CN105659124B - 无机光学元件及其制造方法 - Google Patents
无机光学元件及其制造方法 Download PDFInfo
- Publication number
- CN105659124B CN105659124B CN201480058385.5A CN201480058385A CN105659124B CN 105659124 B CN105659124 B CN 105659124B CN 201480058385 A CN201480058385 A CN 201480058385A CN 105659124 B CN105659124 B CN 105659124B
- Authority
- CN
- China
- Prior art keywords
- film
- birefringent
- protective film
- birefringent film
- inorganic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Polarising Elements (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-219491 | 2013-10-22 | ||
| JP2013219491A JP6223116B2 (ja) | 2013-10-22 | 2013-10-22 | 無機光学素子 |
| PCT/JP2014/077684 WO2015060213A1 (ja) | 2013-10-22 | 2014-10-17 | 無機光学素子及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105659124A CN105659124A (zh) | 2016-06-08 |
| CN105659124B true CN105659124B (zh) | 2019-06-04 |
Family
ID=52992810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480058385.5A Active CN105659124B (zh) | 2013-10-22 | 2014-10-17 | 无机光学元件及其制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9964670B2 (enExample) |
| JP (1) | JP6223116B2 (enExample) |
| CN (1) | CN105659124B (enExample) |
| WO (1) | WO2015060213A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019095554A (ja) * | 2017-11-21 | 2019-06-20 | デクセリアルズ株式会社 | 光学素子及び投射型画像表示装置 |
| JP7236225B2 (ja) * | 2018-05-31 | 2023-03-09 | デクセリアルズ株式会社 | 位相差補償素子、液晶表示装置および投射型画像表示装置 |
| JP2020012876A (ja) * | 2018-07-13 | 2020-01-23 | デクセリアルズ株式会社 | 位相差素子の製造方法、位相差素子、および投射型画像表示装置 |
| JP7236230B2 (ja) * | 2018-09-07 | 2023-03-09 | デクセリアルズ株式会社 | 光学素子、液晶表示装置および投射型画像表示装置 |
| JP7092630B2 (ja) * | 2018-09-21 | 2022-06-28 | デクセリアルズ株式会社 | 光学素子及び投射型画像表示装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000258632A (ja) * | 1999-03-10 | 2000-09-22 | Nitto Denko Corp | 広視野角偏光板及び液晶表示装置 |
| US20120293732A1 (en) * | 2011-05-16 | 2012-11-22 | Sony Chemical & Information Device Corporation | Phase difference element and method for manufacturing the same |
| CN103323898A (zh) * | 2012-03-20 | 2013-09-25 | 远东新世纪股份有限公司 | 制造位相差板的方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH077130B2 (ja) * | 1988-06-10 | 1995-01-30 | トヨタ自動車株式会社 | 複屈折板 |
| JPH09297214A (ja) * | 1996-05-08 | 1997-11-18 | Matsushita Electric Ind Co Ltd | 偏光素子 |
| JPH11109129A (ja) * | 1997-10-02 | 1999-04-23 | Nikon Corp | 斜め蒸着膜素子 |
| JP3458763B2 (ja) * | 1998-05-29 | 2003-10-20 | 株式会社豊田中央研究所 | 複屈折板 |
| JP2004070131A (ja) * | 2002-08-08 | 2004-03-04 | Nippon Sheet Glass Co Ltd | 薄膜偏光子およびその製造方法 |
| JP2005099266A (ja) * | 2003-09-24 | 2005-04-14 | Dainippon Printing Co Ltd | 位相差制御基板およびディスプレイ |
| US7203001B2 (en) * | 2003-12-19 | 2007-04-10 | Nanoopto Corporation | Optical retarders and related devices and systems |
| CN101622557A (zh) * | 2007-01-12 | 2010-01-06 | 东丽株式会社 | 偏振片和使用该偏振片的液晶显示装置 |
| JP2009031537A (ja) | 2007-07-27 | 2009-02-12 | Seiko Epson Corp | 光学素子およびその製造方法、液晶装置、ならびに電子機器 |
| JP4412372B2 (ja) * | 2007-09-12 | 2010-02-10 | セイコーエプソン株式会社 | 偏光素子の製造方法 |
| JP5606052B2 (ja) | 2009-01-13 | 2014-10-15 | キヤノン株式会社 | 光学素子 |
| JP2010049280A (ja) * | 2009-11-25 | 2010-03-04 | Seiko Epson Corp | 偏光素子の製造方法 |
| JP2010160504A (ja) * | 2010-02-24 | 2010-07-22 | Seiko Epson Corp | プロジェクタ |
| JP2012008363A (ja) | 2010-06-25 | 2012-01-12 | Sony Chemical & Information Device Corp | 波長板の製造方法 |
| JP2012103577A (ja) | 2010-11-12 | 2012-05-31 | Seiko Epson Corp | 光学補償板とその製造方法及び液晶表示装置 |
| JP2013228574A (ja) * | 2012-04-26 | 2013-11-07 | Seiko Epson Corp | 位相差板、及び電子機器 |
-
2013
- 2013-10-22 JP JP2013219491A patent/JP6223116B2/ja active Active
-
2014
- 2014-10-17 WO PCT/JP2014/077684 patent/WO2015060213A1/ja not_active Ceased
- 2014-10-17 CN CN201480058385.5A patent/CN105659124B/zh active Active
- 2014-10-17 US US15/031,071 patent/US9964670B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000258632A (ja) * | 1999-03-10 | 2000-09-22 | Nitto Denko Corp | 広視野角偏光板及び液晶表示装置 |
| US20120293732A1 (en) * | 2011-05-16 | 2012-11-22 | Sony Chemical & Information Device Corporation | Phase difference element and method for manufacturing the same |
| CN103323898A (zh) * | 2012-03-20 | 2013-09-25 | 远东新世纪股份有限公司 | 制造位相差板的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6223116B2 (ja) | 2017-11-01 |
| US20160266282A1 (en) | 2016-09-15 |
| WO2015060213A1 (ja) | 2015-04-30 |
| CN105659124A (zh) | 2016-06-08 |
| US9964670B2 (en) | 2018-05-08 |
| JP2015082010A (ja) | 2015-04-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |