CN106444110A - 基板支撑杆以及涂覆防静电液的方法 - Google Patents

基板支撑杆以及涂覆防静电液的方法 Download PDF

Info

Publication number
CN106444110A
CN106444110A CN201611032498.5A CN201611032498A CN106444110A CN 106444110 A CN106444110 A CN 106444110A CN 201611032498 A CN201611032498 A CN 201611032498A CN 106444110 A CN106444110 A CN 106444110A
Authority
CN
China
Prior art keywords
support bar
bracing piece
static liquid
inner bracing
outer support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201611032498.5A
Other languages
English (en)
Other versions
CN106444110B (zh
Inventor
金宇
黄文同
张玉虎
刘小波
苏琦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei BOE Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei BOE Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Hefei BOE Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to CN201611032498.5A priority Critical patent/CN106444110B/zh
Publication of CN106444110A publication Critical patent/CN106444110A/zh
Priority to US15/801,464 priority patent/US10692746B2/en
Application granted granted Critical
Publication of CN106444110B publication Critical patent/CN106444110B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B05C1/0813—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line characterised by means for supplying liquid or other fluent material to the roller
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B05C1/0821—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line characterised by driving means for rollers or work
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

本发明涉及一种基板支撑杆，包括：外支撑杆，其为一表面开口的盒体结构；内支撑杆，容置于外支撑杆内，具有用于支撑基板的支撑面；用于控制内支撑杆做升降运动以使得内支撑杆在第一状态和第二状态之间变化的升降结构，升降结构包括一穿过外支撑杆的底部以支撑内支撑杆的连接杆；防静电液涂覆结构，用于在内支撑杆位于第一状态时，在内支撑杆上涂覆防静电液；其中，第一状态为内支撑杆完全位于外支撑杆内部，第二状态为内支撑杆的支撑面与外支撑杆的具有开口的表面平齐。本发明还涉及一种涂覆防静电液的方法。实现防静电液的自动涂覆，防止涂覆防静电液时对基板等的污染、且避免人身危害。

