CN105204704A - Method for processing single-face touch screen shadow eliminating conductive glass - Google Patents
Method for processing single-face touch screen shadow eliminating conductive glass Download PDFInfo
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- CN105204704A CN105204704A CN201510697114.0A CN201510697114A CN105204704A CN 105204704 A CN105204704 A CN 105204704A CN 201510697114 A CN201510697114 A CN 201510697114A CN 105204704 A CN105204704 A CN 105204704A
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Abstract
A method for processing single-face touch screen shadow eliminating conductive glass comprises the following steps: 1, treating a glass baseplate; 2, sputtering an intervention layer I and a transparent passivation layer on the glass baseplate; 3, sputtering an intervention layer II on the transparent passivation layer sputtered on the glass baseplate. The single-face touch screen shadow eliminating conductive glass has excellent electromagnetic shielding, stelectrostatic protection and shadow elimination functions, and can completely replace the conventional conductive glass, and the conductive glass, with low energy consumption, high uniformity and low cost, used for manufacturing capacitive screens can be provided for downstream clients.
Description
Technical field
The present invention relates to electro-conductive glass technical field, especially a kind of one side touch-screen disappears the job operation of shadow electro-conductive glass.
Background technology
At present, capacitance plate product uses widely, and the two-sided plating electro-conductive glass in capacitance plate is its main devices, the conductive film of two-sided plating electro-conductive glass requires relatively tighter at aspect of performance, such as homogeneity, heat resistance, acid-proof alkaline, high-temp resisting high-humidity resisting performance etc.; When making transparent circuitry, because technology difficulty increases, often adopt harsh circuit at making circuit.In manufacturing process, easily etch away the position that should not etch, and there is the erosion trace track of circuit etch, affect its electromagnetic screen, electrostatic protection function, the erosion trace track of existence can have an impact to viewing graphic pattern.
In view of the foregoing, now develop a kind of one side touch-screen to disappear the job operation of shadow electro-conductive glass.
Summary of the invention
The object of the invention is to overcome deficiency of the prior art, the job operation that a kind of one side touch-screen disappears shadow electro-conductive glass is provided, there is good electromagnetic screen, electrostatic defending and the shadow effect that disappears, and existing conventional conductive glass can be replaced completely, for downstream client provides the making capacitance plate electro-conductive glass of low power consuming, high uniformity, low cost.
The present invention to achieve these goals, adopt following technical scheme: a kind of one side touch-screen disappears the job operation of shadow electro-conductive glass, the described one side touch-screen shadow electro-conductive glass that disappears is made up of glass substrate, tin face, air surface, interfering layer one, transparent passivating layer, interfering layer two; Two surfaces of glass substrate are respectively tin face and air surface, the tin face of glass substrate arranges interfering layer one, arranges transparent passivating layer between interfering layer one and interfering layer two;
Described transparent passivating layer adopts transparent silicon dioxide or transparent silicon oxynitride;
Described interfering layer one all adopts niobium pentaoxide with interfering layer two.
The first step, processes glass substrate,
A, glass substrate to be cut, first X cutting, then Y cutting, and then break sheet process;
B, to cutting after glass substrate carry out edging and chamfering, first X edging, then chamfering, half-twist is again to Y edging and chamfering;
C, scrub and dry up;
D, polishing is carried out to the glass substrate after edging and chamfering;
E, scrub and dry up again;
Second step, to glass substrate sputtering interfering layer one and transparent passivating layer;
A, polishing scrubbed dry up rear glass substrate and heat; The heating-up temperature adopted is 150-280 degree Celsius;
B, utilize magnetic control sputtering vacuum coating equipment to heating after glass substrate tin face on sputter interfering layer one, interfering layer one is niobium pentaoxide, sputters transparent passivating layer above interfering layer one, and transparent passivating layer is transparent silicon dioxide or transparent silicon oxynitride;
3rd step, on the transparent passivating layer of glass substrate sputtering, carries out interfering layer two sputtering;
A, to sputtering interfering layer one and transparent passivating layer after glass substrate heat; Heating-up temperature adopts 280-380 degree Celsius;
B, utilize magnetic control sputtering vacuum coating equipment, to the glass substrate after heating, on the interfering layer one and transparent passivating layer of glass substrate, carry out interfering layer two sputtering, interfering layer two is niobium pentaoxide;
C, to sputtering interfering layer two after glass substrate, do annealing in process through surge chamber: be first cooled to 200 degrees Celsius, then heat to 300 degrees Celsius stablize, complete the plated film to glass substrate.
