CN101599315A - A kind of transparent conductive material of resistive touch screen - Google Patents
A kind of transparent conductive material of resistive touch screen Download PDFInfo
- Publication number
- CN101599315A CN101599315A CNA2009101077955A CN200910107795A CN101599315A CN 101599315 A CN101599315 A CN 101599315A CN A2009101077955 A CNA2009101077955 A CN A2009101077955A CN 200910107795 A CN200910107795 A CN 200910107795A CN 101599315 A CN101599315 A CN 101599315A
- Authority
- CN
- China
- Prior art keywords
- transparent conductive
- conductive material
- touch screen
- thin film
- resistive touch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Laminated Bodies (AREA)
- Position Input By Displaying (AREA)
Abstract
The invention discloses a kind of transparent conductive material of suitable resistive touch screen.It comprises three layers of optical thin film of PETG (PET) base material and substrate surface.From substrate surface, three layers of optical thin film are high index of refraction dielectric optical thin film, low-refraction dielectric optical thin film and transparent conductive film successively.By three layers of optical thin film design, this transparent conductive material especially in 400～490nm scope, has anti-reflection effect in the visible waveband less than 490nm.The square resistance rate of this transparent conductive material is 200～600 Ω/.Its physical characteristic is convenient to the preparation and the quality-improving of resistive touch screen.
Description
Technical field
The present invention relates to a kind of is the transparent conductive material of base material with flexible PETG (PET), and it applies to resistive touch screen.
Background technology
Touch-screen is a kind of remarkable input equipment that improves man machine operation interface, have intuitively, simply, advantage efficiently.Along with development of electronic technology, the use of touch screen is more and more general.In the past, various types of touch-screens constantly occur, and comprise resistance-type, condenser type, infrared and surface acoustic wave type touch-screen.Wherein, resistive touch screen is the market mainstream.The core of resistive touch screen is two-layer transparent conductive material.There is TCO Film ﹠amp in the compound mode of this two-layer transparent conductive material; TCO Film and TCOFilm ﹠amp; Two kinds of structures of TCO Glass (TCO is the abbreviation of transparent conductive oxides).TCO Film and TCO Glass adopt to deposit In2O3:Sn (being called for short ITO) film on transparent base.Ito thin film has that light transmission is good, resistivity is low, easy etching and easy advantage such as low temperature preparation.The square resistance that is applied to the ito thin film in the resistive touch screen has specific requirement, and its Standard resistance range is 200～1000 Ω/.In order to obtain desired square resistance, the thin thickness of nesa coating has the high characteristic that sees through, and still often causes the face impedance inhomogeneous, and environmental stability is poor.And in the ITO film that generally uses on the market, although their transmitance height because the intrinsic of ITO self absorbs problem, causes its ubiquity to see through the yellowing problem, this has influenced the outward appearance visual effect of touch-screen.
Recently, resistive touch screen has developed and had the multi-point touch function, and is the same with capacitive touch screen, can realize amplifying by simple action, dwindles, complicated operations such as rotation, has extensive market prospects.It realizes that principle is that the working face of touch-screen carries out subregion to be handled, and makes it to discern the multiple point touching that exists on the touch-screen with the ito thin film employing matrix design of the resistive touch screen of matching test principle.In preparation, between the matrix unit of ito thin film and the matrix unit the etched gap that forms insulation.Because gap width is very narrow, and the high-permeability of ito thin film, when carrying out multiple accurate printing on the ITO surface, the location is difficulty very.Although around printing zone, designed the printing target as witness marker, but prolongation along with printing time, repeat function between the scraper of printing press and its net, cause the net distortion, the orientation problem on the ITO film surface that exists is particularly evident at this moment at present, has hindered the quality control of multi-touch resistance-type touch-screen.In the multi-touch resistance-type touch-screen; in order to obtain the ito thin film membrane structure of matrix form, be by mode of printing at the ito thin film surface printing a kind of acid resistance protection printing ink, covering needs the ito thin film that keeps; exposing needs etched ito thin film, forms by the acid solution etching then.Because these acid resistance protection printing ink belong to oily matter; with the acid solution non-infiltration; gap between the aforesaid matrix unit is very narrow; therefore; gap between acid-proof ink also is very little, and under capillary effect, acid solution is not easy to contact with exposed ito thin film; usually occur to be etched into the problem of insulation fully, cause yield very low.
