CN203276239U - Double-faced plating conductive glass used for mutual-induction type inductance capacitive screen - Google Patents
Double-faced plating conductive glass used for mutual-induction type inductance capacitive screen Download PDFInfo
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- CN203276239U CN203276239U CN 201320249844 CN201320249844U CN203276239U CN 203276239 U CN203276239 U CN 203276239U CN 201320249844 CN201320249844 CN 201320249844 CN 201320249844 U CN201320249844 U CN 201320249844U CN 203276239 U CN203276239 U CN 203276239U
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Abstract
The utility model relates to the technical field of conductive glass and discloses double-faced plating conductive glass used for a mutual-induction type inductance capacitive screen. The double-faced plating conductive glass used for the mutual-induction type inductance capacitive screen comprises a glass substrate, wherein the two surfaces of the glass substrate are a tin surface (2) and an air surface (3) respectively, a transparent passivation layer (4) is arranged on the tin surface of the glass substrate, a transparent conducting film I (5), the sheet resistance of which is 50 Omega, is arranged on the transparent passivation layer (4), a transparent disapparation layer (6) is arranged on the air surface (3) of the glass substrate, and a transparent conducting film II (7), the sheet resistance of which is 50 Omega, is arranged on the transparent disapparation layer (6). The double-faced plating conductive glass can protect an ITO (indium tin oxide) conducting film corrosion circuit from being etched by an acid solution during the manufacturing process, has excellent functions of electromagnetic shielding, electrostatic protection and disapparation, can completely replace the existing traditional conductive glass, and the double-faced plating conductive glass used for the mutual-induction type inductance capacitive screen, which has the advantages of low energy consumption, high uniformity and low cost, is provided for a downstream user.
Description
Technical field
The utility model relates to the electro-conductive glass technical field, relates in particular to a kind of mutual inductance type capacitance plate with two-sided plating electro-conductive glass.
Background technology
At present, the capacitance plate product uses very extensive, and the two-sided plating electro-conductive glass in capacitance plate is its main devices, and the conductive film of two-sided plating electro-conductive glass requires tighter at aspect of performance, such as homogeneity, heat resistance, acid-proof alkaline, high-temp resisting high-humidity resisting performance etc.; When making transparent circuitry, because technology difficulty increases, often adopt harsh circuit at the making circuit.In manufacturing process, easily etch away not should etching the position, and have the etched erosion trace of circuit track, affect its electromagnetic screen, electrostatic protection function, the erosion trace track of existence can exert an influence to viewing graphic pattern.
The utility model content
The purpose of this utility model provides a kind of mutual inductance type capacitance plate with two-sided plating electro-conductive glass just for existing weak point in above-mentioned prior art.
The purpose of this utility model can realize by following technique measures:
Mutual inductance type capacitance plate of the present utility model includes glass substrate with two-sided plating electro-conductive glass, and two surfaces of described glass substrate are respectively tin face and air surface; Be provided with transparent passivation layer on the described tin face of glass substrate, and to have sheet resistance on described transparent passivation layer be 50 nesa coating I; Be provided with the transparent shadow layer that disappears on the described air surface of glass substrate, and to have sheet resistance on the described transparent shadow layer that disappears be 50 nesa coating II.
Transparent passivation layer described in the utility model is transparent silicon dioxide layer or transparent silicon oxynitride layer.
The transparent shadow layer that disappears described in the utility model is transparent silicon dioxide layer and transparent niobium pentaoxide layer formation; Wherein, described transparent silicon dioxide layer is positioned on the described air surface of glass substrate, on described transparent niobium pentaoxide layer, described nesa coating II is set.
Nesa coating I described in the utility model, nesa coating II are indium tin oxide conductive film.
The beneficial effects of the utility model are as follows:
Mutual inductance type capacitance plate of the present utility model is with two-sided plating electro-conductive glass, the transparent passivation layer that has and the transparent shadow layer that disappears, can protect indium tin oxide conductive film etching circuit, do not made the etching of the acid solution in process, avoid etching away in manufacturing process not should etching the position, make indium tin oxide conductive film etching circuit reach designing requirement in manufacturing process, distance between centers of tracks can reach the 5-10 micron; Has good electromagnetic screen and the shadow effect that disappears.And can replace existing conventional conductive glass fully, for the downstream client provides low power consuming, high uniformity, makes cheaply the two-sided plating electro-conductive glass of capacitance plate product.
Description of drawings
Fig. 1 is for being schematic diagram of the present utility model.
In figure: 1, glass substrate, 2, the tin face, 3, air surface, 4, transparent passivation layer, 5, the nesa coating I, 6, the transparent shadow layer that disappears, 7, the nesa coating II.
