure device EX.

In the way of recovery tube 24, the liquid 1 and the gas-liquid separator 22 of gas separated from the suction of ozzle 21 is reclaimed are provided with. Herein, as described above, the gas around it is reclaimed together with the liquid in substrate P from recovery ozzle 21.Gas-liquid separator 22 separate from the liquid 1 and gas for reclaiming the recovery of ozzle 21.As gas-liquid separator 22, for example can be using Gravity Separation mode Device of device or centrifugation mode etc.；The device of the Gravity Separation mode makes liquid fall by Action of Gravity Field by above-mentioned hole portion Under, so as to separate liquids and gases；The liquids and gases that the device of the centrifugation mode is reclaimed using centrifugal force separate.Vacuum It is gas that 25 attractions by gas-liquid separator 22 separate.

Vacuum in recovery tube 24 is between 25 and gas-liquid separator 22, to be provided with the gas for making by gas-liquid separator 22 separate The dry drier 23 of body.Even if being mixed with liquid component in the gas for by gas-liquid separator 22 separate, by by drier 23 Dry gas, it is 25 the gas for having dried is flowed into vacuum, so that vacuum system caused by can preventing liquid component from flowing into The generation of the problems such as 25 failure.As drier 23, can using the device of mode as cooler or for example heater that The device of the mode of sample, the device of mode as the cooler (is mixed with liquid by by the gas supplied from gas-liquid separator 22 The gas of body composition) be cooled to the dew point of the liquid or its below, so as to liquid component be removed, mode as the heater Device by be heated to the boiling point of the liquid or its more than, so as to liquid component be removed.

On the other hand, the liquid 1 for by gas-liquid separator 22 separate is recovered to liquids recovery part by the 2nd recovery tube 26 28.Case that liquids recovery part 28 is housed with the liquid 1 to reclaiming etc..It is recovered to the liquid 1 of liquids recovery part 28 For example discard, or return to liquid supply portion 11 etc. after cleaning and recycled.In addition, in the way of the 2nd recovery tube 26, Amount (the liquids recovery of time per unit to the liquid 1 for reclaiming is provided between gas-liquid separator 22 and liquids recovery part 28 Amount) flowmeter 27 that measures.Flowmeter 27 monitors the amount of the liquid 1 reclaimed from substrate P often, by the output of its measurement result To control device CONT.As described above, in substrate P liquid 1 and the gas around it are reclaimed and reclaimed from recovery ozzle 21, but Liquid 1 and gas are separated in gas-liquid separator 22, liquid component is only sent to flowmeter 27, so, flowmeter 27 can be correctly Measure the amount of the liquid 1 reclaimed from substrate P.

In addition, there is exposure device EX detection to be supported on the focusing of the position on the surface of the substrate P of Substrate table PST (focus) detection is 56.Focus detection be 56 have detecting light beam is projected in substrate P from oblique upper by liquid 1 The light part 56B of the reflected light of the above-mentioned detecting light beam that light projector part 56A and receiving are reflected by substrate P.Focus detection system Control device CONT is arrived in the light result output of 56 (light part 56B).Control device CONT is according to the inspection that focus detection is 56 Survey the positional information that result can detect that the Z-direction on substrate P surface.In addition, projecting multiple detections by from light projector part 56A With light beam, so as to can detect that the inclination information of θ X and the θ Y-directions of substrate P.

Substrate P is not limited to, focus detection is the table of 56 objects that also can detect the image planes side for being configured to projection optics system PL Face positional information.In addition, focus detection is 56 surface position informations by the detection object of liquid 1 (substrate P), but in immersion area The outside of domain AR2, also can be using the focus detection system of the surface position information for not passing through the ground detection object (substrate P) of liquid 1.

As shown in a part of sectional view of Fig. 1, liquid feed mechanism 10 and liquids recovery mechanism 20 consolidate with respect to lens barrel Fixed board 8 is discretely supported by.So, the vibration for being produced by liquid feed mechanism 10 and liquids recovery mechanism 20 will not be by lens barrel Fixed plate 8 is delivered to projection optics system PL.

Fig. 4 is the view field AR1 for showing liquid feed mechanism 10 and liquids recovery mechanism 20 and projection optics system PL The plan of position relationship.The view field AR1 of projection optics system PL turns into the elongated rectangle of Y direction (slit-shaped), along X Direction of principal axis configures 3 supply ozzle 14A~14C with clamping its view field AR1 in+X sides, and 2 recovery ozzles are configured in-X sides 21A、21B.Supply ozzle 14A~14C is connected to liquid supply portion 11 by supply pipe 15, reclaims ozzle 21A, 21B and passes through It is 25 that recovery tube 24 is connected to vacuum.In addition, making supply pin 14A~14C and recovery ozzle 21A, 21B substantially turn round 180 ° Position, configuration supply ozzle 14A '~14C ', reclaim ozzle 21A ', 21B '.Supply ozzle 14A~14C and recovery ozzle 21A ', 21B ' are alternately arranged along Y direction, and supply ozzle 14A '~14C ' replaces row with ozzle 21A, 21B is reclaimed along Y direction Row, supply ozzle 14A '~14C ' is connected to liquid supply portion 11 by supply pipe 15 ', reclaims ozzle 21A ', 21B ' and passes through It is 25 that recovery tube 24 ' is connected to vacuum.It is same with supply pipe 15 in the way of supply pipe 15 ', it is provided with flowmeter 12 ' and valve 13′.In addition, in the way of recovery tube 24 ', it is same with recovery tube 24, it is provided with gas-liquid separator 22 ' and drier 23 '.

Fig. 5 is the figure of the retracting device 60 for showing the liquid 1 for reclaiming the outside for flowing out to substrate P.In Figure 5, return Receiving apparatus 60 are with the recovery port (suction port) 61 that the formation of the ground of accessory plate 43 is surrounded on substrate tray PH and are configured at recovery port 61st, the liquid absorbing member 62 being made up of porous plastids such as spongy component or porous ceramics.Liquid absorbing member 62 is tool There is the annular component of preset width, liquid 1 can be remained scheduled volume.Connect with recovery port 61 in being internally formed for substrate tray PH Logical stream 63, the bottom for being configured at the liquid absorbing member 62 of recovery port 61 is contacted with stream 63.In addition, in substrate tray PH On substrate P and accessory plate 43 between be provided with multiple liquids recovery holes 64.These liquids recovery holes 64 are also connected to stream 63.

The back side for supporting substrates P is provided with above substrate tray (substrate holding structure) PH for keeping substrate P Multiple protruding portion 65.The adsorption hole 66 that absorption keeps substrate P is respectively provided with these protuberances 65.Adsorption hole 66 connects respectively It is connected to the pipeline 67 being formed inside substrate tray PH.

The stream 63 for being connected to recovery port 61 and liquids recovery hole 64 is connected to pipe outside substrate tray PH The one end on road 68.On the other hand, it is 70 that the other end of pipeline 68 is connected to the vacuum comprising vavuum pump.On the way of pipeline 68 In be provided with gas-liquid separator 71, be provided with drier 72 between in gas-liquid separator 71 and vacuum being 70.It is 70 drive by vacuum Dynamic, liquid 1 is reclaimed together with the gas around it from recovery port 61.Even if in addition, liquid 1 soaks between substrate P and accessory plate 43 Enter, around the rear side of substrate P, the liquid is also reclaimed together with ambient gas from liquids recovery hole 64.It is 70 in vacuum, flows into The gas for being separated by gas-liquid separator 71, having been dried by drier 72.On the other hand, the liquid 1 for by gas-liquid separator 71 separate It is flowed into the liquid recovery part 73 that can house the case of liquid 1 etc..The liquid 1 for being recovered to liquid recovery part 73 for example goes out of use Or clean, liquid supply portion 11 etc. is returned to, it is reused.

In addition, the pipeline 67 for being connected to adsorption hole 66 is connected to the one end of the pipeline 69 outside substrate tray PH. On the other hand, it is 74 that the other end of pipeline 69 is connected to vacuum, and the vacuum is 74 comprising true outside substrate tray PH Empty pump.It is 74 driving by vacuum, the substrate P for being supported on protuberance 65 carries out absorption holding by adsorption hole 66.In pipeline 69 Way in be provided with gas-liquid separator 75, be that drier 76 is provided between 74 in gas-liquid separator 75 and vacuum.In addition, in gas-liquid separation The connection of device 75 has the liquid recovery part 73 that can house the case of liquid 1 etc..

Below, the grade of reference picture 1 explanation uses above-mentioned exposure device EX by the order of the graph exposure of mask M to substrate P.

Mask M is loaded into mask platform MST, substrate P is loaded into Substrate table PST, then, control device CONT drives liquid The liquid supply portion 11 of body feed mechanism 10, by supply pipe 15 and supply ozzle 14 in time per unit by the liquid of scheduled volume Body 1 is supplied in substrate P.In addition, control device CONT supplies liquid 1 with by liquid feed mechanism 10, liquids recovery is driven The vacuum of mechanism 20 is 25, reclaims the liquid 1 of scheduled volume in time per unit by reclaiming ozzle 21 and recovery tube 24.So, The liquid immersion area AR2 of liquid 1 is formed between the optical element 2 and substrate P of the leading section of projection optics system PL.Herein, it is Formation liquid immersion area AR2, control device CONT control liquid feed mechanism 10 and liquids recovery mechanism 20 respectively, make relative base Liquid quantity delivered on plate P and the liquids recovery amount generally equal amount from substrate P.Then, control device CONT is by illuminating Optical system IL is exposed the illumination with light EL to mask M, and the figure picture of mask M is thrown by projection optics system PL and liquid 1 Shadow is to substrate P.

When being scanned exposure, in the figure picture of a part of view field AR1 projection print plates M, with respect to projection optics system PL towards -X direction (or +X direction) by speed V movements mask M, it is synchronous with this, substrate P towards +X direction is made by Substrate table PST (or -X direction) is mobile by speed β V (β is projection multiplying power).After being exposed to 1 exposure area (shot area), lead to The stepping of substrate P is crossed, next exposure area scanning starting position is moved into, below, by step scan mode successively to each exposure Light region is exposed treatment.In this form of implementation, make liquid 1 parallel to the moving direction court of substrate P and the movement of substrate P Direction identical direction fluidly sets.That is, substrate P is made towards with scanning direction (-X direction) shown in arrow Xa (reference picture 4) Moving substrate P is scanned the occasion of exposure, uses supply pipe 15, supply ozzle 14A~14C, recovery tube 24 and recovery ozzle 21A, 21B, the supply and recovery of liquid 1 are carried out by liquid feed mechanism 10 and liquids recovery mechanism 20.That is, when substrate P towards-X When direction is moved, liquid 1 is supplied between projection optics system PL and substrate P from supply ozzle 14 (14A~14C), meanwhile, from Reclaim ozzle 21 (21A, 21B) to reclaim the liquid 1 in substrate P together with the gas around it, full of projection optics system PL's Liquid 1 is set to be flowed towards -X direction between the optical element 2 and substrate P of leading section.On the other hand, substrate P is made to continue to use arrow Xb Scanning direction (+X direction) shown in (reference picture 4) is mobile, be scanned the occasion of exposure, uses supply pipe 15 ', supply ozzle 14A '~14C ', recovery tube 24 ' and recovery ozzle 21A ', 21B ', are carried out by liquid feed mechanism 10 and liquids recovery mechanism 20 The supply and recovery of liquid 1.That is, when substrate P is moved towards +X direction, liquid 1 is supplied from supply ozzle 14 ' (14A '~14C ') Be given between projection optics system PL and substrate P, meanwhile, by the liquid 1 in substrate P from reclaim ozzle 21 ' (21A ', 21B ') and its The gas of surrounding is reclaimed together, and liquid 1 towards+X is made between the optical element 2 and substrate P of the leading section full of projection optics system PL Flow in direction.In the occasion, for example, by supplying the liquid 1 of the supply of ozzle 14 with substrate P towards the movement of -X direction, attracting Flowed between optical element 2 and substrate P, so, liquid feed mechanism 10 (liquid supply portion 11) though supply energy It is smaller, also can easily supply a liquid between optical element 2 and substrate P.Then, liquid 1 is switched corresponding to scanning direction The direction of flowing, so as to make the occasion of substrate P scanning towards +X direction or -X direction, all can be filled to optical element 2 by liquid 1 With between substrate P, can be exposed by high-resolution and depth of focus wide.

