CN203276237U - Two-sided film-coated conductive glass for capacitive screen - Google Patents
Two-sided film-coated conductive glass for capacitive screen Download PDFInfo
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- CN203276237U CN203276237U CN 201320249817 CN201320249817U CN203276237U CN 203276237 U CN203276237 U CN 203276237U CN 201320249817 CN201320249817 CN 201320249817 CN 201320249817 U CN201320249817 U CN 201320249817U CN 203276237 U CN203276237 U CN 203276237U
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Abstract
The utility model relates to the technical field of conductive glass, and discloses a piece of two-sided film-coated conductive glass for a capacitive screen. The two-sided film-coated conductive glass for the capacitive screen comprises a glass substrate (1), wherein two surfaces of the glass substrate (1) adopts a tin surface (2) and an air surface (3) respectively; a transparent passivation layer (4) is arranged on the tin surface (2) of the glass substrate, and a transparent conducting film I (5) with 100 omega of sheet resistance is arranged on the transparent passivation layer (4); a transparent shadow-eliminating layer (6) is arranged on the air surface (3) of the glass substrate, and a transparent conducting film II (7) with 250 omega of sheet resistance is arranged on the transparent shadow-eliminating layer (6). The two-sided film-coated conductive glass can protect an indium tin oxide conducting film etching line from being etched by an acid solution in the manufacturing process, has good electromagnetic shielding and shadow eliminating effects, and is low in energy consumption, high in uniformity and low in cost.
Description
Technical field
The utility model relates to the electro-conductive glass technical field, relates in particular to a kind of capacitance plate double-sided coating electro-conductive glass.
Background technology
At present, the capacitance plate product uses very extensive, and the two-sided plating electro-conductive glass in capacitance plate is its main devices, and the conductive film of two-sided plating electro-conductive glass requires tighter at aspect of performance, such as homogeneity, heat resistance, acid-proof alkaline, high-temp resisting high-humidity resisting performance etc.; When making transparent circuitry, because technology difficulty increases, often adopt harsh circuit at the making circuit.In manufacturing process, easily etch away not should etching the position, and have the etched erosion trace of circuit track, affect its electromagnetic screen, electrostatic protection function, the erosion trace track of existence can exert an influence to viewing graphic pattern.
The utility model content
The purpose of this utility model provides a kind of capacitance plate double-sided coating electro-conductive glass for existing weak point in above-mentioned prior art just.
The purpose of this utility model can realize by following technique measures:
Capacitance plate of the present utility model includes glass substrate with the double-sided coating electro-conductive glass, two surfaces of described glass substrate are respectively tin face and air surface, be provided with transparent passivation layer on the described tin face of glass substrate, and to have sheet resistance on described transparent passivation layer be 100 nesa coating I; Be provided with the transparent shadow layer that disappears on the described air surface of glass substrate, and to have sheet resistance on the described transparent shadow layer that disappears be 250 nesa coating II.
Transparent passivation layer described in the utility model is transparent silicon dioxide layer or transparent silicon oxynitride layer.
The transparent shadow layer that disappears described in the utility model is transparent silicon dioxide layer and transparent niobium pentaoxide layer formation; Wherein, described transparent silicon dioxide layer is positioned on the described air surface of glass substrate, on described transparent niobium pentaoxide layer, described nesa coating II is set.
Nesa coating I described in the utility model, nesa coating II are indium tin oxide conductive film.
The beneficial effects of the utility model are as follows:
Transparent passivation layer and the transparent shadow layer that disappears that capacitance plate of the present utility model has with the double-sided coating electro-conductive glass, can protect indium tin oxide conductive film etching circuit, do not made the etching of the acid solution in process, avoid etching away in manufacturing process not should etching the position, make indium tin oxide conductive film etching circuit reach designing requirement in manufacturing process, distance between centers of tracks can reach the 5-10 micron; Has good electromagnetic screen and the shadow effect that disappears.Can replace existing conventional conductive glass fully, for the downstream client provides low power consuming, high uniformity, capacitance plate electro-conductive glass cheaply.
Description of drawings
Fig. 1 is for being schematic diagram of the present utility model.
In figure: 1, glass substrate, 2, the tin face, 3, air surface, 4, transparent passivation layer, 5, the nesa coating I, 6, the transparent shadow layer that disappears, 7, the nesa coating II.
Embodiment
Below in conjunction with drawings and Examples, the utility model is elaborated.
As shown in Figure 1, a kind of capacitance plate double-sided coating electro-conductive glass, include glass substrate 1, two surfaces of described glass substrate 1 are respectively tin face 2 and air surface 3, be provided with transparent passivation layer 4 on the described tin face 2 of glass substrate, and to have sheet resistance on described transparent passivation layer 4 be 100 nesa coating I 5; Be provided with the transparent shadow layer 6 that disappears on the described air surface 3 of glass substrate, and to have sheet resistance on the described transparent shadow layer 6 that disappears be 250 nesa coating II 7.Described glass substrate 1 is the thick ultrawhite sheet glass of 0.4mm.