Summary of the invention
The problems referred to above that in the preparation of touch-screen, exist in view of the ito thin film that generally uses at present, the invention provides a kind of transparent conductive material that is used for resistive touch screen, be convenient to the preparation and the quality-improving of resistive touch screen,, the invention provides a kind of transparent conductive material for realizing above-mentioned target:
A kind of transparent conductive material of suitable resistive touch screen, it by flexible and transparent base material PETG (PET) (6), with and the surface successively the deposition ground floor optical thin film (7), second layer optical thin film (8) and the 3rd layer of transparent conductive film (9) form.
Wherein, described transparent conductive material in the visible waveband less than 490nm, especially in 400～490nm scope, has anti-reflection effect, and its square resistance magnitude range is 200～600 Ω/, preferred 300～500 Ω/.
Wherein, described PET (6), it can also can be the complex of double-layer PET for single-layer PET.
Wherein, described ground floor optical thin film (7) is the high index of refraction thin dielectric film, and ranges of indices of refraction is 2.0～2.4, and its material can be TiO2, Nb2O5, Ta2O5, ZrO2 etc., preferred TiO2, Nb2O5, and its thickness range is 10～30nm.
Wherein, described second layer optical thin film (8) is the low-refraction thin dielectric film, and ranges of indices of refraction is 1.38～1.6, and its material can be SiO2, MgF2 etc., preferred SiO2, and its thickness range is 50～100nm.
Wherein, described the 3rd layer of transparent conductive film (9), its material is ITO, its thickness range is 10～20nm.
Wherein, described plural layers adopt the preparation of low temperature magnetic sputtering technology.
Transparent conductive material of the present invention especially in 400～490nm scope, has anti-reflection effect in the visible waveband less than 490nm; Its square resistance rate is 200～600 Ω/, preferred 300～500 Ω/.Base material can also can be the complex of double-layer PET for single-layer PET, and its surface can exist sclerosis and processing such as anti-dazzle.Three layers of optical thin film of transparent conductive material are from substrate surface, are ground floor, the second layer and the 3rd layer successively.Ground floor is a high index of refraction thin dielectric film, and its ranges of indices of refraction is 2.0～2.4, and thickness range is 10～30nm, and can select material is TiO2, Nb2O5, Ta2O5 etc., preferred TiO2 and Nb2O5; The second layer is a low-refraction thin dielectric film, and its ranges of indices of refraction is, thickness range is 50～100nm, and can select material is SiO2, MgF2, SrF2 etc., preferred SiO2; The 3rd layer is ito thin film, and thickness range is 10～20nm.In the present invention, the low temperature magnetic sputtering technology is adopted in the preparation of multilayer optical film, and wherein, ito thin film is in the imperfect state of crystallization.
Transparent conductive material of the present invention prepares resistive touch screen, has following advantage:
1, ito thin film is not directly to be deposited on the pet sheet face, have certain thickness dielectric optical thin film surface but be deposited on, therefore, the surperficial ito thin film good uniformity of transparent conductive material of the present invention, its face impedance unanimity has improved the linearity of resistive touch screen.
2, transparent conductive material is in the visible waveband less than 490nm, especially in 400～490nm scope, has anti-reflection effect, can offset ito thin film because intrinsic absorbs the low transmission in low band that causes, the light penetration of different-waveband is consistent, eliminate the problem of ito thin film yellowing, promoted the quality of touch-screen.
3, adopted three layers of above-mentioned optical thin film, the reflection of transparent conductive material presents certain color with faint.After etching, the reflection of transparent conductive material becomes colourless.The faint variation of this reflection characteristic makes naked eyes can confirm that ito thin film is by etched edge of acid solution and gap in the preparation process of traditional resistive touch screen especially multi-touch resistance-type touch-screen, distinguish printing quality on the ito thin film surface easily, be convenient to the quality control of product, avoid adopting special inspecting equipment, simplify technical process.
