CN105839190A - High-temperature diffusion device - Google Patents
High-temperature diffusion device Download PDFInfo
- Publication number
- CN105839190A CN105839190A CN201610317130.7A CN201610317130A CN105839190A CN 105839190 A CN105839190 A CN 105839190A CN 201610317130 A CN201610317130 A CN 201610317130A CN 105839190 A CN105839190 A CN 105839190A
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- China
- Prior art keywords
- air inlet
- technique
- technique air
- heater
- diffusion device
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
Abstract
The invention discloses a high-temperature diffusion device which comprises a furnace body. One end of the furnace body is provided with a furnace mouth, the other end of the furnace body is provided with a closed structure, and a furnace cover is arranged at the furnace mouth; a quartz boat is arranged in the furnace body, and silicon wafers are uniformly placed on the quartz boat; the upper end of the furnace body is provided with a first process gas inlet, a second process gas inlet and a third process gas inlet, and the lower end of the furnace body is provided with a tail gas exhaust port; the high-temperature diffusion device further comprises a gas flow stabilizing device which is arranged at the furnace mouth or the furnace middle or the furnace tail. According to the high-temperature diffusion device, the structure is simple, the gas flowing stability in the furnace body can be improved, the silicon wafer diffusion uniformity is guaranteed, and then the uniformity of a silicon wafer square resistor is guaranteed.
Description
Technical field
The present invention relates to photovoltaic field of diffusion technologies, be specially a kind of High temperature diffusion device.
Background technology
It is the core of crystal-silicon solar cell that diffusion makes P-N knot, be also solaode quality key it
One.For diffusing procedure, greatest problem is how to ensure the uniformity of diffusion.Spreading uniform battery, its subsequent technique is joined
Number controllability is high, it is ensured that the stability of silicon solar cell unit for electrical property parameters.At present, crystalline silicon industrialized production spreads
Make the P-N diffusion furnace that used of knot and mainly have tubular type and board-like two kinds.Tubular diffusion furnace because its closure is good, capacity big,
It is widely used.Tubular diffusion furnace can greatly reduce technique pickup risk, applies for high performance solar batteries industry
Thering is provided hardware guarantee, existing high temperature dispersing furnace, the gas homogeneity being passed through is poor, and after being passed through body of heater, skewness, cause
Silicon chip diffusion is uneven, thus causes square resistance uneven.
Summary of the invention
It is an object of the invention to provide a kind of High temperature diffusion device, with the problem solving to propose in above-mentioned background technology.
For achieving the above object, the present invention provides following technical scheme: a kind of High temperature diffusion device, including body of heater, described
One end of body of heater is fire door, and other end stove tail is enclosed construction, is provided with bell at described fire door, sets in the inside of described body of heater
Have quartz boat, described quartz boat be uniformly placed with silicon chip, be provided with in the upper end of described body of heater the first technique air inlet, second
Technique air inlet and the 3rd technique air inlet, be provided with exhaust port in the lower end of described body of heater, also includes gas constant-current stabilizer,
Described gas constant-current stabilizer is arranged in fire door, stove or stove tail position.
Preferably, described gas constant-current stabilizer includes current stabilization body, air inlet, honeycomb sheet, air doctor, gas outlet and mistake
Filter disc, one end of described current stabilization body is provided with air inlet, and the other end of described current stabilization body is provided with gas outlet, the inside of described current stabilization body
Being provided with honeycomb sheet, air doctor, described honeycomb sheet is positioned at one end of air inlet, and described honeycomb sheet connects air doctor, institute
The outlet stating air doctor connects gas outlet by filter, includes that multiple air-flow regulates grid in described air doctor,
And described air-flow regulation grid is tapered.
Preferably, described first technique air inlet, the second technique air inlet and the 3rd technique air inlet are separately positioned on stove
In mouth, stove, at stove tail.
Preferably, described first technique air inlet, the second technique air inlet and the 3rd technique air inlet are arranged in stove.
Preferably, described first technique air inlet, the second technique air inlet and the 3rd technique air inlet are arranged at fire door.
Preferably, the aperture of described first technique air inlet, the second technique air inlet and the 3rd technique air inlet is consistent, all
For 2.5mm-3mm.
Compared with prior art, the invention has the beneficial effects as follows:
(1) present configuration is simple, it is possible to increase the stability of gas flowing in body of heater, it is ensured that the uniformity of silicon chip diffusion,
So that it is guaranteed that the uniformity of silicon chip square resistance.
