CN201793487U - Transparent conducting glass of high-transmissivity touch screen - Google Patents
Transparent conducting glass of high-transmissivity touch screen Download PDFInfo
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- CN201793487U CN201793487U CN2010202972630U CN201020297263U CN201793487U CN 201793487 U CN201793487 U CN 201793487U CN 2010202972630 U CN2010202972630 U CN 2010202972630U CN 201020297263 U CN201020297263 U CN 201020297263U CN 201793487 U CN201793487 U CN 201793487U
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- film layer
- thin film
- glass substrate
- touch screen
- transmissivity
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Abstract
The utility model discloses transparent conducting glass of a high-transmissivity touch screen, which comprises a glass substrate (1) and a group of optical antireflection coatings and ITO (Indium Tin Oxide) film layers (4), wherein the group of optical antireflection coatings and the ITO film layers (4) are sequentially deposited on at least one surface of the glass substrate (1); each optical antireflection coating comprises a TiO2 film layer (2) and a SiO2 film layer (3); and the glass substrate (1) is an ultrathin float glass substrate. The technologies of the transparent conducting glass of the high-transmissivity touch screen mainly lie in an optical antireflection coating technology and a vacuum plating technology, including the design of the optical antireflection coating system, the vacuum magnetron sputtering deposition technology of the multilayer optical film, the film layer uniformity ensuring technology and the like; and the optical antireflection coatings generate certain optical interference characteristics by overlapping medium film materials with high and low refractive indexes and film thickness in different times of a quarter of lamda, thereby improving the transmissivity and obtaining ITO transparent conducting glass with high transmissivity and favorable uniformity.
Description
Technical field
The utility model relates to a kind of vacuum coating technology, and just material surface modifying technology especially relates to a kind of high-transmissivity transparent conductive glass of touch screen and preparation method thereof and preparation method thereof.
Background technology
Touch-screen is as a kind of novel human-computer interaction interface, be widely used on the various digital information systems, from small sized product such as mobile phone, PDA, digital product, e-Book, to medium-sized product such as automatic navigator, game machine, household electrical appliance, industry control instrument, can see the touch-screen product on the touch PDP commonly used in large product such as POS system, common query system, portable computer, Medical Instruments and the TV news program again.
In recent years, the application of touch-screen on mobile phone more and more widely, the particularly release of iPhone touch-screen mobile phone, the dynamics that has greatly stimulated touch-screen on mobile phone, to use, the mobile phone of nearly all brand all with touch-screen applications in mobile phone as new design and attraction, open-minded along with domestic 3G Communications service, the application of touch-screen on mobile phone will be more extensive.The strong growth point of another of touch-screen is on automobile GPS navigation instrument, and automobile has become city resident's ordinary consumption product, and the people who buys private car is more and more; Yet automobile GPS navigation instrument also only is that high-grade automobile is equipped, and along with the change of people life style, going for a drive can be more and more, and the application of GPS navigation instrument also can increase thereupon.
Because the application of mobile phone and GPS navigation instrument is mostly out of doors, the transmitance of touch-screen is required also to have higher requirement, so also just the requirement of the transmitance of the used transparent conducting glass of touch-screen has also further been improved.Yet the transmitance of existing transparent conducting glass can't satisfy higher level demand, has restricted the deep application of touch-screen on mobile phone and GPS navigation instrument.
The utility model content
Technical problem to be solved in the utility model is to provide a kind of high-transmissivity transparent conductive glass of touch screen at problems of the prior art, its objective is by on the thin float glass, under high vacuum environment, deposit one group of optics anti-reflection film and ITO (tin indium oxide) film at glass surface, obtain the ITO transparent conducting glass that is used for touch-screen of transmitance height, good uniformity with the planar magnetic control sputtering technology.
The technical solution of the utility model is this kind high-transmissivity transparent conductive glass of touch screen, comprises glass substrate, and deposits one group of optical anti-reflective film and ITO rete successively at least one surface of glass substrate, and described optical anti-reflective film comprises TiO
2Thin film layer and SiO
2Thin film layer.
As first kind of embodiment of the present utility model, described high-transmissivity transparent conductive glass of touch screen is for to be provided with one deck TiO by titanium plate dc reactive sputtering technology on a surface of glass substrate
2Thin film layer is at TiO
2By silicon target medium frequency reactive sputtering technology one deck SiO is set on the another side of thin film layer
2Thin film layer passes through ITO target d.c. sputtering technology at last at SiO
2The ITO rete is set on the another side of thin film layer.
