CN106637113A - Method for manufacturing multi-layer optical film on plastic film - Google Patents
Method for manufacturing multi-layer optical film on plastic film Download PDFInfo
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- CN106637113A CN106637113A CN201611050624.XA CN201611050624A CN106637113A CN 106637113 A CN106637113 A CN 106637113A CN 201611050624 A CN201611050624 A CN 201611050624A CN 106637113 A CN106637113 A CN 106637113A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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Abstract
The invention provides a method for manufacturing a multi-layer optical film on a plastic film. The method is characterized in that the transparent plastic film is used as a base material, and the plastic film is repeatedly rotated forwards and backwards by a rotating roller to be repeatedly and alternately sputtered with two materials with different refractive indexes to obtain the multi-layer optical film. The optical film manufactured by the manufacturing method of the multi-layer optical film can selectively reflect infrared bands; visible light can be transmitted to achieve the heat insulation effect; meanwhile, as the material per se has low probability of oxidation, the property of not shielding electromagnetic signals is achieved; and therefore, the problems in the prior art that a metal film is high in probability of oxidation, shields ETC and GPS signals and is highly reflective are solved.
Description
Technical field
The present invention relates to the technical field of multi-layer optical film, more particularly to one kind makes on a plastic film multi-layer optical film
Method.
Background technology
Optical plastic film optical plastic with its excellent performance, light weight, be easily worked shaping, do not corrode and cheap
The features such as, the fields such as daily life, industry and scientific research are applied to more and more widely.And in order to further improve optical plastic
Mechanical performance and optical property, the attention of the plated film extremely people of optical plastic, in existing coating technique, with vacuum coating
It is the most extensive in the application of technology.Film directly affects the various performances of film, dissimilarity to the adhesive force of optical plastic substrate
The optical thin film of energy is used in and shows the numerous areas such as brightness enhancement film including automobile heat insulation film, building fenestrated membrane, liquid crystal flat-panel.
At present domestic high-end product great majority are the metal films of assembly of thin films structure based on magnetron sputtering metal film,
Such as aluminium, silver, with good heat-insulated and conductive effect, but metal film exists oxidizable, shields ETC, and gps signal is reflective
High problem is difficult to solve.
The content of the invention
The invention provides a kind of method for making multi-layer optical film on a plastic film, using principle of optical interference in modeling
The material of two kinds of different refractivities of alternating sputtering to be making multi-layer optical film on material film, so as to solve what prior art faced
There is oxidizable, shielding ETC, gps signal, reflective high problem in metal film.
A kind of method for making multi-layer optical film on a plastic film, comprises the steps：
The cavity of magnetron sputtering coater is evacuated into vacuum, argon gas is passed through, transparent plastic film volume is put in into magnetron sputtering
In the rotating roller of coating machine, rotated by controlling rotating roller, on transparent plastic film surface magnetron sputtering deposition plating is carried out
Film, wherein target include target A and target B, form the multi-layer optical film that ABAB or BABA replaces overlaying structure, and target A is height
Refractive index target, target B is low-refraction target.
Preferably, target A is the one kind in silica, magnesium fluoride or calcirm-fluoride, and target B is titanium dioxide, five oxidations
One kind in Tritanium/Trititanium, zirconium dioxide, cerium oxide or zinc oxide.
Preferably, target A is silica, and target B is titanium dioxide or the one kind in five oxidation Tritanium/Trititaniums.
Preferably, target B is titanium dioxide.
