CN201343500Y - High transmission conductive glass for touch screen - Google Patents
High transmission conductive glass for touch screen Download PDFInfo
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- CN201343500Y CN201343500Y CNU2009200374273U CN200920037427U CN201343500Y CN 201343500 Y CN201343500 Y CN 201343500Y CN U2009200374273 U CNU2009200374273 U CN U2009200374273U CN 200920037427 U CN200920037427 U CN 200920037427U CN 201343500 Y CN201343500 Y CN 201343500Y
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Abstract
The utility model discloses high-transmission conductive glass for touch screen, which comprises a glass substrate, wherein the surface of the glass substrate is provided with a silicon oxide filming layer and an indium tin oxide filming layer in turn, and the silicon oxide filming layer is located on the internal layer, the indium tin oxide filming layer is located on the external layer, and a niobium pentoxide filming layer is arranged between the glass substrate and the silicon oxide filming layer. The utility model adopts the niobium pentoxide and the silicon oxide, which have the stable filming refractive index as the optical antireflective dielectric layer, can increase the visible light transmission of the conductive glass over 94% through utilizing the excellent insulation and stable refractive index of the niobium pentoxide and the silicon oxide, and solves the matching problem of the dielectric layer with an ITO conductive layer.
Description
Technical field
The utility model relates to a kind of touch-screen high transmittivity electricity conducting glass.
Background technology
Indium tin oxide-coated glass, it is the ITO conductive glass, especially adopt the ITO conductive glass of planar magnetic control sputtering deposition techniques, since the last century the nineties, be mainly used in the liquid crystal panel glass and the refrigerator-freezer coated glass aspect of liquid-crystal display industry, and the ITO conductive glass that touch-screen is used, it is the base mateiral of touch panel, the ITO conductive glass that the requirement of its opposite resistance and transmitance is used than liquid-crystal display has higher requirement, usually the requirement of face resistance is 150 Ω/mouths, transmitance is more than 89%, it is on thin float glass, under high vacuum environment, deposit the ITO nano thin-film with the planar magnetic control sputtering technology at glass surface, thereby obtain the transmitance height, the glass of good uniformity; And high permeability glass, be mainly used in the optics industry in the past, employing is under high vacuum condition, at thermal evaporation plated film or the laser gun bombardment plated film of carrying out on glass, it is little that its plated film is used area, material therefor is generally magnesium fluoride, titanium dioxide, silicon-dioxide etc., film thickness is thicker, uniformity requirement is lower, and owing to the requirement of use occasion, this class glass does not need the ITO conductive layer certainly, but magnesium fluoride is a kind of material that can not use magnetron sputtering technique to finish, have with the ITO material and to conflict, titanium dioxide also is a kind of magnetron sputtering instability, and the too low material of sputter rate, be unfavorable for large-sized plated film in enormous quantities, therefore to obtain the conductive glass of high permeability, should solve the optical problem that improves transmitance, solve the matching problem of medium layer and ITO conductive layer again.
The utility model content
The purpose of this utility model is: the touch-screen that a kind of display effect is clear, visible light transmissivity is high and conduct electricity very well high transmittivity electricity conducting glass is provided.
The technical scheme that its purpose that realizes the utility model adopts is: a kind of touch-screen high transmittivity electricity conducting glass, comprise glass substrate, glass substrate surface is disposed with silicon-dioxide coatings and indium oxide coating layer, the silicon-dioxide coatings is positioned at internal layer, the indium oxide coating layer is positioned at skin, is provided with the Niobium Pentxoxide coatings between glass substrate and silicon-dioxide coatings.
Specifically, the thickness of described silicon-dioxide coatings is 78～98nm, and the thickness of indium oxide coating layer is 9～11nm, and the thickness of Niobium Pentxoxide coatings is 15～18nm.
The beneficial effects of the utility model are: the utility model selects comparatively stable Niobium Pentxoxide of film forming specific refractory power and silicon-dioxide as the anti-reflection medium layer of optics, utilize Niobium Pentxoxide and silicon-dioxide good insulation performance and stable specific refractory power, the visible light transmissivity of conductive glass is brought up to more than 94%, also solved the matching problem of medium layer and ITO conductive layer.
Description of drawings
Below in conjunction with drawings and Examples the utility model is further specified.
Fig. 1 is a structural representation of the present utility model.
1. glass substrates, 2. silicon-dioxide coatings, 3. indium oxide coating layers, 4. Niobium Pentxoxide coatings among the figure
Embodiment.
With preferred embodiment the utility model is further described in conjunction with the accompanying drawings now.These accompanying drawings are the synoptic diagram of simplification, basic structure of the present utility model only is described in a schematic way, so it only show the formation relevant with the utility model.
A kind of touch-screen high transmittivity electricity conducting glass as shown in Figure 1, comprise glass substrate 1, be disposed with silicon-dioxide coatings 2 and indium oxide coating layer 3 on glass substrate 1 surface, silicon-dioxide coatings 2 is positioned at internal layer, indium oxide coating layer 3 is positioned at skin, between glass substrate 1 and silicon-dioxide coatings 2, be provided with Niobium Pentxoxide coatings 4, wherein the thickness of silicon-dioxide coatings 2 is 78～98nm, the thickness of indium oxide coating layer 3 is 9～11nm, and the thickness of Niobium Pentxoxide coatings 4 is 15～18nm.