As second kind of embodiment of the present utility model, described high-transmissivity transparent conductive glass of touch screen is for to be provided with one deck TiO by titanium plate dc reactive sputtering technology on a surface of glass substrate
2Thin film layer is at TiO
2By silicon target medium frequency reactive sputtering technology one deck SiO is set on the another side of thin film layer
2Thin film layer, by ITO target d.c. sputtering technology at SiO
2The ITO rete is set on the another side of thin film layer; Another surface of described glass substrate is gone up and by titanium plate dc reactive sputtering technology one deck TiO is set
2Thin film layer is at TiO
2By silicon target medium frequency reactive sputtering technology one deck SiO is set on the another side of thin film layer
2Thin film layer.
Described glass substrate is the thin float glass substrate.
Described TiO
2Thin film layer, SiO
2Thin film layer and ITO rete disposable finishing in the continuous vacuum coating machine.
High-transmissivity transparent conductive glass of touch screen with above-mentioned special construction has the following advantages:
1, the technology of this kind high-transmissivity transparent conductive glass of touch screen is optical anti-reflective film technology and vacuum coating technology, this comprises the vacuum magnetic-control sputtering deposition technique of design, multilayer optical film of optical anti-reflective film system and membrane uniformity assurance technology etc., optical anti-reflective film is the certain optical interference characteristic of thickness stack generation by high and low refractive index deielectric-coating material and different λ/4 multiples, thereby realized the raising of transmitance, obtained the ITO transparent conducting glass of transmitance height, good uniformity.
2, this kind high-transmissivity transparent conductive glass of touch screen each layer film of disposable successive sedimentation in vacuum plating unit, what titanium dioxide adopted is titanium plate dc reactive sputtering technology, what silicon-dioxide adopted is silicon target medium frequency reactive sputtering technology, the target d.c. sputtering technology that tin indium oxide adopts has improved production efficiency of products and quality stability.
3, this kind high-transmissivity transparent conductive glass of touch screen satisfies the demand of touch-screen to high permeability ITO transparent conducting glass, improve the display resolution and the result of use of outdoor electronic product (as mobile phone, GPS navigation instrument) touch-screen, have good application and popularization value.
Description of drawings
The utility model is described in further detail below in conjunction with accompanying drawing:
Fig. 1 is the film structure synoptic diagram of first kind of embodiment of the utility model.
Fig. 2 is the film structure synoptic diagram of second kind of embodiment of the utility model.
In Fig. 1-2,1: glass substrate; 2:TiO
2Thin film layer; 3:SiO
2Thin film layer; The 4:ITO rete.
Embodiment
This kind high-transmissivity transparent conductive glass of touch screen be on the thin float glass, under high vacuum environment, with the planar magnetic control sputtering technology at glass surface deposition ITO film, obtain the conductive glass of transmitance height, good uniformity.
Compared with common transmission glass, demand deposits one group of TiO to the high permeability touch-screen again with the ITO transparent conducting glass
2, SiO
2Optical anti-reflective film system, the certain optical interference characteristic of thickness stack generation by high low refractive index dielectric mould material and different λ/4 multiples realizes the raising of transmitance.
The film structure of this patent high-transmissivity transparent conductive glass of touch screen has 2 kinds, and transmitance is greater than 94% (@550nm) film structure be: Glass/TiO
2/ SiO
2/ ITO; Transmitance 98% (@550nm) film structure is: TiO
2/ SiO
2/ Glass/TiO
2/ SiO
2/ ITO.TiO
2 Thin film layer 2 adopts Ti target direct current reaction magnetron sputtering technology, SiO
2 Thin film layer 3 adopts Si target intermediate frequency reaction magnetocontrol sputtering technology, and ITO rete 4 adopts ITO target magnetically controlled DC sputtering technology.Because the multiple of λ/4 that blooming requires is therefore particularly important to the control of thickness.
Specifically, TiO
2The thickness of thin film layer 2 is 10-11nm, SiO
2The thickness of thin film layer 3 is 850-900nm, and the thickness of ITO rete 4 is 10-15nm.
What the utility model adopted is on-line continuous formula high temperature magnetron sputtering film preparing technology, the planar magnetic control sputtering technology is to realize plasma discharge under vacuum condition, utilize the motion of electromagnetic field control charged particle, material is plated in bombardment, thereby deposits needed film on glass substrate 1.All are plated material TiO the utility model
2, SiO
2, ITO all finishes on continuous vacuum magnetron sputtering machine successively continuously.