(2) the gas constant-current stabilizer that the present invention uses, it is possible to the quickly air-flow in regulating stove body, it is ensured that diffusion uniform
Property, and in gas constant-current stabilizer, air doctor uses conical flow regulation grid, it is possible to air-flow is played guide effect.
Accompanying drawing explanation
Fig. 1 is the overall structure schematic diagram of the present invention；
Fig. 2 is the gas constant-current stabilizer structural representation of the present invention；
In figure: 1, body of heater；2, fire door；3, stove tail；4, bell；5, quartz boat；6, the first technique air inlet；7, the second technique air inlet
Mouthful；8, the 3rd technique air inlet；9, exhaust port；10, gas constant-current stabilizer；11, in stove；12, current stabilization body；13, air inlet；
14, honeycomb sheet；15, air doctor；16, gas outlet；17, filter；18, air-flow regulation grid.
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Describe, it is clear that described embodiment is only a part of embodiment of the present invention rather than whole embodiments wholely.Based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under not making creative work premise
Embodiment, broadly falls into the scope of protection of the invention.
Embodiment one:
Referring to Fig. 1-2, the present invention provides a kind of technical scheme: a kind of High temperature diffusion device, including body of heater 1, the one of body of heater 1
End is fire door 2, and other end stove tail 3 is enclosed construction, is provided with bell 4 at fire door 2, is provided with quartz boat 5 in the inside of body of heater 1,
Quartz boat 5 is uniformly placed with silicon chip, is provided with first technique air inlet the 6, second technique air inlet 7 and in the upper end of body of heater 1
3rd technique air inlet 8, is provided with exhaust port 9 in the lower end of body of heater 1, also includes gas constant-current stabilizer 10, and described gas is steady
Stream device 10 is arranged on fire door 2 position.
In the present embodiment, gas constant-current stabilizer 10 include current stabilization body 12, air inlet 13, honeycomb sheet 14, air doctor 15,
Gas outlet 16 and filter 17, one end of current stabilization body 12 is provided with air inlet 13, and the other end of current stabilization body 12 is provided with gas outlet 16, surely
The inside of fluid 12 is provided with honeycomb sheet 14, air doctor 15, and honeycomb sheet 14 is positioned at one end of air inlet 13, and honeycomb sheet 14 connects
Air doctor 15, the outlet of air doctor 15 connects gas outlet 16 by filter 17, includes many in air doctor 15
Individual air-flow regulation grid 18, and air-flow regulation grid 18 is tapered, the gas constant-current stabilizer that the present invention uses, it is possible to quickly regulate
Air-flow in body of heater, it is ensured that the uniformity of diffusion, and in gas constant-current stabilizer, air doctor uses conical flow regulation lattice
Grid, it is possible to air-flow is played guide effect.
In the present embodiment, first technique air inlet the 6, second technique air inlet 7 and the 3rd technique air inlet 8 are separately positioned on
In fire door 2, stove 11, at stove tail 3, the first technique air inlet the 6, second technique air inlet 7 and aperture one of the 3rd technique air inlet 8
Cause, be 2.5mm.
Present configuration is simple, it is possible to increase the stability of gas flowing in body of heater, it is ensured that the uniformity of silicon chip diffusion,
So that it is guaranteed that the uniformity of silicon chip square resistance.
Embodiment two:
The present invention provides a kind of technical scheme: a kind of High temperature diffusion device, including body of heater 1, one end of body of heater 1 is fire door 2, separately
One end stove tail 3 is enclosed construction, is provided with bell 4 at fire door 2, is provided with quartz boat 5 in the inside of body of heater 1, on quartz boat 5 all
Even it is placed with silicon chip, is provided with the first technique air inlet the 6, second technique air inlet 7 and the 3rd technique air inlet in the upper end of body of heater 1
8, it is provided with exhaust port 9 in the lower end of body of heater 1, also includes that gas constant-current stabilizer 10, described gas constant-current stabilizer 10 are arranged on
11 position in stove.