4, because the thin thickness of ito thin film, and adopt the low temperature magnetic sputtering technology, ito thin film is in the imperfect state of crystallization, reacts with acid solution easily and etched, reduces the etching bad phenomenon of touch-screen in preparing.
Description of drawings
Fig. 1 is the transmittance curve of a kind of ITO film commonly used in the resistive touch screen.
Fig. 2 is the two layers of conductive material of multi-touch resistance-type touch-screen, (a) first conductive layer; (b) second conductive layer; (c) two conductive layer combination figure.
Fig. 3 is the structure of transparent conductive material of the present invention.
Fig. 4 is the transmittance curve figure of transparent conductive material of the present invention.
Fig. 5 is the reflectance curve figure of transparent conductive material of the present invention.
Embodiment
Fig. 1 is the transmittance curve of a kind of ITO film commonly used in the resistive touch screen.As can be seen from the figure, the ITO film has and high sees through characteristic, but its transmitance is with the reducing and reduce of wavelength, and in low band, especially the following frequency-range table of blue light reveals absorbing phenomenon, and this absorbing phenomenon is from the intrinsic absorption of ito thin film.This absorbing phenomenon is to cause the ITO film to present the reason of faint yellowing, and it has influenced the appearance that ITO uses.
Recently, the resistive touch screen development has the multi-point touch function, has expanded the function of resistive touch screen, can realize the various operations of capacitive touch screen.The implementation of multi-touch resistance-type touch-screen is that the layer of transparent electric conducting material with resistive touch screen is etched into transverse conductance bar (1), and another layer material is etched into vertical bus (2), and the gap between them is divided into (3) and (4).In circuit control, the transverse conductance bar is connected with touch screen controller by conducting wire (5) respectively with vertical bus.Two-layer transparent conductive material forms the form of matrix, respectively shown in Fig. 2 (a)-(c) by after making up.For the precision that improves resistive touch screen and avoid producing blind area, the narrower in width of the gap among Fig. 2 (3) and (4) ,～0.1mm in the working region of touch-screen.In the preparation of touch-screen, the high-permeability characteristic of this width and ito thin film has hindered the quality testing of touch-screen preparation.
Fig. 3 is the structure of the transparent conductive material that designs of the present invention.Comprise transparent base (6), ground floor optical thin film (7), second layer optical thin film (8) and the 3rd layer of transparent conductive film (9).The material of transparent base (6) is PETG (PET), and in concrete enforcement, it can be that single-layer PET also can be the complex of double-layer PET, and cure process and non-glare treated can be carried out in its surface.Ground floor optical thin film (7) is a high index of refraction thin dielectric film, and its ranges of indices of refraction is 2.0～2.4, and thickness range is 10～30nm, and can select material is TiO2, Nb2O5, Ta2O5 etc., preferred TiO2 and Nb2O5; Second layer optical thin film (8) is a low-refraction thin dielectric film, and its ranges of indices of refraction is 1.38～1.6, and thickness range is 50～100nm, and can select material is SiO2, MgF2, SrF2 etc., preferred SiO2; The 3rd layer of transparent conductive film (9) is ito thin film, and thickness range is 10～20nm.
The low temperature magnetic sputtering technology is adopted in the preparation of multilayered film material.The SiO2 film can adopt Si or SiO2 as target, and TiO2 adopts Ti, TiO or TiO2 to adopt Nb or Nb2O5 as target as target, Nb2O5, and it is 9: 1 ceramic target that ito thin film adopts weight ratio, and the depositing temperature scope is room temperature～150 ℃.Before preparation, three kinds of targets and transparent base (6) are assemblied in the plated film vacuum chamber extracting vacuum then, substrate surface treatment, and plated film.The thickness of thin film deposition is because the detection of online film thickness monitoring.In plated film, by regulating suitable filming parameter, open three targets and simultaneously transparent base is carried out plated film, save time; Also can only open a target at every turn, plated one deck after, open another target again, plate another layer film, plated three-layer thin-film successively, but elapsed time is more.