Below in conjunction with accompanying drawing the utility model patent is described in detail.
Fig. 1 is the film structure synoptic diagram of first kind of embodiment of the utility model high-transmissivity transparent conductive glass of touch screen.This kind high-transmissivity transparent conductive glass of touch screen is for to be provided with one deck TiO by titanium plate dc reactive sputtering technology on a surface of glass substrate 1
2 Thin film layer 2 is at TiO
2By silicon target medium frequency reactive sputtering technology one deck SiO is set on the another side of thin film layer 2
2 Thin film layer 3 passes through ITO target d.c. sputtering technology at last at SiO
2ITO rete 4 is set on the another side of thin film layer 3.
Its method for producing is as follows:
1) glass substrate 1 of the specification that will produce being sent into continous way round brush cleaning machine cleans;
The glass substrate 1 that 2) will clean is loaded on the substrate dolly, and dolly is sent to the continuous vacuum coating machine;
3) dolly that is mounted with glass substrate 1 moves in vacuum chamber with certain speed, successively by the plasma body zone of Ti, Si and ITO target is housed;
4) Ti target DC magnetically controlled DC sputtering TiO
2 Thin film layer 2, Si target intermediate frequency reaction magnetocontrol sputtering generate SiO
2The ITO rete 4 of thin film layer 3 and the production of ITO target magnetically controlled DC sputtering is plated on the glass substrate 1 successively;
5) glass substrate 1 that has plated rete is walked out vacuum chamber with dolly, and the glass substrate 1 that has plated film is taken off from dolly;
6) finished product of plated film is carried out the corresponding light electrical property and detect, salable product are packed.
TiO
2The preparation technology parameter of thin film layer 2 is preferably: background pressure≤1 * 10
-3Pa, operating pressure 3-4 * 10
-1Pa, argon flow amount 100sccm, oxygen flow 80sccm, target power output 60-65KW, the TiO of deposition gained
2The thickness of thin film layer 2 is 10-11nm;
SiO
2The preparation technology parameter of thin film layer 3 is preferably: background pressure≤1 * 10
-3Pa, operating pressure 3-4 * 10
-1Pa, argon flow amount 100sccm, oxygen flow 70sccm, target power output 150-160KW, the SiO of deposition gained
2The thickness of thin film layer 3 is 850-900nm;
The preparation technology parameter of ITO rete 4 is preferably: background pressure≤1 * 10
-3Pa, operating pressure 3-4 * 10
-1Pa, argon flow amount 120sccm, oxygen flow 3sccm, target power output 1.5-1.8KW, the thickness of the ITO rete 4 of deposition gained is 10-12nm;
The transmitance of the high-transmissivity transparent conductive glass of touch screen by the preparation of above-mentioned complete processing is greater than 94% (@550nm), its performance index are specific as follows:
Face resistance: 350-600 Ω/, the resistance homogeneity is MD≤± 10%, TD≤± 15%, transmitance: 94.1% (550nm), colourity: a*=-1.5, b*=0.3, thermostability: Rt/R≤115%.
Wherein:
@550nm: the expression optical wavelength is measured when 550nm;
Ω/: face unit of resistance;
A*/b*: the expression of tristimulus coordinates;
Rt: represent heated baking face resistance value afterwards; R: represent original resistance value.
Fig. 2 is the film structure synoptic diagram of second kind of embodiment of the utility model high-transmissivity transparent conductive glass of touch screen.This kind high-transmissivity transparent conductive glass of touch screen is for to be provided with one deck TiO by titanium plate dc reactive sputtering technology on a surface of glass substrate 1
2 Thin film layer 2 is at TiO
2By silicon target medium frequency reactive sputtering technology one deck SiO is set on the another side of thin film layer 2
2 Thin film layer 3, by ITO target d.c. sputtering technology at SiO
2ITO rete 4 is set on the another side of thin film layer 3; Another surface of glass substrate 1 is gone up and by titanium plate dc reactive sputtering technology one deck TiO is set
2 Thin film layer 2 is at TiO
2By silicon target medium frequency reactive sputtering technology one deck SiO is set on the another side of thin film layer 2
