CN105839190B - A kind of High temperature diffusion device - Google Patents
A kind of High temperature diffusion device Download PDFInfo
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- CN105839190B CN105839190B CN201610317130.7A CN201610317130A CN105839190B CN 105839190 B CN105839190 B CN 105839190B CN 201610317130 A CN201610317130 A CN 201610317130A CN 105839190 B CN105839190 B CN 105839190B
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- air inlet
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- furnace body
- technique air
- fire door
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
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Abstract
The invention discloses a kind of High temperature diffusion devices, including furnace body, one end of furnace body is fire door, the other end is enclosed construction, bell is equipped at fire door, quartz boat is internally provided in furnace body, silicon chip is uniformly placed on quartz boat, the first technique air inlet is equipped in the upper end of furnace body, second technique air inlet and third technique air inlet, exhaust port is equipped in the lower end of furnace body, further include gas constant-current stabilizer, gas constant-current stabilizer is arranged on fire door, in stove or stove tail position, the configuration of the present invention is simple, the stability that gas flows in furnace body can be improved, ensure the uniformity of silicon chip diffusion, so that it is guaranteed that the uniformity of silicon chip square resistance.
Description
Technical field
The present invention relates to photovoltaic field of diffusion technologies, specially a kind of High temperature diffusion device.
Background technology
It is the core of crystal-silicon solar cell and the key of solar cell quality that diffusion, which makes P-N knots,
One.For diffusing procedure, greatest problem is how to ensure the uniformity of diffusion.Spread uniform battery, subsequent technique ginseng
Number controllability is high, it is ensured that the stability of silicon solar cell unit for electrical property parameters.At present, it is spread in crystalline silicon industrialized production
Diffusion furnace mainly has tubular type and two kinds board-like used by making P-N knots.Tubular diffusion furnace because its closure is good, capacity is big,
It is widely used.Tubular diffusion furnace can greatly reduce technique pickup risk, be high performance solar batteries industry application
Hardware guarantee is provided, existing high temperature dispersing furnace, the gas homogeneity being passed through is poor, and after being passed through furnace body, is unevenly distributed, causes
Silicon chip diffusion is uneven, uneven so as to cause square resistance.
Invention content
The purpose of the present invention is to provide a kind of High temperature diffusion device, to solve the problems mentioned in the above background technology.
To achieve the above object, the present invention provides following technical solution：A kind of High temperature diffusion device, it is described including furnace body
One end of furnace body is fire door, and other end stove tail is enclosed construction, and bell is equipped at the fire door, is set in the inside of the furnace body
There is quartz boat, silicon chip is uniformly placed on the quartz boat, the first technique air inlet, second are equipped in the upper end of the furnace body
Technique air inlet and third technique air inlet are equipped with exhaust port in the lower end of the furnace body, further include gas constant-current stabilizer,
The gas constant-current stabilizer is arranged in fire door, stove or stove tail position.
Preferably, the gas constant-current stabilizer includes current stabilization body, air inlet, honeycomb piece, air doctor, gas outlet and mistake
Filter disc, one end of the current stabilization body are equipped with air inlet, and the other end of the current stabilization body is equipped with gas outlet, the inside of the current stabilization body
Equipped with honeycomb piece, air doctor, the honeycomb piece is located at one end of air inlet, and the honeycomb piece connects air doctor, institute
The outlet for stating air doctor connects gas outlet by filter, and including multiple air-flows in the air doctor adjusts grid,
And to adjust grid tapered for the air-flow.
Preferably, the first technique air inlet, the second technique air inlet and third technique air inlet are separately positioned on stove
In mouth, stove, at stove tail.
Preferably, the first technique air inlet, the second technique air inlet and third technique air inlet are arranged in stove.
Preferably, the first technique air inlet, the second technique air inlet and third technique air inlet are arranged at fire door.
Preferably, the first technique air inlet, the second technique air inlet are consistent with the aperture of third technique air inlet,
For 2.5mm-3mm.
Compared with prior art, the beneficial effects of the invention are as follows：
（1）The configuration of the present invention is simple can improve the stability that gas flows in furnace body, it is ensured that silicon chip is spread uniform
Property, so that it is guaranteed that the uniformity of silicon chip square resistance.