Among the present invention, ito thin film is not directly to be deposited on the pet sheet face, has certain thickness dielectric optical thin film surface but be deposited on, therefore, the surperficial ito thin film good uniformity of transparent conductive material of the present invention, its face impedance unanimity can improve the linearity of resistive touch screen.The transmitance of the transparent conductive material that Fig. 4 designs for the present invention and the relation of wavelength.As can be seen from the figure, its transmitance is whole to be increased, and can increase to adopt the definition of this transparent material as touch-screen, especially, obviously increases in the transmitance of low band, and this will improve the appearance of touch-screen, avoid the yellowing problem.Because interference effect, the reverberation of this transparent material will present faint color, be convenient to the quality control in the touch-screen preparation process, and its reflection collection of illustrative plates as shown in Figure 5.And transparent conductive material of the present invention is convenient to etching, has improved speed of production and yield.
Claims (7)
1, a kind of transparent conductive material of suitable resistive touch screen, it is characterized in that, it by flexible and transparent base material PETG (PET) (6), with and the surface successively the deposition ground floor optical thin film (7), second layer optical thin film (8) and the 3rd layer of transparent conductive film (9) form.
2, the transparent conductive material of a kind of suitable resistive touch screen as claimed in claim 1, it is characterized in that, described transparent conductive material, in visible waveband less than 490nm, especially in 400～490nm scope, have anti-reflection effect, its square resistance magnitude range is 200～600 Ω/, preferred 300～500 Ω/.
3, the transparent conductive material of a kind of suitable resistive touch screen as claimed in claim 1 is characterized in that, described PET (6), and it can also can be the complex of double-layer PET for single-layer PET.
4, the transparent conductive material of a kind of suitable resistive touch screen as claimed in claim 1, it is characterized in that, described ground floor optical thin film (7) is the high index of refraction thin dielectric film, ranges of indices of refraction is 2.0～2.4, its material can be TiO2, Nb2O5, Ta2O5, ZrO2 etc., preferred TiO2, Nb2O5, its thickness range is 10～30nm.
5, the transparent conductive material of a kind of suitable resistive touch screen as claimed in claim 1, it is characterized in that, described second layer optical thin film (8) is the low-refraction thin dielectric film, ranges of indices of refraction is 1.38～1.6, its material can be SiO2, MgF2 etc., preferred SiO2, its thickness range is 50～100nm.
6, the transparent conductive material of a kind of suitable resistive touch screen as claimed in claim 1 is characterized in that, described the 3rd layer of transparent conductive film (9), and its material is ITO, its thickness range is 10～20nm.
7, the transparent conductive material of a kind of suitable resistive touch screen as claimed in claim 1 is characterized in that, described plural layers adopt the preparation of low temperature magnetic sputtering technology.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2009101077955A CN101599315A (en) | 2009-06-01 | 2009-06-01 | A kind of transparent conductive material of resistive touch screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2009101077955A CN101599315A (en) | 2009-06-01 | 2009-06-01 | A kind of transparent conductive material of resistive touch screen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101599315A true CN101599315A (en) | 2009-12-09 |
Family
ID=41420717
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2009101077955A Pending CN101599315A (en) | 2009-06-01 | 2009-06-01 | A kind of transparent conductive material of resistive touch screen |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101599315A (en) |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102157262A (en) * | 2011-03-10 | 2011-08-17 | 苏州大学 | Method for preparing capacitor with Ta205 thin film as dielectric film |
