CN205068341U - Touch -sensitive screen single face shadow conductive glass that disappears - Google Patents
Touch -sensitive screen single face shadow conductive glass that disappears Download PDFInfo
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- CN205068341U CN205068341U CN201520825954.6U CN201520825954U CN205068341U CN 205068341 U CN205068341 U CN 205068341U CN 201520825954 U CN201520825954 U CN 201520825954U CN 205068341 U CN205068341 U CN 205068341U
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Abstract
The utility model provides a touch -sensitive screen single face shadow conductive glass that disappears, be by: go up glass substrate, tin face, air face, go up interfere layer no. 1, go up transparent passivation layer, go up interfere layer no. 2, down glass substrate, interfere layer, ITO membrane to constitute down, set up the ITO membrane below the interference that going up glass substrate and being tin face and air face with two surfaces of glass substrate down, the air of going up glass substrate and glass substrate down is in the face of laminating, and the tin face top of going up glass substrate sets up interferes layer no. 1, goes up and interferes layer no. 1 and last interferences layer to set up transparent passivation layer between two, goes up and interferes two top on the layer to set up the ITO membrane, and lower glass substrate's tin face below sets up down interference layer under, layer, the effect of good electromagnetic shield, electrostatic protection and the shadow that disappears has to traditional conductive glass of having now can be replaced completely, conductive glass is used for the low reaches customer provides low power consuming, high uniformity, low -cost preparation electric capacity screen.
Description
Technical field
The utility model relates to electro-conductive glass technical field, and especially a kind of touch-screen one side disappears shadow electro-conductive glass.
Background technology
At present, capacitance plate product uses widely, and the two-sided plating electro-conductive glass in capacitance plate is its main devices, the conductive film of two-sided plating electro-conductive glass requires relatively tighter at aspect of performance, such as homogeneity, heat resistance, acid-proof alkaline, high-temp resisting high-humidity resisting performance etc.; When making transparent circuitry, because technology difficulty increases, often adopt harsh circuit at making circuit.In manufacturing process, easily etch away the position that should not etch, and there is the erosion trace track of circuit etch, affect its electromagnetic screen, electrostatic protection function, the erosion trace track of existence can have an impact to viewing graphic pattern.
In view of the foregoing, now develop a kind of touch-screen one side to disappear shadow electro-conductive glass.
Utility model content
The purpose of this utility model is to overcome deficiency of the prior art, a kind of touch-screen one side is provided to disappear shadow electro-conductive glass, there is good electromagnetic screen, electrostatic defending and the shadow effect that disappears, and existing conventional conductive glass can be replaced completely, for downstream client provides the making capacitance plate electro-conductive glass of low power consuming, high uniformity, low cost.
The utility model to achieve these goals, adopt following technical scheme: a kind of touch-screen one side disappears shadow electro-conductive glass, be by: top glass substrate, tin face, air surface, upper interfering layer one, upper transparent passivating layer, upper interfering layer two, lower glass substrate, lower interfering layer, ito film are formed; Two surfaces of top glass substrate and lower glass substrate are tin face and air surface, the air surface correspondence laminating of top glass substrate and lower glass substrate, above the tin face of top glass substrate, interfering layer one is set, between upper interfering layer one and upper interfering layer two, transparent passivating layer is set, above upper interfering layer two, ito film is set, below the tin face of lower glass substrate, lower interfering layer is set, below lower interfering layer, ito film is set.
Described upper transparent passivating layer adopts transparent silicon dioxide or transparent silicon oxynitride.
Described upper interfering layer one, upper interfering layer two, lower interfering layer all adopt niobium pentaoxide.
Process principle:
The first step, processes top glass substrate and lower glass substrate,
A, top glass substrate and lower glass substrate to be cut, first X cutting, then Y cutting, and then break sheet process;
B, to cutting after top glass substrate and lower glass substrate carry out edging and chamfering, first X edging chamfering again, half-twist is again to Y edging and chamfering;
C, scrub and dry up;
D, polishing is carried out to the top glass substrate after edging and chamfering and lower glass substrate;
E, scrub and dry up again;
Second step, to top glass substrate and lower glass substrate sputtering upper interfering layer one, upper transparent passivating layer, lower interfering layer;
A, polishing scrubbed dry up rear top glass substrate and lower glass substrate and to be bonded together along air surface and to heat; The heating-up temperature adopted is 150-280 degree Celsius;
B, utilize magnetic control sputtering vacuum coating equipment to the upper interfering layer one of sputtering above the tin face of the top glass substrate upper surface after heating, upper interfering layer one adopts niobium pentaoxide, the upper transparent passivating layer of sputtering above upper interfering layer one, upper transparent passivating layer adopts transparent silicon dioxide or transparent silicon oxynitride, the lower interfering layer of sputtering below the tin face of lower glass substrate lower surface, lower interfering layer adopts niobium pentaoxide;
3rd step, interfering layer two and ito film sputtering on the basis that top glass substrate and lower glass substrate second step sputter is carried out;
A, to second step sputtering after top glass substrate and lower glass substrate heat; Heating-up temperature adopts 280-380 degree Celsius;
B, utilize magnetic control sputtering vacuum coating equipment, to the top glass substrate after heating and lower glass substrate sputtering, interfering layer two in sputtering above the upper transparent passivating layer of top glass substrate, upper interfering layer two adopts niobium pentaoxide, sputtering ITO film above upper interfering layer two, sputtering ITO film below lower interfering layer;
C, to the top glass substrate after sputtering ITO film and lower glass substrate, do annealing in process through surge chamber: be first cooled to 200 degrees Celsius, then heat to 300 degrees Celsius and stablize, complete the plated film to top glass substrate and lower glass substrate.