（2）The gas constant-current stabilizer that the present invention uses, air-flow that can quickly in regulating stove body, it is ensured that diffusion it is uniform
Property, and air doctor adjusts grid using conical flow in gas constant-current stabilizer, can play guiding role to air-flow.
Description of the drawings
Fig. 1 is the overall structure diagram of the present invention；
Fig. 2 is the gas constant-current stabilizer structure diagram of the present invention；
In figure：1st, furnace body；2nd, fire door；3rd, stove tail；4th, bell；5th, quartz boat；6th, the first technique air inlet；7th, the second technique
Air inlet；8th, third technique air inlet；9th, exhaust port；10th, gas constant-current stabilizer；11st, in stove；12nd, current stabilization body；13rd, into
Gas port；14th, honeycomb piece；15th, air doctor；16th, gas outlet；17th, filter；18th, air-flow adjusts grid.
Specific embodiment
Below in conjunction with the attached drawing in the embodiment of the present invention, the technical solution in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other without making creative work
Embodiment shall fall within the protection scope of the present invention.
Embodiment one：
- 2 are please referred to Fig.1, the present invention provides a kind of technical solution：A kind of High temperature diffusion device, including furnace body 1, furnace body 1
One end for fire door 2, other end stove tail 3 is enclosed construction, and bell 4 is equipped at fire door 2, quartz is internally provided in furnace body 1
Boat 5 is uniformly placed with silicon chip on quartz boat 5, and the first technique air inlet 6, the second technique air inlet are equipped in the upper end of furnace body 1
7 and third technique air inlet 8, exhaust port 9 is equipped in the lower end of furnace body 1, further includes gas constant-current stabilizer 10, the gas
Constant-current stabilizer 10 is arranged on 2 position of fire door.
In the present embodiment, gas constant-current stabilizer 10 include current stabilization body 12, air inlet 13, honeycomb piece 14, air doctor 15,
Gas outlet 16 and filter 17, one end of current stabilization body 12 are equipped with air inlet 13, and the other end of current stabilization body 12 is equipped with gas outlet 16, surely
Fluid 12 is internally provided with honeycomb piece 14, air doctor 15, and honeycomb piece 14 is located at one end of air inlet 13, and honeycomb piece 14 connects
Air doctor 15, the outlet of air doctor 15 connect gas outlet 16 by filter 17, include in air doctor 15 more
A air-flow adjusts grid 18, and air-flow adjusts the gas constant-current stabilizer that grid 18 is tapered, and the present invention uses, and can quickly adjust
Air-flow in furnace body, it is ensured that the uniformity of diffusion, and also air doctor adjusts lattice using conical flow in gas constant-current stabilizer
Grid can play guiding role to air-flow.
In the present embodiment, the first technique air inlet 6, the second technique air inlet 7 and third technique air inlet 8 are separately positioned on
11 in fire door 2, stove, at stove tail 3, the aperture one of the first technique air inlet 6, the second technique air inlet 7 and third technique air inlet 8
It causes, is 2.5mm.
The configuration of the present invention is simple can improve the stability that gas flows in furnace body, it is ensured that the uniformity of silicon chip diffusion,
So that it is guaranteed that the uniformity of silicon chip square resistance.
Embodiment two：
The present invention provides a kind of technical solution：A kind of High temperature diffusion device, including furnace body 1, one end of furnace body 1 is fire door
2, other end stove tail 3 is enclosed construction, and bell 4 is equipped at fire door 2, quartz boat 5 is internally provided in furnace body 1, in quartz boat 5
On be uniformly placed with silicon chip, the upper end of furnace body 1 be equipped with the first technique air inlet 6, the second technique air inlet 7 and third technique into
Gas port 8 is equipped with exhaust port 9 in the lower end of furnace body 1, further includes gas constant-current stabilizer 10, the gas constant-current stabilizer 10 is set
Put 11 position in stove.
In the present embodiment, gas constant-current stabilizer 10 include current stabilization body 12, air inlet 13, honeycomb piece 14, air doctor 15,
Gas outlet 16 and filter 17, one end of current stabilization body 12 are equipped with air inlet 13, and the other end of current stabilization body 12 is equipped with gas outlet 16, surely
Fluid 12 is internally provided with honeycomb piece 14, air doctor 15, and honeycomb piece 14 is located at one end of air inlet 13, and honeycomb piece 14 connects
Air doctor 15, the outlet of air doctor 15 connect gas outlet 16 by filter 17, include in air doctor 15 more
A air-flow adjusts grid 18, and air-flow adjusts the gas constant-current stabilizer that grid 18 is tapered, and the present invention uses, and can quickly adjust
Air-flow in furnace body, it is ensured that the uniformity of diffusion, and also air doctor adjusts lattice using conical flow in gas constant-current stabilizer
Grid can play guiding role to air-flow.
In the present embodiment, the first technique air inlet 6, the second technique air inlet 7 and third technique air inlet 8 are arranged at stove
In 11, the first technique air inlet 6, the second technique air inlet 7 are consistent with the aperture of third technique air inlet 8, are 2.8mm.
The configuration of the present invention is simple can improve the stability that gas flows in furnace body, it is ensured that the uniformity of silicon chip diffusion,
So that it is guaranteed that the uniformity of silicon chip square resistance.
Embodiment three：
The present invention provides a kind of technical solution：A kind of High temperature diffusion device, including furnace body 1, one end of furnace body 1 is fire door
2, other end stove tail 3 is enclosed construction, and bell 4 is equipped at fire door 2, quartz boat 5 is internally provided in furnace body 1, in quartz boat 5
On be uniformly placed with silicon chip, the upper end of furnace body 1 be equipped with the first technique air inlet 6, the second technique air inlet 7 and third technique into
Gas port 8 is equipped with exhaust port 9 in the lower end of furnace body 1, further includes gas constant-current stabilizer 10, the gas constant-current stabilizer 10 is set
It puts in 3 position of stove tail.
In the present embodiment, gas constant-current stabilizer 10 include current stabilization body 12, air inlet 13, honeycomb piece 14, air doctor 15,
Gas outlet 16 and filter 17, one end of current stabilization body 12 are equipped with air inlet 13, and the other end of current stabilization body 12 is equipped with gas outlet 16, surely
Fluid 12 is internally provided with honeycomb piece 14, air doctor 15, and honeycomb piece 14 is located at one end of air inlet 13, and honeycomb piece 14 connects
Air doctor 15, the outlet of air doctor 15 connect gas outlet 16 by filter 17, include in air doctor 15 more
A air-flow adjusts grid 18, and air-flow adjusts the gas constant-current stabilizer that grid 18 is tapered, and the present invention uses, and can quickly adjust
Air-flow in furnace body, it is ensured that the uniformity of diffusion, and also air doctor adjusts lattice using conical flow in gas constant-current stabilizer
Grid can play guiding role to air-flow.
In the present embodiment, the first technique air inlet 6, the second technique air inlet 7 and third technique air inlet 8 are arranged at stove
Mouth 2, the first technique air inlet 6, the second technique air inlet 7 are consistent with the aperture of third technique air inlet 8, are 3mm.
The configuration of the present invention is simple can improve the stability that gas flows in furnace body, it is ensured that the uniformity of silicon chip diffusion,
So that it is guaranteed that the uniformity of silicon chip square resistance.
Experimental example：
Technique and various embodiments of the present invention are diffused silicon chip to silicon chip using common quartz ampoule and conventional method
Technique is diffused, finally carries out Square resistance measurement, data such as following table：
| Fire door | In stove | Stove tail | |
| Conventional method | 8 | 6 | 7 |
| Embodiment one | 2 | 2 | 1 |
| Embodiment two | 2 | 2 | 2 |
| Embodiment three | 1 | 2 | 1 |
By above table data it is found that when being diffused technique using embodiment two, the square resistance uniformity of silicon chip
Most preferably, embodiment two is most preferred embodiment.
Every technical staff's notice：Although the present invention describes according to above-mentioned specific embodiment, of the invention
Invention thought be not limited in the invention, any repacking with inventive concept will all be included in this patent protection of the patent right
In the range of.