2 Thin film layer 3.
Its method for producing is as follows:
1) glass substrate 1 of the specification that will produce being sent into continous way round brush cleaning machine cleans;
The glass substrate 1 that 2) will clean is loaded on the substrate dolly, and dolly is sent to the continuous vacuum coating machine;
3) dolly that is mounted with glass substrate 1 moves in vacuum chamber with certain speed, successively by the plasma body zone of Ti, Si and ITO target is housed;
4) Ti target DC magnetically controlled DC sputtering TiO
2 Thin film layer 2, Si target intermediate frequency reaction magnetocontrol sputtering generate SiO
2The ITO rete 4 of thin film layer 3 and the production of ITO target magnetically controlled DC sputtering is plated on the glass substrate 1 successively;
5) glass substrate 1 that has plated rete is walked out vacuum chamber with dolly, and the glass substrate 1 that has plated film is taken off from dolly;
6) glass substrate 1 that the glass one side has been plated in batch rete takes out from tr, cleans through Cleaning Line, and plated film does not face outer being loaded on the dolly;
7) dolly that is mounted with glass substrate 1 moves in vacuum chamber with certain speed, by the plasma body zone of Ti, Si target is housed, plates TiO successively successively
2 Thin film layer 2 and SiO
2 Thin film layer 3;
8) glass substrate 1 that has plated rete is walked out vacuum chamber with dolly, and the glass substrate 1 that has plated film is taken off from dolly;
9) finished product of plated film is carried out the corresponding light electrical property and detect, salable product are packed.
TiO
2The preparation technology parameter of thin film layer 2 is preferably: background pressure≤1 * 10
-3Pa, operating pressure 3-4 * 10
-1Pa, argon flow amount 100sccm, oxygen flow 80sccm, target power output 60-65KW, the TiO of deposition gained
2The thickness of thin film layer 2 is 10-11nm;
SiO
2The preparation technology parameter of thin film layer 3 is preferably: background pressure≤1 * 10
-3Pa, operating pressure 3-4 * 10
-1Pa, argon flow amount 100sccm, oxygen flow 70sccm, target power output 150-160KW, the SiO of deposition gained
2The thickness of thin film layer 3 is 850-900nm;
The preparation technology parameter of ITO rete 4 is preferably: background pressure≤1 * 10
-3Pa, operating pressure 3-4 * 10
-1Pa, argon flow amount 120sccm, oxygen flow 3sccm, target power output 1.5-1.8KW, the thickness of the ITO rete 4 of deposition gained is 10-12nm;
The transmitance of the described high-transmissivity transparent conductive glass of touch screen by the preparation of above-mentioned complete processing is greater than 98% (@550nm), its performance index are specific as follows:
Face resistance: 350-600 Ω/, the resistance homogeneity is MD≤± 10%, TD≤± 15%, transmitance: 98.05% (550nm), colourity: a*=-1.8, b*=-1, thermostability: Rt/R
0≤ 115%.
Wherein:
@550nm: the expression optical wavelength is measured when 550nm;
Ω/: face unit of resistance;
A*/b*: the expression of tristimulus coordinates;
Rt: represent heated baking face resistance value afterwards; R
0: represent original resistance value.
The technology of this kind high-transmissivity transparent conductive glass of touch screen is optical anti-reflective film technology and vacuum coating technology, this comprises the vacuum magnetic-control sputtering deposition technique of design, multilayer optical film of optical anti-reflective film system and membrane uniformity assurance technology etc., optical anti-reflective film is the certain optical interference characteristic of thickness stack generation by high and low refractive index deielectric-coating material and different λ/4 multiples, thereby realized the raising of transmitance, obtained the ITO transparent conducting glass of transmitance height, good uniformity.Each layer film is disposable successive sedimentation in vacuum plating unit, what titanium dioxide adopted is titanium plate dc reactive sputtering technology, what silicon-dioxide adopted is silicon target medium frequency reactive sputtering technology, and the target d.c. sputtering technology that tin indium oxide adopts has improved production efficiency of products and quality stability.
Claims (5)
1. high-transmissivity transparent conductive glass of touch screen, it is characterized in that: described high-transmissivity transparent conductive glass of touch screen comprises glass substrate (1), and depositing one group of optical anti-reflective film and ITO rete (4) successively at least one surface of glass substrate (1), described optical anti-reflective film comprises TiO
2Thin film layer (2) and SiO
2Thin film layer (3).