Preferably, vacuum≤4.5 × 10 of cavity-7Torr, is passed through the vacuum after argon gas for 4.5 × 10-3～6.5
×10-3Torr。
Preferably, vacuum≤3.5 × 10 of cavity-7Torr, is passed through the vacuum after argon gas for 5.5 × 10-3Torr。
Preferably, magnetron sputtering coater is provided with No. 1 target drone, No. 2 target drones, No. 3 target drones；Set on No. 1 target drone and No. 3 target drones
For target A, target B is set on No. 2 target drones, or, target B is set on No. 1 target drone and No. 3 target drones, it is set to target on No. 2 target drones
A。
Preferably, when rotating roller is rotated forward, while opening No. 1 target drone, No. 2 target drones and No. 3 target drones；Rotating roller reversely turns
When dynamic, while opening No. 1 target drone and No. 2 target drones, No. 3 target drones are closed；Positive and negative rotation is repeated several times by rotating roller thin to plastics
Film is overlapped sputtering sedimentation plated film and obtains multi-layer optical film.
Preferably, magnetron sputtering coater target current is 2.5-8.1A.
Preferably, magnetron sputtering coater target current is 4.6A.
Transparent plastic film is flexible material in the present invention, it is preferable that transparent plastic film is poly terephthalic acid second two
One kind in alcohol ester (PET), polyethylene naphthalate (PEN), polyvinyl chloride (PVC), polypropylene (PP).
A kind of multilayer optical film, carries out magnetron sputtering deposition plated film on transparent plastic film, to be formed on its surface
ABAB or BABA replaces the multi-layer optical film of overlaying structure, and wherein A is high index of refraction target, and B is low-refraction target.
Preferably, A is the one kind in silica, magnesium fluoride or calcirm-fluoride, and B is titanium dioxide, five oxidation Tritanium/Trititaniums, dioxy
Change the one kind in zirconium, cerium oxide or zinc oxide.
Preferably, A is silica, and B is titanium dioxide or the one kind in five oxidation Tritanium/Trititaniums；More preferably B is titanium dioxide.
Preferably, transparent plastic film is polyethylene terephthalate, polyethylene naphthalate, polychlorostyrene second
One kind in alkene or polypropylene.
Magnetron sputtering coater utilizes the light flux variations of optical monitoring system real time on-line monitoring blooming in the present invention
Determine that individual layer sputters thickness, adjusted by adjusting the spacing of rotating speed, sputtering power, Ar throughputs, substrate and target of rotating roller
Individual layer thickness.
Can be needed to select the thickness and stacking fold of monofilm, target back wave according to actual optical signature in the present invention
It is long to meet below equation with target monofilm thickness：
λReflection=2 (nOdd numberdOdd number+nEven numberdEven number)
Wherein nOdd numberFor the refractive index of odd-level target, nEven numberFor the refractive index of even level target.dOdd numberFor odd-level target list
Thickness degree, dEven numberFor even level target thickness in monolayer；Stacking fold is more, and the reflectivity of blooming is higher.
Optical film thickness shown in Figure 1 and the relation of the number of plies, can be obtained using the thickness structure of linear gradient change
Wider reflection bandwidth spectrum is obtained, with the increase of the number of plies, thickness need to meet equation below：
dOdd number=dOdd number 0+αm
dEven number=dEven number 0+βm
Wherein dOdd number 0It is the odd-level original depth for meeting reflectance target centre wavelength, dEven number 0It is to meet reflectance target center
The even level original depth of wavelength, α is the slope of odd-level, and β is the slope of even level, and m is the number of plies.
Linear gradient multilayer film reflection bandwidth spectral principle schematic diagram shown in Figure 2, with linear gradient change
Multi-layer film structure, can be by the λ in a branch of natural light1、λ2、λ3、λ4Wave band carry out selective reflecting.Spectral centroid wavelength and
Bandwidth can be regulated and controled by odd-level, the original depth of even level and linear gradient slope.
The spectral characteristic of blooming can be adjusted by regulating and controlling the film structure of multilayer film, certain band is reflected or transmitted
Wide optical effect, for example can optionally reflect infrared and ultraviolet band transmission visible light wave range reach it is not only transparent but also heat-insulated
Every the effect of ultraviolet.