Claims (1)
1. a kind of High temperature diffusion device, including furnace body（1）, it is characterised in that：The furnace body（1）One end be fire door（2）, separately
One end stove tail（3）For enclosed construction, in the fire door（2）Place is equipped with bell（4）, in the furnace body（1）Be internally provided with quartz
Boat（5）, in the quartz boat（5）On be uniformly placed with silicon chip, in the furnace body（1）Upper end be equipped with the first technique air inlet
（6）, the second technique air inlet（7）With third technique air inlet（8）, in the furnace body（1）Lower end be equipped with exhaust port
（9）, further include gas constant-current stabilizer（10）, the gas constant-current stabilizer（10）It is arranged on fire door（2）, in stove（11）Or stove tail
（3）Position;The gas constant-current stabilizer（10）Including current stabilization body（12）, air inlet（13）, honeycomb piece（14）, air doctor
（15）, gas outlet（16）And filter（17）, the current stabilization body（12）One end be equipped with air inlet（13）, the current stabilization body（12）
The other end be equipped with gas outlet（16）, the current stabilization body（12）Be internally provided with honeycomb piece（14）, air doctor（15）, it is described
Honeycomb piece（14）Positioned at air inlet（13）One end, the honeycomb piece（14）Connect air doctor（15）, the gas adjustment
Device（15）Outlet pass through filter（17）Connect gas outlet（16）, the air doctor（15）It is interior to be adjusted including multiple air-flows
Grid（18）, and the air-flow adjusts grid（18）It is tapered;The first technique air inlet（6）, the second technique air inlet（7）
With third technique air inlet（8）It is separately positioned on fire door（2）, in stove（11）, stove tail（3）Place;Or the first technique air inlet
（6）, the second technique air inlet（7）With third technique air inlet（8）It is arranged in stove（11）;Or the first technique air inlet
（6）, the second technique air inlet（7）With third technique air inlet（8）It is arranged at fire door（2）;The first technique air inlet
（6）, the second technique air inlet（7）With third technique air inlet（8）Aperture it is consistent, be 2.5mm-3mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610317130.7A CN105839190B (en) | 2016-05-12 | 2016-05-12 | A kind of High temperature diffusion device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610317130.7A CN105839190B (en) | 2016-05-12 | 2016-05-12 | A kind of High temperature diffusion device |
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| Publication Number | Publication Date |
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| CN105839190A CN105839190A (en) | 2016-08-10 |
| CN105839190B true CN105839190B (en) | 2018-07-06 |
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| CN201610317130.7A Active CN105839190B (en) | 2016-05-12 | 2016-05-12 | A kind of High temperature diffusion device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115233186A (en) * | 2022-07-20 | 2022-10-25 | 无锡松煜科技有限公司 | Method for improving LPCVD surface coating process |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201852445U (en) * | 2010-09-29 | 2011-06-01 | 常州天合光能有限公司 | Diffusion furnace capable of improving sheet resistance uniformity |
| CN202297872U (en) * | 2011-06-27 | 2012-07-04 | 光为绿色新能源股份有限公司 | Silicon-wafer diffusion furnace for solar cell |
| CN202830231U (en) * | 2012-09-11 | 2013-03-27 | 江阴鑫辉太阳能有限公司 | Flowing gas stabilizing device of crystalline silicon solar cell diffusion furnace |
-
2016
- 2016-05-12 CN CN201610317130.7A patent/CN105839190B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201852445U (en) * | 2010-09-29 | 2011-06-01 | 常州天合光能有限公司 | Diffusion furnace capable of improving sheet resistance uniformity |
| CN202297872U (en) * | 2011-06-27 | 2012-07-04 | 光为绿色新能源股份有限公司 | Silicon-wafer diffusion furnace for solar cell |
| CN202830231U (en) * | 2012-09-11 | 2013-03-27 | 江阴鑫辉太阳能有限公司 | Flowing gas stabilizing device of crystalline silicon solar cell diffusion furnace |
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| CN105839190A (en) | 2016-08-10 |
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