Described transparent passivation layer 4 is transparent silicon dioxide layer or transparent silicon oxynitride layer.The described transparent shadow layer 6 that disappears is transparent silicon dioxide layer and transparent niobium pentaoxide layer formation; Wherein, described transparent silicon dioxide layer is positioned on the described air surface 3 of glass substrate, on described transparent niobium pentaoxide layer, described nesa coating II 7 is set.
Described nesa coating I 5, nesa coating II 7 are indium tin oxide conductive film, and the thickness of indium tin oxide conductive film is 25nm ± 1nm.
Described transparent passivation layer 4 is set directly on described glass substrate 1, is used for preventing that the indium tin oxide conductive film of the section that is located thereon and described glass substrate 1 from spreading, and affects optics and electrical properties.Described indium tin oxide conductive film is used for making various electrically conducting transparent circuits.The described transparent shadow layer 6 that disappears is used for eliminating the etching conductive circuit to the impact of display pattern.
Claims (4)
1. a capacitance plate double-sided coating electro-conductive glass, include glass substrate (1), and two surfaces of described glass substrate (1) are respectively tin face (2) and air surface (3); It is characterized in that: be provided with transparent passivation layer (4) on the described tin face (2) of glass substrate, and to have sheet resistance on described transparent passivation layer (4) be 100 nesa coating I (5); Be provided with the transparent shadow layer (6) that disappears on the described air surface (3) of glass substrate, and to have sheet resistance on the described transparent shadow layer (6) that disappears be 250 nesa coating II (7).
2. according to a kind of capacitance plate double-sided coating electro-conductive glass claimed in claim 1, it is characterized in that: described transparent passivation layer (4) is transparent silicon dioxide layer or transparent silicon oxynitride layer.
3. according to a kind of capacitance plate double-sided coating electro-conductive glass claimed in claim 1, it is characterized in that: the described transparent shadow layer (6) that disappears is transparent silicon dioxide layer and transparent niobium pentaoxide layer formation; Wherein, described transparent silicon dioxide layer is positioned on the described air surface (3) of glass substrate, on described transparent niobium pentaoxide layer, described nesa coating II (7) is set.
4. according to a kind of capacitance plate double-sided coating electro-conductive glass claimed in claim 1, it is characterized in that: described nesa coating I (5), nesa coating II (7) are indium tin oxide conductive film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320249817 CN203276237U (en) | 2013-05-10 | 2013-05-10 | Two-sided film-coated conductive glass for capacitive screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320249817 CN203276237U (en) | 2013-05-10 | 2013-05-10 | Two-sided film-coated conductive glass for capacitive screen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203276237U true CN203276237U (en) | 2013-11-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320249817 Expired - Lifetime CN203276237U (en) | 2013-05-10 | 2013-05-10 | Two-sided film-coated conductive glass for capacitive screen |
Country Status (1)
| Country | Link |
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| CN (1) | CN203276237U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103218102A (en) * | 2013-05-10 | 2013-07-24 | 洛阳恒兆电子有限公司 | Method for machining double-sided coated glass for capacitive screen and double-sided coated glass |
| CN105236770A (en) * | 2015-10-19 | 2016-01-13 | 洛阳康耀电子有限公司 | Machining method of double-face touch screen shadow eliminating conducting glass |
| WO2016141664A1 (en) * | 2015-03-11 | 2016-09-15 | 京东方科技集团股份有限公司 | Shadow elimination structure, touch screen and preparation method thereof |
-
2013
- 2013-05-10 CN CN 201320249817 patent/CN203276237U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103218102A (en) * | 2013-05-10 | 2013-07-24 | 洛阳恒兆电子有限公司 | Method for machining double-sided coated glass for capacitive screen and double-sided coated glass |
| CN103218102B (en) * | 2013-05-10 | 2015-11-18 | 洛阳康耀电子有限公司 | A kind of job operation of capacitance plate double-sided coated glass and double-sided coated glass |
| WO2016141664A1 (en) * | 2015-03-11 | 2016-09-15 | 京东方科技集团股份有限公司 | Shadow elimination structure, touch screen and preparation method thereof |
| US10198134B2 (en) | 2015-03-11 | 2019-02-05 | Boe Technology Group Co., Ltd. | Shadow elimination arrangement, touch screen and method for producing the same |
| CN105236770A (en) * | 2015-10-19 | 2016-01-13 | 洛阳康耀电子有限公司 | Machining method of double-face touch screen shadow eliminating conducting glass |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20131106 |