Description

基板支撑杆以及涂覆防静电液的方法
技术领域
本发明涉及液晶产品制作技术领域，尤其涉及一种基板支撑杆以及涂覆防静电液的方法。
背景技术
在TFT-LCD(薄膜晶体管液晶显示器)领域的工艺制程中，曝光机主要是将掩膜版上的膜层进行对位并曝光在涂胶后的玻璃基板上，玻璃基板是通过基台进行承载，而Liftbar(支撑杆)主要起的作用是：Loading(装载)基板时，Lift bar升起，接收Robot arm(机器人手臂)送入曝光机内的基板，再降至基台表面，将基板均匀放置在基台表面上；Unloading(卸载)基板时，Lift bar升起，待Robot arm将基板取走后，等待下一片基板送入继续接收。
ESD(静电释放)一直是LCD(液晶显示器)和半导体产业中的顽敌，曝光机在Unloading基板时，Lift bar将基板顶起与基台表面分离的瞬间，基台与基板之间会产生瞬时高压静电，将膜层击穿烧毁，从而产生ESD不良，随着设备老化，Lift bar磨损，这种不良会越来越严重。而通过在Lift bar表面涂覆防静电液，可以有效的防止ESD高发。目前使用的方法是在Lift bar表面手动涂覆防静电液，而这种方式不仅难以均匀全面的涂覆，使除静电能力变差，还存在很多风险。
发明内容
为了解决上述技术问题，本发明提供一种基板支撑杆及涂覆防静电液的方法，实现防静电液的自动涂覆。
为了达到上述目的，本发明采用的技术方案是：一种基板支撑杆，包括：
外支撑杆，其为一表面开口的盒体结构；
内支撑杆，容置于所述外支撑杆内，具有用于支撑基板的支撑面；
用于控制所述内支撑杆做升降运动以使得所述内支撑杆在第一状态和第二状态之间变化的升降结构；
防静电液涂覆结构，用于在所述内支撑杆位于所述第一状态时，在所述内支撑杆上涂覆防静电液；
其中，所述第一状态为所述内支撑杆完全位于所述外支撑杆内部，所述第二状态为所述内支撑杆的所述支撑面与所述外支撑杆的具有开口的表面平齐。
进一步的，所述内支撑杆的边缘与所述外支撑杆之间具有缝隙。
进一步的，所述内支撑杆上设置有多个供防静电液通过的通孔；所述防静电液涂覆结构包括：固定于所述外支撑杆底部的防静电液供给结构；
用于将所述防静电液供给结构提供的防静电液输送至所述支撑面上的、数量与所述通孔对应的多个连接管，每个所述连接管的一端与所述防静电液供给结构连通，另一端与所述内支撑杆上的相应的通孔连通。
进一步的，所述连接管为可弯折的弹性软管。
进一步的，还包括防静电液回收结构，固定于所述外支撑杆上与所述开口相对设置的表面，并通过管道与所述外支撑杆内部连通。
进一步的，还包括辊轮，所述外支撑杆的中部设置用于固定所述辊轮的第一卡槽，在所述外支撑杆的长度方向的、所述第一卡槽的相对的两侧分别设置所述内支撑杆，所述外支撑杆沿其长度方向的、相对的两内侧壁上向内凹设有第二卡槽；
在所述第一状态下，所述辊轮从所述第一卡槽移动至所述第二卡槽、并能够沿着所述第二卡槽移动以使得所述辊轮在相应的所述内支撑杆上的所述支撑面上移动。
进一步的，所述第二卡槽靠近所述外支撑杆底部的第一侧壁与所述第一卡槽连接处为弧面。
进一步的，所述第一卡槽的开口处可拆卸的设有盖板，所述盖板的表面与所述外支撑杆的具有开口的表面平齐。
进一步的，所述盖板上设有用于吸附基板的真空吸附盘。
进一步的，所述升降结构包括升降气缸。
进一步的，还包括用于控制所述升降结构运动以及控制所述防静电液涂覆结构涂覆预设量的防静电液的PLC控制结构。
进一步的，还包括用于控制所述外支撑杆移动至预设位置以承接基板的移动结构。
进一步的，所述移动结构包括设置于所述外支撑杆上与所述开口相对的表面的联动杆，以及用于驱动所述联动杆运动的驱动轴。
本发明还提供一种涂覆防静电液的方法，应用于上述所述的基板支撑杆，包括：
升降结构控制内支撑杆下降预设距离，以使得内支撑杆完全位于外支撑杆的内部；
防静电液涂覆结构在内支撑杆上涂覆防静电液。