| CN102324271A (en) * | 2011-10-14 | 2012-01-18 | 南昌欧菲光科技有限公司 | Crystallized type ITO (Indium Tin Oxide) transparent conductive film and preparation method thereof |
| CN102534530A (en) * | 2010-12-15 | 2012-07-04 | 电子科技大学 | Magnetron sputtering preparation method of flexible PET substrate ITO film |
| CN102723128A (en) * | 2012-06-25 | 2012-10-10 | 深圳豪威真空光电子股份有限公司 | Flexible transparent conductive film and manufacturing method thereof and touch panel |
| CN103069505A (en) * | 2010-09-17 | 2013-04-24 | 乐金华奥斯有限公司 | Transparent conductive film with superior visibility and method for producing same |
| CN103218081A (en) * | 2013-04-12 | 2013-07-24 | 深圳欧菲光科技股份有限公司 | Double-layer touch screen and preparation method for same |
| CN103235660A (en) * | 2013-04-12 | 2013-08-07 | 深圳欧菲光科技股份有限公司 | Double-layer touch screen and manufacturing method thereof |
| CN103353815A (en) * | 2013-02-04 | 2013-10-16 | 芜湖长信科技股份有限公司 | Capacitor screen OGS shadow eliminating structure and manufacturing process thereof |
| CN103488369A (en) * | 2013-09-17 | 2014-01-01 | 芜湖长信科技股份有限公司 | Touch screen without chromatic aberration and method for manufacturing touch screen |
| CN103984455A (en) * | 2014-04-06 | 2014-08-13 | 浙江科创新材料科技有限公司 | Extensional physical touch control press key realizing method based on capacitive touch screen, capacitive touch screen using method and capacitive touch screen system |
| CN104078105A (en) * | 2013-03-29 | 2014-10-01 | 琳得科株式会社 | Film for stacking of transparent conductive layer and transparent conductive film |
| CN105845203A (en) * | 2016-05-26 | 2016-08-10 | 中国航空工业集团公司北京航空材料研究院 | Flexible copper grid base transparent conducting thin film |
| CN106637113A (en) * | 2016-11-24 | 2017-05-10 | 合肥昂宇光电科技有限公司 | Method for manufacturing multi-layer optical film on plastic film |
| CN106760363A (en) * | 2017-01-10 | 2017-05-31 | 广州市祺虹电子科技有限公司 | A kind of luminescence transparent decorative panel |
| CN108353521A (en) * | 2015-12-14 | 2018-07-31 | 日东电工株式会社 | Electromagnetic wave absorb and the formed body with electromagnetic wave absorb for having the electromagnetic wave absorb |
| CN111560586A (en) * | 2020-04-30 | 2020-08-21 | 豪威星科薄膜视窗(深圳)有限公司 | Capacitive touch screen coating process and touch screen |
-
2009
- 2009-06-01 CN CNA2009101077955A patent/CN101599315A/en active Pending
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103069505A (en) * | 2010-09-17 | 2013-04-24 | 乐金华奥斯有限公司 | Transparent conductive film with superior visibility and method for producing same |
| CN102534530A (en) * | 2010-12-15 | 2012-07-04 | 电子科技大学 | Magnetron sputtering preparation method of flexible PET substrate ITO film |
| CN102157262A (en) * | 2011-03-10 | 2011-08-17 | 苏州大学 | Method for preparing capacitor with Ta205 thin film as dielectric film |
| CN102157262B (en) * | 2011-03-10 | 2012-09-05 | 苏州大学 | Method for preparing capacitor with Ta205 thin film as dielectric film |
| CN102324271A (en) * | 2011-10-14 | 2012-01-18 | 南昌欧菲光科技有限公司 | Crystallized type ITO (Indium Tin Oxide) transparent conductive film and preparation method thereof |
| CN102723128A (en) * | 2012-06-25 | 2012-10-10 | 深圳豪威真空光电子股份有限公司 | Flexible transparent conductive film and manufacturing method thereof and touch panel |
| CN102723128B (en) * | 2012-06-25 | 2015-02-18 | 深圳豪威真空光电子股份有限公司 | Flexible transparent conductive film and manufacturing method thereof and touch panel |
| CN103353815B (en) * | 2013-02-04 | 2016-12-28 | 芜湖长信科技股份有限公司 | Capacitance plate OGS shadow eliminating structure and manufacturing process thereof |
| CN103353815A (en) * | 2013-02-04 | 2013-10-16 | 芜湖长信科技股份有限公司 | Capacitor screen OGS shadow eliminating structure and manufacturing process thereof |
| CN104078105A (en) * | 2013-03-29 | 2014-10-01 | 琳得科株式会社 | Film for stacking of transparent conductive layer and transparent conductive film |
| CN103218081A (en) * | 2013-04-12 | 2013-07-24 | 深圳欧菲光科技股份有限公司 | Double-layer touch screen and preparation method for same |
