CN106095213A - A kind of half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass - Google Patents
A kind of half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass Download PDFInfo
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- CN106095213A CN106095213A CN201610645461.3A CN201610645461A CN106095213A CN 106095213 A CN106095213 A CN 106095213A CN 201610645461 A CN201610645461 A CN 201610645461A CN 106095213 A CN106095213 A CN 106095213A
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3605—Coatings of the type glass/metal/inorganic compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing Of Electric Cables (AREA)
Abstract
A kind of half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass, and glass substrate is processed, second step, to glass substrate sputtering opaque layer and clear layer by the first step；3rd step, after glass substrate has sputtered opaque layer and clear layer, carries out ito film sputtering；There is good electromagnetic shielding, electrostatic defending and the shadow effect that disappears, and existing conventional conductive glass can be replaced completely, the making capacitance plate electro-conductive glass of low power consuming, high uniformity, low cost is provided for downstream client.
Description
Technical field
The present invention relates to electro-conductive glass technical field, a kind of half-reflection and half-transmission touch screen disappears the processing side of shadow electro-conductive glass
Method.
Background technology
At present, capacitance plate product uses widely, and the two-sided plating electro-conductive glass in capacitance plate is its main devices, two-sided plating
The conductive film of electro-conductive glass requires relatively tight at aspect of performance, such as uniformity, heat resistance, acid-proof alkaline, high temperature resistant
High wet performance etc.；Making transparent circuitry when, owing to technology difficulty increases, when making circuit frequently with harsh circuit.
In manufacturing process, the position that should not etch readily etched away, and there is the erosion trace track of circuit etch, affect its electromagnetism
Shielding, electrostatic protection function, the erosion trace track existed can produce impact to viewing graphic pattern.
In view of the foregoing, now develop a kind of half-reflection and half-transmission touch screen to disappear the processing method of shadow electro-conductive glass.
Summary of the invention
The invention aims to overcome deficiency of the prior art, it is provided that a kind of half-reflection and half-transmission touch screen disappears shadow electro-conductive glass
Processing method, there is good electromagnetic shielding, electrostatic defending and the shadow effect that disappears, and existing conventional pilot can be replaced completely
Electricity glass, provides the making capacitance plate electro-conductive glass of low power consuming, high uniformity, low cost for downstream client.
The present invention to achieve these goals, adopts the following technical scheme that a kind of half-reflection and half-transmission touch screen disappears shadow conduction glass
The processing method of glass, described half-reflection and half-transmission touch screen disappear shadow electro-conductive glass be by glass substrate, stannum face, ito film, opaque layer,
Clear layer is constituted；Two surfaces of glass substrate are stannum face, and the stannum face on surface is provided above ito film on the glass substrate,
Arranging opaque layer and clear layer below the stannum face of glass substrate lower surface, opaque layer constitutes opacity, and clear layer is constituted
Bright zone；
Described clear layer uses transparent silicon dioxide or transparent silicon oxynitride；
Described opaque layer uses opaque silicon dioxide or opaque silicon oxynitride.
The first step, processes glass substrate,
A, glass substrate is cut, first X cutting, then Y cutting, break sheet the most again and process；
B, the glass substrate after cutting being carried out edging and chamfering, first X edging, then chamfering, half-twist is again to Y edging and chamfering；
C, scrub and dry up；
D, the glass substrate after edging and chamfering is polished；
E, scrub and dry up again；
Second step, to glass substrate sputtering opaque layer and clear layer；
A, polishing is scrubbed dry up rear glass substrate and heat；The heating-up temperature used is 150-280 degree Celsius；
B, utilize magnetic control sputtering vacuum coating equipment to heating after glass substrate lower surface stannum face below sputter opaque layer
And clear layer, opacity sputtering opaque layer, bright zone sputtering clear layer, described clear layer use transparent silicon dioxide or
Transparent silicon oxynitride, described opaque layer uses opaque silicon dioxide or opaque silicon oxynitride；
3rd step, after glass substrate has sputtered opaque layer and clear layer, carries out ito film sputtering；
A, to sputtering opaque layer and clear layer after glass substrate heat；Heating-up temperature uses 280-380 degree Celsius；
B, utilize magnetic control sputtering vacuum coating equipment, to the glass substrate after heating, above the upper surface stannum face of glass substrate
Sputtering ito film；
C, to sputtering ito film after glass substrate, buffered room makes annealing treatment: is first cooled to 200 degrees Celsius, then is heated up to
300 degrees Celsius stable, completes the plated film to glass substrate.