进一步的，所述防静电液涂覆结构在内支撑杆上涂覆防静电液的步骤具体包括：
防静电液供给结构内的防静电液通过内支撑杆上的通孔喷涂于内支撑杆的支撑面上；
辊轮从第一卡槽移动至第二卡槽、并沿着第二卡槽移动以使得辊轮在相应的所述内支撑杆上的所述支撑面上移动，使得防静电液完全覆盖于内支撑杆的支撑面上。
本发明的有益效果是：实现防静电液的自动涂覆，防止涂覆防静电液时对基板等的污染、且避免人身危害。
附图说明
图1表示本发明实施例中基板支撑杆结构示意图；
图2表示本发明实施例中基板支撑杆截面图；
图3表示本发明实施例中内支撑杆位于第一状态结构示意图；
图4表示本发明实施例中辊轮结构示意图。
具体实施方式
以下结合附图对本发明的特征和原理进行详细说明，所举实施例仅用于对本发明的解释说明，并非对本发明保护范围的限制。
如图1-图4所示，本实施例提供一种基板支撑杆，包括：
外支撑杆2，其为一表面开口的盒体结构；
内支撑杆1，容置于所述外支撑杆2内，具有用于支撑基板的支撑面；
用于控制所述内支撑杆1做升降运动以使得所述内支撑杆1在第一状态和第二状态之间变化的升降结构；
防静电液涂覆结构，用于在所述内支撑杆1位于所述第一状态时，在所述内支撑杆1上涂覆防静电液；
其中，所述第一状态为所述内支撑杆1完全位于所述外支撑杆2内部，所述第二状态为所述内支撑杆1的所述支撑面与所述外支撑杆2的具有开口的表面平齐。
所述防静电液涂覆结构的设置实现防静电液的自动涂覆，提高工作效率；且内支撑杆1和外支撑杆2的设置，使得所述内支撑杆1在完全位于所述外支撑杆2内部时在所述内支撑杆1上涂覆防静电液，防止防静电液外泄对承载基板的基台(设置支撑杆的基台)、以及基台周边的器件的污染；并且，相对于人工涂覆，避免了对人体的伤害，也防止将防静电液带出支撑杆外部对基板或其他器件造成污染。
所述防静电液涂覆结构的具体结构形式可以有多种，只要实现在所述第一状态下，在所述内支撑杆1上自动涂覆防静电液即可，优选的，所述内支撑杆1上设置有多个供防静电液通过的通孔3；所述防静电液涂覆结构包括：固定于所述外支撑杆2底部的防静电液供给结构；
用于将所述防静电液供给结构提供的防静电液输送至所述支撑面上的、数量与所述通孔3对应的多个连接管，每个所述连接管的一端与所述防静电液供给结构连通，另一端与所述内支撑杆1上的相应的通孔3连通。
本实施例中，所述内支撑杆1上均匀设置所述通孔3，且所述通孔3的数量可以根据实际需要设定。
优选的，所述防静电液供给结构包括一容纳防静电液的防静电液供给罐8，所述外支撑杆2的底部设有容纳该防静电液供给罐8的容纳槽。
本实施例中，所述内支撑杆1可以在所述外支撑杆2内升降运动以在防静电液涂覆结束后实现对基板的支撑，为了利于所述内支撑杆1的升降，本实施例中，所述连接管为可弯折的弹性软管。
涂覆防静电液时存在多余的防静电液外流的情况，为了防止防静电液外流造成污染，本实施例中，所述内支撑杆1的边缘与所述外支撑杆2之间具有缝隙，这样多余的防静电液从所述缝隙中进入到所述外支撑杆2内，在涂覆防静电液后所述内支撑杆1由所述第一状态转换为第二状态，即所述内支撑杆1的支撑面与所述外支撑杆2的具有开口的表面平齐时，不会有防静电液外流。
防静电液存在于所述外支撑杆2时间过长，或者所述外支撑杆2内的防静电液过多时，会发生防静电液外流的情况，为了防止这种情况的发生，本实施例中基板支撑杆还包括防静电液回收结构9，固定于所述外支撑杆2的底部(与外支撑杆2上的开口相对的表面)，并通过管道7与所述外支撑杆2内部连通。
从所述内支撑杆1与所述外支撑杆2的缝隙流入所述外支撑杆2内的防静电液通过管道7流入所述防静电液回收结构9回收，防止污染且节省资源。
如图3所示，本实施例中，基板支撑杆还包括辊轮，所述外支撑杆2的中部设置用于固定所述辊轮的第一卡槽11，在所述外支撑杆2的长度方向的、所述第一卡槽11的相对的两侧分别设置所述内支撑杆1，所述外支撑杆2沿其长度方向的、相对的两内侧壁上向内凹设有第二卡槽6；
