CN111560586A - Capacitive touch screen coating process and touch screen - Google Patents
Capacitive touch screen coating process and touch screen Download PDFInfo
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- CN111560586A CN111560586A CN202010364591.6A CN202010364591A CN111560586A CN 111560586 A CN111560586 A CN 111560586A CN 202010364591 A CN202010364591 A CN 202010364591A CN 111560586 A CN111560586 A CN 111560586A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Position Input By Displaying (AREA)
Abstract
The invention discloses a capacitive touch screen coating process and a touch screen, and relates to the technical field of display element processing; the touch screen comprises a base layer, and a ZrOx layer, a silicon dioxide layer and an ITO layer which are sequentially laid on the base layer through target sputtering. According to the invention, an online surface activity enhancement treatment mode is adopted, a crystallization inducing layer is created, ZrOx is adopted as the first layer of the refractive index matching layer, online post-ion source treatment is adopted, the surface activity in contact with the metal layer is activated, the adhesive force of the traditional ITO film to the metal layer is effectively improved, and the screen performance is ensured.
Description
Technical Field
The invention relates to the technical field of display element processing, in particular to a capacitive touch screen coating process and a touch screen.
Background
The frame of an ITO film of an existing capacitive touch screen is generally silver paste lines, and the lines are processed by a screen printing method, but limited by the accuracy of the screen printing, and the line width/line distance (L/S) of the lines is 80/80 micrometers; the touch screen with the structure has a larger frame and a small screen occupation ratio. In order to enlarge the screen ratio and narrow the borders of the touch screen, it is necessary to achieve an L/S of 40/40 microns or 30/30 microns or even 20/20 microns.
Therefore, the silver paste screen printing mode cannot be adopted, and a metal conductive layer, such as a Cu or Cu-containing composite layer or an Al-containing composite layer, needs to be added on the surface of the ITO during film coating. However, after the metal layer is plated on the existing ITO film (without plating the metal conductive layer), poor adhesion of the film layer is easy to occur, and the screen performance is reduced.
Disclosure of Invention
The invention aims to provide a capacitive touch screen coating process to solve the problems that the adhesion of a coating layer is poor and the performance of a screen is affected when a metal layer is coated in the existing coating process.
In order to achieve the purpose, the technical scheme provided by the invention is as follows:
a capacitive touch screen coating process comprises the following steps:
dewatering the base layer, and removing the moisture component on the surface of the base layer;
surface enhancement, enhancing the surface activity of the base layer by glow discharge;
sputtering a first layer of target material, namely sputtering a ZrOx target material on the base layer by adopting ZrOx;
sputtering a second layer of target material, namely sputtering a silicon dioxide target material on the base layer by adopting silicon and oxygen;
sputtering a third layer of target material, namely sputtering an ITO target material on the base layer by adopting ITO;
ion source bombardment treatment, wherein the ITO target material is bombarded by an online linear ion source in vacuum;
and heating, namely performing off-line heating on the base layer and each target after the ion source bombardment treatment.
According to the coating process of the capacitive touch screen, provided by the invention, the crystallization inducing layer is created in an online surface activity enhancement treatment mode, ZrOx is used as the first layer of the refractive index matching layer, and online post-ion source treatment is adopted to activate the surface activity in contact with the metal layer, so that the adhesive force of the traditional ITO film to the metal layer is effectively improved, and the screen performance is ensured.
In addition, the capacitive touch screen coating process according to the embodiment of the invention may further have the following additional technical features:
according to one example of the present invention, the substrate de-watering process is between 120 ℃ below zero and 152 ℃ below zero.
According to an example of the present invention, the glow discharge has a voltage range of 1.0-2.5kV and a current range of 0.7-1.5A.
According to one example of the invention, x in ZrOx is 0.8-0.99.
According to an example of the present invention, the sputtering of the second layer of target material is performed in a protective gas; and/or the ion source bombardment treatment is carried out in a protective gas.
According to an example of the present invention, the ITO includes indium oxide and tin oxide, and a weight ratio of the indium oxide to the tin oxide is in a range of 0.10 to 0.97.
According to one example of the present invention, the weight ratio of the indium oxide to the tin oxide is 0.9.
According to one example of the invention, the heating treatment temperature interval is 140-160 ℃, and the heating time interval is 40-70 min.
The second purpose of the invention is to provide a coated screen, which is processed by the coating process of the capacitive touch screen in the technical scheme, and comprises a base layer, and a ZrOx layer, a silicon dioxide layer and an ITO layer which are sequentially laid on the base layer through target sputtering.