In the present embodiment, gas constant-current stabilizer 10 include current stabilization body 12, air inlet 13, honeycomb sheet 14, air doctor 15,
Gas outlet 16 and filter 17, one end of current stabilization body 12 is provided with air inlet 13, and the other end of current stabilization body 12 is provided with gas outlet 16, surely
The inside of fluid 12 is provided with honeycomb sheet 14, air doctor 15, and honeycomb sheet 14 is positioned at one end of air inlet 13, and honeycomb sheet 14 connects
Air doctor 15, the outlet of air doctor 15 connects gas outlet 16 by filter 17, includes many in air doctor 15
Individual air-flow regulation grid 18, and air-flow regulation grid 18 is tapered, the gas constant-current stabilizer that the present invention uses, it is possible to quickly regulate
Air-flow in body of heater, it is ensured that the uniformity of diffusion, and in gas constant-current stabilizer, air doctor uses conical flow regulation lattice
Grid, it is possible to air-flow is played guide effect.
In the present embodiment, first technique air inlet the 6, second technique air inlet 7 and the 3rd technique air inlet 8 are arranged at stove
In 11, first technique air inlet the 6, second technique air inlet 7 is consistent with the aperture of the 3rd technique air inlet 8, is 2.8mm.
Present configuration is simple, it is possible to increase the stability of gas flowing in body of heater, it is ensured that the uniformity of silicon chip diffusion,
So that it is guaranteed that the uniformity of silicon chip square resistance.
Embodiment three:
The present invention provides a kind of technical scheme: a kind of High temperature diffusion device, including body of heater 1, one end of body of heater 1 is fire door 2, separately
One end stove tail 3 is enclosed construction, is provided with bell 4 at fire door 2, is provided with quartz boat 5 in the inside of body of heater 1, on quartz boat 5 all
Even it is placed with silicon chip, is provided with the first technique air inlet the 6, second technique air inlet 7 and the 3rd technique air inlet in the upper end of body of heater 1
8, it is provided with exhaust port 9 in the lower end of body of heater 1, also includes that gas constant-current stabilizer 10, described gas constant-current stabilizer 10 are arranged on
Stove tail 3 position.
In the present embodiment, gas constant-current stabilizer 10 include current stabilization body 12, air inlet 13, honeycomb sheet 14, air doctor 15,
Gas outlet 16 and filter 17, one end of current stabilization body 12 is provided with air inlet 13, and the other end of current stabilization body 12 is provided with gas outlet 16, surely
The inside of fluid 12 is provided with honeycomb sheet 14, air doctor 15, and honeycomb sheet 14 is positioned at one end of air inlet 13, and honeycomb sheet 14 connects
Air doctor 15, the outlet of air doctor 15 connects gas outlet 16 by filter 17, includes many in air doctor 15
Individual air-flow regulation grid 18, and air-flow regulation grid 18 is tapered, the gas constant-current stabilizer that the present invention uses, it is possible to quickly regulate
Air-flow in body of heater, it is ensured that the uniformity of diffusion, and in gas constant-current stabilizer, air doctor uses conical flow regulation lattice
Grid, it is possible to air-flow is played guide effect.
In the present embodiment, first technique air inlet the 6, second technique air inlet 7 and the 3rd technique air inlet 8 are arranged at stove
Mouth 2, first technique air inlet the 6, second technique air inlet 7 is consistent with the aperture of the 3rd technique air inlet 8, is 3mm.
Present configuration is simple, it is possible to increase the stability of gas flowing in body of heater, it is ensured that the uniformity of silicon chip diffusion,
So that it is guaranteed that the uniformity of silicon chip square resistance.
Experimental example:
Use common quartz ampoule and conventional method that silicon chip is diffused technique and various embodiments of the present invention silicon chip is carried out
Diffusion technique, finally carries out Square resistance measurement, data such as following table:
| Fire door | In stove | Stove tail | |
| Conventional method | 8 | 6 | 7 |
| Embodiment one | 2 | 2 | 1 |
| Embodiment two | 2 | 2 | 2 |
| Embodiment three | 1 | 2 | 1 |
From above table data, when using embodiment two to be diffused technique, the square resistance uniformity of silicon chip is optimal,
Embodiment two is most preferred embodiment.
Every technical staff's notice: although the present invention describes according to above-mentioned detailed description of the invention, but the present invention
Invention thought be not limited to that invention, the repacking of any utilization inventive concept, all will include this patent protection of the patent right in
In the range of.
Claims (6)
1. a High temperature diffusion device, including body of heater (1), it is characterised in that: one end of described body of heater (1) is fire door (2), separately
One end stove tail (3) is enclosed construction, is provided with bell (4) at described fire door (2) place, is provided with quartz in the inside of described body of heater (1)
Boat (5), is uniformly placed with silicon chip on described quartz boat (5), is provided with the first technique air inlet in the upper end of described body of heater (1)
(6), the second technique air inlet (7) and the 3rd technique air inlet (8), be provided with exhaust port in the lower end of described body of heater (1)
(9), also include that gas constant-current stabilizer (10), described gas constant-current stabilizer (10) are arranged on (11) or stove tail in fire door (2), stove
(3) position.
A kind of High temperature diffusion device the most according to claim 1, it is characterised in that: described gas constant-current stabilizer (10) includes
Current stabilization body (12), air inlet (13), honeycomb sheet (14), air doctor (15), gas outlet (16) and filter (17), described surely
One end of fluid (12) is provided with air inlet (13), and the other end of described current stabilization body (12) is provided with gas outlet (16), described current stabilization body
(12) inside is provided with honeycomb sheet (14), air doctor (15), and described honeycomb sheet (14) is positioned at one end of air inlet (13), institute
Stating honeycomb sheet (14) and connect air doctor (15), the outlet of described air doctor (15) is connected by filter (17) gives vent to anger
Mouthful (16), include multiple air-flow regulation grid (18) in described air doctor (15), and described air-flow regulation grid (18) in
Taper.
A kind of High temperature diffusion device the most according to claim 1, it is characterised in that: described first technique air inlet (6), the
Two technique air inlets (7) and the 3rd technique air inlet (8) are separately positioned on (11) in fire door (2), stove, stove tail (3) place.
A kind of High temperature diffusion device the most according to claim 1, it is characterised in that: described first technique air inlet (6), the
Two technique air inlets (7) and the 3rd technique air inlet (8) are arranged in stove (11).
A kind of High temperature diffusion device the most according to claim 1, it is characterised in that: described first technique air inlet (6), the
Two technique air inlets (7) and the 3rd technique air inlet (8) are arranged at fire door (2).
A kind of High temperature diffusion device the most according to claim 1, it is characterised in that: described first technique air inlet (6), the
Two technique air inlets (7) are consistent with the aperture of the 3rd technique air inlet (8), are 2.5mm-3mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610317130.7A CN105839190B (en) | 2016-05-12 | 2016-05-12 | A kind of High temperature diffusion device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610317130.7A CN105839190B (en) | 2016-05-12 | 2016-05-12 | A kind of High temperature diffusion device |
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| Publication Number | Publication Date |
|---|---|
| CN105839190A true CN105839190A (en) | 2016-08-10 |
| CN105839190B CN105839190B (en) | 2018-07-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610317130.7A Active CN105839190B (en) | 2016-05-12 | 2016-05-12 | A kind of High temperature diffusion device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115233186A (en) * | 2022-07-20 | 2022-10-25 | 无锡松煜科技有限公司 | Method for improving LPCVD surface coating process |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201852445U (en) * | 2010-09-29 | 2011-06-01 | 常州天合光能有限公司 | Diffusion furnace capable of improving sheet resistance uniformity |
| CN202297872U (en) * | 2011-06-27 | 2012-07-04 | 光为绿色新能源股份有限公司 | Silicon-wafer diffusion furnace for solar cell |
| CN202830231U (en) * | 2012-09-11 | 2013-03-27 | 江阴鑫辉太阳能有限公司 | Flowing gas stabilizing device of crystalline silicon solar cell diffusion furnace |
-
2016
- 2016-05-12 CN CN201610317130.7A patent/CN105839190B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201852445U (en) * | 2010-09-29 | 2011-06-01 | 常州天合光能有限公司 | Diffusion furnace capable of improving sheet resistance uniformity |
| CN202297872U (en) * | 2011-06-27 | 2012-07-04 | 光为绿色新能源股份有限公司 | Silicon-wafer diffusion furnace for solar cell |
| CN202830231U (en) * | 2012-09-11 | 2013-03-27 | 江阴鑫辉太阳能有限公司 | Flowing gas stabilizing device of crystalline silicon solar cell diffusion furnace |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115233186A (en) * | 2022-07-20 | 2022-10-25 | 无锡松煜科技有限公司 | Method for improving LPCVD surface coating process |
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| CN105839190B (en) | 2018-07-06 |
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