Compared with prior art, the present invention has the advantages that：
The present invention adopts transparent plastic film for base material, using magnetron sputtering technique, with different refractivity material as target,
The multi-layer optical film that the method makes has the structure that high index of refraction target layer and low-index layer are alternately superimposed, and can reach choosing
The optical effect of sexual reflex or transmission different-waveband light is selected, reflective weak, in addition plastic sheeting belongs to flexible material, using rotating roller
It is more uniform that formula sputtering not only makes target sputter on multi-layer optical film surface, and is conducive to large area, large-scale production, subtracts
Few area occupied, economizes on resources；Silica, magnesium fluoride, calcirm-fluoride is not stable in properties oxidizable, can greatly promote product and use
Life-span, and there is no shielding action to electromagnetic signal, the use range of blooming can be widened；By the membrane system knot for regulating and controlling multilayer film
Structure can adjust the spectral characteristic of blooming, obtain wider reflection bandwidth spectrum, can be applicable to automobile adhesive film, building fenestrated membrane,
House decoration, optical display numerous areas；Being used for example as automobile window films can optionally reflect infrared saturating with ultraviolet band
Penetrate visible light wave range and reach not only transparent but also heat insulation ultraviolet effect.
Description of the drawings
The functional relation of Fig. 1 optical film thickness and the number of plies,
Fig. 2 linear gradient multilayer film reflection bandwidth spectral principle schematic diagrames,
Fig. 3 magnetic control sputtering system structural representations,
The optical profile of the anti-UV and IR multi-layer optical films of Fig. 4,
The optical profile of Fig. 5 bandwidth reflecting multilayer bloomings.
Specific embodiment
As shown in Figure 1, Figure 2, shown in Fig. 3, Fig. 4, Fig. 5, the functional relation of Fig. 1 optical film thickness and the number of plies, Fig. 2 linear gradients are more
Tunic reflection bandwidth spectral principle schematic diagram, Fig. 3 magnetic control sputtering system structural representations, the anti-UV and IR multilayer opticals of Fig. 4
Learn the optical profile of film, the optical profile of Fig. 5 bandwidth reflecting multilayer bloomings.
Embodiment 1
A kind of method for making multi-layer optical film on a plastic film, it is characterised in that comprise the steps：
The cavity of magnetron sputtering coater is evacuated into vacuum, argon gas is passed through, transparent plastic film volume is put in into magnetron sputtering
In the rotating roller of coating machine, rotated by controlling rotating roller, on transparent plastic film surface magnetron sputtering deposition plating is carried out
Film, wherein target include target A and target B, form the multi-layer optical film that ABAB or BABA replaces overlaying structure, and target A is height
Refractive index target, target B is low-refraction target.
Embodiment 2
The cavity of magnetron sputtering coater is evacuated into vacuum, argon gas is passed through, transparent plastic film volume is put in into magnetron sputtering
In the rotating roller of coating machine, rotated by controlling rotating roller, on transparent plastic film surface magnetron sputtering deposition plating is carried out
Film, wherein target include target A and target B, form the multi-layer optical film that ABAB or BABA replaces overlaying structure, and target A is two
Silica, target B is titanium dioxide.
Embodiment 3
The cavity of magnetron sputtering coater is evacuated into vacuum, argon gas is passed through, transparent plastic film volume is put in into magnetron sputtering
In the rotating roller of coating machine, rotated by controlling rotating roller, on transparent plastic film surface magnetron sputtering deposition plating is carried out
Film, wherein target include target A and target B, form the multi-layer optical film that ABAB or BABA replaces overlaying structure, and target A is fluorine
Change magnesium, target B is five oxidation Tritanium/Trititaniums.
Embodiment 4
A kind of method for making multi-layer optical film on a plastic film, it is characterised in that comprise the steps：
The cavity of magnetron sputtering coater is evacuated into vacuum, argon gas is passed through, transparent plastic film volume is put in into magnetron sputtering
In the rotating roller of coating machine, rotated by controlling rotating roller, on transparent plastic film surface magnetron sputtering deposition plating is carried out
Film, wherein target include target A and target B, form the multi-layer optical film that ABAB or BABA replaces overlaying structure, and target A is fluorine
Change calcium, target B is zirconium dioxide.