As a rule, improve the visible light transmissivity of conductive glass, the selection of medium tunic is crucial, has only the rational medium tunic of selection, just can utilize optical principle, make between each medium tunic and interfere mutually, and the reflected light of each medium layer membrane interface and incident light are cancelled out each other, thereby improve the transmitance of visible light, reduce the reflectivity of visible light, at this, the utility model selects comparatively stable Niobium Pentxoxide of film forming specific refractory power and silicon-dioxide as the anti-reflection medium layer of optics, and Niobium Pentxoxide and silicon-dioxide all have good insulation performance and stable specific refractory power, can once make with the magnetron sputtering of ITO material and to finish, opposite resistance does not have tangible influence yet, therefore under the prerequisite that guarantees conductivity, the visible light transmissivity of conductive glass is brought up to more than 94%, and display effect is also more clear.
With above-mentioned foundation embodiment of the present utility model is enlightenment, and by above-mentioned description, the related work personnel can carry out various change and modification fully in the scope that does not depart from the utility model technological thought.Technical scope of the present utility model is not limited to the content on the specification sheets, must determine its technical scope according to the claim scope.
Claims (2)
1. touch-screen high transmittivity electricity conducting glass, comprise glass substrate (1), glass substrate (1) surface is disposed with silicon-dioxide coatings (2) and indium oxide coating layer (3), silicon-dioxide coatings (2) is positioned at internal layer, indium oxide coating layer (3) is positioned at skin, it is characterized in that: be provided with Niobium Pentxoxide coatings (4) between glass substrate (1) and silicon-dioxide coatings (2).
2. touch-screen high transmittivity electricity conducting glass according to claim 1, it is characterized in that: the thickness of described silicon-dioxide coatings (2) is 78～98nm, the thickness of indium oxide coating layer (3) is 9～11nm, and the thickness of Niobium Pentxoxide coatings (4) is 15～18nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2009200374273U CN201343500Y (en) | 2009-02-13 | 2009-02-13 | High transmission conductive glass for touch screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2009200374273U CN201343500Y (en) | 2009-02-13 | 2009-02-13 | High transmission conductive glass for touch screen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201343500Y true CN201343500Y (en) | 2009-11-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2009200374273U Expired - Fee Related CN201343500Y (en) | 2009-02-13 | 2009-02-13 | High transmission conductive glass for touch screen |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201343500Y (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102968232A (en) * | 2012-11-23 | 2013-03-13 | 深圳莱宝高科技股份有限公司 | Capacitive touch panel and production method thereof |
| CN103353815A (en) * | 2013-02-04 | 2013-10-16 | 芜湖长信科技股份有限公司 | Capacitor screen OGS shadow eliminating structure and manufacturing process thereof |
| CN103430134A (en) * | 2011-01-19 | 2013-12-04 | Lg伊诺特有限公司 | Touch panel and method for manufacturing same |
| CN104238800A (en) * | 2013-06-24 | 2014-12-24 | 富元精密镀膜股份有限公司 | Touch panel |
| CN105563955A (en) * | 2014-11-06 | 2016-05-11 | 无锡康力电子有限公司 | Transparent conductive glass |
| CN107244815A (en) * | 2017-06-19 | 2017-10-13 | 合肥市惠科精密模具有限公司 | A kind of TFT LCD displays high transmittivity electricity conducting glass |
| CN111560586A (en) * | 2020-04-30 | 2020-08-21 | 豪威星科薄膜视窗(深圳)有限公司 | Capacitive touch screen coating process and touch screen |
| CN113800782A (en) * | 2021-09-30 | 2021-12-17 | 台州星星光电科技有限公司 | Matte black coated glass panel that sees through to laser radar infrared light |
-
2009
- 2009-02-13 CN CNU2009200374273U patent/CN201343500Y/en not_active Expired - Fee Related
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103430134A (en) * | 2011-01-19 | 2013-12-04 | Lg伊诺特有限公司 | Touch panel and method for manufacturing same |
| US9904088B2 (en) | 2011-01-19 | 2018-02-27 | Lg Innotek Co., Ltd. | Touch panel and method for manufacturing the same |
| US10120229B2 (en) | 2011-01-19 | 2018-11-06 | Lg Innotek Co., Ltd. | Touch panel and method for manufacturing the same |
| CN102968232A (en) * | 2012-11-23 | 2013-03-13 | 深圳莱宝高科技股份有限公司 | Capacitive touch panel and production method thereof |
| CN103353815A (en) * | 2013-02-04 | 2013-10-16 | 芜湖长信科技股份有限公司 | Capacitor screen OGS shadow eliminating structure and manufacturing process thereof |
| CN103353815B (en) * | 2013-02-04 | 2016-12-28 | 芜湖长信科技股份有限公司 | Capacitance plate OGS shadow eliminating structure and manufacturing process thereof |
| CN104238800A (en) * | 2013-06-24 | 2014-12-24 | 富元精密镀膜股份有限公司 | Touch panel |
| CN105563955A (en) * | 2014-11-06 | 2016-05-11 | 无锡康力电子有限公司 | Transparent conductive glass |
| CN107244815A (en) * | 2017-06-19 | 2017-10-13 | 合肥市惠科精密模具有限公司 | A kind of TFT LCD displays high transmittivity electricity conducting glass |
| CN111560586A (en) * | 2020-04-30 | 2020-08-21 | 豪威星科薄膜视窗(深圳)有限公司 | Capacitive touch screen coating process and touch screen |
| CN113800782A (en) * | 2021-09-30 | 2021-12-17 | 台州星星光电科技有限公司 | Matte black coated glass panel that sees through to laser radar infrared light |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20091111 Termination date: 20160213 |