According to one example of the invention, the ZrOx layer is 5-18nm thick; the thickness of the silicon dioxide layer is 30-50 nm; the thickness of the ITO layer is 15-25 nm.
Advantages of the above additional aspects will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention.
Drawings
FIG. 1 is a flow chart of a coating process for a capacitive touch screen according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a touch screen according to an embodiment of the present invention.
In the drawings, the components represented by the respective reference numerals are listed below:
100. a base layer; 200. a ZrOx layer; 300. a silicon dioxide layer; 400. an ITO layer.
Detailed description of the preferred embodiments
The principles and features of this invention are described below in conjunction with the following drawings, which are set forth by way of illustration only and are not intended to limit the scope of the invention.
With reference to fig. 1, the present embodiment provides a capacitive touch screen coating process, which includes the following steps:
the base layer removes water, gets rid of the surperficial moisture weight of base layer, and specifically, the base layer of this embodiment is PET (poly terephthalic acid plastics) base layer.
Surface enhancement, which is to enhance the surface activity of the base layer through glow discharge;
sputtering a first layer of target material, namely sputtering a ZrOx target material on the base layer by adopting ZrOx;
sputtering a second layer of target material, namely sputtering a silicon dioxide target material on the base layer by adopting silicon and oxygen;
sputtering a third layer of target material, namely sputtering an ITO target material on the base layer by adopting ITO;
ion source bombardment treatment, wherein the ITO target material is bombarded by an online linear ion source in vacuum;
and (4) heating, namely performing off-line heating on the base layer and each target after the ion source bombardment treatment.
As a preferred implementation manner of the embodiment of the present invention, in the base layer water removal process of the embodiment, the whole base layer is at a temperature of between 120 ℃ below zero and 152 ℃ below zero, and the water removal process is performed in a non-contact manner, specifically, a low-temperature water air pump (polycold) is used for refrigeration, a refrigeration pipeline is arranged at a position more than 100mm away from the substrate in a vacuum chamber, and during operation, the temperature of the refrigeration pipeline is between-120 ℃ and-150 ℃. Improve dewatering efficiency, guarantee the connection reliability that follow-up rete laid.
As a preferred embodiment of the present invention, the voltage interval of the glow discharge in this embodiment is 1.0 to 2.5kV, the current interval is 0.7 to 1.5A, and the glow discharge (glow discharge) refers to a gas discharge that shows glow in low-pressure gas, i.e., a self-sustaining discharge (self-excited conduction) in a rarefied gas, and the surface activity of the PET base layer is enhanced by using the characteristic of the laser generated by the positive column region of the glow discharge, so as to improve the stability of the subsequent film layer connection.
As a preferred embodiment of the present embodiment, x in ZrOx (rotary zirconia target) of the present embodiment is 1.8 to 1.99. ZrOx is used as an optimized structure of ZrO2, the material is more suitable for magnetron sputtering, on one hand, the conductivity of the target material is increased by utilizing the characteristics of Zr metal, the direct current or intermediate frequency mode can be used (the deposition efficiency of the coating can be increased), and the radio frequency (the deposition efficiency of the coating is lower) is avoided; on the other hand, the oxidation characteristic and the transparency characteristic of the product are utilized to participate in the optical layer of the product.
As a preferred implementation of the embodiment of the present invention, the sputtering of the second layer target of the embodiment is performed in a protective gas; and the ion source bombardment treatment is carried out in the protective gas, wherein the protective gas is preferably Ar (argon), and the stable chemical property of Ar can ensure the effects of sputtering and ion source bombardment treatment.
As a preferred embodiment of the present invention, ITO includes indium oxide and tin oxide, and a weight ratio interval of the indium oxide to the tin oxide is 0.10-0.97.
More preferably, the weight ratio of indium oxide to tin oxide in this embodiment is 0.9: 0.1, the sputtering effect of the target and the adhesive force of the material are optimal.
As a preferred implementation manner of the embodiment of the present invention, the heating treatment temperature interval of the embodiment is 140 ℃ to 160 ℃, the heating time interval is 40min to 70min, and off-line heating is adopted, where the off-line heating is that the product leaves the vacuum environment, and the product is baked and heated in an atmospheric state, so as to perform recombination on the structure of the film layer in a hot state, and improve the visible light transmittance of the product.
With reference to fig. 2, based on the above method, the present embodiment further provides a coated panel, which is processed by the capacitive touch panel coating process according to the above technical solution, and includes a base layer 100, and a ZrOx layer 200, a silicon dioxide layer 300, and an ITO layer 400 sequentially deposited on the base layer by target sputtering.