Embodiment 5
A kind of method for making multi-layer optical film on a plastic film, comprises the steps：
The cavity of magnetron sputtering coater is evacuated into vacuum for 4.5 × 10-7After Torr, being passed through argon gas in sputtering chamber makes
Working vacuum degree is 4.5 × 10-3Torr, vacuum chamber continuous air extraction, adjustment target current is 2.5A；By polyethylene terephthalate
Ester plastic film rolls are put in rotating roller, open the target selection on No. 1 target drone, No. 2 target drones, No. 3 target drones, No. 1 and No. 3 target drones
Cerium oxide, the target on No. 2 target drones selects calcirm-fluoride；Start rotating roller, rotate forward rotating roller, magnetic is carried out to plastic sheeting
Control sputtering sedimentation plated film；After all substrate plastic films volume forward direction is discharged, No. 1 target drone and No. 2 target drones are opened, close No. 3 targets
Machine, while rotating roller is rotated backward, repetition carries out magnetron sputtering deposition plated film to plastic sheeting, forms CeO2/CaF2It is alternately folded
Plus structure.
Embodiment 6
A kind of method for making multi-layer optical film on a plastic film, comprises the steps：
The cavity of magnetron sputtering coater is evacuated into vacuum for 3.5 × 10-7After Torr, being passed through argon gas in sputtering chamber makes
Working vacuum degree is 6.5 × 10-3Torr, vacuum chamber continuous air extraction, adjustment target current is 8.1A；Will be poly- to naphthalenedicarboxylic acid ethylene glycol
Ester plastic film rolls are put in rotating roller, open No. 1 target drone, No. 2 target drones, No. 3 target drones, the target on No. 1 target drone and No. 3 target drones
From zinc oxide, the target on No. 2 target drones selects calcirm-fluoride；Start rotating roller, rotate forward rotating roller, plastic sheeting is entered
Row magnetron sputtering deposition plated film；After all substrate plastic films volume forward direction is discharged, No. 1 target drone and No. 2 target drones are opened, close 3
Number target drone, while rotating roller is rotated backward, repetition carries out magnetron sputtering deposition plated film to plastic sheeting；Form ZnO/CaF2Hand over
For the structure of superposition.
Embodiment 7
With reference to Fig. 3, a kind of method for making multi-layer optical film on a plastic film comprises the steps：
The cavity of magnetron sputtering coater is evacuated into vacuum for 2.0 × 10-7After Torr, being passed through argon gas in sputtering chamber makes
Working vacuum degree is 5.5 × 10-3Torr, vacuum chamber continuous air extraction, adjustment target current is 4.6A；Polyvinyl chloride plastic film is rolled up
In being put in rotating roller, No. 1 target drone, No. 2 target drones, No. 3 target drones are opened, the target on No. 1 target drone and No. 3 target drones selects titanium dioxide
Silicon, the target on No. 2 target drones selects titanium dioxide；Become using the luminous flux of optical monitoring system real time on-line monitoring blooming
Change, by adjusting the spacing of rotating speed, sputtering power, Ar throughputs, substrate and target of rotating roller silicon dioxide layer thickness is controlled
It is 94.4nm to spend for 146.3nm, titanium dioxide thickness in monolayer；Start rotating roller, rotate forward rotating roller, plastic sheeting is entered
Row magnetron sputtering deposition plated film；After all substrate plastic films volume forward direction is discharged, No. 1 target drone and No. 2 target drones are opened, close 3
Number target drone, while rotating roller is rotated backward, repetition carries out magnetron sputtering deposition plated film to plastic sheeting；Transparent plastic film leads to
Repeatedly forward and reverse rotates and circulate during target as sputter and walk about 4 cycles to cross rotating roller, formation totally 20 layers of SiO2/
TiO2The structure being alternately superimposed.