The invention has the beneficial effects as follows: the present invention can protect indium tin oxide conductive film to etch circuit, not by manufacturing process
The etching of the acid solution in technique, it is to avoid etch away the position that should not etch in manufacturing process, makes oxygen in manufacturing process
Change indium stannum conducting film etching circuit to reach to design requirement, there is good electromagnetic shielding, electrostatic defending and the shadow effect that disappears, and energy
Enough replace existing conventional conductive glass completely, the making capacitance plate of low power consuming, high uniformity, low cost is provided for downstream client
Use electro-conductive glass.
Accompanying drawing explanation
The invention will be further described below in conjunction with the accompanying drawings:
Fig. 1 is, general assembly structural representation；
Fig. 2 is, in Fig. 1, A-A is to cross-sectional view；
Fig. 1, in 2: glass substrate 1, stannum face 2, ito film 3, opaque layer 4, clear layer 5, opacity 6, bright zone 7.
Detailed description of the invention
The present invention is described in further detail with detailed description of the invention below in conjunction with embodiment:
Embodiment 1
Two surfaces of glass substrate 1 are stannum face 2, are provided above ito film 3, at glass in the stannum face 2 of glass substrate 1 upper surface
Arranging opaque layer 4 and clear layer 5 below the stannum face 2 of glass substrate 1 lower surface, opaque layer 4 constitutes opacity 6, clear layer 5
Constitute bright zone 7；
Described clear layer 5 uses transparent silicon dioxide or transparent silicon oxynitride；
Described opaque layer 4 uses opaque silicon dioxide or opaque silicon oxynitride.
Embodiment 2
The first step, processes glass substrate 1,
A, glass substrate 1 is cut, first X cutting, then Y cutting, break sheet the most again and process；
B, the glass substrate 1 after cutting being carried out edging and chamfering, first X edging, then chamfering, half-twist is again to Y edging and fall
Angle；
C, scrub and dry up；
D, the glass substrate 1 after edging and chamfering is polished；
E, scrub and dry up again；
Second step, sputters opaque layer 4 and clear layer 5 to glass substrate 1；
A, polishing is scrubbed dry up rear glass substrate 1 and heat；The heating-up temperature used is 150-280 degree Celsius；
B, utilize magnetic control sputtering vacuum coating equipment to heating after glass substrate 1 lower surface stannum face 2 below sputter opaque
Layer 4 and clear layer 5, opacity sputtering opaque layer 4, bright zone sputtering clear layer 5, described clear layer 5 uses transparent two
Silicon oxide or transparent silicon oxynitride, described opaque layer 4 uses opaque silicon dioxide or opaque silicon oxynitride；
3rd step, after glass substrate 1 has sputtered opaque layer 4 and clear layer 5, carries out ito film 3 and sputters；
A, to sputtering opaque layer 4 and clear layer 5 after glass substrate 1 heat；Heating-up temperature uses 280-380 Celsius
Degree；
B, utilize magnetic control sputtering vacuum coating equipment, to the glass substrate 1 after heating, on the upper surface stannum face 2 of glass substrate 1
Side's sputtering ito film 3；
C, to sputtering ito film 3 after glass substrate 1, buffered room makes annealing treatment: is first cooled to 200 degrees Celsius, then is heated up to
300 degrees Celsius stable, completes the plated film to glass substrate 1.
Claims (2)
1. half-reflection and half-transmission touch screen disappears a processing method for shadow electro-conductive glass, and described half-reflection and half-transmission touch screen disappears shadow electro-conductive glass
It is to be made up of glass substrate (1), stannum face (2), ito film (3), opaque layer (4), clear layer (5)；It is characterized in that: glass base
Two surfaces of plate (1) are stannum face (2), are provided above ito film (3), at glass in the stannum face (2) of glass substrate (1) upper surface
The lower section, stannum face (2) of glass substrate (1) lower surface arranges opaque layer (4) and clear layer (5), and opaque layer (4) constitutes opaque
District (6), clear layer (5) constitutes bright zone (7)；
Described clear layer (5) uses transparent silicon dioxide or transparent silicon oxynitride；
Described opaque layer (4) uses opaque silicon dioxide or opaque silicon oxynitride.