As a preferred implementation of the embodiment of the invention, the ZrOx layer 200 has a thickness of 5-18 nm; the thickness of the silicon dioxide layer 300 is 30-50 nm; the thickness of the ITO layer 400 is 15-25nm, a product with high visible light transmittance can be obtained through the combination, and the surface resistance of the product can be 100-150 Ohm/square (Ohm/Sqr) through the film layer combination.
In summary, according to the capacitive touch screen and the coating process thereof provided by this embodiment, an online surface activity enhancement processing mode is adopted to create the crystallization inducing layer, ZrOx is adopted as the first layer of the refractive index matching layer, and online post-ion source processing is adopted to activate the surface activity in contact with the metal layer, so as to effectively improve the adhesion of the conventional ITO film to the metal layer and ensure the screen performance.
In the description of the present invention, it is to be understood that the terms "upper", "lower", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the device referred to must have a specific orientation, be constructed and operated in a specific orientation, and should not be construed as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art within the scope of the present invention.
Claims (10)
1. A capacitive touch screen coating process is characterized by comprising the following steps:
dewatering the base layer, and removing the moisture component on the surface of the base layer;
surface enhancement, enhancing the surface activity of the base layer by glow discharge;
sputtering a first layer of target material, namely sputtering a ZrOx target material on the base layer by adopting ZrOx;
sputtering a second layer of target material, namely sputtering a silicon dioxide target material on the base layer by adopting silicon and oxygen;
sputtering a third layer of target material, namely sputtering an ITO target material on the base layer by adopting ITO;
ion source bombardment treatment, wherein the ITO target material is bombarded by an online linear ion source in vacuum;
and heating, namely performing off-line heating on the base layer and each target after the ion source bombardment treatment.
2. The capacitive touch screen coating process according to claim 1, wherein the substrate de-watering process is at a temperature of between-120 ℃ and-152 ℃.
3. The capacitive touch screen coating process according to claim 1, wherein the voltage interval of the glow discharge is 1.0-2.5kV, and the current interval is 0.7-1.5A.
4. The plating process for a capacitive touch screen according to claim 1, wherein x in ZrOx is 1.8-1.99.
5. The capacitive touch screen coating process according to claim 1, wherein the sputtering of the second layer of target material is performed in a protective gas; and/or the ion source bombardment treatment is carried out in a protective gas.
6. The capacitive touch screen coating process according to claim 1, wherein the ITO comprises indium oxide and tin oxide, and the weight ratio of the indium oxide to the tin oxide is in the range of 0.10-0.97.
7. The capacitive touch screen coating process according to claim 6, wherein the weight ratio of the indium oxide to the tin oxide is 0.9.
8. The capacitive touch screen coating process according to claim 1, wherein the heating treatment temperature interval is 140-160 ℃, and the heating time interval is 40-70 min.
9. A coated screen, which is processed by the capacitive touch screen coating process according to any one of claims 1 to 8, and comprises a base layer and a ZrOx layer, a silicon dioxide layer and an ITO layer which are sequentially laid on the base layer by target sputtering.
10. The coated screen of claim 9 wherein the ZrOx layer is 5-18nm thick; the thickness of the silicon dioxide layer is 30-50 nm; the thickness of the ITO layer is 15-25 nm.
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| CN202010364591.6A CN111560586A (en) | 2020-04-30 | 2020-04-30 | Capacitive touch screen coating process and touch screen |
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| CN203276222U (en) * | 2013-05-15 | 2013-11-06 | 南昌欧菲光科技有限公司 | Novel double-side flexible ITO conducting film structure |
| CN103714882A (en) * | 2013-12-07 | 2014-04-09 | 深圳市金凯新瑞光电有限公司 | Production method of Ag-plated conducting film applied to touch panel sensor |
| CN204256704U (en) * | 2014-11-19 | 2015-04-08 | 南昌欧菲光学技术有限公司 | Touch-screen |
| CN105677071A (en) * | 2014-11-19 | 2016-06-15 | 南昌欧菲光学技术有限公司 | Touch screen and manufacture method thereof |
| CN105063557A (en) * | 2015-08-06 | 2015-11-18 | 国营第二二八厂 | Method for directional resistance value increase of ITO conducting film |
| CN106544644A (en) * | 2016-10-27 | 2017-03-29 | 广东星弛光电科技有限公司 | A kind of anti-fingerprint handset touch panel colour coating process |
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