Embodiment
Below in conjunction with drawings and Examples, the utility model is elaborated.
As shown in Figure 1, a kind of mutual inductance type capacitance plate is with two-sided plating electro-conductive glass, include glass substrate 1, two surfaces of described glass substrate 1 are respectively tin face 2 and air surface 3, be provided with transparent passivation layer 4 on the described tin face 2 of glass substrate, and to have sheet resistance on described transparent passivation layer 4 be 50 nesa coating I 5; Be provided with the transparent shadow layer 6 that disappears on the described air surface 3 of glass substrate, and to have sheet resistance on the described transparent shadow layer 6 that disappears be 50 nesa coating II 7.Described glass substrate 1 is the thick ultrawhite sheet glass of 0.55mm.
Described transparent passivation layer 4 is transparent silicon dioxide layer or transparent silicon oxynitride layer.The described transparent shadow layer that disappears is transparent silicon dioxide layer and transparent niobium pentaoxide layer formation; Wherein, described transparent silicon dioxide layer is positioned on the described air surface 3 of glass substrate, on described transparent niobium pentaoxide layer, described nesa coating II 7 is set.
Described nesa coating I 5, nesa coating II 7 are indium tin oxide conductive film, and the thickness of indium tin oxide conductive film is 25nm ± 1nm.
Described transparent passivation layer 4 is set directly on described glass substrate 1, is used for preventing that the indium tin oxide conductive film of the section that is located thereon and described glass substrate 1 from spreading, and affects optics and electrical properties.Described indium tin oxide conductive film is used for making various conducting wires.The described transparent shadow layer 6 that disappears is used for eliminating the etching conductive circuit to the impact of display pattern.
Claims (4)
1. a mutual inductance type capacitance plate with two-sided plating electro-conductive glass, includes glass substrate (1), and two surfaces of described glass substrate (1) are respectively tin face (2) and air surface (3); It is characterized in that: be provided with transparent passivation layer (4) on the described tin face (2) of glass substrate, and to have sheet resistance on described transparent passivation layer (4) be 50 nesa coating I (5); Be provided with the transparent shadow layer (6) that disappears on the described air surface (3) of glass substrate, and to have sheet resistance on the described transparent shadow layer (6) that disappears be 50 nesa coating II (7).
According to mutual inductance type capacitance plate claimed in claim 1 with two-sided plating electro-conductive glass, it is characterized in that: described transparent passivation layer (4) is transparent silicon dioxide layer or transparent silicon oxynitride layer.
According to mutual inductance type capacitance plate claimed in claim 1 with two-sided plating electro-conductive glass, it is characterized in that: the described transparent shadow layer (6) that disappears consists of for transparent silicon dioxide layer and transparent niobium pentaoxide layer; Wherein, described transparent silicon dioxide layer is positioned on the described air surface (3) of glass substrate, on described transparent niobium pentaoxide layer, described nesa coating II (7) is set.
According to mutual inductance type capacitance plate claimed in claim 1 with two-sided plating electro-conductive glass, it is characterized in that: described nesa coating I (5), nesa coating II (7) are indium tin oxide conductive film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320249844 CN203276239U (en) | 2013-05-10 | 2013-05-10 | Double-faced plating conductive glass used for mutual-induction type inductance capacitive screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320249844 CN203276239U (en) | 2013-05-10 | 2013-05-10 | Double-faced plating conductive glass used for mutual-induction type inductance capacitive screen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203276239U true CN203276239U (en) | 2013-11-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320249844 Expired - Lifetime CN203276239U (en) | 2013-05-10 | 2013-05-10 | Double-faced plating conductive glass used for mutual-induction type inductance capacitive screen |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203276239U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103218102A (en) * | 2013-05-10 | 2013-07-24 | 洛阳恒兆电子有限公司 | Method for machining double-sided coated glass for capacitive screen and double-sided coated glass |
| CN106406615A (en) * | 2016-09-19 | 2017-02-15 | 广州视源电子科技股份有限公司 | Manufacturing method of TDR touch screen |
-
2013
- 2013-05-10 CN CN 201320249844 patent/CN203276239U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103218102A (en) * | 2013-05-10 | 2013-07-24 | 洛阳恒兆电子有限公司 | Method for machining double-sided coated glass for capacitive screen and double-sided coated glass |
| CN103218102B (en) * | 2013-05-10 | 2015-11-18 | 洛阳康耀电子有限公司 | A kind of job operation of capacitance plate double-sided coated glass and double-sided coated glass |
| CN106406615A (en) * | 2016-09-19 | 2017-02-15 | 广州视源电子科技股份有限公司 | Manufacturing method of TDR touch screen |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20131106 |
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| CX01 | Expiry of patent term |