The optical characteristics of the gained multi-layer optical film of embodiment 7 as indicated at 4, exceedes in 750-960nm infrared band reflectivity
95%, UV light reflectivity reaches more than 80% near 310nm, the blooming can be applicable to automobile heat insulation every ultraviolet fenestrated membrane and
Building fenestrated membrane field.
Embodiment 8
With reference to Fig. 3, a kind of method for making multi-layer optical film on a plastic film comprises the steps：
The cavity of magnetron sputtering coater is evacuated into vacuum for 3.0 × 10-7After Torr, being passed through argon gas in sputtering chamber makes
Working vacuum degree is 5.0 × 10-3Torr, vacuum chamber continuous air extraction, adjustment target current is 6.8A；Polyacrylic film volume is put
In rotating roller, No. 1 target drone, No. 2 target drones, No. 3 target drones are opened, the target on No. 1 target drone and No. 3 target drones selects silica, 2
Target selects titanium dioxide on number target drone；Using the light flux variations of optical monitoring system real time on-line monitoring blooming, pass through
The spacing for adjusting the rotating speed of rotating roller, sputtering power, Ar throughputs, substrate and target controls silicon dioxide layer thickness and is
76.7nm, titanium dioxide thickness in monolayer is 46.4nm；Start rotating roller, rotate forward rotating roller, magnetic is carried out to plastic sheeting
Control sputtering sedimentation plated film；After all substrate plastic films volume forward direction is discharged, No. 1 target drone and No. 2 target drones are opened, close No. 3 targets
Machine, while rotating roller is rotated backward, repetition carries out magnetron sputtering deposition plated film to plastic sheeting；Transparent plastic film is by turning
The repeatedly forward and reverse rotation of dynamic roller is circulated during target as sputter walks about 6 cycles, forms totally 30 layers of SiO2/TiO2Hand over
For the structure of superposition.
The spectral characteristic of the gained multi-layer optical film of embodiment 8 is as shown in Figure 5：Reflection in 400-510nm bandwidth interval
More than 95%, the blooming can be applicable to finishing field of handling official business to rate.
Embodiment 9
A kind of multilayer optical film, carries out magnetron sputtering deposition plated film, with thin in transparent plastic on transparent plastic film
Film surface forms the multi-layer optical film that ABAB replaces overlaying structure, and wherein A is high index of refraction target, and B is low-refraction target.
Embodiment 10
A kind of multilayer optical film, carries out magnetron sputtering deposition plating on polyethylene terephthalate plastic sheeting
Film, to form earth silicon/titanic oxide in polyethylene terephthalate Plastic film surface many of overlaying structure are replaced
Layer blooming.
Embodiment 11
A kind of multilayer optical film, carries out magnetron sputtering deposition plating on polyethylene naphthalate plastic sheeting
Film, to form magnesium fluoride/five oxidation Tritanium/Trititanium in polyethylene naphthalate Plastic film surface many of overlaying structure are replaced
Layer blooming.
Embodiment 12
A kind of multilayer optical film, carries out magnetron sputtering deposition plated film, with polychlorostyrene second on polyvinyl chloride plastic film
Alkene plastics film surface forms the multi-layer optical film that calcirm-fluoride/zirconium dioxide replaces overlaying structure.
Embodiment 13
A kind of multilayer optical film, carries out magnetron sputtering deposition plated film, with polypropylene plastics on polyacrylic film
Material film surface forms the multi-layer optical film that calcirm-fluoride/cerium oxide replaces overlaying structure.
Embodiment 14
A kind of multilayer optical film, carries out magnetron sputtering deposition plated film, with polypropylene plastics on polyacrylic film
Material film surface forms the multi-layer optical film that calcirm-fluoride/zinc oxide replaces overlaying structure.
The above, the only present invention preferably specific embodiment, but protection scope of the present invention is not limited thereto,
Any those familiar with the art the invention discloses technical scope in, technology according to the present invention scheme and its
Inventive concept equivalent or change in addition, all should be included within the scope of the present invention.
Claims (10)
1. it is a kind of on a plastic film make multi-layer optical film method, it is characterised in that comprise the steps：
The cavity of magnetron sputtering coater is evacuated into vacuum, argon gas is passed through, transparent plastic film volume is put in into magnetron sputtering plating
In the rotating roller of machine, rotated by controlling rotating roller, on transparent plastic film surface magnetron sputtering deposition plated film is carried out, its
Middle target includes target A and target B, forms the multi-layer optical film that ABAB or BABA replaces overlaying structure, and target A is high index of refraction
Target, target B is low-refraction target.
2. the method for making multi-layer optical film on a plastic film according to claim 1, it is characterised in that target A is
One kind in silica, magnesium fluoride or calcirm-fluoride, target B be titanium dioxide, five oxidation Tritanium/Trititaniums, zirconium dioxide, cerium oxide or
One kind in zinc oxide；
Preferably, target A is silica, and target B is titanium dioxide or the one kind in five oxidation Tritanium/Trititaniums；It is highly preferred that target B
For titanium dioxide.
3. it is according to claim 1 on a plastic film make multi-layer optical film method, it is characterised in that cavity it is true
Reciprocal of duty cycle≤4.5 × 10-7Torr, is passed through the vacuum after argon gas 4.5 × 10-3～6.5 × 10-3Torr；
Preferably, vacuum≤3.5 × 10 of cavity-7Torr, is passed through the vacuum after argon gas for 5.5 × 10-3Torr。
4. according to any one of claim 1-3 on a plastic film make multi-layer optical film method, it is characterised in that
Magnetron sputtering coater is provided with No. 1 target drone, No. 2 target drones, No. 3 target drones；Target A, No. 2 target drones are set on No. 1 target drone and No. 3 target drones
On be set to target B, or, target B is set on No. 1 target drone and No. 3 target drones, be set to target A on No. 2 target drones.
5. according to any one of claim 1-3 on a plastic film make multi-layer optical film method, it is characterised in that
When rotating roller is rotated forward, while opening No. 1 target drone, No. 2 target drones and No. 3 target drones；When rotating roller is rotated backward, while opening 1
Number target drone and No. 2 target drones, close No. 3 target drones.
6. according to claim 1-3 on a plastic film make multi-layer optical film method, it is characterised in that magnetic control splashes
Coating machine target current is penetrated for 2.5-8.1A.
7. according to claim 1-3 on a plastic film make multi-layer optical film method, it is characterised in that transparent modeling
Material film is the one kind in polyethylene terephthalate, polyethylene naphthalate, polyvinyl chloride or polypropylene.
8. a kind of multilayer optical film, it is characterised in that magnetron sputtering deposition plated film is carried out on transparent plastic film, with it
Surface forms the multi-layer optical film that ABAB or BABA replaces overlaying structure, and wherein A is high index of refraction target, and B is low-refraction target
Material.
9. multilayer optical film according to claim 8, it is characterised in that A is in silica, magnesium fluoride or calcirm-fluoride
One kind, B is the one kind in titanium dioxide, five oxidation Tritanium/Trititaniums, zirconium dioxide, cerium oxide or zinc oxide；
Preferably, A is silica, and B is titanium dioxide or the one kind in five oxidation Tritanium/Trititaniums；More preferably B is titanium dioxide.
10. multilayer optical obtained in the method for making multi-layer optical film on a plastic film according to claim 8 or claim 9 is thin
Film, it is characterised in that transparent plastic film is polyethylene terephthalate, polyethylene naphthalate, polychlorostyrene second
One kind in alkene or polypropylene.
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