2. a kind of high-transmissivity transparent conductive glass of touch screen according to claim 1 is characterized in that: described high-transmissivity transparent conductive glass of touch screen is for to be provided with one deck TiO by titanium plate dc reactive sputtering technology on a surface of glass substrate (1)
2Thin film layer (2) is at TiO
2By silicon target medium frequency reactive sputtering technology one deck SiO is set on the another side of thin film layer (2)
2Thin film layer (3) passes through ITO target d.c. sputtering technology at last at SiO
2ITO rete (4) is set on the another side of thin film layer (3).
3. a kind of high-transmissivity transparent conductive glass of touch screen according to claim 1 is characterized in that: described high-transmissivity transparent conductive glass of touch screen is for to be provided with one deck TiO by titanium plate dc reactive sputtering technology on a surface of glass substrate (1)
2Thin film layer (2) is at TiO
2By silicon target medium frequency reactive sputtering technology one deck SiO is set on the another side of thin film layer (2)
2Thin film layer (3), by ITO target d.c. sputtering technology at SiO
2ITO rete (4) is set on the another side of thin film layer (3); Another surface of described glass substrate (1) is gone up and by titanium plate dc reactive sputtering technology one deck TiO is set
2Thin film layer (2) is at TiO
2By silicon target medium frequency reactive sputtering technology one deck SiO is set on the another side of thin film layer (2)
2Thin film layer (3).
4. according to the described a kind of high-transmissivity transparent conductive glass of touch screen of each claim of claim 1-3, it is characterized in that: described glass substrate (1) is the thin float glass substrate.
5. a kind of high-transmissivity transparent conductive glass of touch screen according to claim 4 is characterized in that: described TiO
2Thin film layer (2), SiO
2Thin film layer (3) and ITO rete (4) disposable finishing in the continuous vacuum coating machine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010202972630U CN201793487U (en) | 2010-08-17 | 2010-08-17 | Transparent conducting glass of high-transmissivity touch screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010202972630U CN201793487U (en) | 2010-08-17 | 2010-08-17 | Transparent conducting glass of high-transmissivity touch screen |
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| Publication Number | Publication Date |
|---|---|
| CN201793487U true CN201793487U (en) | 2011-04-13 |
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ID=43848405
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|---|---|---|---|
| CN2010202972630U Expired - Fee Related CN201793487U (en) | 2010-08-17 | 2010-08-17 | Transparent conducting glass of high-transmissivity touch screen |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101921985A (en) * | 2010-08-17 | 2010-12-22 | 芜湖长信科技股份有限公司 | High-transmissivity transparent conductive glass of touch screen and preparation method thereof |
| CN103135869A (en) * | 2011-11-25 | 2013-06-05 | 日东电工株式会社 | Touch panel sensor |
| CN103407232A (en) * | 2013-08-14 | 2013-11-27 | 江苏奥蓝工程玻璃有限公司 | Offline antireflection coated glass and manufacturing method thereof |
| CN103407231A (en) * | 2013-08-14 | 2013-11-27 | 江苏奥蓝工程玻璃有限公司 | Offline reflection-enhancing coated glass and manufacturing method thereof |
| CN104766546A (en) * | 2015-04-15 | 2015-07-08 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN115793317A (en) * | 2022-12-30 | 2023-03-14 | 芜湖长信科技股份有限公司 | Method for reducing light wave oscillation of liquid crystal display device |
-
2010
- 2010-08-17 CN CN2010202972630U patent/CN201793487U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101921985A (en) * | 2010-08-17 | 2010-12-22 | 芜湖长信科技股份有限公司 | High-transmissivity transparent conductive glass of touch screen and preparation method thereof |
| CN103135869A (en) * | 2011-11-25 | 2013-06-05 | 日东电工株式会社 | Touch panel sensor |
| CN103407232A (en) * | 2013-08-14 | 2013-11-27 | 江苏奥蓝工程玻璃有限公司 | Offline antireflection coated glass and manufacturing method thereof |
| CN103407231A (en) * | 2013-08-14 | 2013-11-27 | 江苏奥蓝工程玻璃有限公司 | Offline reflection-enhancing coated glass and manufacturing method thereof |
| CN104766546A (en) * | 2015-04-15 | 2015-07-08 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN115793317A (en) * | 2022-12-30 | 2023-03-14 | 芜湖长信科技股份有限公司 | Method for reducing light wave oscillation of liquid crystal display device |
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|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110413 Termination date: 20140817 |
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| EXPY | Termination of patent right or utility model |