The invention has the beneficial effects as follows: the present invention can protect indium tin oxide conductive film to etch circuit; not by the etching of the acid solution made in process; avoid in manufacturing process, etch away the position that should not etch; in manufacturing process, make indium tin oxide conductive film etch circuit reach designing requirement; there is good electromagnetic screen, electrostatic defending and the shadow effect that disappears; and existing conventional conductive glass can be replaced completely, for downstream client provides the making capacitance plate electro-conductive glass of low power consuming, high uniformity, low cost.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, the invention will be further described:
Fig. 1 is, general assembly structural representation;
In Fig. 1: glass substrate 1, tin face 2, air surface 3, interfering layer 1, transparent passivating layer 5, interfering layer 26.
Embodiment
Below in conjunction with embodiment and embodiment, the present invention is described in further detail:
Embodiment 1
Two surfaces of glass substrate 1 are respectively tin face 2 and air surface 3, the tin face 2 of glass substrate 1 arranges interfering layer 1, arranges transparent passivating layer 5 between interfering layer 1 and interfering layer 26;
Described transparent passivating layer 5 adopts transparent silicon dioxide or transparent silicon oxynitride;
Described interfering layer 1 all adopts niobium pentaoxide with interfering layer 26.
Embodiment 2
The first step, processes glass substrate 1,
A, glass substrate 1 to be cut, first X cutting, then Y cutting, and then break sheet process;
B, to cutting after glass substrate 1 carry out edging and chamfering, first X edging, then chamfering, half-twist is again to Y edging and chamfering;
C, scrub and dry up;
D, polishing is carried out to the glass substrate 1 after edging and chamfering;
E, scrub and dry up again;
Second step, sputters interfering layer 1 and transparent passivating layer 5 to glass substrate 1;
A, polishing scrubbed dry up rear glass substrate 1 and heat; The heating-up temperature adopted is 150-280 degree Celsius;
B, utilize magnetic control sputtering vacuum coating equipment to heating after glass substrate 1 tin face 2 on sputter interfering layer 1, interfering layer 1 is niobium pentaoxide, sputter transparent passivating layer 5 above interfering layer 1, transparent passivating layer 5 is transparent silicon dioxide or transparent silicon oxynitride; 3rd step, on the transparent passivating layer 5 that glass substrate 1 sputters, carries out interfering layer 26 and sputters;
A, to sputtering interfering layer 1 and transparent passivating layer 5 after glass substrate 1 heat; Heating-up temperature adopts 280-380 degree Celsius;
B, utilize magnetic control sputtering vacuum coating equipment, to the glass substrate 1 after heating, on the interfering layer 1 and transparent passivating layer 5 of glass substrate 1, carry out interfering layer 26 and sputter, interfering layer 26 is niobium pentaoxide;
C, to sputtering interfering layer 26 after glass substrate 1, do annealing in process through surge chamber: be first cooled to 200 degrees Celsius, then heat to 300 degrees Celsius stablize, complete the plated film to glass substrate 1.
Claims (2)
1. one side touch-screen disappears a job operation for shadow electro-conductive glass, and the described one side touch-screen shadow electro-conductive glass that disappears is made up of glass substrate (1), tin face (2), air surface (3), interfering layer one (4), transparent passivating layer (5), interfering layer two (6); It is characterized in that: two surfaces of glass substrate (1) are respectively tin face (2) and air surface (3), the tin face (2) of glass substrate (1) arranges interfering layer one (4), transparent passivating layer (5) is set between interfering layer one (4) and interfering layer two (6);
Described transparent passivating layer (5) adopts transparent silicon dioxide or transparent silicon oxynitride;
Described interfering layer one (4) all adopts niobium pentaoxide with interfering layer two (6).