| CN103235660A (en) * | 2013-04-12 | 2013-08-07 | 深圳欧菲光科技股份有限公司 | Double-layer touch screen and manufacturing method thereof |
| US9804697B2 (en) | 2013-04-12 | 2017-10-31 | Shenzhen O-Film Tech Co., Ltd. | Double-layer touch screen and method for making the same |
| CN103488369A (en) * | 2013-09-17 | 2014-01-01 | 芜湖长信科技股份有限公司 | Touch screen without chromatic aberration and method for manufacturing touch screen |
| CN103984455A (en) * | 2014-04-06 | 2014-08-13 | 浙江科创新材料科技有限公司 | Extensional physical touch control press key realizing method based on capacitive touch screen, capacitive touch screen using method and capacitive touch screen system |
| CN108353521A (en) * | 2015-12-14 | 2018-07-31 | 日东电工株式会社 | Electromagnetic wave absorb and the formed body with electromagnetic wave absorb for having the electromagnetic wave absorb |
| CN108353521B (en) * | 2015-12-14 | 2019-10-15 | 日东电工株式会社 | Electromagnetic wave absorb and the formed body with electromagnetic wave absorb for having the electromagnetic wave absorb |
| US10701848B2 (en) | 2015-12-14 | 2020-06-30 | Nitto Denko Corporation | Electromagnetic wave absorber and molded article equipped with electromagnetic wave absorber |
| CN105845203A (en) * | 2016-05-26 | 2016-08-10 | 中国航空工业集团公司北京航空材料研究院 | Flexible copper grid base transparent conducting thin film |
| CN106637113A (en) * | 2016-11-24 | 2017-05-10 | 合肥昂宇光电科技有限公司 | Method for manufacturing multi-layer optical film on plastic film |
| CN106760363A (en) * | 2017-01-10 | 2017-05-31 | 广州市祺虹电子科技有限公司 | A kind of luminescence transparent decorative panel |
| CN111560586A (en) * | 2020-04-30 | 2020-08-21 | 豪威星科薄膜视窗(深圳)有限公司 | Capacitive touch screen coating process and touch screen |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101599315A (en) | A kind of transparent conductive material of resistive touch screen | |
| US9674946B2 (en) | Conductive laminate, transparent conductive laminate with patterned wiring, and optical device | |
| CN102253781B (en) | Metal-bridge integrated capacitive touch screen and manufacturing method | |
| EP1892609A1 (en) | Transparent planar body and transparent touch switch | |
| CN103226212B (en) | The one shadow nesa coating that disappears | |
| CN105144045B (en) | Conductive structure and its manufacture method | |
| CN105556618B (en) | The manufacture method of transparent conductive base and transparent conductive base | |
| CN103092416A (en) | Shadow-removing high transmittance glass for one glass solution (OGS) and manufacturing method thereof | |
| CN102541383B (en) | Non-lapping integrated capacitive touch screen without metal electrode layer and manufacturing method for non-lapping integrated capacitive touch screen | |
| KR20120134955A (en) | Touch panel having improved visibility and method for manufacturing the same | |
| CN102152563A (en) | Transparent conductive material | |
| KR101504840B1 (en) | Conducting substrate and method for preparing the same | |
| EP3118728B1 (en) | Projected capacitive touch switch panel | |
| CN104516586A (en) | Touch panel and method for manufacturing the same | |
| CN102629176A (en) | Novel metal bridge integrated capacitive touch screen and manufacture method thereof | |
| CN102637102A (en) | Novel overlapping integral capacitor touch screen and manufacturing method thereof | |
| CN102543266B (en) | Transparent conducting film with copper conductor | |
| CN202711212U (en) | Novel non-metallic electrode layer non-overlapping one-piece capacitive touch screen | |
| CN201718163U (en) | Flexible transparent electromagnetic shielding film | |
| CN104166490A (en) | ITO conducting glass and preparation method thereof | |
| CN203259674U (en) | Shadow-eliminating transparent conductive film | |
| CN204079779U (en) | Ito conductive glass | |
| KR20150000726A (en) | Method for Manufacturing Transparent Conductive Film And the Transparent Conductive Film Manufactured by the Method | |
| CN202711213U (en) | Novel metal gap bridge integrated capacitive touch screen | |
| CN204676000U (en) | A kind of AZO conductive glass and contactor control device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Open date: 20091209 |