在所述第一状态下，所述辊轮从所述第一卡槽11移动至所述第二卡槽6、并能够沿着所述第二卡槽6移动以使得所述辊轮在相应的所述内支撑杆1上的所述支撑面上移动。
如图4所示，所述辊轮包括滚轮轴16和套设于所述滚轮轴外部的涂覆部15。
图2所示为所述辊轮位于所述第二卡槽6的状态，在进行防静电液涂覆时，升降结构控制所述内支撑杆1下降，防静电液供给结构通过所述内支撑杆1上的通孔3自动喷涂防静电液，所述辊轮从所述第一卡槽11移动至所述第二卡槽6，并且沿着所述第二卡槽6在相应的所述内支撑杆1上的所述支撑面上往返运动，使防静电液均匀覆盖所述内支撑杆1的支撑面，涂覆结束后，所述辊轮进入所述第一卡槽11固定，多余的防静电液会从所述内支撑杆1和所述外支撑杆2之间的缝隙进入所述外支撑杆2、并进入所述防静电液回收结构回收。防静电液涂覆均匀后，静置几分钟(具体时间可根据实际需要设定)，在所述升降结构的控制下，将所述内支撑杆1由所述第一状态转换为所述第二状态以支撑基板。
为了利于所述辊轮由所述的第一卡槽11进入所述第二卡槽6，本实施例中，所述第二卡槽6靠近所述外支撑杆2底部(与设置开口的表面相对设置的表面)的第一侧壁与所述第一卡槽11连接处为弧面。
为了防止所述辊轮使用时间过长而表面被污染以影响防静电液的涂覆，需要经常清洗或更换，为了方便所述辊轮的更换，本实施例中，所述第一卡槽11的开口处可拆卸的设有盖板4，所述盖板4的表面与所述外支撑杆2的具有开口的表面平齐。将所述盖板4取下，即可将所述辊轮取出。
优选的，所述盖板4上设有用于吸附基板的真空吸附盘5，利于基板的吸附固定。
优选的，所述升降结构包括升降气缸10。所述升降气缸的一端可直接穿过所述外支撑杆2以与内支撑杆1连接实现内支撑杆1的升降；也可以与穿过所述外支撑杆2以支撑内支撑杆1的连接杆连接以实现内支撑杆1的升降。
优选的，基板支撑杆还包括用于控制所述升降结构运动以及控制所述防静电液涂覆结构涂覆预设量的防静电液的PLC控制结构12。
通过PLC控制结构12控制防静电液供给结构均匀喷涂定量防静电液，有效减少涂覆时间，避免不必要的等待和停机，并可节约防静电液用量。
优选的，基板支撑杆还包括用于控制所述外支撑杆2移动至预设位置以承接基板的移动结构。
优选的，所述移动结构包括设置于所述外支撑杆2底部(与外支撑杆2上的开口相对设置的表面)的联动杆13，以及用于驱动所述联动杆13运动的驱动轴14。
本实施例还提供一种涂覆防静电液的方法，应用于上述所述的基板支撑杆，包括以下步骤：
升降结构控制内支撑杆下降预设距离，以使得内支撑杆完全位于外支撑杆的内部；
防静电液涂覆结构在内支撑杆上涂覆防静电液。
所述预设距离的设定可以根据实际需要设定，只要满足使得内支撑杆完全位于外支撑杆的内部、以便在内支撑杆上涂覆防静电液即可，本实施例中，所述预设距离为1cm，但并不以此为限。
本实施例中，所述升降结构采用PLC控制结构控制，实现内支撑杆升降的自动控制。
防静电液涂覆结束后，静置预设时间，内支撑杆上升至支撑面与外支撑杆的具有开口的表面平齐，即可进行基板的支撑。
进一步的，所述防静电液涂覆结构在内支撑杆上涂覆防静电液的步骤具体包括：
防静电液供给结构内的防静电液通过内支撑杆上的通孔喷涂于内支撑杆的支撑面上；
辊轮从第一卡槽移动至第二卡槽、并沿着第二卡槽移动以使得辊轮在相应的所述内支撑杆上的所述支撑面上移动，使得防静电液完全覆盖于内支撑杆的支撑面上。
具体的，防静电液供给结构在PLC控制结构的控制下、防静电液通过内支撑杆上的通孔自动喷涂于内支撑杆的支撑面上；
辊轮在内支撑杆的支撑面上往返运动、使得防静电液完全覆盖于支撑面上。
以上为本发明较佳实施例，需要说明的是，对于本领域普通技术人员来说，在不脱离本发明所述原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明保护范围。

Claims (15)

1.一种基板支撑杆，其特征在于，包括：
外支撑杆，其为一表面开口的盒体结构；
内支撑杆，容置于所述外支撑杆内，具有用于支撑基板的支撑面；
用于控制所述内支撑杆做升降运动以使得所述内支撑杆在第一状态和第二状态之间变化的升降结构；
防静电液涂覆结构，用于在所述内支撑杆位于所述第一状态时，在所述内支撑杆上涂覆防静电液；
其中，所述第一状态为所述内支撑杆完全位于所述外支撑杆内部，所述第二状态为所述内支撑杆的所述支撑面与所述外支撑杆的具有开口的表面平齐。
2.根据权利要求1所述的基板支撑杆，其特征在于，所述内支撑杆的边缘与所述外支撑杆之间具有缝隙。
3.根据权利要求1或2所述的基板支撑杆，其特征在于，所述内支撑杆上设置有多个供防静电液通过的通孔；所述防静电液涂覆结构包括：固定于所述外支撑杆上与所述开口相对的表面的防静电液供给结构；
用于将所述防静电液供给结构提供的防静电液输送至所述支撑面上的、数量与所述通孔对应的多个连接管，每个所述连接管的一端与所述防静电液供给结构连通，另一端与所述内支撑杆上的相应的通孔连通。
4.根据权利要求3所述的基板支撑杆，其特征在于，所述连接管为可弯折的弹性软管。
5.根据权利要求1-3任一项所述的基板支撑杆，其特征在于，还包括防静电液回收结构，固定于所述外支撑杆上与所述开口相对的表面，并通过管道与所述外支撑杆内部连通。
6.根据权利要求1所述的基板支撑杆，其特征在于，还包括辊轮，所述外支撑杆的中部设置用于固定所述辊轮的第一卡槽，在所述外支撑杆的长度方向的、所述第一卡槽的相对的两侧分别设置所述内支撑杆，所述外支撑杆沿其长度方向的、相对的两内侧壁上向内凹设有第二卡槽；
在所述第一状态下，所述辊轮从所述第一卡槽移动至所述第二卡槽、并能够沿着所述第二卡槽移动以使得所述辊轮在相应的所述内支撑杆上的所述支撑面上移动。
7.根据权利要求6所述的基板支撑杆，其特征在于，所述第二卡槽靠近所述外支撑杆底部的第一侧壁与所述第一卡槽连接处为弧面。
8.根据权利要求6所述的基板支撑杆，其特征在于，所述第一卡槽的开口处可拆卸的设有盖板，所述盖板的表面与所述外支撑杆的具有开口的表面平齐。
9.根据权利要求8所述的基板支撑杆，其特征在于，所述盖板上设有用于吸附基板的真空吸附盘。
10.根据权利要求1所述的基板支撑杆，其特征在于，所述升降结构包括升降气缸。
11.根据权利要求1所述的基板支撑杆，其特征在于，还包括用于控制所述升降结构运动以及控制所述防静电液涂覆结构涂覆预设量的防静电液的PLC控制结构。
12.根据权利要求1所述的基板支撑杆，其特征在于，还包括用于控制所述外支撑杆移动至预设位置以承接基板的移动结构。
13.根据权利要求12所述的基板支撑杆，其特征在于，所述移动结构包括设置于所述外支撑杆上与所述开口相对的表面的联动杆，以及用于驱动所述联动杆运动的驱动轴。
14.一种涂覆防静电液的方法，应用于权利要求1-13任一项所述的基板支撑杆，其特征在于，包括：
升降结构控制内支撑杆下降预设距离，以使得内支撑杆完全位于外支撑杆的内部；
防静电液涂覆结构在内支撑杆上涂覆防静电液。
15.根据权利要求14所述的涂覆防静电液的方法，其特征在于，所述防静电液涂覆结构在内支撑杆上涂覆防静电液的步骤具体包括：
防静电液供给结构内的防静电液通过内支撑杆上的通孔喷涂于内支撑杆的支撑面上；
辊轮从第一卡槽移动至第二卡槽、并沿着第二卡槽移动以使得辊轮在相应的所述内支撑杆上的所述支撑面上移动，使得防静电液完全覆盖于内支撑杆的支撑面上。
CN201611032498.5A 2016-11-17 2016-11-17 基板支撑杆以及涂覆防静电液的方法 Active CN106444110B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201611032498.5A CN106444110B (zh) 2016-11-17 2016-11-17 基板支撑杆以及涂覆防静电液的方法
US15/801,464 US10692746B2 (en) 2016-11-17 2017-11-02 Substrate lift bar and method for smearing anti-static liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201611032498.5A CN106444110B (zh) 2016-11-17 2016-11-17 基板支撑杆以及涂覆防静电液的方法

Publications (2)

Publication Number Publication Date
CN106444110A true CN106444110A (zh) 2017-02-22
CN106444110B CN106444110B (zh) 2023-08-29

Family

ID=58220993

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201611032498.5A Active CN106444110B (zh) 2016-11-17 2016-11-17 基板支撑杆以及涂覆防静电液的方法

Country Status (2)

Country Link
US (1) US10692746B2 (zh)
CN (1) CN106444110B (zh)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5716489A (en) * 1993-12-10 1998-02-10 Fabio Perini S.P.A. Device for gluing the tail end of a reel of web material
CN102161026A (zh) * 2010-02-24 2011-08-24 东京毅力科创株式会社 基板输送装置
JP2012223917A (ja) * 2011-04-15 2012-11-15 Eins Corp 帯電防止剤塗布装置
JP2013191604A (ja) * 2012-03-12 2013-09-26 Toray Eng Co Ltd 塗布装置
CN103454810A (zh) * 2013-09-09 2013-12-18 深圳市华星光电技术有限公司 用于液晶配向膜的烘烤装置
CN205157918U (zh) * 2015-11-19 2016-04-13 郴州市晶讯光电有限公司 一种酒精喷洒机
CN106098601A (zh) * 2016-06-30 2016-11-09 京东方科技集团股份有限公司 一种基板的支撑装置、干燥设备及相关工作方法
CN206339802U (zh) * 2016-11-17 2017-07-18 合肥京东方光电科技有限公司 基板支撑杆