2. a half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass, it is characterised in that:
The first step, processes glass substrate (1),
A, glass substrate (1) is cut, first X cutting, then Y cutting, break sheet the most again and process；
B, the glass substrate (1) after cutting being carried out edging and chamfering, first X edging, then chamfering, half-twist is again to Y edging and fall
Angle；
C, scrub and dry up；
D, the glass substrate (1) after edging and chamfering is polished；
E, scrub and dry up again；
Second step, to glass substrate (1) sputtering opaque layer (4) and clear layer (5)；
A, polishing is scrubbed dry up rear glass substrate (1) and heat；The heating-up temperature used is 150-280 degree Celsius；
B, utilize magnetic control sputtering vacuum coating equipment to heating after glass substrate (1) lower surface stannum face (2) lower section sputtering not
Clear layer (4) and clear layer (5), opacity sputtering opaque layer (4), bright zone sputtering clear layer (5), described clear layer
(5) transparent silicon dioxide or transparent silicon oxynitride, described opaque layer (4) is used to use opaque silicon dioxide or not
Transparent silicon oxynitride；
3rd step, after glass substrate (1) has sputtered opaque layer (4) and clear layer (5), carries out ito film (3) sputtering；
A, to sputtering opaque layer (4) and clear layer (5) after glass substrate (1) heat；Heating-up temperature uses 280-380
Degree Celsius；
B, utilize magnetic control sputtering vacuum coating equipment, to the glass substrate (1) after heating, at the upper surface stannum of glass substrate (1)
Top sputtering ito film, face (2) (3)；
C, to the glass substrate (1) after sputtering ito film (3), buffered room makes annealing treatment: is first cooled to 200 degrees Celsius, then adds
Temperature is stable to 300 degrees Celsius, completes the plated film to glass substrate (1).
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610645461.3A CN106095213A (en) | 2016-08-09 | 2016-08-09 | A kind of half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass |
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| CN201610645461.3A CN106095213A (en) | 2016-08-09 | 2016-08-09 | A kind of half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass |
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| CN105204691A (en) * | 2015-10-19 | 2015-12-30 | 洛阳康耀电子有限公司 | Method for processing single-sided shadow mark vanishing conductive glass |
| CN105204704A (en) * | 2015-10-19 | 2015-12-30 | 洛阳康耀电子有限公司 | Method for processing single-face touch screen shadow eliminating conductive glass |
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| CN205068341U (en) * | 2015-10-19 | 2016-03-02 | 洛阳康耀电子有限公司 | Touch -sensitive screen single face shadow conductive glass that disappears |
| CN205115290U (en) * | 2015-10-19 | 2016-03-30 | 洛阳康耀电子有限公司 | Two -sided shadow conductive glass that disappears of touch -sensitive screen |
| CN205115289U (en) * | 2015-10-19 | 2016-03-30 | 洛阳康耀电子有限公司 | Single face shadow touch -sensitive screen conductive glass that disappears |
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2016
- 2016-08-09 CN CN201610645461.3A patent/CN106095213A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103218102A (en) * | 2013-05-10 | 2013-07-24 | 洛阳恒兆电子有限公司 | Method for machining double-sided coated glass for capacitive screen and double-sided coated glass |
| CN105204691A (en) * | 2015-10-19 | 2015-12-30 | 洛阳康耀电子有限公司 | Method for processing single-sided shadow mark vanishing conductive glass |
| CN105204704A (en) * | 2015-10-19 | 2015-12-30 | 洛阳康耀电子有限公司 | Method for processing single-face touch screen shadow eliminating conductive glass |
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| CN205068341U (en) * | 2015-10-19 | 2016-03-02 | 洛阳康耀电子有限公司 | Touch -sensitive screen single face shadow conductive glass that disappears |
| CN205115290U (en) * | 2015-10-19 | 2016-03-30 | 洛阳康耀电子有限公司 | Two -sided shadow conductive glass that disappears of touch -sensitive screen |
| CN205115289U (en) * | 2015-10-19 | 2016-03-30 | 洛阳康耀电子有限公司 | Single face shadow touch -sensitive screen conductive glass that disappears |
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