CN105659124B - 无机光学元件及其制造方法 - Google Patents

无机光学元件及其制造方法 Download PDF

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Publication number
CN105659124B
CN105659124B CN201480058385.5A CN201480058385A CN105659124B CN 105659124 B CN105659124 B CN 105659124B CN 201480058385 A CN201480058385 A CN 201480058385A CN 105659124 B CN105659124 B CN 105659124B
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China
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film
birefringent
protective film
birefringent film
inorganic
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Chinese (zh)
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CN105659124A (zh
Inventor
大和田雅弘
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Dexerials Corp
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Dexerials Corp
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • C23C16/402Silicon dioxide
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Polarising Elements (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
CN201480058385.5A 2013-10-22 2014-10-17 无机光学元件及其制造方法 Active CN105659124B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013-219491 2013-10-22
JP2013219491A JP6223116B2 (ja) 2013-10-22 2013-10-22 無機光学素子
PCT/JP2014/077684 WO2015060213A1 (ja) 2013-10-22 2014-10-17 無機光学素子及びその製造方法

Publications (2)

Publication Number Publication Date
CN105659124A CN105659124A (zh) 2016-06-08
CN105659124B true CN105659124B (zh) 2019-06-04

Family

ID=52992810

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480058385.5A Active CN105659124B (zh) 2013-10-22 2014-10-17 无机光学元件及其制造方法

Country Status (4)

Country Link
US (1) US9964670B2 (enExample)
JP (1) JP6223116B2 (enExample)
CN (1) CN105659124B (enExample)
WO (1) WO2015060213A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019095554A (ja) * 2017-11-21 2019-06-20 デクセリアルズ株式会社 光学素子及び投射型画像表示装置
JP7236225B2 (ja) * 2018-05-31 2023-03-09 デクセリアルズ株式会社 位相差補償素子、液晶表示装置および投射型画像表示装置
JP2020012876A (ja) * 2018-07-13 2020-01-23 デクセリアルズ株式会社 位相差素子の製造方法、位相差素子、および投射型画像表示装置
JP7236230B2 (ja) * 2018-09-07 2023-03-09 デクセリアルズ株式会社 光学素子、液晶表示装置および投射型画像表示装置
JP7092630B2 (ja) * 2018-09-21 2022-06-28 デクセリアルズ株式会社 光学素子及び投射型画像表示装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000258632A (ja) * 1999-03-10 2000-09-22 Nitto Denko Corp 広視野角偏光板及び液晶表示装置
US20120293732A1 (en) * 2011-05-16 2012-11-22 Sony Chemical & Information Device Corporation Phase difference element and method for manufacturing the same
CN103323898A (zh) * 2012-03-20 2013-09-25 远东新世纪股份有限公司 制造位相差板的方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH077130B2 (ja) * 1988-06-10 1995-01-30 トヨタ自動車株式会社 複屈折板
JPH09297214A (ja) * 1996-05-08 1997-11-18 Matsushita Electric Ind Co Ltd 偏光素子
JPH11109129A (ja) * 1997-10-02 1999-04-23 Nikon Corp 斜め蒸着膜素子
JP3458763B2 (ja) * 1998-05-29 2003-10-20 株式会社豊田中央研究所 複屈折板
JP2004070131A (ja) * 2002-08-08 2004-03-04 Nippon Sheet Glass Co Ltd 薄膜偏光子およびその製造方法
JP2005099266A (ja) * 2003-09-24 2005-04-14 Dainippon Printing Co Ltd 位相差制御基板およびディスプレイ
US7203001B2 (en) * 2003-12-19 2007-04-10 Nanoopto Corporation Optical retarders and related devices and systems
CN101622557A (zh) * 2007-01-12 2010-01-06 东丽株式会社 偏振片和使用该偏振片的液晶显示装置
JP2009031537A (ja) 2007-07-27 2009-02-12 Seiko Epson Corp 光学素子およびその製造方法、液晶装置、ならびに電子機器
JP4412372B2 (ja) * 2007-09-12 2010-02-10 セイコーエプソン株式会社 偏光素子の製造方法
JP5606052B2 (ja) 2009-01-13 2014-10-15 キヤノン株式会社 光学素子
JP2010049280A (ja) * 2009-11-25 2010-03-04 Seiko Epson Corp 偏光素子の製造方法
JP2010160504A (ja) * 2010-02-24 2010-07-22 Seiko Epson Corp プロジェクタ
JP2012008363A (ja) 2010-06-25 2012-01-12 Sony Chemical & Information Device Corp 波長板の製造方法
JP2012103577A (ja) 2010-11-12 2012-05-31 Seiko Epson Corp 光学補償板とその製造方法及び液晶表示装置
JP2013228574A (ja) * 2012-04-26 2013-11-07 Seiko Epson Corp 位相差板、及び電子機器

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000258632A (ja) * 1999-03-10 2000-09-22 Nitto Denko Corp 広視野角偏光板及び液晶表示装置
US20120293732A1 (en) * 2011-05-16 2012-11-22 Sony Chemical & Information Device Corporation Phase difference element and method for manufacturing the same
CN103323898A (zh) * 2012-03-20 2013-09-25 远东新世纪股份有限公司 制造位相差板的方法

Also Published As

Publication number Publication date
JP6223116B2 (ja) 2017-11-01
US20160266282A1 (en) 2016-09-15
WO2015060213A1 (ja) 2015-04-30
CN105659124A (zh) 2016-06-08
US9964670B2 (en) 2018-05-08
JP2015082010A (ja) 2015-04-27

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