2. one side touch-screen disappears a job operation for shadow electro-conductive glass, it is characterized in that:
The first step, processes glass substrate (1),
A, glass substrate (1) to be cut, first X cutting, then Y cutting, and then break sheet process;
B, to cutting after glass substrate (1) carry out edging and chamfering, first X edging, then chamfering, half-twist is again to Y edging and chamfering;
C, scrub and dry up;
D, polishing is carried out to the glass substrate (1) after edging and chamfering;
E, scrub and dry up again;
Second step, to glass substrate (1) sputtering interfering layer one (4) and transparent passivating layer (5);
A, polishing scrubbed dry up rear glass substrate (1) and heat; The heating-up temperature adopted is 150-280 degree Celsius;
B, utilize the upper sputtering in the tin face (2) of magnetic control sputtering vacuum coating equipment to the glass substrate (1) after heating interfering layer one (4), interfering layer one (4) is niobium pentaoxide, interfering layer one (4) top sputtering transparent passivating layer (5), transparent passivating layer (5) is transparent silicon dioxide or transparent silicon oxynitride; 3rd step, on the transparent passivating layer (5) that glass substrate (1) sputters, carries out interfering layer two (6) and sputters;
A, to sputtering interfering layer one (4) and transparent passivating layer (5) after glass substrate (1) heat; Heating-up temperature adopts 280-380 degree Celsius;
B, utilize magnetic control sputtering vacuum coating equipment, to the glass substrate (1) after heating, on the interfering layer one (4) and transparent passivating layer (5) of glass substrate (1), carry out interfering layer two (6) to sputter, interfering layer two (6) is niobium pentaoxide;
C, to sputtering interfering layer two (6) after glass substrate (1), do annealing in process through surge chamber: be first cooled to 200 degrees Celsius, then heat to 300 degrees Celsius stablize, complete the plated film to glass substrate (1).
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510697114.0A CN105204704B (en) | 2015-10-19 | 2015-10-19 | A kind of single side touch screen disappears the processing method of shadow electro-conductive glass |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510697114.0A CN105204704B (en) | 2015-10-19 | 2015-10-19 | A kind of single side touch screen disappears the processing method of shadow electro-conductive glass |
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| CN105204704A true CN105204704A (en) | 2015-12-30 |
| CN105204704B CN105204704B (en) | 2018-08-10 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106095213A (en) * | 2016-08-09 | 2016-11-09 | 洛阳康耀电子有限公司 | A kind of half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103218102A (en) * | 2013-05-10 | 2013-07-24 | 洛阳恒兆电子有限公司 | Method for machining double-sided coated glass for capacitive screen and double-sided coated glass |
| CN104205021A (en) * | 2012-03-30 | 2014-12-10 | 应用材料公司 | Transparent body for use in a touch screen panel manufacturing method and system |
| US20150109234A1 (en) * | 2013-10-18 | 2015-04-23 | Applied Materials, Inc. | Transparent body for a touch panel manufacturing method and system for manufacturing a transparent body for a touch screen panel |
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- 2015-10-19 CN CN201510697114.0A patent/CN105204704B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104205021A (en) * | 2012-03-30 | 2014-12-10 | 应用材料公司 | Transparent body for use in a touch screen panel manufacturing method and system |
| CN103218102A (en) * | 2013-05-10 | 2013-07-24 | 洛阳恒兆电子有限公司 | Method for machining double-sided coated glass for capacitive screen and double-sided coated glass |
| US20150109234A1 (en) * | 2013-10-18 | 2015-04-23 | Applied Materials, Inc. | Transparent body for a touch panel manufacturing method and system for manufacturing a transparent body for a touch screen panel |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106095213A (en) * | 2016-08-09 | 2016-11-09 | 洛阳康耀电子有限公司 | A kind of half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass |
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| CN105204704B (en) | 2018-08-10 |
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