In exposure process, located at the measurement result of the flowmeter 12 of liquid feed mechanism 10 and located at liquids recovery The measurement result of the flowmeter 27 of mechanism 20 exports control device CONT often.Control device CONT compares the survey of flowmeter 12 Amount result is that the amount of the liquid being supplied to by liquid feed mechanism 10 in substrate P is returned with the measurement result of flowmeter 27 by liquid The amount of the liquid that mechanism 20 reclaims from substrate P is received, according to its result of the comparison, the valve 13 of control liquid feed mechanism 10.Specifically Say that control device CONT obtains the amount of liquid (measurement result of flowmeter 12) and the liquid from substrate P being supplied in substrate P in ground The difference of body yield (measurement result of flowmeter 27), judges whether the difference obtained exceedes feasible value (threshold set in advance Value), control valve 13.Herein, as described above, control device CONT controls liquid feed mechanism 10 and liquid recovery machine respectively Structure 20, makes to be supplied to the amount of liquid in substrate P and is substantially the same with the liquids recovery amount from substrate P, so, such as liquid feed mechanism The liquids recovery action of 10 liquid supply action and liquids recovery mechanism 20 is normally carried out respectively, then the above-mentioned difference obtained is substantially It is zero.

In the occasion of occasion of the difference obtained more than or equal to feasible value, i.e. liquids recovery amount than liquid quantity delivered much less, It is abnormal that control device CONT judges that the recovery action of liquids recovery mechanism 20 occurs, it is impossible to withdrawal liquid 1.Now, control device CONT for example judge the vacuum in liquids recovery mechanism 20 be 25 break down etc. it is abnormal, in order to prevent can not be by liquid recovery machine Normally withdrawal liquid 1 and the leakage of liquid 1 that causes of structure 20, makes the valve 13 of liquid feed mechanism 10 work, and disconnects supply pipe 15 stream, stop liquid feed mechanism 10 is to supplying liquid 1 in substrate P.So, control device CONT compares from liquid supply The amount of liquid that mechanism 10 is supplied in substrate P and the amount of liquid reclaimed by liquids recovery mechanism 20, detect according to its comparative result Liquids recovery mechanism 20 recovery action exception, when the surplus supply of liquid 1, detect abnormal when, stop to substrate P supply liquid Body 1.So, liquid 1 can be prevented to be immersed in not to the leakage or liquid 1 in substrate P or the outside of Substrate table PST (substrate tray PH) The expansion of loss caused by desired position, or such leakage or immersion.

In addition, control device CONT is in the exception that the recovery for detecting liquids recovery mechanism 20 is acted, for anti-stopping leak The electric leakage that the attachment of the liquid 1 of leakage or immersion causes, stops the power supply to the electrical equipment for constituting exposure device EX.Herein, As electrical equipment, can include for linear motor 47,48 for moving Substrate table PST etc..These linear motors 47, 48 positions that easily attachment is immersed of the liquid 1 in leaking on the outside of Substrate table PST, so, control device CONT is by stopping Only powered to these linear motors 47,48, so as to the electric leakage that the attachment of liquid 1 causes can be prevented.In addition, conduct electrically sets It is standby, in addition to linear motor 47,48, for example, can include on Substrate table PST, for receiving opposing substrate platform PST's The sensor (photomultiplier (Off オ ト マ Le) etc.) of exposure light EL.Or, as electrical equipment, can include for adjusting The various executive components such as such as piezoelectric element of position adjustment of Z-direction and incline direction of integral basis sheet tray PH.In addition, working as When detecting abnormal, all power electrical apparatus to constituting exposure device EX can be stopped, can also stopping electrically being set to a part Available electricity.Herein, when control device CONT detects the exception of recovery action of liquids recovery mechanism 20, for example, stop to example The piezoelectric element for such as being used in linear motor or near 0~150V or the photomultiplier used near 300~900V Electrical equipments such as (sensors) (high voltage installation) is powered, so as to electric leakage can be prevented, suppresses influence of the electric leakage to peripheral device.

In addition, control device CONT is in the exception that the recovery for detecting liquids recovery mechanism 20 is acted, for example, stop using In the driving of the air bearing 42 for making the spigot surface 41A of Substrate table PST opposing substrates base plate 41 non-contactly move.Air bearing 42 have the blow-off outlet 42B of (spigot surface) 41A blow gas (air) and attraction Substrate table PST above opposing substrate base plate 41 The air entry 42A of the gas between (bearing surface) and spigot surface 41A, is produced by the blowout of the gas from blow-off outlet 42B below Bounce and the balance of attraction produced by air entry 42A, keep one between spigot surface 41A below Substrate table PST Fixed gap, but control device CONT is in the exception that the recovery for detecting liquids recovery mechanism 20 is acted, for prevent leakage Liquid 1 flow into (immersion) to air bearing 42 air entry 42A, stop air bearing 42 action, particularly from air entry The air-breathing of 42A.So, liquid 1 can be prevented to be flowed into the vacuum system being connected with air entry 42A, can prevents the inflow of liquid 1 from drawing The generation of the problems such as failure of the vacuum system risen.

In addition, also the jut 65 or adsorption hole 66 that keep substrate P can be set in other component, by other component Absorption is held in the occasion of substrate tray PH, and control device CONT stops from the adsorption hole that other component is kept for adsorbing The air-breathing of (air entry).

In addition, control device CONT drives alarm dress in the exception that the recovery for detecting liquids recovery mechanism 20 is acted Put K.Alarm device K can be used emergency warning lamp, alarm tone, display etc. to send alarm, and so, such as operator can be learnt in exposure There is the leakage or immersion of liquid 1 in device EX.

In addition, when the exception that the recovery for detecting liquids recovery mechanism 20 is acted, dress is reclaimed in control device CONT increases Put 60 liquids recovery amount.Specifically, the vacuum for making retracting device 60 is 70 drive volume (driving force) rising.Retracting device 60 (vacuum is 70) are driven into vibration source, so, in exposure-processed, preferably reduce or prevent the driving of retracting device 60 Power, but when the possibility of the leakage abnormal, that liquid 1 occurs that the recovery for detecting liquids recovery mechanism 20 is acted, control dress Put CONT to rise by making the driving force of retracting device 60, so as to the outside of Substrate table PST (substrate tray PH) can be prevented (at least The outside of recovery port 61) liquid 1 leakage, or prevent leakage expansion.

In addition, during the exposure area near the center to substrate P is exposed, being supplied from liquid feed mechanism 10 Liquid 1 reclaimed by liquids recovery mechanism 20.On the other hand, as shown in Figure 5, carried out by the fringe region to substrate P Exposure-processed, so as to when liquid immersion area AR2 is near the fringe region of substrate P, be continued in projected light by accessory plate 43 Be holding liquid 1 between PL and substrate P, but a part for liquid 1 flows out to the outside of accessory plate 43, the liquid of outflow sometimes 1 recovery port 61 by being configured with liquid absorbing member 62 is reclaimed.Herein, control device CONT starts to drive aforesaid liquid supply Mechanism 10 and liquids recovery mechanism 20, meanwhile, start the action of retracting device 60.Therefore, the liquid 1 for being reclaimed from recovery port 61 leads to The attraction that vacuum is 70 is crossed, is reclaimed by stream 63 and pipeline 68 together with the air of surrounding.In addition, be flowed into substrate P with it is auxiliary The liquid 1 in the gap of plate 43 is helped to be reclaimed by stream 63 and pipeline 68 together with the air of surrounding by liquids recovery hole 64.This When, gas-liquid separator 71 separates the liquid 1 and gas reclaimed from recovery port 61.The gas separate by gas-liquid separator 71 is by drying After device 72 is dried, it is 70 to be flowed into vacuum.So, liquid component can be prevented to be flowed into the problem that vacuum is 70.On the other hand, by The liquids recovery that gas-liquid separator 71 is separate is to liquid recovery part 73.

Now, a part for the liquid 1 supplied from liquid feed mechanism 10 is reclaimed by retracting device 60, so, by liquid The amount of liquid that recovering mechanism 20 is reclaimed is reduced, as a result, the liquids recovery amount measured by the flowmeter 27 of liquids recovery mechanism 20 subtracts It is few.In the occasion, even if liquid 1 is not leaked, control device CONT is likely to the flowmeter according to comparative liquid feed mechanism 10 12 and liquids recovery mechanism 20 flowmeter 27 each measurement result, false judgment liquids recovery mechanism 20 recovery action in Produce abnormal.Therefore, it is provided between the gas-liquid separator 71 and liquid recovery part 73 in retracting device 60 to the liquid of recovery The flowmeter that amount is measured, measurement results and liquid recovery machine of the control device CONT according to the flowmeter of the retracting device 60 The measurement result of the flowmeter 27 of structure 20 obtains the yield of overall liquid, compares the overall liquids recovery amount and liquid obtained The measurement result of the flowmeter 12 of body feed mechanism 10.According to its result of the comparison, control device CONT judges and liquids recovery Whether the liquids recovery action of mechanism 20 produces exception, according to the result that it judges, can carry out stop liquid feed mechanism 10 Liquid supply acts, stops power supply, stop from measures such as the aspiratory actions of air entry.

In addition, when the measured value of the flowmeter for being located at retracting device 60 turn into feasible value set in advance relatively it is superfluous compared with During big value, when control device CONT judges that substantial amounts of liquid 1 flows out to the outside of substrate P, in order to prevent liquid 1 to Substrate table Leakage in the outside of PST (substrate tray PH) etc., prevented also from liquid feed mechanism 10.

The liquid 1 for flowing out to the outside of substrate P is also possible to be immersed from the gap of substrate P and accessory plate 43, reaches substrate P Rear side.The liquid 1 for entering into the rear side of substrate P there is also the adsorption hole (attraction being flowed into for adsorbing holding substrate P Mouthful) 66 possibility.In the occasion, the adsorption hole 66 that substrate tray PH is located to adsorb holding substrate P passes through pipeline 67 It is 74 to be connected to vacuum with pipeline 69, in its way, is provided with gas-liquid separator 75 and the gas to by gas-liquid separator 75 separate The drier 76 being dried.Therefore, even if liquid 1 is flowed into adsorption hole 66, the liquid that will can be also flowed into from adsorption hole 66 1 time Liquid recovery part 73 is received, prevents liquid component to be flowed into the problem that vacuum is 74.

In the occasion that liquid 1 immerses from adsorption hole 66, due to there is the possibility that holding of substrate P etc. is produced, institute With, between pipeline 69 or gas-liquid separator 75 and liquid recovery part 73 configure flowmeter, detected by the flowmeter liquid from The occasion of the immersion of adsorption hole 66, is judged as abnormal situation, implements the stopping of liquid supply action as described above, power supply and stops Only, from least one in the stopping of the air-breathing of air entry.

For the occasion that gas-liquid separator 75 is not provided with the pipeline 69 being connected with adsorption hole 66, when detecting liquids recovery During the exception of the recovery action of mechanism 20 or retracting device 60, in order to prevent liquid 1 to be flowed into adsorption hole (air entry), can also stop Only vacuum is the driving of 74 (attracting system), stops the air-breathing from adsorption hole 66.

As described above, when exception as detecting liquid 1 and leaking or immerse, stopping supplies machine by liquid Structure 10 in substrate P supply liquid 1, so, the leakage of liquid 1 or the expansion of prevent leakage or immersion etc. can be prevented.In addition, i.e. Make such abnormal occasion for occurring is leaked or immersed in liquid 1, by stopping to the linear motor for constituting exposure device EX 47th, the power supply of the electrical equipments such as 48, so as to the expansion of the caused loss of generation and electric leakage of electric leakage can be prevented.In addition, in order to inhale The attached air entry 42A or substrate P for keeping air bearing 42, stops connecting from the vacuum system such as the adsorption hole 66 located at substrate tray PH The air-breathing of logical each air entry, so as to liquid 1 can be prevented to be flowed into the hair of problem as the vacuum system being connected with the air entry It is raw.In addition, when the gas from recovery ozzle 21 or recovery port 61 or the grade suction port withdrawal liquid of adsorption hole 66 and around it, using Gas-liquid separator carries out gas-liquid separation to the liquids and gases sucked from suction port, and with drier to by gas-liquid separator separates Gas afterwards is dried, so as to liquid component (wet gas etc.) can be prevented to be flowed into vacuum system, can reduce liquid to vacuum The influence of system.In addition, this form of implementation is the composition from suction port withdrawal liquid together with the gas around it, but by by The liquids and gases that gas-liquid separator is reclaimed are separated, so as to the amount of liquid of recovery can be measured correctly.

In above-mentioned form of implementation, as the exception that the recovery of liquids recovery mechanism 20 is acted, (moved with the failure that vacuum is 25 Make abnormal) as a example by be illustrated, but in addition to the failure that vacuum is 25, for example, can also include the action of gas-liquid separator 22 It is abnormal.Even if that is, can by reclaim ozzle 21 reclaim substrate P on liquid 1, gas-liquid separator 22 can not be sufficiently separated from Liquid and gas that ozzle 21 is reclaimed are reclaimed, the situation for producing the amount of liquid measured by flowmeter 27 fewer than predetermined value.At this Close, be flowed into the liquid component that vacuum is 25 and increase, so, cause vacuum to be 25 failure etc., therefore, control device CONT stops The only liquid supply action of liquid feed mechanism 10, meanwhile, the liquids recovery of stop liquid recovering mechanism 20 (vacuum is 25) is moved Make, so as to the leakage of liquid 1 can be prevented, and the failure that vacuum is 25 can be prevented.

In this form of implementation, control device CONT controls liquid feed mechanism 10 and liquids recovery mechanism 20 respectively, makes The amount of liquid that must be supplied in substrate P is substantially the same with the liquids recovery amount from substrate P.Therefore, as normally carried out respectively The liquids recovery action of the liquid supply action of liquid feed mechanism 10 and liquids recovery mechanism 20, then the above-mentioned difference obtained is substantially It is zero, above-mentioned feasible value is redefined for less value corresponding to which.On the other hand, for example there is height in the liquid 1 for using Volatile occasion, even if the liquids recovery action point of the liquid supply action of liquid feed mechanism 10 and liquids recovery mechanism 20 Do not carry out normally, liquid 1 volatilizees in substrate P, it is also possible to so that the measurement that the flowmeter 27 of liquids recovery mechanism 20 is obtained Value is smaller than the measured value obtained by the flowmeter 12 of liquid feed mechanism 10.Therefore, control device CONT preferably corresponds to use Liquid 1 (volatility) or substrate P residing for environment, preset above-mentioned feasible value, according to setting feasible value asked with above-mentioned The comparative result of the difference for going out, controls valve 13.

In addition, in above-mentioned form of implementation, liquid quantity delivered and the liquids recovery mechanism 20 of comparative liquid feed mechanism 10 Liquids recovery amount, detect the exception of the circulation status of liquid 1, but also can according only to the quantity delivered of liquid feed mechanism 10 or only Yield according to liquids recovery mechanism 20 detects exception respectively.In addition, being not limited to the flow of liquid, liquid supply is being detected Mechanism 10 or the mechanically or electrically abnormal occasion of liquids recovery mechanism 20, control device CONT can also take stop liquid to supply machine The liquid supply of structure 10 acts, stops power supply, stop from measures such as the aspiratory actions of air entry.

In this form of implementation, the gas around it is also carried out together with liquid 1 reclaiming from ozzle 21 is reclaimed, so, In order to measure more accurate liquids recovery amount, the liquid of recovery is also separated with gas using gas-liquid separator 22, use flowmeter The amount of liquid that 27 measurements are separate.Therefore, the gas-liquid separation ability of gas-liquid separator 22 is it is also possible that the liquid measured by flowmeter 27 The scale of construction changes.Therefore, the gas-liquid separator 22 (gas-liquid separation ability) that control device CONT also corresponds to use sets above-mentioned Feasible value.

In this form of implementation, when the exception that the liquids recovery for detecting liquids recovery mechanism 20 is acted, liquid supply Stopping, the stopping to power electrical apparatus and the stopping of the aspiratory action from air entry of the liquid supply action of mechanism 10 are all Carry out, but can also implement at least any one.

In this form of implementation, from the recovery ozzle 21 of liquids recovery mechanism 20 together with liquid 1 by it around gas Also reclaim, so, in order to press the amount of liquid that the more preferable measurement of precision flowmeter 27 is reclaimed, it is separated into using gas-liquid separator 22 Liquid and gas, but in liquids recovery mechanism 20 from the occasion for reclaiming the only composition of withdrawal liquid 1 of ozzle 21, without gas-liquid separation Device 22 separates liquid and gas, by determining the amount of the liquid for reclaiming, can obtain liquids recovery amount.

But, in this form of implementation, can also form such composition, i.e. when detect liquids recovery mechanism 20 return During the exception of receipts action, the liquid supply action of stop liquid feed mechanism 10 or stops to power electrical apparatus, or stop from The aspiratory action of air entry, but work as Substrate table (movable link) PST and projected light for detecting and can remain substrate P and move When be the exception of the position relationship of PL, implement the stopping of liquid supply action, the stopping of power supply and moved from the air-breathing of air entry In the stopping of work at least any one.Herein, the out-of-the way position relation of Substrate table PST and projection optics system PL is to throw Below shadow optical system PL keep liquid 1 state, the position relationship comprising at least one party in Z-direction and XY directions it is different Often.That is, even if the supply action of liquid feed mechanism 10 and the recovery of liquids recovery mechanism 20 action is normal, for example, Substrate table is worked as It is inclined along XY directions from the desired position relative to projection optics system PL that the action of PST produces abnormal, Substrate table PST to be configured to The position of shifting, can not form well between the occasion, the substrate P for producing in projection optics system PL and being held in Substrate table PST The state (state of liquid 1 can not be kept below projection optics system PL) of the liquid immersion area AR2 of liquid 1.In the occasion, liquid The moving lens 45 that body 1 leaks into the outside of substrate P, the outside of substrate tray PH, or Substrate table PST (substrate tray PH) soak. So, liquids recovery mechanism 20 be due to that can not reclaim the liquid 1 of scheduled volume, so, the flowmeter 27 of liquids recovery mechanism 20 will Control device CONT is arrived in the measurement result output of the value smaller than predetermined value.Measurement knots of the control device CONT according to the flowmeter 27 The exception of the positions of such Substrate table PST such as the detectable leakage that liquid 1 occurs of fruit.Then, control device CONT is in detection To its it is abnormal when, implement stopping, the stopping of power supply and the stopping of aspiratory action from air entry of liquid supply action etc..

In addition, be set as the distance between projection optics system PL and substrate P to be opened by the surface of liquid 1 by liquid immersion area AR2 Power forms the preset distance (0.1mm~1mm or so) of the degree of liquid immersion area AR2, but for example in Substrate table PST on Z axis side To the occasion in position control generation problem, the distance increase of the substrate P on projection optics system PL and Substrate table PST may be produced Life can not keep the situation of liquid 1 below projection optics system PL.In the occasion, liquid 1 leaks into outside or the base of substrate P Outside of pallet PST (substrate tray PH) etc., liquids recovery mechanism 20 can not reclaim the liquid 1 of scheduled volume, liquids recovery mechanism The measurement result output of the value smaller than predetermined value is arrived control device CONT by 20 flowmeter 27.Control device CONT is according to the stream The measurement result of gauge 27, can detect that the leakage of liquid 1 occurs the malposition of such Substrate table PST.Control device CONT detect this it is abnormal when, implement the stopping of liquid supply action, the stopping of power supply and stopping from the aspiratory action of air entry Only etc..

In order to detect the exception of position relationships of the Substrate table PST with respect to projection optics system PL, liquids recovery mechanism is not used The measurement result of 20 flowmeter 27, for example, detected the position in the XY directions of Substrate table PST, according to it by laser interferometer 46 Position testing result, can detect that the exception of position relationship.Control device CONT also may compare the base that laser interferometer 46 is obtained Pallet position testing result and feasible value set in advance, when the platform position testing result of laser interferometer 46 is allowed more than above-mentioned During value, implement stopping of supply action of liquid 1 etc..In addition, also can be the Z axis side of 56 detection Substrate table PST by focus detection To position, compare by (focus) detection of focusing be 56 acquisitions platform position testing result and feasible value set in advance, when poly- When Jiao's detection is that 56 testing result exceedes feasible value, control device CONT implements stopping etc. of the supply action of liquid 1.This Sample, detection knots of the control device CONT according to the Substrate table position detecting device for comprising laser interferometer 46 and focus detection being 56 Really, the exception of the position relationship of detection projection optics system PL and Substrate table PST, when detecting abnormal, implements liquid supply dynamic The stopping of work, the stopping of the power supply of relative electrical equipment and the stopping of aspiratory action from air entry etc..

In addition, can also form such composition, i.e. when laser interferometer 46 makes a mistake, control device CONT stops The liquid supply action of liquid feed mechanism 10.Herein, the erroneous packets of laser interferometer 46 contain due to laser interferometer 46 certainly The failure of body is configured with certain reason such as foreign matter so that can not carry out Substrate table PST's in the light path of the measure light of interferometer The state of position measurement.When laser interferometer 46 makes a mistake, control device CONT can not hold the position of Substrate table PST, Can not be while the position of control base board platform PST.In the occasion, produced in the position relationship of projection optics system PL and Substrate table PST It is abnormal, there is the danger that liquid 1 is leaked and flowed out.Therefore, when laser interferometer 46 makes a mistake, by stopping being supplied by liquid Liquid is supplied to mechanism 10, so as to the problem that liquid 1 is leaked can be prevented.

Equally, the measurement system in the position of the Z-direction for control base board platform PST (focuses on inspection in this form of implementation Survey is the occasion for 56) making a mistake, and exception is produced in the position relationship of projection optics system PL and Substrate table PST, there is liquid 1 The danger of outflow is leaked, so, it is 56 occasions for making a mistake, control device CONT stop liquids supply machine in focus detection The liquid supply action of structure 10.

Substrate table PST (substrate tray PH) is not limited to gather with the exception of the position relationship of the Z-direction of projection optics system PL Jiao's detection is 56, it is possible to use the detection system of the non-optical such as static capacity sensor.

In addition, it is possible to use the image planes of interferometer management projection optics system PL and the position on the surface of Substrate table PST (substrate P) Put relation.The management of the image planes of projection optics system PL and the position relationship on Substrate table PST (substrate P) surface is carried out using interferometer Content e.g., as disclosed in United States Patent (USP) 6,202,964, allowed in the national decree specified by this international application or selected Scope, quote disclosure of which as a part described herein.

In addition, in above-mentioned form of implementation, illustrating to produce abnormal occasion in exposure actions, but do not carry out substrate P Exposure when that abnormal occasion occurs is also identical.

In addition, in above-mentioned form of implementation, when detecting abnormal in being supplied in liquid, the supply of stop liquid, but work as When starting the supply of liquid, even if detecting the abnormal occasion of the position relationship of projection optics system PL and Substrate table PST etc., Also can the supply of stop liquid start.

Below, the 2nd form of implementation of exposure device EX of the invention is illustrated.In the following description, pair with above-mentioned implementation The identical or equal composition part of form uses identical symbol, simplifies or the description thereof will be omitted.In this form of implementation, bag is used Detector containing optical fiber is detected optically by liquid 1 towards the leakage in the outside of substrate P or Substrate table PST (substrate tray PH) etc., when When detecting the leakage or immersion of liquid 1, implementation supplies the action of liquid, the power supply to electrical equipment from liquid feed mechanism 10 Stopping and from least one in the stopping of the aspiratory action of air entry.

Referring to the Cleaning Principle of the detector of the leakage of Fig. 6 and Fig. 7 explanation detection liquid 1.In this form of implementation, Optical fiber is used as detector.Fig. 6 is the signal pie graph of the optical fiber for showing general.In figure 6, optical fiber 80 ' has transmission light Core 81 and the clad section 82 around core 81, with the refractive index smaller than core 81.In optical fiber 80 ', light quilt The core 81 with the refractive index higher than clad section 82 is sealing into be transmitted.

Fig. 7 is the signal pie graph of the optical fiber 80 for showing this form of implementation.In the figure 7, optical fiber 80 is with transmission light Core 81, the optical fiber (unclad fiber) for being not provided with around it clad section.The core 81 of optical fiber 80 has than around it The refractive index nc refractive index na of gas (in this form of implementation be air) high, and with than liquid (in this form of implementation In be pure water) 1 low refractive indexes (na ＜ nc ＜ nw) of refractive index nw.Therefore, the field being full of by air around optical fiber 80 Close, as long as the incidence angle θ of light₀Meet sin θ₀＞ na/nc, then light be sealing into the core 81 with the refractive index nc higher than air Transmitted.That is, from optical fiber 80 penetrate the incident light in end do not produce it is big damply from its light quantity of outgoing end outgoing.Can It is that the occasion on the surface of optical fiber 80 is attached in liquid (pure water) 1, due to being nc ＜ nw, so, at the position for being attached to water, All of incidence angle can not all meet total reflection condition sin θ₀=nw/nc, does not occur entirely at the interface of the liquid 1 and optical fiber 80 Reflection, so, light leaks into outside from the liquid attachment portion of optical fiber 80.Therefore, from the light that the incident-end of optical fiber 80 is incident Light quantity reduced when from the outgoing of outgoing end.Therefore, the optical fiber 80 is set in the precalculated position of exposure device EX, by measurement The light quantity of the outgoing end of the optical fiber 80, so that whether optical fiber 80, i.e. liquid can be attached to by control device CONT detection liquid 1 Whether 1 leak.The refractive index of air is 1 or so, and the refractive index of water is 1.4~1.6 or so, so, core 81 for example preferably by Material (quartz, glass of specific composition etc.) with 1.2 or so refractive index is constituted.

In addition, the attenuation of the light according to the outgoing end outgoing from optical fiber 80, can obtain the liquid 1 for being attached to optical fiber 80 Amount.That is, light decrement depends on the area that liquid 1 is attached to the part of optical fiber, and optical fiber 80 is attached in a small amount of liquid 1 The occasion of surrounding, the attenuation of the light of outgoing end is small, and in the occasion of the attachment of substantial amounts of liquid 1, attenuation is big.Therefore, can examine The area for considering the part of the attachment of liquid 1 depends on liquid leakage amount, so, the light quantity of the outgoing end by measuring optical fiber 80, So as to the leakage rate of liquid 1 can be obtained.In addition, by the measured value of the light quantity of fiber exit end and multiple threshold values set in advance (a reference value) is compared, and in the occasion more than each threshold value, specific signal is sent respectively, so as to scalably detect liquid 1 Leakage rate.

Fig. 8 is the state for showing to be configured at the optical fiber 80 of above-mentioned detector around Substrate table PST (substrate tray PH) Side view, Fig. 9 is plan.As shown in Figure 8 and Figure 9, optical fiber 80 is wound around Substrate table PST (substrate tray PH) Ground configuration.In the incident-end of optical fiber 80, connection can the incident light of opposed optical fibers 80 light projector part 83, in the exit end of optical fiber 80 Portion connection light part 84, the light part 84 can receive in optical fiber 80 transmission, from the light of outgoing end outgoing.Control device The light quantity of the light that CONT is received according to the light quantity of the light that optical fiber 80 is incided from light projector part 83 and by light part 84, obtains The light decay rate of the outgoing end with respect to incident-end of optical fiber 80, according to the result that this is obtained, judges whether liquid 1 is attached to light Whether fine 80, i.e. liquid 1 leak into the outside of Substrate table PST (substrate tray PH).Control device CONT ought judge that liquid 1 is leaked When, realize stopping that the liquid supply carried out by liquid feed mechanism 10 acts, the stopping to the power supply of electrical equipment and from suction Stopping of the aspiratory action of gas port etc..

Optical fiber 80 can be configured to above Substrate table PST (substrate tray PH), particularly around recovery port 61, also may be used In order to check the immersion (immersion liquid) of moving lens 45, be configured to moving lens 45 or its around.

Figure 10 is to show optical fiber 80 to be configured to around the air bearing 42 below Substrate table PST and removable Ground supports the example around the substrate base (substructure member) 41 of Substrate table PST.Optical fiber 80 due to can arbitrarily bend, institute So that any of the easy leakage of the liquid 1 such as Substrate table PST (substrate tray PH), air bearing 42 and substrate base 41 can be wound up into Position ground is installed, and is configured by arbitrary form with can freely arranging.Air bearing 42 is installed on especially by by optical fiber 80 Around, so as to can well detect whether liquid 1 adheres to (leakage) and arrive near air bearing 42, prevent liquid 1 from flowing into advance To the problem of the air entry 42A of air bearing 42.

But, in above-mentioned optical fiber 80, when the distance from incidence end to exit end, it is difficult to determine that liquid 1 is attached sometimes In the position of optical fiber 80, the i.e. leak position of liquid 1.Therefore, as shown in Figure 11, matrix is pressed by by multiple optical fiber 80 Shape carries out 2 dimension configurations, so as to can determine that the leak position of liquid 1.In fig. 11, detector 90 has the 1st optical fiber 80A and the 2nd Optical fiber 80B；1st optical fiber 80A with the 1st direction (Y direction) for length direction, along with the 2nd direction (X-axis of the 1st direction orthogonal Direction) set multiple；2nd optical fiber 80B sets multiple with the 2nd direction as length direction along the 1st direction.These multiples 1, 2nd optical fiber 80A, 80B is configured by rectangular (reticulate).Each incident-end set of the 1st optical fiber 80A of multiple, its Set-dissection Outgoing end with set optical fiber 85A is connected.The incident-end of set optical fiber 85A is connected to light projector part 83A.On the other hand, The outgoing end of the 1st optical fiber 80A of multiple is for example connected to the light part 84A being made up of 1 Vc CD line sensors etc..As much Each incident-end set of individual 2nd optical fiber 80B, its Set-dissection is connected with the outgoing end of set optical fiber 85B.Set optical fiber The incident-end of 85B is connected to light projector part 83B.On the other hand, each outgoing end of the 2nd optical fiber 80B of multiple is for example connected to The light part 84B being made up of 1 Vc CD line sensors etc..

Light from the 83A outgoing of light projector part is branched off into the 1st optical fiber 80A of multiple respectively after along the 85A transmission of set optical fiber. Respectively from the incident light of the incident-end of the 1st optical fiber 80A after the 1st optical fiber 80A transmission, from the outgoing of outgoing end, by light accepting part Divide 84A light.Light part 84A detects light quantity respectively from the light of the outgoing end outgoing of the 1st optical fiber 80A of multiple respectively. Here, as shown in Figure 11, the occasion on the specific 1st optical fiber 80AL in liquid 1 is attached to the 1st optical fiber 80A of multiple, The light quantity of the outgoing end of the 1st optical fiber 80AL declines.Control device CONT is arrived in the light result output of light part 84A.Together Sample, the light from the 83B outgoing of light projector part is branched off into the 2nd optical fiber 80B of multiple respectively after the 85B transmission of set optical fiber.Respectively from The incident light of the incident-end of 2 optical fiber 80B, from the outgoing of outgoing end, is received after the 2nd optical fiber 80B transmission by light part 84B Light.Light part 84B detects the light quantity of the light of each outgoing end outgoing from the 2nd optical fiber 80B of multiple respectively.Herein, as schemed As shown in 11, the occasion on specific 2nd optical fiber 80BL in liquid 1 is attached to the 2nd optical fiber 80B of multiple, in the 2nd light The light quantity of the outgoing end of fine 80BL declines.Control device CONT is arrived in the light result output of light part 84B.Control device Each light results of the CONT according to light part 84A, 84B, it may be determined that (liquid 1 of leakage is relative to be detected for the leak position of liquid 1 Device 90 attachment position) be the 1st optical fiber 80AL and the 2nd optical fiber 80BL near intersections.

Figure 12 is to show to have to be configured to as driving Substrate table by the detector 90 of optical fiber 80A, 80B of rectangular configuration The figure of the example of the linear motor 47 (stator 47A) of the electromagnetic drive source of PST.Linear electrical is configured to by by detector 90 Machine 47, the outside that Substrate table PST is leaked into so as to can determine that, the position of the liquid 1 being attached on linear motor 47.By true The position of the liquid 1 of fixed leakage, so that the removing operation of the liquid 1 that can be leaked by good efficiency.

Liquid 1 be water, remove the leakage liquid (water) occasion, removing operation is carried out by using absolute alcohol (wiping operation), so that water can be well removed, further, since alcohol volatilizees immediately, so, can successfully carry out removing work Industry.

Schematic diagram as shown in figure 13 is like that, attached so as to can determine that by making pulsed light incident from the incident-end of optical fiber 80 The position of the liquid 1 in the surface of optical fiber 80.The occasion on the surface of optical fiber 80 is attached in liquid 1, from the incidence end of optical fiber 80 The incident pulsed light L1 in portion reflects in the attachment position of liquid 1, produces its reflected light L2 to again return to showing for incident-end side As.Therefore, the optical elements such as polarization beam splitter are set in light incident side, guide to light-receiving device by reflected light with optical element Row detection.From testing result, according to pulsed light L1 incide moment of optical fiber 80 and reflected light L2 by incident-end light when The time difference at quarter and the ray velocity transmitted in optical fiber 80, can obtain the distance of incident-end and the attachment position of liquid 1, so that Can determine that the attachment position (leak position of liquid 1) of liquid 1.(the core of optical fiber 80 is corresponded in the ray velocity of the transmission of optical fiber 80 81) formation material produces change, so, can be obtained according to the formation material of the optical fiber 80.

Below, the 3rd form of implementation of exposure device EX of the invention is illustrated.In this form of implementation, when using comprising rib When the detector of mirror (optical element) is detected optically by out the leakage of liquid 1, detects the leakage of liquid 1, implement liquid supply The stopping of liquid supply action of mechanism 10, the power supply of electrical equipment stop and from the stopping of the aspiratory action of air entry At least one.

Referring to the Cleaning Principle of the detector of the leakage of Figure 14 and Figure 15 explanation detection liquid 1.In this form of implementation Middle use prism.Figure 14 is the figure of the signal composition of the detector 100 for being shown with prism.In fig. 14, detector 100 has Prism 101, is installed on the 1st face 101A, the light projector part 102 of the projection light of opposing prism 101 of prism 101, and be installed on prism 101 the 2nd face 101B, receive the light accepting part in the reflected light of the 3rd face 101C of prism 101 from the light of the outgoing of light projector part 102 Divide 103.1st face 101A and the 2nd face 101B substantially turn into right angle.

Prism 101 has a refractive index higher than gas (in this form of implementation be air) around it, and with than Liquid (being pure water in this form of implementation) 1 low refractive index.The occasion being full of by air around prism 101, from light projector The light that part 102 projects the 3rd face 101C is carried out selecting Refractive Index of Glass Prism with being totally reflected by the 3rd face 101C.Therefore, from light-projecting portion Divide the unattenuated many light quantities ground of light of 102 outgoing by the light of light part 103.