The beneficial effects of the utility model are: the utility model can protect indium tin oxide conductive film to etch circuit; not by the etching of the acid solution made in process; avoid in manufacturing process, etch away the position that should not etch; in manufacturing process, make indium tin oxide conductive film etch circuit reach designing requirement; there is good electromagnetic screen, electrostatic defending and the shadow effect that disappears; and existing conventional conductive glass can be replaced completely, for downstream client provides the making capacitance plate electro-conductive glass of low power consuming, high uniformity, low cost.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, the utility model is described in further detail:
Fig. 1 is, general assembly structural representation;
In Fig. 1: top glass substrate 1, tin face 2, air surface 3, upper interfering layer 1, upper transparent passivating layer 5, upper interfering layer 26, lower glass substrate 7, lower interfering layer 8, ito film 9.
Embodiment
Below in conjunction with accompanying drawing and embodiment, the utility model is described in further detail:
As shown in the figure, two surfaces of top glass substrate 1 and lower glass substrate 7 are tin face 2 and air surface 3, the air surface 3 correspondence laminating of top glass substrate 1 and lower glass substrate 7, above the tin face 2 of top glass substrate 1, interfering layer 1 is set, between upper interfering layer 1 and upper interfering layer 26, transparent passivating layer 5 is set, above upper interfering layer 26, ito film 9 is set, below the tin face 2 of lower glass substrate 7, lower interfering layer 8 is set, below lower interfering layer 8, ito film 9 is set.
Described upper transparent passivating layer 5 adopts transparent silicon dioxide or transparent silicon oxynitride.
Described upper interfering layer 1, upper interfering layer 26, lower interfering layer 8 all adopt niobium pentaoxide.
Claims (3)
1. touch-screen one side disappears a shadow electro-conductive glass, be by: top glass substrate (1), tin face (2), air surface (3), upper interfering layer one (4), upper transparent passivating layer (5), upper interfering layer two (6), lower glass substrate (7), lower interfering layer (8), ito film (9) are formed, it is characterized in that: two surfaces of top glass substrate (1) and lower glass substrate (7) are tin face (2) and air surface (3), air surface (3) the correspondence laminating of top glass substrate (1) and lower glass substrate (7), the top, tin face (2) of top glass substrate (1) arranges interfering layer one (4), transparent passivating layer (5) is set between upper interfering layer one (4) and upper interfering layer two (6), upper interfering layer two (6) top arranges ito film (9), the below, tin face (2) of lower glass substrate (7) arranges lower interfering layer (8), lower interfering layer (8) below arranges ito film (9).
2. a kind of touch-screen one side according to claim 1 disappears shadow electro-conductive glass, it is characterized in that: described upper transparent passivating layer (5) adopts transparent silicon dioxide or transparent silicon oxynitride.
3. a kind of touch-screen one side according to claim 1 disappears shadow electro-conductive glass, it is characterized in that: described upper interfering layer one (4), upper interfering layer two (6), lower interfering layer (8) all adopt niobium pentaoxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520825954.6U CN205068341U (en) | 2015-10-19 | 2015-10-19 | Touch -sensitive screen single face shadow conductive glass that disappears |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520825954.6U CN205068341U (en) | 2015-10-19 | 2015-10-19 | Touch -sensitive screen single face shadow conductive glass that disappears |
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| Publication Number | Publication Date |
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| CN205068341U true CN205068341U (en) | 2016-03-02 |
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| CN201520825954.6U Active CN205068341U (en) | 2015-10-19 | 2015-10-19 | Touch -sensitive screen single face shadow conductive glass that disappears |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106095213A (en) * | 2016-08-09 | 2016-11-09 | 洛阳康耀电子有限公司 | A kind of half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass |
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2015
- 2015-10-19 CN CN201520825954.6U patent/CN205068341U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106095213A (en) * | 2016-08-09 | 2016-11-09 | 洛阳康耀电子有限公司 | A kind of half-reflection and half-transmission touch screen disappears the processing method of shadow electro-conductive glass |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |