CN106103455A - 有机薄膜形成用溶液及使用该溶液的有机薄膜形成方法 - Google Patents

有机薄膜形成用溶液及使用该溶液的有机薄膜形成方法 Download PDF

Info

Publication number
CN106103455A
CN106103455A CN201580014513.0A CN201580014513A CN106103455A CN 106103455 A CN106103455 A CN 106103455A CN 201580014513 A CN201580014513 A CN 201580014513A CN 106103455 A CN106103455 A CN 106103455A
Authority
CN
China
Prior art keywords
atom
film
organic
solution
substituent group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201580014513.0A
Other languages
English (en)
Chinese (zh)
Inventor
肥高友也
岛田干也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Soda Co Ltd
Original Assignee
Nippon Soda Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Soda Co Ltd filed Critical Nippon Soda Co Ltd
Publication of CN106103455A publication Critical patent/CN106103455A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
CN201580014513.0A 2014-03-26 2015-03-20 有机薄膜形成用溶液及使用该溶液的有机薄膜形成方法 Pending CN106103455A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014064035 2014-03-26
JP2014-064035 2014-03-26
PCT/JP2015/001570 WO2015146103A1 (ja) 2014-03-26 2015-03-20 有機薄膜形成用溶液及びそれを用いた有機薄膜形成方法

Publications (1)

Publication Number Publication Date
CN106103455A true CN106103455A (zh) 2016-11-09

Family

ID=54194653

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580014513.0A Pending CN106103455A (zh) 2014-03-26 2015-03-20 有机薄膜形成用溶液及使用该溶液的有机薄膜形成方法

Country Status (5)

Country Link
JP (1) JP6263605B2 (ja)
KR (1) KR20160122840A (ja)
CN (1) CN106103455A (ja)
TW (1) TWI595000B (ja)
WO (1) WO2015146103A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114206815A (zh) * 2020-02-26 2022-03-18 瓦克化学股份公司 卤化四甲硅烷基硼酸盐

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170130366A (ko) * 2015-03-24 2017-11-28 제이엔씨 주식회사 디알킬아미노실란의 제조 방법
JP2024025759A (ja) * 2022-08-10 2024-02-26 ダイキン工業株式会社 表面処理層を含む物品

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE472901A (ja) * 1946-05-16
US5783299A (en) * 1986-01-21 1998-07-21 Seiko Epson Corporation Polarizer plate with anti-stain layer
JP3387204B2 (ja) * 1993-04-15 2003-03-17 セイコーエプソン株式会社 偏光板、偏光板の製造方法および液晶表示装置
US5759643A (en) * 1987-01-16 1998-06-02 Seiko Epson Corporation Polarizing plate and method of production
JP3986275B2 (ja) 2001-09-03 2007-10-03 シャープ株式会社 静電潜像現像用トナー
EP1484105B1 (en) * 2002-03-12 2012-07-18 Nippon Soda Co., Ltd. Method for preparing chemical adsorption film and solution for preparing chemical adsorption film for use therein
JP2004091810A (ja) 2002-08-29 2004-03-25 Toshiba Corp イオン注入装置及びイオン注入方法
JP4129446B2 (ja) 2004-06-28 2008-08-06 株式会社サンファッション 立体細幅帯状体
JP4385052B2 (ja) * 2004-07-22 2009-12-16 日本曹達株式会社 有機薄膜形成方法
JP2008059840A (ja) 2006-08-30 2008-03-13 Noritsu Koki Co Ltd プラズマ発生装置およびそれを用いるワーク処理装置
JP2008246959A (ja) * 2007-03-30 2008-10-16 Kagawa Univ 撥水撥油防汚性反射板およびその製造方法ならびにそれを用いたトンネル、道路標識、表示板、乗り物および建物
JP2009104424A (ja) 2007-10-24 2009-05-14 Hitachi Ltd Ｅｔｃカード不正使用防止システム

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114206815A (zh) * 2020-02-26 2022-03-18 瓦克化学股份公司 卤化四甲硅烷基硼酸盐
CN114206815B (zh) * 2020-02-26 2024-03-08 瓦克化学股份公司 卤化四甲硅烷基硼酸盐

Also Published As

Publication number Publication date
WO2015146103A1 (ja) 2015-10-01
TW201540722A (zh) 2015-11-01
TWI595000B (zh) 2017-08-11
KR20160122840A (ko) 2016-10-24
JP6263605B2 (ja) 2018-01-17
JPWO2015146103A1 (ja) 2017-04-13

Similar Documents

Publication Publication Date Title
CN105814139B (zh) 含氟醚组合物、其制造方法、涂布液、具有表面处理层的基材及其制造方法
EP3778700B1 (en) Fluorinated ether compound, fluorinated ether composition, coating liquid and article
CN104245865B (zh) 疏油性涂料
EP2982702B1 (en) Fluorine-containing ether compound, fluorine-containing ether composition, and coating solution, as well as substrate having surface layer, and method for manufacturing same
EP2780426B1 (en) Fluorinated coatings with lubricious additive
Kaynak et al. Anti-adhesive layers on stainless steel using thermally stable dipodal perfluoroalkyl silanes
Wu et al. Self-assembled monolayers of perfluoroalkylsilane on plasma-hydroxylated silicon substrates
CN106103455A (zh) 有机薄膜形成用溶液及使用该溶液的有机薄膜形成方法
JPS58167597A (ja) フルオロアミノシラン化合物
JP2005280020A (ja) 金型とその製造方法及びそれを用いて作成した成型品
US20220298180A1 (en) Fluorine-containing ether compound, surface treatment agent, fluorine-containing ether composition, coating liquid, article, and production method thereof
CN112878053B (zh) 一种基于微纳结构的超疏水织物及其制备方法
JP5952750B2 (ja) ペンタエリスリトール骨格を有する新規フッ素含有アルコキシシラン化合物、それを用いた表面改質剤およびその中間体
JPWO2020111010A1 (ja) 含フッ素エーテル化合物、組成物および物品
TWI665207B (zh) 氟矽腈化合物
JP2015205973A (ja) 撥水撥油性組成物、及びそれを用いて形成した撥水膜
EP2163607A1 (en) Solvent for cleaning of organic thin film
CN114258412A (zh) 含氟化合物、含有含氟化合物的组合物、涂布液、物品和物品的制造方法
JP5992039B2 (ja) 有機ケイ素化合物、それを用いた薄膜形成用組成物および有機薄膜
EP2638980B1 (en) Process for producing organic thin film laminate using solid or oily material for organic thin film formation applications
JP6215389B2 (ja) 撥水撥油性組成物、及びそれを用いて形成した撥水膜
Capacci-Daniel Crystal growth of polymorphic bis-diphenyl ureas on self-assembled monolayer templates
JP2023533256A (ja) ハイブリッドシロキサンオリゴマー
JP2017200892A (ja) 環状シロキサン化合物、環状シロキサン膜、ナノ構造体の製造方法およびＳｉＯ２超薄膜
JPH03284688A (ja) 含フッ素スルホンアミドシランおよびその製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20161109

WD01 Invention patent application deemed withdrawn after publication