Figure 15 is to show that liquid 1 is attached to the figure of the state of the 3rd face 101C of the prism 101 of detector 100.In Figure 15 In, the light of the 3rd face 101C is projected because the presence face of liquid 1 is not totally reflected by the 3rd face 101C from light projector part 102, The light composition of a part (or whole) leaks into outside from the liquid attachment portion of prism 101.Therefore, going out from light projector part 102 The light quantity decay of the light composition of the face 101B of arrival the 2nd in the light penetrated, so, according to the light quantity of light, (light is believed for light part 103 Breath), can detect that whether liquid 1 is attached to the 3rd face 101C of prism 101.Therefore, by the precalculated position of exposure device EX Detector 100 with the prism 101 is set, so as to can detect that liquid 1 is according to the light result of light part 103 by CONT It is no to be attached to whether prism 101, i.e. liquid 1 leak.

Figure 16 is to show putting down for the example being configured to the detector 100 with above-mentioned prism 101 around Substrate table PST Face figure.In figure 16, detector 100 prism 101 the 3rd face 101C towards in the state of upside at predetermined intervals in Substrate table Installed around PST (substrate tray PH) multiple.Control device CONT is incided according to from the light projector part 102 of each detector 100 The light quantity of the light quantity of light during prism 101 and the light received by light part 103, obtains outgoing light quantity relative in prism 101 The attenuation rate of incident light quantity, according to the result that it is obtained, judges whether liquid 1 is attached to whether prism 101, i.e. liquid 1 leak To the outside of Substrate table PST (substrate tray PH).When control device CONT judges that liquid 1 is leaked, implement liquid feed mechanism The stopping of the supply action of 10 liquid, to electrical equipment power supply stopping and the stopping of aspiratory action from air entry etc..

In this form of implementation, each testing results and the detector 100 of the control device CONT according to multiple detectors 100 Installation site information, be readily determined the leak position of liquid 1.In addition, prism 101 is due to smaller, so, can be easily The arbitrary position of exposure device EX is installed to, it is also good that operation is set.

Above-mentioned detector 100 is equally applicable to water-level gauge (liquid level gauge).Figure 17 is to show that the case of liquid (water) 1 can be being housed 110 wall is along multiple the schematic diagrames for installing detector 100 of short transverse (Z-direction) arrangement.The wall of case 110 is transparent, Detector 100 installs the 3rd face 101C of prism 101 with being contacted with the wall of case 110.It is in multiple detectors 100, detect case The detector 100 shown by optical signal than being not detected by liquid 1 of the detector 100 (light part 103) of the liquid 1 in 110 The value low by optical signal of (light part 103), so, each testing results of the control device CONT according to multiple detectors 100 (light result) and the plurality of detector 100 respectively with respect to the installation site information of case 110, the liquid 1 in case 110 can be obtained Liquid level (water level), so, the amount of liquid in case 110 can be obtained.

Figure 18 is to show that will there is the case 110 of the detector 100 for constituting water-level gauge to be applied to the one of liquids recovery mechanism 20 The signal pie graph of partial example.Liquids recovery mechanism shown in Figure 18 20 is had recovery ozzle 21, is connected by recovery tube 24 It is 25 and gas-liquid separator 22 and drier 23 in the way of recovery tube 24 in the vacuum of ozzle 21 is reclaimed.By gas-liquid separation The liquid 1 that device 22 is separate is housed to the case 110 with detector 100 by the 2nd recovery tube 26.That is, in this form of implementation, if Put the flowmeter 27 that case 110 replaces the liquids recovery mechanism 20 of the explanation of reference picture 3.Control is arrived in the testing result output of detector 100 Device CONT processed, control device CONT are obtained by reclaiming the amount of liquid that ozzle 21 is reclaimed according to the testing result of detector 100. Control device CONT passes through to compare the amount of liquid supplied from the amount of liquid for reclaiming the recovery of ozzle 21 and from liquid feed mechanism 10, from And can detect that the exception of the recovery action of liquids recovery mechanism 20.In addition, connecting liquids recovery by pipeline 28A in case 110 Part 28, is provided with valve 28B in the way of pipeline 28A.Control device CONT when case 110 be filled to scheduled volume or its more than when (or regularly) make valve 28B starts, open stream 28A, with the liquid 1 in the collection box 110 of liquids recovery part 28.

In addition, in form of implementation shown in Figure 18, detector 100 is respectively mounted in supply pipe 15 and recovery tube 24.At this In, supply pipe 15 and recovery tube 24 are formed by transparent material respectively, make the detection faces 100c of detector 100 tight in its tube outer surface Contiguity is contacted to earth and installs detector 100.The light result of the light part 103 according to the detector 100 for being installed on supply pipe 15, control Whether the detectable liquid 1 of device CONT processed is passed to supply pipe 15.That is, the occasion phase of supply pipe 15 is not passed to liquid 1 Than, the value by optical signal of the light part 103 of the occasion of circulation diminishes, so, control device CONT is according to light part 103 The detectable liquid 1 of light result whether normally whether be passed to the supply action of supply pipe 15, i.e. liquid feed mechanism 10 Carry out.Equally, control device CONT can according to the light result of the light part 103 of the detector 100 for being installed on recovery tube 24, Detect liquid 1 whether be passed to recovery tube 24, i.e. liquids recovery mechanism 20 recovery action whether normally carry out.So, Detector 100 also is used as being detected optically by whether liquid 1 is passed to supply pipe or the liquid of recovery tube whether there is sensor.

In addition, by the way that the detector 100 with prism 101 to be installed to (light near the front end of such as projection optics system PL Learn the vicinity of element 2), so as to also can be used the detector 100 to detect whether liquid 1 is filled to projection optics system PL and substrate P Between.

In above-mentioned form of implementation, although leakage or the liquid 1 of liquid 1 are detected optically by using optical fiber 80 or prism 101 The presence or absence of ground detected, but also can be used static capacity sensor etc. to be detected in the way of electricity.

In addition, liquid 1 for water occasion, also can by leakage sensor by electricity in the way of detect liquid 1 leakage or The presence or absence of liquid 1, the leakage sensor is made up of 2 electric wires for leaving certain intervals, by having for the conducting between 2 electric wires Leakage without detection liquid 1.In this form of implementation, liquid 1 uses water, so, the leakage sensor of above-mentioned composition can be used. Liquid 1 using ultra-pure water occasion, ultra-pure water due to no electric conductivity, so, it is impossible to by leakage sensor detection liquid 1 Whether there is.In the occasion, such as contain electrolysed substance in advance in 2 coating of electric wire for leaving, then can ultrapure water infiltration when Carve and obtain electric conductivity, so, can be detected as the liquid 1 of ultra-pure water with the leakage sensor of above-mentioned composition.

Certainly the characteristic that above-mentioned each form of implementation can be combined is used.For example, being spread on the periphery of linear motor If optical fiber 80, in Substrate table PST (substrate tray PH) detector 100 of the configuration with prism 101.

In addition, optical fiber or prism can also be not provided with above-mentioned all of position, as long as being arranged as required to Substrate table PST Inside or the executing agency such as photoelectric detector or piezoelectric element vicinity.

In addition, such as reference picture 8~as shown in Figure 10, can be wound up into around Substrate table PST or substrate base 41 week Exclosure configures optical fiber 80, but also the 1st light can be set around Substrate table PST as shown in the side view of Figure 19 (b) certainly Fine 80C, sets the 2nd optical fiber 80D around substrate base 41.In addition, optical fiber 80 (80E) can also be configured located at Substrate table The inside of the recovery port 61 on PST.Same with above-mentioned form of implementation, in Figure 19, Substrate table PST has and surrounds and be held in substrate The accessory plate 43 formed around the substrate P of pallet PH and the recovery port 61 on the outside of it.Accessory plate 43 has located at holding Tabular surface (planar section) 43A of plane roughly the same with the surface of the substrate P around the substrate P of substrate tray PH.It is flat Smooth face 43A is surrounded and ring-type is set as around substrate P.In addition, being provided with recovery port 61 on the outside of accessory plate 43 (tabular surface 43A). Recovery port 61 is the groove portion of the ring-type for being formed with surrounding accessory plate 43 (substrate P).In this form of implementation, in recovery port 61 Side does not configure liquid absorbing member (62).As shown in the plan of Figure 19 (a), optical fiber 80E is along the recovery for being formed as ring-type The all-round configuration of mouth 61.Be provided with the optical fiber 80E of detection the presence or absence of liquid 1 in the inside of recovery port 61, so, even if liquid 1 from Substrate P is leaked, and before the liquid 1 of leakage spreads, the liquid 1 of leakage can be detected by optical fiber 80E.Therefore, control device CONT is taken and is acted using the liquid supply of the stop liquid feed mechanism 10 of valve 13 when optical fiber 80E detects the presence of liquid 1 Etc. adequate measures, so as to the diffusion or the leakage from Substrate table PST of liquid 1 can be prevented.When optical fiber 80E is configured into recovery port During 61 inside, also liquid absorbing member (62) can be configured to the recovery port 61.

In addition, as shown in Figure 19 (b), exposure device EX (bases are respectively arranged in the optical fiber 80 of the presence or absence of detection liquid 1 Pallet PST) multiple precalculated positions occasion, corresponding to the testing result of these multiple optical fiber 80, control device CONT controls The action of exposure device EX.For example, control device CONT corresponds to the optical fiber 80 detected to liquid 1 in multiple optical fiber 80 Position, at least one party's in the stopping of the power supply of the stopping and electrical equipment of the liquid supply of selection liquid feed mechanism 10 Action.

Specifically, control device CONT is when the 1st optical fiber 80C located at Substrate table PST detects the presence of liquid 1, The liquid supply action of stop liquid feed mechanism 10, when the 2nd optical fiber 80D located at substrate base 41 detects depositing for liquid 1 When, stop the power supply to predetermined electrical equipment.Herein, predetermined electrical equipment can be included and drive Substrate table PST's Linear motor 47,48 carries out Anti-vibration unit 9 of vibrationproof supporting etc. to substrate base 41.

When the 1st optical fiber 80C located at Substrate table PST detects the presence of liquid 1, the 2nd optical fiber located at substrate base 41 When 80D is not detected by the presence of liquid 1, control device CONT judges that the liquid 1 of leakage does not feed through to the line for driving Substrate table PST Property motor 47,48 or Anti-vibration unit 9.That is, control device CONT judges that the range of scatter of the liquid 1 of leakage is narrower model Enclose.In the occasion, control device CONT implements the stopping of the liquid supply action of liquid feed mechanism 10, but continues to linear electricity Motivation 47,48 or Anti-vibration unit 9 are powered.On the other hand, when the 2nd optical fiber 80D located at substrate base 41 detects depositing for liquid 1 When, control device CONT judge leakage liquid 1 feed through to linear motor 47,48 or Anti-vibration unit 9.That is, control device CONT judges that the range of scatter of the liquid 1 of leakage is scope wider.In the occasion, control device CONT stop liquids supply machine The liquid supply action of structure 10, meanwhile, stop the power supply of at least one party in linear motor 47,48 and Anti-vibration unit 9.When When 2 optical fiber 80D detect the presence of liquid 1, best control device CONT stops to linear motor 47,48 or Anti-vibration unit 9 Power supply, but do not stop to exposure device EX overall power supply.When stopping to exposure device EX bulk supplies, recovery hereafter is made Industry and stabilisation need the long period.

So, corresponding to the 1st optical fiber 80C of mutually different position and the testing result of the 2nd optical fiber 80D is located at, control The action of exposure device EX, so, adequate measure corresponding with the range of scatter of the liquid 1 of leakage or countermeasure can be taken.Therefore, Resuming operation the required time after the leakage of liquid 1 occurs can be shortened, the reduction of the rate of motion of exposure device EX can be prevented.When When detecting the presence of liquid 1 located at the 1st optical fiber 80C of Substrate table PST, control device CONT stops by liquid feed mechanism 10 Liquid supply is carried out, is continued to power electrical apparatus, so as to the time required for resuming operation or stabilizing can be suppressed to most Small limit.On the other hand, when the 2nd optical fiber 80D located at substrate base 41 detects the presence of liquid 1, control device CONT Stop the power supply to the linear motor 47,48 or Anti-vibration unit 9 for driving Substrate table PST.So, even if leaking into wide scope Liquid spreads, and occurs prevented also from such infringement such as electric leakage or failure.

In addition, control device CONT also corresponds to the amount of the liquid 1 detected by optical fiber 80, control exposure device EX's Action.For example, control device CONT corresponds to the amount of the liquid 1 detected by optical fiber 80, the liquid of selection liquid feed mechanism 10 The action of at least one party of the stopping of body supply action and the stopping of the power supply to electrical equipment.

Specifically, at least one party of the control device CONT in the 1st optical fiber 80C and the 2nd optical fiber 80D detect more than etc. When the liquid 1 of the amount of the 1st a reference value set in advance, the liquid supply of stop liquid feed mechanism 10 action, when detecting More than or equal to the amount of the 2nd a reference value liquid 1 when, stop driving the linear motor 47,48 of Substrate table PST and to substrate base The power supply of the 41 grade electrical equipments of Anti-vibration unit 9 for carrying out vibrationproof supporting.Herein, the 2nd a reference value is bigger than the 1st a reference value Value.

Control device CONT is in the liquid 1 for judging to be detected by least one party in the 1st optical fiber 80C and the 2nd optical fiber 80D Amount more than or equal to the 1st a reference value, less than 2 a reference value when, judge that the amount of liquid 1 for leaking is small amount.In the occasion, control The liquid supply action of device CONT stop liquids feed mechanism 10, continues the confession of linear motor 47,48 and Anti-vibration unit 9 Electricity.On the other hand, when the liquid 1 for judging to be detected by least one party in the 1st optical fiber 80C and the 2nd optical fiber 80D amount more than etc. When 2 a reference value, control device CONT judges that the amount of the liquid 1 of leakage is more amount.In the occasion, control device CONT stops Only liquid feed mechanism 10 liquid supply action, meanwhile, stop in linear motor 47,48 and Anti-vibration unit 9 at least The power supply of one side.When optical fiber 80C, 80D detect the liquid 1 more than or equal to the amount of the 2nd a reference value, best control device CONT Stop the power supply of linear motor 47,48 or Anti-vibration unit 9, but do not stop to exposure device EX overall power supply.Because, When stop to exposure device EX bulk supplies when, hereafter resume operation and stabilisation needs the long period.

So, the amount of the liquid 1 detected by optical fiber 80 can be corresponded to, the action of exposure device EX is controlled, in the occasion, can Take adequate measures corresponding with the amount of the liquid 1 of leakage.It is therefore possible to shorten resuming operation after the leakage generation of liquid 1 The required time, prevent the decline of the operation ratio of exposure device EX.

In above-mentioned form of implementation, 1 optical fiber 80 of configuration around Substrate table PST and substrate base 41 is surrounded, but also may be used Surrounded around Substrate table PST and substrate base 41 by multiple optical fiber.For example, 1 light can respectively be configured on 4 sides of substrate base 41 Fine 80, surrounded around substrate base 41 with 4 optical fiber 80 altogether.So, 1 fiber laser arrays wherein go out the field of liquid 1 Which close, by inquiry optical fiber reaction, so as to be readily determined the leakage place of liquid 1.

In addition, as described above, when the position relationship of projection optics system PL and Substrate table PST becomes exception etc., it is impossible to Liquid 1 is kept below projection optics system PL, the problem of the leakage of liquid 1 is produced.Therefore, in order to prevent the leakage of liquid 1, Can restricting substrate platform PST moving range.Illustrated referring to Figure 20.

In fig. 20, Substrate table PST has as the region LA1 of flat site the 1st, and the 1st region LA1 is included and is held in base Substrate P (or the vacation substrate D P) surface of sheet tray PH and the tabular surface with accessory plate 43 of the substrate P surface in identical faces 43A.In addition, in the position relative with the 1st region LA1, being provided with as the 2nd region LA2 of flat site, the 2nd region LA2 Image planes side front end face (below) 2a comprising projection optics system PL and with this below 2a be in identical faces board member 2P below A part.Herein, liquid 1 is maintained between the 1st tabular surface and the 2nd tabular surface on Substrate table PST, forms liquid immersion area AR2, the 2nd tabular surface includes the front end face 2a of projection optics system PL, relative with above-mentioned 1st tabular surface.Therefore, aforesaid substrate platform The 2nd region LA2 of the 1st region LA1 of PST and front end face 2a relative with the 1st region LA1, comprising projection optics system PL is The region of liquid can be kept.Liquid 1 is held between a part of the 1st region LA1 and the 2nd region LA2, forms liquid immersion area AR2.1st region LA1 and the 2nd region LA2 have to be not necessarily tabular surface, can such as keep liquid 1, then can also have song on surface Face is concavo-convex.

In this form of implementation, the liquid 1 of liquid immersion area AR2 also touches the fore-end for being configured at projection optics system PL Optical element 2 around, the supply ozzle 14 with liquid supply port 14K and the recovery tube with liquids recovery mouthful 21K A part for mouth 21.That is, the 2nd region LA2 of liquid 1 can be kept comprising supply ozzle 14 and the liquid contact surface of ozzle 21 is reclaimed Ground is constituted.

In this form of implementation, control device CONT is limited corresponding to the position relationship of the 1st region LA1 and the 2nd region LA2 The movement of Substrate table PST processed.Specifically, as shown in Figure 20 (a), liquid 1 is being held in the 1st region LA1 and the 2nd area Occasion between the LA2 of domain, the position of the 1st region LA1 and the 2nd region LA2 as shown in liquid 1 being remained into Figure 20 (b) Relation.However, making Substrate table PST than the occasion that position relationship shown in Figure 20 (b) is moved more towards +X direction, liquid immersion area AR2 A part reach more lateral compared with the 1st region LA1, liquid 1 can not be remained to the 1st region LA1 and the 2nd region by generation Situation between LA2.Now, control device CONT judges different in the position relationship generation of the 1st region LA1 and the 2nd region LA2 Often, the movement of restricting substrate platform PST.Specifically, control device CONT stops the movement of Substrate table PST.So, liquid can be prevented The problems such as outflow of body 1.

Herein, control device CONT is judged in the 1st region LA1 and the 2nd area according to the measurement result of laser interferometer 46 Whether the position relationship of domain LA2 produces exception.Control device CONT is detected the XY directions of Substrate table PST by laser interferometer 46 Position, according to the position testing result, obtain relative 2nd region LA2, the 1st region LA1 positional information i.e. the 1st region The position relationship of LA1 and the 2nd region LA2.The information of the size on the 1st region LA1 and the 2nd region LA2 is pre-stored within control Device CONT processed.In addition, the information of the size of liquid immersion area AR2 between on being formed at the 1st region LA1 and the 2nd region LA2 For example obtained in advance by experiment or simulation, be stored in control device CONT.In addition, control device CONT obtain in advance on The exceptional value of the position relationship of the 1st region LA1 and the 2nd region LA2, is stored in control device CONT.Herein, above-mentioned exceptional value It is the value (relative distance) as the position relationship that can not be held in liquid 1 between the 1st region LA1 and the 2nd region LA2, when the 1st When region LA1 exceedes above-mentioned exceptional value with respect to the 2nd region LA2, liquid can not be kept between the 1st region LA1 and the 2nd region LA2 1。

Control device CONT according to the measurement result of laser interferometer 46, in positions of the 1st region LA1 with respect to the 2nd region LA2 Put during more than above-mentioned exceptional value, the movement of limitation (stopping) Substrate table PST.So, the problems such as outflow of liquid 1 can be prevented.

In addition, measurement results of the control device CONT according to laser interferometer 46, when the 1st region LA1 is with respect to the 2nd region When the position of LA2 exceedes above-mentioned exceptional value, can not also stop the movement of Substrate table PST, but change the mobile side of Substrate table PST To.Specifically, in fig. 20, moved towards +X direction by Substrate table PST, when the 2nd region LA2 turns into respect to the 1st region LA1 During the position relationship of exception, control device CONT makes Substrate table PST for example be moved towards -X direction.So, prevented also from liquid 1 The problems such as outflow.

In addition, control device CONT can also form such composition, i.e. in the position of the 1st region LA1 and the 2nd region LA2 When relation produces abnormal, positions of the 1st region LA1 with respect to the 2nd region LA2 to exceed above-mentioned exceptional value, liquid feed mechanism is limited (10) action.Specifically, control device CONT is when the position relationship generation exception in the 1st region LA1 and the 2nd region LA2 When, stop being acted by the liquid supply of liquid feed mechanism (10).So, the problems such as outflow of liquid 1 can be prevented.Or, when When 2nd region LA2 turns into out-of-the way position relation with respect to the 1st region LA1, control device CONT's reductions liquid feed mechanism (10) Liquid quantity delivered (the liquid quantity delivered of time per unit).Or, control device CONT can also form such composition, i.e. when Stop linear motor (47,48) or antihunting device (9) when the position relationship of the 1st region LA1 and the 2nd region LA2 produces abnormal Power supply, or stop from the air-breathing of air entry (42A).

On the other hand, for example after the immersion exposure of substrate P terminates, stop supplying liquid by liquid feed mechanism (10), After the liquid 1 in substrate P on (Substrate table PST) is reclaimed by liquids recovery mechanism (20), in the 1st region LA1 and the 2nd region Liquid 1 is not kept between LA2.In the occasion, control device CONT releases the mobile limitation of Substrate table PST.That is, control device Be limited to for the moving range of Substrate table PST to keep liquid 1 during liquid feed mechanism (10) supply liquid 1 by CONT The 1st scope between the 1st region LA1 and the 2nd region LA2, in the phase of the supply of liquid feed mechanism (10) stop liquid 1 Between, it is limited to the 2nd scope than above-mentioned 1st wide ranges.That is, liquid 1 is being held in projection optics system PL and Substrate table PST The moving range of Substrate table PST is limited to the 1st scope by the occasion between (substrate P), control device CONT, not by liquid 1 The occasion between projection optics system PL and Substrate table PST (substrate P) is held in, is allowed in than the base in the range of the 2nd of the 1st wide ranges the The movement of pallet PST.So, for example in the exposure process of substrate P, can be in projection optics system PL and Substrate table PST (substrate P) Between well persistently keep liquid 1, for example can successfully carry out action hereafter, i.e. Substrate table PST moves to the dress of substrate P Carry the predetermined actions such as the action of unloading position.

Figure 21 is the figure for showing other form of implementation of the invention, and Figure 21 (a) is side view, and Figure 21 (b) is seen from above The plan of Substrate table.In Figure 21 (a), around the optical element 2 of projection optics system PL, setting has liquid supply port The ozzle component 18 of 14K and liquids recovery mouthful 21K.In this form of implementation, ozzle component 18 is at substrate P (Substrate table PST) Top surround the annular component for laterally setting of optical element 2.Gap is provided between ozzle component 18 and optical element 2, From the isolating technique of optical element 2 come by predetermined supporting device support tube nozzle member 18.

Ozzle component 18 is located at the top of substrate P (Substrate table PST), with the liquid being arranged as opposed to the substrate P surface Body supply mouth 14K.In this form of implementation, ozzle component 18 has 2 liquid supply port 14K.Liquid supply port 14K is located at pipe 18a below nozzle member 18.

In addition, ozzle component 18 is located at the top of substrate P (Substrate table PST), with being arranged as opposed to the substrate P surface Liquids recovery mouthful 21K.In this form of implementation, ozzle component 18 has 2 liquids recoveries mouthful 21K.Liquids recovery mouthful 21K sets The 18a below ozzle component 18.

Liquid supply port 14K, 14K are located at everybody of the X-direction both sides of the view field AR1 for clamping projection optics system PL Put, liquids recovery mouthful 21K, 21K are located at respect to the view field AR1 of projection optics system PL compared with liquid supply port 14K, 14K More lateral.The view field AR1 of the projection optics system PL of this form of implementation is set as that by longitudinal direction, X-direction of Y direction be horizontal stroke To the rectangle in plan view.

Below ozzle component 18 (towards the face of substrate P side) the generally planar faces of 18a, (liquid connects below optical element 2 Contacting surface) 2a is also tabular surface, 2a is generally in same level below 18a and optical element 2 below ozzle component 18.This Sample, can well form liquid immersion area AR2 in wide scope.The 2nd region LA2 of liquid 1 can be kept to be turned into below optical element 2 Region below 2a and ozzle component 18 in 18a compared with recovery port 21K insides.

Recess 55 is provided with Substrate table PST, substrate tray PH is configured at recess 55.Recess 55 in Substrate table PST with Above outer 57 turn into be held in the surface of the substrate P of substrate tray PH be substantially the same it is flat as height (same plane) Smooth face (flat).The 1st region LA1 of liquid 1 can be kept turns into 57 region comprising substrate P surface and above.

As shown in Figure 21 (b), orthogonal 2 edge parts of Substrate table PST rectangular in plan view Moving lens 45 are put in distribution.In addition, on Substrate table PST, reference feature 300 to be configured to the precalculated position in the outside of substrate P. Reference feature 300, the substrate set not shown in figure by predetermined position relationship harmonize reference mark PFM that system detects and It is the reference mark MFM for detecting to be harmonized by mask.Harmonized in system in the substrate of this form of implementation, for example with being disclosed in Japan FIA (field picture adjustment) mode as Unexamined Patent 4-65603 publications, the FIA modes make Substrate table PST static, in the future The illuminations such as the white light from Halogen lamp LED on mark, by mark of the photographing element in the predetermined shooting visual field to obtaining Image imaged, by image procossing to mark position measure.In addition, in the mark adjustment system of this form of implementation In, for example with VRA (the graticule adjustment directly perceived) mode as being disclosed in Japanese Unexamined Patent Publication 7-176468 publications, should VRA modes light shine mark, and the marked image data to being obtained by the shooting such as ccd video camera carries out image procossing, detects Mark position.Above reference feature 300 301A substantially turn into tabular surface, located at the substrate P surface for being held in Substrate table PST Height (same plane) is substantially the same with above Substrate table PST 57.301A can be played as focusing above reference feature 300 Detection is the effect of 56 datum level.

In addition, substrate is harmonized, system also detects the alignment mark AM being formed in substrate P.As shown in Figure 21 (b), Formation multiple exposure area S1~S24 in substrate P, alignment mark AM set corresponding to multiple exposure area S1~S24 in substrate P Put multiple.

In addition, on Substrate table PST, precalculated position on the outside of substrate P configured e.g., as disclosed in Japanese Unexamined Patent Application 57- Uneven illumination sensor 400 as No. 117238 publications is used as measurement sensor.Uneven illumination sensor 400 has Upper plate 401 rectangular in plan view.401A substantially turns into tabular surface above upper plate 401, is protected located at by Substrate table PST 57 are substantially the same height (same plane) above the substrate P surface held and Substrate table PST.401A sets above upper plate 401 There is the pin hole part 470 of permeable light.Covered by the light-proofness such as chromium material beyond the pin hole part 470 in 401A above.

In addition, on Substrate table PST, precalculated position on the outside of substrate P, set e.g., as disclosed in Japanese Unexamined Patent Publication 2002- Spatial image measurement sensor 500 is used as measurement sensor as No. 14005 publications.Spatial image measurement sensor 500 With rectangular upper plate 501 in plan view.Above upper plate 501 501A substantially turn into tabular surface, located at be held in 57 are substantially the same height (the same face) above the substrate P surface of Substrate table PST and Substrate table PST.Above upper plate 501 501A is provided with can be by the slit section 570 of light.Covered by the screening property material such as chromium beyond the slit section 570 in 501A above.

In addition, on Substrate table PST, also being provided with being irradiated e.g., as disclosed in as Japanese Unexamined Patent Publication 11-16816 publications Quantity sensor (illuminance transducer) 600,601A is located at and is held in substrate above the upper plate 601 of the irradiation quantity sensor 600 57 are substantially the same height (same plane) above the substrate P surface of platform PST or Substrate table PST.

In addition, in the side of Substrate table PST, setting water guide pipe component 89 with surrounding Substrate table PST.Water guide pipe component 89 The liquid 1 that recyclable (can keep) spills from substrate P or on Substrate table PST, (tabular surface) 57 above Substrate table PST Outside.In addition, being configured with the optical fiber 80 of the presence or absence of detectable liquid 1 in the inside of the water guide pipe component 89.When aqueduct structure When the optical fiber 80 of part 89 detects the presence of liquid 1, control device CONT takes stop liquid in the same manner as above-mentioned form of implementation The adequate measures such as the liquid supply action of feed mechanism (10).

In this form of implementation, liquid immersion area AR2 is formed in substrate P certainly when being exposed to substrate P, work as measurement base For example during the reference mark MFM of quasi- component 300, when measuring treatment using sensor 400,500,600, also respectively in upper plate 301st, liquid immersion area AR2 is formed on 401,501,601.Then, the measurement processing by liquid 1 is carried out.For example, when by liquid It is in the 1st region LA1, comprising reference feature 300 when reference mark MFM in 1 pair of such as reference feature 300 is measured The region of 301A is relative with the 2nd region LA2 above, hydraulically full between a part and the 2nd region LA2 of the 1st region LA1 1.When the measurement processing by liquid 1 is carried out using uneven illumination sensor 400, in the 1st region LA1 comprising upper plate 401 Above 401A region it is relative with the 2nd region LA2, between a part and the 2nd region LA2 of the 1st region LA1 be full of liquid Body 1.Equally, when the measurement processing by liquid 1 is carried out using sensor 500,600, in the 1st region LA1 comprising upper plate 501st, the region of 501A, 601A is relative with the 2nd region LA2 above 601, in a part and the 2nd region of the 1st region LA1 Hydraulically full 1 between LA2.

In order on Substrate table PST (on the 1st region LA1) formed liquid immersion area AR2 and by liquid feed mechanism (10) During supply liquid 1, the moving range of Substrate table PST is restricted to the 1st scope SR1 shown in Figure 21 (b) by control device CONT. In Figure 21 (b), symbol LA2a shows the most+Y during the 2nd region LA2 is configured to the 1st region LA1 in the scope that can keep liquid 1 Position when side and most-X sides.Herein, in Figure 21 (b), for the purpose of simplifying the description, the optical axis AX of projection optics system PL is illustrated (the 2nd region LA2) opposing substrate platform PST (the 1st region LA1) mobile occasion.Equally, symbol LA2b shows that the 2nd region LA2 matches somebody with somebody Put to position when the most+Y sides in the 1st region LA1 and most+X sides.2nd region LA2c shows that the 2nd region LA2 is configured to the 1st area Position during most-Y sides and most+X sides in the LA1 of domain.Symbol LA2d show the 2nd region LA2 be configured in the 1st region LA1 most- Position when Y sides and most-X sides.

Connect the inner side at each center (herein, the optical axis AX of projection optics system PL) of each 2nd region LA2a~LA2d Region is the 1st scope SR1.So, during liquid feed mechanism (10) supply liquid 1, by by the mobile model of Substrate table PST Enclose and be limited to the 1st scope SR1, so as to liquid 1 can be held between the 1st region LA1 and the 2nd region LA2 often, prevent liquid 1 the problems such as spilling.

On the other hand, during liquid feed mechanism (10) does not supply liquid 1, control device CONT is by Substrate table PST's Moving range is limited to 2nd scope SR2 more broader than the 1st scope SR1.Herein, the 1st scope SR1 is contained in the 2nd scope SR2. So, during the supply of liquid feed mechanism (10) stop liquid 1, by being limited to wider than above-mentioned 1st scope SR1 2 scope SR2, so that can successfully carry out Substrate table PST moves to predetermined dynamic such as the action of loading and unloading position of substrate P Make.

More than, specifically understand each form of implementation of the invention, but in the present invention, when by the control located at exposure device When device detects abnormal, control device controls appropriate mechanism or the device of exposure device, prevents leak etc. caused in advance Electric leakage, leak attraction etc..Herein, the block diagram of Figure 23 is set shown in the abnormal detection position of detection, control device and by controlling The relation by control section of device control.The control device of exposure device and the various detection means inside exposure device Connection, these detection means as described above for example with good grounds supply side flowmeter or reclaim effluent gauge independent or its flow Difference detects the abnormal supply side/recovery effluent gauge of exception (liquid communication), measures the platform position of Substrate table with monitor station The platform interferometer of malposition (thus causing leak to occur), detect Substrate table focus state, detection put into effect malposition (by This causes leak to occur) focus detection system, detect the leak for being attached to the optical fiber or prism that are located at Substrate table or bedplate The leakage detector 700,701 of (exception), and the various inspections such as the abnormal water-level gauge of water level detecting yield according to collection box Survey system.Control device can receive abnormal signal from these detection systems.Now, the more predetermined reference signal of control device with from each The signal that detector is received, can determine that it is signal for normal signal or exception.

The control device of exposure device also manufactures dress with the various relevant apparatus such as liquid (pure water) outside exposure device Put, the connection such as liquid (pure water) temperature-adjusting device, developing apparatus, base board delivery device, can receive and notify these relevant apparatus Abnormal signal.In addition, the control device of exposure device can also receive notify be provided with exposure device workshop it is abnormal Signal.In addition, there is provided the exception in workshop of exposure device etc. can include the exception of the toilet for being configured with exposure device, supply It is given to exception, earthquake or fire of the capacity of the pure water or electric power of exposure device etc. etc..Control device also may compare predetermined base Calibration signal and the signal received from each relevant apparatus, judge the signal as normal signal or exception.

The control device of exposure device can also as described above as the explanation of each form of implementation with controlled device, such as liquid Feed mechanism, liquids recovery mechanism, table apparatus, particularly platform air bearing, platform linear motor, substrate tray absorption system, light The various part connections such as sensor, Anti-vibration unit, the executing agencies such as electric multiplier tube (Off オ ト マ Le), can receive notice each The abnormal signal of part.In addition, in the occasion of the sensor not used for detection earthquake,

Control device can also receive abnormal signal from the seismic sensor.In addition, with the quality for determining liquid 1 The occasion of the water quality sensor of (ratio of the impurity such as temperature, dissolved oxygen concentration, organic matter), abnormal letter can be also received from the water quality Number.

Below, reference picture 24 simplys illustrate the control action of control device.Inspection of the control device from inside exposure device The grade of relevant apparatus 1~4 reception for surveying the outside of system or exposure device shows abnormal signal.Show that abnormal signal is for example, right The circulation that the liquid of (and then recovery) is supplied for immersion exposure produces the signal of influence.Now, control device also may compare The signal and reference signal for receiving, judge that the signal for receiving is abnormal signal.Then, control device is true according to abnormal signal Surely abnormal position is generated.Now, control device also can send alarm by alarm device.Then, control device is different with generation Normal position correspondingly judges which device should be controlled, and control signal is sent into the device, and abnormal situation is taken measures.Example Such as, the occasion of liquid leakage is being detected by the leakage detector (optical fiber etc.) located at Substrate table, control device is corresponding to detection Signal stop respectively to carried out by liquid feed mechanism liquid supply, by platform control system carry out platform movement, by platform air axle Hold with the substrate tray absorption air-breathing that carries out of system and platform linear motor, substrate tray absorption system, sensor, Anti-vibration unit, hold The power supply of row mechanism, on the other hand, can the liquids recovery of Jin Shi liquids recoveries mechanism proceed.Stop the dynamic of which device Make, judged according to the place of liquid leakage and its degree (size of signal) by control device.According to the big of detection signal It is small, the electrical equipments such as platform linear motor or sensor is worked on, can only stop liquid feed mechanism action.

As described above, the liquid 1 of this form of implementation uses pure water.Pure water is easily largely obtained in semiconductor manufacturing plant etc. , meanwhile, with not to the dysgenic advantage of generation such as photoresist and optical element (lens) in substrate P.In addition, pure water Harmful effect to environment is few, and the amount of impurity is extremely low, so, surface also with cleaning base plate P and located at projection The effect on the surface of the optical element of the front end face of optical system PL.

In addition, refractive index n generally 1.44 of the pure water (water) to the exposure light EL of wavelength 193nm or so, so, make With ArF excimer lasers (wavelength 193nm) as the light source of exposure light EL occasion, short wavelength turns in substrate P 1/n, i.e. about 134nm, can obtain high-resolution.Further, since depth of focus expands about n times compared with atmosphere, i.e., about 1.44 times, So, as long as ensuring the occasion with the depth of focus of the occasion same degree for using in atmosphere, can further increase projection The numerical aperture of optical system PL, thus improves also resolution.

In this form of implementation, optical element 2 is installed on the front end of projection optics system PL, but be installed on projection optics system The optical element of PL front ends is alternatively the light of the optical characteristics such as aberration (spherical aberration, coma etc.) for adjusting projection optics system PL Plate is learned, or is the planopaallel plate of transmissive exposure light EL.In addition, making the optical element contacted with liquid 1 be more honest and cleaner than lens The planopaallel plate of valency, so, even if having when transport, assembling in exposure device EX, adjustment etc. causing projection optics system PL's (for example silicon systems are organic for the material that transmissivity, the illumination of exposure light EL in substrate P and the uniformity of Illumination Distribution decline Thing etc.) be attached to its planopaallel plate, it is only necessary to the planopaallel plate was changed before it will supply liquid 1, compared to liquid The optical element of the contact of body 1 is the occasion of lens, has the advantages that the reduction of its replacement cost.That is, the irradiation of exposure light EL from The surface contamination of the optical element that attachment of impurity in disperse particle or liquid 1 that photoresist is produced etc. will be contacted with liquid 1, It is therefore desirable to the optical element is regularly changed, but by making the optical element be cheap planopaallel plate, so that and lens Compare, change the low cost of part, and the time required for changing can be shortened, the upper of maintenance cost (operating cost) can be suppressed Rise and process the decline of energy.

The liquid 1 of this form of implementation is water, but is alternatively the liquid beyond water, and for example the light source in exposure light EL is F₂ The occasion of laser, due to the F₂Laser is not through water, so, in the occasion, as liquid 1, transmissive F can be used₂The example of laser Such as fluorine system is oily or crosses the liquid of fluorinated polyester (PFPE) fluorine system.In addition, as liquid 1, it is possible to use exposure light EL is deposited In transmittance, refractive index as high as possible, relative projection optics system PL and the liquid of the photoresist stabilization for being coated on substrate P surface (such as cedar oil).

In above-mentioned each form of implementation, the shape of above-mentioned ozzle is not particularly limited, for example also can be on view field AR1's Side long is carried out the supply or recovery of liquid 1 by 2 pairs of ozzles.And, in the occasion, liquid can be all carried out from +X direction or -X direction 1 supply and recovery, so, can also configure supply ozzle with vertically arranging and reclaim ozzle.

As the substrate P of above-mentioned each form of implementation, the not only semiconductor wafer of applicable semiconductor devices manufacture, and Also the glass substrate of applicable display device, the ceramic wafers of film magnetic head or the mask or mark that are used in exposure device Master (synthetic quartz, silicon wafer) of line piece etc..

In addition, in above-mentioned each form of implementation, using the exposure being partly full of by liquid between projection optics system PL and substrate P Electro-optical device, but the platform movement the present invention may also apply to the substrate that makes to remain exposure object in liquid bath immersion exposure dress Put, or the liquid tank of desired depth is formed on platform, the liquid immersion exposure apparatus of substrate are kept wherein.Make to remain in liquid bath The construction and exposure actions of the liquid immersion exposure apparatus of the platform movement of the substrate of exposure object are for example recorded in Japanese Unexamined Patent Publication in detail Flat 6-124873 publications, in addition, forming the liquid tank of desired depth on platform, keep the liquid immersion exposure apparatus of substrate wherein Construction and exposure actions be for example recorded in Japanese Unexamined Patent Publication 10-303114 publications or United States Patent (USP) 5 in detail, 825,043, As long as this international application is specified or the national decree of selection is allowed, the content that these documents are recorded is cited as recording herein A part.

As exposure device EX, except synchronizing moving mask M and substrate P, the figure to mask M are scanned dividing for exposure Walk the scanning exposure apparatus (step-scan exposure device) of scan mode outward, be equally applicable to make mask M and substrate P static In the state of the figure of mask M be exposed together, make the projection exposure of the mobile Step-and-repeat mode of substrate P substep successively Device (stepping exposure device).In addition, being turned the present invention may also apply to 2 figures that partly at least overlapped in substrate P The exposure device of the substep suture way of print.

In addition, the present invention may also apply to the exposure device of dual stage type, the exposure device of the dual stage type has 2 platforms, and this 2 Individual platform can load respectively the processed substrate such as chip towards XY it is directionally independent it is mobile.The construction of the exposure device of dual stage type and exposure Action e.g., as disclosed in Japanese Unexamined Patent Publication 10-163099 and Japanese Unexamined Patent Publication 10-214783 (with United States Patent (USP) 6,341, 007th, 6,400,441,6,549,269 and 6,590,634 correspondence), Japanese Unexamined Patent Application Publication 2000-505958 (with United States Patent (USP) 5, 969,441 correspondences) or United States Patent (USP) 6,208,407, as long as this international application is specified or the national decree of selection is allowed, these The content that document is recorded is cited as a part described herein.

In addition, as being disclosed in Japanese Unexamined Patent Publication 11-135400 publications, present invention can be suitably applied to Substrate table and The exposure device of test desk, the Substrate table keeps substrate P, and the test desk has various measurement component or sensors etc..At this Close, above the projection optics system and test desk between can keep liquid, can implement above-mentioned water leak detectors etc. in the test desk Countermeasure.

As the species of exposure device EX, it is not limited to use the semiconductor manufacturing of semiconductor element graph exposure to substrate P Exposure device, also can widely be adapted to liquid crystal display cells manufacture use or display manufacturing exposure device, for making Make exposure device of film magnetic head, photographing element (CCD) or graticule or mask etc. etc..

Substrate table PST or mask platform MST using linear motor occasion, using air bearing air levitation and Using any all usable in the magnetic suspension type of Lorentz force or reactance force.In addition, each PST, MST can be along guiding structure Part movement type, or be not provided with ways without ways type.The example of linear motor is used in platform, it is public Open in United States Patent (USP) 5,623,853 and 5,528,118, as long as this international application is specified or the national decree of selection is allowed, this The content that a little documents are recorded is cited as a part described herein.

As each drive mechanism of PST, MST, it is possible to use planar motor, the planar motor makes 2 dimensions configure magnetic The magnet unit of iron is relative with the armature unit of 2 dimension ground configuration coils, and each PST, MST are driven by electromagnetic force.In the occasion, only Either one in magnet unit and armature unit is connected to platform PST, MST, the opposing party by magnet unit and armature unit Located at the mobile surface side of platform PST, MST.

Rack component machine is used by the counter-force of the mobile generation of Substrate table PST in which can also be not delivered to projection optics system PL Escape into floor (the earth) tool.The processing method of the counter-force is for example disclosed in detail in the (Japanese Unexamined Patent Publication of United States Patent (USP) 5,528,118 Flat 8-166475 publications), as long as this international application is specified or the national decree of selection is allowed, the content that these documents are recorded It is cited as a part described herein.

The counter-force of the mobile generation of Substrate table PST uses rack component mechanically with being also not delivered to projection optics system PL Escape into floor (the earth).The processing method of the counter-force is for example disclosed in detail in (the Japanese Unexamined Patent Publication 8- of United States Patent (USP) 5,874,820 No. 330224 publications), as long as this international application is specified or the national decree of selection is allowed, the content that these documents are recorded is drawn It is used as a part described herein.

The exposure device EX of the form of implementation of the application is by keeping predetermined mechanical precision, electric precision, optical accuracy ground Assemble each subsystem comprising each inscape cited by the application claim and manufacture.In order to ensure these various essences Degree, before and after the assembling, the adjustment for reaching optical accuracy is carried out to various optical systems, to it is various machinery system carry out for The adjustment of mechanical precision is reached, various electric systems are carried out with the adjustment for reaching electric precision.Filled to exposure from each subsystem Distribution connection of the assembling procedure put comprising the mutual mechanical connection of each subsystem, circuit, pipe arrangement connection of pneumatic circuit etc.. This from each subsystem before the assembling procedure of exposure device, there certainly exist each subsystem assembling procedure respectively.One Each subsystem of denier terminates in the assembling procedure of exposure device, then carry out structure adjusting, it is ensured that used as each of exposure device entirety Plant precision.The toilet that the manufacture of exposure device is preferably managed in temperature and cleanliness factor etc. is carried out.

The micro element of semiconductor devices etc. as shown in Figure 12, through carrying out micro element functional performance design step 201st, step 202, the manufacture of the mask based on design step are made as the step 203 of the substrate of the base material of device, by above-mentioned implementation The exposure device EX of form is by exposure-processed step 204, the device assembling step of the graph exposure of mask to substrate (comprising cutting work Sequence, bonding process, packaging process) 205, detection step 206 etc. manufactured.

The possibility utilized in industry

According to the present invention, the interior arrangement of the exposure device that influence is produced on immersion exposure or the related dress of outside are can detect The exception put, can suppress or reduce the leakage or immersion of the liquid of exposure to peripheral device component or the shadow of exposure actions Ring, so, the good state of expensive exposure device can be maintained, carry out the immersion exposure treatment of good accuracy.So, can make Make the device with desired performance.

Claims (13)

1. a kind of exposure device, uses up so that the base plate exposure, it is characterised in that possess through liquid to substrate irradiation exposure：

Projection optical system, will be as passing through liquid shadow-mark；

Movable link, supports the substrate and movement；

Liquid organization of supply, from the top of the movable link through supply opening to supplying liquid under the projection optical system；And

Liquids recovery mechanism, reclaims the liquid of the supply through suction port from the top of the movable link with the gases；

There is collecting to be housed in this from the groove and detection of suction port recovery and the liquid for gas separate for the liquids recovery mechanism The detector of the amount of the liquid of groove.

2. exposure device as claimed in claim 1, wherein, the stream for making liquid be flowed from the groove is connected with the bottom of the groove Road；

When the groove contains the liquid of more than given amount, being located at the valve start of the stream opens the stream.

3. a kind of exposure device, uses up so that the base plate exposure, it is characterised in that possess through liquid to substrate irradiation exposure：

Projection optical system, by pattern image through on the liquid shadow-mark to the substrate；

Suction port, is communicated in attraction system；

Separator, the liquid sucked from the suction port is separated with gas；And

Drier, dries the gas after being separated by the separator.

4. exposure device as claimed in claim 3, wherein, the attraction system is flowed into the dried gas of the drier.

5. exposure device as claimed in claim 3, wherein, the suction port is set for withdrawal liquid.

6. exposure device as claimed in claim 3, it possesses：

Liquid organization of supply, to supplying liquid under the projection optical system；And

Liquids recovery mechanism, possesses suction port, reclaims the liquid of the supply.

7. exposure device as claimed in claim 6, wherein, the liquid organization of supply stops to the throwing when exception is detected Liquid supply under shadow optical system.

8. exposure device as claimed in claim 7, wherein, this extremely the recovery comprising the liquids recovery mechanism act it is different Often.

9. exposure device as claimed in claim 6, wherein, the liquids recovery mechanism has the liquid that will be reclaimed from the suction port The separator for gas separate and the recovery tube that the separator is connected with the attraction system；

The drier is located at the recovery tube.

10. exposure device as claimed in claim 6, wherein, the liquids recovery mechanism has the liquid that will be reclaimed from the suction port The flowmeter of the amount of the liquid that the separator and measurement that body with gas separate with the separator separate.

11. exposure devices as claimed in claim 3, it possesses movable link, and the movable link possesses suction port, supports the base Plate is simultaneously mobile.

12. exposure devices as claimed in claim 11, wherein, around the substrate supported from the movable link and the substrate Above gap flow into liquid be recovered from the suction port.

A kind of 13. device making methods, base plate exposure is made comprising the exposure device any one of usage right requirement 1 to 12 Action.