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2755768A (en) * 1953-04-30 1956-07-24 American Can Co Adhesive applicator
US5260174A (en) * 1989-02-17 1993-11-09 Dai Nippon Insatsu Kabushiki Kaisha Method and apparatus for forming a coating of a viscous liquid on an object
TW434052B (en) * 1996-02-20 2001-05-16 Pre Tech Co Ltd Washing device of disk to be washed
JP3278714B2 (ja) * 1996-08-30 2002-04-30 東京エレクトロン株式会社 塗布膜形成装置
JP3290910B2 (ja) * 1997-02-19 2002-06-10 東京エレクトロン株式会社 洗浄装置
US7306002B2 (en) * 2003-01-04 2007-12-11 Yong Bae Kim System and method for wet cleaning a semiconductor wafer

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5716489A (en) * 1993-12-10 1998-02-10 Fabio Perini S.P.A. Device for gluing the tail end of a reel of web material
CN102161026A (zh) * 2010-02-24 2011-08-24 东京毅力科创株式会社 基板输送装置
JP2012223917A (ja) * 2011-04-15 2012-11-15 Eins Corp 帯電防止剤塗布装置
JP2013191604A (ja) * 2012-03-12 2013-09-26 Toray Eng Co Ltd 塗布装置
CN103454810A (zh) * 2013-09-09 2013-12-18 深圳市华星光电技术有限公司 用于液晶配向膜的烘烤装置
CN205157918U (zh) * 2015-11-19 2016-04-13 郴州市晶讯光电有限公司 一种酒精喷洒机
CN106098601A (zh) * 2016-06-30 2016-11-09 京东方科技集团股份有限公司 一种基板的支撑装置、干燥设备及相关工作方法
CN206339802U (zh) * 2016-11-17 2017-07-18 合肥京东方光电科技有限公司 基板支撑杆

Also Published As

Publication number Publication date
US10692746B2 (en) 2020-06-23
US20180138067A1 (en) 2018-05-17
CN106444110B (zh) 2023-08-29

Similar Documents

Publication Publication Date Title
KR100803147B1 (ko) 도포장치 및 이를 이용한 처리액의 도포 방법
TWI358326B (en) Coating apparatus, coating method and coating-film
KR102039131B1 (ko) 그라비아 코팅 장치
KR20090085547A (ko) 기판 처리 장치
CN206339802U (zh) 基板支撑杆
CN110586409B (zh) 一种用于漆包线底漆与面漆涂覆的涂漆装置
KR101287564B1 (ko) 인쇄판 세정장치
CN106444110A (zh) 基板支撑杆以及涂覆防静电液的方法
KR101863260B1 (ko) 친환경 점착제 도포장치
KR100829413B1 (ko) 인쇄장치
CN211032640U (zh) 一种便于管道涂刷转移的装置
CN110890308A (zh) 晶圆承载装置、涂胶显影设备及涂胶显影方法
JP2009154106A (ja) 塗布方法および塗布装置並びに液晶ディスプレイ用部材の製造方法
JP6331832B2 (ja) 塗布板載置装置、塗装システム、ガラス板
CN208036416U (zh) 一种隔振结构及车辆
KR100775122B1 (ko) 토출제어구조 및 이를 이용한 코팅장치
CN109013180A (zh) 一种配向膜涂布方法及涂布机
CN211073536U (zh) 一种手机镀膜工具箱
JP2004098192A (ja) 自動液体塗布装置
CN217774596U (zh) 一种胶带生产用涂胶装置
CN221288393U (zh) 一种排水管道喷涂修复装置
CN219273498U (zh) 一种橡胶制品涂胶装置
JP5338071B2 (ja) 塗布方法および塗布装置並びに液晶ディスプレイ用部材の製造方法
JP3574228B2 (ja) 搬送コンベア用の着脱荷装置
KR20110096210A (ko) 반사방지용 코팅 장치 및 이를 포함한 반사방지용 코팅 시스템

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant